CN101979160B - 一种清洗碳化硅晶片表面污染物的方法 - Google Patents
一种清洗碳化硅晶片表面污染物的方法 Download PDFInfo
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- CN101979160B CN101979160B CN201010179864.6A CN201010179864A CN101979160B CN 101979160 B CN101979160 B CN 101979160B CN 201010179864 A CN201010179864 A CN 201010179864A CN 101979160 B CN101979160 B CN 101979160B
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Families Citing this family (16)
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CN102311840A (zh) * | 2011-08-31 | 2012-01-11 | 燕山大学 | 一种碳化硅衍生碳润滑添加剂 |
CN102825027B (zh) * | 2012-08-27 | 2014-04-16 | 西北工业大学 | 一种用于溶胶凝胶法提拉制膜的衬底清洗方法 |
CN102915912A (zh) * | 2012-09-24 | 2013-02-06 | 中国电子科技集团公司第五十五研究所 | 一种在碳化硅表面形成牺牲氧化层的方法 |
CN104014505A (zh) * | 2014-05-28 | 2014-09-03 | 中国科学院长春光学精密机械与物理研究所 | 一种去除烧结碳化硅反射镜的铝掺杂硅改性膜的方法 |
CN104810255A (zh) * | 2015-02-28 | 2015-07-29 | 株洲南车时代电气股份有限公司 | 一种用于碳化硅器件表面碳保护膜去除的方法 |
CN105344647B (zh) * | 2015-10-10 | 2017-09-19 | 南京信息工程大学 | 一种冰核采样膜片的清洗方法 |
CN105499228B (zh) * | 2015-11-25 | 2017-08-25 | 中锗科技有限公司 | 一种太阳能锗片包装用晶圆盒的清洗方法 |
CN108022827B (zh) * | 2016-11-02 | 2020-05-05 | 株洲中车时代电气股份有限公司 | 一种碳化硅金属污染处理方法 |
CN109108032A (zh) * | 2018-06-25 | 2019-01-01 | 上海华力微电子有限公司 | 一种非生产性晶圆清洗方法 |
CN111092011B (zh) * | 2018-10-23 | 2022-09-16 | 山东浪潮华光光电子股份有限公司 | 一种改善led芯片表面污染的处理方法 |
CN109848122A (zh) * | 2018-12-29 | 2019-06-07 | 晶能光电(江西)有限公司 | SiC盘表面AlN膜层的清洗方法 |
CN110729177B (zh) * | 2019-10-17 | 2022-06-24 | 深圳第三代半导体研究院 | 一种有效去除晶圆正反面颗粒团聚的清洗方法 |
CN113764259B (zh) * | 2020-09-18 | 2024-05-07 | 英迪那米(徐州)半导体科技有限公司 | 一种半导体芯片的清洗方法 |
CN114559712B (zh) * | 2022-02-15 | 2023-04-18 | 江苏诺德新材料股份有限公司 | 一种耐高温低损耗的覆铜板及其制备工艺 |
CN114653666A (zh) * | 2022-03-17 | 2022-06-24 | 安徽光智科技有限公司 | 砷化铟多晶的清洗方法 |
CN116786559A (zh) * | 2023-08-14 | 2023-09-22 | 湖北微流控科技有限公司 | 一种总氮水质检测微流控芯片石英检测片的回收方法 |
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US6375752B1 (en) * | 1999-06-29 | 2002-04-23 | Bridgestone Corporation | Method of wet-cleaning sintered silicon carbide |
CN1791497A (zh) * | 2003-04-23 | 2006-06-21 | 辛特弗公司 | 用于清洗碳化硅颗粒的方法 |
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JPH0517229A (ja) * | 1991-07-01 | 1993-01-26 | Shin Etsu Chem Co Ltd | 炭化珪素質部材の製造方法 |
JPH0677310A (ja) * | 1992-08-27 | 1994-03-18 | Shin Etsu Chem Co Ltd | 炭化珪素質部材の洗浄方法 |
JP4188473B2 (ja) * | 1998-12-08 | 2008-11-26 | 株式会社ブリヂストン | 炭化ケイ素焼結体の湿式洗浄方法 |
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Patent Citations (2)
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US6375752B1 (en) * | 1999-06-29 | 2002-04-23 | Bridgestone Corporation | Method of wet-cleaning sintered silicon carbide |
CN1791497A (zh) * | 2003-04-23 | 2006-06-21 | 辛特弗公司 | 用于清洗碳化硅颗粒的方法 |
Non-Patent Citations (3)
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JP特开2000-169233A 2000.06.20 |
JP特开平5-17229A 1993.01.26 |
JP特开平6-77310A 1994.03.18 |
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Address after: 100190, room 1, building 66, No. 2005 East Zhongguancun Road, Beijing, Haidian District Patentee after: TANKEBLUE SEMICONDUCTOR Co.,Ltd. Patentee after: SUZHOU TANKEBLUE SEMICONDUCTOR Co.,Ltd. Patentee after: INSTITUTE OF PHYSICS, CHINESE ACADEMY OF SCIENCES Address before: 100190, room 1, building 66, No. 2005 East Zhongguancun Road, Beijing, Haidian District Patentee before: TANKEBLUE SEMICONDUCTOR Co.,Ltd. Patentee before: SUZHOU TANKEBLUE SEMICONDUCTOR Co.,Ltd. Patentee before: INSTITUTE OF PHYSICS, CHINESE ACADEMY OF SCIENCES |
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Effective date of registration: 20200106 Address after: Room 301, Building 9, Tianrong Street, Daxing Biomedical Industry Base, Zhongguancun Science and Technology Park, Daxing District, Beijing 102600 Patentee after: TANKEBLUE SEMICONDUCTOR Co.,Ltd. Address before: 100190, room 1, building 66, No. 2005 East Zhongguancun Road, Beijing, Haidian District Co-patentee before: SUZHOU TANKEBLUE SEMICONDUCTOR Co.,Ltd. Patentee before: TANKEBLUE SEMICONDUCTOR Co.,Ltd. Co-patentee before: INSTITUTE OF PHYSICS, CHINESE ACADEMY OF SCIENCES |
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Application publication date: 20110223 Assignee: Shenzhen Reinvested Tianke Semiconductor Co.,Ltd. Assignor: TANKEBLUE SEMICONDUCTOR Co.,Ltd. Contract record no.: X2023990000683 Denomination of invention: A Method for Cleaning Surface Contaminants on Silicon Carbide Wafers Granted publication date: 20140514 License type: Common License Record date: 20230725 |