JP4986490B2 - Pre-discharge device - Google Patents

Pre-discharge device Download PDF

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Publication number
JP4986490B2
JP4986490B2 JP2006096270A JP2006096270A JP4986490B2 JP 4986490 B2 JP4986490 B2 JP 4986490B2 JP 2006096270 A JP2006096270 A JP 2006096270A JP 2006096270 A JP2006096270 A JP 2006096270A JP 4986490 B2 JP4986490 B2 JP 4986490B2
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plate
squeegee
coating liquid
preliminary discharge
preliminary
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JP2007268391A (en
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博嗣 熊澤
英典 宮本
芳明 升
健司 吉澤
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Tokyo Ohka Kogyo Co Ltd
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Tokyo Ohka Kogyo Co Ltd
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Priority to JP2006096270A priority Critical patent/JP4986490B2/en
Priority to PCT/JP2007/052730 priority patent/WO2007116609A1/en
Priority to KR1020087022360A priority patent/KR101005955B1/en
Priority to TW096108313A priority patent/TW200738350A/en
Publication of JP2007268391A publication Critical patent/JP2007268391A/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0254Coating heads with slot-shaped outlet
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/26Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • B05C11/04Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface with blades
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/08Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
    • B05C9/10Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation being performed before the application
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/08Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
    • B05C9/12Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation being performed after the application

Landscapes

  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Description

本発明は、ガラス基板や半導体ウェハ等の基板表面にレジスト等の塗布液を塗布するスリットコータの予備吐出装置及び予備吐出方法に関するものである。   The present invention relates to a preliminary discharge apparatus and a preliminary discharge method for a slit coater for applying a coating liquid such as a resist onto a substrate surface such as a glass substrate or a semiconductor wafer.

スリットコータを用いて基板表面に塗布液をコートする場合、塗布作業が終了した後の次の基板に塗布するまでの待機期間中に、スリットノズルの先端部の塗布液が空気と接触するため塗布液の濃度が部分的に高くなり、部分的に塗布液の粘度が上昇してしまう。
このような状態で塗布作業を行うと、部分的な粘度むらにより縦筋等の塗布むらや膜切れが発生する。
このような不具合を解消するために、基板への塗布液の供給に先立ってスリットノズルの開口付近に存在する少量の塗布液を吐出させる予備吐出処理が行われている。
When coating the coating liquid on the substrate surface using a slit coater, the coating liquid at the tip of the slit nozzle comes into contact with air during the waiting period until the coating is performed on the next substrate after the coating operation is completed. The concentration of the liquid partially increases, and the viscosity of the coating liquid partially increases.
When the coating operation is performed in such a state, uneven coating such as vertical stripes or film breakage occurs due to partial viscosity unevenness.
In order to eliminate such problems, a preliminary discharge process is performed in which a small amount of coating liquid existing near the opening of the slit nozzle is discharged prior to the supply of the coating liquid to the substrate.

このような予備吐出処理を行う予備吐出装置として、プライミングローラを用い、スリットノズルからプライミングローラ上に少量の塗布液を吐出させるローラ方式の予備吐出装置が既知である(例えば特許文献1参照)。
この予備吐出装置では、洗浄液が収容されている洗浄槽内にプライミングローラを浸浸し、スリットノズルから吐出された塗布液をプライミングローラの回転に伴いスキージにより掻き落とすように構成されている。
As a preliminary ejection device that performs such preliminary ejection processing, a roller-type preliminary ejection device that uses a priming roller and ejects a small amount of coating liquid from a slit nozzle onto the priming roller is known (see, for example, Patent Document 1).
In this preliminary discharge device, a priming roller is immersed in a cleaning tank in which a cleaning liquid is stored, and the coating liquid discharged from the slit nozzle is scraped off by a squeegee as the priming roller rotates.

特開2005−329340号公報JP 2005-329340 A

ところで、上述したようなローラ方式の予備吐出装置は、ローラ自身を収容する洗浄槽を必要とするため装置自体の容積が大きくなり装置自体が大型化する欠点がある。また塗布される基板の大型化に伴いローラも大型化するため、ローラの加工精度を維持するのが困難になる欠点が生じていた。さらにローラ方式の場合、洗浄液中にプライミングローラを浸漬するために洗浄液の消費量が大量になり、ランニングコストも高価になる欠点も指摘されている。
またこれ以外にも、ローラ全体を常に清浄に保つために、スリットノズルのスリット長以上のスキージ(ローラ表面の塗布液かき取り用)が必要となるので、ローラの場合と同様スキージの加工精度の維持が困難であり、さらにはこのような大型化したスキージをローラに対して所定の角度で設けることに関しても精度の維持が困難であった。
またローラの清掃に欠陥が生じた場合、その欠陥が塗布自体に悪影響を与え易いという欠点がある。
By the way, the roller-type preliminary discharge device as described above requires a cleaning tank that accommodates the roller itself, so that the volume of the device itself increases and the size of the device itself increases. Further, since the roller is also enlarged with the increase in the size of the substrate to be coated, there has been a drawback that it is difficult to maintain the processing accuracy of the roller. Further, in the case of the roller method, it has been pointed out that the consumption of the cleaning liquid is large because the priming roller is immersed in the cleaning liquid, and the running cost is also expensive.
In addition, in order to keep the entire roller clean, a squeegee longer than the slit length of the slit nozzle (for scraping the coating liquid on the roller surface) is required. It is difficult to maintain, and furthermore, it is difficult to maintain accuracy with respect to providing such a large squeegee at a predetermined angle with respect to the roller.
Further, when a defect occurs in the cleaning of the roller, there is a drawback that the defect tends to adversely affect the coating itself.

本発明は上述した点に鑑み、装置自体が大型化することなく、またローラ自体に高い加工精度を必要としない予備吐出装置及び予備吐出方法を実現するものである。
さらに、本発明の他の目的は、洗浄液の消費量が比較的少量で済み、ランニングコストが安価な予備吐出装置及び予備吐出方法を実現するものである。
In view of the above, the present invention realizes a preliminary discharge device and a preliminary discharge method in which the apparatus itself does not increase in size and does not require high processing accuracy in the roller itself.
Furthermore, another object of the present invention is to realize a preliminary discharge apparatus and a preliminary discharge method in which the consumption of the cleaning liquid is relatively small and the running cost is low.

本発明の予備吐出装置は、基板表面への塗布に先立って、スリットノズルからの塗布液を吐出させるための予備吐出装置であって、スリットノズルと対向して配置され、スリットノズルのスリット開口の延在方向と同一の方向に延在する予備吐出面と、予備吐出面の近傍に、予備吐出面の表面に存在する塗布液を除去する除去機構が設けられている構成とする。   The preliminary ejection device of the present invention is a preliminary ejection device for ejecting the coating liquid from the slit nozzle prior to application to the surface of the substrate, and is disposed opposite to the slit nozzle, and has a slit opening of the slit nozzle. A pre-discharge surface extending in the same direction as the extending direction and a removal mechanism for removing the coating liquid existing on the surface of the pre-discharge surface are provided in the vicinity of the pre-discharge surface.

本発明の予備吐出装置によれば、スリットノズルと対向して配置され、スリットノズルのスリット開口の延在方向と同一の方向に延在する予備吐出面と、予備吐出面の近傍に、予備吐出面の表面に存在する塗布液を除去する除去機構が設けられているので、予備吐出面(仮想の基板)に塗布液を吐出するようにして実際の予備吐出処理を行うことが可能になる。これにより、例えばローラ方式の予備吐出装置の場合に比べて駆動装置を設ける必要もなく簡易な構造を得られると共に装置の大型化を抑えることができる。また製造コストも抑えることができる。さらにはローラ方式を用いていないので高い加工精度も必要としない。   According to the preliminary discharge device of the present invention, the preliminary discharge surface that is arranged to face the slit nozzle and extends in the same direction as the extension direction of the slit opening of the slit nozzle, and the preliminary discharge in the vicinity of the preliminary discharge surface Since the removal mechanism for removing the coating liquid existing on the surface of the surface is provided, it is possible to perform the actual preliminary discharge processing by discharging the coating liquid onto the preliminary discharge surface (virtual substrate). Accordingly, for example, it is not necessary to provide a driving device as compared with a roller type preliminary discharge device, and a simple structure can be obtained and an increase in size of the device can be suppressed. In addition, manufacturing costs can be reduced. Furthermore, since a roller system is not used, high machining accuracy is not required.

本発明の予備吐出方法は、基板表面への塗布に先立って、スリットノズルからの塗布液を吐出させるための予備吐出方法であって、スリットノズルが基板表面に塗布液を供給する間に、スリットノズルのスリット開口の延在方向と同一の方向に延在する予備吐出面上で除去機構を移動させることで、予備吐出面上に残存する塗布液を除去するようにする。   The preliminary ejection method of the present invention is a preliminary ejection method for ejecting a coating liquid from a slit nozzle prior to application to the substrate surface, and the slit nozzle is configured to supply the coating liquid to the substrate surface while the slit is being supplied. By moving the removing mechanism on the preliminary discharge surface extending in the same direction as the extension direction of the slit opening of the nozzle, the coating liquid remaining on the preliminary discharge surface is removed.

本発明の予備吐出方法によれば、スリットノズルが基板表面に塗布液を供給する間に、スリットノズルのスリット開口の延在方向と同一の方向に延在する予備吐出面上で除去機構を移動させることで、予備吐出面上に残存する塗布液を除去するようにしたので、例えばローラ方式の予備吐出方式に比べて簡易に予備吐出処理を行うことができ処理効率を向上させることができる。また、予備吐出処理中は例えば予備吐出面へ少量の洗浄液を供給するだけで構わなく、その後の除去機構の移動で塗布液を除去することができるので、例えばローラ方式の予備吐出方式に比べて洗浄液の消費量を大幅に削減することができる。   According to the preliminary discharge method of the present invention, while the slit nozzle supplies the coating liquid to the substrate surface, the removal mechanism is moved on the preliminary discharge surface extending in the same direction as the slit opening extending direction of the slit nozzle. By doing so, the coating liquid remaining on the preliminary discharge surface is removed, so that the preliminary discharge process can be easily performed as compared with, for example, the roller-type preliminary discharge method, and the processing efficiency can be improved. Further, during the preliminary ejection process, for example, it is only necessary to supply a small amount of cleaning liquid to the preliminary ejection surface, and the coating liquid can be removed by the subsequent movement of the removal mechanism. The consumption of cleaning liquid can be greatly reduced.

本発明の予備吐出装置によれば、構造的に簡易であり、また安価な予備吐出装置を得ることが可能になる。
また、本発明の予備吐出方法によれば、予備吐出処理の処理効率の向上及び洗浄液の削減をも図ることが可能になる。
According to the preliminary discharge device of the present invention, it is possible to obtain a preliminary discharge device that is structurally simple and inexpensive.
In addition, according to the preliminary discharge method of the present invention, it is possible to improve the processing efficiency of the preliminary discharge process and reduce the cleaning liquid.

以下、図面を参照して本発明の実施の形態を説明する。
図1及び図2は、本発明の予備吐出装置を具えるスリットコータの概略構成図を示し、図1は平面図、図2は図1のA―A線上の断面図である。また図3及び図4は予備吐出装置の概略構成図、図5は予備吐出装置の除去機構の詳細を示す側面図である。
図1及び図2に示すように、スリットコータは基台1を具え、基台1に一対のレール(2a,2b)が設けられている。レール(2a,2b)にはスリットノズル3が搭載された移動装置4が走行自在に配置され、レール(2a,2b)のほぼ中央に基板載置ステージ5が配置されている。そして、基板載置ステージ5上にガラス基板や半導体ウェハ等の基板Wが配置され、基板Wの表面にレジスト等の塗布液が塗布される。移動装置4は、レール(2a,2b)に係合する駆動部(6a,6b)とこれら駆動部間に架設したビーム(7a,7b)を具えている。
Embodiments of the present invention will be described below with reference to the drawings.
1 and 2 show a schematic configuration diagram of a slit coater including the preliminary ejection device of the present invention, FIG. 1 is a plan view, and FIG. 2 is a cross-sectional view taken along the line AA of FIG. 3 and 4 are schematic configuration diagrams of the preliminary ejection device, and FIG. 5 is a side view showing details of the removal mechanism of the preliminary ejection device.
As shown in FIGS. 1 and 2, the slit coater includes a base 1, and the base 1 is provided with a pair of rails (2 a and 2 b). A moving device 4 on which the slit nozzle 3 is mounted is movably disposed on the rails (2a, 2b), and a substrate placement stage 5 is disposed substantially at the center of the rails (2a, 2b). Then, a substrate W such as a glass substrate or a semiconductor wafer is disposed on the substrate mounting stage 5, and a coating liquid such as a resist is applied to the surface of the substrate W. The moving device 4 includes driving units (6a, 6b) that engage with the rails (2a, 2b) and beams (7a, 7b) installed between these driving units.

スリットノズル3は、2つの駆動装置(6a,6b)との間に昇降自在に支持され、レール(2a,2b)の延在方向と直交する方向に延在するスリット開口を有しており、塗布液はこのスリット開口を介して基板Wの表面に塗布される。スリットノズル3は、シリンジポンプ(図示せず)と連通すると共に塗布液供給チューブ(図示せず)共連通して1回分の塗布液が供給される。そして、1回の塗布が終了した後は、余分な塗布液は排出チューブを介して回収される。   The slit nozzle 3 is supported so as to be movable up and down between two drive devices (6a, 6b), and has a slit opening extending in a direction perpendicular to the extending direction of the rails (2a, 2b). The coating liquid is applied to the surface of the substrate W through this slit opening. The slit nozzle 3 communicates with a syringe pump (not shown) and communicates with a coating liquid supply tube (not shown) to supply one coating liquid. And after one application | coating is complete | finished, an excess coating liquid is collect | recovered via a discharge tube.

なお、基板W表面への塗布に際しては、例えばギャップセンサを用いてスリットノズルと基板W表面との間隔を測定し、図示しない昇降装置を駆動してスリットノズル3と基板W表面との間隔が所定の間隔に維持されるように調整する。   When applying to the surface of the substrate W, for example, a gap sensor is used to measure the distance between the slit nozzle and the surface of the substrate W, and a lifting device (not shown) is driven to set a predetermined distance between the slit nozzle 3 and the surface of the substrate W. Adjust so that the interval is maintained.

そして本実施の形態においては特に、基板載置ステージ5から離れた位置に設けられた予備吐出部10において、予備吐出装置が次に示すように構成されている。
即ち、予備吐出装置は、図3及び図4に示すように、スリットノズル3と対向するように配置され、スリットノズル3のスリット開口の延在方向と同一の方向に延在する予備吐出面20と、予備吐出面20の表面に存在する塗布液を除去する除去機構21等から構成されている。
In the present embodiment, in particular, in the preliminary discharge unit 10 provided at a position away from the substrate mounting stage 5, the preliminary discharge device is configured as follows.
That is, as shown in FIGS. 3 and 4, the preliminary ejection device is disposed so as to face the slit nozzle 3, and the preliminary ejection surface 20 extends in the same direction as the extension direction of the slit opening of the slit nozzle 3. And a removal mechanism 21 that removes the coating liquid present on the surface of the preliminary ejection surface 20.

予備吐出面20は板状のプレートで形成されており、このプレート20はドレインパン22に固定され、スリットノズル3のスリット開口の延在方向と同一の方向に延在している。ドレインパン22には、図示しないが、ドレインパン22自身を洗浄する洗浄液供給機構を独自で有している。またドレインパン22内を排気する排気機構も有している。
またプレート20の両端(20a,20b)は面取り加工されている。このように面取り加工することにより、後述するように、スキージ22がプレート20上を移動する際、スキージ22がプレート20の両端(20a,20b)により影響(接触による破損等)を受けることを防ぐことができる。
The preliminary discharge surface 20 is formed of a plate-like plate, and the plate 20 is fixed to the drain pan 22 and extends in the same direction as the extension direction of the slit opening of the slit nozzle 3. Although not shown, the drain pan 22 has a unique cleaning liquid supply mechanism for cleaning the drain pan 22 itself. An exhaust mechanism for exhausting the drain pan 22 is also provided.
Both ends (20a, 20b) of the plate 20 are chamfered. By chamfering in this way, as will be described later, when the squeegee 22 moves on the plate 20, the squeegee 22 is prevented from being affected (broken by contact, etc.) by both ends (20 a, 20 b) of the plate 20. be able to.

除去機構21は、図5に示すように、スキージ23が取り付けられた本体24と、この本体24に取り付けられた洗浄液供給機構25、乾燥機構26、吸引機構27とから構成されている。   As shown in FIG. 5, the removing mechanism 21 includes a main body 24 to which the squeegee 23 is attached, and a cleaning liquid supply mechanism 25, a drying mechanism 26, and a suction mechanism 27 attached to the main body 24.

除去機構21では、図示のようにプレート20上に配置された際に、可動方向(矢印A参照)を基準として、本体24の後段に乾燥機構26が、本体24前段に洗浄液供給機構25が配置されるように取り付けられている。吸引機構27は、本体24においてスキージ23が取り付けられた側とは反対側に取り付けられている。また本体30は支点Xを基準として動可能に取り付けられている。
なお、洗浄液供給機構25、乾燥機構26、吸引機構27の取り付け位置やプレート20に対する本体24の向き等は図示の場合に限定されず状況に応じて様々な形態が考えられる。
When the removal mechanism 21 is arranged on the plate 20 as shown in the drawing, the drying mechanism 26 is provided at the rear stage of the main body 24 and the cleaning liquid supply mechanism 25 is provided at the front stage of the main body 24 based on the movable direction (see arrow A). Installed to be placed. The suction mechanism 27 is attached to the main body 24 on the side opposite to the side on which the squeegee 23 is attached. The body 30 is mounted for rotation fulcrum X as a reference.
Note that the attachment positions of the cleaning liquid supply mechanism 25, the drying mechanism 26, and the suction mechanism 27, the orientation of the main body 24 with respect to the plate 20, and the like are not limited to the illustrated case, and various forms are conceivable depending on the situation.

このような構成の除去機構21では、図示しない駆動機構に設けられた押圧バネにより自身がプレート20に押圧されると共にスキージ23もプレート20に圧接される。そしてスリットノズル3の開口の延在方向と同一の方向(長手方向)に一体で移動し後述するような予備吐出処理を行う。なお、プレート20上に塗布液を吐出しない場合は、除去機構21はプレート20上から一旦上方へ離れ、プレート20に対して直行方向(矢印B参照)に移動し待機位置に戻る。即ちプレート20の横側へ移動する。   In the removing mechanism 21 having such a configuration, the pressing mechanism 20 is pressed against the plate 20 by a pressing spring provided in a driving mechanism (not shown) and the squeegee 23 is also pressed against the plate 20. And it moves integrally in the same direction (longitudinal direction) as the extending direction of the opening of the slit nozzle 3, and performs preliminary discharge processing as described later. When the coating liquid is not discharged onto the plate 20, the removal mechanism 21 temporarily moves upward from the plate 20, moves in a direction perpendicular to the plate 20 (see arrow B), and returns to the standby position. That is, it moves to the side of the plate 20.

スキージ23の端部(下端)は上述したようにプレート20の表面に対して圧接され、スキージ23とプレート20の表面との間には弾性圧接力が作用している。プレート20に対してのスキージ23の突き当て角度は例えば30〜75度(好ましくは45〜60度)の範囲で調整することができる。このような角度でスキージ23をプレート20に突き当てることにより塗布液のかき取り効果を高めることができる。   As described above, the end portion (lower end) of the squeegee 23 is pressed against the surface of the plate 20, and an elastic pressing force acts between the squeegee 23 and the surface of the plate 20. The abutting angle of the squeegee 23 with respect to the plate 20 can be adjusted within a range of, for example, 30 to 75 degrees (preferably 45 to 60 degrees). By scraping the squeegee 23 against the plate 20 at such an angle, the effect of scraping off the coating liquid can be enhanced.

スキージ23としては、プレート20よりも硬度が低く、耐溶剤性があり、弾性を有する材料からなるものが好ましい。本実施の形態ではポリエステルを用いているが、これ以外にも例えば弾性変形可能なゴム材料からなるものも用いることができる。   The squeegee 23 is preferably made of a material having lower hardness than the plate 20, solvent resistance, and elasticity. In this embodiment, polyester is used, but other than this, for example, a material made of a rubber material that can be elastically deformed can also be used.

洗浄液供給機構25には洗浄液を供給する洗浄液供給孔29が設けられている。この洗浄液供給機構25はプレート20上に洗浄液を供給できる構成であれば構わなく供給管やノズル形状等は様々な形態が考えられ、例えば複数のノズルを設けるようにしてプレート20上に異なる種類の洗浄液を供給することもできる。またこれ以外にもノズルの向き或いはノズルからの洗浄液の供給角度を変えることでプレート20だけでなくスキージ23に洗浄液を供給することもできる。この場合は別途スキージ23用の洗浄液供給機構を設ける必要もなく構成を簡素化できる。   The cleaning liquid supply mechanism 25 is provided with a cleaning liquid supply hole 29 for supplying a cleaning liquid. The cleaning liquid supply mechanism 25 may have any configuration as long as it can supply the cleaning liquid onto the plate 20. Various forms of supply pipes, nozzles, and the like are conceivable. For example, different types of nozzles may be provided on the plate 20 by providing a plurality of nozzles. A cleaning liquid can also be supplied. In addition, the cleaning liquid can be supplied not only to the plate 20 but also to the squeegee 23 by changing the direction of the nozzle or the supply angle of the cleaning liquid from the nozzle. In this case, it is not necessary to separately provide a cleaning liquid supply mechanism for the squeegee 23, and the configuration can be simplified.

乾燥機構26にはエアを供給するエア供給孔28が設けられている。この乾燥機構26も洗浄液供給機構25に類似して、プレート20上にエアを供給できる構成であれば構わなく供給管やノズル形状等は様々な形態が考えられる。例えばノズルの向き或いはノズルからのエアの供給角度を変えることでプレート20だけでなくスキージ23にエアを供給することもでき、この場合は別途スキージ23用の乾燥機構を設ける必要もなく構成を簡素化できる。   The drying mechanism 26 is provided with an air supply hole 28 for supplying air. The drying mechanism 26 is similar to the cleaning liquid supply mechanism 25 as long as it can supply air onto the plate 20, and various forms such as a supply pipe and a nozzle shape are conceivable. For example, air can be supplied not only to the plate 20 but also to the squeegee 23 by changing the direction of the nozzle or the air supply angle from the nozzle. In this case, there is no need to provide a separate drying mechanism for the squeegee 23 and the configuration is simplified. Can be

なおスキージ23用の洗浄液供給機構或いは乾燥機構を別途設ける場合は、プレート20の近傍(上側、下側、横側等)、除去機構21の移動終点位置近傍、除去機構21の待機位置近傍等に設けることができる。また除去機構21に一体に組み込むこともできる。   When a cleaning liquid supply mechanism or a drying mechanism for the squeegee 23 is separately provided, it is provided in the vicinity of the plate 20 (upper side, lower side, lateral side, etc.), in the vicinity of the movement end point position of the removal mechanism 21, in the vicinity of the standby position of the removal mechanism 21. Can be provided. Moreover, it can also be integrated in the removal mechanism 21 integrally.

吸引機構27は、図示しないが、本体24内を通じてスキージ23の近傍へと通じる吸引用のノズルから構成されている。   Although not shown, the suction mechanism 27 includes a suction nozzle that communicates with the squeegee 23 through the body 24.

このような本実施の形態の予備吐出装置によれば、スリットノズル3のスリット開口の延在方向と同一の方向に延在するプレート20と、このプレート20の近傍に、プレート20の表面に存在する塗布液を除去する除去機構21が設けられているので、後述するように実際にプレート20上で移動させた場合は、プレート(仮想の基板)20に正規の塗布工程と同様に塗布液を吐出して除去機構21によりプレート20上の塗布液を除去するという容易な予備吐出処理を行うことが可能になる(例えばローラ方式の予備吐出装置の場合に比べて)。
すなわち、本実施の形態の場合、板状のプレート20の幅と略同等の幅のスキージ23を単にスリットノズル3の開口の延在方向に移動させるといった簡易な構成なので、ローラ方式のようにローラの駆動機構やスリット長以上のスキージ等は必要なく、ローラ自体やスキージの取り付け方に高い精度も要求されない。このように、高い加工精度も要求されず大掛りな駆動装置も必要としないので製造コストが抑えられた簡易な装置構造を得ることができる。
According to such a preliminary discharge device of the present embodiment, the plate 20 extending in the same direction as the extending direction of the slit opening of the slit nozzle 3, and present on the surface of the plate 20 in the vicinity of the plate 20. Since the removing mechanism 21 for removing the coating liquid to be removed is provided, when the plate 20 is actually moved on the plate 20 as will be described later, the coating liquid is applied to the plate (virtual substrate) 20 in the same manner as the regular coating process. It is possible to perform an easy preliminary discharge process of discharging and removing the coating liquid on the plate 20 by the removing mechanism 21 (for example, as compared with a roller type preliminary discharge device).
That is, in the case of the present embodiment, since the squeegee 23 having a width substantially equal to the width of the plate-like plate 20 is simply moved in the direction in which the opening of the slit nozzle 3 extends, The drive mechanism and the squeegee longer than the slit length are not required, and high accuracy is not required for the roller itself and how to attach the squeegee. In this way, since a high machining accuracy is not required and a large drive device is not required, a simple device structure with reduced manufacturing cost can be obtained.

また除去機構21が、スキージ23及び洗浄液供給機構25、更には乾燥機構26や吸引機構27とから構成されているので、後述するように実際にプレート20上で移動させた場合は、プレート20上の塗布液を洗浄液でやわらかくしてスキージ23でかき取ることが可能になる。そして更に、吸引機構によりかき取った塗布液をダイレクトに吸引することもでき、かき取った後のプレート20をクリーンな状態に乾燥させることも可能になる。   Further, since the removing mechanism 21 is composed of the squeegee 23 and the cleaning liquid supply mechanism 25, and further, the drying mechanism 26 and the suction mechanism 27, when moved on the plate 20 as will be described later, The coating solution can be softened with a cleaning solution and scraped off with a squeegee 23. Furthermore, the coating liquid scraped off by the suction mechanism can be directly sucked, and the plate 20 after scraping can be dried in a clean state.

次に、上述した予備吐出装置を用いた実際の予備吐出方法(予備吐出処理)の実施の形態を説明する。本実施の形態では、塗布に際し、予備吐出部10をスタート位置とする。   Next, an embodiment of an actual preliminary discharge method (preliminary discharge process) using the above-described preliminary discharge device will be described. In the present embodiment, the pre-ejection unit 10 is set as a start position during application.

基板Wへの正規塗布工程が終了すると、図3に示したようにスリットノズル3はスタート位置である予備吐出部10に戻る。そしてスリットノズル3からプレート20へ、正規の塗布工程と同様な操作により所定量の塗布液を吐出(供給)する。
この際、スリットノズル3は、プレート20に近づくように下降し、例えばスリットノズル3の先端とプレート20の表面との間隔が例えば30μmとなるまで下降してビードを形成する。その後、スリットノズル3を例えば150〜200μm程度まで上昇させ、その間にポンプからの塗布液供給速度を基板Wへの塗布速度まで上げてスリットノズル3を移動させて所定量の塗布液を吐出する。
When the regular coating process on the substrate W is completed, the slit nozzle 3 returns to the preliminary ejection unit 10 which is the start position as shown in FIG. Then, a predetermined amount of coating liquid is discharged (supplied) from the slit nozzle 3 to the plate 20 by the same operation as in the regular coating process.
At this time, the slit nozzle 3 descends so as to approach the plate 20 and descends to form a bead, for example, until the distance between the tip of the slit nozzle 3 and the surface of the plate 20 becomes, for example, 30 μm. Thereafter, the slit nozzle 3 is raised to, for example, about 150 to 200 μm, and during that time, the coating liquid supply speed from the pump is increased to the coating speed on the substrate W, and the slit nozzle 3 is moved to discharge a predetermined amount of coating liquid.

プレート20上に塗布液を吐出した後、スリットノズル3は基板W上へ移動し基板Wへの正規塗布工程へ再び戻る。
具体的には、リニアモータが駆動されることで移動装置5が図面の右側に向けて移動し、スリットノズル3から基板Wの表面にレジスト等の塗布液を供給する。基板Wの表面への正規な塗布工程が終了すると、スリットノズル3は昇降しスタート位置まで戻る。
After the coating liquid is discharged onto the plate 20, the slit nozzle 3 moves onto the substrate W and returns to the regular coating process on the substrate W again.
Specifically, when the linear motor is driven, the moving device 5 moves toward the right side of the drawing, and a coating liquid such as a resist is supplied from the slit nozzle 3 to the surface of the substrate W. When the regular coating process on the surface of the substrate W is completed, the slit nozzle 3 moves up and down and returns to the start position.

このように次の基板Wへの正規塗布工程が再び行われ始めると、予備吐出部10では除去機構21が動作してプレート20上の塗布液の除去を始める。
即ち、除去機構21が待機位置からプレート20上に移動し、図4及び図5に示すようにプレート20上に対向して配置される。そして洗浄液供給機構25から洗浄液をプレート20上に供給する。
Thus, when the regular application process on the next substrate W starts to be performed again, the removal mechanism 21 operates in the preliminary ejection unit 10 to start removing the coating liquid on the plate 20.
That is, the removal mechanism 21 moves from the standby position onto the plate 20 and is disposed opposite to the plate 20 as shown in FIGS. Then, a cleaning liquid is supplied onto the plate 20 from the cleaning liquid supply mechanism 25.

次に除去機構21をプレート20上の一端から他端(図4及び図5中矢印A)へ移動することでプレート20上の塗布液をスキージ23によりかき取る。この際、洗浄液により塗布液の粘性は低下しておりプレート20上から塗布液をきれいにかき取ることができる。そしてこのかき取り動作にあわせて吸引機構27の駆動によりスキージ23に付いた塗布液をダイレクトに吸引する。
なお吸引はかき取り動作にあわせなくても構わなく、スキージ23が移動終点まで到達した時点で動作することもできる。また除去機構21の移動は1回きりではなく複数回行う場合も考えられる。
Next, the removal mechanism 21 is moved from one end on the plate 20 to the other end (arrow A in FIGS. 4 and 5) to scrape the coating solution on the plate 20 with the squeegee 23. At this time, the viscosity of the coating liquid is reduced by the cleaning liquid, and the coating liquid can be scraped cleanly from the plate 20. In accordance with this scraping operation, the application liquid attached to the squeegee 23 is directly sucked by driving the suction mechanism 27.
The suction may not be synchronized with the scraping operation, and can be performed when the squeegee 23 reaches the movement end point. In addition, the movement of the removal mechanism 21 may be performed multiple times instead of once.

次に乾燥機構26よりエアをプレート20上に供給してプレート20を乾燥する。そしてこの後は、除去機構21をプレート20上から一旦上方へ離し、プレート20に対して直行方向に移動させ(図4中矢印B参照)待機位置へと戻す。
なお、例えばスキージ23も洗浄液で洗浄し乾燥させる場合は、洗浄液供給機構や乾燥機構が設けられている箇所にもよるが(除去機構21に一体に設けられているかそれとも別途設けられているか)、待機位置に戻る前(プレート20の乾燥後)や待機位置に戻ってから行われる。
Next, air is supplied onto the plate 20 from the drying mechanism 26 to dry the plate 20. After that, the removal mechanism 21 is once moved upward from the plate 20 and moved in a direction perpendicular to the plate 20 (see arrow B in FIG. 4) to return to the standby position.
For example, when the squeegee 23 is also cleaned and dried with the cleaning liquid, depending on the location where the cleaning liquid supply mechanism and the drying mechanism are provided (whether they are provided integrally with the removal mechanism 21 or separately), This is performed before returning to the standby position (after the plate 20 is dried) or after returning to the standby position.

このような本実施の形態の予備吐出方法によれば、プレート20上に塗布液を吐出して洗浄液を供給後、スキージ23でかき取るだけの簡易な方法としたので、例えばローラ方式の予備吐出方式に比べて処理効率を向上できる。また、予備吐出処理中は洗浄液供給機構25から少量の洗浄液をプレート20上へ供給するだけで構わなく、例えばローラ方式の予備吐出方式に比べて洗浄液の消費量を大幅に削減することができる。
また、吸引機構27でスキージ23に付いた塗布液をダイレクトに吸引しているのでスキージ23を常に洗浄後に近い状態にすることができ処理中は最大のかき取り効果を維持することができる。またかき取り後のプレート20を乾燥機構26により乾燥させているので、プレート20上を常にクリーンな状態にすることもできる。
なお、プレート20だけでなくスキージ23を洗浄及び乾燥する場合は、よりクリーンな環境下で予備吐出処理を行うことができる。
According to the preliminary discharge method of the present embodiment as described above, since the coating liquid is discharged onto the plate 20 and the cleaning liquid is supplied, the simple method is simply scraped with the squeegee 23. The processing efficiency can be improved compared to the method. Further, during the preliminary discharge process, it is only necessary to supply a small amount of the cleaning liquid from the cleaning liquid supply mechanism 25 onto the plate 20, and for example, the consumption of the cleaning liquid can be greatly reduced as compared with the roller-type preliminary discharge system.
Further, since the coating liquid attached to the squeegee 23 is directly sucked by the suction mechanism 27, the squeegee 23 can always be brought into a close state after cleaning, and the maximum scraping effect can be maintained during the processing. Further, since the scraped plate 20 is dried by the drying mechanism 26, the plate 20 can always be kept clean.
In the case where not only the plate 20 but also the squeegee 23 is cleaned and dried, the preliminary ejection process can be performed in a cleaner environment.

上述した実施の形態の予備吐出装置では、予備吐出面20として板状のプレートを用いたが、これ以外にもベルト状のものを用いることもできる。
例えばベルトをローラ状に回転移動可能な構成とすれば、回転移動するベルトに対して固定されたスキージを当接することで、本実施の形態の構成(図3及び図4)と同様に塗布液をかき取ることができる。この場合、スキージはベルトに当接すればよいのでスキージの配置位置も特に限定されない。
In the preliminary discharge device of the above-described embodiment, a plate-like plate is used as the preliminary discharge surface 20, but a belt-like plate can also be used.
For example, if the belt is configured to be able to rotate and move in the form of a roller, the coating liquid can be applied in the same manner as in the configuration of the present embodiment (FIGS. 3 and 4) by bringing a fixed squeegee into contact with the rotating belt. Can be scraped off. In this case, since the squeegee only needs to abut on the belt, the arrangement position of the squeegee is not particularly limited.

また上述した実施の形態の予備吐出装置では、除去機構21が、スキージ23及び洗浄液供給機構25、更には乾燥機構26及び吸引機構27からなる場合を説明したが除去機構21の構成はこれに限定されない。即ち、塗布液の粘度が低く洗浄液をよりやわらかくする必要のない場合は、プレート20上の塗布液を単にかき取るという点では少なくともスキージ23を有していればよく、スキージ23のみの除去機構も考えられる。またこれ以外にもスキージ23と洗浄液供給機構25からなる除去機構も考えられる。
このように、状況下に応じて除去機構21の構成をさらに簡素化させることが可能なことはいうまでもない。無論除去機構21としては上述した構成とし、実際の処理中において必要のない工程を除く(工程を行わない)こともできる。
Further, in the preliminary ejection device of the above-described embodiment, the case where the removal mechanism 21 includes the squeegee 23 and the cleaning liquid supply mechanism 25, and further the drying mechanism 26 and the suction mechanism 27 has been described. Not. That is, when the viscosity of the coating solution is low and it is not necessary to make the cleaning solution softer, it is sufficient to have at least the squeegee 23 in that the coating solution on the plate 20 is simply scraped, and a mechanism for removing only the squeegee 23 is also provided. Conceivable. In addition, a removal mechanism including a squeegee 23 and a cleaning liquid supply mechanism 25 is also conceivable.
Thus, it goes without saying that the configuration of the removal mechanism 21 can be further simplified depending on the situation. Of course, the removing mechanism 21 has the above-described configuration, and it is also possible to exclude a process that is not necessary during actual processing (the process is not performed).

また上述した実施の形態の予備吐出装置では、除去機構21においてスキージ23を用いた場合を説明したが、例えばブラシ、エアナイフ或いはスポンジを用いることもできる。
また上述した実施の形態の予備吐出装置では、除去機構21において1つのスキージ23が設けられた場合を説明したが、複数設けられた構成とすることもできる。この場合、それぞれのスキージを同じ材料から形成しても構わなく異なる材料で形成しても構わない。このような構成によりかき取り効果を単に1つの場合に比べて大幅に向上することができる。
またスキージとブラシ或いはエアナイフとを組み合わせたり、ブラシとエアナイフを組み合わせることもできる。
またこれ以外にも、スキージとスポンジ、ブラシとスポンジ或いはエアナイフとスポンジのように組み合わせることにより、例えば塗布液のかき取り及びプレートの洗浄(拭き取り)をいっきに行うこともでき相乗効果を期待できる。
In the preliminary ejection device according to the above-described embodiment, the case where the squeegee 23 is used in the removing mechanism 21 has been described. However, for example, a brush, an air knife, or a sponge can be used.
In the preliminary ejection device according to the above-described embodiment, the case where one squeegee 23 is provided in the removal mechanism 21 has been described, but a configuration in which a plurality of squeegees are provided may be employed. In this case, each squeegee may be formed of the same material or different materials. With such a configuration, the scraping effect can be greatly improved as compared with the case of only one.
Also, a squeegee and a brush or an air knife can be combined, or a brush and an air knife can be combined.
In addition to this, by combining squeegee and sponge, brush and sponge, or air knife and sponge, for example, the coating liquid can be scraped off and the plate can be cleaned (wiped off) at the same time, and a synergistic effect can be expected.

また上述した実施の形態の予備吐出装置では、プレート20を例えば90度反転させ(垂直)、横面に取り付けられた除去機構21でプレート20の塗布液をかき取るようにする構成や、スリットノズル3より塗布液をプレート20上に吐出後にプレート20を180度反転させて、プレート20の下面に取り付けられた除去機構21で塗布液をかき取るようにすることもできる。   In the preliminary ejection device according to the above-described embodiment, the plate 20 is inverted 90 degrees (vertical), for example, and the coating liquid on the plate 20 is scraped off by the removing mechanism 21 attached to the lateral surface, or a slit nozzle 3, after discharging the coating liquid onto the plate 20, the plate 20 can be inverted 180 degrees, and the coating liquid can be scraped off by the removing mechanism 21 attached to the lower surface of the plate 20.

また上述した実施の形態の予備吐出装置では、例えばプレート20の端部においてスキージ23の先端がプレート20から離間するように(プレート20から上方へ離れるように)構成することもできる。例えば処理中における可動停止時にプレート20の端部においてスキージ23の先端がプレート20から離間することにより、スキージ22に不着した塗布液がプレート20上に残存する不具合が解消され、プレート20表面がクリーンな状態に維持される利点がある。
またこれ以外にも、プレート20に駆動機構を設け、プレート20が除去機構21(スキージ22)に対して離間する構成とすることもできる。
In the preliminary discharge device of the above-described embodiment, for example, the tip of the squeegee 23 may be configured to be separated from the plate 20 at the end portion of the plate 20 (so as to be separated upward from the plate 20). For example, when the movable stop is stopped during processing, the tip of the squeegee 23 is separated from the plate 20 at the end of the plate 20, thereby eliminating the problem that the coating liquid that does not adhere to the squeegee 22 remains on the plate 20 and the surface of the plate 20 is clean. There is an advantage of being maintained in a proper state.
In addition to this, a driving mechanism may be provided on the plate 20 so that the plate 20 is separated from the removal mechanism 21 (squeegee 22).

また上述した実施の形態の予備吐出装置では、除去機構21は最低限プレート20上に洗浄液を供給でき、プレート20上から塗布液を除去できればよいため、上述した実施の形態のようにプレート20の上側に位置するような構成に限定されず、プレート20の配置位置等により例えばプレート20に対して横側に設置することもできる。即ち、除去機構24の設置位置はプレート20に対し上側、下側、横側の何れかの箇所でも構わない。   Further, in the preliminary ejection device of the above-described embodiment, the removing mechanism 21 is required to supply at least the cleaning liquid onto the plate 20 and to remove the coating liquid from the plate 20. It is not limited to the structure located on the upper side, and can be installed on the lateral side with respect to the plate 20, for example, depending on the arrangement position of the plate 20 or the like. In other words, the installation position of the removal mechanism 24 may be any of the upper side, the lower side, and the lateral side with respect to the plate 20.

上述した実施の形態の予備吐出方法においては、スリットノズル3よりプレート20上へ塗布液を吐出した後、スキージ22でかき取る前に洗浄液をプレート20上に噴出したが、粘性が低ければ洗浄液を噴出せず単にスキージ22で塗布液をかき取ることも可能である。   In the preliminary discharge method of the above-described embodiment, after the coating liquid is discharged onto the plate 20 from the slit nozzle 3, the cleaning liquid is sprayed onto the plate 20 before scraping with the squeegee 22, but if the viscosity is low, the cleaning liquid is discharged. It is also possible to simply scrape off the coating solution with the squeegee 22 without spraying.

また上述した実施の形態の予備吐出装置では、スリットノズルを収容するガントリーを1個だけ有するスリットコータについて説明したが、基台上に2対のガントリーを具えるダブルガントリー方式にも適用することができる。   In the preliminary discharge device of the above-described embodiment, the slit coater having only one gantry that accommodates the slit nozzle has been described. However, it can also be applied to a double gantry method having two pairs of gantry on the base. it can.

なお、本発明は上述の実施の形態に限定されるものではなく、本発明の要旨を逸脱しない範囲でその他様々な構成が取り得る。 The present invention is not limited to the above-described embodiment, and various other configurations can be taken without departing from the gist of the present invention.

スリットコータの一例を示す平面図である。It is a top view which shows an example of a slit coater. 図1に示すスリットコータのA−A線上の断面図である。It is sectional drawing on the AA line of the slit coater shown in FIG. 本発明に係る予備吐出装置の一実施の形態を示す概略構成図(その1)である。It is a schematic block diagram (the 1) which shows one Embodiment of the preliminary discharge apparatus which concerns on this invention. 本発明に係る予備吐出装置の一実施の形態を示す概略構成図(その2)である。It is a schematic block diagram (the 2) which shows one Embodiment of the preliminary discharge apparatus which concerns on this invention. 図3及び図4に示す予備吐出装置の除去機構の詳細を示す側面図である。It is a side view which shows the detail of the removal mechanism of the preliminary discharge apparatus shown in FIG.3 and FIG.4.

符号の説明Explanation of symbols

1・・・基台、2a,2b・・・レール、3・・・スリットノズル、4・・・移動装置、5・・・基板載置ステージ、6a,6b・・・駆動部、7a,7b・・・ ビーム、10・・・予備吐出部、20・・・予備吐出面(プレート)、21・・・除去機構、22・・・ドレインパン、23・・・スキージ、24・・・本体、25・・・洗浄液供給機構、26・・・乾燥機構、27・・・吸引機構、28・・・エア供給孔、29・・・洗浄液供給孔   DESCRIPTION OF SYMBOLS 1 ... Base, 2a, 2b ... Rail, 3 ... Slit nozzle, 4 ... Moving device, 5 ... Substrate mounting stage, 6a, 6b ... Drive part, 7a, 7b・ ・ ・ Beam, 10 ・ ・ ・ Preliminary ejection part, 20 ・ ・ ・ Preliminary ejection surface (plate), 21 ... Removal mechanism, 22 ... Drain pan, 23 ... Squeegee, 24 ... Main body, 25 ... Cleaning liquid supply mechanism, 26 ... Drying mechanism, 27 ... Suction mechanism, 28 ... Air supply hole, 29 ... Cleaning liquid supply hole

Claims (4)

基板への塗布に先立って、スリットノズルからの塗布液を吐出させるための予備吐出装置において、
前記スリットノズルと対向して配置され、前記スリットノズルのスリット開口の延在方向と同一の方向に延在する予備吐出面と、
前記予備吐出面の近傍に、前記予備吐出面の表面に存在する塗布液を除去する除去機構が設けられ、
前記予備吐出面はドレインパンに固定される板状プレートからなり、
前記除去機構はスキージが取り付けられた本体と、この本体に取り付けられた洗浄液供給機構、乾燥機構及び吸引機構から構成され、前記本体は支点を中心として回動可能とされていることを特徴とする予備吐出装置。
Prior to the application to the substrate, in the preliminary discharge device for discharging the coating liquid from the slit nozzle,
A pre-ejection surface that is arranged facing the slit nozzle and extends in the same direction as the direction of extension of the slit opening of the slit nozzle;
In the vicinity of the preliminary discharge surface, a removal mechanism for removing the coating liquid present on the surface of the preliminary discharge surface is provided,
The preliminary discharge surface comprises a plate-like plate fixed to the drain pan,
The removal mechanism includes a main body to which a squeegee is attached, a cleaning liquid supply mechanism, a drying mechanism, and a suction mechanism attached to the main body, and the main body is rotatable about a fulcrum. Pre-discharge device.
請求項に記載の予備吐出装置において、前記スキージはポリエステルから形成されていることを特徴とする予備吐出装置。 2. The preliminary ejection device according to claim 1 , wherein the squeegee is made of polyester. 請求項に記載の予備吐出装置において、前記スキージが複数設けられていることを特徴とする予備吐出装置。 2. The preliminary ejection device according to claim 1 , wherein a plurality of the squeegees are provided. 請求項1に記載の予備吐出装置において、前記板状プレートの一端又は両端が面取り加工されていることを特徴とする予備吐出装置。 2. The preliminary ejection device according to claim 1, wherein one or both ends of the plate-like plate are chamfered.
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