CN103949427B - A kind of rinse bath body structure for photoresistance nozzle and application thereof - Google Patents
A kind of rinse bath body structure for photoresistance nozzle and application thereof Download PDFInfo
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- CN103949427B CN103949427B CN201410174612.2A CN201410174612A CN103949427B CN 103949427 B CN103949427 B CN 103949427B CN 201410174612 A CN201410174612 A CN 201410174612A CN 103949427 B CN103949427 B CN 103949427B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
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- Cleaning By Liquid Or Steam (AREA)
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Abstract
For rinse bath body structure and the application thereof of photoresistance nozzle, comprise rinse bath housing, anti-cleaning fluid splashing chamber, nozzle cleaning chamber, cleaning fluid outlet, cleaning fluid pipeline, newly-increased cleaning fluid pipeline, nitrogen sparge tube road and negative pressure ventilation pipeline; Cleaning fluid, along cleaning fluid pipeline and the newly-increased cleaning fluid pipeline direction flooding nozzle head inner on the lower side to nozzle cleaning chamber, makes nozzle head comprehensively be cleaned; The nitrogen sparge tube road be in tilted layout and negative pressure ventilation pipeline can reduce the situation that cleaning fluid is splashed to anti-cleaning fluid splashing chamber, and can prevent cleaning fluid or final cleaning fluid from remaining in nozzle cleaning chamber.Trough body structure of the present invention and application thereof can ensure the cleaning performance of nozzle head, also can avoid the residual of pollutant, and quality when ensureing photoresistance nozzle spray photoresistance is unaffected.
Description
Technical field
The present invention relates to ic manufacturing technology field, particularly relate to a kind of rinse bath body structure and application thereof of photoetching glue spreader photoresistance nozzle.
Background technology
At present, IC manufacturing field widely uses a kind of photoetching glue spreader, and can stick at its nozzle position after photoetching glue spreader uses has foreign matter, in order to avoid the foreign matter sticked is to the pollution of integrated circuit, needs to clean its nozzle position; The structure of photoetching glue spreader photoresistance nozzle cleaning groove used at present as shown in Figure 1, wherein, 1 is nozzlend, and 2 is nozzle waist, and 3 is nozzle head, 4 is anti-cleaning fluid splashing chamber, 5 is rinse bath housing, and 6 is final washer jet, and 7 is cleaning fluid pipeline, 8 is cleaning fluid outlet, and 9 is nozzle cleaning chamber; Cleaning fluid, through rinse bath housing, is imported to flooding nozzle head in nozzle cleaning chamber by cleaning fluid pipeline; After cleaning fluid flooding nozzle head, discharge from cleaning fluid outlet, described final washer jet for rinse complete to nozzle head cleaning after the raffinate at cleaning fluid tube outlet place; Because only have a nozzle cleaning pipeline in current rinse bath body structure, can not washer jet head surrounding fully, nozzle head still can stick pollutant, when photoresistance nozzle spray photoresistance, these pollutants are brought on wafer, bring defect to wafer, thus affect the quality of wafer product.
Because rinse bath requires nozzle head to clean up, during to ensure photoresistance nozzle spray photoresistance, do not have pollutant effect to the quality of wafer, in order to reach above object, currently available technology is:
1) scavenging period of photoresistance nozzle in rinse bath is extended;
2) increase the caliber of cleaning fluid pipeline, strengthen the flow of cleaning fluid.
But along with the raising of line efficiency is produced in industry, require the holding time shortening every section of operation at present; And extend the scavenging period of photoresistance nozzle in rinse bath, can not ensure that the pollutant of nozzle head surrounding is all cleaned up; And increase the caliber of cleaning fluid pipeline, strengthen the flow of cleaning fluid, cleaning fluid not only can be caused to be splashed to nozzle waist, also create the waste of cleaning fluid, add on-the-spot Material Cost.
In sum, the rinse bath body structure of this photoresistance nozzle used both at home and abroad at present, has following shortcoming:
1) single cleaning fluid pipeline can not washer jet head surrounding fully, and nozzle head still can stick and has pollutant;
2) extend the scavenging period of photoresistance nozzle in rinse bath, occupy more activity time, and can not ensure that the pollutant of nozzle head surrounding is all cleaned up;
3) increase the caliber of cleaning fluid pipeline, strengthen the flow of cleaning fluid, cleaning fluid not only can be caused to be splashed to nozzle waist and run down into the cleannes that nozzle head affects nozzle head, also creating the waste of cleaning fluid, add on-the-spot Material Cost;
4) when photoresistance nozzle shifts out cleaning cell body, due to the tension force of liquid surface, the cleaning fluid containing pollutant can be attached on nozzle head, and is taken out of by photoresistance nozzle, thus quality when affecting photoresistance nozzle spray photoresistance;
5) remain in the cleaning fluid in nozzle cleaning chamber or final cleaning fluid, the nozzle head of contaminant bands to next photoresistance nozzle, the cleaning performance of next photoresistance nozzle can be affected.
Summary of the invention
Existing the problems referred to above during in order to solve the rinse bath cleaning photoresistance nozzle under prior art, the invention provides a kind of rinse bath body structure for photoresistance nozzle and application thereof, this rinse bath body structure and be applied in cleaning photoresistance nozzle time, comprehensive cleaning of nozzle head can be realized, and the cleaning fluid containing pollutant can be prevented to be splashed to nozzle waist, the cleaning fluid containing pollutant or final cleaning fluid can also be avoided to remain in nozzle cleaning chamber, with the adverse effect of pollution abatement thing to photoresistance nozzle.Concrete scheme of the present invention is as described below:
A kind of rinse bath body structure for photoresistance nozzle, comprise rinse bath housing, anti-cleaning fluid splashing chamber, nozzle cleaning chamber, cleaning fluid outlet, nozzlend, nozzle waist, nozzle head, cleaning fluid pipeline, final washer jet, cleaning fluid, through rinse bath housing, is imported to flooding nozzle head in nozzle cleaning chamber by described cleaning fluid pipeline; After cleaning fluid flooding nozzle head, discharge from cleaning fluid outlet, described final washer jet for rinse complete to nozzle head cleaning after the raffinate at cleaning fluid tube outlet place; At least also comprise a road and increase cleaning fluid pipeline newly, the inwall of outlet in nozzle cleaning chamber of cleaning fluid pipeline and newly-increased cleaning fluid pipeline is circumferentially uniform along level; Described cleaning fluid pipeline and newly-increased cleaning fluid pipeline and horizontal direction are that angle of inclination is arranged, cleaning fluid is along cleaning fluid pipeline and the newly-increased cleaning fluid pipeline direction flooding nozzle head inner on the lower side to nozzle cleaning chamber.
According to a kind of rinse bath body structure for photoresistance nozzle of the present invention, described cleaning fluid pipeline and newly-increased cleaning fluid pipeline are connected with the mode of aperture interference fit with adopting caliber between rinse bath housing or are connected with screw thread or welding manner with between rinse bath housing.
Purpose of design is herein, and at least the inwall of outlet in nozzle cleaning chamber of cleaning fluid pipeline and newly-increased cleaning fluid pipeline two-way is circumferentially uniform along level, can ensure that nozzle head is cleaned comprehensively; Cleaning fluid pipeline and newly-increased cleaning fluid pipeline and horizontal direction are that angle of inclination is arranged, cleaning fluid is along cleaning fluid pipeline and the newly-increased cleaning fluid pipeline direction flooding nozzle head inner on the lower side to nozzle cleaning chamber, the situation that cleaning fluid is splashed to anti-cleaning fluid splashing chamber can be reduced, reduce the situation that cleaning fluid is attached on nozzle waist; Avoid splashing and remain cleaning fluid run down into nozzle cleaning chamber or nozzle head and have influence on the cleannes of nozzle head.
According to a kind of rinse bath body structure for photoresistance nozzle of the present invention, described anti-cleaning fluid splashing chamber also has nitrogen sparge tube road, at least one road, this nitrogen sparge tube road and horizontal direction are that angle of inclination is arranged, the direction purging that nitrogen is inner on the lower side along this nitrogen sparge tube road direction anti-cleaning fluid splashing chamber.
According to a kind of rinse bath body structure for photoresistance nozzle of the present invention, described angle of inclination is 30 to 60 degree.
According to a kind of rinse bath body structure for photoresistance nozzle of the present invention, the outlet on described nitrogen sparge tube road is positioned at the top of 1/2nd height in anti-cleaning fluid splashing chamber.
According to a kind of rinse bath body structure for photoresistance nozzle of the present invention, described nitrogen sparge tube road is connected with the mode of aperture interference fit with adopting caliber between rinse bath housing or is connected with screw thread or welding manner with between rinse bath housing.
According to a kind of rinse bath body structure for photoresistance nozzle of the present invention, described cleaning fluid outlet also has at least one road negative pressure ventilation pipeline; Described negative pressure ventilation pipeline is connected with the mode of aperture interference fit with adopting caliber between rinse bath housing or is connected with screw thread or welding manner with between rinse bath housing.
According to a kind of rinse bath body structure for photoresistance nozzle of the present invention, described angle of inclination is 30 to 60 degree, and described cleaning fluid pipeline and the newly-increased outlet of cleaning fluid pipeline and the centre position of nozzle head are on sustained height.
Purpose of design is herein, nitrogen sparge tube curb angle of inclination is that the direction of 30 to 60 degree purges anti-cleaning fluid splashing chamber, can make to be in barotropic state in anti-cleaning fluid splashing chamber, can blow in nozzle cleaning chamber downwards being splashed to anti-cleaning fluid splashing chamber cleaning liquid inside, and can prevent cleaning fluid or final cleaning fluid from remaining in nozzle cleaning chamber, negative pressure ventilation pipeline can ensure that cleaning fluid or final the smooth and easy of cleaning fluid reserve, and avoids remaining.
According to the application of a kind of rinse bath body structure for photoresistance nozzle of the present invention, based on above-mentioned a kind of rinse bath body structure for photoresistance nozzle, its embody rule method is as follows:
1) before nozzle head prepares to enter nozzle cleaning chamber 2 to 4 seconds, nitrogen sparge tube road started to purge anti-cleaning fluid splashing chamber, and simultaneously negative pressure ventilation pipeline starts suck purge liquid outlet;
2) after nozzle head enters cleaning chambers, the cleaning fluid of cleaning fluid pipeline and newly-increased cleaning fluid pipeline starts flooding nozzle head, and washing time maintains 3 to 5 seconds;
3), after rinsing, nozzle head is extracted out from cleaning cell body;
4) final washer jet starts the outlet position rinsing cleaning fluid pipeline and newly-increased cleaning fluid pipeline, and final washer jet washing time maintains 2 to 4 seconds;
5) final washer jet stops flushing after 2 to 3 seconds, and nitrogen sparge tube road stops purging, and negative pressure ventilation pipeline stops suction simultaneously.
According to a kind of application for photoresistance nozzle cleaning trough body structure of the present invention, it is characterized in that, the cleaning fluid pressure of described cleaning fluid pipeline and newly-increased cleaning fluid pipeline is 2 to 3 kilograms; The nitrogen pressure on described nitrogen sparge tube road is 1 to 2 kilogram; The pressure of described negative pressure ventilation pipeline is negative 0 to 1 kilogram; Described final cleaning fluid pressure is 1 to 2 kilogram.
Purpose of design is herein, when photoresistance nozzle extracts cleaning cell body out, prevent from remaining at the pollutant of nozzle waist and nozzle head, and reduce the use amount of cleaning fluid, reduce Material Cost, cleaning fluid pressure is 2 to 3 kilograms, coordinate 0 to 1 kilogram that the pressure of 1 to 2 kilogram of nitrogen pressure of nitrogen sparge tube road and negative pressure ventilation pipeline is negative, can ensure after cleaning fluid ejection can comprehensive flooding nozzle head, and can not directly be blown to cleaning fluid outlet by the nitrogen on nitrogen sparge tube road, the cleaning performance of nozzle head can be ensured, also the residual of pollutant can be avoided, quality when ensureing photoresistance nozzle spray photoresistance is unaffected.
A kind of rinse bath body structure for photoresistance nozzle of the present invention and application thereof is used to obtain following beneficial effect:
1) at least the inwall of the cleaning fluid tube outlet of two-way in nozzle cleaning chamber is circumferentially uniform along level, can ensure that nozzle head is cleaned comprehensively; And the situation that cleaning fluid is splashed to anti-cleaning fluid splashing chamber can be reduced, reduce the situation that cleaning fluid is attached on nozzle waist; Avoid splashing and remain cleaning fluid run down into nozzle cleaning chamber or nozzle head and have influence on the cleannes of nozzle head;
2) nitrogen sparge tube road can make to be in barotropic state in anti-cleaning fluid splashing chamber, can blow to downwards in nozzle cleaning chamber being splashed to anti-cleaning fluid splashing chamber cleaning liquid inside, and can prevent cleaning fluid or final cleaning fluid from remaining in nozzle cleaning chamber;
3) negative pressure ventilation pipeline can ensure that cleaning fluid or final the smooth and easy of cleaning fluid reserve, and avoids remaining;
4) shorten scavenging period, decrease the activity time that photoresistance nozzle cleans in cleaning cell body;
5) when photoresistance nozzle extracts cleaning cell body out, prevent and remain at the pollutant of nozzle waist and nozzle head, and reduce the use amount of cleaning fluid, reduce Material Cost, cleaning fluid pressure coordinates the pressure of nitrogen pressure and negative pressure ventilation pipeline, can ensure after cleaning fluid ejection can comprehensive flooding nozzle head, and can not directly be blown to cleaning fluid outlet by the nitrogen on nitrogen sparge tube road, the cleaning performance of nozzle head can be ensured, also can avoid the residual of pollutant, quality when ensureing photoresistance nozzle spray photoresistance is unaffected.
Accompanying drawing explanation
Fig. 1 is the sectional view of former rinse bath cell body;
Fig. 2 is the sectional view of rinse bath trough body structure after improving;
In figure: 1-nozzlend, 2-nozzle waist, 3-nozzle head, 4-anti-cleaning fluid splashing chamber, 5-rinse bath housing, the final washer jet of 6-, 7-cleaning fluid pipeline, 8-cleaning fluid outlet, 9-nozzle cleaning chamber, 10-increases cleaning fluid pipeline newly, 11-nitrogen sparge tube road, 12-negative pressure ventilation pipeline.
Detailed description of the invention
Below in conjunction with drawings and Examples, a kind of rinse bath body structure for photoresistance nozzle of the present invention and application thereof are further described.
Embodiment
As shown in Figure 2, a kind of rinse bath body structure for photoresistance nozzle and application thereof, comprise rinse bath housing 5, anti-cleaning fluid splashing chamber 4, nozzle cleaning chamber 9, cleaning fluid outlet 8, nozzlend 1, nozzle waist 2, nozzle head 3, cleaning fluid pipeline 7, final washer jet 6, cleaning fluid, through rinse bath housing 5, is imported to flooding nozzle head 3 in nozzle cleaning chamber 9 by cleaning fluid pipeline 7; After cleaning fluid flooding nozzle head 3, discharge from cleaning fluid outlet 8, final washer jet 6 for rinse to nozzle head 3 clean complete after the raffinate in cleaning fluid pipeline 7 exit; At least also comprise a road and increase cleaning fluid pipeline 10 newly, the inwall of outlet in nozzle cleaning chamber 9 of cleaning fluid pipeline 7 and newly-increased cleaning fluid pipeline 10 is circumferentially uniform along level; Cleaning fluid pipeline 7 and newly-increased cleaning fluid pipeline 10 be that angle of inclination is arranged with horizontal direction, and cleaning fluid is along cleaning fluid pipeline 7 and the newly-increased cleaning fluid pipeline 10 direction flooding nozzle head 3 on the lower side to inside, nozzle cleaning chamber 9.
Cleaning fluid pipeline 7 and newly-increased cleaning fluid pipeline 10 are connected with the mode of aperture interference fit with adopting caliber between rinse bath housing 5 or are connected with screw thread or welding manner with between rinse bath housing 5.
At least the inwall of outlet in nozzle cleaning chamber 9 of cleaning fluid pipeline 7 and newly-increased cleaning fluid pipeline 10 two-way is circumferentially uniform along level, can ensure that nozzle head is cleaned comprehensively; Cleaning fluid pipeline 7 and newly-increased cleaning fluid pipeline 10 are that angle of inclination is arranged with horizontal direction, cleaning fluid is along cleaning fluid pipeline 7 and the newly-increased cleaning fluid pipeline 10 direction flooding nozzle head 3 inner on the lower side to nozzle cleaning chamber 9, the situation that cleaning fluid is splashed to anti-cleaning fluid splashing chamber can be reduced, reduce the situation that cleaning fluid is attached on nozzle waist; Avoid splashing and remain cleaning fluid run down into nozzle cleaning chamber or nozzle head and have influence on the cleannes of nozzle head.
Anti-cleaning fluid splashing chamber 4 also has nitrogen sparge tube road, at least one road 11, and this nitrogen sparge tube road 11 is that angle of inclination is arranged with horizontal direction, the direction purging that nitrogen is inner on the lower side to anti-cleaning fluid splashing chamber 4 along this nitrogen sparge tube road 11.
The angle of inclination on nitrogen sparge tube road 11 is 30 to 60 degree.
The outlet on nitrogen sparge tube road 11 is positioned at the top of 1/2nd height in anti-cleaning fluid splashing chamber 4.
Caliber is adopted to be connected with the mode of aperture interference fit or to be connected with screw thread or welding manner with between rinse bath housing 5 between nitrogen sparge tube road 11 with rinse bath housing 5.
Cleaning fluid outlet 8 also has at least one road negative pressure ventilation pipeline 12; Caliber is adopted to be connected with the mode of aperture interference fit or to be connected with screw thread or welding manner with between rinse bath housing 5 between negative pressure ventilation pipeline 12 with rinse bath housing 5.
The angle of inclination of cleaning fluid pipeline 7 and newly-increased cleaning fluid pipeline 10 is 30 to 60 degree, and the outlet of cleaning fluid pipeline 7 and newly-increased cleaning fluid pipeline 10 and the centre position of nozzle head 3 are on sustained height.
Nitrogen sparge tube road 11 is that the direction of 30 to 60 degree purges anti-cleaning fluid splashing chamber along angle of inclination, can make to be in barotropic state in anti-cleaning fluid splashing chamber, can blow in nozzle cleaning chamber downwards being splashed to anti-cleaning fluid splashing chamber cleaning liquid inside, and can prevent cleaning fluid or final cleaning fluid from remaining in nozzle cleaning chamber, negative pressure ventilation pipeline can ensure that cleaning fluid or final the smooth and easy of cleaning fluid reserve, and avoids remaining.
For an application for the rinse bath body structure of photoresistance nozzle, based on a kind of rinse bath body structure for photoresistance nozzle, its embody rule method is as follows:
1) before nozzle head 3 prepares to enter nozzle cleaning chamber 92 to 4 seconds, nitrogen sparge tube road 11 started to purge anti-cleaning fluid splashing chamber 4, and simultaneously negative pressure ventilation pipeline 12 starts suck purge liquid outlet 8;
2) after nozzle head 3 enters cleaning chambers, the cleaning fluid of cleaning fluid pipeline 7 and newly-increased cleaning fluid pipeline 10 starts flooding nozzle head 3, and washing time maintains 3 to 5 seconds;
3), after rinsing, nozzle head 3 is extracted out from cleaning cell body;
4) final washer jet 6 starts the outlet position rinsing cleaning fluid pipeline 7 and newly-increased cleaning fluid pipeline 10, and final washer jet 6 washing time maintains 2 to 4 seconds;
5) final washer jet 6 stops flushing after 2 to 3 seconds, and nitrogen sparge tube road 11 stops purging, and negative pressure ventilation pipeline 12 stops suction simultaneously.
The cleaning fluid pressure of cleaning fluid pipeline 7 and newly-increased cleaning fluid pipeline 10 is 2 to 3 kilograms; The nitrogen pressure on nitrogen sparge tube road 11 is 1 to 2 kilogram; The pressure of negative pressure ventilation pipeline 12 is negative 0 to 1 kilogram; Final cleaning fluid pressure is 1 to 2 kilogram.
When photoresistance nozzle extracts cleaning cell body out, prevent and remain at the pollutant of nozzle waist and nozzle head, and reduce the use amount of cleaning fluid, reduce Material Cost, cleaning fluid pressure is 2 to 3 kilograms, coordinate 0 to 1 kilogram that the pressure of 1 to 2 kilogram of nitrogen pressure of nitrogen sparge tube road 11 and negative pressure ventilation pipeline 12 is negative, can ensure after cleaning fluid ejection can comprehensive flooding nozzle head, and can not directly be blown to cleaning fluid outlet by the nitrogen on nitrogen sparge tube road 11, the cleaning performance of nozzle head can be ensured, also the residual of pollutant can be avoided, quality when ensureing photoresistance nozzle spray photoresistance is unaffected.
Use a kind of rinse bath body structure for photoresistance nozzle of the present invention and application thereof, can ensure that nozzle head is cleaned comprehensively; And the situation that cleaning fluid is splashed to anti-cleaning fluid splashing chamber can be reduced, reduce the situation that cleaning fluid is attached on nozzle waist; Nitrogen sparge tube road can make to be in barotropic state in anti-cleaning fluid splashing chamber, can blow to downwards in nozzle cleaning chamber being splashed to anti-cleaning fluid splashing chamber cleaning liquid inside, and can prevent cleaning fluid or final cleaning fluid from remaining in nozzle cleaning chamber; So trough body structure of the present invention and application thereof can ensure the cleaning performance of nozzle head, also can avoid the residual of pollutant, quality when ensureing photoresistance nozzle spray photoresistance is unaffected.The present invention is applicable to rinse bath body structure and the application thereof of various photoetching glue spreader photoresistance nozzle.
Claims (9)
1. the rinse bath body structure for photoresistance nozzle, comprise rinse bath housing (5), anti-cleaning fluid splashing chamber (4), nozzle cleaning chamber (9), cleaning fluid outlet (8), nozzlend (1), nozzle waist (2), nozzle head (3), cleaning fluid pipeline (7), final washer jet (6), cleaning fluid, through rinse bath housing (5), is imported to the interior flooding nozzle head (3) in nozzle cleaning chamber (9) by described cleaning fluid pipeline (7); After cleaning fluid flooding nozzle head (3), discharge from cleaning fluid outlet (8), described final washer jet (6) for rinse to nozzle head (3) clean complete after the raffinate in cleaning fluid pipeline (7) exit; It is characterized in that, at least also comprise a road and increase cleaning fluid pipeline (10) newly, the outlet of cleaning fluid pipeline (7) and newly-increased cleaning fluid pipeline (10) is circumferentially uniform along level at the inwall of nozzle cleaning chamber (9); Described cleaning fluid pipeline (7) and newly-increased cleaning fluid pipeline (10) and horizontal direction be that angle of inclination is arranged, cleaning fluid is along cleaning fluid pipeline (7) and newly-increased cleaning fluid pipeline (10) direction flooding nozzle head (3) on the lower side to nozzle cleaning chamber (9) inside; Described anti-cleaning fluid splashing chamber (4) also has nitrogen sparge tube road, at least one road (11), this nitrogen sparge tube road (11) and horizontal direction are that angle of inclination is arranged, nitrogen purges along this nitrogen sparge tube road (11) to the direction that anti-cleaning fluid splashing chamber (4) is inner on the lower side, make to be in barotropic state in anti-cleaning fluid splashing chamber (4), can blow to downwards in nozzle cleaning chamber (9) being splashed to anti-cleaning fluid splashing chamber (4) cleaning liquid inside, and can prevent cleaning fluid or final cleaning fluid from remaining in nozzle cleaning chamber (9); The outlet of described nitrogen sparge tube road (11) is higher than the outlet of described cleaning fluid pipeline (7) and newly-increased cleaning fluid pipeline (10).
2. rinse bath body structure according to claim 1, it is characterized in that, described cleaning fluid pipeline (7) and adopt caliber to be connected with the mode of aperture interference fit between newly-increased cleaning fluid pipeline (10) with rinse bath housing (5) or be connected with screw thread or welding manner with between rinse bath housing (5).
3. rinse bath body structure according to claim 1, is characterized in that, described angle of inclination is 30 to 60 degree.
4. rinse bath body structure according to claim 1, is characterized in that, the outlet of described nitrogen sparge tube road (11) is positioned at the top of 1/2nd height of anti-cleaning fluid splashing chamber (4).
5. rinse bath body structure according to claim 1, it is characterized in that, described nitrogen sparge tube road (11) is connected with the mode of aperture interference fit with adopting caliber between rinse bath housing (5) or is connected with screw thread or welding manner with between rinse bath housing (5).
6. rinse bath body structure according to claim 1, is characterized in that, described cleaning fluid outlet (8) also has at least one road negative pressure ventilation pipeline (12); Described negative pressure ventilation pipeline (12) is connected with the mode of aperture interference fit with adopting caliber between rinse bath housing (5) or is connected with screw thread or welding manner with between rinse bath housing (5).
7. rinse bath body structure according to claim 1, it is characterized in that, described angle of inclination is 30 to 60 degree, and the outlet of described cleaning fluid pipeline (7) and newly-increased cleaning fluid pipeline (10) and the centre position of nozzle head (3) are on sustained height.
8., for an application for photoresistance nozzle cleaning trough body structure, based on the claims 1 to a kind of rinse bath body structure for photoresistance nozzle according to claim 7, its embody rule method is as follows:
1) prepare to enter nozzle cleaning chamber (9) 2 to 4 seconds before at nozzle head (3), nitrogen sparge tube road (11) starts to purge anti-cleaning fluid splashing chamber (4), and negative pressure ventilation pipeline (12) starts suck purge liquid outlet (8) simultaneously;
2) after nozzle head (3) enters cleaning chambers, the cleaning fluid of cleaning fluid pipeline (7) and newly-increased cleaning fluid pipeline (10) starts flooding nozzle head (3), and washing time maintains 3 to 5 seconds;
3), after rinsing, nozzle head (3) is extracted out from cleaning cell body;
4) final washer jet (6) starts the outlet position rinsing cleaning fluid pipeline (7) and newly-increased cleaning fluid pipeline (10), and final washer jet (6) washing time maintains 2 to 4 seconds;
5) final washer jet (6) stops flushing after 2 to 3 seconds, and nitrogen sparge tube road (11) stop purging, and negative pressure ventilation pipeline (12) stops suction simultaneously.
9. a kind of application for photoresistance nozzle cleaning trough body structure according to claim 8, is characterized in that, the cleaning fluid pressure of described cleaning fluid pipeline (7) and newly-increased cleaning fluid pipeline (10) is 0.2 to 0.3MPa; The nitrogen pressure of described nitrogen sparge tube road (11) is 0.1 to 0.2MPa; The pressure of described negative pressure ventilation pipeline (12) is negative 0 to 0.1MPa; Described final cleaning fluid pressure is 0.1 to 0.2MPa.
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| CN201410174612.2A CN103949427B (en) | 2014-04-28 | 2014-04-28 | A kind of rinse bath body structure for photoresistance nozzle and application thereof |
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| CN103949427B true CN103949427B (en) | 2016-03-02 |
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| CN108856113A (en) * | 2018-05-29 | 2018-11-23 | 武汉华星光电技术有限公司 | Coating nozzles cleaning device |
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| CN114247677A (en) * | 2020-09-24 | 2022-03-29 | 中国科学院微电子研究所 | Cleaning equipment and cleaning method for glue outlet nozzle |
| CN113752688B (en) * | 2021-09-10 | 2023-05-02 | 昆山晟丰精密机械有限公司 | Net bottom cleaning device under vacuum environment |
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| CN103949427A (en) | 2014-07-30 |
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