CN202277978U - Cleaning device for light-sensitive lacquer sprayer - Google Patents
Cleaning device for light-sensitive lacquer sprayer Download PDFInfo
- Publication number
- CN202277978U CN202277978U CN2011203957952U CN201120395795U CN202277978U CN 202277978 U CN202277978 U CN 202277978U CN 2011203957952 U CN2011203957952 U CN 2011203957952U CN 201120395795 U CN201120395795 U CN 201120395795U CN 202277978 U CN202277978 U CN 202277978U
- Authority
- CN
- China
- Prior art keywords
- cleaning device
- shower nozzle
- cleaning
- photoresist
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The utility model relates to a cleaning device for a light-sensitive lacquer sprayer, which comprises a cleaning groove, at least one flushing tube and a liquid drainage tube. The shaped of the inner wall of the cleaning groove matches with that of the light-sensitive lacquer sprayer, the flushing tubes are arranged on the cleaning groove, a liquid outlet tube opening of each flushing tube faces to the light-sensitive lacquer sprayer, and the liquid drainage tube is disposed at the bottom of the cleaning groove. Compared with the prior art, the cleaning device for the light-sensitive lacquer sprayer is disposed on photoetching equipment, before light-sensitive lacquer is sprayed on wafers, residual impurities located surrounding the light-sensitive lacquer sprayer are cleaned and removed at first, accordingly, led-in impurities in a light-sensitive lacquer spraying process can be reduced, defects caused by pollutants in photoetching process are reduced, and the quality of the photoetching process is improved.
Description
Technical field
The utility model relates to a kind of integrated circuit technology manufacturing equipment, relates in particular to a kind of cleaning device that is used for reducing the photoresist shower nozzle of the defect problem that the photoetching process pollutant causes.
Background technology
In integrated circuit technology was made, the various physical units of transistor, diode, electric capacity, resistance and metal level constituted in crystal column surface or top layer.These parts pass through photo-etching technological process, finally the part of keeping characteristics figure on wafer.The target that photoetching process (Lithographic Process) is produced is the requirement according to circuit design, generates accurate in size pattern image, and the correct position of crystal column surface and with other parts (parts) related correctly.
Photoetching process is one the most key in the basic technology made of integrated circuit technology.Photoetching process has been confirmed the critical size of device.Photoetching process is equivalent to the camera technique of high-tech version, is under fabulous microsize, to accomplish.Yet many problems of photoetching process can not be ignored, the mistake that at first produces in the photoetching process can cause figure distort or alignment bad, finally can be converted into electrical characteristics harmful effect to semiconductor devices; The dislocation of photoetching process figure also can cause similar bad result; In addition, another problem of photoetching process is a defective, and all contaminations can cause defective in processing procedure.For example, when the crystal column surface that provides applied photoresist, the photoresist shower nozzle that is used to spray photoresist moved at crystal column surface evenly, and sprays photoresist equably to crystal column surface; The photoresist shower nozzle is in the spraying environment of photoresist formation in spraying photoresist process for a long time, can form the mass crystallization particle around it; If the untimely removing of this crystalline particle on the wafer of the follow-up spraying photoresist that drops accidentally, gently then causes the photoresist distortion; Heavy then cause that wafer scratches problem, and photoetching process will accomplish 5 layers to 20 layers even more in the production process of a wafer, so; Crystalline particle such as untimely cleaning, the pollution problem meeting of generation is further amplified.
The utility model content
The purpose of the utility model provides a kind of cleaning device of photoresist shower nozzle, to reduce the impurity of introducing in the spraying photoresist process, reduces the defect problem that pollutant causes in the photoetching process, improves the quality of photoetching process.
For addressing the above problem, the utility model provides a kind of cleaning device of photoresist shower nozzle, comprises rinse bath, at least one cleaning hose and at least one discharging tube, the shape adaptation of said rinse bath inner wall shape and said photoresist shower nozzle; Said cleaning hose is arranged on the rinse bath, and the fluid mouth of pipe of said cleaning hose is towards said photoresist shower nozzle; Said discharging tube is arranged at said bottom of rinse bath.
Further, the fluid mouth of pipe of said cleaning hose is positioned at the sidewall middle part of said rinse bath.
Further, relative position is provided with two said cleaning hoses on said rinse bath.
Further, the diameter of said cleaning hose is 2mm～5mm.
Further, the diameter of said discharging tube is greater than the diameter of said cleaning hose.
Further, the diameter of said discharging tube is less than the diameter of said cleaning hose
Further, the material of said cleaning device is a Teflon.
Further, said cleaning device also comprises the drying unit that is used to dry said photoresist shower nozzle, and said drying unit is arranged on the rinse bath.
Than prior art; The cleaning device of the photoresist shower nozzle that the utility model provided is arranged on the lithographic equipment; Before to wafer spraying photoresist, first cleaning and removing is removed and is positioned at photoresist shower nozzle residual impurity on every side, thereby has reduced the impurity of introducing in the spraying photoresist process; Reduce the defect problem that pollutant causes in the photoetching process, improved the quality of photoetching process.
Description of drawings
Fig. 1 is the structural representation of the cleaning device of photoresist shower nozzle among the utility model first embodiment.
Fig. 2 is the structural representation of the cleaning device of photoresist shower nozzle among the utility model second embodiment.
Fig. 3 is the structural representation of the cleaning device of photoresist shower nozzle among the utility model the 3rd embodiment.
The specific embodiment
For the content that makes the utility model is clear more understandable,, the content of the utility model is described further below in conjunction with Figure of description.Certainly the utility model is not limited to this specific embodiment, and the general replacement that those skilled in the art knew also is encompassed in the protection domain of the utility model.
Secondly, the utility model utilizes sketch map to carry out detailed statement, and when the utility model instance was detailed, for the ease of explanation, sketch map did not amplify according to general ratio is local, should be with this as the qualification to the utility model.
Embodiment one
Fig. 1 is the structural representation of the cleaning device of photoresist shower nozzle among the utility model first embodiment; As shown in Figure 1; Present embodiment provides a kind of cleaning device of photoresist shower nozzle, and said cleaning device comprises rinse bath 101, at least one cleaning hose 103 and at least one discharging tube 105.
The shape of the inner wall shape of said rinse bath 101 and said photoresist shower nozzle 100 is suitable; And the said photoresist shower nozzle 100 of the inner wall surrounding of said rinse bath 101 is provided with; And shape and photoresist shower nozzle 100 shape approximations, but greater than the size of said photoresist shower nozzle 100, the inner wall shape of said rinse bath 101 can improve the efficient of flushing photoresist shower nozzle 100; And prevent in the flushing process that flushing liquor spills and causes secondary environmental pollution.
Said cleaning hose 103 is arranged on the rinse bath 101, and the fluid mouth of pipe of said cleaning hose 103 is towards said photoresist shower nozzle 100; Preferable; The fluid mouth of pipe of said cleaning hose 103 is positioned at the sidewall middle part of said rinse bath; Can try one's best wash all sidedly photoresist shower nozzle 100 around, and the efficient of improve cleaning, the diameter of said cleaning hose 103 is 2mm～5mm; Abundant cleaning photoetching glue shower nozzle 100, and can too much not waste cleaning fluid; The quantity of said cleaning hose 103 is not limit.Wherein, the flushing liquor of said cleaning hose 103 outflows for example is propylene or deionized water.
Said discharging tube 105 is arranged at said rinse bath 101 bottoms.Preferably, the diameter of said discharging tube 105 is more than or equal to the diameter of said cleaning hose 105, realizes that the discharge of total flux and said discharging tube 105 of said cleaning hose 103 is suitable, avoids flushing liquor to accumulate in rinse bath 101.Certainly, the diameter of discharging tube 105 also can avoid flushing liquor to accumulate in rinse bath 101 through a plurality of discharging tubes 105 are set less than the diameter of said cleaning hose 105.
Preferably, the material of said cleaning device is common and the Teflon material that is difficult for being corroded or other can not be corroded and produce the material of contaminating impurities.
Embodiment two
As shown in Figure 2; It is the structural representation of the cleaning device of photoresist shower nozzle among the utility model second embodiment; Be that with implementing a difference relative position is provided with two cleaning hose 103a, 103b on the said in the present embodiment rinse bath 101, can preferably realize comprehensive cleaning of photoresist shower nozzle 100; The quantity of cleaning hose 103 can be four or other in addition, can realize that quantity that photoresist shower nozzle 100 cleans comprehensively are all in the thought range of the utility model.
Embodiment three
As shown in Figure 3; It is the brief configuration sketch map of the cleaning device of photoresist shower nozzle among the utility model the 3rd embodiment; Be that with the foregoing description difference said cleaning device can also be provided with drying unit 107, said drying unit 107 is arranged on the said rinse bath 101.After the flushing that cleaning hose 103 is accomplished photoresist shower nozzle 100; Photoresist shower nozzle 100 can upwards shift out; 107 pairs of photoresist shower nozzles of then said drying plant 100 are realized flash baking; Practice thrift the process time, and avoid flushing liquor residual on the photoresist shower nozzle 100 that jet-coating photoresit is polluted.
In sum; The utility model provides a kind of cleaning device of photoresist shower nozzle, is arranged on the lithographic equipment, before to wafer spraying photoresist; Elder generation's cleaning and removing is removed and is positioned at photoresist shower nozzle residual impurity on every side; Thereby reduced the impurity of introducing in the spraying photoresist process, reduced the defect problem that pollutant causes in the photoetching process, improved the quality of photoetching process.
Though the utility model discloses as above with preferred embodiment; Right its is not in order to limit the utility model; Has common knowledge the knowledgeable in the technical field under any; In spirit that does not break away from the utility model and scope, when can doing a little change and retouching, so the protection domain of the utility model is as the criterion when looking claims person of defining.
Claims (8)
1. the cleaning device of a photoresist shower nozzle is characterized in that, comprises
Rinse bath, the shape adaptation of its inner wall shape and said photoresist shower nozzle;
At least one cleaning hose is arranged on the rinse bath, and the fluid mouth of pipe of said cleaning hose is towards the photoresist shower nozzle;
At least one discharging tube is arranged at said bottom of rinse bath.
2. the cleaning device of photoresist shower nozzle as claimed in claim 1 is characterized in that, the fluid mouth of pipe of said cleaning hose is positioned at the sidewall middle part of said rinse bath.
3. according to claim 1 or claim 2 the cleaning device of photoresist shower nozzle is characterized in that relative position is provided with two said cleaning hoses on said rinse bath.
4. the cleaning device of photoresist shower nozzle as claimed in claim 1 is characterized in that, the diameter of said cleaning hose is 2mm～5mm.
5. like the cleaning device of claim 1 or 4 described photoresist shower nozzles, it is characterized in that the diameter of said discharging tube is greater than the diameter of said cleaning hose.
6. like the cleaning device of claim 1 or 4 described photoresist shower nozzles, it is characterized in that the diameter of said discharging tube is less than the diameter of said cleaning hose.
7. the cleaning device of photoresist shower nozzle as claimed in claim 1 is characterized in that, the material of said cleaning device is a Teflon.
8. the cleaning device of photoresist shower nozzle as claimed in claim 1 is characterized in that, said cleaning device also comprises the drying unit that is used to dry said photoresist shower nozzle, and said drying unit is arranged on the rinse bath.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011203957952U CN202277978U (en) | 2011-10-17 | 2011-10-17 | Cleaning device for light-sensitive lacquer sprayer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011203957952U CN202277978U (en) | 2011-10-17 | 2011-10-17 | Cleaning device for light-sensitive lacquer sprayer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202277978U true CN202277978U (en) | 2012-06-20 |
Family
ID=46224164
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011203957952U Expired - Fee Related CN202277978U (en) | 2011-10-17 | 2011-10-17 | Cleaning device for light-sensitive lacquer sprayer |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202277978U (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103949427A (en) * | 2014-04-28 | 2014-07-30 | 上海华力微电子有限公司 | Cleaning trough body structure for photoresist nozzle and application of cleaning trough body structure |
| CN104607408A (en) * | 2015-02-05 | 2015-05-13 | 广东中烟工业有限责任公司 | Cleaning system of superspeed packing machine glue spray gun |
| CN106054232A (en) * | 2015-04-01 | 2016-10-26 | 富士电机株式会社 | Water monitor |
| CN111330902A (en) * | 2018-12-19 | 2020-06-26 | 江苏鲁汶仪器有限公司 | Scanning nozzle cleaning tank and cleaning method |
| CN116967216A (en) * | 2023-09-25 | 2023-10-31 | 福建省德尚电子材料有限公司 | Photoresist pipeline system |
-
2011
- 2011-10-17 CN CN2011203957952U patent/CN202277978U/en not_active Expired - Fee Related
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103949427A (en) * | 2014-04-28 | 2014-07-30 | 上海华力微电子有限公司 | Cleaning trough body structure for photoresist nozzle and application of cleaning trough body structure |
| CN103949427B (en) * | 2014-04-28 | 2016-03-02 | 上海华力微电子有限公司 | A kind of rinse bath body structure for photoresistance nozzle and application thereof |
| CN104607408A (en) * | 2015-02-05 | 2015-05-13 | 广东中烟工业有限责任公司 | Cleaning system of superspeed packing machine glue spray gun |
| CN106054232A (en) * | 2015-04-01 | 2016-10-26 | 富士电机株式会社 | Water monitor |
| CN106054232B (en) * | 2015-04-01 | 2019-03-01 | 富士电机株式会社 | Water monitor |
| CN111330902A (en) * | 2018-12-19 | 2020-06-26 | 江苏鲁汶仪器有限公司 | Scanning nozzle cleaning tank and cleaning method |
| CN111330902B (en) * | 2018-12-19 | 2021-08-31 | 江苏鲁汶仪器有限公司 | Scanning nozzle cleaning tank and cleaning method |
| CN116967216A (en) * | 2023-09-25 | 2023-10-31 | 福建省德尚电子材料有限公司 | Photoresist pipeline system |
| CN116967216B (en) * | 2023-09-25 | 2023-12-19 | 福建省德尚电子材料有限公司 | Photoresist pipeline system |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN202277978U (en) | Cleaning device for light-sensitive lacquer sprayer | |
| TWI645915B (en) | Substrate wet processing device | |
| US20060028628A1 (en) | Lens cleaning module | |
| US20080002164A1 (en) | Apparatus and method for immersion lithography | |
| JP2007311408A (en) | Substrate processing equipment and method | |
| CN204148064U (en) | A kind of cleaning device of liquid nozzle and cleaning platform | |
| CN103878141A (en) | Semiconductor wafer washing device | |
| JP2008091637A (en) | Substrate cleaning method | |
| CN101847567B (en) | Device for cleaning base plate | |
| US20120180823A1 (en) | In-Situ Immersion Hood Cleaning | |
| JP6275090B2 (en) | Process separation type substrate processing apparatus and processing method | |
| KR100794919B1 (en) | Apparatus and method for glass etching | |
| CN105080892A (en) | Washing device and method for wafer supporting pieces | |
| CN110928143A (en) | Wafer workbench cleaning system and cleaning method | |
| CN105405741A (en) | Local cleaning device and method for wafer | |
| CN104465332B (en) | A kind of base plate cleaning device | |
| KR102535783B1 (en) | Apparatus for Treating Mask and the Method Thereof | |
| CN208737219U (en) | A kind of wafer work platform cleaning systems | |
| US6938629B2 (en) | Rinsing lid for wet bench | |
| JP2703424B2 (en) | Cleaning equipment | |
| WO2020062886A1 (en) | Developing unit cleaning device and cleaning method using same | |
| CN204892278U (en) | Photosensitive resist spouts mucilage binding to be put | |
| KR100812096B1 (en) | Apparatus and method for glass etching | |
| TWI566311B (en) | Semiconductor apparatus and operation method thereof | |
| CN105895552B (en) | Processing equipment integrating moisture removal and drying and processing method of semiconductor wafer |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING Free format text: FORMER OWNER: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION Effective date: 20130422 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 201203 PUDONG NEW AREA, SHANGHAI TO: 100176 DAXING, BEIJING |
|
| TR01 | Transfer of patent right |
Effective date of registration: 20130422 Address after: 100176 No. 18, Wenchang Avenue, Beijing economic and Technological Development Zone, Beijing Patentee after: Semiconductor Manufacturing International (Beijing) Corporation Address before: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Patentee before: Semiconductor Manufacturing International (Shanghai) Corporation |
|
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120620 Termination date: 20181017 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |