CN102770239B - 具有局部区域透明部的化学机械抛光垫 - Google Patents

具有局部区域透明部的化学机械抛光垫 Download PDF

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Publication number
CN102770239B
CN102770239B CN201180005898.6A CN201180005898A CN102770239B CN 102770239 B CN102770239 B CN 102770239B CN 201180005898 A CN201180005898 A CN 201180005898A CN 102770239 B CN102770239 B CN 102770239B
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CN
China
Prior art keywords
polishing
polishing pad
hyalomere
polyureas
heat
Prior art date
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CN201180005898.6A
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English (en)
Chinese (zh)
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CN102770239A (zh
Inventor
W·阿利森
黄平
D·斯科特
R·弗伦泽尔
R·科普里希
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CMC Materials LLC
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Nexplanar Corp
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Publication date
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Publication of CN102770239A publication Critical patent/CN102770239A/zh
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/205—Lapping pads for working plane surfaces provided with a window for inspecting the surface of the work being lapped
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D13/00—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor
    • B24D13/14—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor acting by the front face
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D7/00—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor
    • B24D7/12—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor with apertures for inspecting the surface to be abraded

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
CN201180005898.6A 2010-01-13 2011-01-11 具有局部区域透明部的化学机械抛光垫 Active CN102770239B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/657,135 2010-01-13
US12/657,135 US9017140B2 (en) 2010-01-13 2010-01-13 CMP pad with local area transparency
PCT/US2011/020870 WO2011088057A1 (en) 2010-01-13 2011-01-11 Cmp pad with local area transparency

Publications (2)

Publication Number Publication Date
CN102770239A CN102770239A (zh) 2012-11-07
CN102770239B true CN102770239B (zh) 2016-04-20

Family

ID=43896755

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201180005898.6A Active CN102770239B (zh) 2010-01-13 2011-01-11 具有局部区域透明部的化学机械抛光垫

Country Status (10)

Country Link
US (1) US9017140B2 (https=)
EP (1) EP2523777B1 (https=)
JP (3) JP5503019B2 (https=)
KR (1) KR101495145B1 (https=)
CN (1) CN102770239B (https=)
IL (1) IL220649A (https=)
MY (1) MY165538A (https=)
SG (2) SG10201408738RA (https=)
TW (1) TWI490083B (https=)
WO (1) WO2011088057A1 (https=)

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