CN108856113A - Coating nozzles cleaning device - Google Patents
Coating nozzles cleaning device Download PDFInfo
- Publication number
- CN108856113A CN108856113A CN201810528351.8A CN201810528351A CN108856113A CN 108856113 A CN108856113 A CN 108856113A CN 201810528351 A CN201810528351 A CN 201810528351A CN 108856113 A CN108856113 A CN 108856113A
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- Prior art keywords
- roller
- accommodating chamber
- cleaning device
- main
- liquid accommodating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000004140 cleaning Methods 0.000 title claims abstract description 218
- 239000011248 coating agent Substances 0.000 title claims abstract description 61
- 238000000576 coating method Methods 0.000 title claims abstract description 61
- 239000007788 liquid Substances 0.000 claims abstract description 240
- 239000002699 waste material Substances 0.000 claims description 22
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 49
- 239000000203 mixture Substances 0.000 abstract description 21
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 7
- 241001131688 Coracias garrulus Species 0.000 description 136
- 239000000243 solution Substances 0.000 description 41
- 230000000694 effects Effects 0.000 description 9
- 238000010586 diagram Methods 0.000 description 7
- 230000009286 beneficial effect Effects 0.000 description 6
- 239000011521 glass Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 3
- 230000003749 cleanliness Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 238000002386 leaching Methods 0.000 description 2
- 239000006210 lotion Substances 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000010422 painting Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 210000003934 vacuole Anatomy 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000012857 repacking Methods 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/20—Cleaning of moving articles, e.g. of moving webs or of objects on a conveyor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/022—Cleaning travelling work
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Coating Apparatus (AREA)
Abstract
The invention discloses a kind of coating nozzles cleaning devices, including, roller, region shared by roller a part is applying area, and the roller is able to carry out rotation；Main cleaning device, the main cleaning device are set to outside the applying area, and the main cleaning device is equipped with main liquid accommodating chamber, and a part of the roller is placed in the main liquid accommodating chamber；And secondary cleaning device, the pair cleaning device are set to outside the applying area, and secondary liquid accommodating chamber is equipped with inside the pair cleaning device, a part of the roller is placed in the secondary liquid accommodating chamber；The position of the applying area is passed through in the roller rotation, can be with the roller rotation by the main liquid accommodating chamber and the secondary liquid accommodating chamber；Only photoresist cleaning solution need to be injected in main liquid accommodating chamber at this time to clean photoresist, the mixture that pure water forms photoresist with photoresist cleaning solution is injected in secondary liquid accommodating chamber to clean, and just can solve the problem of prior art can not effectively clean photoresist and cleaning liquid mixture.
Description
Technical field
The present invention relates to a kind of nozzle cleaning, in particular to a kind of coating nozzles cleaning device.
Background technique
In the production technology of TFT (i.e. Thin Film Transistor is the abbreviation of thin film transistor (TFT)) side exposure portion,
Need successively to carry out cleaning glass substrate, coating photoresist, baking, into exposure machine, on the glass substrate to photoresist define figure,
Last developed processing procedure shows figure.
Wherein, glass substrate can enter coater unit progress light blockage coating after completing cleaning, can spray before coating to coating
Mouth is cleaned, and after the completion, coating nozzles can carry out the pre- disgorging motion of photoresist on roller, with this come glass base when guaranteeing coating
Front edge of board film thickness it is uniform；When roller starts turning work, the photoresist to spue in advance is brought into lower section cleaning roller with the rotation of roller
In the photoresist cleaning solution of cylinder, then by scraping article the photoresist cleaning solution on roller is scraped completely, guarantees the cleanliness of roller with this.
But the photoresist cleaning solution in this scheme is that pair roller barrel carries out photoresist cleaning, in the long-term use, photoresist
Contained photoresist concentration can be continuously increased in cleaning solution, and this mixed liquor volatile matter can be attached to roller surface and form crystal, and
Photoresist cleaning solution is bad to the cleaning effect of this crystal, influences roller cleanliness, causes coating nozzles coating bad.
Summary of the invention
It, can not be to photoresist and clear to solve the prior art the purpose of the present invention is to provide a kind of coating nozzles cleaning device
The problem of washing lotion mixture is effectively cleaned.
In order to solve the above-mentioned technical problems, the present invention provides a kind of coating nozzles cleaning devices, including, roller is described
Region shared by roller a part is applying area, and the roller is able to carry out rotation；Main cleaning device, the main cleaning device are set
In outside the applying area, the main cleaning device is equipped with main liquid accommodating chamber, and a part of the roller is placed in the main liquid and accommodates
It is intracavitary；And secondary cleaning device, the pair cleaning device are set to outside the applying area, are equipped with secondary liquid inside the pair cleaning device
Accommodating chamber, a part of the roller are placed in the secondary liquid accommodating chamber；The position of the applying area is passed through in the roller rotation,
It can be with the roller rotation by the main liquid accommodating chamber and the secondary liquid accommodating chamber.
Wherein, the main cleaning device is additionally provided with main swipe, and the main swipe is placed in the outside of the main liquid accommodating chamber, institute
Main swipe is stated to abut with the side of the roller；The sense of rotation of the roller is successively to pass through the main liquid from the applying area
Accommodating chamber, the main swipe and the secondary cleaning device.
Wherein, the secondary cleaning device is additionally provided with secondary swipe, and the pair swipe is placed in the outside of the secondary liquid accommodating chamber, institute
Secondary swipe is stated to abut with the side of the roller；The sense of rotation of the roller is clear successively to pass through the master from the applying area
Cleaning device, the secondary liquid accommodating chamber and the secondary swipe.
Wherein, the secondary cleaning device at least two, the sense of rotation of the roller are successively to pass through from the applying area
Cross the main cleaning device and each secondary cleaning device.
Wherein, the applying area is placed in the top of the roller, the main cleaning device and the secondary cleaning device difference
It is arranged in the opposite two sides of the roller；The main liquid accommodating chamber is opposite with the side of the roller, the main liquid accommodating chamber
Open edge position is abutted with the side of the roller；The pair liquid accommodating chamber is opposite with the side of the roller, the pair liquid
The open edge position of accommodating chamber is abutted with the side of the roller.
Wherein, main nozzle for liquid is equipped in the main liquid accommodating chamber, the main nozzle for liquid is equipped with main liquid suction inlet and main liquid spout,
The main liquid suction inlet is placed in the lower part of the main liquid accommodating chamber, and the main liquid spout is directed at the side of the roller.
Wherein, secondary nozzle for liquid is equipped in the secondary liquid accommodating chamber, the pair nozzle for liquid is equipped with secondary liquid suction inlet and secondary liquid spout,
The pair liquid suction inlet is placed in the lower part of the secondary liquid accommodating chamber, and the pair liquid spout is directed at the side of the roller.
Wherein, the coating nozzles cleaning device further includes waste liquid disk, and the waste liquid disk is set to the lower section of the roller；Institute
The opening edge portion position for stating main liquid accommodating chamber lower part loads the top of range in the waste liquid disk；The pair liquid accommodating chamber lower part
Opening edge portion position in the waste liquid disk load range top.
Wherein, the main cleaning device is set to the lower section of the roller, and a part of the roller lower part is placed in the master
In liquid accommodating chamber；The pair cleaning device is set to the top of the main cleaning device, the pair liquid accommodating chamber and the roller
Side is opposite, and the open edge position of the pair liquid accommodating chamber is abutted with the side of the roller.
Wherein, the opening edge portion position of the secondary liquid accommodating chamber lower part is in the top of the main liquid accommodating chamber.
Beneficial effects of the present invention are as follows：
Since the position of the applying area is passed through in the roller rotation, can hold with the roller rotation by the main liquid
Receive chamber and the secondary liquid accommodating chamber,
So the position that roller is coated with photoresist necessarily passes main liquid accommodating chamber and secondary liquid accommodating chamber, it at this time only need to be in main liquid
Injection photoresist cleaning solution cleans photoresist in accommodating chamber, and pure water is injected in secondary liquid accommodating chamber to photoresist and photoresist cleaning solution
The mixture of composition is cleaned (pure water is preferable to the cleaning effect of this mixture), and just can solve the prior art can not be to photoresist
The problem of effectively being cleaned with cleaning liquid mixture.
Detailed description of the invention
In order to illustrate more clearly of technical solution of the present invention, attached drawing needed in embodiment will be made below
Simply introduce, it should be apparent that, the accompanying drawings in the following description is only some embodiments of the present invention, general for this field
For logical technical staff, without creative efforts, it is also possible to obtain other drawings based on these drawings.
Fig. 1 is the structural schematic diagram of coating nozzles cleaning device one embodiment of the present invention；
Fig. 2 is the structural schematic diagram of second embodiment of coating nozzles cleaning device of the present invention；
Fig. 3 is the structural schematic diagram of coating nozzles cleaning device third embodiment of the present invention；
Fig. 4 is the structural schematic diagram of the 4th embodiment of coating nozzles cleaning device of the present invention；
Fig. 5 is the main nozzle for liquid structural schematic diagram of coating nozzles cleaning device of the present invention；
Fig. 6 is the secondary nozzle for liquid structural schematic diagram of coating nozzles cleaning device of the present invention；
Fig. 7 is the structural schematic diagram of the 5th embodiment of coating nozzles cleaning device of the present invention.
Specific embodiment
Below in conjunction with the attached drawing in embodiment of the present invention, the technical solution in embodiment of the present invention is carried out clear
Chu is fully described by.
From fig. 1, it can be seen that one embodiment of coating nozzles cleaning device of the present invention includes：
Casing 1A, as shown in Figure 1, the inside of casing 1A is equipped with device accommodating chamber 11A, device accommodating chamber 11A is for placing
Various parts of coating nozzles cleaning device, and the top of casing 1A is hatch frame, with this by device accommodating chamber 11A and extraneous
Conducting, moves in device accommodating chamber 11A convenient for coating nozzles 2A and is cleaned.
Roller 3A, as shown in Figure 1, roller 3A is set in device accommodating chamber 11A, roller 3A is cylinder-like structure, roller 3A
Rotation can be carried out by center of rotation of center axis thereof, the sense of rotation of roller 3A is to rotate counterclockwise；Wherein, on roller 3A
Region shared by portion's highest point is applying area 31A (dotted line frame region i.e. shown in FIG. 1), the opening of applying area 31A and casing 1A
Structure is opposite, so that coating nozzles 2A carries out light blockage coating operation in applying area 31A pair roller barrel 3A.
Main cleaning device 4A is placed in roller 3A's as shown in Figure 1, main cleaning device 4A is set in device accommodating chamber 11A
Left side, and be separated from each other with applying area 31A, to avoid influencing coating nozzles 2 in applying area 31A pair roller barrel 3A progress photoresist
Painting work；Wherein, main cleaning device 4A is equipped with main liquid accommodating chamber 41A, and main liquid accommodating chamber 41A and extraneous conducting, main liquid accommodate
The open edge position of chamber 41A is abutted with the side on the left of roller 3A, so that a part on the left of roller 3A is placed in main liquid and accommodates
In chamber 41A.
Secondary cleaning device 5A is placed in roller 3A's as shown in Figure 1, pair cleaning device 5A is set in device accommodating chamber 11A
Right side, and be separated from each other with applying area 31A, to avoid influencing coating nozzles 2A in applying area 31A pair roller barrel 3A progress light
Hinder painting work；Wherein, secondary cleaning device 5A is equipped with pair liquid accommodating chamber 51A, secondary liquid accommodating chamber 51A and extraneous conducting, and secondary liquid holds
Receive the open edge position of chamber 51A abuts with the side on the right side of roller 3A, so that a part on the right side of roller 3A is placed in secondary liquid and holds
It receives in chamber 51A.
Its application process approximately as：
1, coating nozzles 2A is moved to the top of applying area 31A, then carries out light blockage coating in applying area 31A pair roller barrel 3A
Operation, at this time since the roller 3A moment keeps autorotation counterclockwise, so the part that roller 3A is coated with photoresist will turn
It moves to main liquid accommodating chamber 41A；
2, photoresist cleaning solution is injected in main liquid accommodating chamber 41A, so the part that roller 3A is coated with photoresist will be with light
Cleaning solution contact is hindered, photoresist cleaning solution can wash away the photoresist on roller 3A, to reach the purpose of photoresist cleaning, roller 3A at this time
The cleaned part of photoresist will turn in secondary liquid accommodating chamber 51A；
3, injected clear water (or other efficient feasible cleaning solutions) in secondary liquid accommodating chamber 51A, if it is adhered on roller 3A
The mixture (being hereinafter mixture) being made of photoresist and cleaning solution, being contacted by clear water with mixture can carry out effectively
Cleaning, to achieve the purpose that washed mixture.
Therefore, one embodiment of coating nozzles cleaning device of the present invention at least has following beneficial effect：
1. the related roller 3A of the present embodiment, main cleaning device 4A and secondary cleaning device 5A structural relation are summarised as：It is a kind of
Coating nozzles cleaning device, including, roller 3A, region shared by described roller 3A a part is applying area 31A, the roller 3A
It is able to carry out rotation；Main cleaning device 4A, the main cleaning device 4A are set to outside the applying area 31A, the main cleaning device
4A is equipped with main liquid accommodating chamber 41A, and a part of the roller 3A is placed in the main liquid accommodating chamber 41A；And secondary cleaning device
5A, the pair cleaning device 5A are set to outside the applying area 31A, are equipped with secondary liquid accommodating chamber 51A inside the pair cleaning device 5A,
A part of the roller 3A is placed in the secondary liquid accommodating chamber 51A；The portion of the applying area 31A is passed through in the roller 3A rotation
Position, can be with the roller 3A rotation by the main liquid accommodating chamber 41A and the secondary liquid accommodating chamber 51A.
After meeting this structure, by may make roller 3A be coated with photoresist position necessarily pass main liquid accommodating chamber 41A and
Secondary liquid accommodating chamber 51A just can be right as long as ensuring to be injected with suitable cleaning solution in main liquid accommodating chamber 41A and secondary liquid accommodating chamber 51A
Photoresist and mixture are cleaned, to solve the problems, such as that the prior art is bad to mixture cleaning effect.
Wherein, shown in Fig. 1 for direction, if main cleaning device 4A is set to the left side of applying area 31A, secondary cleaning device 5A
Set on the right side of applying area 31A, as long as control roller 3A carries out rotation counterclockwise, can first carry out photoresist cleaning, then again into
The cleaning of row mixture；Correspondingly, if main cleaning device 4A is set to the right side of applying area 31A, secondary cleaning device 5A is set to coating
The left side of area 31A equally can be realized first progress photoresist cleaning as long as control roller 3A carries out rotation clockwise, then again into
The cleaning of row mixture；As long as i.e. roller 3A rotation its same position can be made by applying area 31A, main liquid accommodating chamber 41A and
Secondary liquid accommodating chamber 51A in application process only need to be according to applying area 31A, main liquid accommodating chamber 41A and secondary liquid accommodating chamber 51A
The steering of the positional relationship adjustment roller 3 of three, just can ensure that the correct execution of cleaning sequence.
2. the present embodiment is summarised as in relation to the installation relation between main cleaning device 4A, pair cleaning device 5A and roller 3A：
The applying area 31A is placed in the top of the roller 3A, and the main cleaning device 4A and the pair cleaning device 5A are respectively arranged
In the opposite two sides the roller 3A；The main liquid accommodating chamber 41A is opposite with the side of the roller 3A, the main liquid accommodating chamber
The open edge position of 41A is abutted with the side of the roller 3A；The side phase of pair the liquid accommodating chamber 51A and the roller 3A
Right, the open edge position of the pair liquid accommodating chamber 51A is abutted with the side of the roller 3A.
Firstly the need of pointing out, the side of roller 3A is the position referred to other than two end faces roller 3A, i.e., roller 3A into
When row rotation, a part of the side roller 3A can carry out light blockage coating by applying area 31A, so meeting this structure
Afterwards, the side on the left of roller 3A can surround a confined space with main liquid accommodating chamber 41A, clear preferably to accommodate storage photoresist
Washing lotion, similarly, the side on the right side of roller 3A will surround another confined space with secondary liquid accommodating chamber 51A, deposit more preferably to accommodate
The cleaning solution for storing up pure water etc., so that the contact of cleaning solution with the surface roller 3A photoresist is strengthened, so that cleaning effect is obtained into one
Step optimization.
Secondly as the open edge position of main liquid accommodating chamber 41A is abutted with the side of roller 3A, so that between the two
Away from very little, part photoresist fails thoroughly to clean if it exists, this part photoresist will be supported with the open edge of main liquid accommodating chamber 41A
It connects, scrape, that is, optimize the cleaning effect of photoresist；Similarly, since the open edge position of secondary liquid accommodating chamber 51 is with roller 3A's
Side abuts, and part mixes fail thoroughly to clean if it exists, this part mixes will be with the opening edge of secondary liquid accommodating chamber 51A
Edge is abutted, is scraped, to optimize the cleaning effect of mixture.
As can be seen from Figure 2, second embodiment and one embodiment of coating nozzles cleaning device of the present invention are basic
Unanimously, difference is：
Main cleaning device 4B is additionally provided with main swipe 42B, as shown in Fig. 2, main swipe 42B be set to roller 3B lower section, and with
The lower part of roller 3B abuts, since main swipe 42B is also placed between main liquid accommodating chamber 41B and secondary liquid accommodating chamber 51B, so that it is guaranteed that
The cleaning parts of roller 3B can first pass through main liquid accommodating chamber 41B, then reach the position that main swipe 42B is abutted with roller 3B again,
Finally just reach secondary liquid accommodating chamber 51B.
Secondary cleaning device 5 is additionally provided with secondary swipe 52B, as shown in Fig. 2, pair swipe 52B be set to roller 3B upper right side, and with
The upper right quarter of roller 3B abuts, since secondary swipe 3B is also placed in the top of secondary liquid accommodating chamber 51B, so that it is guaranteed that the cleaning of roller 3B
Position can first pass through secondary liquid accommodating chamber 51B, then reach the position that secondary swipe 52B is abutted with roller 3B again.
Therefore, second embodiment of coating nozzles cleaning device of the present invention at least has following beneficial effect：
1. the set-up mode of main swipe 42B is summarised as：The main cleaning device 4B is additionally provided with main swipe 42B, the master
Swipe 42B is placed in the outside of the main liquid accommodating chamber 41B, and the main swipe 42B is abutted with the side of the roller 3B；The roller
The sense of rotation of cylinder 3B is successively to pass through the main liquid accommodating chamber 41B, the main swipe 42B and described from the applying area 31B
Secondary cleaning device 5B.
After meeting this structure, roller 3B will be supported by the position that main liquid accommodating chamber 41B is cleaned with main swipe 42B
Connect, if remain photoresist or other substances on roller 3B, main swipe 42B just can the residuals on pair roller barrel 3B carry out object
Reason is washed away, to further improve the cleaning effect of pair roller barrel 3B.
2. the set-up mode of secondary swipe 52B is summarised as：The pair cleaning device 5B is additionally provided with secondary swipe 52B, the pair
Swipe 52B is placed in the outside of the secondary liquid accommodating chamber 51B, and the pair swipe 52B is abutted with the side of the roller 3B；The roller
The sense of rotation of cylinder 3B is successively passes through the main cleaning device 4B, the pair liquid accommodating chamber 51B and institute from the applying area 31B
State secondary swipe 52B.
After meeting this structure, roller 3B will be supported by the position that pair liquid accommodating chamber 51B is cleaned with secondary swipe 52B
Connect, if remain photoresist or other substances on roller 3B, secondary swipe 52B just can the residuals on pair roller barrel 3B carry out object
Reason is washed away, to further improve the cleaning effect of pair roller barrel 3B.
As can be seen from Figure 3, the third embodiment of coating nozzles cleaning device of the present invention and second embodiment are basic
Unanimously, difference is：
The quantity of secondary cleaning device 5C is two, and main cleaning device 4C is set to the left side of roller 3C at this time, and first pair is clear
Cleaning device 5C is set to the downside of roller 3C, and second pair cleaning device 5C is set to the right side of roller 3C, and main swipe 42C is set to master
Between the secondary liquid accommodating chamber 51C of liquid accommodating chamber 41C and first, first pair swipe 52C be set to first pair liquid accommodating chamber 51C and
Between second secondary liquid accommodating chamber 51C, second pair swipe 52C is set to the top of second secondary liquid accommodating chamber 51C.
Therefore, the third embodiment of coating nozzles cleaning device of the present invention at least has following beneficial effect：
1, the arrangement relation of each secondary cleaning device 5C is summarised as：The pair cleaning device 5C at least two, it is described
The sense of rotation of roller 3C is from the applying area 31C successively by the main cleaning device 4C and each secondary cleaning
Device 5C.
After meeting this structure, can guarantee pair roller barrel 3C cleaning sequence be first carry out photoresist cleaning, then continuously into
The multiple mixture cleaning of row, to ensure that the cleaning to mixture is thorough enough.
2, flexible Application can be carried out as needed, it for example can be in the secondary cleaning device 5C of main cleaning device 4C and lower section
Photoresist cleaning solution is injected, injects pure water in the secondary cleaning device 5C of right, photoresist cleaning twice will be will do it at this time, then again
The cleaning for carrying out primary mixture, so that it is guaranteed that the cleaning of photoresist is more thorough.
From Fig. 4 to 6 it is found that the 4th embodiment of coating nozzles cleaning device of the present invention and second embodiment base
This is consistent, and difference is：
Main nozzle for liquid 6D is equipped in main liquid accommodating chamber 41D, as shown in Figures 4 and 5, main nozzle for liquid 6D is fixed on main liquid accommodating chamber
The inner wall of 41D, main nozzle for liquid 6D are equipped with main liquid suction inlet 61D and main liquid spout 62D, and main liquid suction inlet 61D is placed in main liquid accommodating chamber 41D
Lower part, to guarantee to draw the cleaning solution in main liquid accommodating chamber 41D, and the week of main liquid spout 62D alignment roller 3D left part
Side, to ensure that the cleaning solution sprayed can be emitted directly toward the left-hand face of roller 3D.
Secondary nozzle for liquid 7D is equipped in secondary liquid accommodating chamber 51D, as shown in figs. 4 and 6, secondary nozzle for liquid 7D is fixed on secondary liquid accommodating chamber
The inner wall of 51D, secondary nozzle for liquid 7D is equipped with pair liquid suction inlet 71D and pair liquid spout 72D, secondary liquid suction inlet 71D are placed in secondary liquid accommodating chamber 51D
Lower part, to guarantee to draw the cleaning solution in secondary liquid accommodating chamber 51D, and the week of pair liquid spout 72D alignment roller 3D right part
Side, to ensure that the cleaning solution sprayed can be emitted directly toward the right lateral surface of roller 3D.
Coating nozzles cleaning device further includes waste liquid disk 8D, as shown in figure 4, waste liquid disk 8D is set to the lower section of roller 3D, and
Ensure that the coverage area of waste liquid disk 8D is wide enough, so that the opening edge portion position of the lower part winner liquid accommodating chamber 41D is in waste liquid disk
8D loads the top of range, and the opening edge portion position of the pair lower part liquid accommodating chamber 51D loads the upper of range in waste liquid disk 8D
Side, wherein there is no specifically limited for the shape of waste liquid disk 8D.
Therefore, the 4th embodiment of coating nozzles cleaning device of the present invention at least has following beneficial effect：
1. the structure of main nozzle for liquid 6D is summarised as：Main nozzle for liquid 6D, the main liquid are equipped in the main liquid accommodating chamber 41D
Nozzle 6D is equipped with main liquid suction inlet 61D and main liquid spout 62D, and the main liquid suction inlet 61D is placed under the main liquid accommodating chamber 41D
Portion, the main liquid spout 62D are directed at the side of the roller 3D.
After meeting this structure, the roller 3D being placed in main liquid accommodating chamber 41D is not only in the state of cleaned vacuole leaching,
And main nozzle for liquid 6D can also extract the cleaning solution pair roller barrel 3D in main liquid accommodating chamber 41D and carry out hydro-peening, i.e., use two simultaneously
Kind mode carries out photoresist cleaning, to substantially increase the cleaning efficiency and quality of photoresist.
Certainly, main nozzle for liquid 6D essence can also use the structure from external acquisition cleaning solution, but straight from main liquid accommodating chamber 41D
Cleaning solution can be reused by connecing extraction cleaning solution, so as to improve the utilization efficiency of cleaning solution, avoid the occurrence of waste
The case where cleaning solution.
2. the structure of secondary nozzle for liquid 7D is summarised as：Secondary nozzle for liquid 7D, the pair liquid are equipped in the pair liquid accommodating chamber 51D
Nozzle 7D is equipped with pair liquid suction inlet 71D and secondary liquid spout 72D, and the pair liquid suction inlet 71D is placed under the secondary liquid accommodating chamber 51D
Portion, the pair liquid spout 72D are directed at the side of the roller 3D.
After meeting this structure, the roller 3D being placed in secondary liquid accommodating chamber 51D is not only in the state of cleaned vacuole leaching,
And pair nozzle for liquid 7D can also extract the cleaning solution pair roller barrel 3D in secondary liquid accommodating chamber 51D and carry out hydro-peening, i.e., use two simultaneously
Kind mode carries out mixture cleaning, to substantially increase the cleaning efficiency and quality of mixture.
Certainly, secondary nozzle for liquid 7D essence can also use the structure from external acquisition cleaning solution, but straight from secondary liquid accommodating chamber 51D
Cleaning solution can be reused by connecing extraction cleaning solution, so as to improve the utilization efficiency of cleaning solution, avoid the occurrence of waste
The case where cleaning solution.
3. the set-up mode of waste liquid disk 8D is summarised as：The coating nozzles cleaning device further includes waste liquid disk 8D, described
Waste liquid disk 8D is set to the lower section of the roller 3D；The opening edge portion position of the main lower part liquid accommodating chamber 41D is in the waste liquid
The top of disk 8D loading range；The opening edge portion position of the pair lower part liquid accommodating chamber 51D loads model in the waste liquid disk 8D
The top enclosed.
After meeting this structure, if because roller 3D rotation or other reasons cause cleaning solution to overflow, the cleaning solution of spilling
It will directly fall in waste liquid disk 8D, to be focused in the future, avoid the occurrence of to inside coating nozzles cleaning device
The case where polluting and being difficult to cleaning and maintenance.
As can be seen from Figure 7, the 5th embodiment and second embodiment of coating nozzles cleaning device of the present invention are basic
Unanimously, difference is：
Main cleaning device 4E is set to the lower section of roller 3E, as shown in fig. 7, the lower part of roller 3E is placed in main liquid accommodating chamber at this time
In 41E, and main swipe 42E is fixed at the inside of main liquid accommodating chamber 41E, and abuts shape with the holding of the right lower quadrant of roller 3E
State.
Secondary cleaning device 5E is set to the right side of roller 3E, as shown in fig. 7, pair liquid accommodating chamber 51E is placed in main liquid receiving at this time
The top of chamber 41E, and the opening edge portion position of the pair lower part liquid accommodating chamber 51E is in the top of main liquid accommodating chamber 41E, to ensure to lead
The cleaning solution overflowed in liquid accommodating chamber 41 to secondary liquid accommodating chamber 51 receives.
Therefore, the 5th embodiment of coating nozzles cleaning device of the present invention at least has following beneficial effect：
1. the arrangement of main cleaning device 4E and secondary cleaning device 5E are summarised as：The main cleaning device 4E is set to institute
The lower section of roller 3E is stated, a part of the lower part the roller 3E is placed in the main liquid accommodating chamber 41E；The pair cleaning device 5E
Set on the top of the main cleaning device 4E, the pair liquid accommodating chamber 51E is opposite with the side of the roller 3E, and the pair liquid holds
Receive the open edge position of chamber 51E abuts with the side of the roller 3E.
After meeting this structure, the positional relationship of main cleaning device 4E and roller 3E is then same as the prior art, so energy
It is enough that secondary cleaning device 5E is directly added on the basis of existing apparatus, the change of structure is reduced, so that production cost is reduced,
So that carrying out directly repacking on existing apparatus becomes feasible.
2. the anti-pollution function of main cleaning device 4E is summarised as：The open edge position of the pair lower part liquid accommodating chamber 51E
It is placed in the top of the main liquid accommodating chamber 41E.
After meeting this structure, if because roller 3E rotation or other reasons cause secondary cleaning device 5E to overflow cleaning solution,
The cleaning solution of spilling will directly be fallen in main liquid accommodating chamber 41E, to be focused in the future, be avoided the occurrence of to coating
The case where being polluted inside nozzle cleaning and being difficult to cleaning and maintenance.
3, since secondary liquid accommodating chamber 51E needs to keep inclination arrangement state shown in Fig. 7, so as to cause secondary liquid accommodating chamber
Between the two away from smaller, i.e., main swipe 42E is difficult to install 51E and main liquid accommodating chamber 41E, and main swipe 42E is changed to be set to main liquid
In accommodating chamber 41E, this puzzlement just can be overcome, and main swipe 42E is set in main liquid accommodating chamber 41E and is also avoided that the secondary liquid of blocking holds
The interior cleaning solution overflowed of the chamber 51E that receives enters main liquid accommodating chamber 41E, and also the inside for holding coating nozzles cleaning device neatly provides
Valuable help.
In conclusion the core of coating nozzles cleaning device described in the embodiment of the present invention is to add cleaning device, pass through
Different cleaning devices inject different cleaning solutions, to cope with a variety of different cleaning demands, substantially increase coating nozzles cleaning
The cleaning effect of device.
The above is a preferred embodiment of the present invention, it is noted that for those skilled in the art
For, various improvements and modifications may be made without departing from the principle of the present invention, these improvements and modifications are also considered as
Protection scope of the present invention.
Claims (10)
1. a kind of coating nozzles cleaning device, which is characterized in that including,
Roller, region shared by roller a part is applying area, and the roller is able to carry out rotation；
Main cleaning device, the main cleaning device are set to outside the applying area, and the main cleaning device is equipped with main liquid accommodating chamber, institute
The a part for stating roller is placed in the main liquid accommodating chamber；
And secondary cleaning device, the pair cleaning device are set to outside the applying area, are equipped with secondary liquid inside the pair cleaning device
Accommodating chamber, a part of the roller are placed in the secondary liquid accommodating chamber；
The position of the applying area is passed through in the roller rotation, can pass through the main liquid accommodating chamber and institute with the roller rotation
State secondary liquid accommodating chamber.
2. coating nozzles cleaning device according to claim 1, which is characterized in that
The main cleaning device is additionally provided with main swipe, and the main swipe is placed in the outside of the main liquid accommodating chamber, the main swipe
It is abutted with the side of the roller；
The sense of rotation of the roller is successively to pass through the main liquid accommodating chamber, the main swipe and the pair from the applying area
Cleaning device.
3. coating nozzles cleaning device according to claim 1 or 2, which is characterized in that
The pair cleaning device is additionally provided with secondary swipe, and the pair swipe is placed in the outside of the secondary liquid accommodating chamber, the pair swipe
It is abutted with the side of the roller；
The sense of rotation of the roller is successively passes through the main cleaning device, the secondary liquid accommodating chamber and institute from the applying area
State secondary swipe.
4. coating nozzles cleaning device according to claim 3, which is characterized in that the pair cleaning device is at least two
A, the sense of rotation of the roller is from the applying area successively by the main cleaning device and each secondary cleaning
Device.
5. coating nozzles cleaning device according to claim 1, which is characterized in that
The applying area is placed in the top of the roller, and the main cleaning device and the secondary cleaning device are respectively arranged in described
The opposite two sides of roller；
The main liquid accommodating chamber is opposite with the side of the roller, the open edge position of the main liquid accommodating chamber and the roller
Side abut；
The pair liquid accommodating chamber is opposite with the side of the roller, the open edge position of the pair liquid accommodating chamber and the roller
Side abut.
6. coating nozzles cleaning device according to claim 5, which is characterized in that be equipped with main liquid in the main liquid accommodating chamber
Nozzle, the main nozzle for liquid are equipped with main liquid suction inlet and main liquid spout, and the main liquid suction inlet is placed in the lower part of the main liquid accommodating chamber,
The main liquid spout is directed at the side of the roller.
7. coating nozzles cleaning device according to claim 5, which is characterized in that be equipped with secondary liquid in the pair liquid accommodating chamber
Nozzle, the pair nozzle for liquid are equipped with secondary liquid suction inlet and secondary liquid spout, and the pair liquid suction inlet is placed in the lower part of the secondary liquid accommodating chamber,
The pair liquid spout is directed at the side of the roller.
8. according to the described in any item coating nozzles cleaning devices of claim 5 to 7, which is characterized in that
The coating nozzles cleaning device further includes waste liquid disk, and the waste liquid disk is set to the lower section of the roller；
The opening edge portion position of the main liquid accommodating chamber lower part loads the top of range in the waste liquid disk；
The opening edge portion position of the pair liquid accommodating chamber lower part loads the top of range in the waste liquid disk.
9. coating nozzles cleaning device according to claim 1, which is characterized in that
The main cleaning device is set to the lower section of the roller, and a part of the roller lower part is placed in the main liquid accommodating chamber
It is interior；
The pair cleaning device is set to the top of the main cleaning device, the side phase of pair the liquid accommodating chamber and the roller
Right, the open edge position of the pair liquid accommodating chamber is abutted with the side of the roller.
10. coating nozzles cleaning device according to claim 9, which is characterized in that open the pair liquid accommodating chamber lower part
Mouth edge is placed in the top of the main liquid accommodating chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810528351.8A CN108856113A (en) | 2018-05-29 | 2018-05-29 | Coating nozzles cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810528351.8A CN108856113A (en) | 2018-05-29 | 2018-05-29 | Coating nozzles cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108856113A true CN108856113A (en) | 2018-11-23 |
Family
ID=64335471
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810528351.8A Pending CN108856113A (en) | 2018-05-29 | 2018-05-29 | Coating nozzles cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108856113A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115026039A (en) * | 2022-06-06 | 2022-09-09 | 郑州航空工业管理学院 | Outdoor full-automatic billboard |
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| JP2001310147A (en) * | 2000-05-02 | 2001-11-06 | Tokyo Ohka Kogyo Co Ltd | Pre-delivering apparatus and pre-delivering method for slit coater |
| JP2004167476A (en) * | 2002-11-07 | 2004-06-17 | Tokyo Ohka Kogyo Co Ltd | Spare discharge device of slit coater |
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| Publication number | Priority date | Publication date | Assignee | Title |
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