CN102575900B - 用于熔化炉的离子等离子电子发射器 - Google Patents
用于熔化炉的离子等离子电子发射器 Download PDFInfo
- Publication number
- CN102575900B CN102575900B CN201080048029.7A CN201080048029A CN102575900B CN 102575900 B CN102575900 B CN 102575900B CN 201080048029 A CN201080048029 A CN 201080048029A CN 102575900 B CN102575900 B CN 102575900B
- Authority
- CN
- China
- Prior art keywords
- electron
- ion plasma
- field
- electron field
- cathode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22D—CASTING OF METALS; CASTING OF OTHER SUBSTANCES BY THE SAME PROCESSES OR DEVICES
- B22D11/00—Continuous casting of metals, i.e. casting in indefinite lengths
- B22D11/10—Supplying or treating molten metal
- B22D11/11—Treating the molten metal
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B4/00—Electrothermal treatment of ores or metallurgical products for obtaining metals or alloys
- C22B4/005—Electrothermal treatment of ores or metallurgical products for obtaining metals or alloys using plasma jets
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B9/00—General processes of refining or remelting of metals; Apparatus for electroslag or arc remelting of metals
- C22B9/04—Refining by applying a vacuum
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B9/00—General processes of refining or remelting of metals; Apparatus for electroslag or arc remelting of metals
- C22B9/16—Remelting metals
- C22B9/22—Remelting metals with heating by wave energy or particle radiation
- C22B9/228—Remelting metals with heating by wave energy or particle radiation by particle radiation, e.g. electron beams
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B3/00—Hearth-type furnaces, e.g. of reverberatory type; Electric arc furnaces ; Tank furnaces
- F27B3/08—Hearth-type furnaces, e.g. of reverberatory type; Electric arc furnaces ; Tank furnaces heated electrically, with or without any other source of heat
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B3/00—Hearth-type furnaces, e.g. of reverberatory type; Electric arc furnaces ; Tank furnaces
- F27B3/10—Details, accessories or equipment, e.g. dust-collectors, specially adapted for hearth-type furnaces
- F27B3/20—Arrangements of heating devices
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
- F27B5/04—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated adapted for treating the charge in vacuum or special atmosphere
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D99/00—Subject matter not provided for in other groups of this subclass
- F27D99/0001—Heating elements or systems
- F27D99/0006—Electric heating elements or system
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/077—Electron guns using discharge in gases or vapours as electron sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B9/00—General processes of refining or remelting of metals; Apparatus for electroslag or arc remelting of metals
- C22B9/16—Remelting metals
- C22B9/22—Remelting metals with heating by wave energy or particle radiation
- C22B9/226—Remelting metals with heating by wave energy or particle radiation by electric discharge, e.g. plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/15—Means for deflecting or directing discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/31—Processing objects on a macro-scale
- H01J2237/3128—Melting
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Geology (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Furnace Details (AREA)
- Discharge Heating (AREA)
- Continuous Casting (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/546,785 US8748773B2 (en) | 2007-03-30 | 2009-08-25 | Ion plasma electron emitters for a melting furnace |
| US12/546,785 | 2009-08-25 | ||
| PCT/US2010/044944 WO2011025648A1 (en) | 2009-08-25 | 2010-08-10 | Ion plasma electron emitters for a melting furnace |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410655724.XA Division CN104409306A (zh) | 2009-08-25 | 2010-08-10 | 生成电子场的方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102575900A CN102575900A (zh) | 2012-07-11 |
| CN102575900B true CN102575900B (zh) | 2014-12-17 |
Family
ID=42990229
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201080048029.7A Expired - Fee Related CN102575900B (zh) | 2009-08-25 | 2010-08-10 | 用于熔化炉的离子等离子电子发射器 |
| CN201410655724.XA Pending CN104409306A (zh) | 2009-08-25 | 2010-08-10 | 生成电子场的方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410655724.XA Pending CN104409306A (zh) | 2009-08-25 | 2010-08-10 | 生成电子场的方法 |
Country Status (16)
| Country | Link |
|---|---|
| US (2) | US8748773B2 (enExample) |
| EP (1) | EP2470847A1 (enExample) |
| JP (1) | JP2013503259A (enExample) |
| KR (1) | KR20120047940A (enExample) |
| CN (2) | CN102575900B (enExample) |
| AU (1) | AU2010286883B2 (enExample) |
| BR (1) | BR112012003444A2 (enExample) |
| CA (1) | CA2769285A1 (enExample) |
| HK (1) | HK1206484A1 (enExample) |
| IL (1) | IL217888A0 (enExample) |
| MX (1) | MX2012001678A (enExample) |
| NZ (1) | NZ597859A (enExample) |
| RU (1) | RU2544328C2 (enExample) |
| SG (1) | SG178528A1 (enExample) |
| UA (1) | UA111144C2 (enExample) |
| WO (1) | WO2011025648A1 (enExample) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6496529B1 (en) * | 2000-11-15 | 2002-12-17 | Ati Properties, Inc. | Refining and casting apparatus and method |
| US8891583B2 (en) | 2000-11-15 | 2014-11-18 | Ati Properties, Inc. | Refining and casting apparatus and method |
| US7803212B2 (en) * | 2005-09-22 | 2010-09-28 | Ati Properties, Inc. | Apparatus and method for clean, rapidly solidified alloys |
| US7578960B2 (en) * | 2005-09-22 | 2009-08-25 | Ati Properties, Inc. | Apparatus and method for clean, rapidly solidified alloys |
| US7803211B2 (en) * | 2005-09-22 | 2010-09-28 | Ati Properties, Inc. | Method and apparatus for producing large diameter superalloy ingots |
| US8381047B2 (en) * | 2005-11-30 | 2013-02-19 | Microsoft Corporation | Predicting degradation of a communication channel below a threshold based on data transmission errors |
| US8642916B2 (en) * | 2007-03-30 | 2014-02-04 | Ati Properties, Inc. | Melting furnace including wire-discharge ion plasma electron emitter |
| US8748773B2 (en) * | 2007-03-30 | 2014-06-10 | Ati Properties, Inc. | Ion plasma electron emitters for a melting furnace |
| US7798199B2 (en) | 2007-12-04 | 2010-09-21 | Ati Properties, Inc. | Casting apparatus and method |
| US8747956B2 (en) | 2011-08-11 | 2014-06-10 | Ati Properties, Inc. | Processes, systems, and apparatus for forming products from atomized metals and alloys |
| WO2013184320A1 (en) * | 2012-06-06 | 2013-12-12 | Purdue Research Foundation | Ion focusing |
| CN103952569A (zh) * | 2014-04-23 | 2014-07-30 | 宝鸡市凯博真空科技有限公司 | 电子束冷床炉 |
| JP5703414B1 (ja) * | 2014-09-10 | 2015-04-22 | 石福金属興業株式会社 | 白金族基合金の製造方法 |
| RU2578192C2 (ru) * | 2014-10-06 | 2016-03-27 | Геннадий Леонидович Багич | Способ излучения энергии и устройство для его осуществления (плазменный излучатель) |
| CN106399721A (zh) * | 2016-08-27 | 2017-02-15 | 宝鸡众有色金属材料有限公司 | 一种半导体靶材用高纯镍锭的制备工艺 |
| US10662509B2 (en) * | 2016-09-09 | 2020-05-26 | Uchicago Argonne, Llc | Method for making metal-carbon composites and compositions |
| WO2021222695A1 (en) * | 2020-05-01 | 2021-11-04 | Essentium, Inc. | Emitter and method for plasma fusing of materials |
| CN113695593B (zh) * | 2020-05-07 | 2023-05-02 | 昆山晶微新材料研究院有限公司 | 一种用于生产高均匀性航空材料的液态3d打印供液方法及其供液系统 |
| CN112048624B (zh) * | 2020-09-14 | 2021-08-03 | 大连理工大学 | 一种电子束循环超温处理提高镍基高温合金成分均匀性的方法 |
| CN113042742A (zh) * | 2021-03-17 | 2021-06-29 | 南京工业大学 | 一种用于钛粉制备深度精炼装置 |
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2009
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- 2010-08-10 CA CA2769285A patent/CA2769285A1/en not_active Abandoned
- 2010-08-10 CN CN201410655724.XA patent/CN104409306A/zh active Pending
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Also Published As
| Publication number | Publication date |
|---|---|
| RU2544328C2 (ru) | 2015-03-20 |
| CA2769285A1 (en) | 2011-03-03 |
| MX2012001678A (es) | 2012-03-07 |
| AU2010286883B2 (en) | 2015-01-15 |
| CN102575900A (zh) | 2012-07-11 |
| HK1172946A1 (en) | 2013-05-03 |
| CN104409306A (zh) | 2015-03-11 |
| US20140230605A1 (en) | 2014-08-21 |
| NZ597859A (en) | 2013-10-25 |
| US8748773B2 (en) | 2014-06-10 |
| UA111144C2 (uk) | 2016-04-11 |
| RU2012111218A (ru) | 2013-10-10 |
| SG178528A1 (en) | 2012-03-29 |
| WO2011025648A1 (en) | 2011-03-03 |
| EP2470847A1 (en) | 2012-07-04 |
| AU2010286883A1 (en) | 2012-02-16 |
| HK1206484A1 (en) | 2016-01-08 |
| KR20120047940A (ko) | 2012-05-14 |
| IL217888A0 (en) | 2012-03-29 |
| BR112012003444A2 (pt) | 2016-02-23 |
| JP2013503259A (ja) | 2013-01-31 |
| US20100012629A1 (en) | 2010-01-21 |
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