JP5153304B2 - 感光性組成物 - Google Patents

感光性組成物 Download PDF

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Publication number
JP5153304B2
JP5153304B2 JP2007297036A JP2007297036A JP5153304B2 JP 5153304 B2 JP5153304 B2 JP 5153304B2 JP 2007297036 A JP2007297036 A JP 2007297036A JP 2007297036 A JP2007297036 A JP 2007297036A JP 5153304 B2 JP5153304 B2 JP 5153304B2
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Japan
Prior art keywords
group
carbon atoms
photosensitive composition
absorbance
substituted
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JP2007297036A
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English (en)
Japanese (ja)
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JP2008146044A (ja
Inventor
陽子 柴▲崎▼
賢治 加藤
聖夫 有馬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Taiyo Holdings Co Ltd
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Taiyo Holdings Co Ltd
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Priority to JP2007297036A priority Critical patent/JP5153304B2/ja
Publication of JP2008146044A publication Critical patent/JP2008146044A/ja
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Publication of JP5153304B2 publication Critical patent/JP5153304B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
JP2007297036A 2006-11-15 2007-11-15 感光性組成物 Active JP5153304B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007297036A JP5153304B2 (ja) 2006-11-15 2007-11-15 感光性組成物

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006309097 2006-11-15
JP2006309097 2006-11-15
JP2007297036A JP5153304B2 (ja) 2006-11-15 2007-11-15 感光性組成物

Publications (2)

Publication Number Publication Date
JP2008146044A JP2008146044A (ja) 2008-06-26
JP5153304B2 true JP5153304B2 (ja) 2013-02-27

Family

ID=39448535

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007297036A Active JP5153304B2 (ja) 2006-11-15 2007-11-15 感光性組成物

Country Status (4)

Country Link
JP (1) JP5153304B2 (ko)
KR (2) KR100963354B1 (ko)
CN (1) CN101183216B (ko)
TW (1) TW200846823A (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010230721A (ja) * 2009-03-25 2010-10-14 Fujifilm Corp 感光性組成物、感光性フィルム、及び、永久パターン形成方法
CN103109234A (zh) 2010-09-16 2013-05-15 株式会社Lg化学 光敏树脂组合物、干膜阻焊膜以及电路板
JP5568679B1 (ja) * 2013-01-30 2014-08-06 太陽インキ製造株式会社 導電性樹脂組成物及び導電回路
JP7270204B2 (ja) 2018-11-09 2023-05-10 互応化学工業株式会社 皮膜の製造方法及びプリント配線板

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1318915C (zh) * 1999-07-12 2007-05-30 太阳油墨制造株式会社 碱显影型光固化性组合物及使用该组合物所得的烧成物图案
SG97168A1 (en) * 1999-12-15 2003-07-18 Ciba Sc Holding Ag Photosensitive resin composition
EP1395615B1 (en) * 2001-06-11 2009-10-21 Basf Se Oxime ester photoinitiators having a combined structure
JP2003107697A (ja) * 2001-09-28 2003-04-09 Fuji Photo Film Co Ltd 感光性転写材料、フォトマスク材料、フォトマスクおよびフォトマスクの製造方法
JP2004133140A (ja) * 2002-10-09 2004-04-30 Ngk Spark Plug Co Ltd プリント配線板用着色樹脂組成物及びそれを用いたプリント配線板
JP2004271788A (ja) * 2003-03-07 2004-09-30 Kyoto Elex Kk アルカリ現像型感光性樹脂組成物及びその樹脂組成物を用いたグリーンシート上へのパターン形成方法
JP4640177B2 (ja) * 2003-09-24 2011-03-02 日立化成工業株式会社 感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JP4489566B2 (ja) * 2003-11-27 2010-06-23 太陽インキ製造株式会社 硬化性樹脂組成物、その硬化物、およびプリント配線板
KR100845657B1 (ko) 2004-07-07 2008-07-10 다이요 잉키 세이조 가부시키가이샤 광 경화성·열 경화성 수지 조성물과 그것을 사용한 건식필름, 및 그의 경화물
JP4599974B2 (ja) * 2004-10-04 2010-12-15 日立化成工業株式会社 感光性樹脂組成物、並びにこれを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
KR101329436B1 (ko) * 2005-04-01 2013-11-14 제이에스알 가부시끼가이샤 감방사선성 수지 조성물, 이것으로부터 형성된 돌기 및 스페이서, 및 이들을 구비하는 액정 표시 소자
JP2007033685A (ja) * 2005-07-25 2007-02-08 Fujifilm Corp パターン形成材料、並びにパターン形成装置及び永久パターン形成方法

Also Published As

Publication number Publication date
TWI366741B (ko) 2012-06-21
KR20100038187A (ko) 2010-04-13
KR100963354B1 (ko) 2010-06-14
CN101183216A (zh) 2008-05-21
TW200846823A (en) 2008-12-01
JP2008146044A (ja) 2008-06-26
KR20080044195A (ko) 2008-05-20
CN101183216B (zh) 2011-11-02

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