CN101952047A - 施用可涂覆型材料的方法 - Google Patents
施用可涂覆型材料的方法 Download PDFInfo
- Publication number
- CN101952047A CN101952047A CN2008801269713A CN200880126971A CN101952047A CN 101952047 A CN101952047 A CN 101952047A CN 2008801269713 A CN2008801269713 A CN 2008801269713A CN 200880126971 A CN200880126971 A CN 200880126971A CN 101952047 A CN101952047 A CN 101952047A
- Authority
- CN
- China
- Prior art keywords
- application type
- coating equipment
- die head
- low
- type material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims abstract description 105
- 238000000034 method Methods 0.000 title claims abstract description 56
- 239000011248 coating agent Substances 0.000 claims abstract description 129
- 238000000576 coating method Methods 0.000 claims abstract description 129
- 239000000758 substrate Substances 0.000 claims abstract description 36
- 239000007888 film coating Substances 0.000 claims description 20
- 238000009501 film coating Methods 0.000 claims description 20
- -1 phospho Chemical class 0.000 claims description 16
- 150000003009 phosphonic acids Chemical class 0.000 claims description 12
- 229920002313 fluoropolymer Polymers 0.000 claims description 11
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims description 10
- 239000004811 fluoropolymer Substances 0.000 claims description 10
- 239000002253 acid Substances 0.000 claims description 6
- 229910000077 silane Inorganic materials 0.000 claims description 6
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 5
- 229910052698 phosphorus Inorganic materials 0.000 claims description 5
- 239000011574 phosphorus Substances 0.000 claims description 5
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims description 5
- 239000012530 fluid Substances 0.000 claims description 4
- 230000008676 import Effects 0.000 claims 4
- 239000007788 liquid Substances 0.000 description 12
- 239000000203 mixture Substances 0.000 description 8
- 125000004432 carbon atom Chemical group C* 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 239000002585 base Substances 0.000 description 6
- 229910052752 metalloid Inorganic materials 0.000 description 5
- 150000002738 metalloids Chemical class 0.000 description 5
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 238000000227 grinding Methods 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 238000009736 wetting Methods 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 239000002033 PVDF binder Substances 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 3
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000002356 single layer Substances 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 238000011144 upstream manufacturing Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 125000001118 alkylidene group Chemical group 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000004411 aluminium Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000000429 assembly Methods 0.000 description 2
- 230000000712 assembly Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 229930192474 thiophene Natural products 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 238000005654 Michaelis-Arbuzov synthesis reaction Methods 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- VYRDHRYMAZWQJH-UHFFFAOYSA-N [P].P Chemical compound [P].P VYRDHRYMAZWQJH-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 150000001347 alkyl bromides Chemical class 0.000 description 1
- 150000001348 alkyl chlorides Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical group FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 125000005003 perfluorobutyl group Chemical class FC(F)(F)C(F)(F)C(F)(F)C(F)(F)* 0.000 description 1
- 125000005005 perfluorohexyl group Chemical group FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)* 0.000 description 1
- 125000001476 phosphono group Chemical group [H]OP(*)(=O)O[H] 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000037452 priming Effects 0.000 description 1
- 230000008521 reorganization Effects 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 239000002094 self assembled monolayer Substances 0.000 description 1
- 239000013545 self-assembled monolayer Substances 0.000 description 1
- 238000001338 self-assembly Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 125000001425 triazolyl group Chemical group 0.000 description 1
- 238000013024 troubleshooting Methods 0.000 description 1
- 230000007306 turnover Effects 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/36—Successively applying liquids or other fluent materials, e.g. without intermediate treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/007—Slide-hopper coaters, i.e. apparatus in which the liquid or other fluent material flows freely on an inclined surface before contacting the work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
- B05C9/06—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying two different liquids or other fluent materials, or the same liquid or other fluent material twice, to the same side of the work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US1806207P | 2007-12-31 | 2007-12-31 | |
| US61/018,062 | 2007-12-31 | ||
| PCT/US2008/085829 WO2009088604A1 (en) | 2007-12-31 | 2008-12-08 | Method for applying a coatable material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101952047A true CN101952047A (zh) | 2011-01-19 |
Family
ID=40853362
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2008801269713A Pending CN101952047A (zh) | 2007-12-31 | 2008-12-08 | 施用可涂覆型材料的方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20100285227A1 (enExample) |
| EP (1) | EP2240285A4 (enExample) |
| JP (1) | JP2011507700A (enExample) |
| KR (1) | KR20100101635A (enExample) |
| CN (1) | CN101952047A (enExample) |
| BR (1) | BRPI0819558A2 (enExample) |
| WO (1) | WO2009088604A1 (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102794988A (zh) * | 2011-05-25 | 2012-11-28 | 松下电器产业株式会社 | 涂敷装置 |
| CN103874731A (zh) * | 2011-09-07 | 2014-06-18 | 微量化学公司 | 用于在低表面能基底上制造浮雕图案的环氧制剂和方法 |
| CN105531037A (zh) * | 2013-09-30 | 2016-04-27 | 三菱化学株式会社 | 各向异性色素膜的制造方法、通过该制造方法所制造的各向异性色素膜、包含该各向异性色素膜的光学元件以及包含该光学元件的液晶元件 |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8158264B2 (en) * | 2006-10-20 | 2012-04-17 | 3M Innovative Properties Company | Method for easy-to-clean substrates and articles therefrom |
| US11635688B2 (en) | 2012-03-08 | 2023-04-25 | Kayaku Advanced Materials, Inc. | Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates |
| JP2013220385A (ja) * | 2012-04-17 | 2013-10-28 | Fujifilm Corp | 塗布装置及びそれを用いた塗膜付きフィルムの製造方法 |
| WO2016099952A1 (en) | 2014-12-18 | 2016-06-23 | 3M Innovative Properties Company | Fluorinated polymers comprising phosphonic moieties |
| CN114450095B (zh) * | 2019-09-30 | 2024-03-26 | 富士胶片株式会社 | 模头 |
| JP7273242B2 (ja) * | 2020-03-05 | 2023-05-12 | 富士フイルム株式会社 | ダイヘッド |
| CN115175772B (zh) * | 2020-03-11 | 2024-06-18 | 富士胶片株式会社 | 模头 |
| KR20220094459A (ko) * | 2020-12-29 | 2022-07-06 | 주식회사 엘지에너지솔루션 | 듀얼 슬롯 다이 코터 |
| CN218945476U (zh) * | 2022-11-29 | 2023-05-02 | 宁德时代新能源科技股份有限公司 | 涂布模头和涂布设备 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6214111B1 (en) * | 1997-01-21 | 2001-04-10 | 3M Innovative Properties Company | Die edge cleaning system |
| EP0954766B1 (en) * | 1997-01-21 | 2003-04-16 | Eastman Kodak Company | Apparatus and method for minimizing the drying of a coating fluid on a slide coater surface |
| CN1827237A (zh) * | 2005-02-28 | 2006-09-06 | 财团法人工业技术研究院 | 基材表面的疏水结构及其制法 |
| CN1909974A (zh) * | 2004-01-20 | 2007-02-07 | 3M创新有限公司 | 用于控制涂覆宽度的方法和装置 |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05261330A (ja) * | 1992-01-22 | 1993-10-12 | Konica Corp | 塗布装置及び塗布方法 |
| US5759274A (en) * | 1994-04-29 | 1998-06-02 | Minnesota Mining And Manufacturing Company | Die coating apparatus with surface covering |
| JPH07309847A (ja) * | 1994-05-20 | 1995-11-28 | Japan Energy Corp | 新規ベンゾトリアゾールフッ素メタクリルイソシアネート誘導体及びその製造方法並びにそれを用いる表面処理剤 |
| WO1996039276A1 (en) * | 1995-06-05 | 1996-12-12 | Minnesota Mining And Manufacturing Company | Coater die edge finishing method |
| JPH091028A (ja) * | 1995-06-12 | 1997-01-07 | Konica Corp | 塗布装置 |
| US5998549A (en) * | 1996-05-31 | 1999-12-07 | 3M Innovative Properties Company | Durable, low surface energy compounds and articles, apparatuses, and methods for using the same |
| US5837324A (en) * | 1996-05-31 | 1998-11-17 | Minnesota Mining And Manufacturing Company | Profiled edge guide |
| US5843530A (en) * | 1997-01-21 | 1998-12-01 | Minnesota Mining And Manufacturing Company | Method for minimizing waste when coating a fluid with a slide coater |
| US5861195A (en) * | 1997-01-21 | 1999-01-19 | Minnesota Mining And Manufacturing Company | Method for coating a plurality of fluid layers onto a substrate |
| US7268179B2 (en) * | 1997-02-03 | 2007-09-11 | Cytonix Corporation | Hydrophobic coating compositions, articles coated with said compositions, and processes for manufacturing same |
| JPH10307381A (ja) * | 1997-03-04 | 1998-11-17 | Fuji Photo Film Co Ltd | 液体噴射装置及び液体噴射装置の製造方法 |
| US5906862A (en) * | 1997-04-02 | 1999-05-25 | Minnesota Mining And Manufacturing Company | Apparatus and method for drying a coating on a substrate |
| US6166138A (en) * | 1997-09-09 | 2000-12-26 | E. I. Du Pont De Nemours And Company | Fluoropolymer composition |
| US5980992A (en) * | 1997-10-03 | 1999-11-09 | 3M Innovative Properties Company | Fluorochemical treatments to provide low-energy surfaces |
| AU2230599A (en) * | 1998-01-27 | 1999-08-09 | Minnesota Mining And Manufacturing Company | Fluorochemical benzotriazoles |
| US6632872B1 (en) * | 2000-09-19 | 2003-10-14 | 3M Innovative Properties Company | Adhesive compositions including self-assembling molecules, adhesives, articles, and methods |
| JP2002248399A (ja) * | 2001-02-27 | 2002-09-03 | Toray Ind Inc | 塗布部材の製造方法及び装置 |
| JP2003266001A (ja) * | 2002-03-15 | 2003-09-24 | Seiko Epson Corp | 成膜装置、デバイスの製造方法及び電子機器 |
| US6824882B2 (en) * | 2002-05-31 | 2004-11-30 | 3M Innovative Properties Company | Fluorinated phosphonic acids |
| US7083826B2 (en) * | 2003-05-16 | 2006-08-01 | 3M Innovative Properties Company | Coating die and method for use |
| US7189479B2 (en) * | 2003-08-21 | 2007-03-13 | 3M Innovative Properties Company | Phototool coating |
| JP4718463B2 (ja) * | 2003-08-21 | 2011-07-06 | スリーエム イノベイティブ プロパティズ カンパニー | パーフルオロポリエーテルアミド連結ホスホネート、ホスフェートおよびそれらの誘導体 |
| US7148360B2 (en) * | 2004-01-30 | 2006-12-12 | 3M Innovative Properties Company | Perfluoropolyether benzotriazole compounds |
-
2008
- 2008-12-08 US US12/811,105 patent/US20100285227A1/en not_active Abandoned
- 2008-12-08 BR BRPI0819558 patent/BRPI0819558A2/pt not_active IP Right Cessation
- 2008-12-08 CN CN2008801269713A patent/CN101952047A/zh active Pending
- 2008-12-08 JP JP2010541470A patent/JP2011507700A/ja active Pending
- 2008-12-08 EP EP08870264A patent/EP2240285A4/en not_active Withdrawn
- 2008-12-08 WO PCT/US2008/085829 patent/WO2009088604A1/en not_active Ceased
- 2008-12-08 KR KR1020107015009A patent/KR20100101635A/ko not_active Ceased
Patent Citations (4)
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| US6214111B1 (en) * | 1997-01-21 | 2001-04-10 | 3M Innovative Properties Company | Die edge cleaning system |
| EP0954766B1 (en) * | 1997-01-21 | 2003-04-16 | Eastman Kodak Company | Apparatus and method for minimizing the drying of a coating fluid on a slide coater surface |
| CN1909974A (zh) * | 2004-01-20 | 2007-02-07 | 3M创新有限公司 | 用于控制涂覆宽度的方法和装置 |
| CN1827237A (zh) * | 2005-02-28 | 2006-09-06 | 财团法人工业技术研究院 | 基材表面的疏水结构及其制法 |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102794988A (zh) * | 2011-05-25 | 2012-11-28 | 松下电器产业株式会社 | 涂敷装置 |
| CN103874731A (zh) * | 2011-09-07 | 2014-06-18 | 微量化学公司 | 用于在低表面能基底上制造浮雕图案的环氧制剂和方法 |
| CN103874731B (zh) * | 2011-09-07 | 2017-02-15 | 微量化学公司 | 用于在低表面能基底上制造浮雕图案的环氧制剂和方法 |
| CN105531037A (zh) * | 2013-09-30 | 2016-04-27 | 三菱化学株式会社 | 各向异性色素膜的制造方法、通过该制造方法所制造的各向异性色素膜、包含该各向异性色素膜的光学元件以及包含该光学元件的液晶元件 |
Also Published As
| Publication number | Publication date |
|---|---|
| BRPI0819558A2 (pt) | 2015-05-05 |
| US20100285227A1 (en) | 2010-11-11 |
| JP2011507700A (ja) | 2011-03-10 |
| EP2240285A4 (en) | 2012-08-01 |
| WO2009088604A1 (en) | 2009-07-16 |
| KR20100101635A (ko) | 2010-09-17 |
| EP2240285A1 (en) | 2010-10-20 |
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