CN101419405B - 具备药液预处理装置的狭缝涂敷装置 - Google Patents
具备药液预处理装置的狭缝涂敷装置 Download PDFInfo
- Publication number
- CN101419405B CN101419405B CN2008102105553A CN200810210555A CN101419405B CN 101419405 B CN101419405 B CN 101419405B CN 2008102105553 A CN2008102105553 A CN 2008102105553A CN 200810210555 A CN200810210555 A CN 200810210555A CN 101419405 B CN101419405 B CN 101419405B
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- CN
- China
- Prior art keywords
- cleaning fluid
- widening roll
- liquid medicine
- felt widening
- felt
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
Abstract
Description
Claims (8)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2007-0106294 | 2007-10-22 | ||
KR1020070106294 | 2007-10-22 | ||
KR1020070106294A KR100877798B1 (ko) | 2007-10-22 | 2007-10-22 | 예비 약액처리수단을 구비한 슬릿코터 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101419405A CN101419405A (zh) | 2009-04-29 |
CN101419405B true CN101419405B (zh) | 2012-04-11 |
Family
ID=40482392
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2008102105553A Active CN101419405B (zh) | 2007-10-22 | 2008-08-27 | 具备药液预处理装置的狭缝涂敷装置 |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR100877798B1 (zh) |
CN (1) | CN101419405B (zh) |
TW (1) | TWI362972B (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5819123B2 (ja) * | 2011-07-12 | 2015-11-18 | 東レ株式会社 | 口金洗浄方法 |
KR101328730B1 (ko) * | 2012-03-28 | 2013-11-11 | 주식회사 디엠에스 | 슬릿코터 |
CN105182689A (zh) * | 2015-10-30 | 2015-12-23 | 京东方科技集团股份有限公司 | 一种涂胶装置及其出胶喷嘴的清洗方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1701860A (zh) * | 2004-05-20 | 2005-11-30 | 东京応化工业株式会社 | 狭缝涂布机的预备排出装置 |
CN1799707A (zh) * | 2004-12-31 | 2006-07-12 | Lg.菲利浦Lcd株式会社 | 具有预涂敷单元的狭缝涂布机以及使用其的涂布方法 |
-
2007
- 2007-10-22 KR KR1020070106294A patent/KR100877798B1/ko active IP Right Grant
-
2008
- 2008-07-29 TW TW097128603A patent/TWI362972B/zh not_active IP Right Cessation
- 2008-08-27 CN CN2008102105553A patent/CN101419405B/zh active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1701860A (zh) * | 2004-05-20 | 2005-11-30 | 东京応化工业株式会社 | 狭缝涂布机的预备排出装置 |
CN1799707A (zh) * | 2004-12-31 | 2006-07-12 | Lg.菲利浦Lcd株式会社 | 具有预涂敷单元的狭缝涂布机以及使用其的涂布方法 |
Non-Patent Citations (2)
Title |
---|
JP特开2005-177707A 2005.07.07 |
JP特开2005-254090A 2005.09.22 |
Also Published As
Publication number | Publication date |
---|---|
KR100877798B1 (ko) | 2009-01-12 |
TWI362972B (en) | 2012-05-01 |
TW200918180A (en) | 2009-05-01 |
CN101419405A (zh) | 2009-04-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: WEIHAI DIANMEI SHIGUANG MECHANICAL AND ELECTRONIC Effective date: 20140306 |
|
TR01 | Transfer of patent right |
Effective date of registration: 20140306 Address after: Gyeonggi Do, South Korea Patentee after: Display Production Service Co., Ltd. Patentee after: Weihai dianmei Shiguang electromechanical Co Ltd Address before: Gyeonggi Do, South Korea Patentee before: Display Production Service Co., Ltd. |
|
TR01 | Transfer of patent right | ||
CP03 | Change of name, title or address |
Address after: 264205 No. 88-1, Bekaert Road, Weihai Economic and Technological Development Zone, Weihai City, Shandong Province Patentee after: WEIHAI DMS OPTICAL ELECTROMECHANICAL Co.,Ltd. Patentee after: DMS Co.,Ltd. Address before: Gyeonggi Do, South Korea Patentee before: DMS Co.,Ltd. Patentee before: WEIHAI DMS OPTICAL ELECTROMECHANICAL Co.,Ltd. |
|
CP03 | Change of name, title or address |