TW201214609A - Substrate conveying apparatus - Google Patents

Abstract

The objective of the present invention is to provide a substrate conveying apparatus capable of restraining dry and non-uniformity of the coated film on a substrate to convey the substrate and capable of restraining the generation of particles as well although there is the state of huge error on the manufacturing and assembly of the apparatus. The solution of the present invention comprises: a substrate conveying apparatus for guiding a substrate floating on the surface of a platform through a substrate guiding component and for conveying the substrate, wherein the substrate guiding component comprises: a substrate guiding component body restraining the substrate by leaning against a side of the substrate and capable of being displaced in the direction perpendicular to the surface of the platform; a floating unit capable of floating the substrate guiding component body from the surface of the platform; and a pushing means that pushes the substrate guiding component body toward the surface side of the platform. The substrate guiding component body has a substrate leaning part for leaning against the side of the substrate while the height position of the substrate leaning part is held at the height position of the substrate floating on the surface of the platform through the floating unit and the pushing means.

Description

201214609 VI. Description of the Invention: [Technical Field] [0001] The present invention relates to a substrate transporting and transporting a substrate by a stage. [Prior Art] [0002] In the technical field of, for example, lithography of a flat panel display (FPD: Flat Panel Display), the substrate transport apparatus is subjected to inspection and processing (four) boards. The processing apparatus transports the substrate to the substrate processing apparatus in the next process. The floating substrate transport apparatus is compared with the transport apparatus consisting of a robot or the like, and the posture of the substrate is changed. The action has the advantage of shortening the tact time.

Generally, the floating substrate transfer device is provided with a substrate guide that ejects air from the platform and forms an air layer between the substrate and the surface of the platform, and floats the substrate to guide the floating substrate to a predetermined direction. (transporting member). The substrate guide is a member that restricts the movement of the floating substrate by abutting the substrate, and the substrate can be guided (conveyed) in a predetermined direction by performing a transport operation while the substrate guide abuts against the substrate. For example, in the following patent document, a roller (transport member) that protrudes from the surface of the stage is disposed, and the back surface of the substrate is brought into contact with the roller, and the roller is rotated in this state to transport the substrate. . However, when the roller is brought into contact with the back surface of the substrate, the dry state of the coating film applied to the surface of the substrate is different between the portion that abuts the roller and the portion that does not abut the roller, and thus the drying is uneven. Hey. Therefore, as shown in Fig. 10 of Patent Document 1 below, the substrate guide has a configuration in which a plurality of substrate guides are perpendicular to the surface of the platform in the transport direction. Form No. A0101 Page 3 / Total 44 pages 1003351886 a guide roller having a rotating shaft in the direction of 201214609, and transmitting a substrate by rotating the guide roller in this state by abutting the side surface of the substrate against the guide roller. Inhibition of uneven drying. [Patent Document 1] Japanese Laid-Open Patent Publication No. 20 08-1 66359. [0003] However, in the above-described floating substrate transfer device (substrate transfer device), even a plurality of side faces of the substrate are abutted. The case of the guide roller also cannot suppress the problem of uneven drying. In the substrate transfer device described in Patent Document 1, since the side surface of the substrate is restricted by the guide roller, a part of the substrate is exposed by the land. That is, the platform width is set smaller than the size of the substrate. In this state, the coating film of the substrate formed on the substrate is different from the portion in which the substrate is on the stage and the portion in which the substrate is exposed, and the coated film has a problem of uneven drying. Here, in order to make the entire surface of the substrate uniform, it is also considered to have a configuration in which the substrate is entirely opposed to the surface of the stage, the platform width is set to be larger than the size of the substrate, and the guide roller is exposed to the surface of the stage to abut. The side of the substrate. However, the surface of a general platform has a flatness error throughout the longitudinal direction, and there is a case where the straightness of the arrangement of the guide rollers has an error. Therefore, when the manufacturing and assembly errors of the devices are large, there is a possibility that the minute gap between the guide roller and the surface of the platform cannot be effectively maintained, and particles are generated due to contact between the guide roller and the surface of the platform. problem. The present invention has been made in view of the above problems, and an object of the invention is to provide a substrate transport apparatus capable of suppressing drying unevenness of a coating film on a substrate and transporting the substrate, and even if the apparatus is manufactured and assembled in a form of 100127327 No. A0101 Page 4 of 44 1003351886-0 201214609 The large error can also suppress the generation of particles. In order to solve the above problems, the substrate transfer device of the present invention transports a substrate that is floated by the surface of the stage by a substrate guide, wherein the substrate guide includes: abutting the substrate a substrate guide body that laterally limits the substrate and is displaceable in a direction perpendicular to a surface of the platform; a floating unit that floats the substrate guide body by a surface of the platform; and urges the substrate guide body to a surface of the platform The substrate guiding body has a base Q plate (four) portion abutting the side surface of the substrate, and the height position of the substrate abutting portion is maintained on the surface of the platform by the floating unit and the pushing means The height position of the floating substrate. According to the substrate transporting device described above, since the substrate is restricted by the side surface of the substrate, it is possible to suppress the coating on the substrate to cause unevenness in drying and transport the substrate. Further, since the height position of the substrate abutting portion of the substrate guide main body is maintained at the height position of the flat (10) substrate by the floating unit and the pressing means, even if a flatness error of the stage is generated, In the case of loading xe and assembly errors, the generation of particles can also be suppressed. Specifically, the substrate guide body is subjected to a floating force by the surface of the platform by the floating unit, and is pressed against the surface side of the platform by the pushing means. That is, the substrate guide body is held at a position where the floating force of the floating unit is balanced with the pushing force of the pushing means. Moreover, while the substrate is being confined to the substrate guide '- while the substrate guide row is transporting the substrate in the transport direction of the platform', even if the flatness of the platform is generated, the portion of the substrate is disturbed (tUrbUleilCe), the substrate guide body It is also pressed against the surface side of the platform by the pushing force, so that the substrate guide body can follow the surface of the platform to walk and transport the substrate. Therefore, 100127327 Form No. A〇101, Page 5 of 44, 1003351886-0 201214609, even if the manufacturing device is manufactured and assembled, the amount of floating of the substrate guide body is determined by (4) * The substrate guide body is brought into contact with the surface of the platform, so that the generation of particles caused by the surface of the substrate guide contacting the platform can be suppressed. Specifically, the embodiment of the substrate guide can be configured such that the substrate guide includes an air pad at a position facing the surface of the platform, and the floating unit is supplied to the air cushion by air. Air is ejected from the surface of the aforementioned platform by the aforementioned air cushion and the substrate guide body is floated by the surface of the platform. Further, the air cushion of the floating unit may be formed by a different body from the substrate abutting portion of the substrate guide main body. According to this configuration, since the configuration in which the substrate does not directly contact the air cushion can be formed, it is possible to suppress the change in the mounting position of the air dam due to the contact of the substrate. Further, the air cushion of the floating unit may be disposed at a position other than the substrate transporting region in the stage. According to this configuration, it is possible to prevent the air ejected from the air cushion from directly colliding with the substrate transporting region on which the substrate in the stage is transported, so that the temperature change of the substrate transporting region in the stage can be suppressed. According to this, drying unevenness of the coating film formed on the substrate can be suppressed. Furthermore, another specific embodiment of the substrate guide can be configured such that the substrate guide includes an air cushion on a bottom surface portion of the substrate guide body opposite to a surface of the platform, and the floating unit is air The gas is supplied to the gas chamber to eject the air by the air cushion and to float the substrate guide body by the surface of the platform. Further, 'the following configuration may be adopted: the substrate guide further includes a guide supporting portion for supporting the substrate guide body, and the guide member supports 100127327 1003351886-0 page 6/44 page form number A0101 201214609' The substrate guide body is displaceably supported in a direction of attaching and detaching the surface of the platform, and is disposed in a state in which the spring member is contracted between the guide support portion and the substrate guide body. From the spring member, the substrate guide body is urged to the deck surface side. '

According to this configuration, a predetermined gap can be formed between the bottom surface of the substrate guide and the surface of the platform year by the biasing force of the spring member and the floating force of the front block v, and the substrate guide can be formed. The yoke abutting portion of the main body may be maintained at a height position of the substrate floating on the surface of the platform, or may be configured to be formed in the vicinity of the substrate guide main body to be read at the guide member branch portion. a portion that is open on the side of the substrate abutting portion β Λ

According to this configuration, when the base member is relatively displaced with respect to the front member, the particulate component is generated due to the contact state between the two members. Assuming that the particles are generated, it is also possible to prevent the particles from being diffused to the substrate abutting portion side by the particles being attracted by the opening of the portion. Further, the guide member supporting portion may include an eQver extending from the substrate abutting portion side, and the cover portion of the suction portion is further disposed with the m base member. A gap is formed between the cover and the substrate abutting portion. According to the configuration, when the attraction force is generated by the opening of the suction portion 丨P, the contact between the cover and the substrate is too large. Since the attraction of the opening of the suction portion is suppressed, it is possible to suppress the micro-slipping due to the contact of the guide opening and the mouth from falling to the base == the substrate guide body 100127327. Form No. 1010101 Page 7 / Total from the side of the face . 1003351886-0 201214609 ―"Effects of the Invention] According to the substrate transfer device of the present invention, it is possible to suppress the unevenness of the coating on the substrate and to transport the substrate, and the error in manufacturing and assembly of the device is large. The situation can also suppress the generation of particles. [Embodiment] [0005] .. m The embodiment of the substrate transfer device of the present invention will be described with reference to the drawings. [First Embodiment] Fig. 1 is a plan view showing an embodiment of a substrate transfer device, Fig. 2 is a plan view of a unit of a large substrate transfer device, Fig. 3 is a side view of a unit of the substrate transfer device, and Fig. 4 is a view A front view of a unit of the substrate transport device. In FIG. 1 to FIG. 4, the substrate transfer device 1 is a device for transporting the substrate 2 in a state where the substrate 2 is floated, and the substrate 2 is transported to the downstream side of the next process by the substrate processing device on the upstream side. A device for a substrate processing apparatus. For example, when the substrate 2 is formed into a coating film by a coating device that discharges a coating liquid such as a photoresist, and then the substrate 2 is transported to a drying device that dries the coating film, the coating device can be supplied. When the substrate 2 is floated, it is conveyed to the drying device without changing the direction as it is. In the following description, it is assumed that the direction in which the substrate 2 is transported is set to a direction orthogonal to the X-axis direction on the horizontal plane, and the direction in which the X-axis direction is perpendicular to the X-axis direction is two-axis. The 100127327 platform has a platform unit 10 and a transport unit 2. The transport unit 20 is disposed on both sides of the ¥ axis direction of the flat β. The structure V of the platform unit can hold the substrate 2 to be carried on the floating page 8/44 page 1003351886-0 201214609 state. Further, the transport unit 20 is a member that transports the substrate 2 in the transport direction (long-axis direction) while restricting the floating substrate 2. That is, the substrate 2 supplied to the stage unit 10 from the upstream side floats on the stage 12 and is restricted by the substrate guides disposed on the transport unit 20. Then, the substrate guide is moved in the X-axis direction so that the substrate 2 is transported in the x-axis direction. As shown in Figs. 3 and 4, the platform unit 10 has a platform 12 which is carried on a flat platform, and a floating means 13 for floating the substrate 2 from the surface of the flat plate 12. The platform 12 is a rectangular metal flat member, and a plurality of blocks are arranged along the transport direction. In the example of Figure 配置, there are four platforms 12 configured. Further, the stage 12 has a land surface 12a (also referred to simply as a surface 12a of the platform) opposed to the substrate 2 to be supplied, and is formed in a flat shape as a whole. In the present embodiment, the land surface 12a is formed to have a larger size than the substrate 2, so that the supplied substrate 2 is not exposed to the entire surface and faces the land surface 12a. According to this, since the entire substrate 2 is opposed to the land surface i2a, the drying environment becomes constant, and when the coating film formed on the substrate 2 is dried during transportation, drying unevenness due to unevenness in the drying environment can be suppressed. ❿ , 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 12 Specifically, it is disposed on the position where the two corners of the diagonal of the substrate 2 are lost when the substrate 2 is supplied onto the stage 12. That is, the positioning pins are disposed in accordance with The size of the substrate 2 to be transported is at a position where the substrate 2 and the positioning pin _ are mixed. Moreover, the positioning pin 14 can be lifted and lowered, and in the retracted state, the entire material 14 is contained in the flat (four). In the protruding state, the positioning lock 14 protrudes from the surface of the platform 12. Therefore, the substrate 2 is supplied in the accommodating state, and the substrate 2_ is supplied to 1003351886-0 100127327. Form No. A0101 Page 9 / Total 44 Page 201214609 ^ On the land surface 12a, the positioning pin 14 is in a protruding state, and the substrate 2 is positioned by contacting the side surface 2a of the substrate 2 with the positioning pin 14. That is, the substrate 2 is supplied to the substrate 2 on the platform 12. The state of freely moving while floating, but only by the positioning lock 14 The side surface 2a of the substrate 2 restricts the movement of the substrate 2, and the substrate 2 is positioned at a predetermined position (positioning range) on the stage 12. Further, the floating means 13 causes the supplied substrate 2 to be lifted by the land surface 12a' In the present embodiment, as shown in Figs. 3 and 4, a vibrator Cvibi'atoOUa' is disposed on the back surface of the stage 12 (the back surface of the deck surface 12a), and can be supplied by the vibrator Ua. The vibration generated by the frequency causes the substrate 2 on the stage 12 to float by the land surface 12a. Specifically, for example, if the vibrator 13a is vibrated by ultrasonic waves, the vibration is transmitted, and the stage 12 itself vibrates by ultrasonic waves. A slight air layer is formed between the land surface 12a and the substrate 2, and the substrate 2 is lifted by the land surface 12&; that is, if the vibrator 13a is vibrated at a specific frequency, the substrate 2 is floated by the land surface 12a. It is held on the stage 1 2 in a state of a predetermined height position. Further, the transport unit 20 is a member that transports the substrate 2 on the stage 12 in the material direction through the substrate guide 30. The material unit 2G has an extension-direction. Transport of bandit lla along platform 12 The transport unit 2 has a substrate guide 30, and the substrate 2 can be transported by moving the plurality of substrate guides 3 by the transport drive unit 4 on the base 11a. That is, the 'substrate guides 3' are arranged corresponding to each of the platforms 12, and the respective substrate guides 30 can be moved from the platform 12 to the lower-downstream side platform 12, and then returned to the original platform 丨2. The substrate guide 3G of each platform 12 can transport the substrate 2 by simultaneous (4) operations 100127327 Form No. A0101 Page 1 / Total 44 Page 1003351886-0 201214609 In the transport direction β, body, - is supplied On a platform 12, the substrate 2 is limited by the substrate (state of Figure 1). Then, the substrate 12 (the state of Fig. 5) on the downstream side by the movement of the substrate guide is carried on the platform 12 on the downstream side (the state of Fig. 6). Then, the substrate guide 3 on the downstream side returns to the original stage 12 on the upstream side (the state of Fig. 7), and the substrate 2 conveyed by the substrate guide 30 on the upstream side is restricted. The substrate 2 is transported in the transport direction by repeating the above steps on each of the stages 12. that is

The substrate 2 is transported by a relay of a plurality of substrate guides 30. The transport drive unit 40 has a rail 41 extending in one direction, a transport main body portion 42 on which the substrate guide 30 is mounted, and a linear motor 43 that drives the main body portion 42. The guide rail 41 is a flat member having a smooth surface, and the smooth surface is disposed on each of the bases 11 upward. That is, the "guide rails 41" are disposed at positions equidistant from the platform 12 at positions equidistant from the platform 12 so as to sandwich the deck surface 2a in the transport direction of the stage 12.

Further, the height positions of the smooth faces of the respective guide rails 41 are each set to a common height position. Moreover, the LM guide (Linear) is disposed on the smooth surface of the guide rail 41.

Motion guide: line motion guide 44 and linear motor 43. Specifically, at a central position in the Y-axis direction of the smooth surface, a stator (magnetic plate) of the linear motor 43 is extended in the X-axis direction, and LM guides 44 are extended on both sides of the stator. It is arranged in the X-axis direction. Further, the transport main body portion 42 is coupled to the LM guide 44, and a mover disposed on the transport main body portion 42 is connected to the stator. Therefore, the linear motor 43 is driven by 100127327, so that the mover moves along the stator, and the form number A0101 is 11/page 44 1003351886-0 201214609 The body 42 can be moved along the guide rail 41. That is, the transport main body portion 42 can be moved in the z-axis direction by the drive control linear motor 43, and stopped at an arbitrary position. The transport main body portion 42 has a mounting portion 42a on which the substrate guide 30 is mounted and a chat portion 42b extending from the mounting portion 42a, and has a shape in which the cross section is slightly hatched. The LM guide 44 is connected to the leg portion 42b, and the mounting portion is placed upwards. A substrate guide 3 is disposed on the mounting portion 42a, and the substrate guides 30 are disposed on the platform 12. Corner line. That is, it is placed on a diagonal different from the diagonal line where the positioning pin 14 is present. Further, the drive control motor 43 is moved in the transport direction while maintaining the positional relationship in which the substrate guide 3 () exists on the diagonal line. Further, the two-dot chain line of Fig. 2 is a transport main body portion 42 and a substrate guide 30 after the movement is displayed. As shown in FIG. 8, the substrate guide member 30 has a substrate guide body 31 for restricting the substrate 2, and a guide support portion for supporting the substrate guide body 31, and further includes: the substrate guide body 31 is floated by the land surface 12a. The lifting unit 5〇; the pushing means 6〇 for pushing the substrate guiding body 31 to the side of the platform surface 12a, by the floating unit 50 and the pushing means 6〇, the substrate guiding body 31 can be made of the platform surface 12 a floats. The guide supporting portion 32 has a flat arm portion 32a, and a substrate guide body 31 is disposed at a tip end portion thereof. The arm portion 32a is disposed in the mounting portion 42a (see Fig. 4) of the transport main body portion 42 via the elevating mechanism, and can elevate and lower the mounting portion 42& in the Z direction. Specifically, the position of the substrate 2 can be restricted by the substrate guide body 31 to the extent that the substrate guide body 31 does not contact the positioning pin 14 in the protruding state. That is, as shown in FIG. 5, after the substrate 2 is transferred to the platform 12 on the next downstream side, as shown in FIG. 6, the substrate 2 is protruded by the state 1003351886-0 100127327 Form No. A0101 Page 12 of 44 201214609 The positioning pin 14 is limited. Further, in Fig. 1 and Fig. 5 to Fig. 7, when the positioning pin 14 is black, the display state is highlighted, and when it is white, the display state is displayed. Further, by raising the substrate guide main body 31, the transport main body portion 42 is moved, and the above-described protruding state of the positioning pin 14 can be exceeded and the substrate guide 30 can be returned to the original stage 12 (state of Fig. 7). Further, the guide supporting portion 32 has an advancing and retracting mechanism, and the arm portion 323 can advance and retract the substrate 2. That is, in the case where the substrate 2 is restricted to the substrate guide body 31, the arm portion 32a is protruded from the substrate 2 side (Fig. - Fig.), and the substrate guide body 31 is brought into contact with the substrate 2 in a state where the substrate 2 is abutted against the substrate 2 As shown in FIG. 5, when the substrate 2 is transported to the next stage 12, the substrate 2 can be released by moving the protruding arm portion 32a to the opposite side of the substrate 2 and making it retracted (FIG. 6). Further, the arm portion 32a is provided with a spring that is expandable and contractible in the advancing and retracting direction, and the arm portion 32a is allowed to enter and abut the substrate guide even if the position of the corner portion of the supplied substrate 2 is shifted. In the case of the body 31, the substrate guide body 31 can be surely abutted against the corner portion of the substrate 2 by the spring absorbing the offset. 基板 The substrate guide body 31 is supported by the guide as shown in FIG. The arm portion 32a of the support portion μ is abutted against the substrate 2 by the substrate guide body 31, so that the substrate 2 is restricted. Specifically, two substrate guide bodies are mounted on the arm portion 32a. Referring to FIG. 2), The two substrate guide bodies 31 on the diagonal line contact the substrate 2 to limit the substrate 2 The guide body 31 has: a guide shaft portion 33; and a substrate-connecting portion 34B formed on the land surface 12a side of the guide shaft portion 33 is abutted against the side surface 2a of the substrate 2 by the substrate abutting portion 34 Substrate 2. 100127327 Moreover, the substrate guide body 31 can be displaced in the z direction and supported by the guide 1003351886-0 Form No. A0101 Page 13 of 44 201214609 P32 branch. Specifically, the guide shaft portion 33 is formed in a cylindrical shape, and the =3 transmission slip_~Ude_35 is cut and formed on the arm. The cross of the yang a. According to this, the pure guide (4) r is displaced in the z direction and supported. That is, the substrate guide mesa 12a is displaced in the Z direction. The jagged earth plate abutting portion 34 is a member that restricts the plate 2 by abutting against the side surface 2a of the substrate 2. The substrate abutting portion 34 is formed in a cylindrical shape made of resin, and the straight soil diameter is smaller than the guide shaft. The straight 彳 的 of the 卩 33 is also large and shaped, and the arm portion 导 of the guide supporting portion 32 protrudes from the substrate 2 side and the substrate guide body 31 abuts against the substrate 2 to make the substrate abutting portion 34 (4) The surface abuts the substrate 2_surface to limit the substrate 2. That is, the substrate 2 abutting portion 34 of each of the substrate guides 3A disposed on the diagonal line is slightly pressed against the side surface 2a of the corner portion of the substrate 2, so that the movement of the substrate 2 floating on the land surface 12a is limit. Further, in the present embodiment, the substrate abutting portion 34 transmits a small pressing restriction to the substrate 2, but a small gap can be formed even if the side surface 2a of the substrate is not pressed by the substrate abutting portion 34. The substrate 2 can also be restricted in the case of abutting against the side surface 2a of the substrate 2. In other words, the restriction substrate 2 is intended to prevent the substrate 2 floating on the land surface 12a from moving freely and to hold the substrate 2. Further, the 'floating unit 50' is a member that floats the substrate guide body 31 by the land surface 12a. The floating unit 50 of the present embodiment is constituted by a gas cylinder 51 disposed on the bottom surface portion 36 of the substrate guide body 31, and an air supply path 52 that communicates with the air cylinder 51. The air supply path 52 is connected to an air cylinder (not shown), and air is supplied through the air supply path 52 by a switching operation of a valve (not shown). That is, the air supplied to the air supply path 52 is ejected by the air cushion 51 to the deck surface i2a 100127327. Form No. A0101 Page 14 of 44 page 1003351886-0 201214609 side. According to this, a floating force is generated in the substrate guide body 31, and the substrate guide body 31 is slightly floated by the land surface 12a. Here, although the amount of floating of the substrate guide main body 31 is adjusted by the opening amount of the transmission valve, in the present embodiment, the height of the substrate 2 abutting on the land surface 12a is adjusted in the present embodiment. position. Further, the height adjustment of the substrate abutting portion 34 to the height of the floating substrate 2 means that not only the floating amount of the substrate 2 and the floating amount of the substrate abutting portion 34 are common, but also the substrate can be adjusted to In a state in which the connecting portion 34 is floated, the substrate abutting portion 34 can abut against the height position of the side surface of the substrate 2.

Further, the 'urging means 6' is a member for pressing the substrate guide body 31 against the side of the land surface 12a. In the urging means 60 of the present embodiment, a coil spring 61 (spring member) is disposed between the substrate abutting portion 34 and the guide supporting portion 32, and the substrate is transmitted through the elastic force of the coil spring 61. The guide body 31 is pressed against the side of the deck surface i2a. Specifically, between the substrate abutting portion 34 and the guide supporting portion 32, the center of the guide shaft portion 33 is substantially concentric, and the coil spring 61 is contracted by a predetermined amount.

The restoring force of the coil spring 61 acts as a pressing force on the substrate abutting portion 34, and the substrate abutting portion 34 (substrate guide body 31) is pressed against the deck surface 12a side. Here, when the air supply amount is increased by opening the valve of the floating unit 5, the floating force is increased by the increase in the air discharged from the air cushion 51, and the substrate guide body 31 is displaced upward. On the other hand, by the substrate guide body 31 being displaced upward, the restoring force of the coil spring 61 of the biasing means 60 is increased, so that the substrate abutting portion 34 receives the pressing force downward. In this manner, the height position of the substrate abutting portion 34 can be adjusted by the position at which the lifting force of the floating unit 50 and the pressing force of the pushing means 6 are balanced. In the present embodiment, the floating 100127327 Form No. A0101 Page 15 / Total 44 page 1003351886-0 201214609 The air supply amount of the early 兀50 is adjusted, and the 俾 substrate abuts (10) as the substrate 2 floating on the platform surface 12a. Height position. With such a substrate guide 30, even in the case of manufacturing or assembly errors such as flatness errors on the surface of the stage 12, the generation of fine particles can be suppressed and the substrate 2 can be transported. Alternatively, the substrate 2 can be restrained by the substrate guide 3, and the substrate contact portion 34 abuts against the side surface 2a of the substrate 2 at a position where the floating force of the floating unit 50 and the surface force of the hand-reduced surface are balanced. In this state, when the substrate guide 30 is being moved in the transport direction and the substrate (4) is being transported, when a flatness error is generated on the surface of the stage 12, for example, assuming that the surface of the stage 12 is raised, the air is caused by the substrate guide body 3i. Since the discharge amount of the air of η does not change, the substrate guide body 31 is displaced upward by the upward force by the floating force generated by the air ejection from the approaching deck surface 12a. However, since the arm portion 32a is fixed to the surface of the stage 12, the spring portion (4) is spirally rotated between the arm portion 32a and the substrate abutting portion 34 to compressively deform and its restoring force acts on the substrate abutting portion 34. That is, even if the deck surface is close to or separated, the floating state of the substrate guide body 31 is balanced because the floating force of the floating unit 50 and the pressing force (restoring force) of the pushing means 60 are balanced at the new height position. The substrate guide body 31 is maintained to track the deck surface 12a. Therefore, even if the manufacturing and the installation error of the device such as the flatness error of the surface of the platform 12 is generated, the substrate guide 30 in the walking can be prevented from contacting the flat α12 table®', which can suppress the substrate guide 3Q from contacting the platform. The production of particles made by the surface. Further, a dustproof mechanism is disposed on the substrate guide 30. In other words, the suction portion 71 disposed on the arm portion 32a of the guide supporting portion 32 and the dustproof cover 72 can be prevented from being generated when the substrate guide body 31 is displaced in the z-axis direction. 100127327 Form No. A0101 Page 16 of 44 1003351886-0 201214609 The attraction portion 7 1 is a member that prevents particles from adhering to the substrate 2 by attracting generated particles. The suction portion 71 is disposed in the vicinity of the through hole of the arm portion 32a through which the substrate guide body 31 is inserted. Specifically, the arm portion 32a is formed with an opening portion 71a that opens to the side of the substrate abutting portion 34, and a vacuum pump is connected to the opposite side of the substrate abutting portion 34 in the opening portion 71a. Therefore, when the vacuum pump is operated, an attractive force is generated in the opening of the substrate abutting portion 34 of the opening portion 71a, and particles generated between the arm portion 32a and the substrate abutting portion can be attracted. That is, it can attract the displacement of the substrate guide body 3

100127327 A member that diffuses the granules of the granules when the guide shaft portion 33 and the sliding bushing 35 slide in the Z-axis direction. The dust cover 72 is disposed on the outer diameter side of the opening of the suction portion 71, and extends from the arm portion 32a toward the substrate abutting portion 34 to form a cylindrical shape. Further, the dustproof cover 72 covers the portion of the outer peripheral surface of the outer peripheral surface of the guide shaft portion 33 and the outer peripheral surface of the substrate abutting portion over the entire circumference. That is, the dust cover 72 is formed to have a larger diameter than the substrate abutting portion 34, and a gap is formed between the outer peripheral surface of the substrate abutting portion 34. According to this, the diffusion of the particles generated between the arm portion 32a and the substrate abutting portion can be prevented. In other words, when the guide member (four) 33 and the sliding bush 35 slide to generate fine particles, the fine particles are diffused. However, due to the presence of the cylindrical dustproof cover 72, the expansion of the particles (four) can be applied to the dust cover. After the autumn, if the real U is operated and the force is generated in other parts, the air enters through the gap formed between the dust cover 72 and the substrate abutting portion W and is sucked to the (four) portion 71. According to this, the particles diffused in the area covered by the dust cover 72 are not (four) to the outside of the dust cover 72, and the particles can be discharged by the suction portion 71. Second, the operation of the base is based on the flow shown on page 17/ A total of 44 pages 1003351886-0 201214609 are illustrated. Here, in the state before the substrate 2 is transported, each of the substrate guides 3 〇 stands by the position of the respective stages 12 adjacent to the arm portion 32a of the guide pushing portion 32. Then, the positioning pin 14 is housed below the deck surface 12& and the storage state is maintained. First, the positioning of the substrate 2 is performed in step S1. That is, the substrate 2 is restricted by the substrate guide 30. The positioning operation of the substrate 2 is specifically provided by the substrate 2 of the process, and the positioning lock 14 in the receiving state is protruded by the land surface 12a, so that the substrate 2 is positioned in the positioning range. Is supplied to the flat vibration by the vibrator i3a 12, the substrate 2 is floated by the land surface 12a and freely moved on the land surface 12&, but the movement of the substrate 2 is restricted by the contact pin 14 in contact with the protruding state. Accordingly, the substrate 2 is positioned at Positioning range (Fig. 7) Next, the restricting operation by the substrate guide 30 is performed through the step S2. That is, the arm portion 32a of the guide supporting portion 32 extends on the side of the substrate 2. Specifically, the air is guided by the substrate guiding body The air cushion 51 of 31 is ejected, and the floating force is balanced with the biasing force of the coil spring 61, and the substrate guide main body 31 side is supported by the arm portion 32a, and floats on the deck surface 12a. In this state, the substrate abuts. The height position of the portion 34 is adjusted to abut against the height position of the side surface 2a of the substrate 2. Then, the arm portion 32a extends, the substrate guide body 31 approaches the side surface 2a of the substrate 2, and the substrate abuts portion 34 abuts the substrate The side surface 2a of the second portion 2a stops the extending operation of the arm portion 32a. That is, the side surface 2a of the corner portion t of the substrate 2 abuts against the substrate abutting portion 34 of the four substrate guide bodies 31 disposed on the diagonal line. The substrate 2 is limited (Fig. 1). Therefore, in this state, the substrate The movement of 2 is limited by the substrate guide 30 and the positioning pin 14. 100127327 Next, the substrate 2 is transported through the step S3. That is, the limited substrate 1003351886-0 Form No. A0I01 Page 18 of 44 201214609 2 pieces 30 by The current platform 丨 2 is carried to the lower platform 12' adjacent to the downstream side, and the substrate 2 is transported by repeating the action. Specifically, it is made to reduce the amount of money that restricts the movement of pure 2 and only borrow The state in which the substrate 2 is moved is restricted by the substrate guide 3. Then, the driving portion 4A is transported by the side, and the substrate guide 3G is moved to the downstream side. During the movement, air can be continuously ejected from the gas cylinder 51 of the substrate guide ’, so that the substrate guide body 31 can maintain the state of being floated by the land surface 12a. Further, even if it is assumed that the flatness of the land surface "a" causes an error, the generation of the particles can be suppressed by the arm portion 32a of the guide supporting portion 32 contacting the land surface 12a by tracking the shape of the land surface ha. The substrate 2 reaches the lower platform 12 adjacent to the downstream side, and the transport driving unit 4 is driven and controlled to stop the substrate guide 3, that is, 'stopped when the positioning pin becomes protruding, the substrate 2 The back side does not collide with the positioning pin 14 (Fig. 5).

Next, the release of the substrate 2 by the substrate guide 30 is performed through the step S4. Specifically, the positioning pin 14 is protruded from the land surface 12a, and the substrate 2 conveyed by the positioning pin 14' is restricted on the next land surface 12a on the downstream side. That is, the substrate 2 is limited by the positioning pin 14 and the substrate guide 30. Then, the arm portion 32a of the substrate guide 30 is retracted and the arm portion 32a is raised by the elevating mechanism while returning to the original position. That is, it rises to a position where the substrate guide body 31 does not contact the positioning pin 14. Accordingly, the release of the substrate 2 by the substrate guide 30 is performed, and the substrate 2 is limited only by the positioning pins 14 (Fig. 6). Then, when the retracting operation and the rising operation of the arm portion 32a are completed, the substrate guide 3 is returned to the original position through the step S5 (Fig. 7). That is, the transport driving unit 40 is driven to move the substrate guide 30 to the stage 12 on the upstream side of the stage 12 on which the substrate 2 is released. At this time, the locating pin 14 is in a protruding state due to the restriction base 100127327, the form number A0101, the 19th page, and the 44th page, 1003351886-0 201214609 ..., because the substrate guide body 31 is raised more than the positioning pin 14, so it is not caused by The movement of the substrate guide 30 causes the substrate guide body μ to come into contact with the positioning pin 14. Moreover, the substrate 2 transported to the platform 12 on the downstream side is limited by the substrate guide 30 which is initially provided with the substrate 12, that is, the substrate guide 30 returned by the platform 12 on the downstream side of the platform 12, It is then transported to the platform 12 on the downstream side. Thus, by passing through the substrate guides 30 disposed on the respective stages 12, the substrate 2 is relay-restricted and moved to the platform 12 on the next downstream side, and the substrate 2 is transported to the final position of the substrate transfer device. As described above, according to the substrate transfer apparatus 1, since the substrate 2 is restricted by the side surface 2a of the substrate 2, it is possible to suppress the unevenness of the coating on the substrate 2 and transport the substrate 2. Further, the position of the substrate abutting portion 34 of the substrate guide body 31 is maintained at a height position of the substrate 2 which is floated by the surface 12a of the stage 12 by the floating unit 5〇 and the pressing means 6〇, Therefore, even if the flatness of the platform 12 is in an error condition, the manufacturing and assembly errors of the device are large, and the floating amount of the substrate guide body 3 can be kept constant without the substrate guide. The body 31 contacts the surface 12a' of the stage 12 so that the generation of particles caused by the substrate guide 3〇 contacting the surface i2a of the stage 12 can be suppressed. Further, in the above-described embodiment, the "urging means 6" has been described with respect to the case where the coil spring 61 is used, but the magnet abutting portion 34 may be urged to the side of the land surface 12a by a magnet. In other words, the substrate abutting portion 34 can approach the arm portion 32a by the position of the n-pole (or s-pole) disposed on the side of the substrate abutting portion 34 and the N-pole (or S-pole) on the side of the arm portion 32a. The repulsive force of the magnet is used as a pushing force. [Embodiment 2] 100127327 Form No. A0101 Page 20 of 44 1003351886-0 Further, other embodiments of the substrate transfer apparatus will be described with reference to Figs. 10 and 11 . Here, the closing is a view of the substrate guide 30 in the other embodiment, and Fig. 1 is a sectional view of Fig. 1A-2A. In the embodiment shown in Figs. 1G and 1m, the air cylinder 51 of the floating unit 5G is formed by being different from the substrate abutting portion 34 of the substrate guide body 31. Incidentally, the configuration other than the substrate guide 30 is the same as that of the above-described embodiment, and therefore the description thereof is omitted. As shown in FIG. 1A and FIG. 7A, the substrate guide member 30 has a substrate guide body 31 for limiting the substrate 2, and a guide support portion 32 for supporting the substrate guide body 31, and further comprising: a substrate guide member by the platform surface Ua. The floating unit 50 that floats on the body 31 pushes the substrate guide body 31 against the pushing means 60 on the side of the platform surface 12a. By the floating unit 50 and the pushing means 6〇, the substrate guiding body can be “platable by the platform” The guide support portion 32 has a flat arm portion 32a, and a substrate guide main body 31 is disposed at a distal end portion thereof. The arm portion 32a is disposed on the mounting portion 42a of the transport main body portion 42 via a lifting mechanism ( Referring to Fig. 4), the mounting portion 42a can be moved up and down in the Z direction. In the present embodiment, the air slide table 81 is used for the elevating mechanism, and the amount of air supplied to the air slide table 81 can be controlled. The table portion 81a in which the arm portion 32a is moved in the z direction β, that is, the air table 81 is linearly moved, is attached to the z direction, and is mounted on the table 81a through the air pressure table 82. The arm portion 32a. Then, by controlling the supply amount of air, the arm portion is moved downward By bringing the substrate guide body 31 closer to the substrate 2, the arm portion 32a is moved upward, so that the substrate guide body 31 is moved in a direction away from the substrate 2. In the present embodiment and the above-described embodiment (Example 1) Similarly, the substrate guide body 31 can be raised from the position of the restriction substrate 2 to the extent that it does not contact the positioning pin 14 of the form number A0101, which is sorrowful. Further, the air slide table 81 is also described later. The guide support portion 32 has an advancing and retracting mechanism, and the arm portion 32a can advance and retract the substrate 2. In the present embodiment, the advancing and retracting mechanism can be controlled by using the air slide 82'. The air supply amount of the air pressure slide 82 causes the substrate guide main body 31 to move away from the substrate 2. Specifically, the main body of the air pressure slide 82 is attached to the air pressure slide μ, and the air pressure slides linearly. The table 82a of the table 82 is movably mounted in the direction toward the center of the substrate 2 to be positioned. Then, by controlling the amount of supply of air to the air slide table 82, the table 82a can be moved forward and backward to the substrate 2. The center direction of the arm portion 32a is extended in the protruding direction of the center of the substrate 2, and the arm portion 32a is retracted to the standby side of the body side. That is, the substrate 2 is restrained to the substrate guide body 31. In this case, the arm portion 32a is protruded from the substrate 2 side (in the figure, the substrate guide body 31 is in contact with the substrate 2 in the shape 1 and is stopped by V. Further, as shown in FIG. 5, when the substrate 2 is transported to When the lower stage 12 is placed, the substrate 2 can be released (the state of Fig. 6) by moving the arm portion 32a to the side opposite to the substrate 2 and in a retracted state. The substrate guide body 31 is as shown in Figs. 1G and 11 The arm portion 32a' of the guide member supporting portion 32 is connected to the substrate 2 by the substrate guide body (4), so that the substrate 2 is restricted. Specifically, two substrate guide bodies 31 (see FIG. 2) are attached to the top end portions of the arm portions 32 & the substrate can be restrained by the two substrate guide bodies 31 disposed on the diagonal lines contacting the substrate 2 2. Specifically, the substrate guide body 31 has a cylindrical guide shaft portion 33, a substrate abutting portion 34 formed on a side surface of the guide shaft portion 33 on the side of the land surface 12a, and the two substrate guide bodies 31. It is fixed at a position equidistant from the center of the arm. Then, the arm portion 32a of the guide supporting portion 32 can be protruded from the substrate 2 side by driving the air pressure sliding table 82 by the 1003351886-0 100127327 form number A0101 page 22/total 44 page 201214609, so that the substrate abutting portion 34 The substrate 2 is restricted by abutting against the side surface 2a of the substrate 2. That is, the side surface 2a of the corner portion of the substrate 2 is slightly pressed by the substrate abutting portion 34 of each of the substrate guides 30 disposed on the diagonal line, so that the movement of the substrate 2 floating on the land surface 2a is limit. Further, in the present embodiment, the substrate Ο 2 is restricted even when the side surface 2a of the substrate 2 is abutted without being pressed by the side surface 2a of the substrate 2 by the substrate abutting portion 34. . That is, if the substrate 2 floating on the land surface 12a is freely moved to the suppressed state, the floating unit 50 is a member for floating the substrate guide body 31 by the land surface 12a. The floating unit 5A of the present embodiment is fixedly disposed between the guide supporting portion 32 and disposed between the substrate guide main body 31 and the air pressure sliding table 82 of the advancing and retracting mechanism. The floating unit 5 has a floating unit body and a gas cylinder 5, and as shown in Fig. 11, a gas cylinder 51 is disposed on the bottom surface portion of the floating unit body 55. That is, the air cushion 51 is placed at a position facing the deck surface 12a. Further, the air cushion 51 is connected to a cylinder (not shown), and air is supplied by a switching operation of a valve (not shown). That is, by the air being supplied to the air cylinder 51, the air cushion 51 is ejected to the side of the deck surface 12a, so that the guide support portion 32 is lifted, and the substrate guide body coupled to the guide support portion 32 is attached. 31 is also subjected to the floating force, and the substrate guide body 31 is slightly floated by the deck surface %. Here, the amount of floating of the substrate guide body 31 is adjusted by the amount of opening of the valve, and in the actual state, (4), the pure abutting portion Μ becomes the height of the substrate 2 floating on the land surface 12a. position. Further, the adjustment of the height of the substrate abutment portion 34 to the height of the floating substrate 2 means that not only the floating amount of the beauty plate 2 and the floating amount of the substrate abutting portion 34 are common, but also can be adjusted to In a state in which the substrate abutting portion 34 is floated, the substrate abuts 100127327. Form No. A0101 Page 23/44 pages 1003351886-0 201214609 The portion 34 can abut the height position of the side surface of the substrate 2. Further, the 'urging means 60 is a member for pressing the substrate guide body 31 against the side of the land surface 123. The urging means 60 of the present embodiment is the air pressure stage 81, and the substrate guide body 31 is pressed against the land surface 12a side by controlling the air supplied to the air pressure stage 81. Specifically, the table 87a of the air slide table 81 is moved downward by the control air, and the advancing and retracting mechanism, the guide support portion 32, and the substrate guide body 31 connected to the table 81 are directly biased downward. The substrate guide body 31 is pressed against the deck surface 12a side. Here, if the air supply amount is increased by opening the width of the floating unit 50, the floating force is increased by the increase in the air discharged from the air cushion 51, and the substrate guide body 31 is displaced upward. On the other hand, if the substrate guide main body 31 is intended to be displaced upward, the air pressure supplied to the air slide table 81 of the urging means 60 does not change, so that the air pressure slightly increases the portion of the table 81a that is slightly displaced upward. The thrust of the table 87a that is intended to move downward is increased. That is, the substrate guide body 31 is subjected to a pressing force downward. In this manner, the height position of the substrate abutting portion 34 can be maintained at the height position of the side surface of the substrate 2 by the position at which the floating force of the floating unit 5'''''''''' With such a substrate guide 30, even in the case of manufacturing or assembly errors such as flatness errors on the surface of the stage 12, the generation of fine particles can be suppressed and the substrate 2 can be transported. Alternatively, the substrate guide 3 can be used to terminate the substrate 2 by the substrate contact portion 34 abutting the side surface 2a of the substrate 2 at a position where the floating force of the floating unit 50 and the pushing force of the pushing means 6 are balanced. In this state, when the substrate guide 3 is being moved in the transport direction and the substrate 2 is being transported, when the flatness error occurs on the surface of the stage 12, for example, assuming that the surface of the stage 12 is raised, the air from the air cushion 51 is sprayed. When the output is constant, the substrate guide body 31 is subjected to the force of the buckle by the floating surface force generated by the air ejection 100127327 form number A0101 page 24/44 pages 1003351886-0 201214609. Displace upwards. If the substrate guide body 31 is displaced upward, the table 81a of the brazing unit 81 is slightly displaced upward, so that the thrust of the #W downward of the table 8la is increased, and the substrate guide body 31 faces downward. Under pressure. Also, even if the deck surface 12a approaches or leaves the substrate guide body 31, the floating force of the floating single & early tg5〇 and the pushing force (restoring force) of the pushing means 6〇 are balanced at the new height position. And the substrate guide is maintained as '俾 substrate guides the ship's tracking platform surface 12a. Therefore, even devices that produce flatness errors on the surface of the platform 12

The manufacturing and assembly errors can also suppress the substrate guides 3 in the walking contact with the deck surface 12& and can suppress the generation of particles caused by the substrate guide 30 contacting the deck surface 12a.

(10) Further, in the above-described embodiment (Embodiment 2), _ is a description of the case where the air tilt of the floating unit 50 is common to the two substrate guide turns 31. However, as shown in the example of FIG. 12, The examiner of each of the substrate guide bodies 31 in which the ejector unit 5G is disposed may also be omitted from the description of the second embodiment. However, in the example of FIG. 12, the substrate guide body is omitted. Since the floating unit 5 is disposed independently of each other, the floating amount of the substrate guide body 31 is more reliably held. However, in the example of FIGS. 1A and 11 , the air cushion 51 of the floating unit 50 is disposed outside the region (substrate transport region) where the substrate 2 is transported, so that the air ejected from the air cylinder 51 can be suppressed on the substrate. The transport area produces temperature changes. In other words, since unevenness in temperature formation in the substrate transporting region can be suppressed, drying unevenness due to temperature unevenness in the substrate transporting region of the coating film formed on the substrate 2 can be suppressed. Further, in the above-described embodiment, the case where the substrate abutting portion 34 of the substrate guide main body 31 has a vertical surface on the side surface of the substrate 2 is 100127327. The form number Α0101 is 25 pages/total 44 pages 1003351886-0 201214609 However, it is also possible to have the inclined surface 3 on the side surface of the substrate 2. That is, since the substrate guide body 31 is floated by the land surface 12a, a gap is formed between the bottom surface of the substrate guide body 31 and the land surface 12a. Therefore, when the substrate 2 is being transported, the substrate 2 is drilled into the gap to damage the substrate 2. Therefore, as shown in Fig. 13, the inclined surface 34a which expands the diameter of the substrate abutting portion 34 toward the land surface 12a is formed. The problem that the substrate 2 is drilled into the gap can be avoided. That is, the substrate abutting portion 34 of the inclined surface 34a which is expanded toward the flat surface 12a abuts against the side surface of the substrate 2, and is perpendicular to the substrate abutting portion 34. In the case of the case, the substrate 2 is prevented from being displaced downward by the upward force. Further, when the substrate 2 is displaced downward, the holding interval of the substrate abutting portion 34 forming the inclined surface 348 is narrowed. 'So the force of clamping the substrate 2 is further advanced By increasing in one step, the substrate 2 can be prevented from being displaced downward. That is, by forming the inclined surface 34a by the substrate abutting portion 34, it is possible to suppress the substrate 2 from being drilled by the floating guide through the air cushion to form the substrate guide 31 and A gap is formed between the deck surfaces 12a. In the above embodiment, an example in which the vibrator 13a is used to vibrate the platform 12 and the substrate 2 is floated by the floating means 13 is described, but the self-platform surface 12a is used. Although the substrate 2 may be ejected and the substrate 2 may be floated. In the above embodiment, the example in which four stages 12 are arranged in a row is described. However, the minimum unit of arrangement may be two in a row. In the above embodiment, the case where the substrate 2 is transported to the drying device has been described. However, the substrate transport device 1 is provided with a drying function and is transported to the next process. The exposure device (exposure 100127327 Form No. A0101, page 26/44 pages 201214609, eduipment) can also be used. That is, if it is used for transporting the substrate 2 In the above embodiment, the case where the shape of the substrate abutting portion 34 is a cylindrical shape has been described, but the cylindrical member having an arcuate surface may be ' However, it is preferable that the contact surface of the substrate 2 is formed in an arc shape to easily adjust the side surface of the contact substrate 2. Further, the substrate transfer device in the above embodiment is not only FpD but also a solar cell ( Solar cell), organic EL (〇rganic eiec_ troluminescence: organic electroluminescence), etc.

When Cj is in a dry state, it can be applied to many types of fields. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a plan view showing a substrate transfer device according to an embodiment of the present invention. Fig. 2 is a plan view showing a unit in which the substrate transfer device is enlarged. Fig. 3 is a side view of a unit of the above substrate transfer device. Figure 4 is a front elevational view of a unit of the above substrate transport device. Fig. 5 is a plan view showing a state in which the substrate is transported to the adjacent platform by the substrate guide of the substrate transfer device. Fig. 6 is a plan view showing a state in which the substrate guide is retracted and the positioning pin is in a protruding state. Fig. 7 is a plan view showing a state in which the substrate guide is returned to the original position. Fig. 8 is a view showing the above substrate guide, U) is a side view thereof, and (5) is a sectional view thereof. 100127327 Fig. 9 is a flow chart showing the operation of the above substrate transporting device. Form No. A0101 Page 27 of 44 1003351886-0 201214609 Fig. 1 is a plan view of a substrate guide in another embodiment. Figure 11 is a cross-sectional view taken along line A-A of Figure 10; Fig. 12 is a plan view showing a substrate guide in another embodiment. Fig. 13 is a view showing a state in which a substrate is held by a substrate abutting portion in another embodiment. [Description of main component symbols] [0007] 1: Substrate transport device 2: Substrate 2 a: Side surface 10 of the substrate: Platform unit 11 · Base 12: Platform 1 2a: Platform surface 13: Floating means 1 3 a: Vibration The locating pin 20: the transport unit 30: the substrate guide 31: the substrate guide body 32: the guide support portion 32a: the arm portion 33. the guide shaft portion 34: the substrate abutment portion 3 4 a : the inclined surface 3 5 : Sliding bushing 4 0 : Transport drive unit form No. A0101 100127327 Page 28 / Total 44 pages 1003351886-0 201214609 41 : Guide rail 42 : Transport main body portion 42 a : Mounting portion 42 b : Foot portion 43 : Linear motor 44 : LM guide Item 50: Floating unit 51: air cushion

52: Air supply path 60: Push means 61: Coil spring 71: Suction portion 71a: Opening portion 72: Dust cover 81, 82: Air slide table 100127327 Form No. A0101 Page 29 of 44 1003351886-0

Claims (1)

201214609 VII, τ, the scope of the patent: - a kind of substrate transport device ... while the substrate is guided by a thousand guides, the floating substrate is transported, characterized in that the substrate guide comprises: Displacement of the floating unit that floats with the flat A; the substrate guide body that is perpendicular to the surface of the substrate by the side surface of the abutting substrate; the substrate guide body and the liver plate are guided by the surface of the platform The table body is urged to the table of the platform to abut the substrate: 'the height position of the substrate abutting portion is maintained by the height position of the substrate floating on the surface of the platform by the floating single-, money 4, 2 The chasing method is the heart of the substrate of the == profit range item 1, among them. The substrate guide includes air cushions at a position opposite the surface of the thousand ports. The air cushion is supplied to the air cushion to be lifted by the surface of the air and the substrate guide body is floated by the platform surface. ',, as in the substrate transfer device of the i-th or the " patent application scope, the gas cartridge U of the unit is formed differently from the substrate abutting portion of the substrate guide body. 4. The substrate transport apparatus of any of clauses 1-4, wherein the air raft of the floating unit is disposed at a position other than the substrate transport area in the platform. 5. The substrate transport device of claim 2, wherein the substrate guide comprises an air cushion on a bottom surface portion of the substrate guide body opposite to a surface of the platform, the clean unit being air Is supplied to the air cushion by the air cushion 100127327 Form No. A0101 Page 30 / Total 44 Page 1003351886-0 201214609 6 8. As Ejecting air and floating the substrate guide body by the surface of the platform, as in the substrate transporting device of claim 1 or 5, wherein 1 a plate guide further includes money for the substrate guide body (four) Zou, by: the guide branch mining section, the county plate guide body can be displaced in the direction of the surface (four) of the material and is read 'in the state of the (four) member is contracted between the article material and the substrate guide body Provided by the spring member: the substrate guide body is urged to the surface side of the platform. For example, in the case of the substrate transporting device for the full-time item, the towel is cut in the body of the base (four), and the suction portion is opened on the side of the substrate abutting portion. The substrate transport device of claim 7, wherein the guide support portion comprises a material extending the base, and the cover is placed outside the opening π of the = lead to cover the substrate guide body. The entire circumference is matched with a gap formed between the - cover and the substrate abutment. The substrate transfer device of the first to eighth shots of the patent application range is wherein the substrate abutting portion has a sloped surface on which the base (4) side is inclined, and the inclined surface has a shape that expands toward the flat (four) surface. The inclination 100127327 Form number AO! Page 31 of 44 1003351886-0