JP2015021182A - Liquid treatment device for metallic thin sheet - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a liquid treatment device for a metallic thin sheet in which a treatment liquid is jetted on a sheet-shaped metallic thin sheet wound around the outer circumference of a cylindrical drum, where variation in liquid treatment in the axial direction of the drum can be reduced.SOLUTION: Provided is a liquid treatment device for a metallic thin sheet including: a cylindrical drum in which a sheet-shaped metallic thin sheet is wound around the outer circumference; a rotary driving mechanism of rotating the drum; a treatment liquid nozzle provided on the outside of the drum and jetting a treatment liquid on the metallic thin sheet wound around the outer circumference of the drum; and a squeegee provided on the outside of the drum and squeezing the treatment liquid on the metallic thin sheet wound around the outer circumference of the drum.

Description

  The present invention relates to a liquid processing apparatus for a metal thin plate that performs liquid processing by injecting a processing liquid onto a sheet metal sheet.

  Products such as lead frames, HDD read head suspension substrates, and display device vapor deposition masks, which are terminal parts of semiconductor devices, are obtained by etching a thin metal plate (thickness: 100 μm or less) with an etchant such as ferric chloride. Processed.

  Specifically, for example, when manufacturing a lead frame, a dry film resist is laminated on a continuous metal thin plate that is horizontally conveyed by a roll-to-roll method, and thereafter, exposure, development, etching, and resist are removed. Each process of peeling is given.

  For example, when manufacturing a suspension substrate for an HDD read head, a resist such as casein is formed on a continuous metal thin plate that is horizontally conveyed by a roll-to-roll method, and each step of exposure and development is performed. After that, it is cut into sheets. Next, etching is performed on the sheet-like metal thin plate that is transported horizontally, and the sheet is laminated through a peeling process for removing the resist.

  Further, for example, when manufacturing a vapor deposition mask for a display device, a resist (first coating) such as casein is formed on a continuous metal thin plate that is horizontally conveyed by a roll-to-roll method, and exposure, development, and first After each step of etching, second coating, second etching, and stripping to remove the resist, it is cut into a sheet (see Patent Document 1).

  By the way, when manufacturing any etching product, an etching process for injecting an etching solution to the metal thin plate is performed, but the etching solution is applied to a continuous metal thin plate that is horizontally conveyed by a roll to roll method. In the case of spraying, or in the case of spraying an etching solution onto a sheet metal sheet that is horizontally transported, it is necessary to secure a relatively large etching area in either case.

  Further, when the etching solution is sprayed on the upper surface of the thin metal plate that is horizontally conveyed, the etching solution supplied to the central portion of the thin metal plate is less likely to flow out than the etching solution supplied to the peripheral portion of the thin metal plate. Therefore, a liquid pool is formed by the reacted etching solution at the center of the metal thin plate, and the unreacted etching solution is difficult to reach the metal thin plate. On the other hand, exchange between the reacted etchant and the unreacted etchant is frequently performed at the peripheral edge of the metal thin plate. Thereby, there exists a possibility that the dispersion | variation in an etching process may arise between the center part and peripheral part of a metal thin plate.

  In order to solve these problems, a metal plate liquid processing apparatus has been developed that injects a processing liquid onto a sheet metal plate wound around an outer periphery of a cylindrical drum. The present applicant has applied for Japanese Patent Application No. 2013-1971 regarding such a metal sheet liquid processing apparatus.

JP 2004-39319 A

  As a result of further earnest research on the liquid processing apparatus for a metal thin plate according to Japanese Patent Application No. 2013-1971, the present inventor scraped the processing liquid on the metal thin plate wound around the outer periphery of the drum with a squeegee, thereby producing a drum It was found that the dispersion of the liquid treatment with respect to the axial direction can be reduced.

  The present invention has been created based on the above findings. An object of the present invention is to provide a metal thin plate liquid treatment apparatus for injecting a treatment liquid onto a sheet metal thin plate wound around the outer periphery of a cylindrical drum, and to reduce the dispersion of the liquid treatment in the axial direction of the drum. It is to provide a processing apparatus.

  The present invention provides a cylindrical drum around which a sheet-like metal thin plate is wound, a rotation drive mechanism for rotating the drum, and a metal thin plate provided outside the drum and wound around the outer periphery of the drum. A thin metal plate liquid processing apparatus comprising: a processing liquid nozzle that injects a liquid; and a squeegee that is provided outside the drum and scrapes off the processing liquid on the thin metal plate that is wound around the outer periphery of the drum. It is.

  According to the present invention, during the rotation of the drum, the processing liquid is sprayed from the processing liquid nozzle onto the metal thin plate wound around the outer periphery of the drum, so that liquid processing is uniformly performed in the circumferential direction of the drum. On the other hand, the processing liquid supplied to the central part of the thin metal plate in the axial direction of the drum is less likely to flow out than the processing liquid supplied to the peripheral part, but the processing liquid on the thin metal plate is scraped off by the squeegee. Thus, it is possible to prevent a liquid pool due to the treated liquid having been reacted from being formed on the metal thin plate (particularly, the central portion in the axial direction of the drum). Thereby, the dispersion | variation in the liquid process regarding the axial direction of a drum can also be reduced notably.

  Preferably, the squeegee is disposed so as to abut against a thin metal plate wound around the outer periphery of the drum. According to such an aspect, according to rotation of a drum, a process liquid can be reliably scraped off with a squeegee from the metal thin plate wound around the outer periphery of a drum. In this case, for example, when a metal thin plate on which a fragile film such as a resist film is formed is subjected to liquid treatment, a flexible squeegee is preferably employed so as not to damage the film.

  Or the said squeegee may be arrange | positioned so that the clearance gap between the range of 0.5 mm-30 mm may be opened with respect to the metal thin plate wound around the outer periphery of the said drum. According to the actual verification by the present inventors, according to such an aspect, the processing liquid can be surely scraped off from the thin metal plate wound around the outer periphery of the drum by the squeegee as the drum rotates. Further, according to such an aspect, since the squeegee is not in contact with the metal thin plate, the film is damaged even when the metal thin plate on which a fragile film such as a resist film is formed is subjected to liquid treatment. There is no fear.

  Preferably, a plurality of the treatment liquid nozzles are provided at intervals in the circumferential direction of the drum. According to such an aspect, since the processing liquid is ejected from a wide range with respect to the circumferential direction of the drum with respect to the metal thin plate wound around the outer periphery of the drum, the efficiency of the liquid processing in the entire metal thin plate is improved.

  Preferably, the rotation axis of the drum is horizontal. According to such an aspect, it is possible to prevent the processing liquid supplied on the metal thin plate from flowing in one direction in the axial direction of the drum due to gravity, and to further reduce variations in the liquid processing in the axial direction of the drum.

  Preferably, the squeegee is provided in a horizontal direction or a direction with an inclination angle with respect to the horizontal direction of −90 ° to + 90 °. According to the actual verification by the present inventors, with such an embodiment, the processing liquid flowing down along the circumferential direction from the upper surface side to the lower surface side of the drum can be effectively scraped off by the squeegee. This prevents the unreacted processing liquid sprayed toward the lower surface side of the drum from being hindered by the reacted processing liquid flowing down from the upper surface side. It is possible to efficiently exchange the unreacted processing solution. Thereby, the efficiency of the liquid processing in the whole metal thin plate improves.

  Specifically, for example, the squeegee is made of resin.

  According to the present invention, during the rotation of the drum, the processing liquid is sprayed from the processing liquid nozzle onto the metal thin plate wound around the outer periphery of the drum, so that liquid processing is uniformly performed in the circumferential direction of the drum. On the other hand, the processing liquid supplied to the central part of the thin metal plate in the axial direction of the drum is less likely to flow out than the processing liquid supplied to the peripheral part, but the processing liquid on the thin metal plate is scraped off by the squeegee. Thus, it is possible to prevent a liquid pool due to the treated liquid having been reacted from being formed on the metal thin plate (particularly, the central portion in the axial direction of the drum). Thereby, the dispersion | variation in the liquid process regarding the axial direction of a drum can also be reduced notably.

FIG. 1 is a schematic front view showing a metal sheet liquid processing apparatus according to a first embodiment of the present invention. FIG. 2 is a schematic left side view showing the liquid processing apparatus for the metal thin plate in FIG. 3 is an enlarged schematic front view showing a drum in the liquid processing apparatus for a thin metal plate in FIG. FIG. 4 is a schematic top view showing the drum of FIG. 3 in an enlarged manner. FIG. 5 is an enlarged schematic view showing protrusions provided on the outer peripheral surface of the drum shown in FIG. FIG. 6 is a schematic front view showing a liquid processing apparatus for a thin metal plate according to a second embodiment of the present invention.

  Embodiments of the present invention will be described below with reference to the drawings.

  FIG. 1 is a schematic front view showing a metal sheet liquid processing apparatus according to a first embodiment of the present invention. FIG. 2 is a schematic left side view showing the liquid processing apparatus for the metal thin plate in FIG.

  As shown in FIG. 1 and FIG. 2, the metal sheet liquid processing apparatus 10 according to this embodiment includes a cylindrical drum 11 around which a sheet metal sheet 20 is wound, and a rotation for rotating the drum 11. A driving mechanism 12, a processing liquid nozzle 13 provided on the outer side of the drum 11 and spraying a processing liquid on a metal thin plate 20 wound around the outer periphery of the drum 11, and provided on the outer side of the drum 11, And a squeegee 14 that scrapes off the treatment liquid on the metal thin plate 20 wound around the metal plate.

  In the present embodiment, as shown in FIGS. 1 and 2, a box-shaped processing tank 16 is disposed outside the drum 11. The drum 11, the treatment liquid nozzle 13, and the squeegee 14 are arranged inside the treatment tank 16, and the rotation drive mechanism 12 is arranged outside the treatment tank 16.

  In the present embodiment, the drum 11 is disposed in the processing tank 16 in a posture in which the rotation axis is oriented in the horizontal direction. The diameter of the drum 11 is 700 mm, for example, and the length in the axial direction is 2200 mm, for example. The material of the drum 11 is, for example, titanium or stainless steel, but is not limited thereto, and may be a hard synthetic resin.

  FIG. 3 is a schematic front view showing the drum 11 of the present embodiment in an enlarged manner, and FIG. 4 is a schematic top view showing the drum 11 in an enlarged manner.

  As shown in FIGS. 3 and 4, the metal thin plate 20 has a rectangular shape in plan view, and the length of the metal thin plate 20 in the longitudinal direction is shorter than the outer periphery of the drum 11, and the short direction of the metal thin plate 20 ( The length in the width direction is shorter than the length in the axial direction of the drum 11. A pair of openings 21 is formed at one end of the thin metal plate 20 in the longitudinal direction.

  On the other hand, a pair of protrusions 11 a are provided on the outer peripheral surface of the drum 11 so as to correspond to the pair of openings 21 of the thin metal plate 20. In the present embodiment, as shown in FIG. 5, an elastic member 11b having a diameter larger than that of the protrusion 11a is provided at the tip of each protrusion 11a. After the diameter of the elastic member 11b is reduced, the distal end portion of the protrusion 11a of the drum 11 is inserted into the opening 21 of the metal thin plate 20, and the opening 21 is lowered to the base end portion of the protrusion 11a. By restoring the diameter, the opening 21 of the thin metal plate 20 is prevented from being caught by the elastic member 11b and coming out of the protrusion 11a.

  As shown in FIGS. 3 and 4, a pair of magnets 11 c is embedded in the outer peripheral surface of the drum 11 at a position corresponding to the other end in the longitudinal direction of the thin metal plate 20. The other end in the longitudinal direction of the thin metal plate 20 is attracted to and fixed to the outer peripheral surface of the drum 11 by the magnetic force of the pair of magnets 11c.

  Returning to FIGS. 1 and 2, a rotating shaft 18 is inserted and fixed in the center of the drum 11 coaxially with the drum 11. As shown in FIG. 2, both ends of the rotating shaft 18 penetrate the wall surface of the processing tank 16 in a liquid-tight manner and extend to the outside of the processing tank 16, and one end of the rotating shaft 18 is connected to the rotation drive mechanism 12. The other end is rotatably supported by a rotary bearing 17.

  The rotation drive mechanism 12 is a motor, for example. By transmitting the rotational force of the rotational drive mechanism 12 to the rotational shaft 18, the drum 11 fixed to the rotational shaft 18 is rotationally driven around a horizontal rotational axis.

  As shown in FIG. 1, a processing liquid distribution pipe 31 having an annular shape is provided outside the drum 11 so as to be coaxial with the drum 11 so as to surround the drum 11. In the present embodiment, as shown in FIG. 2, a plurality of treatment liquid distribution pipes 31 are provided at intervals in the axial direction of the drum 11. A common processing liquid introduction pipe 32 communicates with each processing liquid distribution pipe 31, and the processing liquid introduction pipe 32 extends liquid-tightly through the wall surface of the processing tank 16 to the outside of the processing tank 16. It is being done. Then, outside the processing tank 16, the processing liquid introduction pipe 32 is connected to a processing liquid tank 34 via a pump 33. A pump control unit 36 that controls the operation of the pump 33 is connected to the pump 33. When the pump 33 is operated by the pump controller 36, the processing liquid stored in the processing liquid tank 34 is pushed out into the processing liquid introduction pipe 32 by the pump 33, and then into each processing liquid distribution pipe 31. It is to be distributed.

  In the present embodiment, as shown in FIG. 1, a plurality of processing liquid nozzles 13 are provided at intervals in the circumferential direction on the inner peripheral surface of each processing liquid distribution pipe 31. The processing liquid distributed from the processing liquid introduction pipe 32 into each processing liquid distribution pipe 31 by the operation of the pump 33 is ejected from each processing liquid nozzle 13 toward the outer periphery of the drum 11.

  As shown in FIG. 1, a drain pipe 35 is connected to the bottom surface of the processing tank 16, and the drain pipe 35 is connected to the processing liquid tank 34 described above. The processing liquid that flows down in the processing tank 16 and accumulates on the bottom surface is drained through the drainage pipe 35 and then collected in the processing liquid tank 34.

  In the present embodiment, as shown in FIGS. 1 and 2, the squeegee 14 is provided so as to protrude from the inner wall surface of the treatment tank 16 toward the outer peripheral surface of the drum 11, and is wound around the outer periphery of the drum 11. It arrange | positions so that it may contact | abut with respect to the thin metal plate 20 to be formed. The material of the squeegee 14 is, for example, a soft resin (for example, polyvinyl chloride).

  In the present embodiment, the squeegee 14 is provided in the horizontal direction or in the direction in which the inclination angle with respect to the horizontal direction is −90 ° to + 90 °. In the present specification, the upward inclination angle with respect to the horizontal direction is indicated by a positive sign (+), and the downward inclination angle is indicated by a negative sign (-). In the illustrated example, the squeegee 14 is provided in a direction where the inclination angle with respect to the horizontal direction is −30 °.

  As shown in FIG. 2, a pipe opening 15 is provided in a portion of the squeegee 14 corresponding to each processing liquid distribution pipe 31, and the pipe opening 15 is penetrated by each processing liquid distribution pipe 31. . That is, each processing liquid distribution pipe 31 is provided through the pipe opening 15 of the squeegee 14. This prevents physical interference between the treatment liquid distribution pipes 31 and the squeegee 14.

  Next, the operation of the present embodiment as described above will be described by taking as an example a step of performing an etching process by injecting an etching solution onto a sheet metal sheet.

  First, in a state where the drum 11 is detached from the rotary shaft 18, the sheet-like thin metal plate 20 is wound around the outer periphery of the drum 11. Specifically, for example, as shown in FIGS. 3 and 4, a pair of openings 21 provided at one end in the longitudinal direction of the thin metal plate 20 are fitted into a pair of protrusions 11 a provided on the outer peripheral surface of the drum 11. Combined. Next, the thin metal plate 20 is wound around the outer periphery of the drum 11, and the other end portion of the thin metal plate 20 in the longitudinal direction is attracted and fixed by the magnet 11c. Note that a resist film having at least one resist opening is formed in advance on the outer surface of the thin metal plate 20.

  Next, as shown in FIGS. 1 and 2, the drum 11 around which the thin metal plate 20 is wound is attached to the rotating shaft 18 and fixed. At this time, the squeegee 14 disposed outside the drum 11 is brought into contact with the metal thin plate 20 wound around the outer periphery of the drum 11. In the present embodiment, since the material of the squeegee 14 is a soft resin, the resist film on the metal thin plate 20 is prevented from being damaged by the contact of the squeegee 14.

  Next, the drum 11 is rotationally driven by the rotation driving mechanism 12 and an etching solution (for example, strong acid) is sprayed from each processing solution nozzle 13 onto the metal thin plate 20 wound around the outer periphery of the drum 11. The etching solution supplied onto the metal thin plate 20 erodes a portion of the metal thin plate 20 exposed from the resist opening of the resist film, and the metal thin plate 20 is etched.

  In the present embodiment, when the drum 11 rotates, the squeegee 14 disposed outside the drum 11 is relatively opposed to the rotation direction of the drum 11 on the metal thin plate 20 wound around the outer periphery of the drum 11. Will move. Therefore, the etching solution supplied onto the thin metal plate 20 is surely scraped off by the squeegee 14 in contact with the thin metal plate 20 as the drum 11 rotates. As a result, it is possible to prevent a liquid pool due to the reacted etching solution from being formed on the metal thin plate 20 (particularly, the central portion in the axial direction of the drum 11), and as a result, etching in the axial direction of the drum 11 is performed. Processing variations can be significantly reduced.

  The etching liquid that flows down in the processing tank 16 and accumulates on the bottom surface is drained through the drainage pipe 35 and then collected in the processing liquid tank 34.

  Thereafter, the rotation drive of the drum 11 by the rotation drive mechanism 12 is stopped, and the drum 11 is detached from the rotation shaft 18. Then, the etched metal thin plate 20 is removed from the outer periphery of the drum 11 by the reverse action.

  According to the actual verification by the present inventors, in the present embodiment as described above, when the squeegee 14 is provided in the horizontal direction or in the direction of the inclination angle with respect to the horizontal direction of −90 ° to + 90 °, the etching process is performed. It was confirmed that the squeegee 14 can effectively scrape off the etching solution that flows down along the circumferential direction from the upper surface side to the lower surface side of the drum 11. In this case, the unreacted etching liquid sprayed from the processing liquid nozzle 13 below the drum 11 toward the lower surface side of the drum 11 is hindered by the reacted etching liquid flowing down from the upper surface side of the drum 11. Can be prevented. This makes it possible to efficiently exchange the reacted etchant and the unreacted etchant on the lower surface side of the drum 11.

  According to the present embodiment as described above, the etching liquid is sprayed from the processing liquid nozzle 13 onto the metal thin plate 20 wound around the outer periphery of the drum 11 while the drum 11 is rotating, so that the circumferential direction of the drum 11 is increased. The etching process is performed uniformly. On the other hand, the etching solution supplied to the central portion in the axial direction of the drum 11 in the metal thin plate 20 is less likely to flow out than the etching solution supplied to the peripheral portion. By being scraped off, it is possible to prevent a liquid pool due to the reacted etching solution from being formed on the metal thin plate 20 (particularly, the central portion in the axial direction of the drum 11). Thereby, the dispersion | variation in the etching process regarding the axial direction of the drum 11 can be reduced significantly.

  Further, according to the present embodiment, since the squeegee 14 is disposed so as to contact the thin metal plate 20 wound around the outer periphery of the drum 11, the squeegee 14 is wound around the outer periphery of the drum 11 as the drum 11 rotates. The etching solution can be reliably scraped off from the metal thin plate 20 by the squeegee 14. In the present embodiment, since the squeegee 14 having flexibility is employed, even when the metal thin plate 20 on which a fragile film such as a resist film is formed is subjected to liquid treatment, the squeegee 14 abuts on the surface. Damage to the membrane can be prevented.

  In addition, according to the present embodiment, a plurality of the treatment liquid nozzles 13 are provided at intervals in the circumferential direction of the drum 11, so that the circumference of the drum 11 is set against the metal thin plate 20 wound around the outer circumference of the drum 11. Etching liquid is sprayed from a wide range with respect to the direction. Thereby, the efficiency of the etching process in the whole metal thin plate 20 improves.

  Further, according to the present embodiment, since the rotation axis of the drum 11 is horizontal, the etching solution supplied onto the metal thin plate 20 is prevented from flowing in one direction in the axial direction of the drum 11 due to gravity, Variations in the etching process with respect to the axial direction of the drum 11 can be further reduced.

  In this embodiment, the etching process is performed by spraying an etching solution onto the metal thin plate. However, the present invention is not limited to this. For example, an alkali solution is sprayed onto the metal thin plate to peel off a resin film such as a resist film. A process may be performed and a washing | cleaning process may be performed by injecting a washing | cleaning liquid to a metal thin plate.

  In the present embodiment, as shown in FIG. 1, only one squeegee 14 is provided in the circumferential direction of the drum 11. However, the present invention is not limited to this, and the squeegee 14 is spaced in the circumferential direction of the drum 11. A plurality of them may be provided.

  Moreover, in this Embodiment, as shown in FIG. 1, although the squeegee 14 was arrange | positioned so that the metal thin plate 20 wound around the outer periphery of the drum 11 might be contacted, it is not limited to this, It shows in FIG. As described above, the squeegee 14 ′ may be arranged so as to leave a gap in the range of 0.5 mm to 30 mm with respect to the metal thin plate 20 wound around the outer periphery of the drum 11 (second embodiment according to the present invention). ).

  According to the actual verification by the inventor of the present invention, according to the second embodiment as described above, the processing liquid is reliably supplied from the metal thin plate 20 wound around the outer periphery of the drum 11 by the squeegee 14 according to the rotation of the drum 11. Can be scraped off. Further, according to the second embodiment, since the squeegee 14 is not in contact with the thin metal plate 20, the thin metal plate 20 on which a fragile film such as a resist film is formed on the surface is liquid-treated. Even if it does, there is no possibility of damaging the film regardless of the flexibility of the squeegee 14.

DESCRIPTION OF SYMBOLS 10 Liquid processing apparatus 11 Drum 11a Protrusion 11b Elastic member 11c Magnet 12 Rotation drive mechanism 13 Processing liquid nozzle 14 Squeegee 14 'Squeegee 15 Pipe opening 16 Processing tank 17 Rotating bearing 20 Metal thin plate 21 Opening 31 Processing liquid distribution pipe 32 Processing liquid introduction Pipe 33 Pump 34 Treatment liquid tank 35 Drain pipe 36 Pump control unit

Claims (7)

A cylindrical drum around which a sheet metal sheet is wound, and
A rotation drive mechanism for rotating the drum;
A treatment liquid nozzle that is provided outside the drum and injects a treatment liquid onto a thin metal plate wound around the outer periphery of the drum;
A squeegee that is provided outside the drum and scrapes off the processing liquid on a thin metal plate wound around the outer periphery of the drum;
A liquid processing apparatus for a thin metal plate, comprising: The said thin squeegee is arrange | positioned so that it may contact | abut with respect to the metal thin plate wound around the outer periphery of the said drum, The liquid processing apparatus of the metal thin plate of Claim 1 characterized by the above-mentioned. The liquid processing apparatus for a thin metal plate according to claim 1, wherein the squeegee is disposed so as to leave a gap in a range of 0.5 mm to 30 mm with respect to the thin metal plate wound around the outer periphery of the drum. . 4. The thin metal plate liquid processing apparatus according to claim 1, wherein a plurality of the processing liquid nozzles are provided at intervals in a circumferential direction of the drum. 5. The liquid processing apparatus for a thin metal plate according to any one of claims 1 to 4, wherein the rotation axis of the drum is horizontal. 6. The liquid processing apparatus for a thin metal plate according to claim 5, wherein the squeegee is provided in a horizontal direction or in a direction with an inclination angle of −90 ° to + 90 ° with respect to the horizontal direction. The liquid processing apparatus for a metal thin plate according to any one of claims 1 to 6, wherein a material of the squeegee is resin.