200918180 九、發明說明： 【發明所屬之技術領域】 本發明涉及狹縫塗敷裝置的藥液預處理装置，特別涉 及一種經過結構改良，將預處理裝置中的清洗液喷灑部分 及乾燥部分構成模組，從而用簡單的結構方便去除藥液 之、具有藥液預處理裝置的狹縫塗敷裝置。其中所述清洗 液的喷灑部分及乾燥部分用於向所述起動輥（priming roller)喷灑清洗液並將其乾燥，所述起動輥用於承接由所 述狹縫塗敷裝置的喷頭吐出的藥液。 【先前技術】 平板顯示元件用的基板上的功能性薄膜通常在基板的 製程中透過常規的光刻（photolithography )製程形成預定 圖案。 所述光刻製程則是於基板的薄膜上塗敷預定厚度的感 光液後，對所述感光液（光刻膠）進行曝光、顯影及蝕刻 等一系列步驟，從而對所述基板的薄膜上形成預定的電路 圖案的製程。 在所述光刻製程中，尤其重要的是在塗敷步驟中對基 板上的’專膜形成均勻厚度的感光層。這是由於，如果出現 感光層的厚度比標準值厚或者薄等情況，就會導致不均勻 的钮刻。 作爲如此在基板上塗敷感光液的步驟，已有報導的是 利用旋塗機（spin coater )的旋塗方式和利用狹縫塗敷機 (slitcoater)的非旋轉塗敷方式（Spiniesse〇ater)。 5 200918180 在上述兩種塗敷方式中，所述旋塗方式會根據作業條 件（如轉速及溶劑蒸發等）導致不規則的表面塗層（如形 成波、'、文）’因此最近主要應用的是利用狹縫塗敷裝置的非 旋轉塗敷方式。 所述非旋轉塗敷方式是，透過狹縫塗敷裝置的狹缝喷 頭贺覆感光液的同時’在基板薄膜上形成預定厚度的光刻 用的感光層（或光刻層）。 而且在這種非旋轉塗敷方式中，透過狹縫塗敷裝置 向f板表面錢藥液時’在前後兩個基板的塗敷作業之間 :等待時間内’由於喷頭的喷口與空氣接觸，t導致藥液 ，的曰？。如果在廷-狀態下進行下-個基板的塗敷作 :’由於高濃度藥液，#出現縱向條紋或者塗層斷開的現200918180 IX. The invention relates to a chemical liquid pretreatment device for a slit coating device, and particularly relates to a structure improvement, which comprises a spraying portion and a drying portion of a cleaning liquid in a pretreatment device. The module is a slit coating device having a chemical liquid pretreatment device which is convenient for removing the chemical liquid with a simple structure. Wherein the spraying portion and the drying portion of the cleaning liquid are used for spraying and drying the cleaning liquid to the priming roller for receiving the nozzle by the slit coating device Sew out the liquid. [Prior Art] The functional film on the substrate for the flat panel display element is usually formed into a predetermined pattern by a conventional photolithography process in the process of the substrate. The lithography process is a step of exposing, developing, and etching the photosensitive liquid (photoresist) after applying a predetermined thickness of the photosensitive liquid on the film of the substrate, thereby forming a film on the substrate. The process of the predetermined circuit pattern. In the photolithography process, it is especially important to form a photosensitive layer of uniform thickness on the substrate on the substrate during the coating step. This is because if the thickness of the photosensitive layer is thicker or thinner than the standard value, uneven marking will result. As a step of applying a photosensitive liquid on a substrate as described above, a spin coating method using a spin coater and a non-rotating coating method using a slit coater have been reported. 5 200918180 In the above two coating methods, the spin coating method will cause irregular surface coating (such as forming wave, ', text) according to working conditions (such as rotation speed and solvent evaporation). It is a non-rotation coating method using a slit coating device. In the non-rotation coating method, a photosensitive layer (or a photolithography layer) for lithography having a predetermined thickness is formed on the substrate film while passing through the slit nozzle of the slit coating device. Moreover, in the non-rotation coating method, when the liquid is applied to the surface of the f-plate through the slit coating device, 'between the application operations of the two substrates before and after: waiting time', the nozzle of the nozzle is in contact with the air. , t causes the liquid medicine, what? . If the next-substrate coating is performed in the state of the state: ' Due to the high concentration of the liquid, # vertical streaks or the coating is broken.
^㈣因’設置藥液預處理裝置 :::样這種藥液預處理裝置通常包括:用於存儲清I: 噴口吐置在所述清洗槽的内側，用於承接由喷頭的 液的喷淋7液的起純；詩向起_的表面噴灑清洗 、淋碩，用於噴灑循環液的噴淋 體的嗜氣喈·、 貝杯頌，用於嘴出乾燥氣 的擠壓式到板（squeeze)。 料表面上藥液 當所述藥液預處理裝置的起動輥 ，嗔*、溶劑的嘴淋一)、溶:轉的：二次執行溶 起動輥的乾燥等步驟。 谢的-先Uinse)、 然而，由於上述現有的藥液預處理裝置分別設置有用 6 200918180 :執行溶劑的喷灑、噴淋、漂洗、乾燥等步驟的各個部分， /、結構複雜，發生錯誤動作的頻率較高。 而且，該藥液預處理裝置的結構變得複雜，降 動親的清洗效率。 【發明内容】 本發明是爲了解決上述問題而提出的，其目的在於提 供一種具有藥液預處理裝置的狹縫塗敷裝置，該裳置中 於噴灌溶劑及乾燥的功能部分被構成爲模組，從而 的結構提高清洗效率。 本發明的另-個目的是提供一種具有藥液預處理 的狹縫塗敷裝置，該裝置在起動輥的邊緣形成—流體通 道’並經由所述流體通道使清洗液或者空氣流過，從而方 便地去除塗敷在起動輥上的藥液。 爲了實現上述㈣，本發明較佳的技術方案包括·工 作臺；輸送機構’用於在所述工作臺上輪送基板；狹縫喷 頭，設置在所述工作臺的一側，且可上下移動，其内部設 有用於裝填藥液的腔室；藥液預處理裝置，包括一起動輥 用以承接由所述狹縫嘴頭吐出的藥液，且與所述起動輕外 周面鄰接設置有流體通道，並透過所述流體通道注入清洗 液或者空氣使之與所述起動輥表面接觸，從而去除殘留在 斤4 外周面上的藥液；及移動機構’可移動地安裝 在所述工作臺上，用於移動所述藥液預處理裝置。 本發明由於在起動輥的邊緣形成一流體通道，並經由 所述机體通道使清洗液或空氣流㊣，因&可方便地去除塗 7 200918180 * 敷在所述起動觀上的藥液。 另外，本發明透過把對起動輥噴灑清洗液並予以乾燦 的結構部分核組化，簡化了結構，由此提高了清洗效率， 減少了錯誤動作的發生頻率。 【實施方式] 下面結合附圖，詳細說明本發明狹缝塗敷裝置的一個 較佳貫施例。 , 圖1疋本發明具有藥液預處理裝置的狹縫塗敷裝置〜 们實施例的整體結構示意圖，圖2是用於顯示圖i中的藥 液預處理裝置靠近狹縫塗敷裝置狀態的側面示意圖。 如圖中所不，在工作臺2的上方設置有輸送機構4, °亥枝構用於把基板G向一側移動。 所述輸送機構4可以使用常規的氣浮式輸送台6,其 可用空氣壓力將所述基板G浮上後在此狀態下輸送。 、即，雖然圖中未顯示，所述輸送台6具有常規的氣浮 (式輸送結構，其用托架定基板G的狀態下用空氣壓力 支持所述基板G的底面’並在此狀態下輸送基板。 除上述結構之外，所述輸送機構4還可以構成爲諸如 像輥筒式輸送機那樣的輸送結構，該結構可以在輥筒上搭 載基板G的狀態下將其輪送（未圖示）。 而且，在所述工作臺2的一側設置有狹縫噴頭丨〇。所 述狹縫喷頭丨〇在透過所述輸送台6輸送的基板G的薄膜 上塗敷感光液，以形成光刻用的感光層（以下簡稱“感 層，’）。 200918180 » 所述狹縫噴頭l〇具有常規狹縫式（slit type)噴頭的 外觀’具有矩形喷口 N。 所述狹縫噴頭10設置在所述工作臺2的上方，並與所 述基板G的輸送方向交叉。所述狹縫噴頭1〇同常規的感 光液供應裝s T相連，並由該裝置獲得感光液後用常規的 方法將感光液塗敷於所述基板G的薄膜上。 另外，所述狹縫喷頭1〇安裝於第一支撐架12上並可 , 上下移動。即所述狹縫喷頭丨〇可移動地設置在第一支撐 架12的第一軌道rl上。此時，所述狹缝喷頭10包括直線 運動塊（未圖示，以下簡稱[“塊）與驅動源（未圖示）， 並以LM方式結合在所述第—軌道Η上。 口此田吊要塗敷藥液或者將在後面敘述的藥液預處 理凌置14靠近時，所述狹縫喷頭1〇可以沿著第一軌道η 在下移動。 與上述狹縫喷頭10相鄰的位置上設置有能夠移動的藥 液預處理裝置14 ^ / 即，所述藥液預處理裝置14可透過移動機構17在工 作臺2上移動。 所述移動機構17包括：設置在工作臺2上的第二軌道 ，用於支持所述藥液預處理裝置14的第二支撐架Μ; 1斤述第—支撐架16的下方可移動地設置在所述第二執 道Γ2上的乙％塊L;用於驅動所述塊L移動的驅動源 (未圖示）。 匕田所述驅動源驅動時，所述LM塊乙可沿所述 14 200918180 第二軌道r2前進或後退’從而帶動所述藥液預處 移動。 、置 如圖3及圖4所示，所述藥液預處理裝置μ 槽20,並於所述清洗槽20的内部設有用來存館溶劑的L先 間。 二 另外，所述清洗槽20的内邱讯筈古γ #結 耵門邛a又置有可旋轉的起 R。所述起動親R的上方部分稍微突出所述清洗槽2〇的= 端，從而讓狹缝噴頭1G的和Ν在執行塗敷作業 易於把剩下的藥液w噴到所述起動輥尺的外表面上。 所述起動輥R透過逆時針旋轉，執行清洗步驟以去除 其外表面上钻附的藥液。 、 首先，臨近所述起動輥R的位置上設置有用來噴灑主 洗液的清洗液噴灑單元25。其中所述清洗液最好包括: 別。此外，所述清洗液噴灑單元25可構成爲模組化結構 亚與清洗槽2G相結合，從而簡化結構，易於維修或更換。 所述清洗时灑單元25包括：第—本體24，設置在 k所述起動1¾ R的位置上，並舆所述起動輕&構成第一 流體通道U ;清洗液供應端26 ’設置在所述第—本體24 上方，向所述第一流體通道L1供應溶劑；第一真空端28 , 設f在所述第―本冑24下方’透過真空壓力吸收流過所 述第一流體通道L丨的清洗液及藥液。 八來兒所述第一本體24的一側面28爲曲面，其 與所述起動輥R的外周面相鄰設置。 、 1=1 第本體24的一側面28與起動輥R的外周面 200918180 之間構成一個具有預定長度的第一流體通道L 1。 而且’所述第一本體24的一側設有與所述清洗液供應 端26相連而噴灑溶劑的噴孔hi ;與所述第一真空端28相 連而提供真空壓的吸孔h2。 因此’透過所述清洗液供應端26流入的溶劑，由所述 噴孔hi噴灑到起動輥r的外周面，而喷灑到起動麵R上 的溶劑則透過所述第一流體通道L1沿所述起動輥R的外 周面流動後，被所述吸孔h2所吸收，並離開所述起動親R。 在此過程中，噴灑到起動輥r上的溶劑同藥液混合， 並透過所述吸孔h2的吸力，可以很方便地脫離所述起動 輥R。 此時，由於所述第一流體通道L1沿所述起動軺^ R的 外周面具有一定的縱向長度’溶劑可獲得充裕的時間來沿 著所述第一流體通道L1同藥液混合，因此可以提高清洗 效率。 透過如上過程，可以有效地去除殘留在起動輥R外周 I 面上的藥液。 所述清洗液喷溪單元25的下方可進一步設置有刮板 32，所述刮板32直接與起動輥R的外周面接觸，從而去 除藥液。 即，所述到板32由具有一定彈力的材料製成，並處於 其端部與起動輥R的外周面接觸的狀態。 因此，所述刮板32可透過機械方式去除所述起動輥R 外周面上的藥液或溶劑。 200918180 所述刮板32可以如前所述那樣設置在清洗液噴灑單元 25的下方，或者根據工藝類塑’可以不設置所述刮板32 ° 另一方面，所述刮板32的鄰接位置上連接有第一排氣 端3 4和溢出端3 6。所述第一排氣端3 4同所述清洗槽2 〇 内部的存儲空間22相連，用於向外界排出所述存儲空間22 内的溶劑蒸汽。 而且，當所述存儲空間22内的溶劑超出預定水位時’ 超出部分的溶齊彳就可從溢出端3 6排出’從而防止溶劑溢 、 出清洗槽20的上方。 此外，所述清洗槽20的一側設置有起泡端40，所述 起泡端40與氣體供應單元（未圖示）相連《因此，當溶 劑存儲在所述清洗槽20内時’可透過所述起泡端4〇注入 空氣，並借此在溶劑中産生泡沫，提高清洗效果。 而且，所述清洗槽20的底部連接有排出端42，由此 在需要時，可將清洗槽20内的溶劑向外排出。 έ 另一方面，所述清洗槽20的另一側設有漂洗單元45， 用來清除殘留在起動輥R上的藥液。所述漂洗單元45包 括：用於供應溶劑的供應端50 ;與所述溶劑供應端5〇相 連、用於對起動輥R喷灑溶劑的噴嘴48。 據此，當所述起動輥R經過所述漂洗區域時，從所述 噴嘴48喷出溶劑’去除所述起動輥r上的藥液。所述供 應端50的上方可設置有第二排氣端料，由此將清洗槽2〇 内的溶劑蒸汽向外排出。 所述漂洗單元45上方設有乾择i开s β礼展早51’從而乾燥起 12 200918180 動輥R以完成預處理步驟。 所述乾燥單元51被構成爲模組，從而簡化了結構，方 便了維修或更換工作。 、即’所述乾燥單元51包括：第二本體52，設置在同 :二，輥R臨近的位置上’並與所述起動輥R構成第二 ▲體通道L2;氣體供應端56，設置在所述第二本體Μ的 亡二向所述第二流體通道L2供應空氣；第二真空端以， 二第所述第二本體52的下方’透過真空麼力吸收流過 所述第二流體通道L2的空氣，並乾燥所述起動輕r。 :、來說所述第二本體52的—側面54爲曲面，直 人所述起動輥R的外周面相鄰設置。 ’、' ’、 體通道I:述第二本體52與起動輥R之間形成第二流 〃所述空氣沿所述起動輥R的外周面流動。 另外’所述第二本 端56相連、用^ & ^又置有與所述氣體供應 直办 ;噴射空氣的喷氣孔h3 ;以及_ 真空端58相遠、田从， 所迷弟一 i: 運用於楗供真空壓的吸氣孔h4。 土去 R的外周面’並沿所述第二汽μ、s .音τ 〇 〜的過程中乾燥所述起動輥R的外周面。”、 而且，沿所述第二流體通道u 所述吸氣孔h4周囹AA 士 』工乳破形成在 所述起動輥R的外門面’、空％境所吸收。透過如上過程， 卜周面得以乾燥。 ^由於所述第二流體通道L2 π戶斤n 外周面具有-定 k、L2，口所述起動輥R的 、，向長度，空氣可獲得充裕的時間來沿 13 200918180 所述第二流體通道L2流動的同時與所述起動輥r的外周 面接觸，因此玎以提高乾燥效率。 11 而且，所述氣體供應端56與第二真空端58被構成爲 模組，並與第二本體52相結合，從而方便了維修或 換工作。 下面參照附圖，詳細說明本發明農置的較佳實施例的 操作過程。 如圖i至圖5所示’首先，沿所述第二軌道^，將可 移動地設置在工作臺2 -側的藥液預處理裳置Μ朝狹縫 喷頭10丨向㈣。當所述藥液預處理襄i 14到達喷頭w 下方時，將所述狹縫喷頭1G沿所述第—軌⑹往下移動。 士當所述狹縫喷頭10的喷口 N靠近所述起動親汉上端 日寸，透過噴Π N，把初始量的藥液噴到起動輥卩上4藥 :夜塗敷到起動…時’所述起動報汉開始旋轉，並：步 經過清洗液喷灑單元25。 在：過程中’經由清洗液喷麗單元25的清洗液供應端 ，可透過喷孔M麵到所述起動輥&的外 流體=到起動輥R的外周面上的溶劑沿所述第- 吸在所述起動輥R的外周面上流動後，被所述 及孔h2所吸收，並離開所述起動輥r。 在此輕巾，錢_純卩上@ 匕過程，去除殘留在起動輥R的外周面上的藥 14 200918180 液0 經過所述清洗液喷灑單元25後，所述起動輥R接著 經過刮板32區域，其中所述刮板32處於其端部與起動輥 R的外周面彈性接觸的狀態。 因此，在所述起動輥R的旋轉過程中，所述刮板32 可通過機械方式去除殘留在起動輥R的外周面上的藥液與 溶劑。 經過刮板32後，所述起動輥R接著經過清洗槽2〇的 存儲空間22 ,在此過程中，其通過儲存在存儲空間22内 的溶劑得到漂洗。 此％，存儲空間22内的溶劑可以是經過所述溶劑喷灑 單元25與刮板32後流下的溶劑，也可以是在先前的藥液 預處理步驟中經由所述漂洗單元45的漂洗過程所留下的 溶劑。 另外，在所述起動輥R經過所述清洗槽2〇的存儲空 間22的過程中，可以根據需要向所述起泡端4〇注入空氣， 並借此在溶劑中産生泡泳。 如此在溶劑中産生泡沫，可以提高溶劑的流動性，進 而提高清洗效果。 所述起動輥R經過清洗槽20的存儲空間22後，接著 經過過漂洗單元45。在所述漂洗單元45中，由供應端5〇 所提供的溶劑通過噴嘴、並以一定的壓力喷灑到所述起動 輥> R上。 因此，透過噴灑到起動輥R上的溶劑，所述起動輥上 15 200918180 的藥液得到清除。 經過漂洗單元45後，述起動 分u 、，士 ， 最終經過#儉留 ’亚在此過程中，其外周面得到乾燥。 。早 即，經由與所述乾燥單元51的第二本體 的氣體供應端56所、，6 λ以咖〆 ^ 02—側相連 輥尺上。 所“的空氣，透過喷氣孔Μ喷到起動 因此’透過所述噴氣孔h3喷到起動輥 的空氣’在沿所述第_ 料周面上 <罘一机體通道L2流動的過 動輥R的外周面。 私中乾紐起 而且/D所述第二流體通道L2流 所述吸孔Μ周圍的直办 孔被形成在 展兄所吸收。透過如上過程，所 述起動輥R的外周面得到乾燥。 斤 經過如上所述的藥 弔履預處理過轾後，所述藥液預處理 " 回到原位，並在需要時重複以上過程。 【圖式簡單說明】 圖1是本發明具有藥潘 啕糸液預處理裝置的狹縫塗敷裝置一 個實施例的整體結構示意圖。 圖2是用於顯示圖1中的蘊 〒的樂液預處理裝置靠近狹縫塗 敷裝置狀態的側面示意圖。 圖3是用於顯示狹縫喷頭的喷口正對置在圖工中的藥 液預處理裝置狀態的側面剖視圖。 ，、圖4是形成在圖1中的藥液預處理裝置内側的流體通 道的結構示意圖。 16 200918180 【主要元件符號說明】 2 工作臺 2 第一本體側面 4 輸送機構 h 噴孔 G 基板 h 吸孔 6 輸送台 3 C 托架 3 第一排氣端 10 狹縫噴頭 3 溢出端 N 喷口 2 存儲空間 T 感光液供應 4 起泡端 12 第一支撐架 4 排出端 rl 第一執道 4 漂洗單元 14 藥液預處理 5 溶劑供應端 17 移動機構 4 喷嘴 r2 第二執道 4 第二排氣端 16 第二支撐架 5 乾燥單元 L LM塊 L 第二流體通道 20 清洗槽 5 第二本體 R 起動輥 5 氣體供應端 25 清洗液喷灑 5 第二真空端 LI 第一流體通 5 第二本體側面 24 第一本體 h 喷氣孔 26 清洗液供應 h 吸氣孔 28 第一真空端 17^ (d) because of the 'set liquid pretreatment device::: This liquid pretreatment device usually includes: for storage clear I: the spout is sprinkled inside the cleaning tank for receiving the liquid from the nozzle The spray 7 liquid is pure; the surface of the poem is sprayed and cleaned, and the surface is sprayed, and the spray is used to spray the circulating liquid, and the shell is used for the drying of the nozzle. Board (squeeze). The liquid medicine on the surface of the material is used as a starting roller of the chemical liquid pretreatment device, a nozzle of the solvent, a solvent, a solvent, a solvent, and a second step of drying the solution roller. Thanks - first Uinse), however, since the above-mentioned existing chemical pretreatment devices are separately provided with 6 200918180: performing various steps of spraying, spraying, rinsing, drying, etc. of the solvent, /, the structure is complicated, and malfunction occurs. The frequency is higher. Moreover, the structure of the chemical liquid pretreatment apparatus becomes complicated, and the cleaning efficiency of the progeny is lowered. SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and an object thereof is to provide a slit coating device having a chemical liquid pretreatment device in which a functional portion for sprinkling solvent and drying is configured as a module The resulting structure improves cleaning efficiency. Another object of the present invention is to provide a slit coating apparatus having a chemical liquid pretreatment which forms a fluid passage at the edge of the starter roller and through which the cleaning liquid or air flows, thereby facilitating The liquid medicine applied to the starter roller is removed. In order to achieve the above (4), a preferred technical solution of the present invention includes a workbench; a transport mechanism 'for rotating the substrate on the workbench; and a slit nozzle disposed on one side of the workbench and capable of being up and down Moving, the chamber is provided with a chamber for filling the liquid medicine; the chemical liquid pretreatment device includes a moving roller for receiving the liquid medicine discharged from the slit mouth, and is disposed adjacent to the starting light outer peripheral surface a fluid passage through which the cleaning liquid or air is injected to contact the surface of the starter roller to remove the chemical liquid remaining on the outer peripheral surface of the crucible 4; and the moving mechanism is movably mounted on the workbench Above, for moving the liquid chemical pretreatment device. According to the present invention, since a fluid passage is formed at the edge of the starter roller and the cleaning liquid or the air is flowed through the body passage, the chemical solution applied to the starting view can be easily removed by & Further, the present invention simplifies the structure by nuclearizing the structure in which the cleaning liquid is sprayed on the starter roller and dried, thereby improving the cleaning efficiency and reducing the frequency of occurrence of erroneous actions. [Embodiment] A preferred embodiment of the slit coating apparatus of the present invention will be described in detail below with reference to the accompanying drawings. Figure 1 is a schematic view showing the overall structure of a slit coating device having a chemical liquid pretreatment device according to the present invention, and Figure 2 is a view for showing the state of the chemical liquid pretreatment device of Figure i near the slit coating device. Side view. As shown in the figure, a transport mechanism 4 is provided above the table 2, and the structure is used to move the substrate G to one side. The conveying mechanism 4 can use a conventional air floating type conveying table 6, which can be transported in this state by floating the substrate G with air pressure. That is, although not shown in the drawing, the conveying table 6 has a conventional air floating (type conveying structure which supports the bottom surface of the substrate G with air pressure in a state in which the substrate G is fixed by the bracket) and in this state In addition to the above configuration, the conveying mechanism 4 may be configured as a conveying structure such as a roller conveyor, which can be carried in a state in which the substrate G is mounted on the roller (not shown). Further, a slit nozzle 设置 is disposed on one side of the table 2. The slit nozzle 涂敷 applies a photosensitive liquid on a film of the substrate G conveyed through the conveying table 6 to form Photosensitive layer for lithography (hereinafter referred to as "sensing layer, '). 200918180 » The slit nozzle 10 has the appearance of a conventional slit type nozzle having a rectangular nozzle N. The slit nozzle 10 is provided Above the table 2, and intersecting with the conveying direction of the substrate G. The slit nozzle 1 is connected to a conventional photosensitive liquid supply device s T, and the photosensitive liquid is obtained by the device, and then a conventional method is used. Applying a photosensitive liquid to the substrate G In addition, the slit nozzle 1 is mounted on the first support frame 12 and can be moved up and down. That is, the slit nozzle is movably disposed on the first track of the first support frame 12. At this time, the slit head 10 includes a linear motion block (not shown, hereinafter abbreviated as ""block") and a driving source (not shown), and is coupled to the first track 以 by LM. When the liquid sling is to be coated with a liquid medicine or the chemical liquid pretreatment layer 14 to be described later is approached, the slit nozzle 1 〇 can be moved downward along the first rail η. 10 adjacent positions are provided with a movable chemical pretreatment device 14 ^ / that is, the chemical pretreatment device 14 can be moved on the table 2 through the moving mechanism 17. The moving mechanism 17 includes: a second track on the table 2 for supporting the second support frame of the liquid chemical pretreatment device 14; a lower portion of the first support frame 16 is movably disposed on the second track 2 B% block L; a driving source (not shown) for driving the movement of the block L. The drive source drive of Putian The LM block B can advance or retreat along the 14 200918180 second track r2 to drive the liquid chemical pre-movement. As shown in FIG. 3 and FIG. 4, the liquid chemical pretreatment device μ The groove 20 is provided with an L first space for storing the solvent inside the cleaning tank 20. In addition, the inner channel of the cleaning tank 20 is further provided with a rotatable R. The upper portion of the starting pro-R slightly protrudes the = end of the cleaning tank 2〇, so that the sum of the slit nozzles 1G and the crucible is easy to spray the remaining liquid medicine w to the start. The outer surface of the roller is rotated by a counterclockwise rotation to perform a cleaning step to remove the chemical liquid drilled on the outer surface thereof. First, a position adjacent to the starter roller R is provided for spraying the main wash. The liquid cleaning liquid spray unit 25. Preferably, the cleaning liquid comprises: Further, the cleaning liquid spraying unit 25 may be configured as a modular structure in combination with the cleaning tank 2G, thereby simplifying the structure and being easy to repair or replace. The cleaning sprinkling unit 25 includes: a first body 24 disposed at a position of the starter 126R, and the starting light & constituting the first fluid passage U; the cleaning liquid supply end 26' is disposed at the Above the body 24, a solvent is supplied to the first fluid passage L1; a first vacuum end 28 is disposed below the first portion 24 to pass through the first fluid passage L through vacuum pressure absorption. Cleaning solution and liquid medicine. A side surface 28 of the first body 24 is a curved surface which is disposed adjacent to the outer peripheral surface of the starter roller R. 1 = 1 A side surface 28 of the main body 24 and an outer peripheral surface 200918180 of the starter roller R constitute a first fluid passage L 1 having a predetermined length. Further, one side of the first body 24 is provided with a spray hole hi which is connected to the cleaning liquid supply end 26 to spray a solvent, and a suction hole h2 which is connected to the first vacuum end 28 to provide a vacuum pressure. Therefore, the solvent flowing in through the cleaning liquid supply end 26 is sprayed from the injection hole hi to the outer circumferential surface of the starter roller r, and the solvent sprayed onto the starting surface R passes through the first fluid passage L1. After the outer peripheral surface of the starter roller R flows, it is absorbed by the suction hole h2 and leaves the starting pro-R. In this process, the solvent sprayed onto the starter roller r is mixed with the chemical liquid, and is easily detached from the starter roll R by the suction force of the suction hole h2. At this time, since the first fluid passage L1 has a certain longitudinal length along the outer circumferential surface of the starting device, the solvent can obtain a sufficient time to mix with the chemical liquid along the first fluid passage L1, thereby Improve cleaning efficiency. Through the above process, the chemical liquid remaining on the outer circumference I of the starter roller R can be effectively removed. Below the cleaning liquid blast unit 25, a squeegee 32 may be further provided, and the squeegee 32 is directly in contact with the outer peripheral surface of the priming roller R to remove the chemical liquid. That is, the to-plate 32 is made of a material having a certain elastic force, and is in a state where its end portion is in contact with the outer peripheral surface of the starter roller R. Therefore, the squeegee 32 can mechanically remove the chemical liquid or solvent on the outer peripheral surface of the starter roller R. 200918180 The squeegee 32 may be disposed under the cleaning liquid spray unit 25 as described above, or may be provided without the squeegee 32° according to the process type. On the other hand, the squeegee 32 is adjacent to the position. A first exhaust end 34 and an overflow end 36 are connected. The first exhaust end 34 is connected to the storage space 22 inside the cleaning tank 2 , for discharging solvent vapor in the storage space 22 to the outside. Moreover, when the solvent in the storage space 22 exceeds the predetermined water level, the excess portion of the solvent can be discharged from the overflow end 36 to prevent the solvent from overflowing above the cleaning tank 20. Further, one side of the cleaning tank 20 is provided with a bubble end 40 which is connected to a gas supply unit (not shown). Therefore, when the solvent is stored in the cleaning tank 20, it is permeable. The bubbling end 4 injects air and thereby generates a foam in the solvent to improve the cleaning effect. Further, the bottom of the washing tank 20 is connected to the discharge end 42, whereby the solvent in the washing tank 20 can be discharged outward as needed. έ On the other hand, the other side of the cleaning tank 20 is provided with a rinsing unit 45 for removing the chemical liquid remaining on the priming roller R. The rinsing unit 45 includes a supply end 50 for supplying a solvent, and a nozzle 48 for supplying a solvent to the start roll R in connection with the solvent supply end 5?. According to this, when the starter roller R passes through the rinsing area, the solvent is ejected from the nozzle 48 to remove the chemical liquid on the starter roller r. A second exhaust end material may be disposed above the supply end 50, thereby discharging the solvent vapor in the cleaning tank 2〇 outward. Above the rinsing unit 45, there is a dry selection 51' to dry the 12 200918180 moving roller R to complete the pre-processing step. The drying unit 51 is constructed as a module, thereby simplifying the structure and facilitating maintenance or replacement work. That is, the drying unit 51 includes: a second body 52 disposed at the same position: two, adjacent to the roller R' and forming a second ▲ body passage L2 with the starting roller R; a gas supply end 56, disposed at The second body of the second body is supplied with air to the second fluid passage L2; the second vacuum end of the second body 52 is permeable to the second fluid passage L2 the air and dry the starting light r. The side surface 54 of the second body 52 is a curved surface, and the outer peripheral surface of the starter roller R is disposed adjacent to each other. ', '', the body passage I: a second flow is formed between the second body 52 and the starter roller R, and the air flows along the outer peripheral surface of the starter roller R. In addition, the second local end 56 is connected, and the ^ & ^ is placed directly with the gas supply; the air jet hole h3; and the vacuum end 58 are far away, Tian Cong, the younger brother : Used in the suction hole h4 for vacuum pressure. The soil is removed from the outer peripheral surface of R and the outer peripheral surface of the starter roller R is dried in the course of the second vapor ν, s. And, along the second fluid passage u, the suction hole h4 is formed by the outer surface of the starter roll R, and the air is absorbed by the outer surface of the starter roll R. Through the above process, The surface is dried. ^ Since the second fluid passage L2 π n 外 n outer peripheral surface has - fixed k, L2, the length of the start roller R, the length, the air can obtain ample time to follow the 13 200918180 The second fluid passage L2 flows while being in contact with the outer peripheral surface of the starter roller r, thereby increasing the drying efficiency. 11 Moreover, the gas supply end 56 and the second vacuum end 58 are configured as a module, and The two bodies 52 are combined to facilitate maintenance or work. The operation of the preferred embodiment of the present invention will be described in detail below with reference to the accompanying drawings. As shown in Figures i to 5, first, along the second The rail ^, the liquid chemical pre-treatment set movably disposed on the side of the table 2 is turned toward the slit nozzle 10 (4). When the liquid preparation pretreatment 襄i 14 reaches below the nozzle w, The slit nozzle 1G moves down along the first rail (6). The spout N of the sprinkler 10 is close to the upper end of the starting pro-Chinese, and the initial amount of the chemical is sprayed onto the starter roller by the sneeze N. 4: When the night is applied to the starter, the start of the start is started. Rotating, and: stepping through the cleaning liquid spraying unit 25. During the process: 'through the cleaning liquid supply end of the cleaning liquid spray unit 25, the external fluid passing through the injection hole M surface to the starting roller & The solvent on the outer peripheral surface of the roll R flows along the outer peripheral surface of the starter roll R along the first suction, is absorbed by the hole h2, and leaves the starter roll r. _ pure 卩上@匕 process, removing the drug remaining on the outer peripheral surface of the starter roller R 200918180 Liquid 0 After passing through the cleaning liquid spray unit 25, the starter roll R then passes through the area of the squeegee 32, wherein The squeegee 32 is in a state in which its end portion is in elastic contact with the outer peripheral surface of the starter roller R. Therefore, during the rotation of the priming roller R, the squeegee 32 can be mechanically removed to remain on the outer peripheral surface of the starter roller R. The liquid medicine and the solvent are passed on. After the squeegee 32 passes, the starter roller R then passes through the cleaning tank 2 The storage space 22 is rinsed by the solvent stored in the storage space 22. In this process, the solvent in the storage space 22 may be a solvent flowing through the solvent spraying unit 25 and the squeegee 32. It may also be a solvent left by the rinsing process of the rinsing unit 45 in the previous chemical liquid pretreatment step. In addition, during the passage of the priming roller R through the storage space 22 of the cleaning tank 2 Air can be injected into the bubbling end 4 as needed, thereby generating a bubble in the solvent. Thus, foaming in the solvent can improve the fluidity of the solvent and thereby improve the cleaning effect. After the storage space 22 of the tank 20 is cleaned, the rinsing unit 45 is passed. In the rinsing unit 45, the solvent supplied from the supply end 5〇 is sprayed through the nozzle and is applied to the priming roll > R with a certain pressure. Therefore, the liquid medicine on the starter roll 15 200918180 is removed by the solvent sprayed onto the starter roll R. After passing through the rinsing unit 45, the starting points u, shi, and finally pass through the 俭 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚. Immediately, via the gas supply end 56 of the second body of the drying unit 51, 6 λ is connected to the roller on the side of the coffee machine. The "air" is sprayed through the gas jet hole to the starter so that the 'air that is sprayed through the gas injection hole h3 to the starter roll' is a flow roller that flows along the circumference of the first material < a body passage L2 The outer peripheral surface of R. The straight hole around the suction hole 流 is formed by the second fluid passage L2 and is formed by the straight body. The outer circumference of the starter roller R is transmitted through the above process. The surface is dried. After the pretreatment of the drug suspension as described above, the liquid solution is pretreated " back to the original position, and the above process is repeated as needed. [Simple diagram of the drawing] BRIEF DESCRIPTION OF THE DRAWINGS FIG. 2 is a schematic view showing the overall structure of an embodiment of a slit coating device having a pretreatment device for a medicinal pan sputum. FIG. 2 is a view showing a state in which the lyophilized pretreatment device of FIG. Figure 3 is a side cross-sectional view showing the state of the liquid chemical pretreatment apparatus in which the nozzle of the slit nozzle is directly opposed to the drawing. Fig. 4 is the inside of the liquid chemical pretreatment apparatus formed in Fig. 1. Schematic diagram of the fluid channel. 16 200918180 Main component symbol description] 2 Workbench 2 First body side 4 Transport mechanism h Injection hole G Substrate h Suction hole 6 Conveying table 3 C Bracket 3 First exhaust end 10 Slit nozzle 3 Overflow end N Nozzle 2 Storage space T Photosensitive liquid supply 4 Foaming end 12 First support frame 4 Discharge end rl First lane 4 Rinse unit 14 Chemical liquid pretreatment 5 Solvent supply end 17 Moving mechanism 4 Nozzle r2 Second lane 4 Second exhaust end 16 2 support frame 5 drying unit L LM block L second fluid channel 20 cleaning tank 5 second body R starter roller 5 gas supply end 25 cleaning liquid spray 5 second vacuum end LI first fluid passage 5 second body side 24 a body h jet hole 26 cleaning fluid supply h suction port 28 first vacuum end 17