CN101589483B - 含阳离子敏感层的复合制品 - Google Patents
含阳离子敏感层的复合制品 Download PDFInfo
- Publication number
- CN101589483B CN101589483B CN2007800504054A CN200780050405A CN101589483B CN 101589483 B CN101589483 B CN 101589483B CN 2007800504054 A CN2007800504054 A CN 2007800504054A CN 200780050405 A CN200780050405 A CN 200780050405A CN 101589483 B CN101589483 B CN 101589483B
- Authority
- CN
- China
- Prior art keywords
- composite article
- silicone
- sio
- substrate
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
- C03C17/30—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/42—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating of an organic material and at least one non-metal coating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
- H10P14/6326—Deposition processes
- H10P14/6342—Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/66—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials
- H10P14/668—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials
- H10P14/6681—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials the precursor containing a compound comprising Si
- H10P14/6684—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials the precursor containing a compound comprising Si the compound comprising silicon and oxygen
- H10P14/6686—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials the precursor containing a compound comprising Si the compound comprising silicon and oxygen the compound being a molecule comprising at least one silicon-oxygen bond and the compound having hydrogen or an organic group attached to the silicon or oxygen, e.g. a siloxane
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/69—Inorganic materials
- H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
- H10P14/6921—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon
- H10P14/6922—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon the material containing Si, O and at least one of H, N, C, F or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
- C03C2217/465—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase having a specific shape
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
- C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
- C03C2217/475—Inorganic materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/266—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension of base or substrate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
- Y10T428/31609—Particulate metal or metal compound-containing
- Y10T428/31612—As silicone, silane or siloxane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Laminated Bodies (AREA)
- Electroluminescent Light Sources (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US87095106P | 2006-12-20 | 2006-12-20 | |
| US60/870,951 | 2006-12-20 | ||
| PCT/US2007/026030 WO2008079275A1 (en) | 2006-12-20 | 2007-12-19 | Composite article including a cation-sensitive layer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101589483A CN101589483A (zh) | 2009-11-25 |
| CN101589483B true CN101589483B (zh) | 2012-06-06 |
Family
ID=39427573
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2007800504054A Expired - Fee Related CN101589483B (zh) | 2006-12-20 | 2007-12-19 | 含阳离子敏感层的复合制品 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20100051920A1 (https=) |
| EP (1) | EP2095446A1 (https=) |
| JP (1) | JP2010514139A (https=) |
| KR (1) | KR20090092324A (https=) |
| CN (1) | CN101589483B (https=) |
| WO (1) | WO2008079275A1 (https=) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2114670A1 (en) * | 2007-02-22 | 2009-11-11 | Dow Corning Corporation | Composite article having excellent fire resistance |
| CN101646559A (zh) * | 2007-02-22 | 2010-02-10 | 陶氏康宁公司 | 具有优良的耐火性和抗冲击性的复合制品及其制备方法 |
| US20100093242A1 (en) * | 2007-02-22 | 2010-04-15 | Dimitris Elias Katsoulis | Composite Article Having Excellent Fire Resistance |
| JP2012074512A (ja) * | 2010-09-28 | 2012-04-12 | Sekisui Chem Co Ltd | 光半導体装置用ダイボンド材及びそれを用いた光半導体装置 |
| JP6081774B2 (ja) * | 2012-10-30 | 2017-02-15 | 東レ・ダウコーニング株式会社 | 硬化性シリコーン組成物、その硬化物、および光半導体装置 |
| CN111718234A (zh) | 2014-04-16 | 2020-09-29 | 科慕埃弗西有限公司 | 将氯氟丙烷和氯氟丙烯转化成更需要的氟丙烷和氟丙烯 |
| JP6375226B2 (ja) * | 2014-12-26 | 2018-08-15 | 富士フイルム株式会社 | 硬化性組成物、転写フィルム、画像表示装置の前面板、前面板一体型センサー、画像表示装置および画像表示装置の前面板の製造方法 |
| US20180033614A1 (en) * | 2016-07-27 | 2018-02-01 | Versum Materials Us, Llc | Compositions and Methods Using Same for Carbon Doped Silicon Containing Films |
| JP6754318B2 (ja) * | 2017-05-10 | 2020-09-09 | 信越化学工業株式会社 | ダイボンディング用シリコーン樹脂組成物、ダイボンド材及び光半導体装置 |
| JP7003075B2 (ja) * | 2019-02-15 | 2022-01-20 | 信越化学工業株式会社 | ウェハーレベル光半導体デバイス用樹脂組成物及び該組成物を用いたウェハーレベル光半導体デバイス |
| TW202242913A (zh) * | 2021-04-23 | 2022-11-01 | 美商Ddp 特殊電子材料 Us 9有限責任公司 | 導電複合膜 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0507727A2 (en) * | 1991-03-06 | 1992-10-07 | Ciba-Geigy Ag | Glass coating with improved adhesion and weather resistance |
| CN1380876A (zh) * | 2000-04-18 | 2002-11-20 | 舱壁玻璃公司 | 强化玻璃体 |
| CN1778002A (zh) * | 2003-03-04 | 2006-05-24 | 陶氏康宁公司 | 有机发光二极管 |
| WO2006088645A1 (en) * | 2005-02-16 | 2006-08-24 | Dow Corning Corporation | Reinforced silicone resin film and method of preparing same |
Family Cites Families (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL131800C (https=) * | 1965-05-17 | |||
| US4087585A (en) * | 1977-05-23 | 1978-05-02 | Dow Corning Corporation | Self-adhering silicone compositions and preparations thereof |
| US4260780A (en) * | 1979-11-27 | 1981-04-07 | The United States Of America As Represented By The Secretary Of The Air Force | Phenylmethylpolysilane polymers and process for their preparation |
| US4276424A (en) * | 1979-12-03 | 1981-06-30 | Petrarch Systems | Methods for the production of organic polysilanes |
| US4314956A (en) * | 1980-07-23 | 1982-02-09 | Dow Corning Corporation | High yield silicon carbide pre-ceramic polymers |
| US4324901A (en) * | 1981-04-29 | 1982-04-13 | Wisconsin Alumni Research Foundation | Soluble polysilastyrene and method for preparation |
| US4530879A (en) * | 1983-03-04 | 1985-07-23 | Minnesota Mining And Manufacturing Company | Radiation activated addition reaction |
| US4510094A (en) * | 1983-12-06 | 1985-04-09 | Minnesota Mining And Manufacturing Company | Platinum complex |
| FR2591587A1 (fr) * | 1985-12-17 | 1987-06-19 | Saint Gobain Vitrage | Film organo-mineral depose sur un substrat en verre eventuellement revetu d'une ou plusieurs couches metalliques minces. |
| US4766176A (en) * | 1987-07-20 | 1988-08-23 | Dow Corning Corporation | Storage stable heat curable organosiloxane compositions containing microencapsulated platinum-containing catalysts |
| JPH0214244A (ja) * | 1988-06-30 | 1990-01-18 | Toray Dow Corning Silicone Co Ltd | 加熱硬化性オルガノポリシロキサン組成物 |
| JP3029680B2 (ja) * | 1991-01-29 | 2000-04-04 | 東レ・ダウコーニング・シリコーン株式会社 | オルガノペンタシロキサンおよびその製造方法 |
| JPH06329914A (ja) * | 1993-05-18 | 1994-11-29 | Toray Dow Corning Silicone Co Ltd | 室温硬化性オルガノポリシロキサン組成物およびその製造方法 |
| US5469961A (en) * | 1994-08-15 | 1995-11-28 | Chang; Chun Y. | Combined minidisc box |
| JP3957760B2 (ja) * | 1996-07-10 | 2007-08-15 | 統寶光電股▲ふん▼有限公司 | 有機発光素子用のカプセル封入材としてのシロキサンおよびシロキサン誘導体 |
| JP3996969B2 (ja) * | 1997-01-21 | 2007-10-24 | 東レ・ダウコーニング株式会社 | シリコーンエラストマーコーティングシート状物およびその製造方法 |
| EP1376224B1 (en) * | 1997-08-08 | 2010-10-13 | Dai Nippon Printing Co., Ltd. | Structure for pattern formation, method for pattern formation, and application thereof |
| WO2000036665A1 (en) * | 1998-12-16 | 2000-06-22 | Battelle Memorial Institute | Environmental barrier material for organic light emitting device and method of making |
| JP2000302487A (ja) * | 1999-04-23 | 2000-10-31 | Nippon Sheet Glass Co Ltd | ガラス基板およびその製造方法 |
| US6501219B1 (en) * | 1999-07-29 | 2002-12-31 | General Electric Company | Shatter-resistant incandescent lamp, silicone coating composition, and method |
| US6524598B2 (en) * | 2000-07-10 | 2003-02-25 | The Procter & Gamble Company | Cosmetic compositions |
| US6534581B1 (en) * | 2000-07-20 | 2003-03-18 | Dow Corning Corporation | Silicone composition and electrically conductive silicone adhesive formed therefrom |
| US6963168B2 (en) * | 2000-08-23 | 2005-11-08 | Idemitsu Kosan Co., Ltd. | Organic EL display device having certain relationships among constituent element refractive indices |
| US6664137B2 (en) * | 2001-03-29 | 2003-12-16 | Universal Display Corporation | Methods and structures for reducing lateral diffusion through cooperative barrier layers |
| JP2003163078A (ja) * | 2001-11-28 | 2003-06-06 | Hitachi Ltd | 表示装置 |
| JP3906985B2 (ja) * | 2002-05-24 | 2007-04-18 | 三井化学株式会社 | 金属拡散バリア膜、金属拡散バリア膜の形成方法および半導体装置 |
| WO2003104329A1 (ja) * | 2002-06-05 | 2003-12-18 | ダウコーニングアジア株式会社 | ポリシロキサンフィルム及びその製造方法 |
| JP2004361692A (ja) * | 2003-04-07 | 2004-12-24 | Dow Corning Asia Ltd | 光伝送部材用硬化性オルガノポリシロキサン樹脂組成物、オルガノポリシロキサン樹脂硬化物からなる光伝送部材および光伝送部材の製造方法 |
| JP4163567B2 (ja) * | 2003-07-09 | 2008-10-08 | 株式会社 日立ディスプレイズ | 発光型表示装置 |
| US20070122631A1 (en) * | 2003-11-13 | 2007-05-31 | Akiji Higuchi | Flexible substrate and coating liquid |
| US20050237462A1 (en) * | 2004-04-26 | 2005-10-27 | Eastman Kodak Company | Alignment layer for liquid crystal display |
| JP5297589B2 (ja) * | 2004-05-14 | 2013-09-25 | 東レ・ダウコーニング株式会社 | オルガノポリシロキサン樹脂硬化物からなる独立フィルム、その製造方法および積層フィルム |
| EP1856206B1 (en) * | 2005-02-16 | 2011-10-12 | Dow Corning Corporation | Reinforced silicone resin film and method of preparing same |
| JP4636242B2 (ja) * | 2005-04-21 | 2011-02-23 | 信越化学工業株式会社 | 光半導体素子封止材及び光半導体素子 |
| US20090130463A1 (en) * | 2005-10-05 | 2009-05-21 | John Dean Albaugh | Coated Substrates and Methods for their Preparation |
| KR101447272B1 (ko) * | 2010-12-31 | 2014-10-08 | 제일모직주식회사 | 폴리카보네이트 수지 조성물 및 이를 포함하는 성형품 |
| KR101997921B1 (ko) * | 2011-09-05 | 2019-07-08 | 엘지전자 주식회사 | 태양전지 모듈 |
-
2007
- 2007-12-19 JP JP2009542916A patent/JP2010514139A/ja not_active Ceased
- 2007-12-19 KR KR1020097014761A patent/KR20090092324A/ko not_active Ceased
- 2007-12-19 CN CN2007800504054A patent/CN101589483B/zh not_active Expired - Fee Related
- 2007-12-19 WO PCT/US2007/026030 patent/WO2008079275A1/en not_active Ceased
- 2007-12-19 EP EP07867877A patent/EP2095446A1/en not_active Withdrawn
- 2007-12-19 US US12/520,307 patent/US20100051920A1/en not_active Abandoned
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0507727A2 (en) * | 1991-03-06 | 1992-10-07 | Ciba-Geigy Ag | Glass coating with improved adhesion and weather resistance |
| CN1380876A (zh) * | 2000-04-18 | 2002-11-20 | 舱壁玻璃公司 | 强化玻璃体 |
| CN1778002A (zh) * | 2003-03-04 | 2006-05-24 | 陶氏康宁公司 | 有机发光二极管 |
| WO2006088645A1 (en) * | 2005-02-16 | 2006-08-24 | Dow Corning Corporation | Reinforced silicone resin film and method of preparing same |
Also Published As
| Publication number | Publication date |
|---|---|
| US20100051920A1 (en) | 2010-03-04 |
| KR20090092324A (ko) | 2009-08-31 |
| WO2008079275A1 (en) | 2008-07-03 |
| JP2010514139A (ja) | 2010-04-30 |
| CN101589483A (zh) | 2009-11-25 |
| EP2095446A1 (en) | 2009-09-02 |
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Legal Events
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