CN204148064U - A kind of cleaning device of liquid nozzle and cleaning platform - Google Patents
A kind of cleaning device of liquid nozzle and cleaning platform Download PDFInfo
- Publication number
- CN204148064U CN204148064U CN201420142270.1U CN201420142270U CN204148064U CN 204148064 U CN204148064 U CN 204148064U CN 201420142270 U CN201420142270 U CN 201420142270U CN 204148064 U CN204148064 U CN 204148064U
- Authority
- CN
- China
- Prior art keywords
- cleaning
- liquid
- liquid nozzle
- nozzle
- rinse bath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 97
- 238000004140 cleaning Methods 0.000 title claims abstract description 76
- 239000007789 gas Substances 0.000 claims abstract description 37
- 239000012530 fluid Substances 0.000 claims abstract description 32
- 239000011261 inert gas Substances 0.000 claims abstract description 14
- 239000007921 spray Substances 0.000 claims abstract description 7
- 238000007599 discharging Methods 0.000 claims abstract description 4
- 238000002347 injection Methods 0.000 claims description 4
- 239000007924 injection Substances 0.000 claims description 4
- 238000003860 storage Methods 0.000 claims description 4
- 238000005507 spraying Methods 0.000 claims description 2
- 238000002425 crystallisation Methods 0.000 abstract description 13
- 230000008025 crystallization Effects 0.000 abstract description 13
- 238000004519 manufacturing process Methods 0.000 abstract description 7
- 238000000034 method Methods 0.000 abstract description 6
- 238000005516 engineering process Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000003749 cleanliness Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
Abstract
The utility model provides a kind of cleaning device and cleaning platform of liquid nozzle, comprising: rinse bath, and its top is provided with the opening inserting liquid nozzle; At least one fluid injector, be configured in described liquid nozzle jet cleaning liquid in rinse bath, described fluid injector connects liquid line, and described liquid line is provided with valve; At least one gas nozzle, is configured in rinse bath and sprays inert gas to described liquid nozzle, and described gas nozzle connects gas piping, and described gas piping is provided with valve; Drainage pipe, is configured in bottom of rinse bath for discharging the cleaning fluid after cleaning.The utility model dries up by cleaning also gas to liquid nozzle in rinse bath, thus liquid crystallization residual on cleaning liquid nozzle, reduce in liquid nozzle moving process or the crystallization of production process herb liquid drop wafer surface may, reduce the possibility of volatilizing in cleaning machine simultaneously, ensure the environment of cleaning machine inside, improve the quality of wafer.
Description
Technical field
The utility model belongs to technical field of semiconductor wafer technology, is specially a kind of cleaning device and cleaning platform of liquid nozzle.
Background technology
The deep-submicron stage is being entered into along with integrated circuit feature size, the cleanliness factor of wafer surface required in IC wafer manufacturing process is more and more harsher, in order to ensure the cleanliness factor on wafer material surface, there is hundreds of roads matting in the manufacturing process of integrated circuit, matting account for 30% of whole manufacture process.
Such as, but in cleaning process, occurred some problems: as shown in Figure 1, liquid nozzle 1 sprays liquid corrosion wafer 2 surface, and liquid nozzle 1 sprays liquid in the position of the about 3cm in distance wafer 2 surface.Due to the in-plant injection wafer surface of needs, liquid is easy to backwash on liquid nozzle, if things go on like this liquid crystallization can be accumulated on liquid nozzle, to move or in production process at liquid nozzle, liquid crystallization can be dropped in wafer surface, reduce wafer quality, on liquid nozzle, liquid crystallization also can be volatilized in cleaning machine simultaneously, affects the environment of whole cleaning machine inside.
Therefore, the quality avoiding liquid crystallization residual on liquid nozzle to affect silicon chip becomes those skilled in the art's problem demanding prompt solution.
Utility model content
For the deficiencies in the prior art part, the purpose of this utility model is to provide a kind of cleaning device and cleaning platform of liquid nozzle, avoids liquid crystallization residual on liquid nozzle to affect the quality of silicon chip.
The utility model object is realized by following technical proposals:
A cleaning device for liquid nozzle, described liquid nozzle is used for spraying liquid to wafer, comprising:
Rinse bath, is arranged on the side of cleaning machine, and its top is provided with the opening inserting liquid nozzle;
At least one fluid injector, be configured in described liquid nozzle jet cleaning liquid in rinse bath, described fluid injector connects liquid line, and described liquid line is provided with valve;
At least one gas nozzle, is configured in rinse bath and sprays inert gas to described liquid nozzle, and described gas nozzle connects gas piping, and described gas piping is provided with valve;
Drainage pipe, is configured in bottom of rinse bath for discharging the cleaning fluid after cleaning;
Wherein, when cleaning machine quits work, moved to by liquid nozzle in described rinse bath, described fluid injector and described gas nozzle clean liquid nozzle and dry up.
Preferably, described gas nozzle is positioned at the top of described fluid injector.
Preferably, described liquid line connects cleaning fluid memory cell.
Wherein, described cleaning fluid is preferably deionized water.
Preferably, described gas piping connects inert gas storage unit.
Wherein, described inert gas is preferably nitrogen.
Preferably, be provided with multiple described fluid injector in described rinse bath or be provided with multiple described gas nozzle.
Preferably, described fluid injector or/and described gas nozzle the horizontal direction in described rinse bath on evenly configure.
Preferably, the downward-sloping injection inert gas of described gas nozzle.
A kind of cleaning platform, the lateral circumferential direction of cleaning machine is provided with the cleaning device of liquid nozzle described above.
Preferably, described liquid nozzle level can move left and right and vertically move up and down relative to described cleaning machine.
The utility model dries up by cleaning also gas to liquid nozzle in rinse bath, thus liquid crystallization residual on cleaning liquid nozzle, reduce in liquid nozzle moving process or the crystallization of production process herb liquid drop wafer surface may, reduce the possibility that liquid crystallization is volatilized in cleaning machine simultaneously, ensure the environment of cleaning machine inside, improve the quality of wafer.
Accompanying drawing explanation
In order to be illustrated more clearly in the technical scheme in the utility model embodiment, be briefly described to the accompanying drawing used required in embodiment below, apparently, accompanying drawing in the following describes is only embodiments more of the present utility model, for those of ordinary skill in the art, under the prerequisite not paying creative work, other accompanying drawing can also be obtained according to these accompanying drawings.
Fig. 1 is that existing liquid nozzle sprays the structural representation of liquid to wafer surface;
Fig. 2 is the structural representation of the cleaning device of the utility model herb liquid nozzle;
Fig. 3 is the structural representation of cleaning machine in the utility model.
Number in the figure is described as follows:
100, liquid nozzle; 200, wafer; 300, cleaning device; 310, rinse bath; 311, opening; 320, fluid injector; 330, gas nozzle; 340, Drainage pipe; 350, cleaning fluid memory cell; 360, inert gas storage unit; 370, valve.
Detailed description of the invention
Graphic and embodiment below will be coordinated to describe embodiment of the present utility model in detail, by this to the utility model how application technology means solve technical problem and the implementation procedure reaching technology effect can fully understand and implement according to this.
As shown in Figure 2, the utility model provides a kind of cleaning device 300 of liquid nozzle, comprising: rinse bath 310, and its top is provided with the opening 311 inserting liquid nozzle; At least one fluid injector 320, be configured in described liquid nozzle 100 jet cleaning liquid in rinse bath 310, described fluid injector 320 connects liquid line, and described liquid line is provided with valve 370; At least one gas nozzle 330, be configured in rinse bath 310 and spray inert gas to described liquid nozzle 100, described gas nozzle 330 connects gas piping, and described gas piping is provided with valve 370; Drainage pipe 340, is configured in bottom rinse bath 310 for discharging the cleaning fluid after cleaning.
Wherein, described liquid line connects cleaning fluid memory cell 350, and described cleaning fluid is preferably deionized water (DIW); Described gas piping connects inert gas storage unit 360, and described inert gas is preferably nitrogen (N
2).Preferably, described gas nozzle 330 is positioned at the top of described fluid injector 320.
In order to make liquid nozzle 100 can uniform injected cleaning fluid or inert gas, be provided with multiple described fluid injector 320 in described rinse bath 310 or be provided with multiple described gas nozzle 330, described fluid injector 320 or/and described gas nozzle 330 the horizontal direction in described rinse bath 310 on evenly configure.Dry up to accelerate the liquid nozzle after cleaning, the downward-sloping injection inert gas of described gas nozzle 330, makes the cleaning fluid on liquid nozzle 100 discharge rinse bath 310 faster.
As shown in Figure 3, the utility model additionally provides a kind of cleaning platform, the lateral circumferential direction of cleaning machine is provided with the cleaning device 300 of liquid nozzle described above, described liquid nozzle 100 level can move left and right and vertically move up and down relative to described cleaning machine, when cleaning machine quits work, liquid nozzle 100 is moved in rinse bath 310, liquid nozzle 100 is cleaned and dries up.
The utility model dries up by cleaning also gas to liquid nozzle in rinse bath, thus liquid crystallization residual on cleaning liquid nozzle, reduce in liquid nozzle moving process or the crystallization of production process herb liquid drop wafer surface may, reduce the possibility that liquid crystallization is volatilized in cleaning machine simultaneously, ensure the environment of cleaning machine inside, improve the quality of wafer.
Above-mentioned explanation illustrate and describes some preferred embodiments of the present utility model, but as previously mentioned, be to be understood that the utility model is not limited to the form disclosed by this paper, should not regard the eliminating to other embodiments as, and can be used for other combinations various, amendment and environment, and can in utility model contemplated scope described herein, changed by the technology of above-mentioned instruction or association area or knowledge.And the change that those skilled in the art carry out and change do not depart from spirit and scope of the present utility model, then all should in the protection domain of the utility model claims.
Claims (9)
1. a cleaning device for liquid nozzle, described liquid nozzle is used for spraying liquid to wafer, it is characterized in that, comprising:
Rinse bath, is arranged on the side of cleaning machine, and its top is provided with the opening inserting liquid nozzle;
At least one fluid injector, be configured in described liquid nozzle jet cleaning liquid in rinse bath, described fluid injector connects liquid line, and described liquid line is provided with valve;
At least one gas nozzle, is configured in rinse bath and sprays inert gas to described liquid nozzle, and described gas nozzle connects gas piping, and described gas piping is provided with valve;
Drainage pipe, is configured in bottom of rinse bath for discharging the cleaning fluid after cleaning;
Wherein, when cleaning machine quits work, moved to by liquid nozzle in described rinse bath, described fluid injector and described gas nozzle clean liquid nozzle and dry up.
2. the cleaning device of liquid nozzle according to claim 1, is characterized in that, described gas nozzle is positioned at the top of described fluid injector.
3. the cleaning device of liquid nozzle according to claim 1, is characterized in that, described liquid line connects cleaning fluid memory cell.
4. the cleaning device of liquid nozzle according to claim 1, is characterized in that, described gas piping connects inert gas storage unit.
5. the cleaning device of liquid nozzle according to claim 1, is characterized in that, is provided with multiple described fluid injector or is provided with multiple described gas nozzle in described rinse bath.
6. the cleaning device of liquid nozzle according to claim 5, is characterized in that, described fluid injector or/and described gas nozzle the horizontal direction in described rinse bath on evenly configure.
7. the cleaning device of liquid nozzle according to claim 5, is characterized in that, the downward-sloping injection inert gas of described gas nozzle.
8. a cleaning platform, is characterized in that, the lateral circumferential direction of cleaning machine is provided with as arbitrary in claim 1 ~ 7 as described in the cleaning device of liquid nozzle.
9. cleaning platform according to claim 8, is characterized in that, described liquid nozzle level can move left and right and vertically move up and down relative to described cleaning machine.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420142270.1U CN204148064U (en) | 2014-03-27 | 2014-03-27 | A kind of cleaning device of liquid nozzle and cleaning platform |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420142270.1U CN204148064U (en) | 2014-03-27 | 2014-03-27 | A kind of cleaning device of liquid nozzle and cleaning platform |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204148064U true CN204148064U (en) | 2015-02-11 |
Family
ID=52506217
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420142270.1U Expired - Lifetime CN204148064U (en) | 2014-03-27 | 2014-03-27 | A kind of cleaning device of liquid nozzle and cleaning platform |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204148064U (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104941876A (en) * | 2015-07-15 | 2015-09-30 | 合肥鑫晟光电科技有限公司 | Cleaning equipment of gumming machine rubber heads |
| CN105182689A (en) * | 2015-10-30 | 2015-12-23 | 京东方科技集团股份有限公司 | Adhesive coating device and cleaning method for adhesive discharging nozzle thereof |
| CN107008707A (en) * | 2017-06-02 | 2017-08-04 | 武汉华星光电技术有限公司 | Manifold cleaning device and manifold cleaning method |
| CN108453084A (en) * | 2018-01-29 | 2018-08-28 | 德淮半导体有限公司 | Nozzle cleaning and wafer cleaning equipment |
| CN109663775A (en) * | 2018-12-27 | 2019-04-23 | 上海华力微电子有限公司 | Spray head cleaning structure and method |
-
2014
- 2014-03-27 CN CN201420142270.1U patent/CN204148064U/en not_active Expired - Lifetime
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104941876A (en) * | 2015-07-15 | 2015-09-30 | 合肥鑫晟光电科技有限公司 | Cleaning equipment of gumming machine rubber heads |
| CN105182689A (en) * | 2015-10-30 | 2015-12-23 | 京东方科技集团股份有限公司 | Adhesive coating device and cleaning method for adhesive discharging nozzle thereof |
| CN107008707A (en) * | 2017-06-02 | 2017-08-04 | 武汉华星光电技术有限公司 | Manifold cleaning device and manifold cleaning method |
| CN108453084A (en) * | 2018-01-29 | 2018-08-28 | 德淮半导体有限公司 | Nozzle cleaning and wafer cleaning equipment |
| CN109663775A (en) * | 2018-12-27 | 2019-04-23 | 上海华力微电子有限公司 | Spray head cleaning structure and method |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term |
Granted publication date: 20150211 |