CN101801586B - 用于产生具有线形射束横截面的激光射束的方法和装置 - Google Patents

用于产生具有线形射束横截面的激光射束的方法和装置 Download PDF

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Publication number
CN101801586B
CN101801586B CN2008801070697A CN200880107069A CN101801586B CN 101801586 B CN101801586 B CN 101801586B CN 2008801070697 A CN2008801070697 A CN 2008801070697A CN 200880107069 A CN200880107069 A CN 200880107069A CN 101801586 B CN101801586 B CN 101801586B
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China
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laser beam
imaging
axis
aperture
minor axis
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Expired - Fee Related
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CN2008801070697A
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English (en)
Chinese (zh)
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CN101801586A (zh
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M·斯托普卡
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Coherent GmbH
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Coherent GmbH
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • G02B27/0966—Cylindrical lenses

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Laser Beam Processing (AREA)
  • Lasers (AREA)
  • Microscoopes, Condenser (AREA)
  • Recrystallisation Techniques (AREA)
CN2008801070697A 2007-09-17 2008-07-18 用于产生具有线形射束横截面的激光射束的方法和装置 Expired - Fee Related CN101801586B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102007044298A DE102007044298B3 (de) 2007-09-17 2007-09-17 Verfahren und Anordnung zum Erzeugen eines Laserstrahls mit einem linienhaften Strahlquerschnitt
DE102007044298.1 2007-09-17
PCT/DE2008/001181 WO2009036716A1 (de) 2007-09-17 2008-07-18 Verfahren und anordnung zum erzeugen eines laserstrahls mit einem linienhaften strahlquerschnitt

Publications (2)

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CN101801586A CN101801586A (zh) 2010-08-11
CN101801586B true CN101801586B (zh) 2013-12-11

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CN2008801070697A Expired - Fee Related CN101801586B (zh) 2007-09-17 2008-07-18 用于产生具有线形射束横截面的激光射束的方法和装置

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JP (1) JP5548127B2 (enExample)
KR (1) KR101529344B1 (enExample)
CN (1) CN101801586B (enExample)
DE (1) DE102007044298B3 (enExample)
WO (1) WO2009036716A1 (enExample)

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DE102010027196B4 (de) * 2010-07-07 2012-03-08 Carl Zeiss Laser Optics Gmbh Optisches System zum Erzeugen eines Linienfokus sowie Vorrichtung zum Behandeln eines Substrats mit einem solchen optischen System
DE102010045620B4 (de) * 2010-09-17 2016-09-01 Limo Patentverwaltung Gmbh & Co. Kg Vorrichtung zur Erzeugung einer linienförmigen Intensitätsverteilung in einer Arbeitsebene
KR101257827B1 (ko) * 2012-09-20 2013-04-29 (주)프로비전 라인형 레이저 빔 형성 장치 및 이를 이용한 터치 패널 제조 방법
DE102012111098B4 (de) * 2012-11-19 2016-03-03 Scanlab Ag Divergenzänderungsvorrichtung
DE102014213775B4 (de) * 2014-07-15 2018-02-15 Innolas Solutions Gmbh Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen, kristallinen Substraten, insbesondere von Halbleitersubstraten
DE102015002537B4 (de) * 2015-02-27 2017-11-09 Innovavent Gmbh Optisches System und optisches Verfahren zum Homogenisieren der Intensität von Laserstrahlung sowie Anlage zur Bearbeitung von Dünnfilmschichten
KR102440115B1 (ko) 2015-11-13 2022-09-05 삼성디스플레이 주식회사 엑시머 레이저 어닐링 방법
PL3491450T3 (pl) * 2016-07-27 2024-06-24 Trumpf Laser Gmbh Naświetlanie linią laserową
DE102017115964B4 (de) 2017-07-14 2020-04-02 LIMO GmbH Vorrichtung zur Erzeugung einer linienförmigen Intensitätsverteilung einer Laserstrahlung
US11366331B2 (en) * 2017-12-05 2022-06-21 Panasonic Intellectual Property Management Co., Ltd. Beam converting optical system and light source device
DE102018216940A1 (de) 2018-10-02 2020-04-02 3D-Micromac Ag Laserbearbeitungssystem
DE102019102511B4 (de) * 2019-01-31 2020-08-20 Trumpf Laser- Und Systemtechnik Gmbh Lasersystem
DE102019206976B3 (de) * 2019-05-14 2020-11-12 Trumpf Laser Gmbh Optisches System zum Erzeugen zweier Laserfokuslinien sowie Verfahren zum gleichzeitigen Bearbeiten zweier einander gegenüberliegender, paralleler Werkstückseiten eines Werkstücks
DE102019118676B4 (de) * 2019-07-10 2021-10-21 Innovavent Gmbh Optisches System zur Homogenisierung der Intensität von Lichtstrahlung und Anlage zur Bearbeitung einer Halbleitermaterialschicht
DE102020126267A1 (de) * 2020-10-07 2022-04-07 Trumpf Laser- Und Systemtechnik Gmbh Vorrichtung zum Erzeugen einer Laserlinie auf einer Arbeitsebene
DE102020130651B3 (de) 2020-11-19 2022-05-05 Trumpf Laser- Und Systemtechnik Gmbh Vorrichtung zum Erzeugen einer definierten Laserbeleuchtung auf einer Arbeitsebene

Citations (5)

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Publication number Priority date Publication date Assignee Title
CN1201154A (zh) * 1997-05-29 1998-12-09 中国科学院上海光学精密机械研究所 超精细结构的光学测量系统
US6215595B1 (en) * 1996-02-06 2001-04-10 Semiconductor Energy Laboratory Co., Ltd Apparatus and method for laser radiation
CN1374562A (zh) * 2001-02-22 2002-10-16 石川岛播磨重工业株式会社 照明光学系统及配备该光学系统的激光器处理装置
US6583937B1 (en) * 1998-11-30 2003-06-24 Carl-Zeiss Stiftung Illuminating system of a microlithographic projection exposure arrangement
JP2005079470A (ja) * 2003-09-02 2005-03-24 Nikon Corp 照明光学系の調整方法、露光装置及び方法、並びにデバイス製造方法

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Publication number Priority date Publication date Assignee Title
US7009140B2 (en) * 2001-04-18 2006-03-07 Cymer, Inc. Laser thin film poly-silicon annealing optical system
JPWO2004017392A1 (ja) * 2002-08-13 2005-12-08 株式会社東芝 レーザ照射方法
WO2005085935A1 (de) * 2004-03-06 2005-09-15 Hentze-Lissotschenko Gmbh & Co. Kg Vorrichtung zur homogenisierung von licht sowie anordnung zur beleuchtung oder fokussierung mit einer derartigen vorrichtung
KR20070090246A (ko) * 2004-12-22 2007-09-05 칼 짜이스 레이저 옵틱스 게엠베하 선형 빔을 형성하기 위한 광 조명 시스템
WO2007049525A1 (en) * 2005-10-26 2007-05-03 Semiconductor Energy Laboratory Co., Ltd. Laser irradiation apparatus and manufacturing method of semiconductor device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6215595B1 (en) * 1996-02-06 2001-04-10 Semiconductor Energy Laboratory Co., Ltd Apparatus and method for laser radiation
CN1201154A (zh) * 1997-05-29 1998-12-09 中国科学院上海光学精密机械研究所 超精细结构的光学测量系统
US6583937B1 (en) * 1998-11-30 2003-06-24 Carl-Zeiss Stiftung Illuminating system of a microlithographic projection exposure arrangement
CN1374562A (zh) * 2001-02-22 2002-10-16 石川岛播磨重工业株式会社 照明光学系统及配备该光学系统的激光器处理装置
JP2005079470A (ja) * 2003-09-02 2005-03-24 Nikon Corp 照明光学系の調整方法、露光装置及び方法、並びにデバイス製造方法

Also Published As

Publication number Publication date
KR101529344B1 (ko) 2015-06-16
WO2009036716A1 (de) 2009-03-26
JP2011501872A (ja) 2011-01-13
DE102007044298B3 (de) 2009-02-26
KR20100065326A (ko) 2010-06-16
CN101801586A (zh) 2010-08-11
JP5548127B2 (ja) 2014-07-16

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