CN101183216B - 感光性组合物 - Google Patents

感光性组合物 Download PDF

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Publication number
CN101183216B
CN101183216B CN2007101872515A CN200710187251A CN101183216B CN 101183216 B CN101183216 B CN 101183216B CN 2007101872515 A CN2007101872515 A CN 2007101872515A CN 200710187251 A CN200710187251 A CN 200710187251A CN 101183216 B CN101183216 B CN 101183216B
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CN
China
Prior art keywords
carbon number
alkyl
photosensitive composite
absorbance
phenyl
Prior art date
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CN2007101872515A
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English (en)
Chinese (zh)
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CN101183216A (zh
Inventor
柴崎阳子
加藤贤治
有马圣夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Taiyo Holdings Co Ltd
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Taiyo Holdings Co Ltd
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Publication date
Application filed by Taiyo Holdings Co Ltd filed Critical Taiyo Holdings Co Ltd
Publication of CN101183216A publication Critical patent/CN101183216A/zh
Application granted granted Critical
Publication of CN101183216B publication Critical patent/CN101183216B/zh
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
CN2007101872515A 2006-11-15 2007-11-15 感光性组合物 Active CN101183216B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006309097 2006-11-15
JP2006-309097 2006-11-15
JP2006309097 2006-11-15

Publications (2)

Publication Number Publication Date
CN101183216A CN101183216A (zh) 2008-05-21
CN101183216B true CN101183216B (zh) 2011-11-02

Family

ID=39448535

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2007101872515A Active CN101183216B (zh) 2006-11-15 2007-11-15 感光性组合物

Country Status (4)

Country Link
JP (1) JP5153304B2 (ko)
KR (2) KR100963354B1 (ko)
CN (1) CN101183216B (ko)
TW (1) TW200846823A (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010230721A (ja) * 2009-03-25 2010-10-14 Fujifilm Corp 感光性組成物、感光性フィルム、及び、永久パターン形成方法
WO2012036477A2 (ko) 2010-09-16 2012-03-22 주식회사 엘지화학 감광성 수지 조성물, 드라이 필름 솔더 레지스트 및 회로 기판
JP5568679B1 (ja) * 2013-01-30 2014-08-06 太陽インキ製造株式会社 導電性樹脂組成物及び導電回路
JP7270204B2 (ja) 2018-11-09 2023-05-10 互応化学工業株式会社 皮膜の製造方法及びプリント配線板

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001235858A (ja) * 1999-12-15 2001-08-31 Ciba Specialty Chem Holding Inc 感光性樹脂組成物
CN1360685A (zh) * 1999-07-12 2002-07-24 太阳油墨制造株式会社 碱显影型光固化性组合物及使用该组合物所得的烧成物图案
JP2004271788A (ja) * 2003-03-07 2004-09-30 Kyoto Elex Kk アルカリ現像型感光性樹脂組成物及びその樹脂組成物を用いたグリーンシート上へのパターン形成方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3860170B2 (ja) * 2001-06-11 2006-12-20 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド 組み合わされた構造を有するオキシムエステルの光開始剤
JP2003107697A (ja) * 2001-09-28 2003-04-09 Fuji Photo Film Co Ltd 感光性転写材料、フォトマスク材料、フォトマスクおよびフォトマスクの製造方法
JP2004133140A (ja) * 2002-10-09 2004-04-30 Ngk Spark Plug Co Ltd プリント配線板用着色樹脂組成物及びそれを用いたプリント配線板
JP4640177B2 (ja) * 2003-09-24 2011-03-02 日立化成工業株式会社 感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JP4489566B2 (ja) * 2003-11-27 2010-06-23 太陽インキ製造株式会社 硬化性樹脂組成物、その硬化物、およびプリント配線板
JPWO2006004158A1 (ja) 2004-07-07 2008-04-24 太陽インキ製造株式会社 光硬化性・熱硬化性樹脂組成物とそれを用いたドライフィルム、及びその硬化物
JP4599974B2 (ja) * 2004-10-04 2010-12-15 日立化成工業株式会社 感光性樹脂組成物、並びにこれを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
TWI379161B (en) * 2005-04-01 2012-12-11 Jsr Corp Radiation sensitive resin composition, method for forming projections and spacers, projections and spacers, and liquid crystal display element with them
JP2007033685A (ja) * 2005-07-25 2007-02-08 Fujifilm Corp パターン形成材料、並びにパターン形成装置及び永久パターン形成方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1360685A (zh) * 1999-07-12 2002-07-24 太阳油墨制造株式会社 碱显影型光固化性组合物及使用该组合物所得的烧成物图案
JP2001235858A (ja) * 1999-12-15 2001-08-31 Ciba Specialty Chem Holding Inc 感光性樹脂組成物
JP2004271788A (ja) * 2003-03-07 2004-09-30 Kyoto Elex Kk アルカリ現像型感光性樹脂組成物及びその樹脂組成物を用いたグリーンシート上へのパターン形成方法

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
JP特开2003-280193A 2003.10.02
JP特开平11-24254A 1999.01.29
JP特开平8-339084A 1996.12.24

Also Published As

Publication number Publication date
CN101183216A (zh) 2008-05-21
JP2008146044A (ja) 2008-06-26
TW200846823A (en) 2008-12-01
KR20100038187A (ko) 2010-04-13
JP5153304B2 (ja) 2013-02-27
TWI366741B (ko) 2012-06-21
KR20080044195A (ko) 2008-05-20
KR100963354B1 (ko) 2010-06-14

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Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
EE01 Entry into force of recordation of patent licensing contract

Application publication date: 20080521

Assignee: Taiyo Ink Mfg.Co., Ltd.

Assignor: Taiyo Holding Co., Ltd.

Contract record no.: 2011990000116

Denomination of invention: Chromatic photosensitivity composition and method for manufacturing same

Granted publication date: 20111102

License type: Common License

Record date: 20110302

LICC "enforcement, change and cancellation of record of contracts on the licence for exploitation of a patent or utility model"