TWI284567B - A pre-discharging apparatus for a slit coater - Google Patents
A pre-discharging apparatus for a slit coater Download PDFInfo
- Publication number
- TWI284567B TWI284567B TW092130979A TW92130979A TWI284567B TW I284567 B TWI284567 B TW I284567B TW 092130979 A TW092130979 A TW 092130979A TW 92130979 A TW92130979 A TW 92130979A TW I284567 B TWI284567 B TW I284567B
- Authority
- TW
- Taiwan
- Prior art keywords
- liquid
- nozzle
- slit coater
- discharge device
- circulating
- Prior art date
Links
- 238000007599 discharging Methods 0.000 title claims abstract description 8
- 239000007788 liquid Substances 0.000 claims abstract description 218
- 238000005406 washing Methods 0.000 claims abstract description 41
- 238000004140 cleaning Methods 0.000 claims description 42
- 239000011248 coating agent Substances 0.000 claims description 38
- 238000000576 coating method Methods 0.000 claims description 38
- 239000012530 fluid Substances 0.000 claims description 36
- 239000007921 spray Substances 0.000 claims description 31
- 238000005507 spraying Methods 0.000 claims description 4
- 238000005187 foaming Methods 0.000 claims description 3
- 238000002360 preparation method Methods 0.000 claims description 2
- 238000010408 sweeping Methods 0.000 claims 4
- 238000007664 blowing Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 abstract description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract description 6
- 229910001873 dinitrogen Inorganic materials 0.000 abstract description 6
- 239000002904 solvent Substances 0.000 abstract description 3
- 230000037452 priming Effects 0.000 abstract description 2
- 238000011084 recovery Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 239000002699 waste material Substances 0.000 description 4
- 238000011109 contamination Methods 0.000 description 3
- 230000005587 bubbling Effects 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
- B05B1/005—Nozzles or other outlets specially adapted for discharging one or more gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C17/00—Hand tools or apparatus using hand held tools, for applying liquids or other fluent materials to, for spreading applied liquids or other fluent materials on, or for partially removing applied liquids or other fluent materials from, surfaces
- B05C17/02—Rollers ; Hand tools comprising coating rollers or coating endless belts
Landscapes
- Coating Apparatus (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Nozzles (AREA)
- Spray Control Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
Description
1284567 (1) 玖、發明說明 【發明所屬技術之領域】 本發明是例如關於在玻璃基板或半導體晶圓等的板狀 被處理物表面使光阻液或顯像液、彩色濾光片等的塗布液 從開縫狀開口部流下並塗布的開縫式塗布機的預備吐出裝 置。1284567 (1) Field of the Invention The present invention relates to, for example, a photoresist liquid, a developing liquid, a color filter, or the like on the surface of a plate-shaped object to be processed such as a glass substrate or a semiconductor wafer. The preliminary discharge device of the slit coater that the coating liquid flows down from the slit-like opening and is applied.
【先前技術】 在採用開縫式塗布機並供給塗布液到連續性地多數個 基板表面的情形，在塗布作業與塗布作業之間的待機時 間，由於與空氣的接觸使得吐出噴嘴前端部的塗布液的其 中一部份的濃度上昇。然後，按照該狀態原樣，當繼續對 接下來的基板塗布時，由於高濃度化後的塗布液而使縱向 條紋產生、薄膜破裂產生。[Prior Art] In the case where a slit coater is used and a coating liquid is supplied to a plurality of continuous substrate surfaces, the application of the front end portion between the coating operation and the coating operation causes the coating of the front end portion of the discharge nozzle due to contact with air. The concentration of one part of the liquid rises. Then, in the same manner as in the above state, when the subsequent substrate is applied, the longitudinal stripes are generated and the film is broken due to the coating liquid having a high concentration.
爲了解決上述的不利因素，已知有先前技術是以在保 持洗淨液的洗淨槽内配置旋轉滾筒，而且使該旋轉滾筒的 上部比洗淨液朝更上方突出，使開縫式塗布機的吐出噴嘴 接近於突出後的旋轉滾筒的表面，使多餘的塗布液從吐出 噴嘴引出而附著在旋轉滾筒的表面並去除的方式來進行。 (專利文獻1 ) 而且，關於將液體與空氣混合並噴出的2流體噴嘴是 被記載於專利文獻2及專利文獻3。 〔專利文獻1〕日本特開2 0 0 1 - 3 1 0 1 4 7號 〔專利文獻2〕日本特開2003-145062號 -5- (2) 1284567 〔專利文獻3〕日本特開2003-145064號 【發明內容】 〔發明所欲解決之課題〕In order to solve the above disadvantages, it is known that the prior art is to arrange a rotating drum in a washing tank in which the washing liquid is held, and to make the upper portion of the rotating drum protrude upward from the washing liquid, so that the slit coater is provided. The discharge nozzle is close to the surface of the protruding rotary drum, and the excess coating liquid is taken out from the discharge nozzle and adhered to the surface of the rotary drum and removed. (Patent Document 1) A two-fluid nozzle in which a liquid is mixed with air and ejected is described in Patent Document 2 and Patent Document 3. [Patent Document 1] Japanese Patent Laid-Open Publication No. 2003-145062 No. 2003-145062-5- (2) 1284567 [Patent Document 3] Japanese Patent Laid-Open No. 2003-145064 No. [Summary of the Invention] [Problems to be Solved by the Invention]
在上述開縫式塗布機的預備吐出裝置之中，雖然具有 朝向旋轉滾筒的表面並噴出洗淨液的噴淋噴嘴，但是從該 噴淋噴嘴噴出的洗淨液是使回收到回收槽後的洗淨液循環 使用。 如此，因爲在先前之中是從噴淋噴嘴將一度使用後的 洗淨液噴出，所以在洗淨能力之點與供給新液的情形比較 較爲不如。反之僅供應新液的情形是對成本上較爲不利。 另外，在先前例之中是雖然以藉由將洗淨後的旋轉滾 筒表面的乾燥執行排氣的方式進行，但是也有對乾燥所花 費的時間，將附著在旋轉滾筒表面而且濃縮後的塗布液很 難剝離之所說的問題。In the preliminary discharge device of the slit coater, a shower nozzle that discharges the cleaning liquid toward the surface of the rotary drum is provided, but the cleaning liquid discharged from the shower nozzle is recovered after collecting the recovery tank. The cleaning solution is recycled. In this case, since the washing liquid once used is sprayed from the shower nozzle in the past, the point of the washing ability is inferior to the case where the new liquid is supplied. Conversely, the case where only the new liquid is supplied is disadvantageous in terms of cost. Further, in the prior art, the exhaust liquid is exhausted by drying the surface of the rotating drum after washing, but there is also a coating liquid which adheres to the surface of the rotating drum and is concentrated after the time required for drying. It is difficult to strip off the problem mentioned.
〔用來解決課題之手段〕 爲了解決上述課題，本發明是在設置於洗淨槽内朝向 旋轉滾筒與旋轉滾筒的表面並噴出洗淨液的噴淋噴嘴的預 備吐出裝置之中，由噴出新液的新液噴淋噴嘴與噴出循環 液的循環液噴淋噴嘴來構成上述噴淋噴嘴，而且新液噴淋 噴嘴是將旋轉滾筒的旋轉方向作爲基準並使之比循環液噴 淋噴嘴位在更前方處。 藉由如此之構成，能以循環液（洗淨液）來進行粗洗 -6 - (3) 1284567 淨’能以新液（洗淨液）來進行完成前之最後洗淨。 循環液噴淋噴嘴是不限於一個，藉由分爲上部循環液 噴淋噴嘴與下部循環液噴淋噴嘴，來使洗淨效率更提昇。 另外’爲了儘早使旋轉滾筒的表面乾燥，也可在新液 噴淋噴嘴的上方配置將乾燥氣體噴出的氣體噴出噴嘴。 另外’藉由可調整地設置刷帚，而能有效果上地掃落 附著在旋轉滾筒的表面且濃縮後的塗布液。 另外，也可在洗淨槽内的洗淨液中以其中一部份浸漬 的滾筒刷來洗淨旋轉滾筒表面。可藉由採用滾筒刷來有效 果上地淸掃旋轉滾筒的表面。而且爲了去除附著在滾筒刷 且濃縮後的塗布液，所以也可在滾筒刷的旁邊設置旋轉 桿、噴出氣體或洗淨液的噴嘴。 而且，在洗淨槽内上下位置是設置可變的液面調整用 排液口，能以將洗淨液的液面形成比旋轉滾筒的下端還更 上方或下方的方式來調整而得的構成。 〔發明的效果〕 根據如以上說明的方式，本發明的開縫式塗佈機的預 備吐出裝置，將噴淋噴嘴分爲新液用與循環液用，將旋轉 滾筒（引液滾筒）的旋轉方向作爲基準’因爲使新液噴淋 噴嘴位於比循環液噴淋噴嘴還更前方，所以能將粗洗淨與 完成前之最後洗淨更有效率地進行。 而且，藉由設置在噴淋噴嘴的下方的刷帚’可有效果 上地掃落附著於旋轉滾筒表面的塗布液° -7 - 1284567[Means for Solving the Problem] In order to solve the above-described problems, the present invention is a new discharge device that is installed in a shower nozzle that is disposed in a cleaning tank toward a surface of a rotating drum and a rotating drum and that discharges a cleaning liquid. The new liquid spray nozzle of the liquid and the circulating liquid spray nozzle for discharging the circulating liquid constitute the spray nozzle, and the new liquid spray nozzle uses the rotation direction of the rotary drum as a reference and is located at a ratio of the circulating liquid spray nozzle. More forward. With such a configuration, it is possible to carry out rough washing with a circulating liquid (washing liquid) -6 - (3) 1284567 net can be finally washed before completion with a new liquid (washing liquid). The circulating liquid spray nozzle is not limited to one, and the washing efficiency is further improved by dividing the upper circulating liquid spray nozzle and the lower circulating liquid spray nozzle. Further, in order to dry the surface of the rotary drum as early as possible, a gas ejecting nozzle that ejects the dry gas may be disposed above the new liquid spray nozzle. Further, by adjusting the brush arranging, the coating liquid adhering to the surface of the rotary drum and concentrated can be effectively removed. Alternatively, the surface of the rotating drum may be washed by a roller brush impregnated in a part of the washing liquid in the washing tank. The surface of the rotating drum can be effectively swept by using a roller brush. Further, in order to remove the coating liquid adhered to the roller brush and concentrated, a nozzle for rotating the rod, the gas or the cleaning liquid may be provided beside the roller brush. Further, the vertical position in the cleaning tank is a liquid level adjusting liquid discharge port, and the liquid level of the cleaning liquid can be adjusted to be higher or lower than the lower end of the rotary drum. . [Effects of the Invention] According to the above-described embodiment, the preliminary discharge device of the slit coater of the present invention divides the shower nozzle into new liquid and circulating liquid, and rotates the rotary drum (priming drum). Since the direction is the reference 'because the new liquid spray nozzle is located further forward than the circulating liquid spray nozzle, the rough washing and the final washing before completion can be performed more efficiently. Moreover, the coating liquid attached to the surface of the rotating drum can be effectively swept away by the brush 帚 disposed under the shower nozzle. -7 - 1284567
另外，藉由在噴淋噴嘴之外設置滾筒刷，可有效果上 地剝離附著於旋轉滾筒表面而且濃縮後的塗布液，可將旋 轉滾筒表面保持成淸淨化。 藉由將噴淋噴嘴變更成2流體噴嘴，能以較少的液量 來有效率地洗淨，此外可藉由設置起泡噴嘴來更有效果上 地剝離附著於旋轉滾筒表面的塗布液。Further, by providing a roller brush in addition to the shower nozzle, the coating liquid adhering to the surface of the rotary drum and concentrated can be peeled off in an effective manner, and the surface of the rotary drum can be kept clean. By changing the shower nozzle to a two-fluid nozzle, it is possible to efficiently clean with a small amount of liquid, and it is possible to more effectively peel off the coating liquid adhering to the surface of the rotary drum by providing a foaming nozzle.
而且，藉由利用液面調整用排液構件可調整洗淨槽内 的洗淨液的液面，可採用對應於洗淨液的污穢情形之洗淨 方法，能謀求洗淨液之有效利用。 【實施方式】Further, by using the liquid level adjusting liquid discharge member, the liquid level of the washing liquid in the washing tank can be adjusted, and a cleaning method corresponding to the contamination of the washing liquid can be employed, whereby the cleaning liquid can be effectively utilized. [Embodiment]
以下根據添附圖示說明本發明的實施形態。此處，第 1圖是裝入本發明的預備吐出裝置的塗布裝置之全體圖， 第2圖是顯示本發明的預備吐出裝置的全體圖，第3圖是 說明關於液面調整之圖，第4圖是顯示本發明的預備吐出 裝置的其他實施例之全體圖。 針對第1圖，C爲塗布裝置，P爲預備吐出裝置，在 本實施例之中作爲塗布裝置C是雖然顯示利用線性馬達的 非接觸型，但是塗布裝置並不限定於此。 首先，塗布裝置C是透過在基座1的上面具有高度調 整機構的支撐腳2而設置平台3，而且用來將被處理基板 W從平台3抬起的銷5安裝在以未圖示的壓缸單元來昇降 的水平平板4上，使該銷5面臨平台3的貫通孔6。 另外在基座1的上面是透過線性馬達7而讓移動構件 -8- 1284567 (5) 8在第1圖之中可朝左右方向移動地支承，而且在該移動 構件8升降自如地安裝有開縫式噴嘴9。 另一方，在基座1的其中一端側（第1圖的左側端） 是配置有預備吐出裝置P。預備吐出裝置P是如第2圖所 示，在貯留洗淨液的洗淨槽1 1內旋轉自如地配置圓筒狀 引液滾筒1 2。該圓筒狀引液滾筒1 2是以不鏽鋼、鋁、鈦 等所形成，其尺寸是直徑3 0〜1 0 0 mm，讓長度比開縫式 噴嘴9的長軸方向長度更稍微大地設定，而且在預備吐出 時與開縫式噴嘴9下端（噴嘴孔）的間隔是形成爲25〜 3 0 0 // m 〇 另外，在所開放的洗淨槽1 1上面是設置蓋體13、 1 4，而且使這些蓋體1 3、1 4的內端接近圓筒狀引液滾筒 1 2並儘可能防止洗淨液的蒸發。然後，在蓋體1 3是形成 將循環的洗淨液噴出的第1循環液噴淋噴嘴1 5，而且在 蓋體1 4是形成將空氣、氮氣氣體等的乾燥氣體噴出的噴 嘴1 6。 另外，將圓筒狀引液滾筒1 2的旋轉方向作爲基準， 並從蓋體1 3朝向蓋體1 4，設置將第i刷帚】7、第2循環 液噴淋噴嘴1 8、滾筒刷1 9 '第2刷帚20以及新的洗淨液 噴出的新液噴淋噴嘴2 1。 上述第1刷帚1 7及第2刷帚20是可在洗淨槽！ ！的 側壁透過螺栓構件1 7 a、2 0 a來安裝，而且藉由調整螺栓 構件的鎖入量可使對於圓筒狀引液滾筒1 2的突出量變 化。 -9- (6) 1284567 另外，在洗淨槽1 1的側壁的排氣導管2 2是開口，並 且在洗淨槽1 1的底部是設置洗淨滾筒刷1 9的旋轉桿2 3 及朝向滾筒刷1 9並噴出洗淨液或氮氣氣體的噴嘴2 4。 上述旋轉桿2 3並不會自行旋轉，而且與旋轉的滾筒 刷1 9接觸並發揮將附著在滾筒刷1 9的固態狀塗布液等的 污穢去除的作用。上述噴嘴24是爲了去除附著在滾筒刷 1 9的固態狀塗布液等的污穢，所以噴出洗淨液或氮氣氣 體。另外從噴嘴24不使空氣噴出而以噴出氮氣氣體的方 式來進行是爲了防止洗淨液的劣化。 這些旋轉桿2 3與噴嘴2 4是也可倂用來使用，也可個 別地使用。 另外，如第3圖所示，在洗淨槽1 1的底部是形成有 與回收通道2 5連接的排液口 2 6，將洗淨槽1 1内的洗淨 液透過濾芯來回收，而且再度以從第1及第2循環液噴淋 噴嘴1 5、1 8朝向引液滾筒1 2使之噴出的方式來進行。而 且’排液口 2 6的形狀是製作成朝向上方並擴張的喇η八 狀，以藉由溶劑蒸發來使濃縮後的塗布液等的回收容易地 執行的方式來進行。也可取代製作成喇叭狀的排液口 26 而使洗淨槽1 1的底面全體朝向排液口 26並傾斜。 另外，從回收通道2 5伸長的液面調整用排液構件2 7 是貫通洗淨槽1 1的底部並面臨洗浄槽1 1内。該液面調整 用排液構件2 7是將上端製作成排液□，並且可調整上下 位置，而且製作成在最上位的位置時，洗淨液的液面是在 比引液滾筒12的下端形成在更上方，在最下位的位置 -10 - (7) 1284567 時，洗淨液的液面是比引液滾筒1 2的下端形成在更下方 的方式。另外，關於滾筒刷1 9是設定液面調整用排液構 件27在最上位的位置時，洗淨液的液面是比滾筒刷1 9的 上端形成在更下方，在最下位的位置時，洗淨液的液面是 比滾筒刷1 9的下端形成在更上方的方式。 藉由如以上之構成，洗淨液在淸淨的情形是將液面調 整用排液構件27形成高的位位置並使引液滾筒1 2的下端 直接浸漬在淸淨液中，而且在淸淨液中塗布液濃度等增加 的情形是降低液面調整用排液構件2 7的高度，使圓筒狀 引液滾筒1 2從淸淨面的液面浮出，而且藉由沖洗噴嘴 1 5、1 8、2 1及滾筒刷1 9來洗淨引液滾筒1 2表面。 另外如第4圖所示，也可將第1循環液噴淋噴嘴1 5 置換成第1循環液2流體噴嘴2 8，將第2循環液噴淋噴 嘴1 8置換成第2循環液噴霧噴嘴29，將新液噴淋噴嘴2 1 置換成新液2流體噴嘴3 0。2流體噴嘴是爲了在液體吹入 氣體而形成霧狀，所以液體的表面積越大來使得附著在圓 筒狀引液滾筒12的塗布液也越易溶合而容易去除。而 且，洗淨液的使用量也可大幅地削減。 另外，在洗淨槽1 1的底部設置起泡噴嘴3 1，並且也 可與滾筒刷1 9置換，而且也可倂用。起泡噴嘴3 1是作爲 液體的噴出手段，例如，具有以噴水的方式來使某一定量 的洗淨液噴出並將附著在圓筒狀引液滾筒1 2的塗布液沖 洗的方法、或接觸含有氣體的泡狀的洗淨液並將塗布液沖 洗的方法等。 -11 - (8) 1284567 另外，在第1循環液2流體噴嘴2 8之側的與液氣分 離槽（未圖示）連接的廢液通路3 2是開口，而且在新液 2流體噴嘴3 0之側的與循環用緩衝槽（未圖示）連接的 廢液通路3 3是開口。 而且，在實施例之中是雖然說明了關於設置了新液噴 淋噴嘴的預備吐出裝置，但是也可不設置新液噴淋噴嘴， 而且僅設置了循環液噴淋噴嘴的預備吐出裝置。 〔產業上之可利用性〕 根據本案發明的開縫式塗布機的預備吐出裝置並不只 限於半導體製造裝置，也可對液晶顯示裝置或電漿顯示器 等IT關連製造裝置加以應用。 【圖式簡單說明】 第1圖是裝入本發明的預備吐出裝置的塗布裝置之全 體圖。 第2圖是本發明的預備吐出裝置的全體圖。 第3圖是說明關於液面調整之圖。 第4圖是本發明的預備吐出裝置的其他實施例之全體 圖。 〔符號說明〕 1…基座 2…支撐腳 -12- (9) (9)1284567 3…平台 4···水平平板 5…銷 6…貫通孔 7···線性馬達 8···移動構件 9···開縫式噴嘴 1 1…洗淨>曹 12…圓筒狀引液滾筒 13、14···蓋體 15…第1循環液噴淋噴嘴 16…噴出乾燥氣體的噴嘴 1 7…第1刷帚 1 7a、20a…螺栓構件 18…第2循環液噴淋噴嘴 19…滾筒刷 20···第2刷帚 21…新液噴淋噴嘴 22…排氣導管 2 3…旋轉桿 24…噴出洗淨液或氮氣氣體的噴嘴 25…回收通道 26…排液口 27…液面調整用排液構件 -13 - (10) 1284567 28…第1循環液2流體噴嘴 29…第2循環液噴霧噴嘴 3 0…新液2流體噴嘴 31…起泡噴嘴 32…廢液通路（液氣分離槽） 3 3…廢液通路（循環用緩衝槽） C…塗布裝置Embodiments of the present invention will be described below with reference to the accompanying drawings. Here, Fig. 1 is a general view of a coating device incorporating the preliminary discharge device of the present invention, Fig. 2 is a view showing a whole of the preliminary discharge device of the present invention, and Fig. 3 is a view for explaining a liquid level adjustment. Fig. 4 is a general view showing another embodiment of the preliminary discharge device of the present invention. In the first embodiment, C is a coating device, and P is a preliminary discharge device. In the present embodiment, the coating device C is a non-contact type that uses a linear motor, but the coating device is not limited thereto. First, the coating device C is provided with a platform 3 through a support leg 2 having a height adjustment mechanism on the upper surface of the susceptor 1, and a pin 5 for lifting the substrate W to be processed from the platform 3 is mounted at a pressure not shown. The cylinder unit is raised and lowered on the horizontal flat plate 4 such that the pin 5 faces the through hole 6 of the platform 3. Further, on the upper surface of the susceptor 1, the moving member 8-10-284567 (5) 8 is supported by the linear motor 7 so as to be movable in the left-right direction in the first drawing, and the moving member 8 is detachably mounted and opened. Slot nozzle 9. On the other hand, a preliminary discharge device P is disposed on one end side (the left end of the first drawing) of the susceptor 1. In the preliminary discharge device P, as shown in Fig. 2, a cylindrical liquid introduction roller 12 is rotatably disposed in the cleaning tank 1 1 in which the cleaning liquid is stored. The cylindrical liquid introduction roller 12 is formed of stainless steel, aluminum, titanium, or the like, and has a diameter of 30 to 1.0 mm, and the length is set to be slightly larger than the length of the slotted nozzle 9 in the longitudinal direction. Further, the interval between the lower end (nozzle hole) of the slit nozzle 9 at the time of preliminary discharge is 25 to 3 0 0 // m. Further, the cover 13 and 14 are provided on the open cleaning tank 1 1 . Further, the inner ends of the lids 1 3, 14 are brought close to the cylindrical drip roller 12 and the evaporation of the washing liquid is prevented as much as possible. Then, the lid body 13 is a first circulating liquid shower nozzle 15 that discharges the circulating cleaning liquid, and the lid body 14 is a nozzle 16 that discharges a dry gas such as air or nitrogen gas. Further, with the rotation direction of the cylindrical liquid introduction roller 12 as a reference, the i-th brush 7 and the second circulating liquid shower nozzle 18 and the roller brush are provided from the lid body 1 3 toward the lid body 14. 1 9 'The second brush 20 and the new liquid spray nozzle 2 1 sprayed by the new cleaning liquid. The first brush 1 7 and the second brush 20 are in the cleaning tank! ! The side wall is attached through the bolt members 17a, 20a, and the amount of protrusion to the cylindrical drip roller 12 can be changed by adjusting the amount of locking of the bolt member. -9- (6) 1284567 In addition, the exhaust duct 2 2 on the side wall of the washing tank 1 is an opening, and at the bottom of the washing tank 1 1 is a rotating rod 2 3 and a direction in which the washing roller brush 19 is provided The roller brush 19 is sprayed with a nozzle 24 of a cleaning liquid or a nitrogen gas. The rotary lever 2 does not rotate by itself, and is in contact with the rotating roller brush 19 to remove the contamination of the solid coating liquid or the like adhering to the roller brush 19. The nozzle 24 is for ejecting a cleaning liquid or a nitrogen gas in order to remove contamination of the solid coating liquid or the like adhering to the roller brush 19. Further, the nozzle 24 is discharged from the nozzle 24 so that the nitrogen gas is not ejected, in order to prevent deterioration of the cleaning liquid. These rotary levers 2 3 and nozzles 24 are also available for use or individually. Further, as shown in Fig. 3, a liquid discharge port 2 connected to the recovery passage 25 is formed at the bottom of the washing tank 1 1, and the washing liquid in the washing tank 1 is passed through the filter core to be recovered, and This is carried out again by discharging the first and second circulating liquid shower nozzles 15 and 18 toward the liquid guiding drum 12. Further, the shape of the liquid discharge port 26 is formed so as to be upwardly expanded and expanded, and the recovery of the concentrated coating liquid or the like is easily performed by evaporation of the solvent. Instead of the discharge port 26 formed in a flared shape, the entire bottom surface of the cleaning tank 1 1 may be inclined toward the liquid discharge port 26. Further, the liquid level adjusting liquid discharge member 27 extending from the recovery passage 25 penetrates the bottom of the washing tank 1 1 and faces the inside of the washing tank 1 1 . The liquid level adjusting liquid discharge member 27 is formed by discharging the upper end into a liquid discharge □, and the upper and lower positions can be adjusted, and when the uppermost position is formed, the liquid level of the washing liquid is at the lower end of the liquid guiding drum 12 When it is formed at the uppermost position, at the lowest position -10 - (7) 1284567, the liquid level of the washing liquid is formed lower than the lower end of the liquid guiding drum 12. Further, when the roller brush 19 is set to the uppermost position of the liquid level adjusting drain member 27, the liquid level of the washing liquid is formed lower than the upper end of the roller brush 19, and at the lowest position. The liquid level of the cleaning liquid is formed higher than the lower end of the roller brush 19. According to the above configuration, in the case where the cleaning liquid is cleaned, the liquid level adjusting liquid discharge member 27 is formed at a high position, and the lower end of the liquid guiding drum 12 is directly immersed in the cleaning liquid, and When the concentration of the coating liquid in the cleaning liquid is increased, the height of the liquid level adjusting liquid discharge member 27 is lowered, and the cylindrical liquid introduction roller 12 is floated from the liquid surface of the cleaning surface, and the nozzle 15 is rinsed by the nozzle. , 1, 8 , 2 1 and the roller brush 1 9 to wash the surface of the liquid guiding roller 1 2 . Further, as shown in Fig. 4, the first circulating liquid shower nozzle 15 may be replaced with the first circulating liquid 2 fluid nozzle 2, and the second circulating liquid shower nozzle 18 may be replaced with a second circulating liquid spray nozzle. 29, the new liquid spray nozzle 2 1 is replaced by a new liquid 2 fluid nozzle 30. 2 The fluid nozzle is formed in a mist to blow a gas into the liquid, so the surface area of the liquid is larger to adhere to the cylindrical liquid. The coating liquid of the drum 12 is also more easily dissolved and easily removed. Moreover, the amount of the cleaning liquid used can be greatly reduced. Further, a bubbling nozzle 3 1 is provided at the bottom of the washing tank 1 1 and can also be replaced with the roller brush 19, and can also be used. The bubbling nozzle 31 is a liquid ejecting means, for example, a method of rinsing a certain amount of the cleaning liquid by spraying water, and rinsing the coating liquid adhering to the cylindrical dip roller 12, or contacting A method of rinsing a coating liquid containing a bubble and a method of rinsing a coating liquid. -11 - (8) 1284567 In addition, the waste liquid passage 3 2 connected to the liquid-gas separation tank (not shown) on the side of the first circulating fluid 2 fluid nozzle 28 is an opening, and the new liquid 2 fluid nozzle 3 The waste liquid passage 3 3 connected to the circulation buffer tank (not shown) on the side of 0 is an opening. Further, in the embodiment, the preliminary discharge device in which the new liquid shower nozzle is provided has been described, but the fresh liquid shower nozzle may not be provided, and only the preliminary discharge device of the circulating liquid shower nozzle may be provided. [Industrial Applicability] The preliminary discharge device of the slit coater according to the present invention is not limited to a semiconductor manufacturing device, and may be applied to an IT-related manufacturing device such as a liquid crystal display device or a plasma display device. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a general view of a coating apparatus incorporating a preliminary discharge device of the present invention. Fig. 2 is a general view of a preliminary discharge device of the present invention. Figure 3 is a diagram illustrating the liquid level adjustment. Fig. 4 is a general view showing another embodiment of the preliminary discharge device of the present invention. [Description of symbols] 1...Base 2...Support foot-12- (9) (9)1284567 3...Platform 4···Horizontal plate 5...Pin 6...through hole 7···Linear motor 8···Moving member 9···Slotted nozzle 1 1...washing>Cao 12...cylindrical liquid guiding drum 13 and 14···cover body 15...first circulating liquid shower nozzle 16...nozzle for discharging dry gas 1 7 ...first brush 1 7a, 20a...bolt member 18...second circulating liquid shower nozzle 19...roller brush 20···second brush 21...new liquid shower nozzle 22...exhaust duct 2 3...rotating rod 24...nozzle 25 for discharging a cleaning liquid or nitrogen gas...recovery passage 26...liquid discharge port 27...liquid level adjusting drain member-13 - (10) 1284567 28...first circulating fluid 2fluid nozzle 29...second cycle Liquid spray nozzle 3 0...new liquid 2 fluid nozzle 31...foaming nozzle 32...waste liquid passage (liquid gas separation tank) 3 3...waste liquid passage (circulation buffer tank) C...coating device
P···預備吐出裝置P···Preparation spit device
-14 --14 -
Claims (1)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002323554 | 2002-11-07 | ||
| JP2003361347A JP3877719B2 (en) | 2002-11-07 | 2003-10-22 | Pre-discharge device for slit coater |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200413103A TW200413103A (en) | 2004-08-01 |
| TWI284567B true TWI284567B (en) | 2007-08-01 |
Family
ID=32716019
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW092130979A TWI284567B (en) | 2002-11-07 | 2003-11-05 | A pre-discharging apparatus for a slit coater |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP3877719B2 (en) |
| KR (1) | KR20040041012A (en) |
| TW (1) | TWI284567B (en) |
Families Citing this family (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4324538B2 (en) * | 2004-10-04 | 2009-09-02 | 大日本スクリーン製造株式会社 | Substrate processing apparatus and substrate processing method |
| JP4727203B2 (en) * | 2004-10-18 | 2011-07-20 | 大日本スクリーン製造株式会社 | Substrate processing equipment |
| KR101234211B1 (en) * | 2004-12-31 | 2013-02-19 | 엘지디스플레이 주식회사 | Slit coater with a service unit for a nozzle and a fabricating method of liquid crystal display device using the same |
| KR100700180B1 (en) * | 2004-12-31 | 2007-03-27 | 엘지.필립스 엘시디 주식회사 | Slit coater having pre-spreading unit and method of coating using thereof |
| US20060147618A1 (en) * | 2004-12-31 | 2006-07-06 | Lg Philips Lcd Co., Ltd. | Slit coater with a service unit for a nozzle and a coating method using the same |
| JP4569357B2 (en) * | 2005-03-31 | 2010-10-27 | 凸版印刷株式会社 | Pre-discharge device |
| JP4725273B2 (en) * | 2005-09-29 | 2011-07-13 | 凸版印刷株式会社 | Spinless coating apparatus having preliminary ejection unit and method for producing color filter using the same |
| JP4762850B2 (en) * | 2005-11-16 | 2011-08-31 | 東京エレクトロン株式会社 | Rotating roll cleaning mechanism and rotating roll cleaning method |
| KR101264937B1 (en) * | 2005-11-16 | 2013-05-15 | 도쿄엘렉트론가부시키가이샤 | Cleaning mechanism of rotation roller and cleaning method of rotation roller |
| KR100756811B1 (en) * | 2005-11-24 | 2007-09-10 | 쥬가이로 고교 가부시키가이샤 | Discharge nozzle washing apparatus |
| JP4901200B2 (en) * | 2005-11-30 | 2012-03-21 | 東京応化工業株式会社 | Solvent recovery system |
| JP4624915B2 (en) * | 2005-12-06 | 2011-02-02 | 東京エレクトロン株式会社 | Rotating roll cleaning mechanism and rotating roll cleaning method |
| JP4986490B2 (en) | 2006-03-31 | 2012-07-25 | 東京応化工業株式会社 | Pre-discharge device |
| KR101206776B1 (en) * | 2006-06-09 | 2012-11-30 | 주식회사 케이씨텍 | Priming roller cleaning unit and method, and substrate coating apparatus with the cleaner |
| JP2008049226A (en) * | 2006-08-22 | 2008-03-06 | Tokyo Ohka Kogyo Co Ltd | Preliminary discharge device |
| KR101338789B1 (en) * | 2006-12-26 | 2013-12-06 | 주식회사 케이씨텍 | Pre-discharging apparatus for slit coater |
| KR101298891B1 (en) * | 2006-12-27 | 2013-08-21 | 주식회사 케이씨텍 | Pre-discharging apparatus for slit coater |
| KR200456618Y1 (en) | 2007-05-07 | 2011-11-09 | 주식회사 케이씨텍 | Pre-discharging apparatus for slit coater |
| JP5301120B2 (en) * | 2007-07-03 | 2013-09-25 | 東京応化工業株式会社 | Cleaning device, cleaning method, preliminary discharge device, and coating device |
| JP5144976B2 (en) * | 2007-07-03 | 2013-02-13 | 東京応化工業株式会社 | Cleaning device, cleaning method, preliminary discharge device, and coating device |
| JP5144977B2 (en) * | 2007-07-03 | 2013-02-13 | 東京応化工業株式会社 | Cleaning device, cleaning method, preliminary discharge device, coating device, and preliminary discharge method |
| JP5518284B2 (en) * | 2007-07-12 | 2014-06-11 | 東京応化工業株式会社 | NOZZLE CLEANING DEVICE, NOZZLE CLEANING METHOD, COATING DEVICE, AND COATING METHOD |
| JP4972504B2 (en) * | 2007-09-12 | 2012-07-11 | 大日本スクリーン製造株式会社 | Coating device |
| KR100989927B1 (en) * | 2008-07-09 | 2010-10-26 | (주)티에스티아이테크 | Apparatus for cleaning a roll |
| KR101484272B1 (en) * | 2008-11-28 | 2015-01-20 | 주식회사 디엠에스 | chemical solution pre-discharging apparatus |
| JP5383262B2 (en) * | 2009-03-11 | 2014-01-08 | パナソニック株式会社 | Slit coater preliminary discharge device |
| JP5121778B2 (en) * | 2009-06-26 | 2013-01-16 | 東京エレクトロン株式会社 | Priming processing method and priming processing apparatus |
| KR101091087B1 (en) | 2009-11-26 | 2011-12-09 | 세메스 주식회사 | Unit for preventing hardening of photoresist of a slit nozzle and apparatus for coating photoresist on a substrate having the unit |
| CN103008297A (en) * | 2011-09-22 | 2013-04-03 | 宜春青山能源有限公司 | Lithium ion power battery electrode rolling machine and cleaning device thereof |
| CN102962229A (en) * | 2012-08-03 | 2013-03-13 | 北京京东方光电科技有限公司 | Coating nozzle cleaning device |
| CN102806218A (en) * | 2012-08-21 | 2012-12-05 | 天津力神电池股份有限公司 | Roller C cleaning device and method for coating machine |
| KR101977627B1 (en) * | 2012-10-23 | 2019-05-13 | 세메스 주식회사 | Apparatus for dispensing photoresist |
| JP2015006656A (en) * | 2013-05-29 | 2015-01-15 | 東京エレクトロン株式会社 | Coating applicator and cleaning method of sealing part |
| JP2015021182A (en) * | 2013-07-23 | 2015-02-02 | 大日本印刷株式会社 | Liquid treatment device for metallic thin sheet |
| CN104943360B (en) * | 2014-03-28 | 2017-09-15 | 南京造币有限公司 | A kind of waste liquid circulation wipes version device and its implementation |
| CN108212616A (en) * | 2018-01-18 | 2018-06-29 | 武汉华星光电技术有限公司 | pre-coating device and method |
| CN108856113A (en) * | 2018-05-29 | 2018-11-23 | 武汉华星光电技术有限公司 | Coating nozzles cleaning device |
| CN111804487B (en) * | 2020-07-22 | 2021-12-07 | 宁夏盛泰龙建筑有限公司 | Painting device for protecting water conservancy pipelines |
-
2003
- 2003-10-22 JP JP2003361347A patent/JP3877719B2/en not_active Expired - Lifetime
- 2003-11-04 KR KR1020030077470A patent/KR20040041012A/en not_active Application Discontinuation
- 2003-11-05 TW TW092130979A patent/TWI284567B/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| JP3877719B2 (en) | 2007-02-07 |
| JP2004167476A (en) | 2004-06-17 |
| TW200413103A (en) | 2004-08-01 |
| KR20040041012A (en) | 2004-05-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI284567B (en) | A pre-discharging apparatus for a slit coater | |
| KR101099007B1 (en) | Preliminary spout apparatus for slit coater | |
| JP2006187763A (en) | Slit coater and method for manufacturing liquid crystal display device using it | |
| CN107251191B (en) | Substrate processing apparatus and control method of substrate processing apparatus | |
| JP3973578B2 (en) | Nozzle cleaning device | |
| JP3679904B2 (en) | NOZZLE CLEANING DEVICE AND COATING DEVICE HAVING THE NOZZLE CLEANING DEVICE | |
| JP2000147787A (en) | Method and device for developing | |
| JP2004121980A (en) | Method and apparatus for preliminary discharge | |
| JPH053184A (en) | Cleaning method of wafer | |
| TW201116340A (en) | Priming processing method and priming processing device | |
| KR200456618Y1 (en) | Pre-discharging apparatus for slit coater | |
| KR20070033129A (en) | Apparatus for washing chuck for wafer | |
| JP2930580B1 (en) | Cleaning equipment for semiconductor wafers | |
| JP3035450B2 (en) | Substrate cleaning method | |
| JP2002043210A (en) | Developing device | |
| JP3854166B2 (en) | Substrate processing equipment | |
| JP2008186983A (en) | Developing apparatus, and cleaning method of developing nozzle | |
| JPH06120133A (en) | Developer | |
| JP4371337B2 (en) | Coating nozzle cleaning device | |
| KR100687505B1 (en) | Preliminary dispensing apparatus of slit coater | |
| JP3266229B2 (en) | Processing method | |
| JPH1070100A (en) | Substrate treatment equipment | |
| JPH10113597A (en) | Nozzle cleaning device, nozzle cleaning and chemical liquid application device with nozzle cleaning device | |
| JP2000031108A (en) | Device and method for cleaning and drying wafer | |
| JP3823074B2 (en) | Development device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MK4A | Expiration of patent term of an invention patent |