CN101254495B - Conveying coating apparatus of substrate - Google Patents
Conveying coating apparatus of substrate Download PDFInfo
- Publication number
- CN101254495B CN101254495B CN2008100063927A CN200810006392A CN101254495B CN 101254495 B CN101254495 B CN 101254495B CN 2008100063927 A CN2008100063927 A CN 2008100063927A CN 200810006392 A CN200810006392 A CN 200810006392A CN 101254495 B CN101254495 B CN 101254495B
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- Prior art keywords
- substrate
- conveying mechanism
- conveying
- coating apparatus
- workbench
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
- B05B1/005—Nozzles or other outlets specially adapted for discharging one or more gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Coating Apparatus (AREA)
Abstract
The invention provides a conveyance coating device for substrates. A processed substrate (W1) is kept by the pad of a conveying mechanism (14), a substrate (W2) is kept by the pad of a conveying mechanism (13), the conveying mechanisms move rightwards in the view, the processed substrate (W1) is floatingly conveyed to a joint position, the unprocessed substrate (W2) is floatingly conveyed to a coating processing part. During the coating processing part coats coating liquid on the surface of the unprocessed substrate (W2), the conveying mechanism (14) returns to a calibration position to keep a next unprocessed substrate (W3). The conveying mechanism (13) conveys the coated substrate (W2) to a substrate output part, the conveying mechanism (14) conveys the unprocessed substrate (W3) to the coating processing part. The conveying mechanisms move rightwards in the view, the processed substrate (W2) is floatingly conveyed to the joint position, the unprocessed substrate (W3) is floatingly conveyed to the coating processing part.
Description
Technical field
The present invention relates on one side substrate floating such as glass substrate carried on one side device at upper surface of base plate coating coating fluid.
Background technology
As device at the coating fluids such as surface coated resist of glass substrate; The device that following type is arranged: promptly; Glass substrate is absorbed and fixed on the workbench; The travelling slit nozzle is fixed to the device of the type of glass substrate upper surface curtain shape ground supply coating fluid and with gap nozzle from gap nozzle on one side above this glass substrate on one side, and thereunder moves the device of the type of glass substrate.
In patent documentation 1, disclose and be provided with substrate along the throughput direction that substrate floating is carried and move into the conveying coating apparatus that portion, coated portion and substrate are taken out of portion.This conveying coating apparatus disposes the substrate carrying mechanism that is made up of absorption layer at the ejection air with the both sides of the microscope carrier (workbench) of substrate floating movably, carries with the state of the both sides of having adsorbed substrate.
Following device has been proposed as substrate floating being carried the device that coating fluid is coated on upper surface of base plate on one side on one side in patent documentation 2; Promptly; The first substrate delivery section and the second substrate delivery section are set; Through first delivery section substrate is delivered to coated portion from the substrate delivery section, under the state of the both sides that kept substrate with the first substrate delivery section and the second substrate delivery section, is coated with, after coating finishes through coated portion; The first substrate delivery section is back to initial position, utilizes substrate after the second substrate delivery section will be coated with to be delivered to substrate from coated portion and takes out of portion.
Patent documentation 1: TOHKEMY 2005-243670 communique
Patent documentation 2: TOHKEMY 2006-237482 communique
In patent documentation 1; Dispose the substrate carrying mechanism that constitutes by absorption layer etc. movably in the both sides of microscope carrier (workbench); But for the both sides that the substrate carrying mechanism about passing through keeps glass substrate, carry then/be coated with, if about the mobile of substrate carrying mechanism carry out not exclusively synchronously; Then crooked in the glass substrate generation, this becomes the even reason of crawling.
In patent documentation 2, when carrying out coated, its be through about conveying mechanism keep the structure of the both sides of glass substrate, therefore also take place and above-mentioned same problem.
In addition; In patent documentation 2, in the coated be with patent documentation 1 likewise, about whole conveying mechanisms all adsorb glass substrate; Therefore conveying mechanism can not move by oneself, for example can not carry out moving and being back to moving of starting position to the opposite direction with the moving direction of glass substrate.Can not shorten for this reason and produce blanking time.
Summary of the invention
In order to solve above-mentioned problem; The conveying coating apparatus of a kind of substrate that the present invention relates to; This conveying coating apparatus is to have disposed substrate continuously and moved into the conveying coating apparatus that portion, coated portion and substrate are taken out of the substrate of portion along the throughput direction of substrate; Striding across aforesaid substrate delivery section, coated portion and substrate takes out of the whole of portion and disposes workbench; This workbench has formed the air squit hole that is used for substrate floating at upper surface; The conveying mechanism that one side of the substrate that has only kept floating is carried can independently respectively set in the both sides of above-mentioned workbench movably, and each conveying mechanism moves into through aforesaid substrate that portion, coated portion and the substrate portion of taking out of carry continuously with a plate base and not to other conveying mechanism handing-over.
It can constitute, in above-mentioned coated portion, and with the throughput direction of substrate mutually the direction of quadrature be equipped with the gap nozzles of two independent controls.Thus, can alternately or continuously be coated with different coating fluids through an apparatus for coating.
In addition; A kind of conveying coating process; This conveying coating process has used above-mentioned apparatus for coating; About travel mechanism in travel mechanism keep a side of substrate and carry out coated during, another travel mechanism is avoided and the interference that just is being applied the substrate of processing, move and return the starting position to opposite direction simultaneously with the throughput direction of substrate.
According to the present invention; Owing to when coating, only keep a side of substrate; Therefore do not produce as patent documentation 1 and patent documentation 2 are disclosed when having kept the both sides of substrate by conveying mechanism, owing to about conveying mechanism the time the caused substrate of deviation crooked.
In addition, the conveying mechanism of both sides is can be respectively independent moves and because each conveying mechanism is moved into portion, coated portion and the substrate portion of taking out of with a plate base through substrate carries, produces blanking time thereby can shorten significantly.
Description of drawings
Fig. 1 is the vertical view of the conveying coating apparatus of the substrate that the present invention relates to.
Fig. 2 is the front view of this conveying coating apparatus.
Fig. 3 is the side view of this conveying coating apparatus.
(a)～(c) of Fig. 4 is the vertical view of explanation coating process.
Fig. 5 is the side view that returns operation of expression conveying mechanism.
Fig. 6 is the front view that the expression nozzle moves to the state of position of readiness.
Fig. 7 is the vertical view of other state of expression conveying coating apparatus.
Fig. 8 is the vertical view that other state of coating process is carried in expression.
Symbol description: 1,5,6 ... Workbench; 2,7 ... Elevating mechanism; 3,8 ... Pin; 4 ... Calibrating installation; 11,12 ... Track; 13,14 ... Conveying mechanism; 13a, 14a ... Absorption layer; 16 ... Door type frame; 17 ... Gap nozzle; 18 ... Management devices; 19 ... Travel mechanism; S1 ... Substrate is moved into portion; S2 ... Coated portion; S3 ... Substrate is taken out of portion; W1, W2, W3 ... Substrate.
The specific embodiment
Below, based on accompanying drawing most preferred embodiment of the present invention is described.Fig. 1 is the vertical view of the conveying coating apparatus of the substrate that the present invention relates to, and Fig. 2 is the front view of this conveying coating apparatus, and Fig. 3 is the side view of this conveying coating apparatus.
Conveying coating apparatus disposes substrate continuously along the throughput direction of substrate and moves into the S1 of portion, the S2 of coated portion and substrate and take out of the S3 of portion.Substrate is moved into the S1 of portion and is provided with at upper surface and has formed the workbench 1 that is used for the air squit hole of substrate floating, and below this workbench 1, is provided with the elevating mechanism 2 that is used for substrate delivery/reception to workbench 1.This elevating mechanism 2 possesses and runs through workbench 1 and front end is projected into the pin 3 of workbench 1 top.In addition, though pin 3 can be from the structure of the blank gas of the portion of running through for running through workbench 1.In addition, be provided with the calibrating installation 4 of substrate at the sidepiece of workbench 1.
In addition, the S2 of coated portion is provided with upper surface and has formed the workbench 5 that is used for the air squit hole of substrate floating.Except forming the air squit hole, also be formed with air attraction hole on this workbench 5.The amount of floating of substrate is 50～300 μ m in above-mentioned workbench 1, yet in order to improve the flatness of substrate W in the S2 of coated portion, thereby float that to measure be below the 50 μ m.For this reason,, also be formed uniformly the space and attract the hole through just not being formed uniformly the air squit hole, the balance that obtains ejection and attract, and the amount of floating of substrate is below 50 μ m and be in certain.
Substrate take out of be provided with also on the S3 of portion that upper surface formed the air squit hole that is used to make substrate floating workbench 6 arranged, below this workbench 6, be provided with elevating mechanism 7, be used for further substrate being lifted from workbench 6 and be handover to next process.This elevating mechanism 7 also possesses pin 8.
Move into the S1 of portion, the S2 of coated portion and substrate at aforesaid substrate and take out of the both sides of the workbench 1,5,6 of the S3 of portion and be provided with track 11,12, on this track 11, engaging movably has conveying mechanism 13, and on this track 12, engaging movably has conveying mechanism 14.
Above-mentioned conveying mechanism 13,14 moves with contactless state through linear motor in orbit, and possesses absorption layer 13a, the 14a of the side lower surface that keeps substrate.This absorption layer 13a, 14a can adjust height and position, and that kind that is described below is in order to return under Light Condition, and the interference of the substrate W in avoiding and handling is returned with the state that has descended.
In addition, on the S2 of coated portion, liftably dispose a type frame 16 with the mode that strides across workbench 5.With gap nozzle 17 with the throughput direction of lower end ejiction opening and substrate mutually the mode of quadrature be installed on this type frame 16.
In addition, on the S2 of coated portion, be provided with management devices 18, be used to carry out the management of the lower end ejiction opening of gap nozzle 17 with the mode that strides across workbench 5.This management devices 18 possesses cleaning part, and it is used to carry out the cleaning of the lower end ejiction opening of gap nozzle 17; With allocate portion etc. in advance.
The door type frame 16 of gap nozzle 17 and the relation of management devices 18 have been installed is, a door type frame 16 is positioned at than management devices 18 more in the outer part.And door type frame 16 is movable to and overlooks down the position that overlaps with management devices 18 through the travel mechanism 19 of ball screw etc. is housed.
Below, an example of coating process is described, this coating process has used the conveying coating apparatus that is formed by above structure.
At first; From the state of Fig. 1, promptly with the substrate W1 after the pad 14a maintenance processing of conveying mechanism 14; Pad 13a with conveying mechanism 13 has kept the state of untreated substrate W2 to begin, and shown in Fig. 4 (a), conveying mechanism 13,14 is to figure right-of-center in political views side shifting; Float the substrate W1 after handling and carry to delivery position, untreated substrate W2 is floated and carries to the S2 of coated portion.
Secondly, shown in Fig. 4 (a), carry and utilize the S2 of coated portion during untreated substrate W2 surface coated coating fluid, conveying mechanism 14 is back to calibrating installation, keeps next untreated substrate W3.In addition, for avoid conveying mechanism 14 when returning with handle in the interference of substrate W2, the conveying mechanism 14 state operation that has descended with pad 14a as shown in Figure 5.
Then, shown in Fig. 4 (b), the substrate W2 that conveying mechanism 13 has finished coated is delivered to substrate and takes out of the S3 of portion, and conveying mechanism 14 is delivered to untreated substrate W3 the operation of the S2 of coated portion.After this, shown in Fig. 4 (c), conveying mechanism 13,14 is to figure right-of-center in political views side shifting, and the substrate W2 after the processing floats and carries to delivery position, and untreated substrate W3 floats and carries to the S2 of coated portion.
Through repeating above operation, continuous surface coated coating fluid to substrate W.In addition, every coating once perhaps after the coating of stipulated number, is carried out the management of the lower end ejiction opening of gap nozzle 17 and is for example cleaned and allocate in advance.
In this case; As shown in Figure 6; Door type frame 16 is risen and makes the position of the lower end ejiction opening of gap nozzle 17 be higher than the upper surface of management devices 18, under this state, door type frame 16 is moved to and overlook the position that overlaps with management devices 18 down, after this through travel mechanism 19; Door type frame 16 is descended, the lower end ejiction opening of gap nozzle 17 impregnated in the cleaning fluid etc.
Fig. 7 is the vertical view of other state of expression conveying coating apparatus; This embodiment is being disposed at the S2 of coated portion with the throughput direction of substrate two gap nozzles 17 that the direction of quadrature will independent control mutually; In addition, also corresponding and management devices 18 is set with various gap nozzle 17.
Like this; Through disposing two gap nozzles 17; Can be from the different coating fluid of each nozzle ejection; Under the situation of the same coating fluid of ejection,, therefore can shorten significantly and produce blanking time in addition owing to during spraying, can in the pump of another gap nozzle, store coating fluid from a gap nozzle.
Use a nozzle that two pumps are set with respect to replacing using two gap nozzles 17, also can during a pump ejection of use, only fill quantitative coating fluid to another pump.
Fig. 8 is the vertical view that other state of coating process is carried in expression.In this embodiment, can carry/be coated with the less substrate of various sizes simultaneously, improve the versatility of treatment effeciency and device through conveying mechanism 13,14.
Claims (4)
1. the conveying coating apparatus of a substrate, it is characterized in that along the throughput direction of substrate and disposed substrate continuously and moved into portion, coated portion and substrate and take out of portion,
Striding across aforesaid substrate delivery section, coated portion and substrate takes out of the whole of portion and disposes workbench; This workbench has formed the air squit hole that is used for substrate floating at upper surface; The conveying mechanism that one side of the substrate that has only kept floating is carried; Both sides at above-mentioned workbench can independently respectively set movably; Each conveying mechanism moves into through aforesaid substrate that portion, coated portion and the substrate portion of taking out of carry continuously with a plate base and not to other conveying mechanism handing-over; About conveying mechanism in conveying mechanism keep substrate a side during, another conveying mechanism is avoided the interference with just maintained substrate, move to opposite direction simultaneously with the throughput direction of substrate.
2. the conveying coating apparatus of substrate according to claim 1 is characterized in that,
In above-mentioned coated portion, except being formed with the air squit hole, also being formed with air and attracting the hole.
3. the conveying coating apparatus of substrate according to claim 1 is characterized in that,
In above-mentioned coated portion, and with the throughput direction of substrate mutually the direction of quadrature be equipped with the gap nozzles of two independent controls.
4. the conveying coating process of a substrate, this conveying coating process has used the described conveying coating apparatus of claim 1 to 3, it is characterized in that,
About conveying mechanism in conveying mechanism keep a side of substrate and carry out coated during; Another conveying mechanism is avoided and the interference that just is being applied the substrate of processing, moved and return the starting position to opposite direction simultaneously with the throughput direction of substrate.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007052569A JP2008212804A (en) | 2007-03-02 | 2007-03-02 | Conveying and coating machine of substrate |
| JP2007052569 | 2007-03-02 | ||
| JP2007-052569 | 2007-03-02 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101254495A CN101254495A (en) | 2008-09-03 |
| CN101254495B true CN101254495B (en) | 2012-05-23 |
Family
ID=39833493
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2008100063927A Active CN101254495B (en) | 2007-03-02 | 2008-02-29 | Conveying coating apparatus of substrate |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2008212804A (en) |
| KR (1) | KR100923629B1 (en) |
| CN (1) | CN101254495B (en) |
| TW (1) | TW200925084A (en) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5550882B2 (en) * | 2009-10-19 | 2014-07-16 | 東京応化工業株式会社 | Coating device |
| KR101077846B1 (en) * | 2010-02-05 | 2011-10-28 | 주식회사 나래나노텍 | A Floating Stage for A Substrate-Floating Unit, and A Substrate-Floating Unit, A Substrate-Transferring Device and A Coating Apparatus Having the Same |
| JP5888891B2 (en) * | 2010-09-27 | 2016-03-22 | 東レエンジニアリング株式会社 | Substrate transfer device |
| TW201214609A (en) * | 2010-09-27 | 2012-04-01 | Toray Eng Co Ltd | Substrate conveying apparatus |
| JP2013051275A (en) * | 2011-08-30 | 2013-03-14 | Dainippon Screen Mfg Co Ltd | Substrate processing apparatus |
| JP6033593B2 (en) * | 2012-07-18 | 2016-11-30 | 東レエンジニアリング株式会社 | Substrate transfer device |
| CN104512742A (en) * | 2013-09-27 | 2015-04-15 | 北大方正集团有限公司 | Transmitting device and coating machine having transmitting device |
| JP6339341B2 (en) * | 2013-10-11 | 2018-06-06 | 平田機工株式会社 | Processing system and processing method |
| CN105170417A (en) * | 2015-08-26 | 2015-12-23 | 京东方科技集团股份有限公司 | Coating machine and coating method |
| JP6651392B2 (en) * | 2016-03-22 | 2020-02-19 | 東レエンジニアリング株式会社 | Substrate floating transfer device |
| JP6829962B2 (en) * | 2016-07-28 | 2021-02-17 | 日本電産サンキョー株式会社 | Industrial robot |
| KR101839345B1 (en) * | 2016-10-27 | 2018-03-16 | 세메스 주식회사 | Apparatus for floating a substrate and Method for floating a substrate |
| EP4098375A4 (en) * | 2020-01-29 | 2023-08-09 | Panasonic Intellectual Property Management Co., Ltd. | Double-sided coating apparatus |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4426276B2 (en) * | 2003-10-06 | 2010-03-03 | 住友重機械工業株式会社 | Conveying device, coating system, and inspection system |
| JP4305918B2 (en) * | 2004-01-30 | 2009-07-29 | 東京エレクトロン株式会社 | Floating substrate transfer processing equipment |
| JP4226500B2 (en) | 2004-03-16 | 2009-02-18 | 東京エレクトロン株式会社 | Substrate transport mechanism and coating film forming apparatus |
-
2007
- 2007-03-02 JP JP2007052569A patent/JP2008212804A/en active Pending
-
2008
- 2008-02-29 TW TW097107141A patent/TW200925084A/en unknown
- 2008-02-29 KR KR1020080018694A patent/KR100923629B1/en active IP Right Grant
- 2008-02-29 CN CN2008100063927A patent/CN101254495B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| KR100923629B1 (en) | 2009-10-23 |
| TWI348448B (en) | 2011-09-11 |
| CN101254495A (en) | 2008-09-03 |
| JP2008212804A (en) | 2008-09-18 |
| KR20080080927A (en) | 2008-09-05 |
| TW200925084A (en) | 2009-06-16 |
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