CN102315170B - 一种基于湿法腐蚀制备硅纳米线场效应晶体管的方法 - Google Patents
一种基于湿法腐蚀制备硅纳米线场效应晶体管的方法 Download PDFInfo
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- CN102315170B CN102315170B CN 201110138735 CN201110138735A CN102315170B CN 102315170 B CN102315170 B CN 102315170B CN 201110138735 CN201110138735 CN 201110138735 CN 201110138735 A CN201110138735 A CN 201110138735A CN 102315170 B CN102315170 B CN 102315170B
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 74
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 74
- 239000010703 silicon Substances 0.000 title claims abstract description 74
- 239000002070 nanowire Substances 0.000 title claims abstract description 47
- 238000000034 method Methods 0.000 title claims abstract description 33
- 238000001039 wet etching Methods 0.000 title claims abstract description 26
- 230000005669 field effect Effects 0.000 title claims abstract description 25
- 238000004519 manufacturing process Methods 0.000 title abstract description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 59
- 238000005516 engineering process Methods 0.000 claims abstract description 25
- 239000000758 substrate Substances 0.000 claims abstract description 23
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims abstract description 18
- 229910052814 silicon oxide Inorganic materials 0.000 claims abstract description 15
- 238000000609 electron-beam lithography Methods 0.000 claims abstract description 12
- 238000000151 deposition Methods 0.000 claims abstract description 11
- 238000005530 etching Methods 0.000 claims abstract description 10
- 238000000137 annealing Methods 0.000 claims abstract description 6
- 239000002210 silicon-based material Substances 0.000 claims abstract description 5
- 239000000377 silicon dioxide Substances 0.000 claims description 21
- 238000002360 preparation method Methods 0.000 claims description 19
- 229920005591 polysilicon Polymers 0.000 claims description 15
- 230000003647 oxidation Effects 0.000 claims description 14
- 238000007254 oxidation reaction Methods 0.000 claims description 14
- 230000008021 deposition Effects 0.000 claims description 8
- 150000002500 ions Chemical class 0.000 claims description 7
- 230000015572 biosynthetic process Effects 0.000 claims description 6
- 238000010894 electron beam technology Methods 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 5
- 230000012010 growth Effects 0.000 claims description 5
- 238000002347 injection Methods 0.000 claims description 5
- 239000007924 injection Substances 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 5
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 5
- 239000000243 solution Substances 0.000 claims description 4
- 238000012546 transfer Methods 0.000 claims description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- 239000012528 membrane Substances 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 238000000206 photolithography Methods 0.000 claims description 2
- 238000005229 chemical vapour deposition Methods 0.000 claims 2
- 239000003292 glue Substances 0.000 claims 1
- 238000001259 photo etching Methods 0.000 claims 1
- 230000000452 restraining effect Effects 0.000 abstract description 2
- 239000010409 thin film Substances 0.000 abstract 3
- 238000005468 ion implantation Methods 0.000 abstract 2
- 230000000694 effects Effects 0.000 description 7
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 238000001312 dry etching Methods 0.000 description 4
- 238000010276 construction Methods 0.000 description 2
- 238000002513 implantation Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 230000003071 parasitic effect Effects 0.000 description 2
- 238000005036 potential barrier Methods 0.000 description 2
- 238000010189 synthetic method Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 1
- 241000216843 Ursus arctos horribilis Species 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
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- 238000013461 design Methods 0.000 description 1
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- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
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Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66742—Thin film unipolar transistors
- H01L29/66772—Monocristalline silicon transistors on insulating substrates, e.g. quartz substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
- H01L29/42312—Gate electrodes for field effect devices
- H01L29/42316—Gate electrodes for field effect devices for field-effect transistors
- H01L29/4232—Gate electrodes for field effect devices for field-effect transistors with insulated gate
- H01L29/42384—Gate electrodes for field effect devices for field-effect transistors with insulated gate for thin film field effect transistors, e.g. characterised by the thickness or the shape of the insulator or the dimensions, the shape or the lay-out of the conductor
- H01L29/42392—Gate electrodes for field effect devices for field-effect transistors with insulated gate for thin film field effect transistors, e.g. characterised by the thickness or the shape of the insulator or the dimensions, the shape or the lay-out of the conductor fully surrounding the channel, e.g. gate-all-around
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78696—Thin film transistors, i.e. transistors with a channel being at least partly a thin film characterised by the structure of the channel, e.g. multichannel, transverse or longitudinal shape, length or width, doping structure, or the overlap or alignment between the channel and the gate, the source or the drain, or the contacting structure of the channel
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Thin Film Transistor (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Abstract
Description
Claims (4)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 201110138735 CN102315170B (zh) | 2011-05-26 | 2011-05-26 | 一种基于湿法腐蚀制备硅纳米线场效应晶体管的方法 |
PCT/CN2011/082447 WO2012159424A1 (zh) | 2011-05-26 | 2011-11-18 | 一种基于湿法腐蚀制备硅纳米线场效应晶体管的方法 |
DE112011104045T DE112011104045T5 (de) | 2011-05-26 | 2011-11-18 | Auf Nassätzen beruhendes Verfahren zur Herstellung von Silizium-Nanodraht-Feldeffekttransistoren |
US13/511,123 US9034702B2 (en) | 2011-05-26 | 2011-11-18 | Method for fabricating silicon nanowire field effect transistor based on wet etching |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 201110138735 CN102315170B (zh) | 2011-05-26 | 2011-05-26 | 一种基于湿法腐蚀制备硅纳米线场效应晶体管的方法 |
Publications (2)
Publication Number | Publication Date |
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CN102315170A CN102315170A (zh) | 2012-01-11 |
CN102315170B true CN102315170B (zh) | 2013-07-31 |
Family
ID=45428191
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN 201110138735 Active CN102315170B (zh) | 2011-05-26 | 2011-05-26 | 一种基于湿法腐蚀制备硅纳米线场效应晶体管的方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US9034702B2 (zh) |
CN (1) | CN102315170B (zh) |
DE (1) | DE112011104045T5 (zh) |
WO (1) | WO2012159424A1 (zh) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2968776B1 (fr) * | 2010-12-13 | 2012-12-28 | Commissariat Energie Atomique | Procédé pour réaliser un guide optique a fente sur silicium |
CN103258738B (zh) * | 2012-02-20 | 2016-02-17 | 中芯国际集成电路制造(上海)有限公司 | 超晶格纳米线场效应晶体管及其形成方法 |
US8575009B2 (en) * | 2012-03-08 | 2013-11-05 | International Business Machines Corporation | Two-step hydrogen annealing process for creating uniform non-planar semiconductor devices at aggressive pitch |
CN102623321B (zh) * | 2012-03-31 | 2015-01-28 | 上海华力微电子有限公司 | 基于体硅的纵向堆叠式后栅型SiNWFET制备方法 |
CN102623347B (zh) * | 2012-03-31 | 2014-10-22 | 上海华力微电子有限公司 | 基于体硅的三维阵列式SiNWFET制备方法 |
CN103378148B (zh) * | 2012-04-13 | 2016-02-03 | 中芯国际集成电路制造(上海)有限公司 | 半导体器件及其制造方法 |
CN103377928B (zh) * | 2012-04-17 | 2015-12-16 | 中芯国际集成电路制造(上海)有限公司 | 半导体结构的形成方法、晶体管的形成方法 |
CN103779182B (zh) * | 2012-10-25 | 2016-08-24 | 中芯国际集成电路制造(上海)有限公司 | 纳米线的制造方法 |
CN103824759B (zh) * | 2014-03-17 | 2016-07-06 | 北京大学 | 一种制备多层超细硅线条的方法 |
CN105185823A (zh) * | 2015-08-11 | 2015-12-23 | 中国科学院半导体研究所 | 一种围栅无结纳米线晶体管的制备方法 |
CN106531630B (zh) * | 2015-09-09 | 2022-02-01 | 联华电子股份有限公司 | 半导体制作工艺、平面场效晶体管及鳍状场效晶体管 |
US10236362B2 (en) | 2016-06-30 | 2019-03-19 | International Business Machines Corporation | Nanowire FET including nanowire channel spacers |
CN106555207B (zh) * | 2016-11-16 | 2018-09-18 | 武汉理工大学 | 场效应电催化产氢器件的制备方法 |
CN107039242B (zh) * | 2017-03-10 | 2019-12-31 | 武汉拓晶光电科技有限公司 | 一种核壳异质结构锗硅纳米线及其可控制备方法和应用 |
CN111380929B (zh) * | 2018-12-27 | 2023-01-06 | 有研工程技术研究院有限公司 | 一种基于FinFET制造工艺的硅纳米线细胞传感器 |
CN111435649B (zh) * | 2019-01-11 | 2023-12-01 | 中国科学院上海微系统与信息技术研究所 | 基于图形化soi衬底的半导体纳米线结构及其制备方法 |
CN114620675B (zh) * | 2022-03-18 | 2024-06-04 | 北京航空航天大学 | 一种多维度图案化硅基纳米草制备方法及其应用 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101295677A (zh) * | 2007-04-27 | 2008-10-29 | 北京大学 | 一种体硅纳米线晶体管器件的制备方法 |
CN101999162A (zh) * | 2007-12-14 | 2011-03-30 | 纳米系统公司 | 形成衬底元件的方法 |
Family Cites Families (7)
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JP3355083B2 (ja) * | 1996-03-13 | 2002-12-09 | シャープ株式会社 | 半導体装置の製造方法 |
US6855606B2 (en) * | 2003-02-20 | 2005-02-15 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor nano-rod devices |
US20050048409A1 (en) * | 2003-08-29 | 2005-03-03 | Elqaq Deirdre H. | Method of making an optical device in silicon |
US7452778B2 (en) | 2004-06-10 | 2008-11-18 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor nano-wire devices and methods of fabrication |
KR100594327B1 (ko) * | 2005-03-24 | 2006-06-30 | 삼성전자주식회사 | 라운드 형태의 단면을 가지는 나노와이어를 구비한 반도체소자 및 그 제조 방법 |
KR100757328B1 (ko) | 2006-10-04 | 2007-09-11 | 삼성전자주식회사 | 단전자 트랜지스터 및 그 제조 방법 |
US20080128760A1 (en) | 2006-12-04 | 2008-06-05 | Electronics And Telecommunications Research Institute | Schottky barrier nanowire field effect transistor and method for fabricating the same |
-
2011
- 2011-05-26 CN CN 201110138735 patent/CN102315170B/zh active Active
- 2011-11-18 US US13/511,123 patent/US9034702B2/en not_active Expired - Fee Related
- 2011-11-18 DE DE112011104045T patent/DE112011104045T5/de not_active Withdrawn
- 2011-11-18 WO PCT/CN2011/082447 patent/WO2012159424A1/zh active Application Filing
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101295677A (zh) * | 2007-04-27 | 2008-10-29 | 北京大学 | 一种体硅纳米线晶体管器件的制备方法 |
CN101999162A (zh) * | 2007-12-14 | 2011-03-30 | 纳米系统公司 | 形成衬底元件的方法 |
Also Published As
Publication number | Publication date |
---|---|
US9034702B2 (en) | 2015-05-19 |
CN102315170A (zh) | 2012-01-11 |
WO2012159424A1 (zh) | 2012-11-29 |
US20120302027A1 (en) | 2012-11-29 |
DE112011104045T5 (de) | 2013-09-12 |
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