CN101479662B - 印刷形式前体和由该前体制备压模的方法 - Google Patents

印刷形式前体和由该前体制备压模的方法 Download PDF

Info

Publication number
CN101479662B
CN101479662B CN2007800243849A CN200780024384A CN101479662B CN 101479662 B CN101479662 B CN 101479662B CN 2007800243849 A CN2007800243849 A CN 2007800243849A CN 200780024384 A CN200780024384 A CN 200780024384A CN 101479662 B CN101479662 B CN 101479662B
Authority
CN
China
Prior art keywords
layer
printing form
stamper
form precursor
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2007800243849A
Other languages
English (en)
Chinese (zh)
Other versions
CN101479662A (zh
Inventor
M·彼得路希萨米加
G·B·布朗西特
R·布洛姆奎斯特
李喜现
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of CN101479662A publication Critical patent/CN101479662A/zh
Application granted granted Critical
Publication of CN101479662B publication Critical patent/CN101479662B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0888—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using transparant moulds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C99/00—Subject matter not provided for in other groups of this subclass
    • B81C99/0075—Manufacture of substrate-free structures
    • B81C99/009—Manufacturing the stamps or the moulds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0833—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using actinic light
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Toxicology (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Oral & Maxillofacial Surgery (AREA)
  • Thermal Sciences (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Materials For Photolithography (AREA)
  • Polyethers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
CN2007800243849A 2006-06-30 2007-06-22 印刷形式前体和由该前体制备压模的方法 Expired - Fee Related CN101479662B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/479,779 US20080000373A1 (en) 2006-06-30 2006-06-30 Printing form precursor and process for preparing a stamp from the precursor
US11/479,779 2006-06-30
PCT/US2007/014641 WO2008005208A2 (en) 2006-06-30 2007-06-22 Printing form precursor and process for preparing a stamp from the precursor

Publications (2)

Publication Number Publication Date
CN101479662A CN101479662A (zh) 2009-07-08
CN101479662B true CN101479662B (zh) 2012-07-04

Family

ID=38649921

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2007800243849A Expired - Fee Related CN101479662B (zh) 2006-06-30 2007-06-22 印刷形式前体和由该前体制备压模的方法

Country Status (6)

Country Link
US (2) US20080000373A1 (enExample)
EP (1) EP2038705A2 (enExample)
JP (1) JP5033874B2 (enExample)
KR (1) KR20090034361A (enExample)
CN (1) CN101479662B (enExample)
WO (1) WO2008005208A2 (enExample)

Families Citing this family (82)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7307118B2 (en) 2004-11-24 2007-12-11 Molecular Imprints, Inc. Composition to reduce adhesion between a conformable region and a mold
US20050160934A1 (en) * 2004-01-23 2005-07-28 Molecular Imprints, Inc. Materials and methods for imprint lithography
US20060108710A1 (en) * 2004-11-24 2006-05-25 Molecular Imprints, Inc. Method to reduce adhesion between a conformable region and a mold
US20060081557A1 (en) 2004-10-18 2006-04-20 Molecular Imprints, Inc. Low-k dielectric functional imprinting materials
US20090304992A1 (en) * 2005-08-08 2009-12-10 Desimone Joseph M Micro and Nano-Structure Metrology
US8142703B2 (en) 2005-10-05 2012-03-27 Molecular Imprints, Inc. Imprint lithography method
KR101358255B1 (ko) * 2006-06-27 2014-02-05 엘지디스플레이 주식회사 광경화 타입 소수성 몰드 및 그 제조방법
KR100832298B1 (ko) * 2006-06-29 2008-05-26 엘지디스플레이 주식회사 패턴 형성용 레지스트와 이를 이용한 소프트몰드 제조방법
US20080083484A1 (en) * 2006-09-28 2008-04-10 Graciela Beatriz Blanchet Method to form a pattern of functional material on a substrate
US8128393B2 (en) 2006-12-04 2012-03-06 Liquidia Technologies, Inc. Methods and materials for fabricating laminate nanomolds and nanoparticles therefrom
US8005402B2 (en) * 2007-01-10 2011-08-23 Kabushiki Kaisha Toshiba Charging device, image forming apparatus and charging method
US20080233280A1 (en) * 2007-03-22 2008-09-25 Graciela Beatriz Blanchet Method to form a pattern of functional material on a substrate by treating a surface of a stamp
US7763484B2 (en) * 2007-06-13 2010-07-27 Sumitomo Electric Industries, Ltd. Method to form an optical grating and to form a distributed feedback laser diode with the optical grating
KR101610180B1 (ko) * 2007-11-21 2016-04-07 캐논 나노테크놀로지즈 인코퍼레이티드 나노-임프린트 리소그래피용 다공성 주형 및 임프린팅 스택
US8877298B2 (en) * 2008-05-27 2014-11-04 The Hong Kong University Of Science And Technology Printing using a structure coated with ultraviolet radiation responsive material
US7927976B2 (en) * 2008-07-23 2011-04-19 Semprius, Inc. Reinforced composite stamp for dry transfer printing of semiconductor elements
JP2010049745A (ja) * 2008-08-21 2010-03-04 Fuji Electric Device Technology Co Ltd ナノインプリント用モールドおよびこれを用いて作製された磁気記録媒体
US20100072671A1 (en) * 2008-09-25 2010-03-25 Molecular Imprints, Inc. Nano-imprint lithography template fabrication and treatment
CN101683763A (zh) * 2008-09-25 2010-03-31 鸿富锦精密工业（深圳）有限公司 制造具有微结构导光板的模仁及制造方法
US8470188B2 (en) * 2008-10-02 2013-06-25 Molecular Imprints, Inc. Nano-imprint lithography templates
US20100104852A1 (en) * 2008-10-23 2010-04-29 Molecular Imprints, Inc. Fabrication of High-Throughput Nano-Imprint Lithography Templates
US20100109201A1 (en) * 2008-10-31 2010-05-06 Molecular Imprints, Inc. Nano-Imprint Lithography Template with Ordered Pore Structure
CN101477304B (zh) * 2008-11-04 2011-08-17 南京大学 在复杂形状表面复制高分辨率纳米结构的压印方法
US20100109195A1 (en) * 2008-11-05 2010-05-06 Molecular Imprints, Inc. Release agent partition control in imprint lithography
EP2351068B1 (en) * 2008-11-19 2020-11-04 X Display Company Technology Limited Printing semiconductor elements by shear-assisted elastomeric stamp transfer
EP2199855B1 (en) * 2008-12-19 2016-07-20 Obducat Methods and processes for modifying polymer material surface interactions
EP2199854B1 (en) * 2008-12-19 2015-12-16 Obducat AB Hybrid polymer mold for nano-imprinting and method for making the same
US9238309B2 (en) 2009-02-17 2016-01-19 The Board Of Trustees Of The University Of Illinois Methods for fabricating microstructures
EP2221664A1 (en) * 2009-02-19 2010-08-25 Solvay Solexis S.p.A. Nanolithography process
US20100258163A1 (en) * 2009-04-14 2010-10-14 Honeywell International Inc. Thin-film photovoltaics
JP4617387B2 (ja) * 2009-06-17 2011-01-26 キヤノン株式会社 微細構造体の製造方法
US8261660B2 (en) * 2009-07-22 2012-09-11 Semprius, Inc. Vacuum coupled tool apparatus for dry transfer printing semiconductor elements
US8899957B2 (en) * 2009-09-25 2014-12-02 HGST Netherlands B.V. System, method and apparatus for manufacturing magnetic recording media
DE102009050568A1 (de) * 2009-10-23 2011-04-28 Schott Ag Einrichtung mit verminderten Reibeigenschaften
US8616873B2 (en) * 2010-01-26 2013-12-31 Molecular Imprints, Inc. Micro-conformal templates for nanoimprint lithography
US20110189329A1 (en) * 2010-01-29 2011-08-04 Molecular Imprints, Inc. Ultra-Compliant Nanoimprint Lithography Template
US20110203656A1 (en) * 2010-02-24 2011-08-25 Iowa State University Research Foundation, Inc. Nanoscale High-Aspect-Ratio Metallic Structure and Method of Manufacturing Same
WO2011112714A2 (en) * 2010-03-09 2011-09-15 The Regents Of The University Of Michigan Methods of making organic photovoltaic cells having improved heterojunction morphology
JP2011222647A (ja) * 2010-04-07 2011-11-04 Fujifilm Corp パターン形成方法及びパターン基板製造方法
KR102050884B1 (ko) * 2010-07-02 2019-12-02 디아이씨 가부시끼가이샤 불소계 계면 활성제, 그것을 사용한 코팅 조성물 및 레지스트 조성물
US8541162B2 (en) 2010-09-01 2013-09-24 E I Du Pont De Nemours And Company High resolution, solvent resistant, thin elastomeric printing plates
US8563220B2 (en) * 2010-09-01 2013-10-22 E I Du Pont De Nemours And Company High resolution, solvent resistant, thin elastomeric printing plates
DE102010052033A1 (de) * 2010-11-23 2012-05-24 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Verfahren zur Herstellung von metallischen Strukturen
US8651849B2 (en) * 2011-01-10 2014-02-18 Xerox Corporation Digitally prepared stamp masters and methods of making the same
TW201228807A (en) * 2011-01-13 2012-07-16 Moser Baer India Ltd Method of imprinting a texture on a rigid substrate using flexible stamp
JP5750562B2 (ja) * 2011-03-29 2015-07-22 国立研究開発法人産業技術総合研究所 三層積層型エラストマースランプ及びそれを用いた有機薄膜形成方法
CN102183875B (zh) * 2011-05-09 2012-10-03 苏州光舵微纳科技有限公司 滚轮式紫外线软压印方法
WO2013063202A1 (en) * 2011-10-25 2013-05-02 Unipixel Displays, Inc. Optimization of uv curing
CN104247063B (zh) * 2012-04-27 2017-08-29 琳得科株式会社 热电转换材料及其制造方法
US10126648B2 (en) 2012-05-25 2018-11-13 Micro Resist Technology Gesellschaft Für Chemische Materialien Spezieller Protoresistsysteme Gmbh Composition suitable for use as a release-optimized material for nanoimprint processes and uses thereof
CN102981360A (zh) * 2012-11-29 2013-03-20 清华大学 一种微纳米散斑制作方法
CN105324412B (zh) * 2013-06-27 2017-07-18 3M创新有限公司 含氟聚醚‑聚硅氧烷弹性体组合物和成型制品
CN104672177B (zh) * 2013-12-03 2018-05-15 浙江化工院科技有限公司 一种六氟环氧丙烷连续生产工艺
EP3201004A4 (en) * 2014-09-30 2018-05-30 3M Innovative Properties Company Electrically conductive patterns with wide line-width and methods for producing same
JP2016126240A (ja) * 2015-01-07 2016-07-11 住友ゴム工業株式会社 印刷用樹脂原版の製造方法およびフレキソ印刷版
CN104943156A (zh) * 2015-05-14 2015-09-30 安徽凯盛众普新光源有限公司 一种导光板的生产工艺
US10488753B2 (en) 2015-09-08 2019-11-26 Canon Kabushiki Kaisha Substrate pretreatment and etch uniformity in nanoimprint lithography
US20170066208A1 (en) 2015-09-08 2017-03-09 Canon Kabushiki Kaisha Substrate pretreatment for reducing fill time in nanoimprint lithography
CN107175939B (zh) * 2016-03-09 2020-02-28 华邦电子股份有限公司 用于印刷线路制程的印章及其制造方法以及印刷线路制程
US10620539B2 (en) 2016-03-31 2020-04-14 Canon Kabushiki Kaisha Curing substrate pretreatment compositions in nanoimprint lithography
US10095106B2 (en) 2016-03-31 2018-10-09 Canon Kabushiki Kaisha Removing substrate pretreatment compositions in nanoimprint lithography
US10134588B2 (en) 2016-03-31 2018-11-20 Canon Kabushiki Kaisha Imprint resist and substrate pretreatment for reducing fill time in nanoimprint lithography
US10509313B2 (en) 2016-06-28 2019-12-17 Canon Kabushiki Kaisha Imprint resist with fluorinated photoinitiator and substrate pretreatment for reducing fill time in nanoimprint lithography
US10317793B2 (en) 2017-03-03 2019-06-11 Canon Kabushiki Kaisha Substrate pretreatment compositions for nanoimprint lithography
KR20180115396A (ko) 2017-04-12 2018-10-23 삼성디스플레이 주식회사 광경화성 조성물 및 이로부터 제조된 패턴 형성체
AT519751B1 (de) * 2017-05-04 2018-10-15 Profactor Gmbh Verfahren zur Herstellung von Oberflächen mit Affinitätsrezeptoren
US10211072B2 (en) * 2017-06-23 2019-02-19 Applied Materials, Inc. Method of reconstituted substrate formation for advanced packaging applications
CN108580227B (zh) * 2018-04-20 2020-06-09 清华大学 一种超疏水油漆表面的快速制备方法
JP2022500857A (ja) * 2018-09-12 2022-01-04 アプライド マテリアルズ インコーポレイテッドApplied Materials, Incorporated インプリントリソグラフィ用スタンプの製造方法、インプリントリソグラフィ用スタンプ、インプリントローラおよびロールツーロール基板処理装置
US11718580B2 (en) 2019-05-08 2023-08-08 Meta Platforms Technologies, Llc Fluorene derivatized monomers and polymers for volume Bragg gratings
US11780819B2 (en) 2019-11-27 2023-10-10 Meta Platforms Technologies, Llc Aromatic substituted alkane-core monomers and polymers thereof for volume Bragg gratings
US11879024B1 (en) * 2020-07-14 2024-01-23 Meta Platforms Technologies, Llc Soft mold formulations for surface relief grating fabrication with imprinting lithography
US11884977B2 (en) 2021-03-12 2024-01-30 Singular Genomics Systems, Inc. Nanoarrays and methods of use thereof
WO2022192671A1 (en) 2021-03-12 2022-09-15 Singular Genomics Systems, Inc. Nanoarrays and methods of use thereof
CN113204169A (zh) * 2021-04-12 2021-08-03 新沂崚峻光电科技有限公司 一种新型压印膜的制备方法
JP7614924B2 (ja) * 2021-04-20 2025-01-16 東京応化工業株式会社 ナノインプリント用組成物及びパターン形成方法
US11578320B2 (en) 2021-04-27 2023-02-14 Singular Genomics Systems, Inc. High density sequencing and multiplexed priming
WO2023023638A1 (en) 2021-08-20 2023-02-23 Singular Genomics Systems, Inc. Chemical and thermal assisted nucleic acid amplification methods
WO2023034920A2 (en) 2021-09-03 2023-03-09 Singular Genomics Systems, Inc. Amplification oligonucleotides
EP4422792A4 (en) 2021-10-26 2025-12-17 Singular Genomics Systems Inc TARGETED MULTIPLEX AMPLIFICATION OF POLYNUCLEOTIDS
US20250188521A1 (en) 2022-03-10 2025-06-12 Singular Genomics Systems, Inc. Nucleic acid delivery scaffolds
EP4659001A2 (en) 2023-02-01 2025-12-10 Singular Genomics Systems, Inc. Methods and devices for manipulating biological samples

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5274179A (en) * 1993-04-06 1993-12-28 Alliedsignal Inc. Fluorinated photoinitiators and their application in UV curing of fluorinated monomers
EP0791857B1 (en) * 1996-02-26 2000-11-15 Agfa-Gevaert N.V. Imaging element comprising a two-phase layer having a disperse hydrophobic photopolymerisable phase
US6555288B1 (en) * 1999-06-21 2003-04-29 Corning Incorporated Optical devices made from radiation curable fluorinated compositions
US7078445B2 (en) * 2001-02-01 2006-07-18 E. I. Du Pont De Nemours And Company Photosensitive acrylate composition and waveguide device
US7338613B2 (en) * 2001-09-10 2008-03-04 Surface Logix, Inc. System and process for automated microcontact printing
US6656308B2 (en) * 2002-04-22 2003-12-02 International Business Machines Corporation Process of fabricating a precision microcontact printing stamp
JP4344177B2 (ja) * 2002-07-12 2009-10-14 大日本印刷株式会社 体積型ホログラム記録用感光性組成物、体積型ホログラム記録用感光性媒体、及び体積型ホログラム
US6957608B1 (en) * 2002-08-02 2005-10-25 Kovio, Inc. Contact print methods
KR100568581B1 (ko) * 2003-04-14 2006-04-07 주식회사 미뉴타텍 미세패턴 형성 몰드용 조성물 및 이로부터 제작된 몰드
KR101281775B1 (ko) * 2003-12-19 2013-07-15 더 유니버시티 오브 노쓰 캐롤라이나 엣 채플 힐 소프트 또는 임프린트 리소그래피를 이용하여 분리된마이크로- 및 나노- 구조를 제작하는 방법
US20050230882A1 (en) * 2004-04-19 2005-10-20 Molecular Imprints, Inc. Method of forming a deep-featured template employed in imprint lithography
US20060021533A1 (en) * 2004-07-30 2006-02-02 Jeans Albert H Imprint stamp
US7363854B2 (en) * 2004-12-16 2008-04-29 Asml Holding N.V. System and method for patterning both sides of a substrate utilizing imprint lithography

Also Published As

Publication number Publication date
KR20090034361A (ko) 2009-04-07
JP5033874B2 (ja) 2012-09-26
CN101479662A (zh) 2009-07-08
WO2008005208A2 (en) 2008-01-10
US20080000373A1 (en) 2008-01-03
WO2008005208A3 (en) 2008-03-06
JP2009543340A (ja) 2009-12-03
US20090295041A1 (en) 2009-12-03
EP2038705A2 (en) 2009-03-25

Similar Documents

Publication Publication Date Title
CN101479662B (zh) 印刷形式前体和由该前体制备压模的方法
CN101918896B (zh) 用于模板的组合物和用所述组合物制备模板的方法
JP4901467B2 (ja) 有機モールド及びその製造方法
CN101984756B (zh) 纳米压印用固化性树脂组合物
US9205594B2 (en) Method for producing patterned materials
TWI500638B (zh) 奈米壓印用硬化性組成物及硬化物
US20110008577A1 (en) Process for production of fine structure
JP4904742B2 (ja) パターンの形成方法およびパターンを有する物品
JP6010481B2 (ja) フィルム状モールドの製造方法
del Campo et al. Generating micro-and nanopatterns on polymeric materials
TW201100263A (en) Nano-imprint stemplate and mthod for manufacturing the same
JP5813418B2 (ja) 微細パターンの製造方法
CN101923283A (zh) 纳米压印抗蚀剂及采用该纳米压印抗蚀剂的纳米压印方法
CN1743372A (zh) 一种软印刷用紫外光固化材料的制备方法
TWI389931B (zh) 奈米壓印抗蝕劑及採用該奈米壓印抗蝕劑的奈米壓印方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20120704

Termination date: 20140622

EXPY Termination of patent right or utility model