CN102164854B - 生产具有可控宽粒径分布和最小粒径的硅石溶胶的方法 - Google Patents

生产具有可控宽粒径分布和最小粒径的硅石溶胶的方法 Download PDF

Info

Publication number
CN102164854B
CN102164854B CN2009801377248A CN200980137724A CN102164854B CN 102164854 B CN102164854 B CN 102164854B CN 2009801377248 A CN2009801377248 A CN 2009801377248A CN 200980137724 A CN200980137724 A CN 200980137724A CN 102164854 B CN102164854 B CN 102164854B
Authority
CN
China
Prior art keywords
particle size
reactor
component
colloidal silica
size distribution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN2009801377248A
Other languages
English (en)
Chinese (zh)
Other versions
CN102164854A (zh
Inventor
丹尼斯·L·麦克唐纳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ChampionX LLC
Original Assignee
Ondeo Nalco Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ondeo Nalco Co filed Critical Ondeo Nalco Co
Publication of CN102164854A publication Critical patent/CN102164854A/zh
Application granted granted Critical
Publication of CN102164854B publication Critical patent/CN102164854B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/141—Preparation of hydrosols or aqueous dispersions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Colloid Chemistry (AREA)
CN2009801377248A 2008-09-24 2009-09-24 生产具有可控宽粒径分布和最小粒径的硅石溶胶的方法 Active CN102164854B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/237,047 US8052788B2 (en) 2005-08-10 2008-09-24 Method of producing silica sols with controllable broad size distribution and minimum particle size
US12/237,047 2008-09-24
PCT/US2009/058216 WO2010036797A1 (en) 2008-09-24 2009-09-24 Method of producing silica sols with controllable broad size distribution and minimum particle size

Publications (2)

Publication Number Publication Date
CN102164854A CN102164854A (zh) 2011-08-24
CN102164854B true CN102164854B (zh) 2013-11-20

Family

ID=41382418

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2009801377248A Active CN102164854B (zh) 2008-09-24 2009-09-24 生产具有可控宽粒径分布和最小粒径的硅石溶胶的方法

Country Status (8)

Country Link
US (1) US8052788B2 (enExample)
EP (1) EP2346784A1 (enExample)
JP (1) JP2012503586A (enExample)
KR (1) KR20110069025A (enExample)
CN (1) CN102164854B (enExample)
MY (1) MY158518A (enExample)
TW (1) TWI491563B (enExample)
WO (1) WO2010036797A1 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050234136A1 (en) 2004-04-19 2005-10-20 Holland Brian T Colloidal compositions and methods of preparing same
US20140057532A1 (en) * 2012-08-24 2014-02-27 Ecolab Usa Inc. Methods of polishing sapphire surfaces
WO2014136039A1 (en) * 2013-03-05 2014-09-12 Jawaharlal Nehru Centre For Advanced Scientific Research Composition, substrates and methods thereof
EP2969391B1 (en) 2013-03-15 2018-04-25 Ecolab USA Inc. Methods of polishing sapphire surfaces
CN103311106B (zh) * 2013-05-14 2015-12-23 中国科学院半导体研究所 低表面粗糙度的硅基砷化镓材料的制备方法
JP6179418B2 (ja) * 2014-02-13 2017-08-16 三菱ケミカル株式会社 窒化物半導体基板の製造方法
US9302228B2 (en) 2014-02-28 2016-04-05 Pall Corporation Charged porous polymeric membrane with high void volume
US9446355B2 (en) 2014-02-28 2016-09-20 Pall Corporation Porous polymeric membrane with high void volume
US9309126B2 (en) 2014-02-28 2016-04-12 Pall Corporation Rapidly dissolvable nanoparticles
US9737860B2 (en) 2014-02-28 2017-08-22 Pall Corporation Hollow fiber membrane having hexagonal voids
US9610548B2 (en) 2014-02-28 2017-04-04 Pall Corporation Composite porous polymeric membrane with high void volume
US9764292B2 (en) 2014-02-28 2017-09-19 Pall Corporation Porous polymeric membrane with high void volume
US9776142B2 (en) 2014-02-28 2017-10-03 Pall Corporation Porous polymeric membrane with high void volume
US9561473B2 (en) 2014-02-28 2017-02-07 Pall Corporation Charged hollow fiber membrane having hexagonal voids
CN106044786B (zh) * 2016-06-01 2019-05-07 上海新安纳电子科技有限公司 多分散大粒径硅溶胶及其制备方法
US10377014B2 (en) 2017-02-28 2019-08-13 Ecolab Usa Inc. Increased wetting of colloidal silica as a polishing slurry
JP7003849B2 (ja) * 2018-06-14 2022-01-21 日本製鉄株式会社 キャスタブル耐火物の製造方法
KR102670426B1 (ko) 2020-01-15 2024-06-03 오씨아이 주식회사 흄드 실리카로부터 단일 응집체를 분리 및 포집하는 방법 및 단일 응집체의 형상 분류 방법
WO2024237073A1 (ja) * 2023-05-12 2024-11-21 日揮触媒化成株式会社 研磨用シリカ微粒子分散液、研磨用組成物、および研磨用シリカ微粒子分散液の製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5964693A (en) * 1992-06-03 1999-10-12 Bayer Aktiengesellschaft Continuous preparation of silica sols which contain large particles
US20070034116A1 (en) * 2005-08-10 2007-02-15 Mac Donald Dennis L Silica sols with controlled minimum particle size and preparation thereof

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT649599A (enExample) * 1960-04-13
US3650977A (en) * 1969-03-27 1972-03-21 Philadelphia Quartz Co Method of preparing silica sol and product thereof
US3789009A (en) * 1971-07-15 1974-01-29 Du Pont Process for the preparation of large particle silica sols
US5221497A (en) * 1988-03-16 1993-06-22 Nissan Chemical Industries, Ltd. Elongated-shaped silica sol and method for preparing the same
US4996084A (en) 1989-06-30 1991-02-26 Pfizer Hospital Products Group, Inc. Colloidal silica water based slurry system for investment casting shell backup coats
US5100581A (en) * 1990-02-22 1992-03-31 Nissan Chemical Industries Ltd. Method of preparing high-purity aqueous silica sol
JPH05170424A (ja) * 1991-12-24 1993-07-09 Nittetsu Mining Co Ltd シリカゾルの製造方法
DE4216119C2 (de) 1992-05-15 1995-08-10 Bayer Ag Verfahren zur Herstellung und Konzentrierung von Kieselsolen
CO5070714A1 (es) 1998-03-06 2001-08-28 Nalco Chemical Co Proceso para la preparacion de silice coloidal estable
JP4113288B2 (ja) 1998-09-04 2008-07-09 スピードファム株式会社 研磨用組成物およびそれを用いたシリコンウェーハの加工方法
US6906109B2 (en) 2000-09-01 2005-06-14 Chemical Products Corp. Method for controling uniformity of colloidal silica particle size
US6747065B1 (en) * 2000-09-01 2004-06-08 Chemical Products Corporation System and method for producing high purity colloidal silica and potassium hydroxide
JP2002275274A (ja) 2001-03-19 2002-09-25 Dokai Chemical Industries Co Ltd 鱗片状シリカ粒子を含有する高い保存安定性を有する硬化性組成物及びその製造方法
US6918820B2 (en) 2003-04-11 2005-07-19 Eastman Kodak Company Polishing compositions comprising polymeric cores having inorganic surface particles and method of use
US6939211B2 (en) 2003-10-09 2005-09-06 Micron Technology, Inc. Planarizing solutions including abrasive elements, and methods for manufacturing and using such planarizing solutions
US20050234136A1 (en) 2004-04-19 2005-10-20 Holland Brian T Colloidal compositions and methods of preparing same
US20060283095A1 (en) 2005-06-15 2006-12-21 Planar Solutions, Llc Fumed silica to colloidal silica conversion process
JP5137521B2 (ja) * 2006-10-12 2013-02-06 日揮触媒化成株式会社 金平糖状シリカ系ゾルおよびその製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5964693A (en) * 1992-06-03 1999-10-12 Bayer Aktiengesellschaft Continuous preparation of silica sols which contain large particles
US20070034116A1 (en) * 2005-08-10 2007-02-15 Mac Donald Dennis L Silica sols with controlled minimum particle size and preparation thereof

Also Published As

Publication number Publication date
KR20110069025A (ko) 2011-06-22
MY158518A (en) 2016-10-14
TWI491563B (zh) 2015-07-11
TW201012752A (en) 2010-04-01
EP2346784A1 (en) 2011-07-27
CN102164854A (zh) 2011-08-24
US20090018219A1 (en) 2009-01-15
WO2010036797A1 (en) 2010-04-01
US8052788B2 (en) 2011-11-08
JP2012503586A (ja) 2012-02-09

Similar Documents

Publication Publication Date Title
CN102164854B (zh) 生产具有可控宽粒径分布和最小粒径的硅石溶胶的方法
CN102173426B (zh) 一种均匀度高的二氧化硅溶胶的制备方法
CN102101674B (zh) 一种制备硅溶胶的方法
CN103232044A (zh) 一种纳米级mcm-49分子筛的合成方法
CN1942398B (zh) 引晶勃姆石微粒材料及其形成方法
CN114956101A (zh) 一种高分散微米尺寸二氧化硅微球及其制备方法
JP4493320B2 (ja) シリカゾルの製造方法およびシリカゾル
CN1830777A (zh) 硅溶胶的制造方法及制得的硅溶胶
CN107487774B (zh) 一种层状硅酸盐改性硅溶胶的方法
CN111302347B (zh) 一种高纯大粒径硅溶胶的制备方法
US20070034116A1 (en) Silica sols with controlled minimum particle size and preparation thereof
CN110615449B (zh) 一种双注射反应控制制备普鲁士蓝纳米颗粒的方法
Tsai et al. The study of formation process of colloidal silica
JP3330984B2 (ja) 単分散球状シリカの製造方法
CN110980745B (zh) 一种硅溶胶及制备方法
CN101959590B (zh) 制备胶态金属氧化物颗粒的方法
JPH0455125B2 (enExample)
CN119612522B (zh) 半导体器件的制造方法、硅溶胶及其制备方法和研磨用组合物
CN105883822A (zh) 利用多级淤浆反应器制备大粒径硅溶胶的方法
JP7828925B2 (ja) 水酸化マグネシウムの粒子を製造する方法、水酸化マグネシウムの粒子の粒径を大きくする方法、水酸化マグネシウムの粒子、及び樹脂組成物
CN111717923B (zh) 一种超高纯均匀型硅溶胶的制备方法
US20100284884A1 (en) Method for making colloidal silica particles
JPH0456775B2 (enExample)
KR20230060953A (ko) 실리카 제조방법
JPH0524823A (ja) アルミナゾル及びその製造法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant