CN101114822A - 弹性波器件及其制造方法 - Google Patents
弹性波器件及其制造方法 Download PDFInfo
- Publication number
- CN101114822A CN101114822A CNA2007101077388A CN200710107738A CN101114822A CN 101114822 A CN101114822 A CN 101114822A CN A2007101077388 A CNA2007101077388 A CN A2007101077388A CN 200710107738 A CN200710107738 A CN 200710107738A CN 101114822 A CN101114822 A CN 101114822A
- Authority
- CN
- China
- Prior art keywords
- resin
- elastic wave
- wave device
- encapsulation
- surface acoustic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/64—Filters using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/70—Multiple-port networks for connecting several sources or loads, working on different frequencies or frequency bands, to a common load or source
- H03H9/72—Networks using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders; Supports
- H03H9/0538—Constructional combinations of supports or holders with electromechanical or other electronic elements
- H03H9/0566—Constructional combinations of supports or holders with electromechanical or other electronic elements for duplexers
- H03H9/0576—Constructional combinations of supports or holders with electromechanical or other electronic elements for duplexers including surface acoustic wave [SAW] devices
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H2250/00—Indexing scheme relating to dual- or multi-band filters
Abstract
Description
Claims (20)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006200881A JP4712632B2 (ja) | 2006-07-24 | 2006-07-24 | 弾性波デバイス及びその製造方法 |
JP2006200881 | 2006-07-24 | ||
JP2006-200881 | 2006-07-24 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101114822A true CN101114822A (zh) | 2008-01-30 |
CN101114822B CN101114822B (zh) | 2011-03-16 |
Family
ID=38970880
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2007101077388A Expired - Fee Related CN101114822B (zh) | 2006-07-24 | 2007-04-28 | 弹性波器件及其制造方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7602262B2 (zh) |
JP (1) | JP4712632B2 (zh) |
KR (1) | KR100866433B1 (zh) |
CN (1) | CN101114822B (zh) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102160284A (zh) * | 2008-11-28 | 2011-08-17 | 富士通株式会社 | 弹性波器件及其制造方法 |
CN102398030A (zh) * | 2011-12-08 | 2012-04-04 | 大连理工大学 | 一种弹性波阻抗匹配与阻尼吸收梯度材料的制备方法 |
CN104798302A (zh) * | 2012-12-05 | 2015-07-22 | 株式会社村田制作所 | 弹性波装置的制造方法以及弹性波装置 |
CN105409120A (zh) * | 2013-08-13 | 2016-03-16 | 株式会社村田制作所 | 弹性波装置 |
CN105471405A (zh) * | 2014-09-30 | 2016-04-06 | 日本特殊陶业株式会社 | 布线基板及多连片式布线基板 |
CN111130489A (zh) * | 2019-12-04 | 2020-05-08 | 天津大学 | 芯片封装模块及封装方法及具有该模块的电子装置 |
CN113452336A (zh) * | 2020-03-25 | 2021-09-28 | 三安日本科技株式会社 | 弹性波器件封装与包含弹性波器件的模块 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012010054A (ja) * | 2010-06-24 | 2012-01-12 | Ngk Insulators Ltd | 複合基板及びそれを用いた弾性波デバイス |
JP2012182604A (ja) * | 2011-03-01 | 2012-09-20 | Panasonic Corp | 弾性波フィルタ部品 |
JP2012248916A (ja) | 2011-05-25 | 2012-12-13 | Taiyo Yuden Co Ltd | 弾性波デバイスの製造方法 |
JP6020519B2 (ja) * | 2014-06-20 | 2016-11-02 | 株式会社村田製作所 | 弾性波装置 |
US11349452B2 (en) | 2018-06-15 | 2022-05-31 | Resonant Inc. | Transversely-excited film bulk acoustic filters with symmetric layout |
CN109004080A (zh) * | 2018-08-10 | 2018-12-14 | 付伟 | 带有延伸双围堰及焊锡的芯片封装结构及其制作方法 |
DE112020001765T5 (de) * | 2019-04-05 | 2021-12-23 | Resonant Inc. | Packung eines transversal angeregten akustischen Filmvolumenresonators und Verfahren |
CN113422589A (zh) * | 2021-07-09 | 2021-09-21 | 天通瑞宏科技有限公司 | 一种声表滤波器件 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10215143A (ja) | 1997-01-31 | 1998-08-11 | Nec Corp | 弾性表面波装置 |
TW460943B (en) | 1997-06-11 | 2001-10-21 | Applied Materials Inc | Reduction of mobile ion and metal contamination in HDP-CVD chambers using chamber seasoning film depositions |
JP2000059174A (ja) * | 1998-08-14 | 2000-02-25 | Hitachi Media Electoronics Co Ltd | 弾性表面波分波器及びそれを用いた移動体通信機器 |
DE10006446A1 (de) | 2000-02-14 | 2001-08-23 | Epcos Ag | Verkapselung für ein elektrisches Bauelement und Verfahren zur Herstellung |
JP3537400B2 (ja) * | 2000-03-17 | 2004-06-14 | 松下電器産業株式会社 | 半導体内蔵モジュール及びその製造方法 |
CN1543298A (zh) * | 2000-06-27 | 2004-11-03 | ���µ�����ҵ��ʽ���� | 陶瓷叠层器件 |
JP4145476B2 (ja) | 2000-09-25 | 2008-09-03 | Tdk株式会社 | 弾性表面波装置の製造方法 |
JP4496652B2 (ja) | 2001-02-06 | 2010-07-07 | パナソニック株式会社 | 弾性表面波装置とその製造方法 |
KR100431180B1 (ko) * | 2001-12-07 | 2004-05-12 | 삼성전기주식회사 | 표면 탄성파 필터 패키지 제조방법 |
JP3931767B2 (ja) * | 2002-08-29 | 2007-06-20 | 株式会社村田製作所 | 弾性表面波装置、通信装置 |
JP2004336503A (ja) * | 2003-05-09 | 2004-11-25 | Fujitsu Media Device Kk | 弾性表面波素子及びその製造方法 |
KR20050021731A (ko) * | 2003-08-25 | 2005-03-07 | 삼성전기주식회사 | 표면 탄성파 필터 패키지 제조방법 및 그에 사용되는 칩분리판 |
US7301421B2 (en) * | 2004-06-28 | 2007-11-27 | Kyocera Corporation | Surface acoustic wave device, manufacturing method therefor, and communications equipment |
-
2006
- 2006-07-24 JP JP2006200881A patent/JP4712632B2/ja not_active Expired - Fee Related
-
2007
- 2007-04-05 US US11/730,961 patent/US7602262B2/en not_active Expired - Fee Related
- 2007-04-27 KR KR1020070041530A patent/KR100866433B1/ko not_active IP Right Cessation
- 2007-04-28 CN CN2007101077388A patent/CN101114822B/zh not_active Expired - Fee Related
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102160284A (zh) * | 2008-11-28 | 2011-08-17 | 富士通株式会社 | 弹性波器件及其制造方法 |
CN102398030A (zh) * | 2011-12-08 | 2012-04-04 | 大连理工大学 | 一种弹性波阻抗匹配与阻尼吸收梯度材料的制备方法 |
CN102398030B (zh) * | 2011-12-08 | 2013-10-16 | 大连理工大学 | 一种弹性波阻抗匹配与阻尼吸收梯度材料的制备方法 |
CN104798302A (zh) * | 2012-12-05 | 2015-07-22 | 株式会社村田制作所 | 弹性波装置的制造方法以及弹性波装置 |
CN104798302B (zh) * | 2012-12-05 | 2017-07-07 | 株式会社村田制作所 | 弹性波装置的制造方法以及弹性波装置 |
CN105409120A (zh) * | 2013-08-13 | 2016-03-16 | 株式会社村田制作所 | 弹性波装置 |
CN105409120B (zh) * | 2013-08-13 | 2018-04-10 | 株式会社村田制作所 | 弹性波装置 |
CN105471405A (zh) * | 2014-09-30 | 2016-04-06 | 日本特殊陶业株式会社 | 布线基板及多连片式布线基板 |
CN105471405B (zh) * | 2014-09-30 | 2018-08-28 | 日本特殊陶业株式会社 | 布线基板及多连片式布线基板 |
CN111130489A (zh) * | 2019-12-04 | 2020-05-08 | 天津大学 | 芯片封装模块及封装方法及具有该模块的电子装置 |
CN113452336A (zh) * | 2020-03-25 | 2021-09-28 | 三安日本科技株式会社 | 弹性波器件封装与包含弹性波器件的模块 |
Also Published As
Publication number | Publication date |
---|---|
JP4712632B2 (ja) | 2011-06-29 |
KR20080009626A (ko) | 2008-01-29 |
CN101114822B (zh) | 2011-03-16 |
US20080018414A1 (en) | 2008-01-24 |
US7602262B2 (en) | 2009-10-13 |
JP2008028842A (ja) | 2008-02-07 |
KR100866433B1 (ko) | 2008-10-31 |
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C06 | Publication | ||
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ASS | Succession or assignment of patent right |
Owner name: TAIYO YUDEN CO., LTD. Free format text: FORMER OWNER: FUJITSU LTD. |
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C41 | Transfer of patent application or patent right or utility model | ||
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Effective date of registration: 20100802 Address after: Kanagawa Applicant after: Fujitsu Media Devices Ltd Co-applicant after: Taiyo Yuden Co., Ltd. Address before: Kanagawa Applicant before: Fujitsu Media Devices Ltd Co-applicant before: Fujitsu Ltd. |
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Owner name: TAIYO YUDEN CO., LTD. Free format text: FORMER OWNER: FUJITSU MEDIA DEVICES LTD Effective date: 20101201 Free format text: FORMER OWNER: TAIYO YUDEN CO., LTD. |
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Effective date of registration: 20101201 Address after: Tokyo, Japan, Japan Applicant after: Taiyo Yuden Co., Ltd. Address before: Kanagawa Applicant before: Fujitsu Media Devices Ltd Co-applicant before: Taiyo Yuden Co., Ltd. |
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C14 | Grant of patent or utility model | ||
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