CN102766155A - 一种六甲基二硅氮烷合成方法 - Google Patents
一种六甲基二硅氮烷合成方法 Download PDFInfo
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- CN102766155A CN102766155A CN2012102527195A CN201210252719A CN102766155A CN 102766155 A CN102766155 A CN 102766155A CN 2012102527195 A CN2012102527195 A CN 2012102527195A CN 201210252719 A CN201210252719 A CN 201210252719A CN 102766155 A CN102766155 A CN 102766155A
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- Prior art keywords
- hexamethyldisilazane
- reaction
- washing
- solvent
- compound method
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- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 title claims abstract description 75
- 238000000034 method Methods 0.000 title claims abstract description 26
- 230000002194 synthesizing effect Effects 0.000 title abstract description 3
- 238000006243 chemical reaction Methods 0.000 claims abstract description 53
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 claims abstract description 13
- 239000012046 mixed solvent Substances 0.000 claims abstract description 10
- 238000005406 washing Methods 0.000 claims description 42
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 41
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 claims description 26
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 21
- 229910021529 ammonia Inorganic materials 0.000 claims description 20
- 239000000463 material Substances 0.000 claims description 13
- 239000005051 trimethylchlorosilane Substances 0.000 claims description 13
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 12
- -1 hexamethyldisilazane compound Chemical class 0.000 claims description 11
- 239000012074 organic phase Substances 0.000 claims description 10
- 239000007810 chemical reaction solvent Substances 0.000 claims description 9
- 239000003513 alkali Substances 0.000 claims description 8
- 150000001555 benzenes Chemical class 0.000 claims description 8
- 239000002904 solvent Substances 0.000 claims description 8
- 238000003756 stirring Methods 0.000 claims description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 6
- 239000007864 aqueous solution Substances 0.000 claims description 5
- 238000004140 cleaning Methods 0.000 claims description 5
- 239000007788 liquid Substances 0.000 claims description 3
- 239000002994 raw material Substances 0.000 claims description 3
- 238000000605 extraction Methods 0.000 claims description 2
- 238000002156 mixing Methods 0.000 claims description 2
- 238000000926 separation method Methods 0.000 claims description 2
- 238000007086 side reaction Methods 0.000 abstract description 3
- 238000006460 hydrolysis reaction Methods 0.000 abstract description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 230000035484 reaction time Effects 0.000 abstract description 2
- 238000005265 energy consumption Methods 0.000 abstract 1
- 230000007062 hydrolysis Effects 0.000 abstract 1
- 239000000047 product Substances 0.000 description 14
- HEMHJVSKTPXQMS-UHFFFAOYSA-M sodium hydroxide Inorganic materials [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 8
- 239000000460 chlorine Substances 0.000 description 7
- 239000002245 particle Substances 0.000 description 4
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 238000013019 agitation Methods 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 230000003301 hydrolyzing effect Effects 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 230000005764 inhibitory process Effects 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- 241000228143 Penicillium Species 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- LKCWBDHBTVXHDL-RMDFUYIESA-N amikacin Chemical compound O([C@@H]1[C@@H](N)C[C@H]([C@@H]([C@H]1O)O[C@@H]1[C@@H]([C@@H](N)[C@H](O)[C@@H](CO)O1)O)NC(=O)[C@@H](O)CCN)[C@H]1O[C@H](CN)[C@@H](O)[C@H](O)[C@H]1O LKCWBDHBTVXHDL-RMDFUYIESA-N 0.000 description 1
- 229960004821 amikacin Drugs 0.000 description 1
- 238000004176 ammonification Methods 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 235000013877 carbamide Nutrition 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229920001709 polysilazane Polymers 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000003381 solubilizing effect Effects 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- AAPLIUHOKVUFCC-UHFFFAOYSA-N trimethylsilanol Chemical compound C[Si](C)(C)O AAPLIUHOKVUFCC-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
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CN201210252719.5A CN102766155B (zh) | 2012-07-15 | 2012-07-15 | 一种六甲基二硅氮烷合成方法 |
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CN102766155A true CN102766155A (zh) | 2012-11-07 |
CN102766155B CN102766155B (zh) | 2016-08-17 |
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Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103193816A (zh) * | 2013-04-12 | 2013-07-10 | 哈尔滨工业大学 | 水相合成硫代羧酸酯硅烷偶联剂的制备方法 |
CN105367594A (zh) * | 2015-10-09 | 2016-03-02 | 浙江硕而博化工有限公司 | 一种以六甲基二硅氧烷为原料制备六甲基二硅氮烷的方法 |
CN105732688A (zh) * | 2016-04-06 | 2016-07-06 | 衢州信步化工科技有限公司 | 一种六甲基二硅氮烷的高效合成方法 |
CN105777793A (zh) * | 2016-04-06 | 2016-07-20 | 衢州信步化工科技有限公司 | 一种六甲基二硅氮烷柱式连续合成方法 |
CN108659030A (zh) * | 2018-07-14 | 2018-10-16 | 浙江大学 | 一种连续化生产六甲基二硅氮烷的反应系统及方法 |
CN109748932A (zh) * | 2019-01-09 | 2019-05-14 | 浙江新化化工股份有限公司 | 一种六甲基二硅氮烷的连续式合成方法 |
TWI660962B (zh) * | 2014-04-03 | 2019-06-01 | 日商信越化學工業股份有限公司 | 矽氮烷化合物的製造方法 |
CN111732602A (zh) * | 2020-05-26 | 2020-10-02 | 浙江新安化工集团股份有限公司 | 一种硅氮烷的制备方法 |
CN112442061A (zh) * | 2020-12-08 | 2021-03-05 | 江西贝特利新材料有限公司 | 一种硅氮烷的水洗方法 |
CN112999999A (zh) * | 2021-03-11 | 2021-06-22 | 浙江硕而博化工有限公司 | 一种六甲基二硅氮烷的生产系统及其生产工艺 |
CN114507253A (zh) * | 2022-01-20 | 2022-05-17 | 杭州四马化工科技有限公司 | 一种硅氮烷的连续化生产工艺 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4644076A (en) * | 1985-04-11 | 1987-02-17 | Far Research, Inc. | Continuous process for the synthesis of hexamethyldisilazane |
CN101613363A (zh) * | 2009-07-22 | 2009-12-30 | 吉林新亚强生物化工有限公司 | 六甲基二硅氮烷的制备工艺 |
CN101704835A (zh) * | 2009-11-26 | 2010-05-12 | 衢州瑞力杰化工有限公司 | 一种六甲基二硅氮烷的生产方法 |
-
2012
- 2012-07-15 CN CN201210252719.5A patent/CN102766155B/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4644076A (en) * | 1985-04-11 | 1987-02-17 | Far Research, Inc. | Continuous process for the synthesis of hexamethyldisilazane |
CN101613363A (zh) * | 2009-07-22 | 2009-12-30 | 吉林新亚强生物化工有限公司 | 六甲基二硅氮烷的制备工艺 |
CN101704835A (zh) * | 2009-11-26 | 2010-05-12 | 衢州瑞力杰化工有限公司 | 一种六甲基二硅氮烷的生产方法 |
Non-Patent Citations (2)
Title |
---|
宋立贤等: "六甲基二硅氮烷合成新工艺", 《现代化工》, no. 4, 31 December 1997 (1997-12-31), pages 27 - 28 * |
陈向前等: "六甲基二硅氮烷的合成研究", 《浙江化工》, vol. 34, no. 5, 31 December 2003 (2003-12-31), pages 7 - 8 * |
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103193816B (zh) * | 2013-04-12 | 2015-10-28 | 哈尔滨工业大学 | 水相合成硫代羧酸酯硅烷偶联剂的制备方法 |
CN103193816A (zh) * | 2013-04-12 | 2013-07-10 | 哈尔滨工业大学 | 水相合成硫代羧酸酯硅烷偶联剂的制备方法 |
TWI660962B (zh) * | 2014-04-03 | 2019-06-01 | 日商信越化學工業股份有限公司 | 矽氮烷化合物的製造方法 |
CN105367594A (zh) * | 2015-10-09 | 2016-03-02 | 浙江硕而博化工有限公司 | 一种以六甲基二硅氧烷为原料制备六甲基二硅氮烷的方法 |
CN105367594B (zh) * | 2015-10-09 | 2018-05-04 | 浙江硕而博化工有限公司 | 一种以六甲基二硅氧烷为原料制备六甲基二硅氮烷的方法 |
CN105732688A (zh) * | 2016-04-06 | 2016-07-06 | 衢州信步化工科技有限公司 | 一种六甲基二硅氮烷的高效合成方法 |
CN105777793A (zh) * | 2016-04-06 | 2016-07-20 | 衢州信步化工科技有限公司 | 一种六甲基二硅氮烷柱式连续合成方法 |
CN105777793B (zh) * | 2016-04-06 | 2019-03-08 | 衢州信步化工科技有限公司 | 一种六甲基二硅氮烷柱式连续合成方法 |
CN108659030B (zh) * | 2018-07-14 | 2023-05-02 | 浙江大学 | 一种连续化生产六甲基二硅氮烷的反应系统及方法 |
CN108659030A (zh) * | 2018-07-14 | 2018-10-16 | 浙江大学 | 一种连续化生产六甲基二硅氮烷的反应系统及方法 |
CN109748932A (zh) * | 2019-01-09 | 2019-05-14 | 浙江新化化工股份有限公司 | 一种六甲基二硅氮烷的连续式合成方法 |
CN109748932B (zh) * | 2019-01-09 | 2021-06-08 | 浙江新化化工股份有限公司 | 一种六甲基二硅氮烷的连续式合成方法 |
CN111732602A (zh) * | 2020-05-26 | 2020-10-02 | 浙江新安化工集团股份有限公司 | 一种硅氮烷的制备方法 |
CN112442061A (zh) * | 2020-12-08 | 2021-03-05 | 江西贝特利新材料有限公司 | 一种硅氮烷的水洗方法 |
CN112999999A (zh) * | 2021-03-11 | 2021-06-22 | 浙江硕而博化工有限公司 | 一种六甲基二硅氮烷的生产系统及其生产工艺 |
CN114507253A (zh) * | 2022-01-20 | 2022-05-17 | 杭州四马化工科技有限公司 | 一种硅氮烷的连续化生产工艺 |
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Denomination of invention: A synthetic method of hexamethyldisilazane Effective date of registration: 20211223 Granted publication date: 20160817 Pledgee: Industrial and Commercial Bank of China Limited Feixian sub branch Pledgor: LUNAN NEW TIME BIO-TECH Co.,Ltd. Registration number: Y2021980016212 |
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Date of cancellation: 20221028 Granted publication date: 20160817 Pledgee: Industrial and Commercial Bank of China Limited Feixian sub branch Pledgor: LUNAN NEW TIME BIO-TECH Co.,Ltd. Registration number: Y2021980016212 |
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Denomination of invention: A Synthesis Method of Hexamethyldisilazane Effective date of registration: 20221103 Granted publication date: 20160817 Pledgee: Industrial and Commercial Bank of China Limited Feixian sub branch Pledgor: LUNAN NEW TIME BIO-TECH Co.,Ltd. Registration number: Y2022980020512 |
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