CN103949427A - Cleaning trough body structure for photoresist nozzle and application of cleaning trough body structure - Google Patents
Cleaning trough body structure for photoresist nozzle and application of cleaning trough body structure Download PDFInfo
- Publication number
- CN103949427A CN103949427A CN201410174612.2A CN201410174612A CN103949427A CN 103949427 A CN103949427 A CN 103949427A CN 201410174612 A CN201410174612 A CN 201410174612A CN 103949427 A CN103949427 A CN 103949427A
- Authority
- CN
- China
- Prior art keywords
- cleaning fluid
- pipeline
- nozzle
- cleaning
- rinse bath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
Landscapes
- Nozzles (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The invention relates to a cleaning trough body structure for a photoresist nozzle and application of the cleaning trough body structure. The cleaning trough body structure comprises a cleaning trough shell, a cleaning fluid anti-splattering cavity, a nozzle cleaning cavity, a cleaning fluid discharging opening, a cleaning fluid pipeline, a newly-added cleaning fluid pipeline, a nitrogen purging pipeline and a negative pressure exhaust pipeline, wherein a cleaning fluid flows to the inner lower part of the nozzle cleaning cavity along the cleaning fluid pipeline and the newly-added cleaning fluid pipeline for washing a nozzle head so that the nozzle head is completely cleaned; the nitrogen purging pipeline and the negative pressure exhaust pipeline which are arranged in an inclined manner can be used for reducing frequency of the condition that the cleaning fluid splashes to the cleaning fluid anti-splattering cavity, and can prevent the cleaning fluid or final cleaning fluid from remaining inside the nozzle cleaning cavity. According to the cleaning trough body structure and the application thereof, disclosed by the invention, cleaning effect on the nozzle head can be ensured, residual of pollutants can also be prevented, and the light resistance spraying quality of the photoresist nozzle is not influenced.
Description
Technical field
The present invention relates to ic manufacturing technology field, relate in particular to a kind of rinse bath body structure and application thereof of photoetching glue spreader photoresistance nozzle.
Background technology
At present, integrated circuit manufacture field is widely used a kind of photoetching glue spreader, and photoetching glue spreader can stick and have foreign matter at its nozzle position after using, and the pollution for fear of the foreign matter sticking to integrated circuit, need to clean its nozzle position; The structure of photoetching glue spreader photoresistance nozzle cleaning groove at present used as shown in Figure 1, wherein, 1 is nozzlend, and 2 is nozzle waist, and 3 is nozzle head, 4 is the anti-cleaning fluid chamber of splashing, 5 is rinse bath housing, and 6 is final washer jet, and 7 is cleaning fluid pipeline, 8 is cleaning fluid outlet, and 9 is nozzle cleaning chamber; Cleaning fluid pipeline, through rinse bath housing, imports to flooding nozzle head in nozzle cleaning chamber by cleaning fluid; After cleaning fluid flooding nozzle head, discharge from cleaning fluid outlet, described final washer jet is for rinsing the raffinate that nozzle head is cleaned to complete cleaning fluid pipeline exit afterwards; Because only have a nozzle cleaning pipeline in current rinse bath body structure, washer jet head surrounding fully, nozzle head still can stick and have pollutant, in the time of photoresistance nozzle spray photoresistance, these pollutants are brought on wafer, bring defect to wafer, thereby affect the quality of wafer product.
Because rinse bath requires nozzle head to clean up, when ensureing photoresistance nozzle spray photoresistance, there is no the quality of pollutant effect to wafer, in order to reach above object, currently available technology is:
1) extend the scavenging period of photoresistance nozzle in rinse bath;
2) caliber of increase cleaning fluid pipeline, the flow of increasing cleaning fluid.
But along with the raising of industry product line efficiency, require to shorten at present the holding time of every section of operation; And extend the scavenging period of photoresistance nozzle in rinse bath, can not ensure that the pollutant of nozzle head surrounding is all cleaned totally; And the caliber of increase cleaning fluid pipeline, the flow of increasing cleaning fluid, not only can cause cleaning fluid to be splashed to nozzle waist, has also caused the waste of cleaning fluid, has increased on-the-spot Material Cost.
In sum, the rinse bath body structure of domestic and international this photoresistance nozzle used at present, has following shortcoming:
1) single cleaning fluid pipeline washer jet head surrounding fully, and nozzle head still can stick and have pollutant;
2) extend the scavenging period of photoresistance nozzle in rinse bath, taken more activity time, and can not ensure that the pollutant of nozzle head surrounding is all cleaned totally;
3) caliber of increase cleaning fluid pipeline, the flow of increasing cleaning fluid, not only can cause cleaning fluid to be splashed to nozzle waist and run down into nozzle head affects the cleannes of nozzle head, has also caused the waste of cleaning fluid, has increased on-the-spot Material Cost;
4) in the time that photoresistance nozzle shifts out cleaning cell body, due to the tension force of liquid surface, the cleaning fluid that contains pollutant can be attached on nozzle head, and is taken out of by photoresistance nozzle, thus the quality while affecting photoresistance nozzle spray photoresistance;
5) remain in cleaning fluid or the final cleaning fluid in nozzle cleaning chamber, pollutant can be taken to the nozzle head of next photoresistance nozzle, affect the cleaning performance of next photoresistance nozzle.
Summary of the invention
Existing the problems referred to above while cleaning photoresistance nozzle in order to solve rinse bath under prior art, the invention provides a kind of rinse bath body structure and application thereof for photoresistance nozzle, this rinse bath body structure and being applied in while cleaning photoresistance nozzle, can realize comprehensive cleaning of nozzle head, and can prevent that the cleaning fluid that contains pollutant is splashed to nozzle waist, can also avoid the cleaning fluid or the final cleaning fluid that contain pollutant to remain in nozzle cleaning chamber, the adverse effect with destroy contaminants to photoresistance nozzle.Concrete scheme of the present invention is as described below:
A kind of rinse bath body structure for photoresistance nozzle, comprise rinse bath housing, anti-cleaning fluid splash chamber, nozzle cleaning chamber, cleaning fluid outlet, nozzlend, nozzle waist, nozzle head, cleaning fluid pipeline, final washer jet, described cleaning fluid pipeline, through rinse bath housing, imports to flooding nozzle head in nozzle cleaning chamber by cleaning fluid; After cleaning fluid flooding nozzle head, discharge from cleaning fluid outlet, described final washer jet is for rinsing the raffinate that nozzle head is cleaned to complete cleaning fluid pipeline exit afterwards; At least also comprise that a road increases cleaning fluid pipeline newly, the outlet of cleaning fluid pipeline and newly-increased cleaning fluid pipeline at the inwall in nozzle cleaning chamber along uniform on horizontal circumferencial direction; Described cleaning fluid pipeline and newly-increased cleaning fluid pipeline and horizontal direction are angle of inclination arranges, cleaning fluid is along cleaning fluid pipeline and the newly-increased cleaning fluid pipeline direction flooding nozzle head inner on the lower side to nozzle cleaning chamber.
According to a kind of rinse bath body structure for photoresistance nozzle of the present invention, between described cleaning fluid pipeline and newly-increased cleaning fluid pipeline and rinse bath housing, adopt caliber to be connected with the mode of aperture interference fit or and rinse bath housing between be connected with screw thread or welding manner.
Purpose of design is herein, and at least the outlet of cleaning fluid pipeline and newly-increased cleaning fluid pipeline two-way, at the inwall in nozzle cleaning chamber along uniform on horizontal circumferencial direction, can ensure that nozzle head is cleaned comprehensively; Cleaning fluid pipeline and newly-increased cleaning fluid pipeline and horizontal direction are angle of inclination and arrange, cleaning fluid is along cleaning fluid pipeline and the newly-increased cleaning fluid pipeline direction flooding nozzle head inner on the lower side to nozzle cleaning chamber, can reduce cleaning fluid and be splashed to the splash situation in chamber of anti-cleaning fluid, reduce cleaning fluid and be attached on the situation of nozzle waist; Avoid splashing and residual cleaning fluid runs down into nozzle cleaning chamber or nozzle head and has influence on the cleannes of nozzle head.
According to a kind of rinse bath body structure for photoresistance nozzle of the present invention, the described anti-cleaning fluid chamber of splashing also has at least one road nitrogen blowing pipeline, this nitrogen blowing pipeline and horizontal direction are angle of inclination arranges, nitrogen purges along the anti-cleaning fluid of this nitrogen sparge tube road direction inner direction on the lower side in chamber of splashing.
According to a kind of rinse bath body structure for photoresistance nozzle of the present invention, described angle of inclination is 30 to 60 degree.
According to a kind of rinse bath body structure for photoresistance nozzle of the present invention, the outlet of described nitrogen blowing pipeline be positioned at anti-cleaning fluid splash chamber 1/2nd height top.
According to a kind of rinse bath body structure for photoresistance nozzle of the present invention, between described nitrogen blowing pipeline and rinse bath housing, adopt caliber to be connected with the mode of aperture interference fit or and rinse bath housing between be connected with screw thread or welding manner.
According to a kind of rinse bath body structure for photoresistance nozzle of the present invention, described cleaning fluid outlet also has at least one road negative pressure ventilation pipeline; Between described negative pressure ventilation pipeline and rinse bath housing, adopt caliber to be connected with the mode of aperture interference fit or and rinse bath housing between be connected with screw thread or welding manner.
According to a kind of rinse bath body structure for photoresistance nozzle of the present invention, described angle of inclination is 30 to 60 degree, and described cleaning fluid pipeline and the outlet of newly-increased cleaning fluid pipeline and the centre position of nozzle head are on sustained height.
Purpose of design is herein, nitrogen sparge tube curb angle of inclination is that the direction of 30 to 60 degree purges the anti-cleaning fluid chamber of splashing, can make anti-cleaning fluid splash in chamber in barotropic state, can blow to downwards in nozzle cleaning chamber being splashed to the anti-cleaning fluid chamber cleaning liquid inside that splashes, and can prevent that cleaning fluid or final cleaning fluid from remaining in nozzle cleaning chamber, negative pressure ventilation pipeline can ensure that cleaning fluid or final the smooth and easy of cleaning fluid reserve, and avoid residual.
According to the application of a kind of rinse bath body structure for photoresistance nozzle of the present invention, based on above-mentioned a kind of rinse bath body structure for photoresistance nozzle, its concrete application process is as follows:
1) before nozzle head prepares to enter nozzle cleaning chamber 2 to 4 seconds, nitrogen blowing pipeline started to purge the anti-cleaning fluid chamber of splashing, and negative pressure ventilation pipeline starts suck purge liquid outlet simultaneously;
2) after nozzle head enters cleaning chambers, the cleaning fluid of cleaning fluid pipeline and newly-increased cleaning fluid pipeline starts flooding nozzle head, and washing time maintains 3 to 5 seconds;
3) after rinsing, nozzle head is extracted out from clean cell body;
4) final washer jet starts to rinse the outlet position of cleaning fluid pipeline and newly-increased cleaning fluid pipeline, and final washer jet washing time maintains 2 to 4 seconds;
5) final washer jet stopped rinsing after 2 to 3 seconds, and nitrogen blowing pipeline stops purging, and negative pressure ventilation pipeline stops suction simultaneously.
According to a kind of application for photoresistance nozzle cleaning trough body structure of the present invention, it is characterized in that, the cleaning fluid pressure of described cleaning fluid pipeline and newly-increased cleaning fluid pipeline is 2 to 3 kilograms; The nitrogen pressure of described nitrogen blowing pipeline is 1 to 2 kilogram; The pressure of described negative pressure ventilation pipeline is 0 to 1 kilogram that bears; Described final cleaning fluid pressure is 1 to 2 kilogram.
Purpose of design is herein, photoresistance nozzle is extracted out while cleaning cell body, prevent at the pollutant of nozzle waist and nozzle head residual, and reduce the use amount of cleaning fluid, reduce Material Cost, cleaning fluid pressure is 2 to 3 kilograms, coordinate negative 0 to 1 kilogram of the pressure of 1 to 2 kilogram of nitrogen pressure of nitrogen blowing pipeline and negative pressure ventilation pipeline, can ensure after cleaning fluid ejection comprehensively flooding nozzle head, and can directly do not blown to cleaning fluid outlet by the nitrogen of nitrogen blowing pipeline, can ensure the cleaning performance of nozzle head, also can avoid the residual of pollutant, quality while ensureing photoresistance nozzle spray photoresistance is unaffected.
Use a kind of rinse bath body structure for photoresistance nozzle of the present invention and application thereof to obtain following beneficial effect:
1) at least the cleaning fluid pipeline of two-way outlet at the inwall in nozzle cleaning chamber along uniform on horizontal circumferencial direction, can ensure that nozzle head is cleaned comprehensively; And can reduce cleaning fluid and be splashed to the splash situation in chamber of anti-cleaning fluid, reduce cleaning fluid and be attached on the situation of nozzle waist; Avoid splashing and residual cleaning fluid runs down into nozzle cleaning chamber or nozzle head and has influence on the cleannes of nozzle head;
2) nitrogen blowing pipeline can make anti-cleaning fluid splash in chamber in barotropic state, can blow to downwards in nozzle cleaning chamber being splashed to the anti-cleaning fluid chamber cleaning liquid inside that splashes, and can prevent that cleaning fluid or final cleaning fluid from remaining in nozzle cleaning chamber;
3) negative pressure ventilation pipeline can ensure that cleaning fluid or final the smooth and easy of cleaning fluid reserve, and avoid residual;
4) shorten scavenging period, reduced the activity time that photoresistance nozzle cleans in cleaning cell body;
5) photoresistance nozzle is extracted out while cleaning cell body, prevent at the pollutant of nozzle waist and nozzle head residual, and reduce the use amount of cleaning fluid, reduce Material Cost, cleaning fluid pressure coordinates the pressure of nitrogen pressure and negative pressure ventilation pipeline, can ensure after cleaning fluid ejection comprehensively flooding nozzle head, and can directly do not blown to cleaning fluid outlet by the nitrogen of nitrogen blowing pipeline, can ensure the cleaning performance of nozzle head, also can avoid the residual of pollutant, the quality while ensureing photoresistance nozzle spray photoresistance is unaffected.
Brief description of the drawings
Fig. 1 is the cutaway view of former rinse bath cell body;
Fig. 2 is the cutaway view of rinse bath trough body structure after improving;
In figure: 1-nozzlend, 2-nozzle waist, 3-nozzle head, the anti-cleaning fluid of the 4-chamber of splashing, 5-rinse bath housing, the final washer jet of 6-, 7-cleaning fluid pipeline, 8-cleaning fluid outlet, 9-nozzle cleaning chamber, 10-increases cleaning fluid pipeline, 11-nitrogen blowing pipeline, 12-negative pressure ventilation pipeline newly.
Detailed description of the invention
Below in conjunction with drawings and Examples, a kind of rinse bath body structure and application thereof for photoresistance nozzle of the present invention is further described.
Embodiment
As shown in Figure 2, a kind of rinse bath body structure and application thereof for photoresistance nozzle, comprise rinse bath housing 5, anti-cleaning fluid splash chamber 4, nozzle cleaning chamber 9, cleaning fluid outlet 8, nozzlend 1, nozzle waist 2, nozzle head 3, cleaning fluid pipeline 7, final washer jet 6, cleaning fluid pipeline 7, through rinse bath housing 5, imports to the interior flooding nozzle head 3 in nozzle cleaning chamber 9 by cleaning fluid; After cleaning fluid flooding nozzle head 3, discharge from cleaning fluid outlet 8, final washer jet 6 is for rinsing the raffinate that nozzle head 3 is cleaned to complete cleaning fluid pipeline 7 exits afterwards; At least also comprise that a road increases cleaning fluid pipeline 10 newly, the outlet of cleaning fluid pipeline 7 and newly-increased cleaning fluid pipeline 10 at the inwall in nozzle cleaning chamber 9 along uniform on horizontal circumferencial direction; Cleaning fluid pipeline 7 and newly-increased cleaning fluid pipeline 10 is angle of inclination with horizontal direction to be arranged, cleaning fluid is along cleaning fluid pipeline 7 and newly-increased cleaning fluid pipeline 10 to nozzle cleaning chamber 9 direction flooding nozzle heads 3 inner on the lower side.
Between cleaning fluid pipeline 7 and newly-increased cleaning fluid pipeline 10 and rinse bath housing 5, adopt caliber to be connected with the mode of aperture interference fit or and rinse bath housing 5 between be connected with screw thread or welding manner.
At least the outlet of cleaning fluid pipeline 7 and newly-increased cleaning fluid pipeline 10 two-way, at the inwall in nozzle cleaning chamber 9 along uniform on horizontal circumferencial direction, can ensure that nozzle head is cleaned comprehensively; Cleaning fluid pipeline 7 and newly-increased cleaning fluid pipeline 10 are angle of inclination with horizontal direction and arrange, cleaning fluid is along cleaning fluid pipeline 7 and newly-increased cleaning fluid pipeline 10 to nozzle cleaning chamber 9 direction flooding nozzle heads 3 inner on the lower side, can reduce cleaning fluid and be splashed to the splash situation in chamber of anti-cleaning fluid, reduce cleaning fluid and be attached on the situation of nozzle waist; Avoid splashing and residual cleaning fluid runs down into nozzle cleaning chamber or nozzle head and has influence on the cleannes of nozzle head.
The anti-cleaning fluid chamber 4 of splashing also has at least one road nitrogen blowing pipeline 11, and this nitrogen blowing pipeline 11 is angle of inclination with horizontal direction to be arranged, nitrogen chamber 4 direction inner on the lower side of splashing along this nitrogen blowing pipeline 11 to anti-cleaning fluid purges.
The angle of inclination of nitrogen blowing pipeline 11 is 30 to 60 degree.
The outlet of nitrogen blowing pipeline 11 be positioned at anti-cleaning fluid splash chamber 4 1/2nd height top.
Between nitrogen blowing pipeline 11 and rinse bath housing 5, adopt caliber to be connected with the mode of aperture interference fit or and rinse bath housing 5 between be connected with screw thread or welding manner.
Cleaning fluid outlet 8 also has at least one road negative pressure ventilation pipeline 12; Between negative pressure ventilation pipeline 12 and rinse bath housing 5, adopt caliber to be connected with the mode of aperture interference fit or and rinse bath housing 5 between be connected with screw thread or welding manner.
The angle of inclination of cleaning fluid pipeline 7 and newly-increased cleaning fluid pipeline 10 is 30 to 60 degree, and the outlet of cleaning fluid pipeline 7 and newly-increased cleaning fluid pipeline 10 and the centre position of nozzle head 3 are on sustained height.
Nitrogen blowing pipeline 11 is that the direction of 30 to 60 degree purges the anti-cleaning fluid chamber of splashing along angle of inclination, can make anti-cleaning fluid splash in chamber in barotropic state, can blow to downwards in nozzle cleaning chamber being splashed to the anti-cleaning fluid chamber cleaning liquid inside that splashes, and can prevent that cleaning fluid or final cleaning fluid from remaining in nozzle cleaning chamber, negative pressure ventilation pipeline can ensure that cleaning fluid or final the smooth and easy of cleaning fluid reserve, and avoid residual.
For an application for the rinse bath body structure of photoresistance nozzle, based on a kind of rinse bath body structure for photoresistance nozzle, its concrete application process is as follows:
1) before nozzle head 3 prepares to enter nozzle cleaning chamber 92 to 4 seconds, nitrogen blowing pipeline 11 started to purge the anti-cleaning fluid chamber 4 of splashing, and negative pressure ventilation pipeline 12 starts suck purge liquid outlet 8 simultaneously;
2) after nozzle head 3 enters cleaning chambers, the cleaning fluid of cleaning fluid pipeline 7 and newly-increased cleaning fluid pipeline 10 starts flooding nozzle head 3, and washing time maintains 3 to 5 seconds;
3) after rinsing, nozzle head 3 is extracted out from clean cell body;
4) final washer jet 6 starts to rinse the outlet position of cleaning fluid pipeline 7 and newly-increased cleaning fluid pipeline 10, and final washer jet 6 washing times maintain 2 to 4 seconds;
5) final washer jet 6 stopped rinsing after 2 to 3 seconds, and nitrogen blowing pipeline 11 stops purging, and negative pressure ventilation pipeline 12 stops suction simultaneously.
The cleaning fluid pressure of cleaning fluid pipeline 7 and newly-increased cleaning fluid pipeline 10 is 2 to 3 kilograms; The nitrogen pressure of nitrogen blowing pipeline 11 is 1 to 2 kilogram; The pressure of negative pressure ventilation pipeline 12 is 0 to 1 kilogram that bears; Final cleaning fluid pressure is 1 to 2 kilogram.
Photoresistance nozzle is extracted out while cleaning cell body, prevent at the pollutant of nozzle waist and nozzle head residual, and reduce the use amount of cleaning fluid, reduce Material Cost, cleaning fluid pressure is 2 to 3 kilograms, coordinate negative 0 to 1 kilogram of the pressure of 1 to 2 kilogram of nitrogen pressure of nitrogen blowing pipeline 11 and negative pressure ventilation pipeline 12, can ensure after cleaning fluid ejection comprehensively flooding nozzle head, and can directly do not blown to cleaning fluid outlet by the nitrogen of nitrogen blowing pipeline 11, can ensure the cleaning performance of nozzle head, also can avoid the residual of pollutant, quality while ensureing photoresistance nozzle spray photoresistance is unaffected.
Use a kind of rinse bath body structure and application thereof for photoresistance nozzle of the present invention, can ensure that nozzle head is cleaned comprehensively; And can reduce cleaning fluid and be splashed to the splash situation in chamber of anti-cleaning fluid, reduce cleaning fluid and be attached on the situation of nozzle waist; Nitrogen blowing pipeline can make anti-cleaning fluid splash in chamber in barotropic state, can blow to downwards in nozzle cleaning chamber being splashed to the anti-cleaning fluid chamber cleaning liquid inside that splashes, and can prevent that cleaning fluid or final cleaning fluid from remaining in nozzle cleaning chamber; So trough body structure of the present invention and application thereof can ensure the cleaning performance of nozzle head, also can avoid the residual of pollutant, the quality while ensureing photoresistance nozzle spray photoresistance is unaffected.The present invention is applicable to rinse bath body structure and the application thereof of various photoetching glue spreader photoresistance nozzles.
Claims (10)
1. the rinse bath body structure for photoresistance nozzle, comprise rinse bath housing (5), anti-cleaning fluid splash chamber (4), nozzle cleaning chamber (9), cleaning fluid outlet (8), nozzlend (1), nozzle waist (2), nozzle head (3), cleaning fluid pipeline (7), final washer jet (6), described cleaning fluid pipeline (7), through rinse bath housing (5), imports to the interior flooding nozzle head in nozzle cleaning chamber (9) (3) by cleaning fluid; After cleaning fluid flooding nozzle head (3), discharge from cleaning fluid outlet (8), described final washer jet (6) is for rinsing the raffinate that nozzle head (3) is cleaned to complete cleaning fluid pipeline (7) exit afterwards; It is characterized in that, at least also comprise that a road increases cleaning fluid pipeline (10) newly, the outlet of cleaning fluid pipeline (7) and newly-increased cleaning fluid pipeline (10) at the inwall of nozzle cleaning chamber (9) along uniform on horizontal circumferencial direction; Described cleaning fluid pipeline (7) and newly-increased cleaning fluid pipeline (10) and horizontal direction are angle of inclination arranges, cleaning fluid is along cleaning fluid pipeline (7) and newly-increased cleaning fluid pipeline (10) to nozzle cleaning chamber (9) inside direction flooding nozzle head (3) on the lower side.
2. rinse bath body structure according to claim 1, it is characterized in that, between described cleaning fluid pipeline (7) and newly-increased cleaning fluid pipeline (10) and rinse bath housing (5), adopt caliber to be connected with the mode of aperture interference fit or and rinse bath housing (5) between be connected with screw thread or welding manner.
3. rinse bath body structure according to claim 1, it is characterized in that, the described anti-cleaning fluid chamber (4) of splashing also has at least one road nitrogen blowing pipeline (11), this nitrogen blowing pipeline (11) and horizontal direction are angle of inclination arranges, nitrogen chamber (4) direction inner on the lower side of splashing along this nitrogen blowing pipeline (11) to anti-cleaning fluid purges.
4. rinse bath body structure according to claim 3, is characterized in that, described angle of inclination is 30 to 60 degree.
5. rinse bath body structure according to claim 3, is characterized in that, the outlet of described nitrogen blowing pipeline (11) be positioned at anti-cleaning fluid splash chamber (4) 1/2nd height top.
6. rinse bath body structure according to claim 3, it is characterized in that, between described nitrogen blowing pipeline (11) and rinse bath housing (5), adopt caliber to be connected with the mode of aperture interference fit or and rinse bath housing (5) between be connected with screw thread or welding manner.
7. rinse bath body structure according to claim 1, is characterized in that, described cleaning fluid outlet (8) also has at least one road negative pressure ventilation pipeline (12); Between described negative pressure ventilation pipeline (12) and rinse bath housing (5), adopt caliber to be connected with the mode of aperture interference fit or and rinse bath housing (5) between be connected with screw thread or welding manner.
8. rinse bath body structure according to claim 1, it is characterized in that, described angle of inclination is 30 to 60 degree, and the outlet of described cleaning fluid pipeline (7) and newly-increased cleaning fluid pipeline (10) and the centre position of nozzle head (3) are on sustained height.
9. for an application for photoresistance nozzle cleaning trough body structure, based on the claims 1, to a kind of rinse bath body structure for photoresistance nozzle claimed in claim 8, its concrete application process is as follows:
1) prepare to enter nozzle cleaning chamber (9) 2 to 4 seconds before at nozzle head (3), nitrogen blowing pipeline (11) starts to purge the anti-cleaning fluid chamber (4) of splashing, and negative pressure ventilation pipeline (12) starts suck purge liquid outlet (8) simultaneously;
2) after nozzle head (3) enters cleaning chambers, the cleaning fluid of cleaning fluid pipeline (7) and newly-increased cleaning fluid pipeline (10) starts flooding nozzle head (3), and washing time maintains 3 to 5 seconds;
3) after rinsing, nozzle head (3) is extracted out from clean cell body;
4) final washer jet (6) starts to rinse the outlet position of cleaning fluid pipeline (7) and newly-increased cleaning fluid pipeline (10), and final washer jet (6) washing time maintains 2 to 4 seconds;
5) final washer jet (6) stopped rinsing after 2 to 3 seconds, and nitrogen blowing pipeline (11) stops purging, and negative pressure ventilation pipeline (12) stops suction simultaneously.
10. a kind of application for photoresistance nozzle cleaning trough body structure according to claim 9, is characterized in that, the cleaning fluid pressure of described cleaning fluid pipeline (7) and newly-increased cleaning fluid pipeline (10) is 2 to 3 kilograms; The nitrogen pressure of described nitrogen blowing pipeline (11) is 1 to 2 kilogram; The pressure of described negative pressure ventilation pipeline (12) is 0 to 1 kilogram that bears; Described final cleaning fluid pressure is 1 to 2 kilogram.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410174612.2A CN103949427B (en) | 2014-04-28 | 2014-04-28 | A kind of rinse bath body structure for photoresistance nozzle and application thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410174612.2A CN103949427B (en) | 2014-04-28 | 2014-04-28 | A kind of rinse bath body structure for photoresistance nozzle and application thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103949427A true CN103949427A (en) | 2014-07-30 |
| CN103949427B CN103949427B (en) | 2016-03-02 |
Family
ID=51326852
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410174612.2A Active CN103949427B (en) | 2014-04-28 | 2014-04-28 | A kind of rinse bath body structure for photoresistance nozzle and application thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103949427B (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105700294A (en) * | 2016-01-14 | 2016-06-22 | 武汉华星光电技术有限公司 | Nozzle cleaning jig for rubber coating machine and cleaning block of nozzle cleaning jig |
| CN106513355A (en) * | 2015-09-09 | 2017-03-22 | 沈阳芯源微电子设备有限公司 | Nozzle washing device and nozzle washing method |
| CN108856113A (en) * | 2018-05-29 | 2018-11-23 | 武汉华星光电技术有限公司 | Coating nozzles cleaning device |
| CN109290082A (en) * | 2017-07-25 | 2019-02-01 | 细美事有限公司 | Film forming method and film forming device |
| CN110187138A (en) * | 2019-07-02 | 2019-08-30 | 安图实验仪器(郑州)有限公司 | Sample needle cleaning solution drainage system for in-vitro diagnosis equipment |
| CN113752688A (en) * | 2021-09-10 | 2021-12-07 | 昆山晟丰精密机械有限公司 | Net bottom cleaning device in vacuum environment |
| CN114247677A (en) * | 2020-09-24 | 2022-03-29 | 中国科学院微电子研究所 | Cleaning equipment and cleaning method for glue outlet nozzle |
| CN114602872A (en) * | 2022-05-16 | 2022-06-10 | 宁波润华全芯微电子设备有限公司 | Nozzle test moisturizing box |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0471428A1 (en) * | 1990-08-14 | 1992-02-19 | CRC-Evans Rehabilitation Systems, Inc. | High pressure water jet cleaner and coating applicator |
| JPH05309309A (en) * | 1992-05-11 | 1993-11-22 | Mitsubishi Electric Corp | Cleaning device for applicator nozzle |
| DE19500410A1 (en) * | 1995-01-10 | 1996-07-18 | Amir Dr Zahedi | Method of removing remains of adhesive |
| CN202277978U (en) * | 2011-10-17 | 2012-06-20 | 中芯国际集成电路制造(上海)有限公司 | Cleaning device for light-sensitive lacquer sprayer |
| CN103170486A (en) * | 2013-03-29 | 2013-06-26 | 北京七星华创电子股份有限公司 | Self-cleaning cavity |
| CN203508454U (en) * | 2013-09-04 | 2014-04-02 | 京东方科技集团股份有限公司 | Cleaning device and coating machine |
-
2014
- 2014-04-28 CN CN201410174612.2A patent/CN103949427B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0471428A1 (en) * | 1990-08-14 | 1992-02-19 | CRC-Evans Rehabilitation Systems, Inc. | High pressure water jet cleaner and coating applicator |
| JPH05309309A (en) * | 1992-05-11 | 1993-11-22 | Mitsubishi Electric Corp | Cleaning device for applicator nozzle |
| DE19500410A1 (en) * | 1995-01-10 | 1996-07-18 | Amir Dr Zahedi | Method of removing remains of adhesive |
| CN202277978U (en) * | 2011-10-17 | 2012-06-20 | 中芯国际集成电路制造(上海)有限公司 | Cleaning device for light-sensitive lacquer sprayer |
| CN103170486A (en) * | 2013-03-29 | 2013-06-26 | 北京七星华创电子股份有限公司 | Self-cleaning cavity |
| CN203508454U (en) * | 2013-09-04 | 2014-04-02 | 京东方科技集团股份有限公司 | Cleaning device and coating machine |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106513355A (en) * | 2015-09-09 | 2017-03-22 | 沈阳芯源微电子设备有限公司 | Nozzle washing device and nozzle washing method |
| CN106513355B (en) * | 2015-09-09 | 2019-11-26 | 沈阳芯源微电子设备股份有限公司 | A kind of nozzle cleaning and cleaning method |
| CN105700294A (en) * | 2016-01-14 | 2016-06-22 | 武汉华星光电技术有限公司 | Nozzle cleaning jig for rubber coating machine and cleaning block of nozzle cleaning jig |
| CN105700294B (en) * | 2016-01-14 | 2020-02-18 | 武汉华星光电技术有限公司 | Nozzle cleaning jig of spreading machine and cleaning block thereof |
| CN109290082A (en) * | 2017-07-25 | 2019-02-01 | 细美事有限公司 | Film forming method and film forming device |
| CN108856113A (en) * | 2018-05-29 | 2018-11-23 | 武汉华星光电技术有限公司 | Coating nozzles cleaning device |
| CN110187138A (en) * | 2019-07-02 | 2019-08-30 | 安图实验仪器(郑州)有限公司 | Sample needle cleaning solution drainage system for in-vitro diagnosis equipment |
| CN114247677A (en) * | 2020-09-24 | 2022-03-29 | 中国科学院微电子研究所 | Cleaning equipment and cleaning method for glue outlet nozzle |
| CN113752688A (en) * | 2021-09-10 | 2021-12-07 | 昆山晟丰精密机械有限公司 | Net bottom cleaning device in vacuum environment |
| CN113752688B (en) * | 2021-09-10 | 2023-05-02 | 昆山晟丰精密机械有限公司 | Net bottom cleaning device under vacuum environment |
| CN114602872A (en) * | 2022-05-16 | 2022-06-10 | 宁波润华全芯微电子设备有限公司 | Nozzle test moisturizing box |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103949427B (en) | 2016-03-02 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103949427A (en) | Cleaning trough body structure for photoresist nozzle and application of cleaning trough body structure | |
| CN109645921B (en) | Control method of cleaning machine | |
| CN106513355B (en) | A kind of nozzle cleaning and cleaning method | |
| KR20140065655A (en) | Injection nozzle unit and substrate cleaning device with the same | |
| CN204148064U (en) | A kind of cleaning device of liquid nozzle and cleaning platform | |
| CN204891591U (en) | Novel spray column | |
| KR100934329B1 (en) | Substrate processing equipment | |
| CN114247677A (en) | Cleaning equipment and cleaning method for glue outlet nozzle | |
| CN106040683B (en) | The automatic flushing device of ferrule | |
| CN211464060U (en) | Empty groove multilayer spray set | |
| CN207357663U (en) | Nozzle cleaning and wafer cleaning device | |
| CN209998006U (en) | Cleaning device for single-layer capacitor machining process | |
| WO2023134056A1 (en) | Cleaning device and cleaning method for nozzle | |
| JP2007144308A (en) | Cleaning device | |
| CN103286090A (en) | Device for cleaning rubber eraser in photoresist coating process, and photoresist coating machine | |
| US11919054B2 (en) | Cleaning device and method of cleaning nozzle | |
| CN211052117U (en) | Bonding wire cleaning water tank capable of discharging clean water | |
| CN205949145U (en) | Belt cleaning device of paint spray nozzle | |
| JPH1072098A (en) | Bottle washing machine having washing device for nozzle pipe | |
| CN218421164U (en) | Ammonium sulfate full flow groove | |
| KR0116341Y1 (en) | Automatic exhausting apparatus of bubble for wafer cleaning | |
| CN220678763U (en) | Developing nozzle cleaning and moisturizing device | |
| KR102181480B1 (en) | Washing apparatus of metal mask | |
| JPS62228951A (en) | Reaction cell cleaning device for automatic chemical analyzer | |
| KR101916263B1 (en) | Apparatus for removing form |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |