CN102412801A - 压电装置的制造方法及压电装置 - Google Patents

压电装置的制造方法及压电装置 Download PDF

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Publication number
CN102412801A
CN102412801A CN2011102646202A CN201110264620A CN102412801A CN 102412801 A CN102412801 A CN 102412801A CN 2011102646202 A CN2011102646202 A CN 2011102646202A CN 201110264620 A CN201110264620 A CN 201110264620A CN 102412801 A CN102412801 A CN 102412801A
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CN
China
Prior art keywords
base
crystal
base portion
wafer
piezo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2011102646202A
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English (en)
Chinese (zh)
Inventor
市川了一
天野芳明
龟泽健二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nihon Dempa Kogyo Co Ltd
Original Assignee
Nihon Dempa Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Dempa Kogyo Co Ltd filed Critical Nihon Dempa Kogyo Co Ltd
Publication of CN102412801A publication Critical patent/CN102412801A/zh
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02007—Details of bulk acoustic wave devices
    • H03H9/02086—Means for compensation or elimination of undesirable effects
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/05—Holders or supports
    • H03H9/10—Mounting in enclosures
    • H03H9/1007—Mounting in enclosures for bulk acoustic wave [BAW] devices
    • H03H9/1014—Mounting in enclosures for bulk acoustic wave [BAW] devices the enclosure being defined by a frame built on a substrate and a cap, the frame having no mechanical contact with the BAW device
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/93—Batch processes
    • H01L2224/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L2224/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/42—Piezoelectric device making

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  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
CN2011102646202A 2010-09-22 2011-09-05 压电装置的制造方法及压电装置 Pending CN102412801A (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2010212089 2010-09-22
JP2010-212089 2010-09-22
JP2011-053848 2011-03-11
JP2011053848A JP2012090252A (ja) 2010-09-22 2011-03-11 圧電デバイスの製造方法及び圧電デバイス

Publications (1)

Publication Number Publication Date
CN102412801A true CN102412801A (zh) 2012-04-11

Family

ID=45817119

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2011102646202A Pending CN102412801A (zh) 2010-09-22 2011-09-05 压电装置的制造方法及压电装置

Country Status (4)

Country Link
US (1) US20120068579A1 (enExample)
JP (1) JP2012090252A (enExample)
CN (1) CN102412801A (enExample)
TW (1) TW201222908A (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5384406B2 (ja) * 2010-03-30 2014-01-08 日本電波工業株式会社 音叉型水晶振動片の製造方法、水晶デバイス
JP5588784B2 (ja) * 2010-08-20 2014-09-10 日本電波工業株式会社 圧電デバイスの製造方法及び圧電デバイス
JP2013192027A (ja) * 2012-03-14 2013-09-26 Nippon Dempa Kogyo Co Ltd 圧電デバイス
JP2016039516A (ja) * 2014-08-08 2016-03-22 日本電波工業株式会社 圧電デバイス
WO2017141996A1 (ja) * 2016-02-18 2017-08-24 コニカミノルタ株式会社 圧電素子の製造方法及び圧電素子
CN115955209B (zh) * 2022-12-05 2024-03-19 泰晶科技股份有限公司 一种晶体谐振器及其制备方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001267875A (ja) * 2000-03-22 2001-09-28 Seiko Epson Corp 水晶振動子及びその製造方法
CN1828961A (zh) * 2005-02-28 2006-09-06 精工爱普生株式会社 压电振动片和压电振动器
JP2007129325A (ja) * 2005-11-01 2007-05-24 Seiko Instruments Inc 圧電振動子、発振器、電波時計、電子機器、圧電振動子用ウエハ体及び圧電振動子の製造方法
CN101068107A (zh) * 2006-05-01 2007-11-07 爱普生拓优科梦株式会社 压电振子及其制造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58146117A (ja) * 1982-02-24 1983-08-31 Kinseki Kk 圧電振動子の製造方法
EP1223607A4 (en) * 2000-05-25 2003-03-12 Toppan Printing Co Ltd SUBSTRATE FOR TRANSFER MASK, TRANSFER MASK AND MANUFACTURING METHOD THEREOF
JP2002033632A (ja) * 2000-07-14 2002-01-31 Seiko Instruments Inc 水晶振動子の製造方法
JP4777745B2 (ja) * 2005-11-01 2011-09-21 セイコーインスツル株式会社 圧電振動子及びこれを備える発振器、電波時計並びに電子機器
JP2007258917A (ja) * 2006-03-22 2007-10-04 Epson Toyocom Corp 圧電デバイス
JP2008283243A (ja) * 2007-05-08 2008-11-20 Nec Tokin Corp 圧電振動子および圧電振動ジャイロ
JP2009060478A (ja) * 2007-09-03 2009-03-19 Nippon Dempa Kogyo Co Ltd 圧電振動片の製造方法及び音叉型圧電振動片
JP5278044B2 (ja) * 2009-02-27 2013-09-04 株式会社大真空 パッケージ部材および該パッケージ部材の製造方法および該パッケージ部材を用いた圧電振動デバイス

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001267875A (ja) * 2000-03-22 2001-09-28 Seiko Epson Corp 水晶振動子及びその製造方法
CN1828961A (zh) * 2005-02-28 2006-09-06 精工爱普生株式会社 压电振动片和压电振动器
JP2007129325A (ja) * 2005-11-01 2007-05-24 Seiko Instruments Inc 圧電振動子、発振器、電波時計、電子機器、圧電振動子用ウエハ体及び圧電振動子の製造方法
CN101068107A (zh) * 2006-05-01 2007-11-07 爱普生拓优科梦株式会社 压电振子及其制造方法

Also Published As

Publication number Publication date
US20120068579A1 (en) 2012-03-22
TW201222908A (en) 2012-06-01
JP2012090252A (ja) 2012-05-10

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Application publication date: 20120411