CN102800704A - 沟槽式mos晶体管及其制造方法、集成电路 - Google Patents
沟槽式mos晶体管及其制造方法、集成电路 Download PDFInfo
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- CN102800704A CN102800704A CN2012103131053A CN201210313105A CN102800704A CN 102800704 A CN102800704 A CN 102800704A CN 2012103131053 A CN2012103131053 A CN 2012103131053A CN 201210313105 A CN201210313105 A CN 201210313105A CN 102800704 A CN102800704 A CN 102800704A
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- polysilicon gate
- groove
- mos transistor
- metal silicide
- groove mos
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CN2012103131053A CN102800704A (zh) | 2012-08-29 | 2012-08-29 | 沟槽式mos晶体管及其制造方法、集成电路 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN116913780A (zh) * | 2023-07-20 | 2023-10-20 | 瑶芯微电子科技(上海)有限公司 | 一种屏蔽栅沟槽型mos器件结构及其制备方法 |
Citations (14)
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US20030168695A1 (en) * | 2002-03-07 | 2003-09-11 | International Rectifier Corp. | Silicide gate process for trench MOSFET |
US6635535B2 (en) * | 2001-11-20 | 2003-10-21 | Fairchild Semiconductor Corporation | Dense trench MOSFET with decreased etch sensitivity to deposition and etch processing |
US20040012050A1 (en) * | 2002-07-19 | 2004-01-22 | Hitachi, Ltd. | Semiconductor device |
US20040041207A1 (en) * | 2002-09-02 | 2004-03-04 | Kabushiki Kaisha Toshiba | Trench gate type semiconductor device and fabricating method of the same |
CN1586012A (zh) * | 2001-11-15 | 2005-02-23 | 通用半导体公司 | 具有低栅极电荷的沟槽金属氧化物半导体场效应晶体管 |
CN1700422A (zh) * | 2004-05-19 | 2005-11-23 | 上海宏力半导体制造有限公司 | 改善金属硅化物工艺产生桥连现象的清洗方法 |
US20060197148A1 (en) * | 2005-02-04 | 2006-09-07 | Hsu Hsiu-Wen | Trench power moset and method for fabricating the same |
CN101140871A (zh) * | 2006-09-04 | 2008-03-12 | 中芯国际集成电路制造(上海)有限公司 | 半导体器件中金属硅化物接触的制造方法 |
CN101656268A (zh) * | 2009-07-24 | 2010-02-24 | 上海宏力半导体制造有限公司 | 金属氧化物半导体场效应晶体管及其制造方法 |
CN101937841A (zh) * | 2009-07-02 | 2011-01-05 | 上海华虹Nec电子有限公司 | 降低功率场效应晶体管栅极电阻的方法及结构 |
CN102376756A (zh) * | 2010-08-26 | 2012-03-14 | 上海华虹Nec电子有限公司 | 多晶硅栅极结构 |
CN102446973A (zh) * | 2010-09-30 | 2012-05-09 | 飞兆半导体公司 | 通过低温处理形成的umos半导体器件 |
CN102496571A (zh) * | 2011-12-19 | 2012-06-13 | 杭州士兰集成电路有限公司 | 低势垒肖特基二极管的制作方法及结构 |
US20120256258A1 (en) * | 2011-04-11 | 2012-10-11 | Great Power Semiconductor Corp. | Trench power mosfet structure with high cell density and fabrication method thereof |
-
2012
- 2012-08-29 CN CN2012103131053A patent/CN102800704A/zh active Pending
Patent Citations (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1586012A (zh) * | 2001-11-15 | 2005-02-23 | 通用半导体公司 | 具有低栅极电荷的沟槽金属氧化物半导体场效应晶体管 |
US6635535B2 (en) * | 2001-11-20 | 2003-10-21 | Fairchild Semiconductor Corporation | Dense trench MOSFET with decreased etch sensitivity to deposition and etch processing |
US20030168695A1 (en) * | 2002-03-07 | 2003-09-11 | International Rectifier Corp. | Silicide gate process for trench MOSFET |
US20040012050A1 (en) * | 2002-07-19 | 2004-01-22 | Hitachi, Ltd. | Semiconductor device |
US20040041207A1 (en) * | 2002-09-02 | 2004-03-04 | Kabushiki Kaisha Toshiba | Trench gate type semiconductor device and fabricating method of the same |
CN1700422A (zh) * | 2004-05-19 | 2005-11-23 | 上海宏力半导体制造有限公司 | 改善金属硅化物工艺产生桥连现象的清洗方法 |
US20060197148A1 (en) * | 2005-02-04 | 2006-09-07 | Hsu Hsiu-Wen | Trench power moset and method for fabricating the same |
CN101140871A (zh) * | 2006-09-04 | 2008-03-12 | 中芯国际集成电路制造(上海)有限公司 | 半导体器件中金属硅化物接触的制造方法 |
CN101937841A (zh) * | 2009-07-02 | 2011-01-05 | 上海华虹Nec电子有限公司 | 降低功率场效应晶体管栅极电阻的方法及结构 |
CN101656268A (zh) * | 2009-07-24 | 2010-02-24 | 上海宏力半导体制造有限公司 | 金属氧化物半导体场效应晶体管及其制造方法 |
CN102376756A (zh) * | 2010-08-26 | 2012-03-14 | 上海华虹Nec电子有限公司 | 多晶硅栅极结构 |
CN102446973A (zh) * | 2010-09-30 | 2012-05-09 | 飞兆半导体公司 | 通过低温处理形成的umos半导体器件 |
US20120256258A1 (en) * | 2011-04-11 | 2012-10-11 | Great Power Semiconductor Corp. | Trench power mosfet structure with high cell density and fabrication method thereof |
CN102496571A (zh) * | 2011-12-19 | 2012-06-13 | 杭州士兰集成电路有限公司 | 低势垒肖特基二极管的制作方法及结构 |
Non-Patent Citations (1)
Title |
---|
严利人,周卫,刘道广编著: "《微电子制造技术概论》", 31 March 2010 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN116913780A (zh) * | 2023-07-20 | 2023-10-20 | 瑶芯微电子科技(上海)有限公司 | 一种屏蔽栅沟槽型mos器件结构及其制备方法 |
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Owner name: SHANGHAI HUAHONG GRACE SEMICONDUCTOR MANUFACTURING Free format text: FORMER OWNER: HONGLI SEMICONDUCTOR MANUFACTURE CO LTD, SHANGHAI Effective date: 20140430 |
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Effective date of registration: 20140430 Address after: 201203 Shanghai Zhangjiang hi tech park Zuchongzhi Road No. 1399 Applicant after: Shanghai Huahong Grace Semiconductor Manufacturing Corporation Address before: 201203 Shanghai Guo Shou Jing Road, Pudong New Area Zhangjiang hi tech Park No. 818 Applicant before: Hongli Semiconductor Manufacture Co., Ltd., Shanghai |
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