CN110653131A - Processing liquid supply device - Google Patents
Processing liquid supply device Download PDFInfo
- Publication number
- CN110653131A CN110653131A CN201910471689.9A CN201910471689A CN110653131A CN 110653131 A CN110653131 A CN 110653131A CN 201910471689 A CN201910471689 A CN 201910471689A CN 110653131 A CN110653131 A CN 110653131A
- Authority
- CN
- China
- Prior art keywords
- passage
- supply source
- pressure
- liquid supply
- cleaning liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
- B05C11/1036—Means for supplying a selected one of a plurality of liquids or other fluent materials, or several in selected proportions, to the applying apparatus
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
- B05C11/1044—Apparatus or installations for supplying liquid or other fluent material to several applying apparatus or several dispensing outlets, e.g. to several extrusion nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
- B05C11/1047—Apparatus or installations for supplying liquid or other fluent material comprising a buffer container or an accumulator between the supply source and the applicator
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0254—Coating heads with slot-shaped outlet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/027—Coating heads with several outlets, e.g. aligned transversally to the moving direction of a web to be coated
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Provided is a processing liquid supply device which can shorten the time required for changing the processing liquid. A color resist supply device (processing liquid supply device) (23) is provided with: a liquid transport path (24) that transports the color resist (treatment liquid) (10) and the cleaning liquid (11); a liquid supply channel (29) connected to supply sources (27, 28) of the color resist (10) and the cleaning liquid (11); a nitrogen gas pressure feed passage (gas pressure feed passage) (25) for feeding nitrogen gas (gas) under pressure; and a switching unit (35) that is connected to the liquid transport path (24), the liquid supply path (29), and the nitrogen gas pressure feed path (25) and switches at least between the transport of the color resist (10) or the cleaning liquid (11) in the liquid transport path (24) and the pressure feed of the nitrogen gas.
Description
Technical Field
The present invention relates to a processing liquid supply apparatus.
Background
Conventionally, as an example of a processing liquid supply apparatus, the contents described in patent document 1 below are known. In a resist coating apparatus which is one of the processing liquid supply apparatuses described in patent document 1, three-way valves are provided in pipes near the resist supply units of the first, second, and third resist supply systems which supply different types of photoresists, and the three-way valves are connected to pipes of the thinner supply system.
Documents of the prior art
Patent document
Patent document 1: japanese unexamined patent publication No. 11-169775
Disclosure of Invention
Technical problem to be solved by the invention
According to the resist coating apparatus described in patent document 1, although a plurality of resist supply systems are provided, the operation rate can be improved. When cleaning the pipe of the resist supply system, the pipe of the diluent supply system supplies the diluent to the pipe of the resist supply system through the three-way valve connected thereto. However, if the cleaning is performed only by a pipe for feeding the thinner to the resist supply system, there is a problem that it takes a lot of time to perform the cleaning in order not to leave the mixed solution of the photoresist and the thinner in the pipe.
The present invention has been made in view of the above circumstances, and an object thereof is to reduce the time required for changing a processing liquid or the like.
Technical solution for solving technical problem
(1) A treatment liquid supply device according to an embodiment of the present invention includes: a liquid transport passage that transports the treatment liquid and the cleaning liquid; a liquid supply channel connected to a supply source of the treatment liquid and the cleaning liquid; a gas pressure feed passage for pressure-feeding gas; and a switching unit connected to the liquid transport path, the liquid supply path, and the gas pressure-feed path, and configured to switch at least between the transport of the treatment liquid or the cleaning liquid in the liquid transport path and the pressure-feed of the gas.
The processing liquid is transported from the supply source through the liquid supply path and the switching unit via the liquid transport path. On the other hand, when the treatment liquid or the like is changed, the cleaning liquid is transported from the supply source to the liquid transport path via the liquid supply path and the switching unit, and therefore the liquid transport path or the like can be cleaned. In cleaning the cleaning liquid, it often takes a long time to prevent a mixed liquid of the cleaning liquid and the treatment liquid from remaining in the liquid transportation path. In this regard, the switching unit is connected to the liquid transport path, the liquid supply path, and the air pressure feed path, and can switch at least the transport of the treatment liquid or the cleaning liquid in the liquid transport path and the pressure feed of the gas, and therefore after the cleaning of the liquid transport path of the cleaning liquid is completed, the switching unit may switch the pressure feed of the gas from the air pressure feed path to the liquid transport path. Since the gas is pumped into the liquid transport path, a mixed liquid of the treatment liquid and the cleaning liquid remaining in the liquid transport path is effectively removed. Therefore, the cleaning time of the cleaning liquid and the squeezing time of the cleaning liquid of the treatment liquid after cleaning can be shortened. As described above, the time required for changing the treatment liquid and the like can be shortened.
(2) In addition to the configuration of (1), the processing liquid supply apparatus according to an embodiment of the present invention may further include a cleaning liquid supply path connected to the liquid transport path and the supply source of the cleaning liquid, and a processing liquid supply path connected to the liquid transport path and the supply source of the processing liquid, wherein the switching unit is connected to any one of the cleaning liquid supply path and the processing liquid supply path.
(3) In addition, in the processing liquid supply apparatus according to one embodiment of the present invention, in addition to the configuration of (2) above, the cleaning liquid supply path is connected to the switching unit, and the processing liquid supply path is connected to the liquid transport path on a downstream side of the switching unit.
(4) Further, in the processing liquid supply apparatus according to an embodiment of the present invention, in addition to the configuration of the above (3), the liquid transport lane includes a common transport lane for transporting the processing liquid and the cleaning liquid, and a cleaning liquid transport lane for transporting the cleaning liquid, and the apparatus further includes a second switching unit connected to the processing liquid supply lane, the cleaning liquid transport lane, and the common transport lane to switch between the transport of the processing liquid and the transport of the cleaning liquid in the common transport lane, or the pressure feed of the gas.
(5) In addition to the configuration of any one of (2) to (4), in a configuration in which the supply source of the treatment liquid is replaced with a supply source of a second cleaning liquid, the treatment liquid supply apparatus according to an embodiment of the present invention may further include a second cleaning liquid supply path connected to the liquid transport path and the supply source of the second cleaning liquid or the treatment liquid supply path in addition to the cleaning liquid supply path.
(6) In the treatment liquid supply device according to an embodiment of the present invention, in addition to any one of the configurations (1) to (5), the gas pressure-feed duct includes a main gas pressure-feed duct connected to the switching section, and a supply-source-side gas pressure-feed duct connected to the main gas pressure-feed duct and a supply source of the treatment liquid or the cleaning liquid.
(7) In addition to the configuration of (6), a processing liquid supply apparatus according to an embodiment of the present invention includes: a cleaning liquid supply path connected to the liquid transport path and the supply source of the cleaning liquid, and a process liquid supply path connected to the liquid transport path and the supply source of the process liquid, the supply source-side gas pressure-feed path including: a cleaning liquid supply source-side gas pressure-feed passage connected to the cleaning liquid supply source and the main gas pressure-feed passage, and a treatment liquid supply source-side gas pressure-feed passage connected to one of the treatment liquid supply source and the main gas pressure-feed passage on an upstream side or a downstream side of the cleaning liquid supply source-side gas pressure-feed passage.
(8) In addition to the configuration of (7), a processing liquid supply apparatus according to an embodiment of the present invention includes, in the main gas pressure feed passage, in order from an upstream side: a first main gas pressure-feed lane connected to one of the cleaning liquid supply source-side gas pressure-feed lane and the treatment liquid supply source-side gas pressure-feed lane, a second main gas pressure-feed lane connected to the other of the cleaning liquid supply source-side gas pressure-feed lane and the treatment liquid supply source-side gas pressure-feed lane, a third main gas pressure-feed lane connected to the switching section, and a third switching section and a fourth switching section, the third switching section being connected to the one, the first main gas pressure-feed lane and the second main gas pressure-feed lane to switch the pressure-feed of the gas in the one and the pressure-feed of the gas in the second main gas pressure-feed lane, the fourth switching section being connected to the other, the second main gas pressure-feed lane and the third main gas pressure-feed lane to switch the pressure-feed of the gas in the other, And the pressure feed of the gas in the third main gas pressure feed passage.
(9) In addition to the configuration of any one of (1) to (8), the processing liquid supply apparatus according to an embodiment of the present invention may be configured such that the gas pressure feed passage is configured to pressure-feed nitrogen gas as the gas.
(10) In addition, in the processing liquid supply apparatus according to an embodiment of the present invention, in addition to the configuration of any one of (1) to (9), the liquid transport path transports the color resist as the processing liquid.
Advantageous effects
According to the present invention, the time required for changing the treatment liquid or the like can be shortened.
Drawings
Fig. 1 is a diagram showing the device configuration of a slot coating device according to a first embodiment of the present invention.
Fig. 2 is a diagram showing the configuration of a switching unit and a fourth switching unit provided in the color resist supply apparatus.
Fig. 3 is a view showing the flow of the color resist and nitrogen gas in the coating operation.
Fig. 4 is a diagram showing the flow of the cleaning liquid and the nitrogen gas in association with the cleaning operation.
Fig. 5 is a diagram showing the flow direction of nitrogen gas accompanying the flushing operation.
Fig. 6 is a diagram showing the flow of the cleaning liquid and the nitrogen gas in the cleaning operation according to the second embodiment of the present invention.
Fig. 7 is a diagram showing the flow of the second cleaning liquid and the nitrogen gas in the second cleaning operation.
Fig. 8 is a diagram showing the flow direction of nitrogen gas accompanying the flushing operation.
Fig. 9 is a diagram showing the device configuration of a slit coating device according to a third embodiment of the present invention.
Detailed Description
< first embodiment >
A first embodiment of the present invention is explained with reference to fig. 1 to 5. A color resist supply device (treatment liquid supply device) 23 provided in a slit coating device (treatment liquid coating device) 20 used for manufacturing a liquid crystal panel is exemplified.
The slit coating apparatus 20 according to the present embodiment is an apparatus for forming a color filter on a CF substrate provided in a liquid crystal panel. As shown in fig. 1, the slit coating apparatus 20 includes at least: an application section 21 that applies a color resist (treatment liquid) 10 as a material of the color filter onto the CF substrate; a storage section 22 for temporarily storing the color resist 10 supplied to the coating section 21; and a color resist supply device 23 for supplying the color resist 10 to the reservoir 22. The coating section 21 is a resist coating head provided with a plurality of slit nozzles that coat the color resist 10 on the CF substrate. The storage section 22 includes: a container for storing the color resist 10 supplied from the color resist supply device 23, a pump for appropriately supplying the color resist 10 to the coating section 21, and the like. The coating section 21, the reservoir section 22, and the color resist supply device 23 are connected by pipes.
As shown in fig. 1, the color resist supply device 23 includes at least: a liquid transport passage 24 that transports the color resist 10 and the like; a nitrogen gas pressure feed passage (gas pressure feed passage) 25 for feeding nitrogen gas (gas) under pressure; a connection unit 26 for connecting the liquid transport path 24 to a pipe on the storage unit 22 side and for connecting the nitrogen gas pressure feed path 25 to a nitrogen gas supply source; and a liquid supply path 29 for connecting a color resist supply source (treatment liquid supply source) 27 as a supply source of the color resist 10 and a cleaning liquid supply source 28 as a supply source of the cleaning liquid 11 to the liquid transport path 24, and supplying the color resist 10 and the cleaning liquid 11 to the liquid transport path 24. When forming a color filter on a CF substrate, the color resist 10 transported by the liquid transport path 24 is supplied to the reservoir 22 via the connection portion 26. The liquid transport path 24 can transport the cleaning liquid 11 for cleaning the inside accompanying the change of the color resist 10 or the like. The liquid supply passage 29 includes: a color resist supply path (processing liquid supply path) 31 that connects the liquid transport path 24 and the color resist supply source 27 to take charge of supply of the color resist 10; and a cleaning liquid supply passage 32 for supplying the cleaning liquid 11 by connecting the liquid transport passage 24 and the cleaning liquid supply source 28. The liquid transport passage 24, the nitrogen gas pressure feed passage 25, and the liquid supply passage 29 are each constituted by piping. The color resist supply source 27 and the cleaning solution supply source 28 are each constituted by a container with a lid such as a pail.
As shown in fig. 1, the nitrogen gas pressure feed passage 25 includes: a main nitrogen gas pressure-feed passage (main gas pressure-feed passage) 25A whose upstream end side is connected to a nitrogen gas supply source via a connection portion 26 and whose downstream end side is connected to the liquid transport passage 24; a supply source-side nitrogen gas pressure feed passage (supply source-side nitrogen gas pressure feed passage) 30 for connecting the color resist supply source 27 and the cleaning liquid supply source 28 to the main nitrogen gas pressure feed passage 25A and supplying nitrogen gas to the supply sources 27 and 28. The nitrogen gas supply source is configured to pressure-feed nitrogen gas into the nitrogen gas pressure-feed passage 25 at a predetermined pressure. The supply source side nitrogen pressure-feed passage 30 includes: a color resist supply source side nitrogen gas pressure feed passage (process liquid supply source side nitrogen gas pressure feed passage) 33 which is connected to the main nitrogen gas pressure feed passage 25A and the color resist supply source 27 and which pressure feeds nitrogen gas to the color resist supply source 27; a cleaning liquid supply source-side nitrogen gas pressure-feed passage (cleaning liquid supply source-side gas pressure-feed passage) 34 that is connected to the nitrogen gas pressure-feed passage 25 and the cleaning liquid supply source 28 and that pressure-feeds nitrogen gas to the cleaning liquid supply source 28.
However, the color resist 10 is composed of a photosensitive coloring material. Since the CF substrate of the liquid crystal panel includes color filters of three colors of red, green, and blue, for example, the color resist 10 of three colors of red, green, and blue is used when each color filter is formed. Since the slit coating apparatus 20 according to the present embodiment has a single conveyance path (including the liquid conveyance path 24) for the color resist 10 from the color resist supply source 27 to the coating section 21, when the color of the color resist 10 to be used is changed, it is necessary to replace the color resist supply source 27 and clean the conveyance path for the color resist 10. By appropriately cleaning the transportation path of the color resist 10 therein, color mixing of the color resist 10 can be prevented. The cleaning liquid 11 is made of a solvent such as a thinner, for example, and the cleaning liquid 11 is used for cleaning a transportation path of the color resist 10.
As shown in fig. 1, the color resist supply apparatus 23 according to the present embodiment is provided with two switching units 35 to 38 at the connection between the liquid transport path 24 and the liquid supply path 29 and at the connection between the main nitrogen gas pressure feed path 25A and the supply source side nitrogen gas pressure feed path 30, respectively. As shown in fig. 2, each of the switching units 35 to 38 has three electromagnetic valves 39 provided in each pipe to be connected, and is a so-called three-way valve. Although the first switching unit 35 and the fourth switching unit 38 are shown as typical in fig. 2, the second switching unit 36 and the third switching unit 37 have the same configuration. The switching units 35 to 38 will be described in detail below.
As shown in fig. 1, the switching unit 35 is connected to the liquid transport path 24, the cleaning liquid supply path 32 constituting the liquid supply path 29, and the main nitrogen gas pressure feed path 25A constituting the nitrogen gas pressure feed path 25, and switches at least the transport of the color resist 10 or the cleaning liquid 11 in the liquid transport path 24 and the pressure feed of the nitrogen gas. Specifically, the switching unit 35 includes an electromagnetic valve 39 provided at an upstream end portion (cleaning liquid transport passage 24B) of the liquid transport passage 24, an electromagnetic valve 39 provided at a downstream end portion (opposite side to the cleaning liquid supply source 28) of the cleaning liquid supply passage 32, and an electromagnetic valve 39 provided at a downstream end portion (third main nitrogen pressure feed passage 25A3) of the main nitrogen pressure feed passage 25A. When the color resist 10 is supplied from the color resist supply device 23 to the coating section 21 and the reservoir section 22 side, or when the transport path of the color resist 10 is cleaned, the electromagnetic valve 39 (see fig. 2) constituting the switching section 35 opens the electromagnetic valve 39 provided in the liquid transport passage 24 and the electromagnetic valve 39 provided in the cleaning liquid supply passage 32, and closes the electromagnetic valve 39 provided in the main nitrogen pressure feed passage 25A in opposition. Thus, the nitrogen gas in the main nitrogen gas pressure-feeding passage 25A can be prevented from being pressure-fed to the liquid transport passage 24, and the color resist 10 and the cleaning liquid 11 can be transported from the color resist supply source 27 and the cleaning liquid supply source 28 to the liquid transport passage 24 through the color resist supply passage 31 and the cleaning liquid supply passage 32 and then through the switching unit 35. On the other hand, when the solenoid valve 39 provided in the liquid transport passage 24 and the solenoid valve 39 provided in the main nitrogen pressure-feed passage 25A are opened and the solenoid valve 39 provided in the purge liquid supply passage 32 is closed, among the solenoid valves 39 constituting the switching unit 35, the nitrogen gas in the main nitrogen pressure-feed passage 25A can be pressure-fed into the liquid transport passage 24. The switch 35 is preferably set after the cleaning of the liquid transport path 24 by the cleaning liquid 11 is completed, so that the mixed liquid of the color resist 10 and the cleaning liquid 11 remaining in the liquid transport path 24 can be effectively removed by the nitrogen gas pumped into the liquid transport path 24. Therefore, the cleaning time of the cleaning liquid 11 and the squeezing time of the cleaning liquid 11 of the color resist 10 after cleaning can be shortened. As described above, the time required to change the color resist 10 can be shortened. Further, the switching portion 35 connects the upstream side end portion of the cleaning liquid supply passage 32 and the liquid transport passage 24, and therefore, it is possible to clean substantially the entire area of the liquid transport passage 24 with the cleaning liquid 11 transported from the cleaning liquid supply passage 32 to the liquid transport passage 24 via the switching portion 35. Therefore, the cleaning of the liquid transport path 24 can be efficiently performed.
As shown in fig. 1, the second switching portion 36 connects the intermediate portion in the liquid transport path 24 and the color resist supply path 31 of the liquid supply path 29. In the liquid conveyance path 24, a portion on the downstream side of the second switching portion 36 is a common conveyance path 24A through which the color resists 10 and the cleaning liquid 11 are conveyed, and a portion on the upstream side of the second switching portion 36 is a cleaning liquid conveyance path 24B through which the cleaning liquid 11 is conveyed. The second switching unit 36 includes: an electromagnetic valve 39 provided at an upstream-side end portion in the common transport passage 24A; an electromagnetic valve 39 provided at an end portion on a downstream side (a side opposite to the switching portion 35 side) in the washing liquid transport passage 24B; an electromagnetic valve 39 provided at an end portion on the downstream side (the side opposite to the color resist supply source 27 side) in the color resist supply passage 31. The second switching unit 36 is configured to switch between the conveyance of the color resist 10, the conveyance of the cleaning liquid 11, or the pressure feeding of nitrogen gas in the common conveyance path 24A. Specifically, when the electromagnetic valve 39 provided in the common transport path 24A and the electromagnetic valve 39 provided in the color resist supply path 31 are opened and the electromagnetic valve 39 provided in the cleaning liquid transport path 24B is closed, the electromagnetic valve 39 constituting the second switching unit 36 can open the color resist 10 from the color resist supply path 31 to the common transport path 24A. On the other hand, when the electromagnetic valve 39 provided in the common transport path 24A and the electromagnetic valve 39 provided in the cleaning liquid transport path 24B are opened among the electromagnetic valves 39 constituting the second switching unit 36, and the electromagnetic valve 39 provided in the color resist supply path 31 is closed, the cleaning liquid 11 transported by the cleaning liquid transport path 24B can be transported to the common transport path 24A to clean the common transport path 24A, or the nitrogen gas pumped into the cleaning liquid transport path 24B can be pumped into the common transport path 24A to flush the common transport path 24A.
As shown in fig. 1, the third switch 37 is connected to an intermediate portion of the main nitrogen pressure-feeding passage 25A and the color resist supply source side nitrogen pressure-feeding passage 33 constituting the supply source side nitrogen pressure-feeding passage 30. In contrast, the fourth switching unit 38 is connected to the downstream side of the main nitrogen pressure-feed passage 25A from the third switching unit 37 and the cleaning liquid supply source side nitrogen pressure-feed passage 34 constituting the supply source side nitrogen pressure-feed passage 30. In the main nitrogen pressure-feed passage 25A, the portion upstream of the third switching portion 37 is defined as a first main nitrogen pressure-feed passage (first main gas pressure-feed passage) 25A1, the portion sandwiched between the third switching portion 37 and the fourth switching portion 38 is defined as a second main nitrogen pressure-feed passage (second main gas pressure-feed passage) 25A2, and the portion downstream of the fourth switching portion 38 is defined as a third main nitrogen pressure-feed passage (third main gas pressure-feed passage) 25A 3.
As shown in fig. 1, the third switching unit 37 has an electromagnetic valve 39 provided at the downstream end of the first main nitrogen pressure-feed passage 25a1, an electromagnetic valve 39 provided at the upstream end of the second main nitrogen pressure-feed passage 25a2, and an electromagnetic valve 39 provided at the upstream end (opposite side to the color resist supply source 27 side) of the color resist supply source side nitrogen pressure-feed passage 33. The third switching unit 37 is configured to switch between the pressure feeding of the nitrogen gas in the color resist supply source side nitrogen gas pressure-feeding passage 33 and the pressure feeding of the nitrogen gas in the second main nitrogen gas pressure-feeding passage 25a 2. Specifically, when the solenoid valve 39 provided in the first main nitrogen pressure-feeding passage 25a1 and the solenoid valve 39 provided in the color resist supply source side nitrogen pressure-feeding passage 33 are opened and the solenoid valve 39 provided in the second main nitrogen pressure-feeding passage 25a2 is closed, among the solenoid valves 39 constituting the third switching unit 37, nitrogen gas can be pressurized from the first main nitrogen pressure-feeding passage 25a1 to the color resist supply source side nitrogen pressure-feeding passage 33. The nitrogen gas pressure-fed to the nitrogen gas pressure-feeding path 33 on the color resist supply source side is pressure-fed into the color resist supply source 27, and therefore the color resist 10 can be fed into the color resist supply path 31. On the other hand, of the solenoid valves 39 constituting the third switch 37, the solenoid valve 39 provided in the first main nitrogen pressure-feed passage 25a1 is opened and the solenoid valve 39 provided in the second main nitrogen pressure-feed passage 25a2 is closed, and the nitrogen gas pressure-fed into the first main nitrogen pressure-feed passage 25a1 can be pressure-fed into the second main nitrogen pressure-feed passage 25a2 by opening the solenoid valve 39 provided in the first main nitrogen pressure-feed passage 25a1 and closing the solenoid valve 39 provided in the color resist supply source side nitrogen pressure-feed passage 33.
As shown in fig. 1, the fourth switching unit 38 includes an electromagnetic valve 39 provided at the downstream end of the second main nitrogen pressure-feeding passage 25a2, an electromagnetic valve 39 provided at the upstream end of the third main nitrogen pressure-feeding passage 25A3, and an electromagnetic valve 39 provided at the upstream end (opposite side to the cleaning liquid supply source 28) of the cleaning liquid supply source side nitrogen pressure-feeding passage 34. The fourth switching unit 38 is configured to switch between the pressure feeding of the nitrogen gas in the cleaning liquid supply source side nitrogen pressure-feeding passage 34 and the pressure feeding of the nitrogen gas in the third main nitrogen pressure-feeding passage 25a 3. Specifically, when the solenoid valve 39 provided in the second main nitrogen pressure-feeding passage 25a2 and the solenoid valve 39 provided in the cleaning liquid supply source side nitrogen pressure-feeding passage 34 are opened and the solenoid valve 39 provided in the third main nitrogen pressure-feeding passage 25A3 is closed, among the solenoid valves 39 constituting the fourth switching unit 38, nitrogen gas can be pressure-fed from the second main nitrogen pressure-feeding passage 25a2 to the cleaning liquid supply source side nitrogen pressure-feeding passage 34. The nitrogen gas pressure-fed into the cleaning liquid supply source side nitrogen gas pressure-feeding passage 34 is pressure-fed into the cleaning liquid supply source 28, and therefore the cleaning liquid 11 can be fed into the cleaning liquid supply passage 32. On the other hand, when the solenoid valve 39 provided in the second main nitrogen pressure-feeding passage 25a2 and the solenoid valve 39 provided in the third main nitrogen pressure-feeding passage 25A3 are opened among the solenoid valves 39 constituting the fourth switching unit 38, and the solenoid valve 39 provided in the cleaning liquid supply source side nitrogen pressure-feeding passage 34 is closed, the nitrogen gas pressure-fed into the second main nitrogen pressure-feeding passage 25a2 can be pressure-fed into the third main nitrogen pressure-feeding passage 25 A3.
The slit coating apparatus 20 according to the present embodiment has the above-described configuration, and the operation thereof will be described next. First, when the color resist 10, which is a material of the color filter, is applied on the CF substrate, the color resist 10 is supplied from the color resist supply device 23 to the reservoir 22 as shown in fig. 3. At this time, in the second switching portion 36, the electromagnetic valve 39 provided in the common transport passage 24A and the electromagnetic valve 39 provided in the color resist supply passage 31 are opened, and the electromagnetic valve 39 provided in the cleaning liquid transport passage 24B is closed, while being opposed to each other. On the other hand, in the third switching unit 37, the solenoid valve 39 provided in the first main nitrogen pressure-feeding passage 25a1 and the solenoid valve 39 provided in the color resist supply source side nitrogen pressure-feeding passage 33 are opened, and the solenoid valve 39 provided in the second main nitrogen pressure-feeding passage 25a2 is closed. Thus, since the nitrogen gas is pressure-fed from the first main nitrogen gas pressure-feeding passage 25a1 to the color resist supply source side nitrogen gas pressure-feeding passage 33 via the third switching unit 37, the color resist 10 in the color resist supply source 27 is fed into the color resist supply passage 31 via the pressure-fed nitrogen gas. The color resist 10 sent out into the color resist supply path 31 is transported into the common transport path 24A via the second switching portion 36. Therefore, the color resist 10 can be transported from the color resist supply source 27 to the common transport path 24A, and therefore the color resist 10 can be supplied from the color resist supply device 23 to the reservoir 22. The open/close state of each solenoid valve 39 constituting the switching unit 35 and the fourth switching unit 38 may be set as appropriate, but all of them may be closed, for example.
When the color of the color filter applied to the CF substrate is changed, the color of the color resist 10 supplied from the color resist supply device 23 to the reservoir 22 is changed. Before changing the color of the color resist 10, the transport path of the color resist 10 is cleaned to prevent color mixing. When the purge operation is performed, as shown in fig. 4, the solenoid valve 39 provided in the purge liquid transport passage 24B and the solenoid valve 39 provided in the purge liquid supply passage 32 are opened in the switching unit 35, and the solenoid valve 39 provided in the third main nitrogen pressure-feed passage 25a3 is closed. In the second switching portion 36, the electromagnetic valve 39 provided in the common transport passage 24A and the electromagnetic valve 39 provided in the cleaning liquid transport passage 24B are opened, and the electromagnetic valve 39 provided in the color resist supply passage 31 is closed, oppositely. In the third switching unit 37, the solenoid valve 39 provided in the first main nitrogen pressure-feed passage 25a1 and the solenoid valve 39 provided in the second main nitrogen pressure-feed passage 25a2 are opened, and the solenoid valve 39 provided in the color resist supply source side nitrogen pressure-feed passage 33 is closed. In the fourth switching unit 38, the solenoid valve 39 provided in the second main nitrogen pressure-feeding passage 25a2 and the solenoid valve 39 provided in the cleaning liquid supply source-side nitrogen pressure-feeding passage 34 are opened, and the solenoid valve 39 provided in the third main nitrogen pressure-feeding passage 25A3 is closed. Thus, the nitrogen gas is pressure-fed from the first main nitrogen pressure-feeding passage 25a1 to the cleaning liquid supply source-side nitrogen pressure-feeding passage 34 via the third switching unit 37, the second main nitrogen pressure-feeding passage 25a2, and the fourth switching unit 38, and therefore the cleaning liquid 11 in the cleaning liquid supply source 28 is fed into the cleaning liquid supply passage 32 via the pressure-fed nitrogen gas. The wash liquid 11 sent out from the wash liquid supply path 32 is transported into the wash liquid transport path 24B via the switch 35, and then transported into the common transport path 24A via the second switch 36. Therefore, the cleaning liquid 11 is cleaned in the liquid transport path 24 over substantially the entire length from the upstream end to the downstream end. The color resist 10 and the like before the change are removed along with the cleaning. The cleaning liquid reaching the downstream end of the liquid transport path 24 reaches the storage section 22 and the application section 21 via the connection section 26, and also cleans them. While the cleaning operation is being performed as described above, the operation of replacing the color resist supply source 27 containing the color resist 10 before the change with the color resist supply source 27 containing the color resist 10 after the change is performed.
After the cleaning operation was performed for a predetermined time, the purging operation was performed by feeding nitrogen gas under pressure. When the flushing operation is performed, as shown in fig. 5, the solenoid valve 39 provided in the cleaning liquid transport passage 24B and the solenoid valve 39 provided in the third main nitrogen pressure-feed passage 25a3 are opened in the switching unit 3, and the solenoid valve 39 provided in the cleaning liquid supply passage 32 is closed. In the second switching portion 36, the electromagnetic valve 39 provided in the common transport passage 24A and the electromagnetic valve 39 provided in the cleaning liquid transport passage 24B are opened, and the electromagnetic valve 39 provided in the color resist supply passage 31 is closed, oppositely. In the third switching unit 37, the solenoid valve 39 provided in the first main nitrogen pressure-feed passage 25a1 and the solenoid valve 39 provided in the second main nitrogen pressure-feed passage 25a2 are opened, and the solenoid valve 39 provided in the color resist supply source side nitrogen pressure-feed passage 33 is closed. In the fourth switching unit 38, the electromagnetic valve 39 provided in the second main nitrogen pressure-feed passage 25a2 and the electromagnetic valve 39 provided in the third main nitrogen pressure-feed passage 25A3 are opened, and the electromagnetic valve 39 provided in the cleaning liquid supply source side nitrogen pressure-feed passage 34 is closed. Thus, the nitrogen gas is pressure-fed from the first main nitrogen pressure-feeding passage 25a1 to the cleaning liquid transport passage 24B via the third switch 37, the second main nitrogen pressure-feeding passage 25a2, the fourth switch 38, the third main nitrogen pressure-feeding passage 25A3, and the switch 35. The nitrogen gas is pressure-fed from the cleaning liquid transport passage 24B to the common transport passage 24A via the second switching portion 36. Therefore, the liquid transport passage 24 is flushed with the pressurized nitrogen gas over substantially the entire length from the upstream end to the downstream end. With this rinsing, the color resist 10, the cleaning liquid 11, and the mixed liquid thereof before the change are effectively removed, and therefore the cleaning time in the cleaning operation performed before can be shortened. The nitrogen gas reaching the downstream end of the liquid transport passage 24 reaches the storage section 22 and the coating section 21 via the connection section 26, and also flushes them.
After the flushing operation of the nitrogen gas pressure feeding is performed for a predetermined time, the color resist 10 after the change is transported to the common transport path 24A, and the operation of extruding the residue in the common transport path 24A is performed. In the extrusion work, as shown in fig. 3, the switching portions 35 to 38 are in the same state as in the coating work of the color resist 10 described above. The color resist 10 after the change is transported from the color resist supply source 27 after the change to the common transport path 24A, and therefore the residue in the common transport path 24A is pushed out to the connection portion 26 side. At this time, the amount of the residue remaining in the common transport path 24A is greatly reduced with the flushing work performed before, and therefore, the working time taken for the extrusion work can be shortened. After the extrusion operation is performed for a predetermined time, the coating operation using the color resist 10 after the change is performed.
As described above, the color resist supply device (processing liquid supply device) 23 of the present embodiment includes: a liquid transport path 24 that transports the color resist (treatment liquid) 10 and the cleaning liquid 11; a liquid supply path 29 connected to the supply sources 27, 28 of the color resist 10 and the cleaning liquid 11; a nitrogen gas pressure feed passage (gas pressure feed passage) 25 for pressure-feeding nitrogen gas (gas); and a switching unit 35 connected to the liquid transport path 24, the liquid supply path 29, and the nitrogen gas pressure feed path 25, and switching at least the transport of the color resist 10 or the cleaning liquid 11 in the liquid transport path 24 and the pressure feed of the nitrogen gas.
The color resist 10 is transported from the color resist supply source 27 through the liquid supply path 29 and the switching portion 35 via the liquid transport path 24. On the other hand, when changing the color resist 10 or the like, for example, the cleaning liquid 11 is transported from the color resist supply source 27 to the liquid transport path 24 via the liquid supply path 29 and the switching portion 35, and therefore, cleaning of the liquid transport path 24 or the like can be performed. When cleaning is performed with the cleaning liquid 11, a long time is often required to prevent a mixed liquid of the cleaning liquid 11 and the color resist 10 from remaining in the liquid transportation path 24. In this regard, the switching unit 35 can be connected to the liquid transport path 24, the liquid supply path 29, and the nitrogen gas pressure feed path 25 to switch at least the transport of the color resist 10 or the cleaning liquid 11 in the liquid transport path 24 and the pressure feed of the nitrogen gas, and therefore, after the cleaning by the liquid transport path 24 of the cleaning liquid 11 is finished, the switching unit 35 may switch so that the nitrogen gas is pressure-fed from the nitrogen gas pressure feed path 25 to the liquid transport path 24. The nitrogen gas is pumped in the liquid transport path 24, and therefore the mixed liquid of the color resist 10 and the cleaning liquid 11 remaining in the liquid transport path 24 is effectively removed. Therefore, the cleaning time of the cleaning solution 11 and the squeezing time of the cleaning solution 11 of the color resist 10 after cleaning can be shortened. As described above, the time required to change the color resist 10 can be shortened.
In addition, the liquid supply passage 29 includes: a cleaning liquid supply path 32 connected to the liquid transport path 24 and the cleaning liquid supply source (supply source of cleaning liquid 11) 28; the color resist supply path 31 connected to the liquid transport path 24 and the color resist supply source (supply source of the color resist 10) 27, and the switching section 35 is connected to any one of the cleaning liquid supply path 32 and the color resist supply path 31. Thus, the cleaning liquid 11 is transported from the cleaning liquid supply source 28 to the liquid transport path 24 via the cleaning liquid supply path 32, and the color resist 10 is transported from the color resist supply source 27 to the liquid transport path 24 via the color resist supply path 31. The transport of the cleaning liquid 11 or the color resist 10 in the liquid transport path 24 and the pressure feed of the nitrogen gas can be switched by the switching section 35 connected to either one of the cleaning liquid supply path 32 and the color resist supply path 31. It is assumed that the time required for changing the color resist 10 and the like can be shortened as compared with a case where the cleaning liquid supply source 28 and the color resist supply source 27 are reconnected to one liquid supply path 29 every time the color resist 10 is changed and the like.
The cleaning liquid supply path 32 is connected to the switching unit 35, and the color resist supply path 31 is connected to the liquid transport path 24 on the downstream side of the switching unit 35. Thus, the cleaning liquid 11 is transported from the cleaning liquid supply source 28 to the upstream side of the color resist supply path 31 in the liquid transport path 24 via the cleaning liquid supply path 32 and the switching portion 35. Therefore, if the positional relationship between the cleaning liquid supply path 32 and the color resist supply path 31 is reversed, the liquid transport path 24 can be cleaned by the cleaning liquid 11 over a wider range, and the cleaning of the liquid transport path 24 can be performed efficiently.
In addition, the liquid transporting passage 24 includes: a common transport path 24A for transporting the color resist 10 and the cleaning liquid 11; a cleaning liquid transport path 24B for transporting the cleaning liquid 11, and a second switching unit 36 connected to the color resist supply path 31, the cleaning liquid transport path 24B, and the common transport path 24A, the second switching unit 36 switching between the transport of the color resist 10 in the common transport path 24A, the transport of the cleaning liquid 11, and the pressure feed of nitrogen gas. In this way, the color resist 10 is transported from the color resist supply source 27 to the common transport path 24A via the color resist supply path 31 and the second switching portion 36. On the other hand, when the wash liquid transport passage 24 is switched by the second switching portion 36, the wash liquid 11 is transported from the wash liquid supply source 28 to the wash liquid transport passage 24B via the wash liquid supply passage 32 and the switching portion 35. The wash liquid 11 transported to the wash liquid transport passage 24B is transported to the common transport passage 24A via the second switch 36. Therefore, the common transport passage 24A and the washing liquid transport passage 24B included in the liquid transport passage 24 are washed by the washing liquid 11. After the cleaning of the liquid transport path 24, the switching of the switching section 35 is performed, and therefore the nitrogen gas is pressure-fed from the nitrogen gas pressure-feeding path 25 to the cleaning liquid transport path 24B. The nitrogen gas pressure-fed to the cleaning liquid transport passage 24B is pressure-fed to the common transport passage 24A via the second switching portion 36. Therefore, the mixed liquid of the color resist 10 and the cleaning liquid 11 remaining in the common transport path 24A and the cleaning liquid transport path 24B included in the liquid transport path 24 is efficiently removed by the nitrogen gas which is pumped.
Further, the nitrogen pressure feed passage 25 includes: a main nitrogen gas pressure-feed passage (main gas pressure-feed passage) 25A connected to the switching portion 35; a supply source side nitrogen gas pressure feed passage (supply source side gas pressure feed passage) 30 connected to the main nitrogen gas pressure feed passage 25A, the color resist 10, or the cleaning liquid supply source 28. Thus, the nitrogen gas pressure-fed to the main nitrogen gas pressure-feeding passage 25A is pressure-fed to the liquid transport passage 24 via the switching section 35, or is pressure-fed to the color resist 10 or the cleaning liquid supply source 28 via the supply source side nitrogen gas pressure-feeding passage 30. Since the nitrogen gas is pressure-fed to the nitrogen gas pressure-feed passage 30 on the supply source side, the color resist 10 or the cleaning liquid 11 is supplied from the supply source to the liquid supply passage 29. Since the configuration for the pressurized feeding of nitrogen gas is simplified as compared with the case where the main nitrogen pressurized-feeding passage 25A and the supply source side nitrogen pressurized-feeding passage 30 are not connected, it is suitable for the cost reduction.
In addition, the liquid supply passage 29 includes: a cleaning liquid supply passage 32 connected to the liquid transport passage 24 and the cleaning liquid supply source 28; a color resist supply path 31 connected to the liquid transport path 24 and the color resist supply source 27, the supply source side nitrogen gas pressure-feed path 30 including: a cleaning liquid supply source-side nitrogen pressure-feed passage (cleaning liquid supply source-side air pressure-feed passage) 34 connected to the cleaning liquid supply source 28 and the main nitrogen pressure-feed passage 25A; and a color resist supply source side nitrogen gas pressure-feed passage (process liquid supply source side gas pressure-feed passage) 33 connected to the color resist supply source 27 and the upstream side or the downstream side of the main nitrogen gas pressure-feed passage 25A with respect to the cleaning liquid supply source side nitrogen gas pressure-feed passage 34. Thus, the nitrogen gas pressure-fed to the main nitrogen gas pressure-feed passage 25A is pressure-fed to the cleaning liquid supply source 28 via the cleaning liquid supply source side nitrogen gas pressure-feed passage 34, or is pressure-fed to the color resist supply source 27 via the color resist supply source side nitrogen gas pressure-feed passage 33. The nitrogen gas is pressure-fed to the cleaning liquid supply source side nitrogen gas pressure-feeding passage 34, so that the cleaning liquid 11 is supplied from the supply source to the cleaning liquid supply passage 32, and the nitrogen gas is pressure-fed to the color resist supply source side nitrogen gas pressure-feeding passage 33, so that the color resist 10 is supplied from the supply source to the color resist supply passage 31.
Further, the main nitrogen pressure-feeding passage 25A includes, in order from the upstream side: a first main nitrogen gas pressure-feed passage (first main gas pressure-feed passage) 25a1 connected to one of the cleaning liquid supply source-side nitrogen gas pressure-feed passage 34 and the color resist supply source-side nitrogen gas pressure-feed passage 33; a second main nitrogen gas pressure-feed passage (second main gas pressure-feed passage) 25a2 connected to the other of the cleaning liquid supply source-side nitrogen gas pressure-feed passage 34 and the color resist supply source-side nitrogen gas pressure-feed passage 33; a third main nitrogen pressure-feed passage (third main gas pressure-feed passage) 25A3 connected to the switching unit 35, and a third switching unit 37 connected to the one main nitrogen pressure-feed passage, the first main nitrogen pressure-feed passage 25a1, and the second main nitrogen pressure-feed passage 25a2, and switching between pressure-feed of nitrogen gas in the one main nitrogen pressure-feed passage and pressure-feed of nitrogen gas in the second main nitrogen pressure-feed passage 25a 2; and a fourth switching unit 38 connected to the other, second main nitrogen pressure-feed passage 25a2, and third main nitrogen pressure-feed passage 25A3 to switch between pressure-feed of nitrogen gas in the other and pressure-feed of nitrogen gas in the third main nitrogen pressure-feed passage 25 A3. In this way, the nitrogen gas is pressure-fed to the first main nitrogen pressure-feeding passage 25A1, the second main nitrogen pressure-feeding passage 25A2, and the third main nitrogen pressure-feeding passage 25A3 constituting the main nitrogen pressure-feeding passage 25A, and then is pressure-fed to the liquid transport passage 24 via the switching unit 35. On the other hand, when the pressure feeding of the nitrogen gas is switched by the third switching unit 37, the nitrogen gas is pressure-fed from the first main nitrogen gas pressure-feeding passage 25a1 to one of the cleaning liquid supply source side nitrogen gas pressure-feeding passage 34 and the color resist supply source side nitrogen gas pressure-feeding passage 33, and reaches the supply source of one of the cleaning liquid 11 and the color resist 10. Further, when the pressure feeding of the nitrogen gas is switched by the fourth switching portion 38, the nitrogen gas is pressure-fed from the second main nitrogen gas pressure-feeding passage 25a2 to the other of the cleaning liquid supply source side nitrogen gas pressure-feeding passage 34 and the color resist supply source side nitrogen gas pressure-feeding passage 33, and reaches the other of the cleaning liquid 11 and the color resist 10. As described above, the pressure feeding of the nitrogen gas to the liquid transport path 24, the pressure feeding of the nitrogen gas to the cleaning liquid supply source 28, and the pressure feeding of the nitrogen gas to the color resist supply source 27 can be appropriately switched by the third switching unit 37 and the fourth switching unit 38.
In addition, nitrogen gas is fed under pressure as a gas in the nitrogen gas pressure feed passage 25. By using chemically stable and inexpensive nitrogen gas as the gas, the inside of the liquid transport passage 24 can be appropriately flushed, and cost reduction can be suitably achieved.
In addition, in the liquid transport passage 24, the color resist 10 is transported as a processing liquid. When the color resist 10 as the processing liquid is changed to a different color, the liquid transport path 24 is cleaned by the cleaning liquid 11, and then flushed by the pressure of nitrogen gas, so that the color mixing of the color resist 10 can be prevented in a short time.
< second embodiment >
A second embodiment of the present invention is explained with reference to fig. 6 to 8. In the second embodiment, the color resist supply source 127 is replaced with the second cleaning liquid supply source 40. Note that, with respect to the same configuration, operation, and effect as those of the first embodiment, redundant description is omitted.
As shown in fig. 6, in the color resist supply apparatus 123 according to the present embodiment, the color resist supply source 127 can be replaced with the second cleaning liquid supply source 40. The second cleaning liquid supply source 40 contains a second cleaning liquid 12 different from the cleaning liquid 111 in the cleaning liquid supply source 128. In the present embodiment, when the color resist 110 after the change is different from the color resist 110 before the change in combination, etc., it is difficult to efficiently clean the color resist 110 after the change with only one type of cleaning liquid 111, and at this time, a second cleaning liquid 12 different from the combination of the cleaning liquid 111, etc. is used in combination. When the color resist supply source 127 is replaced with the second cleaning liquid supply source 40, the color resist supply passage 131 serves as the second cleaning liquid supply passage 41 for supplying the second cleaning liquid 12, and the color resist supply source side nitrogen pressure-feed passage 133 serves as the second cleaning liquid supply source side nitrogen pressure-feed passage 42 for pressure-feeding nitrogen to the second cleaning liquid supply source 40 (see fig. 7).
A specific operation sequence is described. When the color of the color resist 110 is changed, a cleaning operation is performed as shown in fig. 6. The cleaning operation is as described in the first embodiment. During this cleaning operation, the operation of replacing the color resist supply source 127 of the color resist 110 before the change with the second cleaning liquid supply source 40 is performed. Therefore, the work time required for replacing the color resist supply source 127 and the second cleaning liquid supply source 40 includes the work time required for the cleaning work, and the increase in the overall work time is avoided. After the cleaning operation is completed, a second cleaning operation of the second cleaning liquid 12 is performed. When the second cleaning operation is performed, as shown in fig. 7, the electromagnetic valve provided in the common transport passage 124A and the electromagnetic valve provided in the second cleaning liquid supply passage 41 are opened, and the electromagnetic valve provided in the cleaning liquid transport passage 124B is closed, as opposed to each other, in the second switching portion 136. On the other hand, in the third switching unit 137, the electromagnetic valve provided in the first main nitrogen pressure-feeding passage 125a1 and the electromagnetic valve provided in the second cleaning liquid supply source-side nitrogen pressure-feeding passage 42 are opened, and the electromagnetic valve provided in the second main nitrogen pressure-feeding passage 125a2 is closed. Thus, the nitrogen gas is pressure-fed from the first main nitrogen gas pressure-feeding passage 125a1 to the second cleaning liquid supply source-side nitrogen gas pressure-feeding passage 42 via the third switching section 137, and therefore the second cleaning liquid 12 in the second cleaning liquid supply source 40 is fed into the second cleaning liquid supply passage 41 by the pressure-fed nitrogen gas. The second cleaning liquid 12 fed out of the second cleaning liquid supply path 41 is transported into the common transport path 124A via the second switching unit 136. Therefore, the inside of the common transport path 124A is cleaned by the second cleaning liquid 12, and thus the color resist 110 is cleaned/removed more efficiently in conjunction with the cleaning operation of the cleaning liquid 111 performed before. The open/close state of each of the solenoid valves constituting the switching unit 135 and the fourth switching unit 138 may be set as appropriate, but all of the solenoid valves may be closed, for example. Thereafter, as shown in fig. 8, during the flushing operation in which the pressurized supply of nitrogen gas is performed, the second cleaning liquid supply source 40 is replaced with the color resist supply source 127 including the color resist 110 after the change. Therefore, the time required for replacing the second cleaning liquid supply source 40 and the color resist supply source 127 is included in the time required for the rinsing operation, and the overall time is not increased. The flushing operation is as described in the first embodiment.
As described above, according to the present embodiment, in the configuration in which the color resist supply source 127 can be replaced with the second cleaning liquid supply source 40, the liquid supply passage 129 includes the second cleaning liquid supply passage 41 or the color resist supply passage 131 connected to the liquid transport passage 124 and the second cleaning liquid supply source 40 in addition to the cleaning liquid supply passage 132. In this way, for example, when the color resist 110 is changed, the color resist supply source 127 can be replaced with the second cleaning liquid supply source 40. The second cleaning liquid 12 is transported from the second cleaning liquid supply source 40 to the liquid transportation path 124 via the second cleaning liquid supply path 41, and thus the liquid transportation path 124 is cleaned. As described above, since the second cleaning liquid 12 is selected according to the type of the color resist 110 after the cleaning of the liquid conveyance path 124 is performed by the cleaning liquid 111 and the second cleaning liquid 12, the cleaning of the liquid conveyance path 124 can be performed more efficiently.
< third embodiment >
A third embodiment of the present invention is explained with reference to fig. 9. In the third embodiment, the nitrogen pressure-feed passage 225 is configured as a dual system in the first embodiment described above. Note that, with respect to the same configuration, operation, and effect as those of the first embodiment, redundant description is omitted.
As shown in fig. 9, the nitrogen gas pressure-feed passage 225 according to the present embodiment is configured by a first nitrogen gas pressure-feed passage 43 and a second nitrogen gas pressure-feed passage 44, the upstream end side of the first nitrogen gas pressure-feed passage 43 is connected to the connection portion 226, the downstream end side is connected to the third switching portion 237, the upstream end side of the second nitrogen gas pressure-feed passage 44 is connected to the connection portion 226, and the downstream end side is connected to the switching portion 235. The first nitrogen gas pressure-feeding passage 43 is connected to the color resist supply source side nitrogen gas pressure-feeding passage 233 and the cleaning liquid supply source side nitrogen gas pressure-feeding passage 234 via a third switching unit 237, and can selectively pressure-feed nitrogen gas to the color resist supply source side nitrogen gas pressure-feeding passage 233 and the cleaning liquid supply source side nitrogen gas pressure-feeding passage 234 according to the switching state of the third switching unit 237. With the above-described configuration, the fourth switching unit described in the first embodiment is omitted in the present embodiment. In contrast, the second nitrogen gas pressure feeding passage 44 is connected to the cleaning liquid transport passage 224B constituting the liquid transport passage 224 via the switching portion 235, and can pressure-feed nitrogen gas to the cleaning liquid transport passage 224B in accordance with the switching state of the switching portion 235. Even with the above-described configuration, the same operation and effect as those of the first embodiment can be obtained.
< other embodiment >
The present invention is not limited to the embodiments described above and illustrated in the drawings, and for example, the following embodiments are also included in the technical scope of the present invention.
(1) In the above embodiments, the case where the upstream side of the liquid transport path is connected to the cleaning liquid supply path via the switching portion and the downstream side is connected to the color resist supply path via the second switching portion has been described, but the upstream side of the liquid transport path may be connected to the color resist supply path via the switching portion and the downstream side may be connected to the cleaning liquid supply path via the second switching portion.
(2) In the first and second embodiments, the upstream side of the main nitrogen gas pressure-feeding passage is connected to the color resist supply source side nitrogen gas pressure-feeding passage via the third switching unit, and the downstream side is connected to the cleaning liquid supply source side nitrogen gas pressure-feeding passage via the fourth switching unit.
(3) In the above embodiments, the configuration in which each switching unit is constituted by three electromagnetic valves is exemplified, but the specific configuration of each switching unit can be appropriately changed.
(4) In the above embodiments, the cleaning operation and the rinsing operation are performed when the color resist supply source is replaced, but the cleaning operation and the rinsing operation may be performed when the color resist supply source is replaced, for example, when the color resist transportation path needs to be cleaned.
(5) In the second embodiment, the second cleaning liquid supply source and the color resist supply source are replaced, but a configuration may be adopted in which the color resist supply source, the cleaning liquid supply source, and the second cleaning liquid supply source are connected to the color resist supply apparatus in parallel. Further, three or more cleaning liquid supply sources may be connected in parallel to the color resist supply device.
(6) In the third embodiment, the first nitrogen gas pressure-feeding passage is connected to the color resist supply source side nitrogen gas pressure-feeding passage and the cleaning liquid supply source side nitrogen gas pressure-feeding passage via the third switching section, but the first nitrogen gas pressure-feeding passage may be a dual system in which one is connected to the color resist supply source side nitrogen gas pressure-feeding passage and the other is connected to the cleaning liquid supply source side nitrogen gas pressure-feeding passage. At this time, the third switching portion may be eliminated.
(7) In the above embodiments, the color resist supply source and the cleaning solution supply source are connected in parallel to the color resist supply device, but the color resist supply source and the cleaning solution supply source may be selectively connected to the color resist supply device. When the cleaning operation is performed, the operation of replacing the color resist supply device and the cleaning liquid supply source may be performed. In this case, the second switching unit can be eliminated.
(8) In the above embodiments, the nitrogen gas is fed under pressure, but a gas other than nitrogen gas may be fed under pressure.
(9) In the above embodiments, the case where the same three-color resists are used for forming the color filters of three colors of red, green, and blue on the CF substrate has been exemplified, but when forming the color filters of colors other than the three colors, it is obvious that a color resist of a color other than the three colors can be used. In this case, the number of colors of the color resist may be four or more, or two or less.
(10) In the above embodiments, the case where the color resist is used as the processing liquid is described, but it is obvious that other types of processing liquids may be used. For example, in an array substrate constituting a liquid crystal panel, a photosensitive resin solution used for forming the insulating film for insulating between conductive films or planarizing a surface may be used as a treatment liquid. In addition, in the CF substrate constituting the liquid crystal panel, a photosensitive resin solution used for forming an insulating film for planarizing the surface may be used as the treatment liquid.
(11) In the above embodiments, the cleaning liquid is a solvent such as a diluent, but it is obvious that a solvent other than a diluent can be used as the cleaning liquid.
Description of the reference numerals
10. 110 … color resist (treatment liquid); 11. 111 … washing liquid; 12 … a second cleaning solution; 23. 123 … color resist supply means (treatment liquid supply means); 24. 124, 224 … liquid transport channels; 24A, 124A … share a common transport channel; 24B, 124B, 224B … wash the liquid transport channels; 25. 225 … nitrogen gas pressure feed passage (gas pressure feed passage); 25a … main nitrogen pressure feed passage (main gas pressure feed passage); 25a1, 125a1 … first main nitrogen pressure feed passage (first main gas pressure feed passage); 25a2, 125a2 … second main nitrogen pressure-feed passage (second main gas pressure-feed passage); 25a3 … third main nitrogen pressure-feed passage (third main gas pressure-feed passage); 27. 127 … color resist supply source (supply source of color resist 10); 28. 128 … cleaning liquid supply source (supply source of cleaning liquid 11); 29. 129 … liquid supply channel; 30 … supply source side nitrogen gas pressure feed passage (supply source side gas pressure feed passage); 31. 131 … color resist supply channel; 32. 132 … cleaning liquid supply path; 33. 133, 233 … color resist supply source side nitrogen gas pressure feed passages (process liquid supply source side gas pressure feed passages); 34. 234 … cleaning liquid supply source side nitrogen gas pressure feed passage (cleaning liquid supply source side gas pressure feed passage); 35. 135, 235 … switching parts; 36. 136 … a second switching part; 37. 137, 237 …; 38. 138 … fourth switching part; 40 … a second cleaning solution supply source; 41 … second washing liquid supply passage.
Claims (10)
1. A treatment liquid supply apparatus, comprising:
a liquid transport passage that transports the treatment liquid and the cleaning liquid;
a liquid supply channel connected to a supply source of the treatment liquid and the cleaning liquid;
a gas pressure feed passage for pressure-feeding gas;
and a switching unit connected to the liquid transport path, the liquid supply path, and the gas pressure-feed path, and configured to switch at least between the transport of the treatment liquid or the cleaning liquid in the liquid transport path and the pressure-feed of the gas.
2. The treatment liquid supply apparatus according to claim 1,
the liquid supply path includes a cleaning liquid supply path connected to the liquid transport path and the supply source of the cleaning liquid, and a treatment liquid supply path connected to the liquid transport path and the supply source of the treatment liquid,
the switching portion is connected to any one of the washing liquid supply passage and the treatment liquid supply passage.
3. The treatment liquid supply apparatus according to claim 2,
the cleaning liquid supply passage is connected to the switching portion, and the treatment liquid supply passage is connected to a downstream side of the liquid transport passage from the switching portion.
4. The treatment liquid supply apparatus according to claim 3,
the liquid transport path includes a common transport path that transports the treatment liquid and the washing liquid, and a washing liquid transport path that transports the washing liquid,
the processing liquid supply apparatus further includes a second switching unit connected to the processing liquid supply path, the cleaning liquid transport path, and the common transport path, and configured to switch between transport of the processing liquid and transport of the cleaning liquid in the common transport path, or pressure feed of the gas.
5. The treatment liquid supply apparatus according to any one of claims 2 to 4,
in the configuration in which the supply source of the processing liquid may be replaced with a supply source of a second cleaning liquid, the liquid supply path may include a second cleaning liquid supply path connected to the liquid transport path and the supply source of the second cleaning liquid or the processing liquid supply path in addition to the cleaning liquid supply path.
6. The treatment liquid supply apparatus according to any one of claims 1 to 4,
the gas pressure-feed path includes a main gas pressure-feed path connected to the switching unit, and a supply-source-side gas pressure-feed path connected to the main gas pressure-feed path and a supply source of the treatment liquid or the cleaning liquid.
7. The treatment liquid supply apparatus according to claim 6,
the liquid supply passage includes: a cleaning liquid supply path connected to the liquid transport path and the supply source of the cleaning liquid, and a treatment liquid supply path connected to the liquid transport path and the supply source of the treatment liquid,
the supply source side gas pressure feed passage includes: a cleaning liquid supply source-side gas pressure-feed passage connected to the cleaning liquid supply source and the main gas pressure-feed passage, and a treatment liquid supply source-side gas pressure-feed passage connected to one of the treatment liquid supply source and the main gas pressure-feed passage on an upstream side or a downstream side of the cleaning liquid supply source-side gas pressure-feed passage.
8. The treatment liquid supply apparatus according to claim 7,
the main gas pressure delivery passage includes, in order from the upstream side: a first main gas pressure-feed passage connected to one of the cleaning liquid supply source-side gas pressure-feed passage and the treatment liquid supply source-side gas pressure-feed passage, a second main gas pressure-feed passage connected to the other of the cleaning liquid supply source-side gas pressure-feed passage and the treatment liquid supply source-side gas pressure-feed passage, and a third main gas pressure-feed passage connected to the switching section,
the treatment liquid supply device further includes a third switching portion and a fourth switching portion,
the third switching unit is connected to one of the cleaning liquid supply source-side gas pressure-feed passage and the treatment liquid supply source-side gas pressure-feed passage, the first main gas pressure-feed passage, and the second main gas pressure-feed passage, and switches between pressure-feed of the gas in the one and pressure-feed of the gas in the second main gas pressure-feed passage,
the fourth switching unit is connected to the other of the cleaning liquid supply source-side gas pressure-feed passage and the treatment liquid supply source-side gas pressure-feed passage, the second main gas pressure-feed passage, and the third main gas pressure-feed passage, and switches between pressure-feed of the gas in the other and pressure-feed of the gas in the third main gas pressure-feed passage.
9. The treatment liquid supply apparatus according to any one of claims 1 to 4 and 7 to 8, wherein the gas pressure feed passage is configured to pressure feed nitrogen gas as the gas.
10. The treatment liquid supply apparatus according to any one of claims 1 to 4 and 7 to 8,
the liquid transport passage transports a color resist as the processing liquid.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201862692459P | 2018-06-29 | 2018-06-29 | |
| US62/692459 | 2018-06-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110653131A true CN110653131A (en) | 2020-01-07 |
Family
ID=69028644
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910471689.9A Pending CN110653131A (en) | 2018-06-29 | 2019-05-31 | Processing liquid supply device |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP6752938B2 (en) |
| CN (1) | CN110653131A (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11169775A (en) * | 1997-12-10 | 1999-06-29 | Sony Corp | Resist coating apparatus |
| JP5163256B2 (en) * | 2008-04-22 | 2013-03-13 | 凸版印刷株式会社 | Coating liquid supply apparatus and coating liquid supply method using the same |
| WO2015136872A1 (en) * | 2014-03-10 | 2015-09-17 | 株式会社Ｓｃｒｅｅｎホールディングス | Substrate processing system and tubing cleaning method |
| TW201703876A (en) * | 2015-07-31 | 2017-02-01 | 思可林集團股份有限公司 | Coating apparatus and coating method preventing the waste coating solution from leaking out of the nozzle when the coating solution is stored in the nozzle |
| CN106694446A (en) * | 2017-03-01 | 2017-05-24 | 上海国舜化工设备有限公司 | Full-automatic clean-in-place machine |
| CN107051815A (en) * | 2017-03-27 | 2017-08-18 | 广州金田瑞麟净化设备制造有限公司 | A kind of glue spreader of framed filter |
-
2019
- 2019-05-31 CN CN201910471689.9A patent/CN110653131A/en active Pending
- 2019-06-14 JP JP2019110835A patent/JP6752938B2/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11169775A (en) * | 1997-12-10 | 1999-06-29 | Sony Corp | Resist coating apparatus |
| JP5163256B2 (en) * | 2008-04-22 | 2013-03-13 | 凸版印刷株式会社 | Coating liquid supply apparatus and coating liquid supply method using the same |
| WO2015136872A1 (en) * | 2014-03-10 | 2015-09-17 | 株式会社Ｓｃｒｅｅｎホールディングス | Substrate processing system and tubing cleaning method |
| TW201703876A (en) * | 2015-07-31 | 2017-02-01 | 思可林集團股份有限公司 | Coating apparatus and coating method preventing the waste coating solution from leaking out of the nozzle when the coating solution is stored in the nozzle |
| CN106694446A (en) * | 2017-03-01 | 2017-05-24 | 上海国舜化工设备有限公司 | Full-automatic clean-in-place machine |
| CN107051815A (en) * | 2017-03-27 | 2017-08-18 | 广州金田瑞麟净化设备制造有限公司 | A kind of glue spreader of framed filter |
Also Published As
| Publication number | Publication date |
|---|---|
| JP6752938B2 (en) | 2020-09-09 |
| JP2020004961A (en) | 2020-01-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US10268116B2 (en) | Processing liquid supplying apparatus and method of supplying processing liquid | |
| US4375865A (en) | Color change system for spray coating apparatus | |
| US4337282A (en) | Color change system for spray coating apparatus | |
| DE102014225053A1 (en) | Process fluid supply device, process fluid supply process and storage medium | |
| JP2004363292A (en) | Liquid feeder and board treating system | |
| KR102281631B1 (en) | Processing liquid supply apparatus, device unit, processing liquid supply method and recording medium | |
| TWI311078B (en) | ||
| CN110653131A (en) | Processing liquid supply device | |
| CN109427620B (en) | Pump device, processing liquid supply device, substrate processing device, liquid discharge method, and liquid replacement method | |
| US20080041488A1 (en) | Fluid dispensing system for semiconductor manufacturing processes with self-cleaning dispense valve | |
| JP2000323813A (en) | Substrate treatment unit | |
| CN102484064B (en) | Apparatus and methods for enhanced fluid delivery on bevel etch applications | |
| CN111188026A (en) | Gas processing system, gas processing method and atomic layer deposition equipment | |
| KR100497276B1 (en) | A solution supply method and chemical solution supply apparatus in use the process of semiconductor manufacturing | |
| JPS63110636A (en) | Chemical treating system | |
| CN114103473B (en) | Ink jet printing apparatus and ink jet printing method | |
| JPH0521329A (en) | Resist coating device | |
| WO2016114266A1 (en) | Block valve and block valve for raw material container | |
| KR20200072222A (en) | Bottle, Apparatus and method for treating substrate | |
| JP2003181334A (en) | Liquid feeder | |
| JP2011016047A (en) | Liquid discharge apparatus | |
| KR102156486B1 (en) | Cleaning liquid cartridge and cleaning method using the cleaning liquid cartridge | |
| JPH11216401A (en) | Coating device | |
| CN117048201A (en) | Glaze spraying control method based on glaze spraying equipment, glaze spraying controller and glaze spraying system | |
| JPH06121960A (en) | Resin supply device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20200107 |
|
| WD01 | Invention patent application deemed withdrawn after publication |