TW201703876A - Coating apparatus and coating method preventing the waste coating solution from leaking out of the nozzle when the coating solution is stored in the nozzle - Google Patents

Coating apparatus and coating method preventing the waste coating solution from leaking out of the nozzle when the coating solution is stored in the nozzle Download PDF

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Publication number
TW201703876A
TW201703876A TW105115044A TW105115044A TW201703876A TW 201703876 A TW201703876 A TW 201703876A TW 105115044 A TW105115044 A TW 105115044A TW 105115044 A TW105115044 A TW 105115044A TW 201703876 A TW201703876 A TW 201703876A
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Taiwan
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coating liquid
nozzle
coating
flow path
discharge port
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TW105115044A
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Chinese (zh)
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TWI622431B (en
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上野幸一
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思可林集團股份有限公司
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0254—Coating heads with slot-shaped outlet
    • B05C5/0258—Coating heads with slot-shaped outlet flow controlled, e.g. by a valve
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/02623—Liquid deposition
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0085—Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor

Abstract

The present invention provides a coating apparatus and a coating method, which provides a coating skill, spraying and coating the coating solution on the substrate from the spray outlet at the lower end section of the nozzle through the flow path arranged inside the nozzle, to prevent the waste coating solution from leaking out of the nozzle when the coating solution is stored in the nozzle, and to seek the reduction of the operation cost. The coating apparatus comprises: a coating solution supply section, employed to supply the coating solution to the nozzle; a close section having a close member capable of closing the spray outlet; a moving mechanism section, employed to move at least one of the nozzle and the close member; and a control section, employed to selectively switch the storage mode and the spray mode. The storage mode makes the close member abut upon the spray outlet and close the spray outlet by controlling the moving mechanism section for storing the coating solution supplied to the nozzle in the flow path. The spray mode makes the close member separate from the spray outlet and enable the spraying of the coating solution from the spray outlet.

Description

塗布裝置及塗布方法 Coating device and coating method

本發明係關於一種塗布裝置及塗布方法，其將塗布液塗布於液晶顯示裝置用玻璃基板、半導體晶圓(wafer)、PDP(plasma display panel：電漿顯示面板)用玻璃基板、光罩(photomask)用玻璃基板、彩色濾光片(color filter)用基板、記錄磁碟(recording disk)用基板、太陽電池用基板、電子紙(electronic paper)用基板等的精密電子裝置用基板(以下，簡稱為「基板」)。 The present invention relates to a coating apparatus and a coating method for applying a coating liquid to a glass substrate for a liquid crystal display device, a semiconductor wafer, a glass substrate for a PDP (plasma display panel), and a photomask (photomask) a substrate for a precision electronic device such as a glass substrate, a color filter substrate, a recording disk substrate, a solar cell substrate, or an electronic paper substrate (hereinafter, abbreviated as follows) It is "substrate").

習知以來，在上述的精密電子裝置用基板之製程中係採用將塗布液塗布於基板之表面的塗布裝置。例如在日本特許第5041827號公報中所記載的塗布裝置中係將塗布液從已形成於狹縫噴嘴(slit nozzle)之下端部的狹縫狀噴出口朝向基板噴出並予以塗布。在該狹縫噴嘴的內部係形成有塗布液的流路，供給至狹縫噴嘴的塗布液係經由該流路而流通至噴出口，且從噴出口噴出。在該塗布裝置中係能夠對該狹縫噴嘴供給二種類的塗布液，且能夠切換從狹縫噴嘴噴出的塗布液。 Conventionally, in the above-described process for a substrate for a precision electronic device, a coating device that applies a coating liquid onto the surface of a substrate is used. For example, in the coating device described in Japanese Patent No. 5041827, the coating liquid is discharged from the slit-shaped discharge port formed at the lower end portion of the slit nozzle toward the substrate and coated. A flow path of the coating liquid is formed inside the slit nozzle, and the coating liquid supplied to the slit nozzle flows through the flow path to the discharge port and is discharged from the discharge port. In the coating apparatus, it is possible to supply two kinds of coating liquids to the slit nozzles, and to switch the coating liquid discharged from the slit nozzles.

在進行塗布液之切換時係有必要在將先前塗布的塗布液(先前的塗布液)從狹縫噴嘴內去除之後再將下次塗布的塗布液(下次的塗布液)送入狹縫噴嘴。在上述習知裝置中係在狹縫噴嘴的兩端設置有埠口(port)。此等埠口當中的一方係具有作為供給專用埠口的功能，相對於此，另一方則 具有作為供給兼排出埠口的功能。然後，在進行塗布液之切換時係經由供給專用埠口來供給下次的塗布液，並且經由狹縫噴嘴內的流路及供給兼排出埠口來取出塗布液。藉由進行如此的操作，則即便先前的塗布液已殘留於狹縫噴嘴內仍能藉由下次的塗布液所沖走並從狹縫噴嘴去除。然後，在狹縫噴嘴內的流路置換成下次的塗布液並由下次的塗布液所充填之後，停止來自供給兼排出埠口的塗布液之排出，並且將下次的塗布液供給至供給兼排出埠口而由噴出口噴出下次的塗布液。 When switching the coating liquid, it is necessary to send the coating liquid (the next coating liquid) to be applied to the slit nozzle after the previously applied coating liquid (previous coating liquid) is removed from the slit nozzle. . In the above conventional device, a port is provided at both ends of the slit nozzle. One of these passes has a function as a supply-specific mouth, whereas the other side It has a function as a supply and discharge port. Then, when the coating liquid is switched, the next coating liquid is supplied through the supply nozzle, and the coating liquid is taken out through the flow path in the slit nozzle and the supply/discharge port. By performing such an operation, even if the previous coating liquid remains in the slit nozzle, it can be washed away by the next coating liquid and removed from the slit nozzle. Then, after the flow path in the slit nozzle is replaced with the next coating liquid and is filled by the next coating liquid, the discharge of the coating liquid from the supply/discharge port is stopped, and the next coating liquid is supplied to The supply and discharge of the mouth are discharged, and the next coating liquid is discharged from the discharge port.

可是，在包括上述狹縫噴嘴的一般噴嘴中，流路和噴出口係彼此連通，而且即便是在切換作業中，噴嘴的噴出口仍被開放。因此，有時塗布液會在切換作業中從噴嘴的噴出口流出。此種現象並非是在塗布液之切換作業中的固有問題，亦會在僅將特定的塗布液從噴嘴噴出的情況下發生。例如在噴嘴的流路並未由上述塗布液填滿的情況下係有必要在塗布處理前將上述塗布液供給至噴嘴並使上述塗布液貯留於流路內。當噴出口在該貯留處理中被開放時，無論是否在貯留處理的中途，塗布液都會從噴出口流出。 However, in the general nozzle including the slit nozzle described above, the flow path and the discharge port are in communication with each other, and even in the switching operation, the discharge port of the nozzle is opened. Therefore, sometimes the coating liquid flows out from the discharge port of the nozzle during the switching operation. Such a phenomenon is not an inherent problem in the switching operation of the coating liquid, and it also occurs when only a specific coating liquid is ejected from the nozzle. For example, when the flow path of the nozzle is not filled by the coating liquid, it is necessary to supply the coating liquid to the nozzle before the coating treatment, and to store the coating liquid in the flow path. When the discharge port is opened in the storage process, the coating liquid flows out from the discharge port regardless of whether or not the discharge port is in the middle of the storage process.

如此在先前技術中，因是在將噴嘴的噴出口始終保持開放的狀態下將塗布液供給至該噴嘴，故而不僅是在將塗布液塗布於基板的塗布處理中，就連塗布處理以外的時序(timing)中有時塗布液仍會從噴出口流出。在塗布液比較廉價的情況時，即便是在不進行塗布處理的期間，使噴嘴待機於遠離基板的位置，將流出的塗布液予以回收並廢棄，仍不被視為是問題。然而，當塗布液變為高價物時，塗布液的流出就會成為運轉成本增加的主要原因之一。 As described above, in the prior art, since the coating liquid is supplied to the nozzle while the discharge port of the nozzle is always kept open, not only the coating process for applying the coating liquid to the substrate but also the timing other than the coating process In the (timing), the coating liquid may still flow out from the discharge port. When the coating liquid is relatively inexpensive, the nozzle is allowed to stand at a position away from the substrate while the coating process is not being performed, and the discharged coating liquid is collected and discarded, which is not considered to be a problem. However, when the coating liquid becomes a high-priced product, the outflow of the coating liquid becomes one of the main causes of an increase in running cost.

本發明係有鑑於上述課題而開發完成者，其目的在於提供一種透過被設置於噴嘴之內部的流路將塗布液從被設置於噴嘴之下端部的噴出口噴出並塗布於基板的塗布技術，用以防止塗布液貯留於噴嘴時白白浪費掉的塗布液之流出並謀求運轉成本的減低。 The present invention has been developed in view of the above-described problems, and an object of the present invention is to provide a coating technique for ejecting a coating liquid from a discharge port provided at an end portion of a lower end of a nozzle and applying it to a substrate through a flow path provided inside the nozzle. It is used to prevent the outflow of the coating liquid which is wasted when the coating liquid is stored in the nozzle, and to reduce the running cost.

本發明的一態樣係一種使用具有噴嘴本體、噴出口及流路的噴嘴將塗布液塗布於基板的塗布裝置，該噴出口係設置於噴嘴本體的下端部，該流路係在噴嘴本體的內部將塗布液流通至噴出口，其特徵在於具備：塗布液供給部，用以將塗布液供給至噴嘴；封閉部，其具有能夠封閉噴出口的封閉構件；移動機構部，用以使噴嘴及封閉構件當中的至少一方移動；以及控制部，用以選擇性地切換貯留模式及噴出模式，該貯留模式係藉由控制移動機構部來使封閉構件抵接於噴出口並封閉噴出口以將供給至噴嘴的塗布液貯留於流路，該噴出模式係使封閉構件從噴出口分離並能夠將塗布液從噴出口噴出。 An aspect of the present invention is a coating apparatus for applying a coating liquid to a substrate by using a nozzle having a nozzle body, a discharge port, and a flow path, the discharge port being disposed at a lower end portion of the nozzle body, the flow path being attached to the nozzle body The coating liquid is internally supplied to the discharge port, and is characterized in that: a coating liquid supply unit for supplying the coating liquid to the nozzle; a closing portion having a closing member capable of closing the discharge port; and a moving mechanism portion for the nozzle and the nozzle At least one of the closing members moves; and a control portion for selectively switching the storage mode and the discharge mode, the storage mode is configured to control the moving mechanism portion to abut the sealing member to the discharge port and close the discharge port to supply The coating liquid to the nozzle is stored in the flow path, and the discharge mode separates the closing member from the discharge port and can eject the coating liquid from the discharge port.

又，本發明的另一態樣係一種使用具有噴嘴本體、噴出口及流路的噴嘴將塗布液塗布於基板的塗布方法，該噴出口係設置於噴嘴本體的下端部，該流路係在噴嘴本體的內部將塗布液流通至噴出口，其特徵在於具備：貯留步驟，其在使封閉構件抵接於噴出口並封閉噴出口的狀態下將塗布液供給至噴嘴並使塗布液貯留於流路；以及噴出步驟，其在貯留步驟之後使封閉構件從噴出口分離的狀態下將塗布液供給至噴嘴，藉此將貯留於流路的塗布液從噴出口噴出。 Moreover, another aspect of the present invention is a coating method for applying a coating liquid to a substrate by using a nozzle having a nozzle body, a discharge port, and a flow path, the discharge port being provided at a lower end portion of the nozzle body, the flow path being The inside of the nozzle body flows the coating liquid to the discharge port, and is characterized in that it has a storage step of supplying the coating liquid to the nozzle and storing the coating liquid in the flow while the closing member abuts against the discharge port and closes the discharge port. And a discharge step of supplying the coating liquid to the nozzle in a state where the sealing member is separated from the discharge port after the storage step, thereby discharging the coating liquid stored in the flow path from the discharge port.

如以上，依據本發明，藉由設置有能夠封閉噴嘴之噴出口的封閉構件，且利用該封閉構件來封閉噴出口，就能 阻止將塗布液供給至噴嘴並貯留於流路的期間塗布液從噴出口噴出。從而，能防止塗布液貯留於噴嘴時白白浪費掉的塗布液之流出並可以謀求運轉成本的減低。 As described above, according to the present invention, by providing a closing member capable of closing the discharge port of the nozzle, and closing the discharge port by the closing member, The coating liquid is prevented from being ejected from the ejection port while the coating liquid is supplied to the nozzle and stored in the flow path. Therefore, it is possible to prevent the outflow of the coating liquid that is wasted when the coating liquid is stored in the nozzle, and it is possible to reduce the running cost.

1‧‧‧塗布裝置 1‧‧‧ Coating device

2‧‧‧狹縫噴嘴 2‧‧‧Slit nozzle

3‧‧‧基板 3‧‧‧Substrate

4‧‧‧載台 4‧‧‧ stage

5‧‧‧塗布處理部 5‧‧‧ Coating Processing Department

6‧‧‧封閉部 6‧‧‧Department

7A至7C‧‧‧回收容器 7A to 7C‧‧‧Recycling containers

8‧‧‧預分配裝置 8‧‧‧Pre-distribution device

9‧‧‧控制部 9‧‧‧Control Department

10‧‧‧供給機構 10‧‧‧Supply institutions

11‧‧‧排出配管 11‧‧‧Discharge piping

12‧‧‧排出用閥 12‧‧‧Exhaust valve

13‧‧‧感測器(偵測部) 13‧‧‧Sensor (detection department)

21‧‧‧噴嘴體(噴嘴本體) 21‧‧‧Nozzle body (nozzle body)

22‧‧‧供給口 22‧‧‧ supply port

23‧‧‧噴出口 23‧‧‧Spray outlet

24‧‧‧排出口(排氣孔) 24‧‧‧Exhaust (venting hole)

31‧‧‧(基板3的)表面 31‧‧‧ (surface of substrate 3)

41‧‧‧保持面 41‧‧‧ Keep face

51‧‧‧噴嘴支承體 51‧‧‧Nozzle support

51a‧‧‧固定構件 51a‧‧‧Fixed components

51b‧‧‧升降機構(移動機構部) 51b‧‧‧ Lifting Mechanism (Movement Department)

52‧‧‧導軌 52‧‧‧rails

53‧‧‧狹縫噴嘴移動部(移動機構部) 53‧‧‧Slit nozzle moving part (moving mechanism part)

54‧‧‧線性馬達(移動機構部) 54‧‧‧Linear motor (moving mechanism department)

54a‧‧‧定子 54a‧‧‧stator

54b‧‧‧動子 54b‧‧‧ mover

55‧‧‧線性編碼器 55‧‧‧Linear encoder

55a‧‧‧比例尺部 55a‧‧‧scale

55b‧‧‧檢測部 55b‧‧‧Detection Department

61‧‧‧封閉構件 61‧‧‧Closed components

62‧‧‧回收容器 62‧‧‧Recycling container

63‧‧‧排洩配管 63‧‧‧Excretion piping

81‧‧‧貯留槽 81‧‧‧reservoir

82‧‧‧預分配輥 82‧‧‧Pre-distribution roller

82a‧‧‧軸心 82a‧‧‧Axis

83‧‧‧刮刀 83‧‧‧ scraper

84‧‧‧溶劑 84‧‧‧Solvent

91‧‧‧CPU 91‧‧‧CPU

92‧‧‧ROM 92‧‧‧ROM

93‧‧‧RAM 93‧‧‧RAM

94‧‧‧固定磁碟 94‧‧‧Fixed Disk

101A、101B‧‧‧供給部(塗布液供給部) 101A, 101B‧‧‧Supply unit (coating liquid supply unit)

102A、102B‧‧‧泵浦 102A, 102B‧‧‧ pump

103A、103B、107‧‧‧配管 103A, 103B, 107‧‧‧ piping

104、106、109‧‧‧三通閥 104, 106, 109‧‧‧ three-way valve

105‧‧‧供給配管 105‧‧‧Supply piping

108‧‧‧四通閥 108‧‧‧ four-way valve

210‧‧‧流路 210‧‧‧flow path

211、212‧‧‧噴嘴構件 211, 212‧‧‧ nozzle components

213、214‧‧‧側板 213, 214‧‧‧ side panels

611‧‧‧基底板 611‧‧‧Base plate

612‧‧‧彈性板(封閉構件) 612‧‧‧Elastic plate (closed member)

911‧‧‧充填判定部 911‧‧‧ Filling and Judging Department

912‧‧‧模式切換部 912‧‧‧Mode Switching Department

AR1‧‧‧噴嘴調整區 AR1‧‧‧Nozzle adjustment zone

Z1‧‧‧封閉高度位置 Z1‧‧‧closed height position

圖1係顯示本發明的塗布裝置之第一實施形態的立體圖。 Fig. 1 is a perspective view showing a first embodiment of the coating apparatus of the present invention.

圖2係顯示圖1所示的塗布裝置之構成的側視圖。 Fig. 2 is a side view showing the configuration of the coating device shown in Fig. 1.

圖3A係狹縫噴嘴的立體圖。 Fig. 3A is a perspective view of a slit nozzle.

圖3B係顯示圖3A所示的狹縫噴嘴之內部的流路之示意圖。 Fig. 3B is a schematic view showing a flow path inside the slit nozzle shown in Fig. 3A.

圖4係顯示封閉部之構成的示意圖。 Fig. 4 is a schematic view showing the configuration of a closing portion.

圖5A至圖5F係顯示圖1之塗布裝置中所裝配的供給機構之構成及運作的示意圖。 5A to 5F are schematic views showing the configuration and operation of a supply mechanism assembled in the coating apparatus of Fig. 1.

圖6係顯示用以控制圖1所示的塗布裝置之電氣構成的方塊圖。 Figure 6 is a block diagram showing the electrical configuration for controlling the coating apparatus shown in Figure 1.

圖7A至圖7F係顯示本發明的塗布裝置之第二實施形態中所裝配的供給機構之構成及運作的示意圖。 7A to 7F are schematic views showing the configuration and operation of a supply mechanism assembled in a second embodiment of the coating apparatus of the present invention.

圖1係顯示本發明的塗布裝置之第一實施形態的立體圖。又，圖2係顯示圖1所示的塗布裝置之構成的側視圖。另外，在圖1、圖2及以後的各圖中係為了明確其等的方向關係而適當附記將Z方向作為鉛直方向、將XY平面作為水平面的XYZ正交座標系。又，在容易理解的目的下，依需要而誇張或簡化描述各部的尺寸或數目。又，在圖2中係省略了噴嘴支承體等一部分的構成。 Fig. 1 is a perspective view showing a first embodiment of the coating apparatus of the present invention. 2 is a side view showing the configuration of the coating device shown in FIG. 1. In addition, in each of FIG. 1, FIG. 2, and subsequent figures, in order to clarify the directional relationship, the XYZ orthogonal coordinate system in which the Z direction is the vertical direction and the XY plane is the horizontal plane is appropriately attached. Also, for the purpose of easy understanding, the size or number of each part is exaggerated or simplified as needed. In addition, in FIG. 2, the structure of the nozzle support body etc. is abbreviate|omitted.

塗布裝置1係指使用狹縫噴嘴2將塗布液塗布於基板3之表面31之被稱為狹縫塗布機(slit coater)的塗布裝置。 作為塗布裝置1的塗布液係能夠使用阻劑(resist)液、彩色濾光片用液、聚醯亞胺(polyimide)、矽(silicon)、奈米金屬油墨(nano metal ink)、包括導電性材料的漿料(slurry)等各種的塗布液。又，就成為塗布對象的基板3而言，亦能夠應用於矩形玻璃基板、半導體基板、薄膜(film)液晶用可撓性基板(flexible substrate)、光罩用基板、彩色濾光片用基板、太陽電池用基板、有機EL(electroluminescence：電致發光)用基板等各種的基板。另外，在本實施形態中係事先準備二種類的塗布液，且能從一個狹縫噴嘴2切換二種類的塗布液來塗布。為了區別此等二種類的塗布液而將其中一方的塗布液稱為「塗布液A」，並且將另一方的塗布液稱為「塗布液B」。又，在不區別塗布液時係簡稱為「塗布液」。又，在本說明書中，所謂「基板3的表面31」係意指基板3的兩主面當中塗布有塗布液之此側的主面。 The coating device 1 is a coating device called a slit coater that applies a coating liquid onto the surface 31 of the substrate 3 using the slit nozzle 2 . As the coating liquid of the coating device 1, a resist liquid, a color filter liquid, a polyimide, a silicon, a nano metal ink, and the like can be used. Various coating liquids such as slurries of materials. In addition, the substrate 3 to be coated can also be applied to a rectangular glass substrate, a semiconductor substrate, a flexible substrate for a film liquid crystal, a substrate for a mask, a substrate for a color filter, and Various substrates such as a substrate for a solar cell and a substrate for an organic EL (electroluminescence). Further, in the present embodiment, two types of coating liquids are prepared in advance, and two kinds of coating liquids can be switched from one slit nozzle 2 to be applied. In order to distinguish between the two types of coating liquids, one of the coating liquids is referred to as "coating liquid A", and the other coating liquid is referred to as "coating liquid B". Further, when the coating liquid is not distinguished, it is simply referred to as "coating liquid". In the present specification, the "surface 31 of the substrate 3" means a main surface on the side where the coating liquid is applied to both main surfaces of the substrate 3.

塗布裝置1係具備：載台(stage)4，其能夠以水平姿勢吸引保持基板3；塗布處理部5，其使用狹縫噴嘴2對由載台4所保持的基板3施予塗布處理；封閉部6，用以在切換塗布液時封閉狹縫噴嘴2的噴出口；回收部7，用以回收從狹縫噴嘴2所沖洗(purge)的塗布液；預分配(pre-dispensing)裝置8，其在塗布處理之前先對狹縫噴嘴2施予預分配處理；以及控制部9，用以控制此等各部。 The coating apparatus 1 includes a stage 4 that can suck the holding substrate 3 in a horizontal posture, and a coating processing unit 5 that applies a coating process to the substrate 3 held by the stage 4 using the slit nozzle 2; a portion 6 for closing the discharge port of the slit nozzle 2 when the coating liquid is switched; a collecting portion 7 for recovering the coating liquid flushed from the slit nozzle 2; and a pre-dispensing device 8, It applies a pre-distribution process to the slit nozzle 2 before the coating process; and a control unit 9 for controlling the parts.

狹縫噴嘴2係具有朝向X方向延伸的長條狀之作為開口部的噴出口。然後，狹縫噴嘴2係能夠從噴出口朝向由載台4所保持的基板3之表面31噴出塗布液。另外，有關狹縫噴嘴2的構成將於後面詳述。 The slit nozzle 2 has an elongated discharge port that is an opening that extends in the X direction. Then, the slit nozzle 2 can eject the coating liquid from the discharge port toward the surface 31 of the substrate 3 held by the stage 4. In addition, the configuration of the slit nozzle 2 will be described in detail later.

載台4係由具有大致長方體之形狀的花崗岩等之石材所構成，在其上表面(+Z側)當中的-Y側係具備被加工成大 致水平的平坦面並保持基板3的保持面41。在保持面41係分散形成有未圖示的多數個真空吸引口。利用此等的真空吸引孔來吸引基板3，藉此就能在進行塗布處理時使基板3在指定的位置保持成大致水平狀態。另外，基板3的保持態樣並非被限定於此，例如亦可為機械式地保持基板3之構成。 The stage 4 is made of a stone such as granite having a substantially rectangular parallelepiped shape, and the -Y side of the upper surface (+Z side) is processed to be large. A horizontal flat surface is formed and the holding surface 41 of the substrate 3 is held. A plurality of vacuum suction ports (not shown) are formed in the holding surface 41 so as to be dispersed. By suctioning the substrate 3 by the vacuum suction holes, the substrate 3 can be maintained in a substantially horizontal state at a predetermined position during the coating process. Further, the holding state of the substrate 3 is not limited thereto, and for example, the configuration of the substrate 3 may be mechanically held.

又，在比保持面41在載台4中所占有的區域還靠+Y側係設置有噴嘴調整區AR1。然後，在噴嘴調整區AR1當中之從+Y側至-Y側係依順序配置有封閉部6、回收部7及預分配裝置8。 Moreover, the nozzle adjustment area AR1 is provided on the +Y side of the area occupied by the holding surface 41 in the stage 4. Then, the closing portion 6, the collecting portion 7, and the pre-distribution device 8 are disposed in order from the +Y side to the -Y side in the nozzle adjustment area AR1.

在本實施形態的塗布裝置1中，使狹縫噴嘴2朝向Y方向移動的移動機構部係設置於塗布處理部5，且使狹縫噴嘴2在保持面41的上方與噴嘴調整區AR1的上方之間往復移動。然後，在狹縫噴嘴2移動至噴嘴調整區AR1的上方之期間、即保持面41在載台4中所占有的區域之上方沒有狹縫噴嘴2的期間，能在載台4上進行塗布處理後的先行基板3之搬出和塗布處理前的後續基板3之搬入。另一方面，塗布液係在狹縫噴嘴2移動於保持面41的上方之期間塗布於該保持面41上的基板3之表面31。 In the coating device 1 of the present embodiment, the moving mechanism portion that moves the slit nozzle 2 in the Y direction is provided in the coating processing portion 5, and the slit nozzle 2 is above the holding surface 41 and above the nozzle adjustment region AR1. Reciprocating between. Then, during the period in which the slit nozzle 2 moves above the nozzle adjustment area AR1, that is, while the holding surface 41 does not have the slit nozzle 2 above the area occupied by the stage 4, the coating process can be performed on the stage 4. The subsequent substrate 3 is carried out and the subsequent substrate 3 before the coating process is carried in. On the other hand, the coating liquid is applied to the surface 31 of the substrate 3 on the holding surface 41 while the slit nozzle 2 is moved above the holding surface 41.

塗布處理部5的移動機構部係主要具有：橋梁(bridge)構造的噴嘴支承體51，其在X方向橫過載台4的上方並支承狹縫噴嘴2；以及狹縫噴嘴移動部53，其沿著朝向Y方向延伸的一對導軌(guide rail)52而使噴嘴支承體51以及由該噴嘴支承體51所支承的狹縫噴嘴2水平移動。該噴嘴支承體51係具有：固定構件51a，用以固定狹縫噴嘴2；以及二個升降機構51b，用以支承固定構件51a並且使該固定構件51a升降。另外，固定構件51a係由將X軸方向作 為長邊方向的碳纖維(carbon fiber)補強樹脂等之剖面矩形的棒狀構件所構成。 The moving mechanism portion of the coating processing unit 5 mainly includes a nozzle supporting body 51 having a bridge structure, which supports the slit nozzle 2 above the X-direction lateral overloading table 4, and a slit nozzle moving portion 53 along which A pair of guide rails 52 extending in the Y direction are used to horizontally move the nozzle support body 51 and the slit nozzle 2 supported by the nozzle support body 51. The nozzle support body 51 has a fixing member 51a for fixing the slit nozzle 2, and two lifting mechanisms 51b for supporting the fixing member 51a and lifting the fixing member 51a. In addition, the fixing member 51a is made by the X-axis direction It is composed of a rod-shaped member having a rectangular cross section such as a carbon fiber reinforcing resin in the longitudinal direction.

二個升降機構51b係連結於固定構件51a之長邊方向的兩端部，且分別具備AC伺服馬達(servomotor)及滾珠螺桿(ball screw)等。藉由此等的升降機構51b，能使固定構件51a及由該固定構件51a所固定的狹縫噴嘴2朝向鉛直方向(Z軸方向)升降，且能調整狹縫噴嘴2的噴出口與基板3的間隔、即噴出口對基板3之相對的高度。另外，固定構件51a之鉛直方向的位置，例如是能藉由省略圖示的線性編碼器(linear encoder)所檢測，該線性編碼器係具備被設置於升降機構51b之側面的省略圖式之比例尺(scale)部、以及與該比例尺部對向地設置於狹縫噴嘴2之側面等的省略圖式之檢測感測器所構成。 The two elevating mechanisms 51b are connected to both end portions of the fixing member 51a in the longitudinal direction, and each includes an AC servomotor, a ball screw, and the like. By the elevating mechanism 51b, the fixing member 51a and the slit nozzle 2 fixed by the fixing member 51a can be moved up and down in the vertical direction (Z-axis direction), and the discharge port of the slit nozzle 2 and the substrate 3 can be adjusted. The interval, that is, the relative height of the discharge port to the substrate 3. Further, the position of the fixing member 51a in the vertical direction can be detected, for example, by a linear encoder (not shown) having a scale which is provided on the side surface of the elevating mechanism 51b. The (scale) portion and the detection sensor of the drawings, which are disposed on the side surface of the slit nozzle 2 opposite to the scale portion, are configured.

如圖1所示，如此所構成的噴嘴支承體51係沿著X軸方向而架設於載台4的左右兩端部，且具有橫跨保持面41的架橋構造。狹縫噴嘴移動部53係具有作為相對性移動手段的功能，該相對性移動手段係使作為該架橋構造體的噴嘴支承體51和由該噴嘴支承體51所固定保持的狹縫噴嘴2，相對於被保持於載台4上的基板3沿著Y軸方向而相對移動。 As shown in FIG. 1 , the nozzle support body 51 configured as described above is stretched over the left and right end portions of the stage 4 along the X-axis direction, and has a bridge structure that straddles the holding surface 41 . The slit nozzle moving portion 53 has a function as a relative moving means for opposing the nozzle support body 51 as the bridge structure and the slit nozzle 2 fixed by the nozzle support body 51. The substrate 3 held on the stage 4 is relatively moved in the Y-axis direction.

狹縫噴嘴移動部53係在±X側之各側上具備：導軌52，用以將狹縫噴嘴2的移動朝向Y軸方向導引；作為驅動源的線性馬達54；以及線性編碼器55，用以檢測狹縫噴嘴2之噴出口的位置。 The slit nozzle moving portion 53 is provided on each side of the ±X side with a guide rail 52 for guiding the movement of the slit nozzle 2 in the Y-axis direction, a linear motor 54 as a drive source, and a linear encoder 55. It is used to detect the position of the discharge port of the slit nozzle 2.

二個導軌52係分別沿著Y軸方向以包括從噴嘴封閉位置(封閉部6的配設位置)至塗布結束位置(保持面41的-Y側端部位置)為止的區間之方式延伸設置於載台4之X軸方 向的兩端部。因此，二個升降機構51b的下端部能藉由狹縫噴嘴移動部53而沿著上述二個導軌52所導引，藉此，狹縫噴嘴2就會移動於噴嘴洗淨位置以及與被保持於載台4上的基板3對向的位置之間。 The two guide rails 52 are extended in the Y-axis direction so as to extend from the nozzle closing position (the arrangement position of the closing portion 6) to the coating end position (the Y-side end position of the holding surface 41). X-axis side of stage 4 Both ends of the direction. Therefore, the lower end portions of the two lifting mechanisms 51b can be guided along the two guide rails 52 by the slit nozzle moving portion 53, whereby the slit nozzle 2 moves to the nozzle cleaning position and is held Between the opposite positions of the substrate 3 on the stage 4.

在本實施形態中，各線性馬達54係構成作為具有定子(stator)54a和動子(mover)54b的AC無鐵心線性馬達(coreless linear motor)。定子54a係沿著Y軸方向而設置於載台4之X軸方向的兩側面。另一方面，動子54b係固設於升降機構51b的外側。線性馬達54係藉由在此等定子54a與動子54b之間產生的磁力而具有作為狹縫噴嘴移動部53之驅動源的功能。 In the present embodiment, each linear motor 54 is configured as an AC coreless linear motor having a stator 54a and a mover 54b. The stator 54a is provided on both side faces of the stage 4 in the X-axis direction along the Y-axis direction. On the other hand, the mover 54b is fixed to the outside of the elevating mechanism 51b. The linear motor 54 has a function as a drive source of the slit nozzle moving portion 53 by the magnetic force generated between the stator 54a and the mover 54b.

又，各線性編碼器55係分別具有比例尺部55a和檢測部55b。比例尺部55a係沿著Y軸方向而設置於已固設於載台4的線性馬達54之定子54a的下方部位。另一方面，檢測部55b係固設於已固設於升降機構51b的線性馬達54之動子54b的更外側，且與比例尺部55a對向配置。線性編碼器55係基於比例尺部55a與檢測部55b之相對的位置關係，來檢測Y軸方向上的狹縫噴嘴2之噴出口的位置。 Further, each of the linear encoders 55 has a scale portion 55a and a detecting portion 55b. The scale portion 55a is provided below the stator 54a of the linear motor 54 that has been fixed to the stage 4 along the Y-axis direction. On the other hand, the detecting portion 55b is fixed to the outside of the mover 54b of the linear motor 54 that has been fixed to the elevating mechanism 51b, and is disposed to face the scale portion 55a. The linear encoder 55 detects the position of the discharge port of the slit nozzle 2 in the Y-axis direction based on the positional relationship between the scale portion 55a and the detecting portion 55b.

圖3A係狹縫噴嘴的立體圖。圖3B係顯示圖3A所示的狹縫噴嘴之內部的流路之示意圖。狹縫噴嘴2係具有噴嘴體(nozzle body)21，該噴嘴體21係由一對噴嘴構件211、212、和一對側板(side plate)213、214組合而成。更具體而言，如圖3A所示，能藉由將一對噴嘴構件211、212彼此固定，並且在其左右的兩端部安裝一對側板213、214，而形成在內部具有流路210的噴嘴體21。另外，作為此等噴嘴構件211、212及側板213、214的材料，例如可以使用鋁等的金屬。 Fig. 3A is a perspective view of a slit nozzle. Fig. 3B is a schematic view showing a flow path inside the slit nozzle shown in Fig. 3A. The slit nozzle 2 has a nozzle body 21 which is a combination of a pair of nozzle members 211 and 212 and a pair of side plates 213 and 214. More specifically, as shown in FIG. 3A, a pair of nozzle members 211, 212 can be fixed to each other, and a pair of side plates 213, 214 are attached to both ends of the left and right sides to form a flow path 210 therein. Nozzle body 21. Further, as the material of the nozzle members 211 and 212 and the side plates 213 and 214, for example, a metal such as aluminum can be used.

又，在各側板213、214係設置有供給口22，能藉由對一對噴嘴構件211、212的安裝而形成一對供給口22。又，當將一對噴嘴構件211、212彼此固定時，就能在前方的噴嘴構件211之下端部與後方的噴嘴構件212之下端部之間，於X方向形成有狹縫狀的開口，此具有作為狹縫狀之噴出口23的功能。然後，在塗布裝置1運轉時，塗布液係透過後面所說明的供給機構之供給配管而從一對供給口22輸送至噴嘴體21內的流路210。又，該塗布液係流通於流路210，且從噴出口23朝向噴嘴體21的下方噴出。另外，在本實施形態中，在切換塗布液時的塗布液之供給時序中，噴嘴體21的噴出口23係因抵接於封閉部6的封閉構件61而被封閉，藉此能阻止塗布液從噴出口23流出，另一方面，在除此以外的時序，噴嘴體21的噴出口23係從封閉構件61分離並能夠將塗布液從噴出口23噴出。 Further, the supply ports 22 are provided in the respective side plates 213 and 214, and the pair of supply ports 22 can be formed by attaching the pair of nozzle members 211 and 212. Further, when the pair of nozzle members 211 and 212 are fixed to each other, a slit-like opening can be formed in the X direction between the lower end portion of the front nozzle member 211 and the lower end portion of the nozzle member 212 at the rear. It has a function as a slit-shaped discharge port 23. Then, when the coating device 1 is operated, the coating liquid is sent from the pair of supply ports 22 to the flow path 210 in the nozzle body 21 through the supply pipe of the supply mechanism described later. Further, the coating liquid flows through the flow path 210 and is discharged from the discharge port 23 toward the lower side of the nozzle body 21. Further, in the present embodiment, in the supply timing of the coating liquid when the coating liquid is switched, the discharge port 23 of the nozzle body 21 is closed by the closing member 61 that abuts against the closing portion 6, thereby preventing the coating liquid from being blocked. At the other timings, the discharge port 23 of the nozzle body 21 is separated from the closing member 61 and the coating liquid can be ejected from the discharge port 23 at a timing other than this.

又，如圖3A、圖3B所示，噴嘴體21係具有一個排出口24。排出口24係設置於噴嘴體21的上面。因此，當在已利用例如以下所說明的封閉部6來封閉噴出口23的狀態下輸送塗布液時，存在於上述供給配管或狹縫噴嘴2之流路210內的氣體成分就不會從噴出口23噴出，而能從排出口24朝向狹縫噴嘴2的外部排出。例如當在狹縫噴嘴2之流路210及供給配管的內部已由氮氣等的氣體所沖洗而並未存在塗布液的狀態下開始塗布液的輸送時，上述氣體成分就能藉由塗布液的輸送而從排出口24排出並且使塗布液貯留於流路210(貯留處理)。塗布液就會藉此充填於流路210，且接續於氣體成分的排出而使已溢流的塗布液從排出口24朝向狹縫噴嘴2的外部排出。另外，在該實施形態中係以感測器偵測來自排出口24的塗布液之排出並檢測塗 布液對流路210之充填。 Further, as shown in FIGS. 3A and 3B, the nozzle body 21 has a discharge port 24. The discharge port 24 is provided on the upper surface of the nozzle body 21. Therefore, when the coating liquid is conveyed in a state where the discharge port 23 is closed by the closing portion 6 described below, for example, the gas component existing in the flow path 210 of the supply pipe or the slit nozzle 2 is not sprayed. The outlet 23 is ejected and can be discharged from the discharge port 24 toward the outside of the slit nozzle 2. For example, when the flow of the coating liquid is started in a state where the flow path 210 of the slit nozzle 2 and the supply pipe are flushed with a gas such as nitrogen gas and the coating liquid is not present, the gas component can be coated with the liquid. The conveyance is discharged from the discharge port 24 and the coating liquid is stored in the flow path 210 (storage process). The coating liquid is thus filled in the flow path 210, and the discharged coating liquid is discharged from the discharge port 24 toward the outside of the slit nozzle 2 in accordance with the discharge of the gas component. In addition, in this embodiment, the sensor detects the discharge of the coating liquid from the discharge port 24 and detects the coating. The liquid is filled with the flow path 210.

另一方面，當未進行藉由封閉部6而致使的噴出口23之封閉的狀態下透過供給配管將塗布液輸送至狹縫噴嘴2時，在該狹縫噴嘴2中，塗布液就會透過流路210而輸送至噴出口23，且從噴出口23朝向基板噴出(塗布處理)。又，當在此狀態下透過供給配管送入氮氣等的氣體成分時，就可以從噴出口23去除已殘留於供給配管及狹縫噴嘴2的塗布液(沖洗處理)。如此在本實施形態中，封閉部6對來自噴出口23或排出口24的氣體成分或塗布液之噴出/排出而言係具有重要的功能。 On the other hand, when the coating liquid is conveyed to the slit nozzle 2 through the supply pipe in a state where the discharge port 23 caused by the closing portion 6 is not closed, the coating liquid passes through the slit nozzle 2 The flow path 210 is sent to the discharge port 23, and is discharged from the discharge port 23 toward the substrate (coating process). In addition, when a gas component such as nitrogen gas is supplied through the supply pipe in this state, the coating liquid remaining in the supply pipe and the slit nozzle 2 can be removed from the discharge port 23 (flushing process). As described above, in the present embodiment, the closing portion 6 has an important function for discharging/discharging the gas component or the coating liquid from the discharge port 23 or the discharge port 24.

圖4係顯示封閉部之構成的示意圖。該封閉部6係具有封閉構件61、回收容器(recovery pot)62及排洩配管(drain pipe)63。封閉構件61係由基底板611及彈性板612所構成，該基底板611係具有不鏽鋼板等的剛性，該彈性板612係具有矽膠(silicon rubber)等的彈性。如圖4所示，基底板611係具有與狹縫噴嘴2之長邊方向X平行延伸設置的矩形形狀，且其X方向長度係比狹縫噴嘴2的X方向長度還長若干。又，在基底板611的上面整體固定有彈性板612。因此，當在藉由塗布處理部5的移動機構部使狹縫噴嘴2位於封閉構件61的正上方之後使狹縫噴嘴2下降至封閉高度位置Z1並將狹縫噴嘴2的下端部按壓於彈性板612時，狹縫噴嘴2的噴出口23就能由封閉構件61的彈性板612之表面所封閉。另一方面，藉由移動機構部使狹縫噴嘴2移動至遠離封閉構件61的位置，藉此就能解除藉由彈性板612而致使的噴出口23之封閉。另外，雖然藉由上述封閉處理，基本上就能阻止來自噴出口23的塗布液之噴出/流出，但是作為來自噴出口23的塗布液之漏出對策係以從下 方側覆蓋封閉構件61的方式配設有回收容器62，並且從該回收容器62沿著下方側延伸設置有排洩配管63。 Fig. 4 is a schematic view showing the configuration of a closing portion. The closing portion 6 has a closing member 61, a recovery pot 62, and a drain pipe 63. The closing member 61 is composed of a base plate 611 having a rigidity such as a stainless steel plate and an elastic plate 612 having elasticity such as silicon rubber. As shown in FIG. 4, the base plate 611 has a rectangular shape extending in parallel with the longitudinal direction X of the slit nozzle 2, and its length in the X direction is longer than the length of the slit nozzle 2 in the X direction. Further, an elastic plate 612 is integrally fixed to the upper surface of the base plate 611. Therefore, when the slit nozzle 2 is positioned directly above the closing member 61 by the moving mechanism portion of the coating processing portion 5, the slit nozzle 2 is lowered to the closed height position Z1 and the lower end portion of the slit nozzle 2 is pressed to the elastic portion. At the time of the plate 612, the discharge port 23 of the slit nozzle 2 can be closed by the surface of the elastic plate 612 of the closing member 61. On the other hand, the slit nozzle 2 is moved to a position away from the closing member 61 by the moving mechanism portion, whereby the closing of the discharge port 23 by the elastic plate 612 can be released. In addition, the above-described sealing treatment can substantially prevent the discharge/discharge of the coating liquid from the discharge port 23, but the leakage of the coating liquid from the discharge port 23 is performed from the lower side. A recovery container 62 is disposed to cover the closing member 61 on the square side, and a drain pipe 63 is extended from the recovery container 62 along the lower side.

回到圖2繼續進行構成說明。在封閉部6的-Y側係設置有回收部7。在該實施形態中係為了適當切換二種類的塗布液並且進行後面所詳述的共洗處理，而在回收部7設置有三種類的回收容器7A至7C。此等當中的回收容器7A係指專門回收塗布液A用的回收容器。在該流路210內殘留有塗布液A的狹縫噴嘴2被移動至回收容器7A之上方位置的狀態下，當如後面所述般地藉由氮氣的沖洗處理而從狹縫噴嘴2噴出塗布液A時，該塗布液A就被回收至回收容器7A。回收容器7B係指專門回收塗布液B用的回收容器，且以與回收容器7A同樣的方式回收殘留於狹縫噴嘴2的塗布液B。剩餘的回收容器7C係指用以回收在共洗處理中所產生的塗布液A與塗布液B之混合液的回收容器，且以與回收容器7A同樣的方式回收殘留於狹縫噴嘴2的混合液(=塗布液A+塗布液B)。另外，雖然由回收容器7A所回收的塗布液A以及由回收容器7B所回收的塗布液B係能供再利用，但是由回收容器7C所回收的混合液則會送至省略圖式的廢液處理機構。如此，回收容器7C係具有作為廢液容器的功能。又，回收容器7A至7C的排列順序並非被限定於圖2所示的順序。 Returning to Fig. 2, the construction description will be continued. A collecting portion 7 is provided on the -Y side of the closing portion 6. In this embodiment, three kinds of recovery containers 7A to 7C are provided in the recovery unit 7 in order to appropriately switch the two types of coating liquids and perform the co-washing treatment described later in detail. The recovery container 7A among these refers to a recovery container for specifically recovering the coating liquid A. In the state in which the slit nozzle 2 in which the coating liquid A remains in the flow path 210 is moved to the position above the recovery container 7A, the coating is sprayed from the slit nozzle 2 by the rinsing treatment of nitrogen gas as will be described later. In the case of the liquid A, the coating liquid A is recovered to the recovery container 7A. The recovery container 7B is a collection container for recovering the coating liquid B, and the coating liquid B remaining in the slit nozzle 2 is recovered in the same manner as the recovery container 7A. The remaining recovery container 7C is a recovery container for recovering the mixed solution of the coating liquid A and the coating liquid B generated in the co-washing treatment, and the mixture remaining in the slit nozzle 2 is recovered in the same manner as the recovery container 7A. Liquid (= coating liquid A + coating liquid B). In addition, although the coating liquid A recovered by the recovery container 7A and the coating liquid B recovered by the recovery container 7B can be reused, the mixed liquid recovered by the recovery container 7C is sent to the waste liquid of the omitted drawing. Processing organization. Thus, the recovery container 7C has a function as a waste liquid container. Further, the order in which the recovery containers 7A to 7C are arranged is not limited to the order shown in FIG. 2.

又，如圖2所示，在回收部7的-Y側係設置有預分配裝置8。如圖2所示，預分配裝置8係指配置於噴嘴調整區AR1當中之-Y側的裝置，且具備：貯留槽81，用以在其內部貯留溶劑84；預分配輥(pre-dispensing roller)82，用以將其一部分浸漬於溶劑84且作為從狹縫噴嘴2噴出塗布液的噴出對象；以及刮刀(doctor blade)83。 Moreover, as shown in FIG. 2, the pre-distribution apparatus 8 is provided in the -Y side of the collection part 7. As shown in FIG. 2, the pre-distribution device 8 refers to a device disposed on the -Y side of the nozzle adjustment area AR1, and has a storage tank 81 for storing a solvent 84 therein; a pre-dispensing roller 82 is a discharge target for immersing a part of the solvent 84 in the solvent 84 as a discharge liquid from the slit nozzle 2; and a doctor blade 83.

預分配輥82係指藉由省略圖示的旋轉機構而旋轉驅動，且能夠繞沿著X軸方向的軸心82a朝向箭頭R1之方向旋轉的筒狀之輥子。在該預分配輥82的下方部位係配置有貯留槽81，且貯留有能夠溶解已塗布於預分配輥82的塗布液的作為溶劑84之稀釋劑(thinner)等。又，矽製等的刮刀83係以其一端接觸預分配輥82之外周面的方式所設置。 The pre-distribution roller 82 is a cylindrical roller that is rotationally driven by a rotation mechanism (not shown) and that is rotatable in the direction of the arrow R1 about the axis 82a along the X-axis direction. A storage tank 81 is disposed below the pre-distribution roller 82, and a thinner or the like as a solvent 84 capable of dissolving the coating liquid applied to the pre-distribution roller 82 is stored. Further, the scraper 83 such as tantalum is provided such that one end thereof contacts the outer peripheral surface of the pre-distribution roller 82.

在如此所構成的預分配裝置8中係在狹縫噴嘴2已被移動至預分配輥82之上方位置的狀態下，使狹縫噴嘴2朝向旋轉中的預分配輥82噴出塗布液，藉此能使塗布液塗布於預分配輥82。結果，在噴出口23(尤其是開口(rip)部的前端面)形成有該塗布液的液堆積(liquid pile-up)(預分配處理)。當液堆積如此均勻地形成及於朝向X軸方向延伸的直線狀之噴出口23的全長時，就能夠高精度地完成之後的塗布處理。又，藉由預分配處理，已附著於噴出口23之周圍的受汙染之塗布液等的附著物就會與從噴出口23新噴出的塗布液結合，並朝向預分配輥82之外周面噴出，且從噴出口23之周圍部分去除。 In the pre-distribution device 8 configured as described above, the slit nozzle 2 is sprayed with the coating liquid toward the rotating pre-distribution roller 82 while the slit nozzle 2 has been moved to the position above the pre-distribution roller 82. The coating liquid can be applied to the pre-distribution roller 82. As a result, a liquid pile-up (pre-distribution treatment) of the coating liquid is formed in the discharge port 23 (particularly, the front end surface of the rip portion). When the liquid deposition is formed so uniformly and over the entire length of the linear discharge port 23 extending in the X-axis direction, the subsequent coating process can be completed with high precision. In addition, by the pre-distribution process, the deposit of the contaminated coating liquid or the like adhering to the periphery of the discharge port 23 is combined with the coating liquid newly discharged from the discharge port 23, and is ejected toward the outer peripheral surface of the pre-distribution roller 82. And removed from the peripheral portion of the discharge port 23.

其次，一邊參照圖5A至圖5F且一邊說明對狹縫噴嘴2供給塗布液的供給機構之構成。圖5A至圖5F係顯示圖1之塗布裝置中所裝配的供給機構之構成及運作的示意圖。供給機構10係具有塗布液A的供給部101A、以及塗布液B的供給部101B。供給部101A係具有：槽(tank)，用以貯留塗布液A；以及泵浦102A(參照圖6)，其按照來自控制部9的控制信號而運作並從該槽壓送塗布液A。供給部101B係具有：槽，用以貯留塗布液B；以及泵浦102B(參照圖6)，其按照來自控制部9的控制信號而運作並從該槽 壓送塗布液B。然後，從供給部101A延伸設置的配管103A係連接於三通閥104中的一個埠口。又，從供給部101B延伸設置的配管103B係連接於三通閥104中的另一個埠口。三通閥104中的剩餘埠口係藉由供給配管105而連接於狹縫配管2的流路210。亦即，供給配管105的一端部係透過三通閥106及配管103A、103B來與供給部101A、101B連接，且按照來自控制部9的控制信號在供給部101A、101B之間切換供給配管105的連接目的地。另一方面，供給配管105的另一端部係透過狹縫噴嘴2的供給口22來與流路210連接。 Next, the configuration of the supply mechanism for supplying the coating liquid to the slit nozzle 2 will be described with reference to FIGS. 5A to 5F. 5A to 5F are schematic views showing the configuration and operation of a supply mechanism assembled in the coating apparatus of Fig. 1. The supply mechanism 10 is a supply unit 101A having a coating liquid A and a supply unit 101B of a coating liquid B. The supply unit 101A has a tank for storing the coating liquid A, and a pump 102A (see FIG. 6) that operates in accordance with a control signal from the control unit 9 and pressurizes the coating liquid A from the tank. The supply unit 101B has a tank for storing the coating liquid B, and a pump 102B (refer to FIG. 6) which operates in accordance with a control signal from the control unit 9 and from the tank The coating liquid B was pumped. Then, the pipe 103A extending from the supply unit 101A is connected to one of the three-way valves 104. Further, the pipe 103B extending from the supply portion 101B is connected to the other port of the three-way valve 104. The remaining port in the three-way valve 104 is connected to the flow path 210 of the slit pipe 2 by the supply pipe 105. In other words, one end portion of the supply pipe 105 is connected to the supply units 101A and 101B through the three-way valve 106 and the pipes 103A and 103B, and the supply pipe 105 is switched between the supply units 101A and 101B in accordance with a control signal from the control unit 9. Connection destination. On the other hand, the other end portion of the supply pipe 105 is connected to the flow path 210 through the supply port 22 of the slit nozzle 2.

在該供給配管105的中間部係夾設有另一個三通閥106。在該三通閥106當中之剩餘的埠口係藉由配管107來與省略圖示的氮氣供給源連接。在此，作為氮氣供給源係可以使用可設置塗布裝置1的工廠之資源。又，亦可構成為：在塗布裝置1設置氮氣高壓罐(bomb)作為氮氣供給源，且從該氮氣高壓罐供給氮氣。 Another three-way valve 106 is interposed in the intermediate portion of the supply pipe 105. The remaining ports in the three-way valve 106 are connected to a nitrogen supply source (not shown) by a pipe 107. Here, as a nitrogen supply source, a resource of a factory in which the coating device 1 can be installed can be used. Further, a nitrogen gas high pressure tank may be provided in the coating device 1 as a nitrogen gas supply source, and nitrogen gas may be supplied from the nitrogen gas high pressure tank.

藉由如此地設置三通閥106，不僅能夠透過供給配管105來供給塗布液，還能夠對狹縫噴嘴2選擇性地供給氮氣。例如在切換塗布液時沖洗殘存於供給配管105及狹縫噴嘴2之流路210的塗布液時，三通閥106係按照來自供給部9的控制信號來限制塗布液對狹縫噴嘴2的輸送，另一方面，允許氮氣對狹縫噴嘴2的供給。藉此，例如，如圖5B所示，當在狹縫噴嘴2已被移動至回收容器7A之上方位置的狀態下，氮氣藉由三通閥106的切換透過供給配管105而提供給狹縫噴嘴2時，殘存於供給配管105的塗布液A就能藉由該氮氣供給而回收至回收容器7A(沖洗處理)。 By providing the three-way valve 106 in this manner, not only the coating liquid can be supplied through the supply pipe 105 but also the nitrogen gas can be selectively supplied to the slit nozzle 2 . For example, when the coating liquid remaining in the supply pipe 105 and the flow path 210 of the slit nozzle 2 is flushed when the coating liquid is switched, the three-way valve 106 restricts the delivery of the coating liquid to the slit nozzle 2 in accordance with a control signal from the supply unit 9. On the other hand, the supply of nitrogen to the slit nozzle 2 is allowed. As a result, for example, as shown in FIG. 5B, in a state where the slit nozzle 2 has been moved to a position above the recovery container 7A, nitrogen gas is supplied to the slit nozzle through the supply pipe 105 by switching of the three-way valve 106. At 2 o'clock, the coating liquid A remaining in the supply pipe 105 can be recovered in the recovery container 7A by the supply of the nitrogen gas (rinsing treatment).

另外，藉由進行上面所述的沖洗處理就能使氮氣殘留於供給配管105或狹縫噴嘴2的流路210內。又，有時已溶解於塗布液的氣體成分亦會變成氣泡而存在於供給配管105或狹縫噴嘴2的流路210內。於是，在本實施形態中係在狹縫噴嘴2的排出口24連接有排出配管11。又，在該排氣配管11係夾設有排出用閥12。因此，當排出用閥12按照來自控制部9的控制信號而開啟(opening)時，狹縫噴嘴2的流路210就與排出配管11連通，且能夠從流路210將氣體成分或已溢流的塗布液透過排出配管11而排出至外部。又，在排出配管11當中相對於排出用閥12之位於下游側的下游側端部係設置有感測器13，能藉由該感測器13來偵測從狹縫噴嘴2之排出口24所排出的液體成分(塗布液A、塗布液B、混合液)，且使該偵測信號提供給控制部9。 Further, nitrogen gas can be left in the supply pipe 105 or the flow path 210 of the slit nozzle 2 by performing the above-described rinsing treatment. Further, the gas component dissolved in the coating liquid may become bubbles and may be present in the supply pipe 105 or the flow path 210 of the slit nozzle 2. Then, in the present embodiment, the discharge pipe 11 is connected to the discharge port 24 of the slit nozzle 2. Further, a discharge valve 12 is interposed in the exhaust pipe 11. Therefore, when the discharge valve 12 is opened in accordance with a control signal from the control unit 9, the flow path 210 of the slit nozzle 2 communicates with the discharge pipe 11, and the gas component can be overflowed from the flow path 210. The coating liquid is discharged to the outside through the discharge pipe 11. Further, in the discharge pipe 11, a sensor 13 is provided on the downstream end portion of the discharge valve 12 on the downstream side, and the discharge port 24 from the slit nozzle 2 can be detected by the sensor 13 The discharged liquid components (coating liquid A, coating liquid B, and mixed liquid) are supplied to the control unit 9.

圖6係顯示用以控制圖1所示的塗布裝置之電氣構成的方塊圖。在本實施形態中，為了控制如上述所構成的塗布裝置1之各部的動作而設置有控制部9。該控制部9係與一般的電腦同樣具有進行各種運算處理的CPU(Central Processing Unit：中央處理單元)91、記憶基本程式的讀出專用之ROM(Read Only Memory：唯讀記憶體)92、記憶各種資訊的讀寫自如之RAM(Random Access Memory：隨機存取記憶體)93、以及記憶處理程式或資料等的固定磁碟94等。然後，控制部9係將已儲存於固定磁碟94的處理程式展開於RAM93，且藉由CPU91來執行該程式，藉此來控制塗布裝置1的各部以進行使用塗布液A的第一塗布處理、使用塗布液B的第二塗布處理、以及用以從塗布液A(B)切換至塗布液B(A)的切換處理。尤其在本實施形態中，如 後面所詳述般，CPU91係具備以下的功能：作為判定狹縫噴嘴2的流路210是否已由塗布液所充填的充填判定部911之功能；以及作為基於流路之充填判定結果來切換處理內容的模式切換部912之功能。以下，一邊參照圖5A至圖5F且一邊就塗布裝置1所執行的塗布液之供給動作及塗布動作加以說明。另外，在此為了容易理解發明的特徵起見，而將從基於塗布液A的第一塗布處理切換至基於塗布液B的第二塗布處理時所執行的主要動作之一例顯示於圖5A至圖5F並加以說明。又，此等的圖式以及後面所說明的圖7A至圖7F中的(CL)、(OP)係分別顯示閥12之閉合(closing)及開啟。 Figure 6 is a block diagram showing the electrical configuration for controlling the coating apparatus shown in Figure 1. In the present embodiment, the control unit 9 is provided to control the operation of each unit of the coating device 1 configured as described above. The control unit 9 has a CPU (Central Processing Unit) 91 that performs various types of arithmetic processing, a ROM (Read Only Memory) 92 that is dedicated to reading a memory program, and a memory. A RAM (Random Access Memory) 93 for reading and writing various information, and a fixed disk 94 such as a memory processing program or data. Then, the control unit 9 expands the processing program stored in the fixed disk 94 to the RAM 93, and executes the program by the CPU 91, thereby controlling the respective portions of the coating device 1 to perform the first coating process using the coating liquid A. The second coating treatment using the coating liquid B and the switching treatment for switching from the coating liquid A (B) to the coating liquid B (A). Especially in this embodiment, such as As described in detail later, the CPU 91 has a function of determining whether or not the flow path 210 of the slit nozzle 2 has been filled by the coating liquid, and a function of the filling determination result based on the flow path. The function of the content mode switching unit 912. Hereinafter, the supply operation and the coating operation of the coating liquid performed by the coating device 1 will be described with reference to FIGS. 5A to 5F. In addition, in order to facilitate understanding of the characteristics of the invention, an example of the main operation performed when switching from the first coating process based on the coating liquid A to the second coating process based on the coating liquid B is shown in FIG. 5A to FIG. 5F and explain. Further, these drawings and (CL) and (OP) in Figs. 7A to 7F described later respectively show the closing and opening of the valve 12.

當基板3搬入載台4的保持面41時，控制部9就在利用真空吸引口吸引基板3之後，藉由控制線性馬達54來使狹縫噴嘴2移動至噴出開始位置。在此，所謂噴出開始位置係指狹縫噴嘴2大致沿著應將塗布液塗布於基板3之表面31的塗布區域之一邊的位置。 When the substrate 3 is carried into the holding surface 41 of the stage 4, the control unit 9 moves the slit nozzle 2 to the discharge start position by controlling the linear motor 54 after the substrate 3 is sucked by the vacuum suction port. Here, the discharge start position means that the slit nozzle 2 is substantially along the side of the application region where the coating liquid should be applied to the surface 31 of the substrate 3.

當狹縫噴嘴2移動至噴出開始位置時，控制部9就將控制信號提供給線性馬達54。基於該控制信號，線性馬達54使橋梁構造的噴嘴支承體51朝向Y方向移動，藉此狹縫噴嘴2會掃描基板3的表面31。與該狹縫噴嘴2的掃描同時進行，控制部9係對供給機構10的各部提供控制信號，且按照該控制信號驅動供給機構10的泵浦102A。在此時間點，三通閥104被切換成將供給配管105的一端部連接於配管103A的狀態，並且三通閥106被切換成阻止氮氣對供給配管105的流入並能夠透過供給配管105來輸送塗布液的狀態。又，如圖5A所示，在排出用閥12被閉合的狀態下對供給配管105及狹縫噴嘴2的流路210充填塗 布液A。為此，能藉由泵浦102A的驅動使塗布液A從供給部101A的槽(省略圖示)經由配管103A、三通閥104、106及供給配管105而朝向狹縫噴嘴2壓送，且從狹縫噴嘴2的噴出口23朝向基板3的表面31噴出。另外，控制部9係以調整從狹縫噴嘴2所噴出的塗布液之流量並使形成於表面31上的塗布膜具有所期望膜厚的方式，來控制供給機構10。具體而言，控制泵浦102A的驅動速度。有關此點，在後面的實施形態中亦相同。 When the slit nozzle 2 is moved to the discharge start position, the control portion 9 supplies a control signal to the linear motor 54. Based on the control signal, the linear motor 54 moves the nozzle support body 51 of the bridge structure in the Y direction, whereby the slit nozzle 2 scans the surface 31 of the substrate 3. Simultaneously with the scanning of the slit nozzle 2, the control unit 9 supplies a control signal to each unit of the supply mechanism 10, and drives the pump 102A of the supply mechanism 10 in accordance with the control signal. At this time, the three-way valve 104 is switched to connect the one end portion of the supply pipe 105 to the pipe 103A, and the three-way valve 106 is switched to prevent the inflow of nitrogen gas into the supply pipe 105 and to be transmitted through the supply pipe 105. The state of the coating liquid. Further, as shown in FIG. 5A, the flow path 210 of the supply pipe 105 and the slit nozzle 2 is filled and coated in a state where the discharge valve 12 is closed. Cloth liquid A. Therefore, the coating liquid A can be pumped toward the slit nozzle 2 from the groove (not shown) of the supply unit 101A via the pipe 103A, the three-way valves 104 and 106, and the supply pipe 105 by the driving of the pump 102A, and The discharge port 23 of the slit nozzle 2 is ejected toward the surface 31 of the substrate 3. Moreover, the control unit 9 controls the supply mechanism 10 so that the flow rate of the coating liquid discharged from the slit nozzle 2 is adjusted and the coating film formed on the surface 31 has a desired film thickness. Specifically, the driving speed of the pump 102A is controlled. This point is also the same in the following embodiments.

藉由如以上的動作，狹縫噴嘴2對塗布區域噴出塗布液，且在基板3的表面31上形成有塗布液的層(薄膜)。亦即，能藉由狹縫噴嘴2進行第一塗布處理。然後，當狹縫噴嘴2移動至塗布區域之終端位置的正上方位置時，控制部9就使泵浦102a的驅動停止並使第一塗布處理結束。在此，在將塗布液從「塗布液A」切換至「塗布液B」以持續第二塗布處理的情況下係執行以下的處理並將塗布液B充填於供給配管105及狹縫噴嘴2的流路210。 By the above operation, the slit nozzle 2 ejects the coating liquid to the application region, and a layer (film) of the coating liquid is formed on the surface 31 of the substrate 3. That is, the first coating process can be performed by the slit nozzle 2. Then, when the slit nozzle 2 is moved to a position directly above the end position of the coating region, the control portion 9 stops the driving of the pump 102a and ends the first coating process. When the coating liquid is switched from the "coating liquid A" to the "coating liquid B" to continue the second coating treatment, the following processing is performed and the coating liquid B is filled in the supply pipe 105 and the slit nozzle 2. Flow path 210.

首先，控制部9係將控制信號提供給線性馬達54，且使噴嘴支承體51朝向Y方向移動並移動至塗布液A專用的回收容器7A之上方位置，且使其停止(參照圖5B)。接續於此，控制部9係在維持三通閥104的連接狀態及排出用閥12的閉合狀態下，以配管107與供給配管105連接的方式來控制三通閥106。如此一來，從氮氣供給源壓送來的氮氣就能經由配管107及三通閥106而供給至供給配管105的中間部(夾設有三通閥106的位置)，且朝向比該中間部還靠狹縫噴嘴2側送入。藉此，殘留於供給配管105之一部分(中間部與另一端部之間的管內空間)及狹縫噴嘴2之流路210的塗布液A就能從狹縫噴嘴2的噴出口23朝向 回收容器7A噴出且回收。隨著該回收處理進展，就會在從上述中間部至噴出口23為止的流通空間(以下，稱為「置換對象空間」)內進行從塗布液A至氮氣的置換(第一置換處理)。然後，藉由置換對象空間完全被置換成氮氣，就能使已殘留於置換對象空間的塗布液A全部有效率地回收至回收容器7A。另外，如此所回收的塗布液A係能供再利用。 First, the control unit 9 supplies a control signal to the linear motor 54, and moves the nozzle support body 51 in the Y direction and moves to a position above the recovery container 7A dedicated to the coating liquid A, and stops it (see FIG. 5B). In addition, the control unit 9 controls the three-way valve 106 such that the connection state of the three-way valve 104 and the state in which the discharge valve 12 is closed are connected to the supply pipe 105 by the pipe 107. In this way, the nitrogen gas sent from the nitrogen gas supply source can be supplied to the intermediate portion of the supply pipe 105 (the position where the three-way valve 106 is interposed) via the pipe 107 and the three-way valve 106, and the direction is further than the intermediate portion. It is fed by the slit nozzle 2 side. Thereby, the coating liquid A remaining in one portion of the supply pipe 105 (the inner space between the intermediate portion and the other end portion) and the flow path 210 of the slit nozzle 2 can be directed from the discharge port 23 of the slit nozzle 2 The recovery container 7A is ejected and recovered. As the recovery process progresses, the replacement from the coating liquid A to the nitrogen gas (first replacement treatment) is performed in the flow space (hereinafter referred to as "substitution space") from the intermediate portion to the discharge port 23. Then, by completely replacing the replacement target space with nitrogen gas, the coating liquid A remaining in the replacement target space can be efficiently recovered to the recovery container 7A. Further, the coating liquid A thus recovered can be reused.

在此，如圖5B所示，在供給配管105中係在一端部與中間部之間，換句話說是在供給配管105當中由三通閥104、106所包夾的管內空間(以下，稱為「殘留空間」)中維持殘留有塗布液A的狀態。於是，在本實施形態中，控制部9係控制裝置各部並執行使用了塗布液B和氮氣的共洗處理以將該殘留塗布液A從供給配管105回收。該共洗處理係執行圖5C所示的步驟和圖5D所示的步驟。亦即，控制部9係將控制信號提供給線性馬達54，且在使噴嘴支承體51朝向Y方向移動並移動至封閉部6的上方位置之後，將控制信號提供給升降機構51b，且使噴嘴支承體51往下方移動。藉此，狹縫噴嘴2的下端部會被按壓於彈性板612並封閉噴出口23。又，控制部9係進行三通閥104、106及排出用閥12的切換。更具體而言，三通閥104係被切換成將供給配管105的一端部連接於配管10B的狀態，並且三通閥106係被切換成阻止氮氣對供給配管105之流入的狀態。藉此，供給部101B就能透過配管103B、三通閥104、106及供給配管105來與狹縫噴嘴2連接。又，排出用閥12係被切換成開啟狀態，且能夠將氣體從狹縫噴嘴2的排出口24以及將溢流的塗布液從流路210透過排出配管11而排出至噴嘴外部。 Here, as shown in FIG. 5B, the supply pipe 105 is disposed between the one end portion and the intermediate portion, in other words, the inside of the pipe surrounded by the three-way valves 104, 106 in the supply pipe 105 (hereinafter, The state in which the coating liquid A remains is maintained in the "remaining space". Then, in the present embodiment, the control unit 9 controls the respective portions of the apparatus and performs a co-washing treatment using the coating liquid B and nitrogen gas to collect the residual coating liquid A from the supply piping 105. This co-washing process performs the steps shown in Fig. 5C and the steps shown in Fig. 5D. That is, the control unit 9 supplies the control signal to the linear motor 54, and after moving the nozzle support body 51 in the Y direction and moving to the upper position of the closing portion 6, supplies a control signal to the lifting mechanism 51b, and causes the nozzle The support body 51 moves downward. Thereby, the lower end portion of the slit nozzle 2 is pressed against the elastic plate 612 and closes the discharge port 23. Further, the control unit 9 switches between the three-way valves 104 and 106 and the discharge valve 12. More specifically, the three-way valve 104 is switched to a state in which one end portion of the supply pipe 105 is connected to the pipe 10B, and the three-way valve 106 is switched to prevent the inflow of nitrogen gas into the supply pipe 105. Thereby, the supply unit 101B can be connected to the slit nozzle 2 through the pipe 103B, the three-way valves 104 and 106, and the supply pipe 105. In addition, the discharge valve 12 is switched to the open state, and the gas can be discharged from the discharge port 24 of the slit nozzle 2 and the overflowed coating liquid from the flow path 210 to the discharge pipe 11 and discharged to the outside of the nozzle.

在此狀態下，控制部9係提供控制信號並驅動泵浦 102B。藉此，塗布液B就能從供給部101B的槽(省略圖示)經由配管103B壓送。如圖5C所示，如此被壓送的塗布液B係與殘留於上述殘留空間的殘留塗布液A混合並形成混合液，並且將存在於供給配管105內的氮氣推向狹縫噴嘴2側。另一方面，因狹縫噴嘴2的噴出口23係被封閉著，故而流路210內的壓力會隨著塗布液B的輸送而提高，而存在於流路210的氮氣係經由排出口24及排出配管11而排出至噴嘴外部，並且使混合液貯留於流路210。然後，當存在於供給配管105及流路210的氮氣全部被排出至噴嘴外部時，混合液就從狹縫噴嘴2溢流並流出至排出配管11。如此一來，感測器13就偵測到該混合液，且將該偵測信號提供給控制部9。接收該信號的控制部9就判定流路210已由混合液(多為塗布液B)所充填。此種塗布液B充填於流路210的充填判定係藉由控制部9的充填判定部911所執行。另外，在該實施形態中，雖然是藉由感測器13之感測進行充填判定，但是亦可基於塗布液的供給量來進行，在該情況下就不需要感測器13。 In this state, the control unit 9 provides a control signal and drives the pump. 102B. Thereby, the coating liquid B can be pressure-fed from the groove (not shown) of the supply part 101B via the piping 103B. As shown in FIG. 5C, the coating liquid B thus pumped is mixed with the residual coating liquid A remaining in the residual space to form a mixed liquid, and the nitrogen gas existing in the supply pipe 105 is pushed toward the slit nozzle 2 side. On the other hand, since the discharge port 23 of the slit nozzle 2 is closed, the pressure in the flow path 210 increases as the coating liquid B is transported, and the nitrogen gas existing in the flow path 210 passes through the discharge port 24 and The piping 11 is discharged and discharged to the outside of the nozzle, and the mixed liquid is stored in the flow path 210. Then, when all of the nitrogen gas existing in the supply pipe 105 and the flow path 210 is discharged to the outside of the nozzle, the mixed liquid overflows from the slit nozzle 2 and flows out to the discharge pipe 11. In this way, the sensor 13 detects the mixed liquid and supplies the detection signal to the control unit 9. The control unit 9 that receives the signal determines that the flow path 210 has been filled with the mixed liquid (mostly the coating liquid B). The filling determination of the coating liquid B filled in the flow path 210 is performed by the filling determination unit 911 of the control unit 9. Further, in this embodiment, the filling determination is performed by the sensing of the sensor 13, but it may be performed based on the supply amount of the coating liquid. In this case, the sensor 13 is not required.

當流路210之充填被判定時，控制部9就停止泵浦102B的驅動並中斷塗布液B的供給。又，控制部9係將控制信號提供給排出用閥12並使其閉合。藉此能停止混合液對噴嘴外部排出。如此，混合液就能確實地收集(trap)於流路210。 When the filling of the flow path 210 is determined, the control unit 9 stops the driving of the pump 102B and interrupts the supply of the coating liquid B. Further, the control unit 9 supplies a control signal to the discharge valve 12 and closes it. Thereby, the mixture can be stopped from being discharged to the outside of the nozzle. In this way, the mixed solution can be surely trapped in the flow path 210.

其次，控制部9係將控制信號提供給升降機構51b，且使噴嘴支承體51往上方移動。藉此，狹縫噴嘴2的下端部就從彈性板612往上方離開，且解除封閉狀態。另外，在此階段，塗布液及氮氣的任一方皆未被輸送，而且排出用閥12亦被閉合。因此，大氣壓會透過噴出口23而對貯 留於流路210的混合液作用，以限制混合液從噴出口23的流出。在此狀態下，為了使狹縫噴嘴2移動至回收容器7C的上方並進行廢液處理，控制部9係將控制信號提供給線性馬達54，且使噴嘴支承體51朝向Y方向移動並移動至回收容器7C的上方位置使其停止(參照圖5D)。接續於此，控制部9係在維持三通閥104的連接狀態及排出用閥12的閉合狀態下，以配管107與供給配管105連接的方式來控制三通閥106。藉此，與塗布液A回收至回收容器7A的回收處理同樣地，氮氣能經由配管107及三通閥106供給至供給配管105的中間部(夾設有三通閥106的位置)，且朝向比該中間部還靠狹縫噴嘴2側送入。藉此，就能使殘留於供給配管105之一部分(中間部與另一端部之間的管內空間)及狹縫噴嘴2之流路210的混合液從狹縫噴嘴2的噴出口23朝向回收容器7C噴出，且回收廢液。此種廢液處理係至少繼續取出混合液之全部所需的時間，該時間係可以考慮塗布液A、B的成分或濃度等而事先設定。另外，在本實施形態中，雖然控制部9不僅將混合液就連已送入供給配管105的塗布液B(圖5D中的虛線箭頭)也全部回收至回收容器7C，但是，亦可在使塗布液B之一部分殘存的狀態下停止氮氣的供給。 Next, the control unit 9 supplies a control signal to the elevating mechanism 51b and moves the nozzle support body 51 upward. Thereby, the lower end portion of the slit nozzle 2 is separated upward from the elastic plate 612, and the closed state is released. Further, at this stage, neither of the coating liquid nor the nitrogen gas is delivered, and the discharge valve 12 is also closed. Therefore, the atmospheric pressure will be stored through the discharge port 23 The mixed liquid remaining in the flow path 210 acts to restrict the outflow of the mixed liquid from the discharge port 23. In this state, in order to move the slit nozzle 2 above the recovery container 7C and perform waste liquid processing, the control unit 9 supplies a control signal to the linear motor 54, and moves the nozzle support body 51 in the Y direction and moves to The upper position of the recovery container 7C is stopped (refer to Fig. 5D). In addition, the control unit 9 controls the three-way valve 106 such that the connection state of the three-way valve 104 and the state in which the discharge valve 12 is closed are connected to the supply pipe 105 by the pipe 107. In the same manner as the recovery process in which the coating liquid A is collected in the recovery container 7A, nitrogen gas can be supplied to the intermediate portion of the supply pipe 105 (the position where the three-way valve 106 is interposed) via the pipe 107 and the three-way valve 106, and the orientation ratio is obtained. This intermediate portion is also fed by the slit nozzle 2 side. Thereby, the mixed liquid remaining in one portion of the supply pipe 105 (the inner space between the intermediate portion and the other end portion) and the flow path 210 of the slit nozzle 2 can be recovered from the discharge port 23 of the slit nozzle 2 toward the recovery. The container 7C is ejected, and the waste liquid is recovered. Such waste liquid treatment is a time required to at least continue to take out all of the mixed liquid, and this time can be set in advance in consideration of the components or concentrations of the coating liquids A and B. In addition, in the present embodiment, the control unit 9 not only collects the entire solution liquid B (the dotted arrow in FIG. 5D) that has been fed into the supply pipe 105, but also collects it into the recovery container 7C. The supply of nitrogen gas is stopped in a state where one part of the coating liquid B remains.

當如上述般地完成共洗處理時，控制部9就會將控制信號提供給線性馬達54，且在使噴嘴支承體51朝向Y方向移動並移動至封閉部6的上方位置之後，將控制信號提供給升降機構51b，且使噴嘴支承體51往下方移動。藉此，狹縫噴嘴2的下端部會被按壓於彈性板612並封閉噴出口23(參照圖5E)。又，控制部9係在維持三通閥104、106的連接狀態下開啟排出用閥12，並且提供控制信號至泵浦 102B並驅動泵浦102B。藉此，塗布液B就能從供給部101B的槽(省略圖示)經由配管103B、三通閥104、106壓送至供給配管105。如圖5E所示，如此被壓送的塗布液B係將存在於供給配管105內的氮氣推向狹縫噴嘴2側。另一方面，因狹縫噴嘴2的噴出口23係被封閉著，故而流路210內的壓力會隨著塗布液B的輸送而提高，而存在於流路210的氮氣係經由排出口24及排出配管11而排出至噴嘴外部，並且使塗布液B貯留於流路210。如此，存在於供給配管105及流路210的氮氣就能置換成塗布液B(第二置換處理)。 When the co-washing process is completed as described above, the control unit 9 supplies a control signal to the linear motor 54, and after the nozzle support body 51 is moved in the Y direction and moved to the upper position of the closing portion 6, the control signal is given. It is supplied to the elevating mechanism 51b, and the nozzle support body 51 is moved downward. Thereby, the lower end portion of the slit nozzle 2 is pressed against the elastic plate 612 and the discharge port 23 is closed (see FIG. 5E). Further, the control unit 9 opens the discharge valve 12 while maintaining the connected state of the three-way valves 104, 106, and supplies a control signal to the pump. 102B drives the pump 102B. Thereby, the coating liquid B can be pressure-fed from the tank (not shown) of the supply part 101B to the supply piping 105 via the piping 103B and the three-way valves 104 and 106. As shown in FIG. 5E, the coating liquid B thus pumped pushes the nitrogen gas existing in the supply pipe 105 toward the slit nozzle 2 side. On the other hand, since the discharge port 23 of the slit nozzle 2 is closed, the pressure in the flow path 210 increases as the coating liquid B is transported, and the nitrogen gas existing in the flow path 210 passes through the discharge port 24 and The piping 11 is discharged and discharged to the outside of the nozzle, and the coating liquid B is stored in the flow path 210. In this way, the nitrogen gas existing in the supply pipe 105 and the flow path 210 can be replaced with the coating liquid B (second replacement treatment).

在進而持續進行塗布液B的壓送之期間，塗布液B會從狹縫噴嘴2溢流並流出至排出配管11。如此一來，感測器13就偵測到該塗布液B，且將該偵測信號提供給控制部9。接收該信號的控制部9就判定流路210已由塗布液所充填。此種流路210的充填判定係藉由控制部9的充填判定部911所執行。另外，在該實施形態中，雖然是藉由感測器13之感測進行充填判定，但是亦可基於塗布液的供給量來進行，在該情況下，就不需要感測器13。有關此等，即便是在後面的實施形態中仍相同。 While the pressure application of the coating liquid B is continued, the coating liquid B overflows from the slit nozzle 2 and flows out to the discharge pipe 11. In this way, the sensor 13 detects the coating liquid B and supplies the detection signal to the control unit 9. The control unit 9 that receives the signal determines that the flow path 210 has been filled with the coating liquid. The filling determination of the flow path 210 is performed by the filling determination unit 911 of the control unit 9. Further, in this embodiment, the filling determination is performed by the sensing of the sensor 13, but it may be performed based on the supply amount of the coating liquid. In this case, the sensor 13 is not required. Regarding these, even in the following embodiments, the same is true.

如圖5F所示，當流路210之充填被判定時，控制部9就停止泵浦102B的驅動並停止塗布液B的供給，並且將控制信號提供給排出用閥12並使其閉合。藉此，就不會使氣體成分存在於供給配管105及流路210，而是可以使其由下一個塗布處理所用的塗布液B所充填，且完成對基板3的表面31噴出塗布液B以形成塗布膜的處理(第二塗布處理)之準備。在之後的適當時序，控制部9會將控制信號提供給升降機構51b，且使噴嘴支承體51往上方移動，進 而將控制信號提供給線性馬達54，且使噴嘴支承體51朝向Y方向移動並移動至噴出開始位置。然後，與基於塗布液A的第一塗布處理同樣地執行第二塗布處理。 As shown in FIG. 5F, when the filling of the flow path 210 is determined, the control unit 9 stops the driving of the pump 102B and stops the supply of the coating liquid B, and supplies a control signal to the discharge valve 12 and closes it. Thereby, the gas component is not present in the supply pipe 105 and the flow path 210, but can be filled with the coating liquid B for the next coating process, and the coating liquid B is discharged onto the surface 31 of the substrate 3 to complete Preparation of a treatment (second coating treatment) for forming a coating film. At an appropriate timing thereafter, the control unit 9 supplies a control signal to the elevating mechanism 51b, and moves the nozzle support body 51 upward. On the other hand, the control signal is supplied to the linear motor 54, and the nozzle support body 51 is moved in the Y direction and moved to the discharge start position. Then, the second coating treatment is performed in the same manner as the first coating treatment based on the coating liquid A.

另外，在將塗布液B切換成塗布液A並進行塗布處理的情況下，亦與上面所述的同樣之方式，可以進行從塗布液B向塗布液A的切換。 In addition, when the coating liquid B is switched to the coating liquid A and the coating treatment is performed, the coating liquid B can be switched from the coating liquid B to the coating liquid A in the same manner as described above.

如以上，在本實施形態中，因可以用一支狹縫噴嘴2來選擇性地噴出二種類的塗布液A、B，故而比起針對每一種塗布液使用專用的狹縫噴嘴來進行塗布處理的塗布裝置，還可以減低裝置成本。 As described above, in the present embodiment, since the two types of coating liquids A and B can be selectively ejected by one slit nozzle 2, the coating treatment is performed using a dedicated slit nozzle for each coating liquid. The coating device can also reduce the cost of the device.

又，在本實施形態中係設置有能夠封閉狹縫噴嘴2之噴出口23的彈性板612，且能夠藉由該彈性板612來封閉噴出口23。然後，在已封閉該噴出口23的狀態下將塗布液供給至狹縫噴嘴2並使其貯留於流路210。從而，可以確實地阻止在該貯留中從噴出口23白白浪費地流出塗布液。結果，可以謀求塗布處理所需的運轉成本之減低。 Further, in the present embodiment, the elastic plate 612 capable of closing the discharge port 23 of the slit nozzle 2 is provided, and the discharge port 23 can be closed by the elastic plate 612. Then, the coating liquid is supplied to the slit nozzle 2 in a state where the discharge port 23 is closed, and is stored in the flow path 210. Therefore, it is possible to surely prevent the coating liquid from being wasted from the discharge port 23 in a wasteful manner during the storage. As a result, it is possible to reduce the running cost required for the coating process.

又，在上述實施形態中係在從塗布液A向塗布液B切換時，可以如圖5B所示地將殘存於供給配管105及流路210的塗布液A全部回收至回收容器7A供再利用。又，在從塗布液B向塗布液A的切換時也是同樣的。為此，可以抑制塗布液的消耗量，且可以進而減低運轉成本。 In the above-described embodiment, when the coating liquid A is switched from the coating liquid A to the coating liquid B, all of the coating liquid A remaining in the supply pipe 105 and the flow path 210 can be collected in the recovery container 7A for reuse. . Moreover, the same is true at the time of switching from the coating liquid B to the coating liquid A. For this reason, the consumption amount of the coating liquid can be suppressed, and the running cost can be further reduced.

又，在上述實施形態中，雖然在切換塗布液時，在供給配管105當中由三通閥104、106所包夾的管內空間，換句話說是殘留空間殘留已在切換前使用的塗布液(在圖5B所示的實施形態中為塗布液A)，且在供給切換後所使用的塗布液(在圖5B所示的實施形態中為塗布液B)時因塗布液被混合而產生混合液，但是可以藉由進行上述共洗處理(圖 5C、圖5D)而有效率地除掉混合液。另外，在共洗處理中，雖然伴隨混合液的產生而有必要廢棄一定量的塗布液A、B，但是可以藉由極力縮減三通閥104、106的設置間隔來抑制廢棄量。又，亦能夠如以下說明的第二實施形態般地藉由追加用以供給沖洗液(rinse liquid)的沖洗液供給系統來使塗布液的混合不會產生，以迴避塗布液A、B的廢棄。 Further, in the above-described embodiment, the inside of the pipe surrounded by the three-way valves 104 and 106 in the supply pipe 105 when the coating liquid is switched, in other words, the residual liquid remaining in the residual space has been used before the switching. (In the embodiment shown in FIG. 5B, the coating liquid A), and the coating liquid used in the supply switching (the coating liquid B in the embodiment shown in FIG. 5B) is mixed by the coating liquid to cause mixing. Liquid, but can be processed by the above-mentioned co-washing 5C, Fig. 5D) and the mixed liquid is efficiently removed. Further, in the co-washing treatment, it is necessary to discard a certain amount of the coating liquids A and B accompanying the generation of the mixed liquid, but it is possible to suppress the amount of disposal by reducing the installation interval of the three-way valves 104 and 106 as much as possible. Further, it is also possible to avoid the occurrence of mixing of the coating liquid by adding a rinse liquid supply system for supplying a rinse liquid as in the second embodiment described below, thereby avoiding the disposal of the coating liquids A and B. .

圖7A至圖7F係顯示本發明的塗布裝置之第二實施形態中所裝配的供給機構之構成及運作的示意圖。第二實施形態與第一實施形態大為不同之處係在於設置有供給用以洗淨供給配管105及狹縫噴嘴2之內部的沖洗(洗淨)液的沖洗液供給部；以及對供給配管105供給的塗布液A、B、氮氣等的供給位置。另外，由於其他的構成基本上是與第一實施形態(圖5A至圖5F)相同，故而針對同一構成附記同一符號並省略構成說明。 7A to 7F are schematic views showing the configuration and operation of a supply mechanism assembled in a second embodiment of the coating apparatus of the present invention. The second embodiment is substantially different from the first embodiment in that a flushing liquid supply unit that supplies a flushing (washing) liquid for cleaning the inside of the supply pipe 105 and the slit nozzle 2 is provided, and a supply pipe is provided. The supply position of the coating liquid A, B, nitrogen, etc. supplied by 105. In addition, since the other configurations are basically the same as those of the first embodiment (FIG. 5A to FIG. 5F), the same components are denoted by the same reference numerals, and the description of the components is omitted.

在第二實施形態中，例如，如圖7A所示，供給配管105的一端部係透過四通閥108、配管103A、103B、110來與供給部101A、101B及三通閥109連接。又，在該三通閥109當中之剩餘的二個埠口係分別連接有氮氣供給源及沖洗液供給源。另一方面，供給配管105的另一端部係與第一實施形態同樣透過狹縫噴嘴2的供給口22來與流路210連接。因此，按照來自控制部9的控制信號來切換四通閥108及三通閥109之連接狀態，藉此就能使供給配管105的連接目的地在供給部101A、101B、氮氣供給源(省略圖示)及沖洗液供給源(省略圖示)之間切換。結果，能對供給配管105的一端部，選擇性地供給塗布液A、塗布液B、氮氣及沖洗液，且在第二實施形態中能迴避殘留空間的發生。另外，在使用例如純水或DIW(去離子水：deionized water) 等作為沖洗液的情況下，就可以使用設置塗布裝置1的工廠之資源作為沖洗液供給源。當然，亦可使貯留有沖洗液的槽安裝於塗布裝置1，且使用藉由泵浦從該槽壓送沖洗液的單元作為沖洗液供給源。 In the second embodiment, for example, as shown in FIG. 7A, one end portion of the supply pipe 105 is connected to the supply portions 101A and 101B and the three-way valve 109 through the four-way valve 108 and the pipes 103A, 103B, and 110. Further, a nitrogen supply source and a rinse liquid supply source are connected to each of the remaining two ports of the three-way valve 109. On the other hand, the other end portion of the supply pipe 105 is connected to the flow path 210 through the supply port 22 of the slit nozzle 2 as in the first embodiment. Therefore, the connection state of the four-way valve 108 and the three-way valve 109 is switched in accordance with the control signal from the control unit 9, whereby the connection destination of the supply pipe 105 can be supplied to the supply units 101A and 101B and the nitrogen supply source (omitted from the drawing) Switch between the display) and the rinse solution supply source (not shown). As a result, the coating liquid A, the coating liquid B, the nitrogen gas, and the rinsing liquid can be selectively supplied to one end portion of the supply pipe 105, and in the second embodiment, the occurrence of the residual space can be avoided. In addition, use, for example, pure water or DIW (deionized water: deionized water) When the rinsing liquid is used as the rinsing liquid, the resource of the factory in which the coating device 1 is installed can be used as the rinsing liquid supply source. Of course, the tank in which the rinsing liquid is stored may be attached to the coating device 1, and a unit that pumps the rinsing liquid from the tank by pumping may be used as the rinsing liquid supply source.

即便是在該第二實施形態中，仍與第一實施形態同樣地，當基板3搬入載台4的保持面41時，控制部9就會在利用真空吸引口吸引基板3之後，藉由控制線性馬達54使狹縫噴嘴2移動至噴出開始位置。然後，控制部9會將控制信號提供給線性馬達54並使狹縫噴嘴2對基板3的表面31掃描。與該狹縫噴嘴2的掃描同時進行，控制部9係對供給機構10的各部提供控制信號，且按照該控制信號驅動供給機構10的泵浦102A。在此時間點，四通閥108及三通閥109係被切換成供給配管105的一端部僅連接於配管103A的狀態。又，如圖7A所示，塗布液A係在排出用閥12被閉合的狀態下充填於供給配管105及狹縫噴嘴2的流路210。為此，塗布液A能藉由泵浦102A的驅動從供給部101A的槽(省略圖示)經由配管103A、四通閥108及供給配管105朝向狹縫噴嘴2壓送，且從狹縫噴嘴2的噴出口23朝向基板3的表面31噴出。藉此，在基板3的表面31上就形成有塗布液A的層(薄膜)。然後，當狹縫噴嘴2移動至塗布區域之終端位置的正上方位置時，控制部9就會使泵浦102A的驅動停止並使第一塗布處理結束。在此，在將塗布液從「塗布液A」切換至「塗布液B」以繼續第二塗布處理的情況下係執行以下的處理並對供給配管105及狹縫噴嘴2的流路210充填塗布液B。 Even in the second embodiment, as in the first embodiment, when the substrate 3 is carried into the holding surface 41 of the stage 4, the control unit 9 controls the substrate 3 by the vacuum suction port. The linear motor 54 moves the slit nozzle 2 to the discharge start position. Then, the control section 9 supplies a control signal to the linear motor 54 and causes the slit nozzle 2 to scan the surface 31 of the substrate 3. Simultaneously with the scanning of the slit nozzle 2, the control unit 9 supplies a control signal to each unit of the supply mechanism 10, and drives the pump 102A of the supply mechanism 10 in accordance with the control signal. At this point of time, the four-way valve 108 and the three-way valve 109 are switched so that one end portion of the supply pipe 105 is connected only to the pipe 103A. Further, as shown in FIG. 7A, the coating liquid A is filled in the flow path 210 of the supply pipe 105 and the slit nozzle 2 in a state where the discharge valve 12 is closed. Therefore, the coating liquid A can be pumped from the groove (not shown) of the supply unit 101A via the pipe 103A, the four-way valve 108, and the supply pipe 105 toward the slit nozzle 2 by the driving of the pump 102A, and the slit nozzle is driven from the slit nozzle. The discharge port 23 of 2 is ejected toward the surface 31 of the substrate 3. Thereby, a layer (film) of the coating liquid A is formed on the surface 31 of the substrate 3. Then, when the slit nozzle 2 is moved to a position directly above the end position of the coating region, the control portion 9 stops the driving of the pump 102A and ends the first coating process. When the coating liquid is switched from the "coating liquid A" to the "coating liquid B" to continue the second coating treatment, the following processing is performed and the flow path 210 of the supply pipe 105 and the slit nozzle 2 is filled and coated. Liquid B.

控制部9係將控制信號提供給線性馬達54，且使噴嘴支承體51朝向Y方向移動並移動至塗布液A專用的回收 容器7A之上方位置，且使其停止(參照圖7B)。接續於此，控制部9係在維持排出用閥12的閉合狀態下，將四通閥108及三通閥109切換成供給配管105的一端部僅連接於氮氣供給部的狀態。如此一來，從氮氣供給源壓送來的氮氣就能經由三通閥109、配管110及四通閥108而供給至供給配管105的一端部，且使殘留於供給配管105及狹縫噴嘴2之流路210的塗布液A從狹縫噴嘴2的噴出口23朝向回收容器7A噴出且回收。隨著該回收處理進展，在供給配管105及流路210內進行從塗布液A向氮氣的置換(第一置換處理)。然後，藉由供給配管105及流路210完全被置換成氮氣，就能使已殘留於供給配管105及流路210的塗布液A全部有效率地回收至回收容器7A。另外，如此被回收的塗布液A之全部係能供再利用。 The control unit 9 supplies a control signal to the linear motor 54, and moves the nozzle support body 51 in the Y direction and moves to the coating liquid A for exclusive recycling. The position above the container 7A is stopped and stopped (refer to Fig. 7B). In the closed state in which the discharge valve 12 is maintained, the control unit 9 switches the four-way valve 108 and the three-way valve 109 so that one end portion of the supply pipe 105 is connected only to the nitrogen gas supply unit. In this manner, the nitrogen gas pumped from the nitrogen gas supply source can be supplied to one end portion of the supply pipe 105 via the three-way valve 109, the pipe 110, and the four-way valve 108, and remains in the supply pipe 105 and the slit nozzle 2 The coating liquid A of the flow path 210 is ejected from the discharge port 23 of the slit nozzle 2 toward the recovery container 7A and is recovered. As the recovery process progresses, replacement of the nitrogen from the coating liquid A into the supply pipe 105 and the flow path 210 (first replacement treatment) is performed. Then, the supply pipe 105 and the flow path 210 are completely replaced with nitrogen gas, so that the coating liquid A remaining in the supply pipe 105 and the flow path 210 can be efficiently recovered to the recovery container 7A. In addition, all of the coating liquid A thus recovered can be reused.

其次，為了洗淨被置換成氮氣的供給配管105及狹縫噴嘴2的內部，控制部9係控制裝置各部如下。控制部9係將控制信號提供給線性馬達54，且使噴嘴支承體51朝向Y方向移動並移動至回收容器7C的上方位置，且使其停止(參照圖7C)。接續於此，控制部9係在維持排出用閥12的閉合狀態下，將四通閥108及三通閥109切換成供給配管105的一端部僅連接於沖洗液供給部。如此一來，從沖洗液供給源壓送來的沖洗液就能經由三通閥109、配管110及四通閥108而供給至供給配管105的一端部，且使殘留於供給配管105及狹縫噴嘴2之流路210的氮氣從狹縫噴嘴2的噴出口23朝向回收容器7C噴出，且回收廢棄。隨著該回收處理進展，在供給配管105及流路210內進行從氮氣向沖洗液的置換。藉此，能藉由沖洗液來洗淨供給配管105及狹縫噴嘴2的流路210之內部(沖洗處理)。 Next, in order to clean the inside of the supply pipe 105 and the slit nozzle 2 which are replaced with nitrogen, the control unit 9 is a unit of the control device as follows. The control unit 9 supplies a control signal to the linear motor 54, and moves the nozzle support body 51 in the Y direction and moves to a position above the recovery container 7C, and stops it (see FIG. 7C). In the closed state in which the discharge valve 12 is maintained, the control unit 9 switches the four-way valve 108 and the three-way valve 109 so that one end of the supply pipe 105 is connected only to the rinse liquid supply unit. In this manner, the rinse liquid pumped from the rinse liquid supply source can be supplied to one end portion of the supply pipe 105 via the three-way valve 109, the pipe 110, and the four-way valve 108, and remains in the supply pipe 105 and the slit. The nitrogen gas in the flow path 210 of the nozzle 2 is ejected from the discharge port 23 of the slit nozzle 2 toward the recovery container 7C, and is discarded. As the recovery process progresses, the replacement of the nitrogen gas into the rinse liquid is performed in the supply pipe 105 and the flow path 210. Thereby, the inside of the flow path 210 of the supply pipe 105 and the slit nozzle 2 can be cleaned by the rinse liquid (flushing process).

該沖洗處理後，在將狹縫噴嘴2維持在回收容器7C的上方位置，並且維持排出用閥12之閉合狀態的下，控制部9係再次將四通閥108及三通閥109切換成供給配管105的一端部僅連接於氮氣供給部的狀態。如此一來，如圖7D所示，氮氣就將存在於供給配管105及狹縫噴嘴2的流路210之內部的沖洗液壓送至噴出口23側。藉此，沖洗液被回收廢棄於回收容器7C，並且能乾燥供給配管105及狹縫噴嘴2的流路210之內部。 After the rinsing process, the control unit 9 switches the four-way valve 108 and the three-way valve 109 to supply again while maintaining the slit nozzle 2 at a position above the recovery container 7C and maintaining the closed state of the discharge valve 12. One end of the pipe 105 is connected only to the state of the nitrogen gas supply unit. As a result, as shown in FIG. 7D, the flushing hydraulic pressure existing inside the supply pipe 105 and the flow path 210 of the slit nozzle 2 is sent to the discharge port 23 side. Thereby, the rinse liquid is collected and discarded in the recovery container 7C, and the inside of the supply path 105 and the flow path 210 of the slit nozzle 2 can be dried.

在完成該乾燥處理之後，控制部9係將控制信號提供給線性馬達54，且在使噴嘴支承體51朝向Y方向移動並移動至封閉部6的上方位置之後，將控制信號提供給升降機構51b，且使噴嘴支承體51往下方移動。藉此，狹縫噴嘴2的下端部會被按壓於彈性板612並封閉噴出口23(參照圖7E)。又，控制部9係開啟排出用閥12，並且將四通閥108及三通閥109切換成供給配管105的一端部僅連接於配管103B的狀態。接續於此，控制部9係提供控制信號至驅動泵浦102B來驅動泵浦102B。藉此，能使塗布液B從供給部101B的槽(省略圖示)經由配管103B、四通閥108而壓送至供給配管105。如圖7E所示，如此被壓送的塗布液B係將存在於供給配管105內的氮氣推向狹縫噴嘴2側。另一方面，因狹縫噴嘴2的噴出口23係被封閉著，故而流路210內的壓力能伴隨塗布液B的輸送而提高，且存在於流路210的氮氣能經由排出口24及排出配管11而排出至噴嘴外部，並且使塗布液B貯留於流路210。如此，存在於供給配管105及流路210的氮氣就能置換成塗布液B(第二置換處理)。 After the drying process is completed, the control unit 9 supplies a control signal to the linear motor 54, and after moving the nozzle support body 51 in the Y direction and moving to the upper position of the closing portion 6, provides a control signal to the lifting mechanism 51b. And the nozzle support body 51 is moved downward. Thereby, the lower end portion of the slit nozzle 2 is pressed against the elastic plate 612 and the discharge port 23 is closed (see FIG. 7E). Moreover, the control unit 9 opens the discharge valve 12, and switches the four-way valve 108 and the three-way valve 109 so that one end portion of the supply pipe 105 is connected only to the pipe 103B. Following this, the control unit 9 provides a control signal to drive the pump 102B to drive the pump 102B. By this, the coating liquid B can be pressure-fed from the tank (not shown) of the supply part 101B to the supply piping 105 via the piping 103B and the four-way valve 108. As shown in FIG. 7E, the coating liquid B thus pumped pushes the nitrogen gas existing in the supply pipe 105 toward the slit nozzle 2 side. On the other hand, since the discharge port 23 of the slit nozzle 2 is closed, the pressure in the flow path 210 can be increased by the conveyance of the coating liquid B, and the nitrogen gas existing in the flow path 210 can be discharged through the discharge port 24 and discharged. The pipe 11 is discharged to the outside of the nozzle, and the coating liquid B is stored in the flow path 210. In this way, the nitrogen gas existing in the supply pipe 105 and the flow path 210 can be replaced with the coating liquid B (second replacement treatment).

在進而繼續進行塗布液B的壓送之期間，塗布液B會 從狹縫噴嘴2溢流並流出至排出配管11。如此一來，感測器13就偵測到該塗布液B，且將該偵測信號提供給控制部9。接收該信號的控制部9就判定流路210已由塗布液所充填。此種流路210的充填判定係藉由控制部9的充填判定部911所執行。 During the further pressure transfer of the coating liquid B, the coating liquid B will The overflow from the slit nozzle 2 flows out to the discharge pipe 11. In this way, the sensor 13 detects the coating liquid B and supplies the detection signal to the control unit 9. The control unit 9 that receives the signal determines that the flow path 210 has been filled with the coating liquid. The filling determination of the flow path 210 is performed by the filling determination unit 911 of the control unit 9.

如圖7F所示，當流路210的充填被判定時，控制部9就停止泵浦102B的驅動並停止塗布液B的供給，並且將控制信號提供給排出用閥12並使其閉合。藉此不會使氣體成分存在於供給配管105及流路210，而可以使其由被用於下一個塗布處理的塗布液B所充填，且完成對基板3的表面31噴出塗布液B以形成塗布膜的處理(第二塗布處理)之準備。在之後的適當時序，控制部9會將控制信號提供給升降機構51b，且使噴嘴支承體51往上方移動，進而將控制信號提供給線性馬達54，且使噴嘴支承體51朝向Y方向移動並移動至噴出開始位置。與基於塗布液A的第一塗布處理同樣之方式，執行第二塗布處理。 As shown in FIG. 7F, when the filling of the flow path 210 is determined, the control unit 9 stops the driving of the pump 102B and stops the supply of the coating liquid B, and supplies a control signal to the discharge valve 12 and closes it. Thereby, the gas component is not present in the supply pipe 105 and the flow path 210, but it can be filled with the coating liquid B used for the next coating process, and the coating liquid B is discharged onto the surface 31 of the substrate 3 to form. Preparation of a coating film (second coating treatment). At a later appropriate timing, the control unit 9 supplies a control signal to the elevating mechanism 51b, moves the nozzle support body 51 upward, and supplies a control signal to the linear motor 54 and moves the nozzle support body 51 in the Y direction. Move to the ejection start position. The second coating treatment is performed in the same manner as the first coating treatment based on the coating liquid A.

另外，在將塗布液B切換成塗布液A並進行塗布處理的情況下，亦與上面所述的同樣之方式，可以進行從塗布液B向塗布液A的切換。 In addition, when the coating liquid B is switched to the coating liquid A and the coating treatment is performed, the coating liquid B can be switched from the coating liquid B to the coating liquid A in the same manner as described above.

如以上，在第二實施形態中，不僅能獲得與第一實施形態同樣的作用功效，還能達成以下的作用功效。換句話說，在第二實施形態中不會使混合液產生，而可以進行從塗布液A(B)向塗布液B(A)的切換。為此，沒有伴隨混合液之發生而造成的塗布液A、B之廢棄，且可以降低運轉成本。又，依塗布液A、B之組合，有時會因混合而產生沉積物或氣體等，而在如此的組合中有時實質上無法採用第一實施形態。相對於此，因在第二實施形態中係始終用氮 氣將存在於供給配管105及流路210的塗布液擠出，故而不管塗布液的組合都可以使用。因而，第二實施形態的塗布裝置1可謂是具有較高的通用性。 As described above, in the second embodiment, not only the same effects as those of the first embodiment can be obtained, but also the following effects can be achieved. In other words, in the second embodiment, switching of the coating liquid A (B) to the coating liquid B (A) can be performed without generating a mixed liquid. For this reason, there is no disposal of the coating liquids A and B due to the occurrence of the mixed liquid, and the running cost can be reduced. Further, depending on the combination of the coating liquids A and B, deposits, gases, and the like may be generated by mixing, and in the above-described combination, the first embodiment may not be substantially used. In contrast, in the second embodiment, nitrogen is always used. Since the gas is applied to the coating liquid supplied to the supply pipe 105 and the flow path 210, the combination of the coating liquids can be used. Therefore, the coating apparatus 1 of the second embodiment can be said to have high versatility.

另外，本發明並非被限定於上面所述的實施形態，只要未脫離其趣旨，除了上面所述以外仍能夠進行各種的變更。例如，在上述實施形態中，雖然是對一個狹縫噴嘴2選擇性地供給二種類的塗布液A、B以形成塗布液A的塗布膜及塗布液B的塗布膜，但是亦能夠將本發明應用於選擇性地供給並塗布三種類以上的塗布液的塗布裝置。換句話說，藉由針對每一塗布液設置供給部及專用的回收容器，就可以使用複數種的塗布液。 Further, the present invention is not limited to the above-described embodiments, and various modifications can be made in addition to the above without departing from the scope of the invention. For example, in the above-described embodiment, the coating liquids A and B of the two types of slit nozzles 2 are selectively supplied to form the coating film of the coating liquid A and the coating liquid of the coating liquid B. However, the present invention can also be applied. It is applied to a coating device that selectively supplies and coats three or more types of coating liquids. In other words, by providing a supply unit and a dedicated recovery container for each coating liquid, a plurality of coating liquids can be used.

又，在上述實施形態中，雖然是將本發明應用於一邊切換複數個塗布液一邊從狹縫噴嘴2噴出塗布液的塗布裝置，但是亦可將本發明應用於使一種類的塗布液從狹縫噴嘴2噴出的塗布裝置。換句話說，可以在對狹縫噴嘴2的流路供給塗布液並使其貯留時藉由持續用彈性板612來封閉噴出口23，而確實地防止塗布液從噴出口23的洩漏。結果，可以有效地抑制運轉成本。 Further, in the above-described embodiment, the present invention is applied to a coating device that ejects a coating liquid from the slit nozzle 2 while switching a plurality of coating liquids. However, the present invention can also be applied to a coating liquid of a type. A coating device that sews the nozzle 2 to eject. In other words, when the coating liquid is supplied to the flow path of the slit nozzle 2 and stored, the discharge port 23 can be closed by the continuous elastic plate 612, and the leakage of the coating liquid from the discharge port 23 can be surely prevented. As a result, the running cost can be effectively suppressed.

又，在上述實施形態中，雖然封閉構件61係具有在基底板611之上面安裝有彈性板612的構造，但是封閉構件61的構造並非被限定於此。例如，亦可使用塊狀的彈性體作為封閉構件61。又，雖然是將封閉構件61的表面(在上述實施形態中為彈性板612的表面)最後加工成平面形狀，但是只要可以封閉噴出口23亦可最後加工成任何的形狀。 Further, in the above-described embodiment, the closing member 61 has a structure in which the elastic plate 612 is attached to the upper surface of the base plate 611, but the structure of the closing member 61 is not limited thereto. For example, a block-shaped elastic body can also be used as the closing member 61. Further, although the surface of the closing member 61 (the surface of the elastic plate 612 in the above embodiment) is finally processed into a planar shape, it may be finally processed into any shape as long as the discharge port 23 can be closed.

又，在上述實施形態中，雖然是將本發明應用於使用狹縫噴嘴2來塗布塗布液的塗布裝置，但是噴嘴並非被限定於狹縫噴嘴，而是能夠全面應用於使用習知以來所週知 的噴嘴的塗布裝置。 Further, in the above-described embodiment, the present invention is applied to a coating device that applies a coating liquid using the slit nozzle 2. However, the nozzle is not limited to the slit nozzle, but can be applied to all of the conventional use. know The nozzle coating device.

又，在上述實施形態中係固定配置封閉構件61，另一方面，藉由控制部9來控制線性馬達54及升降機構51b，藉此使狹縫噴嘴2移動並選擇性地切換「貯留模式」和「噴出模式」。該所謂「貯留模式」係意指在已將狹縫噴嘴2的下端部按壓於彈性板612的狀態下將塗布液貯留於狹縫噴嘴2的流路210之動作態樣，且相當於本發明的「貯留步驟」之一例。又，該所謂「噴出模式」係意指在已使狹縫噴嘴2的下端部遠離彈性板612的狀態下從噴出口23噴出塗布液之動作態樣，且相當於本發明的「噴出步驟」之一例。有關此等「貯留模式」、「噴出模式」的切換，亦可藉由封閉構件61的移動來進行。重要的是，只要使狹縫噴嘴2及封閉構件61當中的至少一方移動並進行上述切換即可。 Further, in the above embodiment, the closing member 61 is fixedly disposed, and the linear motor 54 and the elevating mechanism 51b are controlled by the control unit 9, thereby moving the slit nozzle 2 and selectively switching the "storage mode". And "spray mode". The "storage mode" means an operation mode in which the coating liquid is stored in the flow path 210 of the slit nozzle 2 while the lower end portion of the slit nozzle 2 is pressed against the elastic plate 612, and corresponds to the present invention. An example of the "storage step". In addition, the "discharge mode" means an operation state in which the coating liquid is discharged from the discharge port 23 while the lower end portion of the slit nozzle 2 is moved away from the elastic plate 612, and corresponds to the "discharging step" of the present invention. One example. The switching between the "storage mode" and the "discharge mode" can also be performed by the movement of the closing member 61. It is important that at least one of the slit nozzle 2 and the closing member 61 is moved and the above-described switching is performed.

如以上說明般，在上述實施形態中，供給部101A、101B係相當於本發明的「塗布液供給部」之一例。又，氮氣供給源及配管107係相當於本發明的「氣體供給部」之一例。又，塗布液A、B係分別相當於本發明的「第一塗布液」及「第二塗布液」之一例。又，狹縫噴嘴移動部53及升降機構51b係相當於本發明的「移動機構部」之一例。又，排出口24係相當於本發明的「排氣孔」之一例。又，感測器13係相當於本發明的「偵測部」之一例。 As described above, in the above embodiment, the supply units 101A and 101B correspond to an example of the "coating liquid supply unit" of the present invention. Further, the nitrogen gas supply source and the piping 107 correspond to an example of the "gas supply unit" of the present invention. Further, the coating liquids A and B correspond to an example of the "first coating liquid" and the "second coating liquid" of the present invention, respectively. Further, the slit nozzle moving portion 53 and the elevating mechanism 51b correspond to an example of the "moving mechanism portion" of the present invention. Further, the discharge port 24 corresponds to an example of the "vent hole" of the present invention. Further, the sensor 13 corresponds to an example of the "detection unit" of the present invention.

以上，如已例示說明具體的實施形態般，本發明亦可構成為例如控制部在以貯留模式使塗布液充填於流路之後，切換成噴出模式並且藉由塗布液供給部供給塗布液並使其從噴出口朝向基板噴出。 As described above, the present invention may be configured such that the control unit is switched to the discharge mode after the application liquid is filled in the flow path in the storage mode, and the coating liquid supply unit supplies the coating liquid. It is ejected from the ejection port toward the substrate.

又，具備：氣體供給部，用以將氣體供給至噴嘴的流 路；以及供給配管，用以使塗布液和氣體流通至噴嘴的流路。塗布液供給部係構成為能夠透過供給配管來供給互為不同的第一塗布液和第二塗布液。控制部亦可構成為進行：第一置換處理，其在供給配管及流路內存在第一塗布液的狀態下，以噴出模式藉由氣體供給部將氣體透過供給配管來供給並將第一塗布液置換成氣體；第二置換處理，其切換成貯留模式並且藉由塗布液供給部將第二塗布液透過供給配管來供給並將存在於供給配管及流路內的氣體置換成第二塗布液；以及塗布處理，其在進行第二置換處理之後，切換成噴出模式並且藉由塗布液供給部將第二塗布液透過供給配管來供給並使第二塗布液從噴出口噴出。 Further, a gas supply unit for supplying a gas to the nozzle And a supply pipe for circulating the coating liquid and the gas to the flow path of the nozzle. The coating liquid supply unit is configured to be able to supply the first coating liquid and the second coating liquid which are different from each other through the supply pipe. The control unit may be configured to perform a first replacement process in which the gas is supplied through the supply pipe by the gas supply unit and the first coating is performed in the discharge mode in a state where the first coating liquid is present in the supply pipe and the flow path. The liquid is replaced with a gas; the second replacement treatment is switched to the storage mode, and the second coating liquid is supplied through the supply pipe by the coating liquid supply unit, and the gas existing in the supply pipe and the flow path is replaced with the second coating liquid. And a coating process which is switched to the discharge mode after the second replacement process, and the second coating liquid is supplied through the supply pipe by the coating liquid supply unit, and the second coating liquid is discharged from the discharge port.

又，亦可構成為供給配管的一端部、中間部及另一端部係分別連接於塗布液供給部、氣體供給部及流路；控制部係在第一置換處理與第二置換處理之間進行共洗處理。另外，共洗處理係指以下的處理：切換成貯留模式並且藉由塗布液供給部將第二塗布液透過供給配管來供給並將存在於一端部與中間部之間的第一塗布液至少輸送至比中間部更靠另一端部側；之後，切換成噴出模式並且藉由氣體供給部將氣體透過供給配管來供給，藉此至少使存在於比中間部更靠另一端部側的第一塗布液從噴出口噴出。 Further, the one end portion, the intermediate portion, and the other end portion of the supply pipe may be connected to the coating liquid supply unit, the gas supply unit, and the flow path, respectively, and the control unit may be performed between the first replacement process and the second replacement process. Co-washing treatment. In addition, the co-washing treatment refers to a process of switching to a storage mode and supplying the second coating liquid through the supply pipe by the coating liquid supply unit and supplying at least the first coating liquid existing between the one end portion and the intermediate portion. To the other end side than the intermediate portion; thereafter, switching to the discharge mode and supplying the gas through the supply pipe by the gas supply portion, thereby at least causing the first coating to be present on the other end side than the intermediate portion The liquid is ejected from the discharge port.

又，控制部，亦可構成為具有：充填判定部，用以判定噴嘴的流路是否已由塗布液所充填；以及模式切換部，其在藉由充填判定部而判定出流路已由塗布液所充填時切換成噴出模式。 Further, the control unit may be configured to include a filling determination unit for determining whether or not the flow path of the nozzle has been filled with the coating liquid, and a mode switching unit that determines that the flow path has been coated by the filling determination unit Switch to the discharge mode when the liquid is filled.

又，亦可在噴嘴設置用以連通流路的上端部與噴嘴外部的排氣孔。 Further, a vent hole for communicating the upper end portion of the flow path and the outside of the nozzle may be provided in the nozzle.

又，亦可進而具備：排出配管，其連接於排氣孔並連通流路與噴嘴外部；以及偵測部，用以偵測在以貯留模式將塗布液供給至噴嘴的期間塗布液從流路溢流至排出配管。控制部，亦可構成為基於藉由偵測部所進行的溢流之偵測來判定噴嘴的流路已由塗布液所充填。 Furthermore, the discharge pipe may be further provided with a discharge pipe connected to the exhaust hole and communicating with the flow path and the outside of the nozzle, and a detecting portion for detecting the coating liquid from the flow path during the supply of the coating liquid to the nozzle in the storage mode. Overflow to the discharge pipe. The control unit may be configured to determine that the flow path of the nozzle has been filled with the coating liquid based on the detection of the overflow by the detecting unit.

進而，噴出口的形狀為任意，例如可以使用具有狹縫形狀的噴出口。 Further, the shape of the discharge port is arbitrary, and for example, a discharge port having a slit shape can be used.

本發明係可以全面應用於將塗布液透過被設置於噴嘴之內部的流路而從被設置於噴嘴之下端部的噴出口噴出並塗布於基板的塗布技術中。 The present invention can be applied to a coating technique in which a coating liquid is discharged from a discharge port provided at a lower end portion of a nozzle and applied to a substrate through a flow path provided inside the nozzle.

2‧‧‧狹縫噴嘴 2‧‧‧Slit nozzle

3‧‧‧基板 3‧‧‧Substrate

6‧‧‧封閉部 6‧‧‧Department

7A至7C‧‧‧回收容器 7A to 7C‧‧‧Recycling containers

10‧‧‧供給機構 10‧‧‧Supply institutions

11‧‧‧排出配管 11‧‧‧Discharge piping

12‧‧‧排出用閥 12‧‧‧Exhaust valve

13‧‧‧感測器(偵測部) 13‧‧‧Sensor (detection department)

23‧‧‧噴出口 23‧‧‧Spray outlet

61‧‧‧封閉構件 61‧‧‧Closed components

101A、101B‧‧‧供給部(塗布液供給部) 101A, 101B‧‧‧Supply unit (coating liquid supply unit)

103A、103B、107‧‧‧配管 103A, 103B, 107‧‧‧ piping

104、106‧‧‧三通閥 104, 106‧‧‧ three-way valve

105‧‧‧供給配管 105‧‧‧Supply piping

210‧‧‧流路 210‧‧‧flow path

612‧‧‧彈性板(封閉構件) 612‧‧‧Elastic plate (closed member)

Claims (9)

一種塗布裝置，係使用具有噴嘴本體、噴出口及流路的噴嘴將塗布液塗布於基板，該噴出口係設置於前述噴嘴本體的下端部，該流路係在前述噴嘴本體的內部將前述塗布液流通至前述噴出口，其特徵在於具備：塗布液供給部，用以將前述塗布液供給至前述噴嘴；封閉部，其具有能夠封閉前述噴出口的封閉構件；移動機構部，用以使前述噴嘴及前述封閉構件當中的至少一方移動；以及控制部，用以選擇性地切換貯留模式及噴出模式，該貯留模式係藉由控制前述移動機構部來使前述封閉構件抵接於前述噴出口並封閉前述噴出口以將供給至前述噴嘴的塗布液貯留於前述流路，該噴出模式係使前述封閉構件從前述噴出口分離並使前述塗布液能夠從前述噴出口噴出。 In a coating apparatus, a coating liquid is applied to a substrate by using a nozzle having a nozzle body, a discharge port, and a flow path, and the discharge port is provided at a lower end portion of the nozzle body, and the flow path is coated in the nozzle body. The liquid flows through the discharge port, and includes a coating liquid supply unit for supplying the coating liquid to the nozzle, a closing portion having a closing member capable of closing the discharge port, and a moving mechanism portion for making the aforementioned At least one of the nozzle and the closing member moves; and a control unit for selectively switching between a storage mode and a discharge mode, wherein the closing mechanism abuts the sealing member by controlling the moving mechanism portion The discharge port is closed to store the coating liquid supplied to the nozzle in the flow path, and the discharge means separates the closing member from the discharge port and allows the coating liquid to be ejected from the discharge port. 如請求項1所記載之塗布裝置，其中前述控制部係在以前述貯留模式使前述塗布液充填於前述流路之後，切換成前述噴出模式並且藉由前述塗布液供給部來供給前述塗布液以使其從前述噴出口朝向前述基板噴出。 The coating device according to claim 1, wherein the control unit is configured to charge the coating liquid in the storage mode, switch to the discharge mode, and supply the coating liquid by the coating liquid supply unit. It is ejected from the ejection port toward the substrate. 如請求項1所記載之塗布裝置，其中具備：氣體供給部，用以將氣體供給至前述噴嘴的前述流路；以及供給配管，用以使前述塗布液和前述氣體流通至前述噴嘴的前述流路； 前述塗布液供給部係能夠透過前述供給配管來供給互為不同的第一塗布液和第二塗布液；前述控制部係進行：第一置換處理，其在前述供給配管及前述流路內存在前述第一塗布液的狀態下，以前述噴出模式藉由前述氣體供給部將前述氣體透過前述供給配管來供給並將前述第一塗布液置換成前述氣體；第二置換處理，其切換成前述貯留模式並且藉由前述塗布液供給部將前述第二塗布液透過前述供給配管來供給並將存在於前述供給配管及前述流路內的前述氣體置換成前述第二塗布液；以及塗布處理，其在進行前述第二置換處理之後，切換成前述噴出模式並且藉由前述塗布液供給部將前述第二塗布液透過前述供給配管來供給並使前述第二塗布液從前述噴出口噴出。 The coating apparatus according to claim 1, further comprising: a gas supply unit that supplies the gas to the flow path of the nozzle; and a supply pipe that allows the coating liquid and the gas to flow to the flow of the nozzle road; The coating liquid supply unit is capable of supplying the first coating liquid and the second coating liquid which are different from each other through the supply pipe, and the control unit performs a first replacement treatment in which the supply pipe and the flow path are present. In the state of the first coating liquid, the gas is supplied through the supply pipe by the gas supply unit in the discharge mode, and the first coating liquid is replaced with the gas; and the second replacement process is switched to the storage mode. And the coating liquid supply unit supplies the second coating liquid through the supply pipe, and supplies the gas existing in the supply pipe and the flow path to the second coating liquid; and a coating process. After the second replacement treatment, the second coating liquid is supplied through the supply pipe by the coating liquid supply unit, and the second coating liquid is discharged from the discharge port. 如請求項3所記載之塗布裝置，其中前述供給配管的一端部、中間部及另一端部係分別連接於前述塗布液供給部、前述氣體供給部及前述流路；前述控制部係在前述第一置換處理與前述第二置換處理之間進行下述的共洗處理；前述共洗處理係指以下的處理：切換成前述貯留模式並且藉由前述塗布液供給部將前述第二塗布液透過前述供給配管來供給並將存在於前述一端部與前述中間部之間的前述第一塗布液至少輸送至比前述中間部更靠前述另一端部側； 之後，切換成前述噴出模式並且藉由前述氣體供給部將前述氣體透過前述供給配管來供給，藉此至少使存在於比前述中間部更靠前述另一端部側的前述第一塗布液從前述噴出口噴出。 The coating device according to claim 3, wherein the one end portion, the intermediate portion, and the other end portion of the supply pipe are connected to the coating liquid supply unit, the gas supply unit, and the flow path, respectively; The following washing treatment is performed between the replacement treatment and the second replacement treatment; the co-washing treatment refers to a process of switching to the storage mode and transmitting the second coating liquid through the coating liquid supply unit. Supplying the pipe to supply and transporting the first coating liquid existing between the one end portion and the intermediate portion to at least the other end portion side than the intermediate portion; After that, the gas is supplied to the discharge pipe by the gas supply unit, and the gas is supplied through the supply pipe, whereby at least the first coating liquid existing on the other end side than the intermediate portion is sprayed from the spray. The outlet is ejected. 如請求項1至4中任一項所記載之塗布裝置，其中前述控制部係具有：充填判定部，用以判定前述噴嘴的前述流路是否已由前述塗布液所充填；以及模式切換部，其在藉由前述充填判定部而判定出前述流路已由前述塗布液所充填時切換成前述噴出模式。 The coating device according to any one of claims 1 to 4, wherein the control unit includes a filling determining unit that determines whether the flow path of the nozzle is filled with the coating liquid, and a mode switching unit. When it is determined by the above-described filling determination unit that the flow path has been filled with the coating liquid, it is switched to the discharge mode. 如請求項5所記載之塗布裝置，其中前述噴嘴係具有：連通前述流路的上端部與噴嘴外部的排氣孔。 The coating device according to claim 5, wherein the nozzle has a vent hole that communicates with an upper end portion of the flow path and an outside of the nozzle. 如請求項6所記載之塗布裝置，其中進而具備：排出配管，其連接於前述排氣孔並連通前述流路與噴嘴外部；以及偵測部，用以偵測在以前述貯留模式將前述塗布液供給至前述噴嘴的期間，前述塗布液從前述流路溢流至前述排出配管；前述控制部係基於藉由前述偵測部所進行的溢流之偵測來判定前述噴嘴的前述流路已由前述塗布液所充填。 The coating device according to claim 6, further comprising: a discharge pipe connected to the exhaust hole and communicating with the flow path and the outside of the nozzle; and a detecting portion for detecting coating in the foregoing storage mode While the liquid is supplied to the nozzle, the coating liquid overflows from the flow path to the discharge pipe; and the control unit determines that the flow path of the nozzle is based on detection of overflow by the detecting unit It is filled with the aforementioned coating liquid. 如請求項1至4、6及7中任一項所記載之塗布裝置，其中前述噴出口係具有狹縫形狀。 The coating device according to any one of claims 1 to 4, wherein the discharge port has a slit shape. 一種塗布方法，係使用具有噴嘴本體、噴出口及流路的噴嘴將塗布液塗布於基板，該噴出口係設置於前述噴嘴本體的下端部，該流路係在前述噴嘴本體的內部將前述塗布液流通至前述噴出口，其特徵在於具備： 貯留步驟，其在使封閉構件抵接於前述噴出口並封閉前述噴出口的狀態下將前述塗布液供給至前述噴嘴並使前述塗布液貯留於前述流路；以及噴出步驟，其在前述貯留步驟之後使前述封閉構件從前述噴出口分離的狀態下將前述塗布液供給至前述噴嘴，藉此將貯留於前述流路的前述塗布液從前述噴出口噴出。 In a coating method, a coating liquid is applied to a substrate by using a nozzle having a nozzle body, a discharge port, and a flow path, and the discharge port is provided at a lower end portion of the nozzle body, and the flow path is coated in the nozzle body. The liquid flows to the discharge port and is characterized by: a storage step of supplying the coating liquid to the nozzle and storing the coating liquid in the flow path in a state where the closing member abuts the discharge port and closing the discharge port; and a discharging step in the storing step Then, the coating liquid is supplied to the nozzle while the sealing member is separated from the discharge port, whereby the coating liquid stored in the flow path is discharged from the discharge port.
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