WO2007116609A1 - Preliminary discharge device and preliminary discharge method - Google Patents

Preliminary discharge device and preliminary discharge method Download PDF

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Publication number
WO2007116609A1
WO2007116609A1 PCT/JP2007/052730 JP2007052730W WO2007116609A1 WO 2007116609 A1 WO2007116609 A1 WO 2007116609A1 JP 2007052730 W JP2007052730 W JP 2007052730W WO 2007116609 A1 WO2007116609 A1 WO 2007116609A1
Authority
WO
WIPO (PCT)
Prior art keywords
plate
preliminary
preliminary discharge
coating liquid
squeegee
Prior art date
Application number
PCT/JP2007/052730
Other languages
French (fr)
Japanese (ja)
Inventor
Hirotsugu Kumazawa
Hidenori Miyamoto
Yoshiaki Masu
Kenji Yoshizawa
Original Assignee
Tokyo Ohka Kogyo Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co., Ltd. filed Critical Tokyo Ohka Kogyo Co., Ltd.
Publication of WO2007116609A1 publication Critical patent/WO2007116609A1/en

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0254Coating heads with slot-shaped outlet
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/26Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • B05C11/04Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface with blades
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/08Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
    • B05C9/10Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation being performed before the application
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/08Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
    • B05C9/12Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation being performed after the application

Definitions

  • the present invention relates to a preliminary discharge apparatus and a preliminary discharge method for a slit coater for applying a coating liquid such as a resist onto the surface of a substrate such as a glass substrate or a semiconductor wafer.
  • a preliminary discharge process is performed in which a small amount of coating liquid existing near the opening of the slit nozzle is discharged prior to supplying the coating liquid to the substrate.
  • a roller-type preliminary ejection device that uses a priming roller and ejects a small amount of coating liquid onto the priming roller is known (for example, Patent Documents). 1).
  • the priming roller is immersed in the cleaning tank in which the cleaning liquid is stored, and the coating liquid discharged from the slit nozzle is scraped off by the squeegee as the priming roller rotates.
  • Patent Document 1 Japanese Patent Laid-Open No. 2005-329340
  • the roller-type pre-discharge device as described above has a disadvantage that the device itself has a large volume due to the need for a cleaning tank that accommodates the roller itself, and the device itself becomes large. Also, as the substrate to be coated becomes larger, the roller also becomes larger, so the processing accuracy of the roller is increased. There were drawbacks that made it difficult to maintain. Furthermore, in the case of the roller method, it has been pointed out that the consumption of the cleaning liquid becomes large because the priming roller is immersed in the cleaning liquid, and the running cost is also increased.
  • the present invention realizes a preliminary discharge apparatus and a preliminary discharge method without increasing the size of the apparatus itself and without requiring high V and processing accuracy for the roller itself. Furthermore, another object of the present invention is to realize a preliminary discharge apparatus and a preliminary discharge method in which the consumption of the cleaning liquid is relatively small and the running cost is low.
  • the preliminary ejection device of the present invention is a preliminary ejection device for ejecting a coating liquid such as a slit nozzle force prior to application to the substrate surface, and is disposed facing the slit nozzle.
  • a configuration in which a preliminary discharge surface extending in the same direction as the slit nozzle extension direction of the slit nozzle and a removal mechanism for removing the coating liquid existing on the surface of the preliminary discharge surface are provided in the vicinity of the preliminary discharge surface
  • the preliminary ejection surface that is arranged to face the slit nozzle and extends in the same direction as the extension direction of the slit opening of the slit nozzle, and the vicinity of the preliminary ejection surface
  • a removal mechanism for removing the coating liquid present on the surface of the preliminary ejection surface is provided, so that the actual preliminary ejection processing is performed by ejecting the coating liquid onto the preliminary ejection surface (virtual substrate). Is possible. This makes it possible to obtain a simple structure without the need for providing a drive device as compared with, for example, a roller-type pre-discharge device, and to suppress an increase in size of the device. In addition, manufacturing costs can be reduced.
  • the preliminary ejection method of the present invention is a preliminary ejection method for ejecting a coating liquid such as a slit nozzle force prior to application to the substrate surface, wherein the slit nozzle applies the coating liquid to the substrate surface. While supplying, the removal mechanism is moved on the preliminary discharge surface extending in the same direction as the slit nozzle extending direction so that the coating liquid remaining on the preliminary discharge surface is removed. To.
  • the removal is performed on the preliminary discharge surface extending in the same direction as the extension direction of the slit opening of the slit nozzle. Since the coating liquid remaining on the preliminary discharge surface is removed by moving the mechanism, the preliminary discharge processing can be performed more easily than, for example, the roller-type preliminary discharge method, and the processing efficiency can be improved. Can do. Further, during the preliminary discharge process, for example, the coating liquid can be removed by the movement of the removal mechanism which only needs to supply a small amount of cleaning liquid to the preliminary discharge surface. The consumption of can be greatly reduced.
  • the preliminary discharge device of the present invention it is possible to obtain a preliminary discharge device that is structurally simple and inexpensive.
  • the preliminary discharge method of the present invention it is possible to improve the processing efficiency of the preliminary discharge process and reduce the cleaning liquid.
  • FIG. 1 is a plan view showing an example of a slit coater.
  • FIG. 2 is a cross-sectional view of the slit coater shown in FIG.
  • FIG. 3 is a schematic block diagram (No. 1) showing an embodiment of a preliminary discharge device according to the present invention.
  • FIG. 4 is a schematic block diagram showing an embodiment of a preliminary discharge device according to the present invention (No. 1). 2)
  • FIG. 5 is a side view showing details of the removal mechanism of the preliminary ejection device shown in FIGS. 3 and 4.
  • FIGS. 1 and 2 are schematic configuration diagrams of a slit coater including the preliminary ejection device of the present invention.
  • FIG. 1 is a plan view and FIG. 2 is a cross-sectional view taken along line AA in FIG. 3 and 4 are schematic configuration diagrams of the preliminary ejection device, and
  • FIG. 5 is a side view showing details of the removal mechanism of the preliminary ejection device.
  • the slit coater has a base 1 as shown in FIG.
  • the base 1 is provided with a pair of rails (2a, 2b).
  • a moving device 4 on which the slit nozzle 3 is mounted is movably disposed, and a substrate mounting stage 5 is disposed at substantially the center of the rails (2a, 2b). Then, a substrate W such as a glass substrate or a semiconductor wafer is disposed on the substrate mounting stage 5, and a coating liquid such as a resist is applied to the surface of the substrate W.
  • the moving device 4 includes drive units (6a, 6b) that engage the rails (2a, 2b) and beams (7a, 7b) installed between these drive units.
  • the slit nozzle 3 is supported between two drive devices (6a, 6b) so as to be movable up and down.
  • a slit opening extending in a direction orthogonal to the extending direction of (2a, 2b) is provided, and the coating liquid is applied to the surface of the substrate W through the slit opening.
  • the slit nozzle 3 communicates with a syringe pump (not shown) and communicates with a coating liquid supply tube (not shown) to supply a single coating liquid. After one application, the excess coating solution is collected through the discharge tube.
  • a slit nozzle is used by using a gap sensor.
  • the distance between the slit nozzle 3 and the surface of the substrate W is measured, and an elevating device (not shown) is driven to adjust the distance between the slit nozzle 3 and the surface of the substrate W to be maintained at a predetermined distance.
  • the preliminary discharge device is configured as shown below in the preliminary discharge unit 10 provided at a position away from the substrate mounting stage 5. That is, as shown in FIGS. 3 and 4, the preliminary ejection device is disposed so as to face the slit nozzle 3, and the preliminary ejection surface 20 extends in the same direction as the extension direction of the slit opening of the slit nozzle 3. And a removing mechanism 21 that removes the coating liquid present on the surface of the preliminary ejection surface 20.
  • the preliminary discharge surface 20 is formed by a plate-like plate, and the plate 20 is a drain pan 22.
  • the slit nozzle 3 extends in the same direction as the slit opening direction.
  • the drain pan 22 has a cleaning liquid supply mechanism for cleaning the drain pan 22 itself. It also has an exhaust mechanism for exhausting the drain pan 22.
  • Both ends (20a, 20b) of the plate 20 are chamfered. By chamfering in this way, as will be described later, when the squeegee 22 moves on the plate 20, the squeegee 22 is influenced by both ends (20a, 20b) of the plate 20 (breakage due to contact, etc.). Can be prevented.
  • the removal mechanism 21 includes a main body 24 to which a squeegee 23 is attached, and a cleaning liquid supply mechanism 25, a drying mechanism 26, and a suction mechanism 27 attached to the main body 24. ing.
  • the drying mechanism 26 is provided upstream of the main body 24 and the cleaning liquid is supplied downstream of the main body 26 based on the movable direction (see arrow A).
  • a mechanism 25 is mounted to be placed.
  • the suction mechanism 27 is attached to the opposite side of the main body 24 to the side where the squeegee 23 is attached.
  • the main body 30 is movably attached with respect to the fulcrum X.
  • attachment positions of the cleaning liquid supply mechanism 25, the drying mechanism 26, and the suction mechanism 27, the orientation of the main body 24 with respect to the plate 20 and the like are not limited to the illustrated case, and various forms are conceivable depending on the situation.
  • the pressing panel provided in the driving mechanism presses itself against the plate 20 and the squeegee 23 is also pressed against the plate 20. Then, it moves integrally in the same direction (longitudinal direction) as the direction in which the opening of the slit nozzle 3 extends and performs a preliminary discharge process as described later.
  • the removal mechanism 21 temporarily moves upward from the plate 20, moves in a direction perpendicular to the plate 20 (see arrow B), and returns to the standby position. That is, it moves to the side of the plate 20.
  • the end portion (lower end) of the squeegee 23 is pressed against the surface of the plate 20 as described above, and an elastic pressure contact force acts between the squeegee 23 and the surface of the plate 20.
  • the abutment angle of the squeegee 23 against the plate 20 can be adjusted within a range of, for example, 30 to 75 degrees (preferably 45 to 60 degrees). At this angle, squeegee 23 is abutted against plate 20 As a result, the effect of removing the coating liquid can be enhanced.
  • the squeegee 23 is preferably a squeegee 23 having a lower hardness than the plate 20 and having a solvent resistance and an elastic material strength.
  • a force using polyester can be used besides this, for example, a rubber material force capable of elastic deformation.
  • the cleaning liquid supply mechanism 25 is provided with a cleaning liquid supply hole 29 for supplying a cleaning liquid.
  • the cleaning liquid supply mechanism 25 may have any configuration that can supply cleaning liquid onto the plate 20.
  • Various forms of supply pipes, nozzles, and the like are possible.
  • different types may be provided on the plate 20 by providing a plurality of nozzles.
  • the cleaning liquid can also be supplied.
  • the cleaning liquid can be supplied not only to the plate 20 but also to the squeegee 23 by changing the direction of the nozzle or the supply angle of the cleaning liquid having the nozzle force. In this case, it is not necessary to separately provide a cleaning liquid supply mechanism for the squeegee 23, and the configuration can be simplified.
  • the drying mechanism 26 is provided with an air supply hole 28 for supplying air.
  • the drying mechanism 26 is similar to the cleaning liquid supply mechanism 25 as long as it is configured to supply air onto the plate 20, and various forms of supply pipes, nozzle shapes, and the like are conceivable.
  • air can be supplied not only to the plate 20 but also to the squeegee 23 by changing the nozzle direction or the air supply angle from the nozzle. In this case, there is no need to provide a separate drying mechanism for the squeegee 23. Can be simplified.
  • the vicinity of the plate 20 (upper side, lower side, lateral side, etc.), the vicinity of the movement end point position of the removal mechanism 21, the removal mechanism 21 It can be provided near the standby position. It can also be integrated into the removal mechanism 21 as a single unit.
  • the suction mechanism 27 is a suction mechanism that leads to the vicinity of the squeegee 23 through the body 24.
  • Nozzle force for I is configured.
  • the plate 20 extending in the same direction as the extending direction of the slit opening of the slit nozzle 3, and the plate 20 Since there is a removal mechanism 21 that removes the coating liquid present on the surface, if it is actually moved on the plate 20 as described later, the plate (virtual substrate) 20 is the same as the regular coating process.
  • the coating liquid is discharged onto the plate 20 by the removal mechanism 21. It is possible to perform an easy preliminary discharge process of removing (for example, as compared with a roller type preliminary discharge device).
  • the squeegee 23 having a width substantially equal to the width of the plate-like plate 20 is simply moved in the direction in which the opening of the slit nozzle 3 extends,
  • the drive mechanism and the squeegee longer than the slit length are not required to have high precision in the required mouth ring itself or the way of attaching the squeegee.
  • a high processing accuracy is not required and a large drive device is not required, a simple device structure with reduced manufacturing cost can be obtained.
  • the removal mechanism 21 is composed of the squeegee 23, the cleaning liquid supply mechanism 25, and further the drying mechanism 26 and the suction mechanism 27, when it is actually moved on the plate 20 as described later,
  • the coating solution on the plate 20 can be softened with the cleaning solution and scraped off with the squeegee 23. Furthermore, the coating liquid scraped off by the suction mechanism can be directly sucked, and the plate 20 after being wiped off can be dried in a clean state.
  • the pre-ejection unit 10 is set as the start position when coating.
  • the slit nozzle 3 returns to the preliminary ejection unit 10 at the start position as shown in FIG. Then, a predetermined amount of coating liquid is discharged (supplied) from the slit nozzle 3 to the plate 20 by the same operation as in the regular coating process.
  • the slit nozzle 3 descends so as to approach the plate 20, and descends to form a bead, for example, until the distance between the tip of the slit nozzle 3 and the surface of the plate 20 becomes, for example, 30 ⁇ m. Thereafter, the slit nozzle 3 is raised to, for example, about 150 to 200 m, and during that time, the coating liquid supply speed such as the pump force is increased to the application speed to the substrate W, and the slit nozzle 3 is increased.
  • the slit nozzle 3 moves onto the substrate W and returns to the normal coating process on the substrate W again. Specifically, when the linear motor is driven, the moving device 5 moves toward the right side of the drawing, and a coating solution such as a resist is supplied from the slit nozzle 3 to the surface of the substrate W. When the regular coating process on the surface of the substrate W is completed, the slit nozzle 3 moves up and down and returns to the start position.
  • the preliminary ejection unit 10 removes it.
  • the removal mechanism 21 operates to start removing the coating solution on the plate 20.
  • the removal mechanism 21 also moves on the plate 20 in the standby position force, and is disposed opposite to the plate 20 as shown in FIGS. Then, the cleaning liquid is supplied onto the plate 20 from the cleaning liquid supply mechanism 25.
  • the removal mechanism 21 moves one end force on the plate 20 to the other end (arrow A in FIGS. 4 and 5), so that the coating solution on the plate 20 is scraped off by the squeegee 23. At this time, the viscosity of the coating solution is lowered by the cleaning solution, and the force on the plate 20 can be wiped off cleanly.
  • the suction mechanism 27 is driven to suck the coating liquid directly on the squeegee 23.
  • suction can be performed when the squeegee 23, which does not have to be synchronized with the force removal operation, reaches the movement end point.
  • the removal mechanism 21 may be moved several times instead of once.
  • the squeegee 23 when the squeegee 23 is also washed with a washing liquid and dried, it depends on the location where the washing liquid supply mechanism and the drying mechanism are provided (the removal mechanism 21 is integrated with the separation mechanism 21 or is provided separately. Before returning to the standby position (after the plate 20 has dried) or returning to the standby position, force is applied.
  • the preliminary discharge method of the present embodiment since the application liquid is discharged onto the plate 20 and the cleaning liquid is supplied, and then the simple method is simply squeezed by the squeegee 23.
  • the processing efficiency can be improved compared to the pre-discharge method of the roller method.
  • the squeegee 23 can always be in a state close to that after cleaning, and the maximum force removal effect can be maintained during processing. .
  • the plate 20 after the force is removed is dried by the drying mechanism 26, the plate 20 can always be kept clean.
  • the preliminary ejection process can be performed in a cleaner environment.
  • a plate-like plate is used as the preliminary ejection surface 20, but a belt-like one can also be used.
  • the belt is configured to be able to rotate and move in the form of a roller, it can be applied in the same manner as the configuration of this embodiment (FIGS. 3 and 4) by contacting a fixed squeegee against the rotating belt.
  • the cloth liquid can be swept away.
  • the position of the squeegee is not particularly limited because the squeegee only needs to contact the belt!
  • the removal mechanism 21 includes the squeegee 23 and the cleaning liquid supply mechanism 25, and further the drying mechanism 26 and the suction mechanism 27 has been described. It is not limited to this. In other words, when the viscosity of the coating solution is low and it is not necessary to soften the cleaning solution, only the squeegee 23 is sufficient if it has at least the squeegee 23 in terms of simply removing the coating solution on the plate 20. A mechanism for removing this is also conceivable. In addition, a removal mechanism comprising a squeegee 23 and a cleaning liquid supply mechanism 25 is also conceivable.
  • the configuration of the removal mechanism 21 can be further simplified depending on the situation.
  • the removal mechanism 21 has the above-described configuration, and during the actual processing, it is also possible to exclude the necessary steps (without performing the steps).
  • the force described in the case where the squeegee 23 is used in the removing mechanism 21 may be used, for example, a brush, an air knife, or a sponge. it can.
  • each squeegee 23 may be formed from the same material cover or from different materials. With such a configuration, the scraping effect can be greatly improved compared to the case of just one.
  • the plate 20 is inverted by 90 degrees, for example.
  • the configuration is such that the removal solution 21 attached to the side surface removes the coating solution on the plate 20, or the plate 20 is inverted 180 degrees after the coating solution is discharged onto the plate 20 from the slit nozzle 3. Then, remove the coating solution with the removal mechanism 21 attached to the lower surface of the plate 20.
  • the preliminary ejection device may be configured such that, for example, the tip of the squeegee 23 is separated from the plate 20 at the end portion of the plate 20 (away from the plate 20 upward).
  • the tip of the squeegee 23 moves away from the plate 20 at the end of the plate 20, thereby eliminating the problem that the coating liquid that does not adhere to the squeegee 22 remains on the plate 20, and the surface of the plate 20 is tally.
  • a drive mechanism may be provided on the plate 20 so that the plate 20 is separated from the removal mechanism 21 (squeegee 22).
  • the removal mechanism 21 can supply at least the cleaning liquid onto the plate 20, and the force on the plate 20 only needs to be able to remove the coating liquid. Therefore, as in the above-described embodiment.
  • the plate 20 is located on the upper side of the plate 20, and can be installed on the side of the plate 20, for example, depending on the arrangement position of the plate 20.
  • the installation position of the removal mechanism 24 may be on the upper side, the lower side, or the side of the plate 20.
  • the cleaning liquid is ejected onto the plate 20 before squeezing with the squeegee 22.
  • the preliminary ejection device of the above-described embodiment is also applied to a double gantry system having two pairs of gantry on the force base described for the slit coater having only one gantry that accommodates the slit nozzle. be able to.

Landscapes

  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

[PROBLEMS] To realize a preliminary discharge device which doesn’t require a enlarged size and a high machining accuracy for roller itself, and an amount of consumption of a washing fluid can be relatively smaller and the running cost can be lowered. [MEANS FOR SOLVING THE PROBLEMS] In a preliminary discharge device for discharging a coating liquid from a slit nozzle (3) prior to coating of a substrate (W) with the coating liquid, a preliminary discharge surface (20) is disposed to face the slit nozzle (3) and extends in the same direction as the extending direction of the slit opening in the slit nozzle (3), and a removal mechanism (21) for removing the coating liquid existing on the surface of the preliminary discharge surface (20) is installed near the preliminary discharge surface (20).

Description

明 細 書  Specification
予備吐出装置及び予備吐出方法  Pre-discharge device and pre-discharge method
技術分野  Technical field
[0001] 本発明は、ガラス基板や半導体ウェハ等の基板表面にレジスト等の塗布液を塗布 するスリットコータの予備吐出装置及び予備吐出方法に関するものである。  The present invention relates to a preliminary discharge apparatus and a preliminary discharge method for a slit coater for applying a coating liquid such as a resist onto the surface of a substrate such as a glass substrate or a semiconductor wafer.
背景技術  Background art
[0002] スリットコータを用いて基板表面に塗布液をコートする場合、塗布作業が終了した 後の次の基板に塗布するまでの待機期間中に、スリットノズルの先端部の塗布液が 空気と接触するため塗布液の濃度が部分的に高くなり、部分的に塗布液の粘度が上 昇してしまう。  [0002] When a coating solution is coated on the surface of a substrate using a slit coater, the coating solution at the tip of the slit nozzle comes into contact with air during the waiting period until the coating is performed on the next substrate after the coating operation is completed. As a result, the concentration of the coating liquid partially increases, and the viscosity of the coating liquid partially increases.
このような状態で塗布作業を行うと、部分的な粘度むらにより縦筋等の塗布むらや 膜切れが発生する。  When the coating operation is performed in such a state, uneven coating such as vertical stripes and film breakage occur due to uneven viscosity.
このような不具合を解消するために、基板への塗布液の供給に先立ってスリットノズ ルの開口付近に存在する少量の塗布液を吐出させる予備吐出処理が行われている  In order to eliminate such problems, a preliminary discharge process is performed in which a small amount of coating liquid existing near the opening of the slit nozzle is discharged prior to supplying the coating liquid to the substrate.
[0003] このような予備吐出処理を行う予備吐出装置として、プライミングローラを用い、スリ ットノズル力 プライミングローラ上に少量の塗布液を吐出させるローラ方式の予備吐 出装置が既知である (例えば特許文献 1参照)。 [0003] As a preliminary ejection device that performs such preliminary ejection processing, a roller-type preliminary ejection device that uses a priming roller and ejects a small amount of coating liquid onto the priming roller is known (for example, Patent Documents). 1).
この予備吐出装置では、洗浄液が収容されている洗浄槽内にプライミングローラを 浸浸し、スリットノズルから吐出された塗布液をプライミングローラの回転に伴 、スキー ジにより搔き落とすように構成されて 、る。  In this preliminary discharge device, the priming roller is immersed in the cleaning tank in which the cleaning liquid is stored, and the coating liquid discharged from the slit nozzle is scraped off by the squeegee as the priming roller rotates. The
[0004] 特許文献 1:特開 2005— 329340号公報 [0004] Patent Document 1: Japanese Patent Laid-Open No. 2005-329340
発明の開示  Disclosure of the invention
発明が解決しょうとする課題  Problems to be solved by the invention
[0005] ところで、上述したようなローラ方式の予備吐出装置は、ローラ自身を収容する洗浄 槽を必要とするため装置自体の容積が大きくなり装置自体が大型化する欠点がある 。また塗布される基板の大型化に伴いローラも大型化するため、ローラの加工精度を 維持するのが困難になる欠点が生じていた。さらにローラ方式の場合、洗浄液中に プライミングローラを浸漬するために洗浄液の消費量が大量になり、ランニングコスト も高価になる欠点も指摘されている。 By the way, the roller-type pre-discharge device as described above has a disadvantage that the device itself has a large volume due to the need for a cleaning tank that accommodates the roller itself, and the device itself becomes large. Also, as the substrate to be coated becomes larger, the roller also becomes larger, so the processing accuracy of the roller is increased. There were drawbacks that made it difficult to maintain. Furthermore, in the case of the roller method, it has been pointed out that the consumption of the cleaning liquid becomes large because the priming roller is immersed in the cleaning liquid, and the running cost is also increased.
またこれ以外にも、ローラ全体を常に清浄に保っために、スリットノズルのスリット長 以上のスキージ (ローラ表面の塗布液力き取り用)が必要となるので、ローラの場合と 同様スキージの加工精度の維持が困難であり、さらにはこのような大型化したスキー ジをローラに対して所定の角度で設けることに関しても精度の維持が困難であった。 またローラの清掃に欠陥が生じた場合、その欠陥が塗布自体に悪影響を与え易い という欠点がある。  In addition, in order to keep the entire roller clean, a squeegee longer than the slit length of the slit nozzle (for removing the coating liquid force on the roller surface) is required. In addition, it is difficult to maintain accuracy with respect to the provision of such a large squeegee at a predetermined angle with respect to the roller. In addition, when a defect occurs in the cleaning of the roller, there is a drawback that the defect tends to adversely affect the coating itself.
[0006] 本発明は上述した点に鑑み、装置自体が大型化することなぐまたローラ自体に高 V、加工精度を必要としな 、予備吐出装置及び予備吐出方法を実現するものである。 さらに、本発明の他の目的は、洗浄液の消費量が比較的少量で済み、ランニングコ ストが安価な予備吐出装置及び予備吐出方法を実現するものである。  In view of the above, the present invention realizes a preliminary discharge apparatus and a preliminary discharge method without increasing the size of the apparatus itself and without requiring high V and processing accuracy for the roller itself. Furthermore, another object of the present invention is to realize a preliminary discharge apparatus and a preliminary discharge method in which the consumption of the cleaning liquid is relatively small and the running cost is low.
課題を解決するための手段  Means for solving the problem
[0007] 本発明の予備吐出装置は、基板表面への塗布に先立って、スリットノズル力ゝらの塗 布液を吐出させるための予備吐出装置であって、スリットノズルと対向して配置され、 スリットノズルのスリット開口の延在方向と同一の方向に延在する予備吐出面と、予備 吐出面の近傍に、予備吐出面の表面に存在する塗布液を除去する除去機構が設け られている構成と [0007] The preliminary ejection device of the present invention is a preliminary ejection device for ejecting a coating liquid such as a slit nozzle force prior to application to the substrate surface, and is disposed facing the slit nozzle. A configuration in which a preliminary discharge surface extending in the same direction as the slit nozzle extension direction of the slit nozzle and a removal mechanism for removing the coating liquid existing on the surface of the preliminary discharge surface are provided in the vicinity of the preliminary discharge surface When
する。  To do.
[0008] 本発明の予備吐出装置によれば、スリットノズルと対向して配置され、スリットノズル のスリット開口の延在方向と同一の方向に延在する予備吐出面と、予備吐出面の近 傍に、予備吐出面の表面に存在する塗布液を除去する除去機構が設けられている ので、予備吐出面 (仮想の基板)に塗布液を吐出するようにして実際の予備吐出処 理を行うことが可能になる。これにより、例えばローラ方式の予備吐出装置の場合に 比べて駆動装置を設ける必要もなく簡易な構造を得られると共に装置の大型化を抑 えることができる。また製造コストも抑えることができる。さらにはローラ方式を用いてい な!、ので高 、力卩ェ精度も必要としな!/、。 [0009] 本発明の予備吐出方法は、基板表面への塗布に先立って、スリットノズル力ゝらの塗 布液を吐出させるための予備吐出方法であって、スリットノズルが基板表面に塗布液 を供給する間に、スリットノズルのスリット開口の延在方向と同一の方向に延在する予 備吐出面上で除去機構を移動させることで、予備吐出面上に残存する塗布液を除 去するようにする。 [0008] According to the preliminary ejection device of the present invention, the preliminary ejection surface that is arranged to face the slit nozzle and extends in the same direction as the extension direction of the slit opening of the slit nozzle, and the vicinity of the preliminary ejection surface In addition, a removal mechanism for removing the coating liquid present on the surface of the preliminary ejection surface is provided, so that the actual preliminary ejection processing is performed by ejecting the coating liquid onto the preliminary ejection surface (virtual substrate). Is possible. This makes it possible to obtain a simple structure without the need for providing a drive device as compared with, for example, a roller-type pre-discharge device, and to suppress an increase in size of the device. In addition, manufacturing costs can be reduced. In addition, the roller system is not used! [0009] The preliminary ejection method of the present invention is a preliminary ejection method for ejecting a coating liquid such as a slit nozzle force prior to application to the substrate surface, wherein the slit nozzle applies the coating liquid to the substrate surface. While supplying, the removal mechanism is moved on the preliminary discharge surface extending in the same direction as the slit nozzle extending direction so that the coating liquid remaining on the preliminary discharge surface is removed. To.
[0010] 本発明の予備吐出方法によれば、スリットノズルが基板表面に塗布液を供給する間 に、スリットノズルのスリット開口の延在方向と同一の方向に延在する予備吐出面上で 除去機構を移動させることで、予備吐出面上に残存する塗布液を除去するようにした ので、例えばローラ方式の予備吐出方式に比べて簡易に予備吐出処理を行うことが でき処理効率を向上させることができる。また、予備吐出処理中は例えば予備吐出 面へ少量の洗浄液を供給するだけで構わなぐその後の除去機構の移動で塗布液 を除去することができるので、例えばローラ方式の予備吐出方式に比べて洗浄液の 消費量を大幅に削減することができる。  According to the preliminary discharge method of the present invention, while the slit nozzle supplies the coating liquid to the substrate surface, the removal is performed on the preliminary discharge surface extending in the same direction as the extension direction of the slit opening of the slit nozzle. Since the coating liquid remaining on the preliminary discharge surface is removed by moving the mechanism, the preliminary discharge processing can be performed more easily than, for example, the roller-type preliminary discharge method, and the processing efficiency can be improved. Can do. Further, during the preliminary discharge process, for example, the coating liquid can be removed by the movement of the removal mechanism which only needs to supply a small amount of cleaning liquid to the preliminary discharge surface. The consumption of can be greatly reduced.
発明の効果  The invention's effect
[0011] 本発明の予備吐出装置によれば、構造的に簡易であり、また安価な予備吐出装置 を得ることが可能になる。  [0011] According to the preliminary discharge device of the present invention, it is possible to obtain a preliminary discharge device that is structurally simple and inexpensive.
また、本発明の予備吐出方法によれば、予備吐出処理の処理効率の向上及び洗 浄液の削減をも図ることが可能になる。  In addition, according to the preliminary discharge method of the present invention, it is possible to improve the processing efficiency of the preliminary discharge process and reduce the cleaning liquid.
図面の簡単な説明  Brief Description of Drawings
[0012] [図 1]スリットコータの一例を示す平面図である。  FIG. 1 is a plan view showing an example of a slit coater.
[図 2]図 1に示すスリットコータの A— A線上の断面図である。  FIG. 2 is a cross-sectional view of the slit coater shown in FIG.
[図 3]本発明に係る予備吐出装置の一実施の形態を示す概略構成図(その 1)である [図 4]本発明に係る予備吐出装置の一実施の形態を示す概略構成図(その 2)である  FIG. 3 is a schematic block diagram (No. 1) showing an embodiment of a preliminary discharge device according to the present invention. FIG. 4 is a schematic block diagram showing an embodiment of a preliminary discharge device according to the present invention (No. 1). 2)
[図 5]図 3及び図 4に示す予備吐出装置の除去機構の詳細を示す側面図である。 発明を実施するための最良の形態 FIG. 5 is a side view showing details of the removal mechanism of the preliminary ejection device shown in FIGS. 3 and 4. BEST MODE FOR CARRYING OUT THE INVENTION
[0013] 以下、図面を参照して本発明の実施の形態を説明する。 図 1及び図 2は、本発明の予備吐出装置を具えるスリットコータの概略構成図を示し 、図 1は平面図、図 2は図 1の A— A線上の断面図である。また図 3及び図 4は予備吐 出装置の概略構成図、図 5は予備吐出装置の除去機構の詳細を示す側面図である 図 1及び図 2に示すように、スリットコータは基台 1を具え、基台 1に一対のレール(2 a, 2b)が設けられている。レール(2a, 2b)にはスリットノズル 3が搭載された移動装 置 4が走行自在に配置され、レール(2a, 2b)のほぼ中央に基板載置ステージ 5が配 置されている。そして、基板載置ステージ 5上にガラス基板や半導体ウェハ等の基板 Wが配置され、基板 Wの表面にレジスト等の塗布液が塗布される。移動装置 4は、レ ール(2a, 2b)に係合する駆動部(6a, 6b)とこれら駆動部間に架設したビーム(7a, 7b)を具えている。 Hereinafter, embodiments of the present invention will be described with reference to the drawings. 1 and 2 are schematic configuration diagrams of a slit coater including the preliminary ejection device of the present invention. FIG. 1 is a plan view and FIG. 2 is a cross-sectional view taken along line AA in FIG. 3 and 4 are schematic configuration diagrams of the preliminary ejection device, and FIG. 5 is a side view showing details of the removal mechanism of the preliminary ejection device. As shown in FIGS. 1 and 2, the slit coater has a base 1 as shown in FIG. The base 1 is provided with a pair of rails (2a, 2b). On the rails (2a, 2b), a moving device 4 on which the slit nozzle 3 is mounted is movably disposed, and a substrate mounting stage 5 is disposed at substantially the center of the rails (2a, 2b). Then, a substrate W such as a glass substrate or a semiconductor wafer is disposed on the substrate mounting stage 5, and a coating liquid such as a resist is applied to the surface of the substrate W. The moving device 4 includes drive units (6a, 6b) that engage the rails (2a, 2b) and beams (7a, 7b) installed between these drive units.
[0014] スリットノズル 3は、 2つの駆動装置(6a, 6b)との間に昇降自在に支持され、レール  [0014] The slit nozzle 3 is supported between two drive devices (6a, 6b) so as to be movable up and down.
(2a, 2b)の延在方向と直交する方向に延在するスリット開口を有しており、塗布液は このスリット開口を介して基板 Wの表面に塗布される。スリットノズル 3は、シリンジポン プ(図示せず)と連通すると共に塗布液供給チューブ (図示せず)共連通して 1回分 の塗布液が供給される。そして、 1回の塗布が終了した後は、余分な塗布液は排出 チューブを介して回収される。  A slit opening extending in a direction orthogonal to the extending direction of (2a, 2b) is provided, and the coating liquid is applied to the surface of the substrate W through the slit opening. The slit nozzle 3 communicates with a syringe pump (not shown) and communicates with a coating liquid supply tube (not shown) to supply a single coating liquid. After one application, the excess coating solution is collected through the discharge tube.
[0015] なお、基板 W表面への塗布に際しては、例えばギャップセンサを用いてスリットノズ ル  [0015] When applying to the surface of the substrate W, for example, a slit nozzle is used by using a gap sensor.
と基板 W表面との間隔を測定し、図示しない昇降装置を駆動してスリットノズル 3と基 板 W表面との間隔が所定の間隔に維持されるように調整する。  The distance between the slit nozzle 3 and the surface of the substrate W is measured, and an elevating device (not shown) is driven to adjust the distance between the slit nozzle 3 and the surface of the substrate W to be maintained at a predetermined distance.
[0016] そして本実施の形態においては特に、基板載置ステージ 5から離れた位置に設け られた予備吐出部 10にお 、て、予備吐出装置が次に示すように構成されて 、る。 即ち、予備吐出装置は、図 3及び図 4に示すように、スリットノズル 3と対向するように 配置され、スリットノズル 3のスリット開口の延在方向と同一の方向に延在する予備吐 出面 20と、予備吐出面 20の表面に存在する塗布液を除去する除去機構 21等から 構成されている。 In the present embodiment, in particular, the preliminary discharge device is configured as shown below in the preliminary discharge unit 10 provided at a position away from the substrate mounting stage 5. That is, as shown in FIGS. 3 and 4, the preliminary ejection device is disposed so as to face the slit nozzle 3, and the preliminary ejection surface 20 extends in the same direction as the extension direction of the slit opening of the slit nozzle 3. And a removing mechanism 21 that removes the coating liquid present on the surface of the preliminary ejection surface 20.
[0017] 予備吐出面 20は板状のプレートで形成されており、このプレート 20はドレインパン 22 に固定され、スリットノズル 3のスリット開口の延在方向と同一の方向に延在している。 ドレインパン 22には、図示しないが、ドレインパン 22自身を洗浄する洗浄液供給機 構を独自で有して 、る。またドレインパン 22内を排気する排気機構も有して 、る。 またプレート 20の両端(20a, 20b)は面取り加工されている。このように面取り加工す ることにより、後述するように、スキージ 22がプレート 20上を移動する際、スキージ 22 がプレート 20の両端 (20a, 20b)により影響 (接触による破損等)を受けることを防ぐ ことができる。 The preliminary discharge surface 20 is formed by a plate-like plate, and the plate 20 is a drain pan 22. The slit nozzle 3 extends in the same direction as the slit opening direction. Although not shown, the drain pan 22 has a cleaning liquid supply mechanism for cleaning the drain pan 22 itself. It also has an exhaust mechanism for exhausting the drain pan 22. Both ends (20a, 20b) of the plate 20 are chamfered. By chamfering in this way, as will be described later, when the squeegee 22 moves on the plate 20, the squeegee 22 is influenced by both ends (20a, 20b) of the plate 20 (breakage due to contact, etc.). Can be prevented.
[0018] 除去機構 21は、図 5に示すように、スキージ 23が取り付けられた本体 24と、この本 体 24に取り付けられた洗浄液供給機構 25、乾燥機構 26、吸引機構 27とから構成さ れている。  As shown in FIG. 5, the removal mechanism 21 includes a main body 24 to which a squeegee 23 is attached, and a cleaning liquid supply mechanism 25, a drying mechanism 26, and a suction mechanism 27 attached to the main body 24. ing.
[0019] 除去機構 21では、図示のようにプレート 20上に配置された際に、可動方向(矢印 A 参照)を基準として、本体 24の前段に乾燥機構 26が、本体 26の後段に洗浄液供給 機構 25が配置されるように取り付けられている。吸引機構 27は、本体 24においてス キージ 23が取り付けられた側とは反対側に取り付けられて 、る。また本体 30は支点 Xを基準として可動可能に取り付けられて 、る。  [0019] When the removal mechanism 21 is arranged on the plate 20 as shown in the figure, the drying mechanism 26 is provided upstream of the main body 24 and the cleaning liquid is supplied downstream of the main body 26 based on the movable direction (see arrow A). A mechanism 25 is mounted to be placed. The suction mechanism 27 is attached to the opposite side of the main body 24 to the side where the squeegee 23 is attached. The main body 30 is movably attached with respect to the fulcrum X.
なお、洗浄液供給機構 25、乾燥機構 26、吸引機構 27の取り付け位置やプレート 2 0に対する本体 24の向き等は図示の場合に限定されず状況に応じて様々な形態が 考えられる。  Note that the attachment positions of the cleaning liquid supply mechanism 25, the drying mechanism 26, and the suction mechanism 27, the orientation of the main body 24 with respect to the plate 20 and the like are not limited to the illustrated case, and various forms are conceivable depending on the situation.
[0020] このような構成の除去機構 21では、図示しない駆動機構に設けられた押圧パネに より自身がプレート 20に押圧されると共にスキージ 23もプレート 20に圧接される。そ してスリットノズル 3の開口の延在方向と同一の方向(長手方向)に一体で移動し後述 するような予備吐出処理を行う。なお、プレート 20上に塗布液を吐出しない場合は、 除去機構 21はプレート 20上から一旦上方へ離れ、プレート 20に対して直行方向(矢 印 B参照)に移動し待機位置に戻る。即ちプレート 20の横側へ移動する。  In the removing mechanism 21 having such a configuration, the pressing panel provided in the driving mechanism (not shown) presses itself against the plate 20 and the squeegee 23 is also pressed against the plate 20. Then, it moves integrally in the same direction (longitudinal direction) as the direction in which the opening of the slit nozzle 3 extends and performs a preliminary discharge process as described later. When the coating liquid is not discharged onto the plate 20, the removal mechanism 21 temporarily moves upward from the plate 20, moves in a direction perpendicular to the plate 20 (see arrow B), and returns to the standby position. That is, it moves to the side of the plate 20.
[0021] スキージ 23の端部(下端)は上述したようにプレート 20の表面に対して圧接され、ス キージ 23とプレート 20の表面との間には弾性圧接力が作用している。プレート 20に 対してのスキージ 23の突き当て角度は例えば 30〜75度(好ましくは 45〜60度)の 範囲で調整することができる。このような角度でスキージ 23をプレート 20に突き当て ることにより塗布液の力き取り効果を高めることができる。 The end portion (lower end) of the squeegee 23 is pressed against the surface of the plate 20 as described above, and an elastic pressure contact force acts between the squeegee 23 and the surface of the plate 20. The abutment angle of the squeegee 23 against the plate 20 can be adjusted within a range of, for example, 30 to 75 degrees (preferably 45 to 60 degrees). At this angle, squeegee 23 is abutted against plate 20 As a result, the effect of removing the coating liquid can be enhanced.
[0022] スキージ 23としては、プレート 20よりも硬度が低ぐ耐溶剤性があり、弾性を有する 材料力もなるものが好ましい。本実施の形態ではポリエステルを用いている力 これ 以外にも例えば弾性変形可能なゴム材料力もなるものも用いることができる。  [0022] The squeegee 23 is preferably a squeegee 23 having a lower hardness than the plate 20 and having a solvent resistance and an elastic material strength. In the present embodiment, a force using polyester can be used besides this, for example, a rubber material force capable of elastic deformation.
[0023] 洗浄液供給機構 25には洗浄液を供給する洗浄液供給孔 29が設けられている。こ の洗浄液供給機構 25はプレート 20上に洗浄液を供給できる構成であれば構わなく 供給管やノズル形状等は様々な形態が考えられ、例えば複数のノズルを設けるよう にしてプレート 20上に異なる種類の洗浄液を供給することもできる。またこれ以外に もノズルの向き或いはノズル力もの洗浄液の供給角度を変えることでプレート 20だけ でなくスキージ 23に洗浄液を供給することもできる。この場合は別途スキージ 23用の 洗浄液供給機構を設ける必要もなく構成を簡素化できる。  The cleaning liquid supply mechanism 25 is provided with a cleaning liquid supply hole 29 for supplying a cleaning liquid. The cleaning liquid supply mechanism 25 may have any configuration that can supply cleaning liquid onto the plate 20. Various forms of supply pipes, nozzles, and the like are possible. For example, different types may be provided on the plate 20 by providing a plurality of nozzles. The cleaning liquid can also be supplied. In addition to this, the cleaning liquid can be supplied not only to the plate 20 but also to the squeegee 23 by changing the direction of the nozzle or the supply angle of the cleaning liquid having the nozzle force. In this case, it is not necessary to separately provide a cleaning liquid supply mechanism for the squeegee 23, and the configuration can be simplified.
[0024] 乾燥機構 26にはエアを供給するエア供給孔 28が設けられている。この乾燥機構 2 6も洗浄液供給機構 25に類似して、プレート 20上にエアを供給できる構成であれば 構わなく供給管やノズル形状等は様々な形態が考えられる。例えばノズルの向き或 いはノズルからのエアの供給角度を変えることでプレート 20だけでなくスキージ 23に エアを供給することもでき、この場合は別途スキージ 23用の乾燥機構を設ける必要も なく構成を簡素化できる。  The drying mechanism 26 is provided with an air supply hole 28 for supplying air. The drying mechanism 26 is similar to the cleaning liquid supply mechanism 25 as long as it is configured to supply air onto the plate 20, and various forms of supply pipes, nozzle shapes, and the like are conceivable. For example, air can be supplied not only to the plate 20 but also to the squeegee 23 by changing the nozzle direction or the air supply angle from the nozzle. In this case, there is no need to provide a separate drying mechanism for the squeegee 23. Can be simplified.
[0025] なおスキージ 23用の洗浄液供給機構或いは乾燥機構を別途設ける場合は、プレ ート 20の近傍 (上側、下側、横側等)、除去機構 21の移動終点位置近傍、除去機構 21の待機位置近傍等に設けることができる。また除去機構 21に一体に組み込むこと ちでさる。  [0025] When a cleaning liquid supply mechanism or a drying mechanism for the squeegee 23 is separately provided, the vicinity of the plate 20 (upper side, lower side, lateral side, etc.), the vicinity of the movement end point position of the removal mechanism 21, the removal mechanism 21 It can be provided near the standby position. It can also be integrated into the removal mechanism 21 as a single unit.
[0026] 吸引機構 27は、図示しないが、本体 24内を通じてスキージ 23の近傍へと通じる吸  [0026] Although not shown, the suction mechanism 27 is a suction mechanism that leads to the vicinity of the squeegee 23 through the body 24.
I用のノズル力 構成されて 、る。  Nozzle force for I is configured.
[0027] このような本実施の形態の予備吐出装置によれば、スリットノズル 3のスリット開口の 延在方向と同一の方向に延在するプレート 20と、このプレート 20の近傍に、プレート 20の表面に存在する塗布液を除去する除去機構 21が設けられているので、後述す るように実際にプレート 20上で移動させた場合は、プレート (仮想の基板) 20に正規 の塗布工程と同様に塗布液を吐出して除去機構 21によりプレート 20上の塗布液を 除去するという容易な予備吐出処理を行うことが可能になる(例えばローラ方式の予 備吐出装置の場合に比べて)。 [0027] According to such a preliminary discharge device of the present embodiment, the plate 20 extending in the same direction as the extending direction of the slit opening of the slit nozzle 3, and the plate 20 Since there is a removal mechanism 21 that removes the coating liquid present on the surface, if it is actually moved on the plate 20 as described later, the plate (virtual substrate) 20 is the same as the regular coating process. The coating liquid is discharged onto the plate 20 by the removal mechanism 21. It is possible to perform an easy preliminary discharge process of removing (for example, as compared with a roller type preliminary discharge device).
すなわち、本実施の形態の場合、板状のプレート 20の幅と略同等の幅のスキージ 23を単にスリットノズル 3の開口の延在方向に移動させるといった簡易な構成なので 、ローラ方式のようにローラの駆動機構やスリット長以上のスキージ等は必要なぐ口 ーラ自体やスキージの取り付け方に高い精度も要求されない。このように、高い加工 精度も要求されず大掛りな駆動装置も必要としないので製造コストが抑えられた簡易 な装置構造を得ることができる。  That is, in the case of the present embodiment, since the squeegee 23 having a width substantially equal to the width of the plate-like plate 20 is simply moved in the direction in which the opening of the slit nozzle 3 extends, The drive mechanism and the squeegee longer than the slit length are not required to have high precision in the required mouth ring itself or the way of attaching the squeegee. Thus, since a high processing accuracy is not required and a large drive device is not required, a simple device structure with reduced manufacturing cost can be obtained.
[0028] また除去機構 21が、スキージ 23及び洗浄液供給機構 25、更には乾燥機構 26や 吸引機構 27とから構成されているので、後述するように実際にプレート 20上で移動 させた場合は、プレート 20上の塗布液を洗浄液でやわら力べしてスキージ 23でかき 取ることが可能になる。そして更に、吸引機構によりかき取った塗布液をダイレクトに 吸引することもでき、力き取った後のプレート 20をクリーンな状態に乾燥させることも 可會 になる。 [0028] Since the removal mechanism 21 is composed of the squeegee 23, the cleaning liquid supply mechanism 25, and further the drying mechanism 26 and the suction mechanism 27, when it is actually moved on the plate 20 as described later, The coating solution on the plate 20 can be softened with the cleaning solution and scraped off with the squeegee 23. Furthermore, the coating liquid scraped off by the suction mechanism can be directly sucked, and the plate 20 after being wiped off can be dried in a clean state.
[0029] 次に、上述した予備吐出装置を用いた実際の予備吐出方法 (予備吐出処理)の実 施の形態を説明する。本実施の形態では、塗布に際し、予備吐出部 10をスタート位 置とする。  Next, an embodiment of an actual preliminary discharge method (preliminary discharge process) using the above-described preliminary discharge device will be described. In the present embodiment, the pre-ejection unit 10 is set as the start position when coating.
[0030] 基板 Wへの正規塗布工程が終了すると、図 3に示したようにスリットノズル 3はスター ト位置である予備吐出部 10に戻る。そしてスリットノズル 3からプレート 20へ、正規の 塗布工程と同様な操作により所定量の塗布液を吐出 (供給)する。  [0030] When the regular coating process on the substrate W is completed, the slit nozzle 3 returns to the preliminary ejection unit 10 at the start position as shown in FIG. Then, a predetermined amount of coating liquid is discharged (supplied) from the slit nozzle 3 to the plate 20 by the same operation as in the regular coating process.
この際、スリットノズル 3は、プレート 20に近づくように下降し、例えばスリットノ ズル 3の先端とプレート 20の表面との間隔が例えば 30 μ mとなるまで下降してビード を形成する。その後、スリットノズル 3を例えば 150〜200 m程度まで上昇させ、そ の間にポンプ力ゝらの塗布液供給速度を基板 Wへの塗布速度まで上げてスリットノズル 3  At this time, the slit nozzle 3 descends so as to approach the plate 20, and descends to form a bead, for example, until the distance between the tip of the slit nozzle 3 and the surface of the plate 20 becomes, for example, 30 μm. Thereafter, the slit nozzle 3 is raised to, for example, about 150 to 200 m, and during that time, the coating liquid supply speed such as the pump force is increased to the application speed to the substrate W, and the slit nozzle 3 is increased.
を移動させて所定量の塗布液を吐出する。  Is moved to discharge a predetermined amount of coating liquid.
[0031] プレート 20上に塗布液を吐出した後、スリットノズル 3は基板 W上へ移動し基板 Wへ の正規塗布工程へ再び戻る。 具体的には、リニアモータが駆動されることで移動装置 5が図面の右側に向けて移 動し、スリットノズル 3から基板 Wの表面にレジスト等の塗布液を供給する。基板 Wの 表面への正規な塗布工程が終了すると、スリットノズル 3は昇降しスタート位置まで戻 る。 [0031] After the coating liquid is discharged onto the plate 20, the slit nozzle 3 moves onto the substrate W and returns to the normal coating process on the substrate W again. Specifically, when the linear motor is driven, the moving device 5 moves toward the right side of the drawing, and a coating solution such as a resist is supplied from the slit nozzle 3 to the surface of the substrate W. When the regular coating process on the surface of the substrate W is completed, the slit nozzle 3 moves up and down and returns to the start position.
[0032] このように次の基板 Wへの正規塗布工程が再び行われ始めると、予備吐出部 10で は除  [0032] When the normal coating process on the next substrate W starts to be performed again in this way, the preliminary ejection unit 10 removes it.
去機構 21が動作してプレート 20上の塗布液の除去を始める。  The removal mechanism 21 operates to start removing the coating solution on the plate 20.
即ち、除去機構 21が待機位置力もプレート 20上に移動し、図 4及び図 5に示すよう にプレート 20上に対向して配置される。そして洗浄液供給機構 25から洗浄液をプレ ート 20上に供給する。  That is, the removal mechanism 21 also moves on the plate 20 in the standby position force, and is disposed opposite to the plate 20 as shown in FIGS. Then, the cleaning liquid is supplied onto the plate 20 from the cleaning liquid supply mechanism 25.
[0033] 次に除去機構 21をプレート 20上の一端力も他端(図 4及び図 5中矢印 A)へ移動す ることでプレート 20上の塗布液をスキージ 23によりかき取る。この際、洗浄液により塗 布液の粘性は低下しておりプレート 20上力も塗布液をきれいにかき取ることができる 。そしてこの力き取り動作にあわせて吸引機構 27の駆動によりスキージ 23に付いた 塗布液をダイレクトに吸弓 Iする。  Next, the removal mechanism 21 moves one end force on the plate 20 to the other end (arrow A in FIGS. 4 and 5), so that the coating solution on the plate 20 is scraped off by the squeegee 23. At this time, the viscosity of the coating solution is lowered by the cleaning solution, and the force on the plate 20 can be wiped off cleanly. In conjunction with this force removal operation, the suction mechanism 27 is driven to suck the coating liquid directly on the squeegee 23.
なお吸引は力き取り動作にあわせなくても構わなぐスキージ 23が移動終点まで到 達した時点で動作することもできる。また除去機構 21の移動は 1回きりではなく複数 回行う場合も考えられる。  Note that the suction can be performed when the squeegee 23, which does not have to be synchronized with the force removal operation, reaches the movement end point. In addition, the removal mechanism 21 may be moved several times instead of once.
[0034] 次に乾燥機構 26よりエアをプレート 20上に供給してプレート 20を乾燥する。そして この後は、除去機構 21をプレート 20上力もー且上方へ離し、プレート 20に対して直 行方向に移動させ (図 4中矢印 B参照)待機位置へと戻す。 Next, air is supplied onto the plate 20 from the drying mechanism 26 to dry the plate 20. Thereafter, the removal mechanism 21 is also released upwardly with the force on the plate 20 and moved in a direction perpendicular to the plate 20 (see arrow B in FIG. 4) to return to the standby position.
なお、例えばスキージ 23も洗浄液で洗浄し乾燥させる場合は、洗浄液供給機構や 乾燥機構が設けられている箇所にもよるが(除去機構 21に一体に設けられているか それとも別途設けられて 、る力 、待機位置に戻る前 (プレート 20の乾燥後)や待機 位置に戻って力 行われる。  For example, when the squeegee 23 is also washed with a washing liquid and dried, it depends on the location where the washing liquid supply mechanism and the drying mechanism are provided (the removal mechanism 21 is integrated with the separation mechanism 21 or is provided separately. Before returning to the standby position (after the plate 20 has dried) or returning to the standby position, force is applied.
[0035] このような本実施の形態の予備吐出方法によれば、プレート 20上に塗布液を吐出 して洗浄液を供給後、スキージ 23で力き取るだけの簡易な方法としたので、例えば口 ーラ方式の予備吐出方式に比べて処理効率を向上できる。また、予備吐出処理中 は洗浄液供給機構 25から少量の洗浄液をプレート 20上へ供給するだけで構わなく 、例えばローラ方式の予備吐出方式に比べて洗浄液の消費量を大幅に削減すること ができる。 [0035] According to the preliminary discharge method of the present embodiment as described above, since the application liquid is discharged onto the plate 20 and the cleaning liquid is supplied, and then the simple method is simply squeezed by the squeegee 23. The processing efficiency can be improved compared to the pre-discharge method of the roller method. Also, during pre-discharge process In this case, it is only necessary to supply a small amount of cleaning liquid from the cleaning liquid supply mechanism 25 onto the plate 20, and for example, the consumption of cleaning liquid can be greatly reduced as compared with the roller type preliminary discharge method.
また、吸引機構 27でスキージ 23に付いた塗布液をダイレクトに吸引しているのでス キージ 23を常に洗浄後に近い状態にすることができ処理中は最大の力き取り効果を 維持することができる。また力き取り後のプレート 20を乾燥機構 26により乾燥させて いるので、プレート 20上を常にクリーンな状態にすることもできる。  In addition, since the coating solution attached to the squeegee 23 is directly sucked by the suction mechanism 27, the squeegee 23 can always be in a state close to that after cleaning, and the maximum force removal effect can be maintained during processing. . In addition, since the plate 20 after the force is removed is dried by the drying mechanism 26, the plate 20 can always be kept clean.
なお、プレート 20だけでなくスキージ 23を洗浄及び乾燥する場合は、よりクリーンな 環境下で予備吐出処理を行うことができる。  In addition, when not only the plate 20 but also the squeegee 23 is washed and dried, the preliminary ejection process can be performed in a cleaner environment.
[0036] 上述した実施の形態の予備吐出装置では、予備吐出面 20として板状のプレートを 用いたが、これ以外にもベルト状のものを用いることもできる。 [0036] In the preliminary ejection device of the above-described embodiment, a plate-like plate is used as the preliminary ejection surface 20, but a belt-like one can also be used.
例えばベルトをローラ状に回転移動可能な構成とすれば、回転移動するベルト〖こ 対して固定されたスキージを当接することで、本実施の形態の構成(図 3及び図 4)と 同様に塗  For example, if the belt is configured to be able to rotate and move in the form of a roller, it can be applied in the same manner as the configuration of this embodiment (FIGS. 3 and 4) by contacting a fixed squeegee against the rotating belt.
布液を力き取ることができる。この場合、スキージはベルトに当接すればよいのでスキ ージの配置位置も特に限定されな!、。  The cloth liquid can be swept away. In this case, the position of the squeegee is not particularly limited because the squeegee only needs to contact the belt!
[0037] また上述した実施の形態の予備吐出装置では、除去機構 21が、スキージ 23及び 洗浄液供給機構 25、更には乾燥機構 26及び吸引機構 27からなる場合を説明した が除去機構 21の構成はこれに限定されない。即ち、塗布液の粘度が低く洗浄液をよ りやわら力べする必要のない場合は、プレート 20上の塗布液を単に力き取るという点 では少なくともスキージ 23を有していればよぐスキージ 23のみの除去機構も考えら れる。またこれ以外にもスキージ 23と洗浄液供給機構 25からなる除去機構も考えら れる。 In the preliminary ejection device of the above-described embodiment, the case where the removal mechanism 21 includes the squeegee 23 and the cleaning liquid supply mechanism 25, and further the drying mechanism 26 and the suction mechanism 27 has been described. It is not limited to this. In other words, when the viscosity of the coating solution is low and it is not necessary to soften the cleaning solution, only the squeegee 23 is sufficient if it has at least the squeegee 23 in terms of simply removing the coating solution on the plate 20. A mechanism for removing this is also conceivable. In addition, a removal mechanism comprising a squeegee 23 and a cleaning liquid supply mechanism 25 is also conceivable.
このように、状況下に応じて除去機構 21の構成をさらに簡素化させることが可能な ことはいうまでもない。無論除去機構 21としては上述した構成とし、実際の処理中に ぉ 、て必要のな!、工程を除く(工程を行わな 、)こともできる。  Thus, it goes without saying that the configuration of the removal mechanism 21 can be further simplified depending on the situation. Of course, the removal mechanism 21 has the above-described configuration, and during the actual processing, it is also possible to exclude the necessary steps (without performing the steps).
[0038] また上述した実施の形態の予備吐出装置では、除去機構 21においてスキージ 23 を用いた場合を説明した力 例えばブラシ、エアナイフ或いはスポンジを用いることも できる。 [0038] In the preliminary ejection device of the above-described embodiment, the force described in the case where the squeegee 23 is used in the removing mechanism 21 may be used, for example, a brush, an air knife, or a sponge. it can.
また上述した実施の形態の予備吐出装置では、除去機構 21において 1つのスキー ジ 23が設けられた場合を説明したが、複数設けられた構成とすることもできる。この 場合、それぞれのスキージを同じ材料カゝら形成しても構わなく異なる材料で形成して も構わない。このような構成によりかき取り効果を単に 1つの場合に比べて大幅に向 上することができる。  Further, in the preliminary discharge device of the above-described embodiment, the case where one squeegee 23 is provided in the removal mechanism 21 has been described, but a configuration in which a plurality of squeegees are provided may be employed. In this case, each squeegee may be formed from the same material cover or from different materials. With such a configuration, the scraping effect can be greatly improved compared to the case of just one.
またスキージとブラシ或いはエアナイフとを組み合わせたり、ブラシとエアナイフを 糸且み合わせることもできる。  It is also possible to combine a squeegee and a brush or an air knife, or to combine a brush and an air knife.
またこれ以外にも、スキージとスポンジ、ブラシとスポンジ或いはエアナイフとスポン ジのように組み合わせることにより、例えば塗布液の力き取り及びプレートの洗浄 (拭 き取り)をいつきに行うこともでき相乗効果を期待できる。  In addition, by combining squeegee and sponge, brush and sponge, or air knife and sponge, for example, it is possible to take off the coating liquid and clean (wipe off) the plate with a synergistic effect. Can be expected.
[0039] また上述した実施の形態の予備吐出装置では、プレート 20を例えば 90度反転させ [0039] In the preliminary ejection device of the above-described embodiment, the plate 20 is inverted by 90 degrees, for example.
(垂直)、横面に取り付けられた除去機構 21でプレート 20の塗布液を力き取るように する構成や、スリットノズル 3より塗布液をプレート 20上に吐出後にプレート 20を 180 度反転させて、プレート 20の下面に取り付けられた除去機構 21で塗布液をかき取る ようにすることちでさる。  (Vertical) The configuration is such that the removal solution 21 attached to the side surface removes the coating solution on the plate 20, or the plate 20 is inverted 180 degrees after the coating solution is discharged onto the plate 20 from the slit nozzle 3. Then, remove the coating solution with the removal mechanism 21 attached to the lower surface of the plate 20.
[0040] また上述した実施の形態の予備吐出装置では、例えばプレート 20の端部において スキージ 23の先端がプレート 20から離間するように(プレート 20から上方へ離れるよ うに)構成することもできる。例えば処理中における可動停止時にプレート 20の端部 においてスキージ 23の先端がプレート 20から離間することにより、スキージ 22に不着 した塗布液がプレート 20上に残存する不具合が解消され、プレート 20表面がタリー ンな状態に維持される利点がある。  [0040] In addition, the preliminary ejection device according to the above-described embodiment may be configured such that, for example, the tip of the squeegee 23 is separated from the plate 20 at the end portion of the plate 20 (away from the plate 20 upward). For example, when the movement stops during processing, the tip of the squeegee 23 moves away from the plate 20 at the end of the plate 20, thereby eliminating the problem that the coating liquid that does not adhere to the squeegee 22 remains on the plate 20, and the surface of the plate 20 is tally. Has the advantage of being maintained
またこれ以外にも、プレート 20に駆動機構を設け、プレート 20が除去機構 21 (スキー ジ 22)に対して離間する構成とすることもできる。  In addition to this, a drive mechanism may be provided on the plate 20 so that the plate 20 is separated from the removal mechanism 21 (squeegee 22).
[0041] また上述した実施の形態の予備吐出装置では、除去機構 21は最低限プレート 20 上に洗浄液を供給でき、プレート 20上力も塗布液を除去できればよいため、上述し た実施の形態のようにプレート 20の上側に位置するような構成に限定されず、プレー ト 20の配置位置等により例えばプレート 20に対して横側に設置することもできる。即 ち、除去機構 24の設置位置はプレート 20に対し上側、下側、横側の何れかの箇所 でも構わない。 [0041] In the preliminary ejection device of the above-described embodiment, the removal mechanism 21 can supply at least the cleaning liquid onto the plate 20, and the force on the plate 20 only needs to be able to remove the coating liquid. Therefore, as in the above-described embodiment. However, it is not limited to the configuration in which the plate 20 is located on the upper side of the plate 20, and can be installed on the side of the plate 20, for example, depending on the arrangement position of the plate 20. Immediately In other words, the installation position of the removal mechanism 24 may be on the upper side, the lower side, or the side of the plate 20.
[0042] 上述した実施の形態の予備吐出方法においては、スリットノズル 3よりプレート 20上 へ塗布液を吐出した後、スキージ 22で力き取る前に洗浄液をプレート 20上に噴出し た  In the preliminary ejection method of the above-described embodiment, after the coating liquid is ejected from the slit nozzle 3 onto the plate 20, the cleaning liquid is ejected onto the plate 20 before squeezing with the squeegee 22.
力 粘性が低ければ洗浄液を噴出せず単にスキージ 22で塗布液を力き取ることも可 能である。  Force If the viscosity is low, it is possible to squeeze the coating solution with the squeegee 22 without spraying the cleaning solution.
[0043] また上述した実施の形態の予備吐出装置では、スリットノズルを収容するガントリー を 1個だけ有するスリットコータについて説明した力 基台上に 2対のガントリーを具え るダブルガントリー方式にも適用することができる。  [0043] Further, the preliminary ejection device of the above-described embodiment is also applied to a double gantry system having two pairs of gantry on the force base described for the slit coater having only one gantry that accommodates the slit nozzle. be able to.
[0044] なお、本発明は上述の実施の形態に限定されるものではなぐ本発明の要旨を逸脱 しな 、範囲でその他様々な構成が取り得る。  It should be noted that the present invention is not limited to the above-described embodiments, and various other configurations can be taken within the scope without departing from the gist of the present invention.

Claims

請求の範囲 The scope of the claims
[1] 基板への塗布に先立って、スリットノズルからの塗布液を吐出させるための予備吐 出装置において、  [1] In a preliminary discharge device for discharging the coating liquid from the slit nozzle prior to coating on the substrate,
前記スリットノズルと対向して配置され、前記スリットノズルのスリット開口の延在方向 と同一の方向に延在する予備吐出面と、  A pre-ejection surface that is disposed opposite to the slit nozzle and extends in the same direction as the slit opening of the slit nozzle;
前記予備吐出面の近傍に、前記予備吐出面の表面に存在する塗布液を除去する 除去機構が設けられて ヽることを特徴とする予備吐出装置。  A pre-ejection apparatus characterized in that a removal mechanism for removing the coating liquid existing on the surface of the pre-ejection surface is provided in the vicinity of the pre-ejection surface.
[2] 請求項 1に記載の予備吐出装置において、前記除去機構はスキージと洗浄液供給 機構とから構成されて ヽることを特徴とする予備吐出装置。  [2] The preliminary ejection device according to [1], wherein the removal mechanism includes a squeegee and a cleaning liquid supply mechanism.
[3] 請求項 2に記載の予備吐出装置において、前記除去機構は乾燥機構及び吸引機 構も有して!/ヽることを特徴とする予備吐出装置。 [3] The preliminary ejection device according to [2], wherein the removal mechanism also has a drying mechanism and a suction mechanism.
[4] 請求項 2に記載の予備吐出装置において、前記スキージはポリエステル力も形成さ れて!、ることを特徴とする予備吐出装置。 4. The preliminary ejection device according to claim 2, wherein the squeegee is also formed with a polyester force!
[5] 請求項 2に記載の予備吐出装置において、前記スキージが複数設けられているこ とを特徴とする予備吐出装置。 5. The preliminary ejection device according to claim 2, wherein a plurality of the squeegees are provided.
[6] 請求項 1に記載の予備吐出装置において、前記予備吐出面は板状のプレートであ り、前記プレートの一端又は両端が面取り加工されていることを特徴とする予備吐出 装置。 6. The preliminary ejection device according to claim 1, wherein the preliminary ejection surface is a plate-like plate, and one or both ends of the plate are chamfered.
[7] 基板表面への塗布に先立って、スリットノズルからの塗布液を吐出させるための予 備吐出方法において、  [7] In the pre-discharge method for discharging the coating liquid from the slit nozzle prior to coating on the substrate surface,
前記スリットノズルが前記基板表面に塗布液を供給する間に、前記スリットノズルのス リット開口の延在方向と同一の方向に延在する予備吐出面上で除去機構を移動させ ることで、前記予備吐出面上に残存する塗布液を除去することを特徴とする予備吐 出方法。  While the slit nozzle supplies the coating liquid to the substrate surface, the removal mechanism is moved on the preliminary discharge surface extending in the same direction as the slit nozzle extending direction of the slit nozzle. A pre-discharge method, wherein the coating liquid remaining on the pre-discharge surface is removed.
[8] 請求項 7に記載の予備吐出方法において、前記予備吐出面上に残存する塗布液 を洗浄液で溶解させた後、溶解された塗布液をスキージで除去し、その後前記予備 吐出面を乾燥させることを特徴とする予備吐出方法。  [8] In the preliminary ejection method according to claim 7, after the coating liquid remaining on the preliminary ejection surface is dissolved with a cleaning liquid, the dissolved coating liquid is removed with a squeegee, and then the preliminary ejection surface is dried. A preliminary discharge method characterized in that
[9] 請求項 8に記載の予備吐出方法において、前記スキージを洗浄させることを特徴と することを特徴とする予備吐出方法。 [9] The preliminary ejection method according to claim 8, wherein the squeegee is washed. A preliminary discharge method characterized by:
[10] 請求項 7に記載の予備吐出方法において、前記除去機構の移動を複数回繰り返 すことを特徴とする予備吐出方法。  10. The preliminary discharge method according to claim 7, wherein the movement of the removal mechanism is repeated a plurality of times.
[11] 請求項 7に記載の予備吐出方法において、前記予備吐出面上に残存する塗布液 を除去した後、前記予備吐出面を洗浄液で洗浄し乾燥させることを特徴とする予備 吐出方法。 11. The preliminary discharge method according to claim 7, wherein after the coating liquid remaining on the preliminary discharge surface is removed, the preliminary discharge surface is washed with a cleaning liquid and dried.
PCT/JP2007/052730 2006-03-31 2007-02-15 Preliminary discharge device and preliminary discharge method WO2007116609A1 (en)

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