CN101045807A - 用于滤色片的遮光性树脂组合物及滤色片 - Google Patents
用于滤色片的遮光性树脂组合物及滤色片 Download PDFInfo
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- CN101045807A CN101045807A CNA2007100913541A CN200710091354A CN101045807A CN 101045807 A CN101045807 A CN 101045807A CN A2007100913541 A CNA2007100913541 A CN A2007100913541A CN 200710091354 A CN200710091354 A CN 200710091354A CN 101045807 A CN101045807 A CN 101045807A
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- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims abstract description 7
- UYAAVKFHBMJOJZ-UHFFFAOYSA-N diimidazo[1,3-b:1',3'-e]pyrazine-5,10-dione Chemical compound O=C1C2=CN=CN2C(=O)C2=CN=CN12 UYAAVKFHBMJOJZ-UHFFFAOYSA-N 0.000 claims abstract description 7
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- 239000013543 active substance Substances 0.000 claims description 20
- 238000009835 boiling Methods 0.000 claims description 20
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- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
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- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
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- 125000002619 bicyclic group Chemical group 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
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- JZZIHCLFHIXETF-UHFFFAOYSA-N dimethylsilicon Chemical compound C[Si]C JZZIHCLFHIXETF-UHFFFAOYSA-N 0.000 description 1
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- 150000002367 halogens Chemical class 0.000 description 1
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- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
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- 229920002521 macromolecule Polymers 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- HSDFKDZBJMDHFF-UHFFFAOYSA-N methyl 3-ethoxypropanoate Chemical class CCOCCC(=O)OC HSDFKDZBJMDHFF-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
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- 229910052760 oxygen Inorganic materials 0.000 description 1
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- 229940059574 pentaerithrityl Drugs 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000000176 photostabilization Effects 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
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- 238000012216 screening Methods 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
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- 239000011734 sodium Substances 0.000 description 1
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- 238000003756 stirring Methods 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- BSUNTQCMCCQSQH-UHFFFAOYSA-N triazine Chemical class C1=CN=NN=C1.C1=CN=NN=C1 BSUNTQCMCCQSQH-UHFFFAOYSA-N 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optical Filters (AREA)
- Materials For Photolithography (AREA)
- Liquid Crystal (AREA)
- Paints Or Removers (AREA)
Abstract
Description
对固体成分重量比率 | 溶剂比率 | 表面活性剂 | |||||||
V-259ME | 碳黑 | PGMEA | PGDA | EP | ANON | 种类 | HLB值 | 配合份 | |
实施例1 | 28% | 50% | 35 | 25 | 20 | 20 | SH3775M | 5 | 0.003 |
实施例2 | 28% | 50% | 35 | 25 | 20 | 20 | SH3775M | 5 | 0.005 |
实施例3 | 28% | 50% | 35 | 25 | 20 | 20 | SH3775M | 5 | 0.02 |
实施例4 | 28% | 50% | 35 | 25 | 20 | 20 | SH3772M | 6 | 0.005 |
实施例5 | 28% | 50% | 35 | 25 | 20 | 20 | SH3773M | 8 | 0.005 |
实施例6 | 28% | 50% | 35 | 25 | 20 | 20 | F-470 | 1 | 0.1 |
实施例7 | 28% | 50% | 40 | 0 | 40 | 20 | SH3775M | 5 | 0.003 |
实施例8 | 28% | 50% | 40 | 0 | 40 | 20 | SH3775M | 5 | 0.005 |
实施例9 | 28% | 50% | 40 | 0 | 40 | 20 | SH3775M | 5 | 0.02 |
实施例10 | 28% | 50% | 40 | 0 | 40 | 20 | F-470 | 1 | 0.1 |
实施例11 | 28% | 50% | 40 | 0 | 50 | 10 | SH3775M | 5 | 0.003 |
实施例12 | 28% | 50% | 40 | 0 | 50 | 10 | SH3775M | 5 | 0.005 |
实施例13 | 28% | 50% | 40 | 0 | 50 | 10 | SH3775M | 5 | 0.02 |
实施例14 | 31% | 45% | 40 | 20 | 20 | 20 | SH3775M | 5 | 0.005 |
实施例15 | 28% | 50% | 30 | 10 | 30 | 30 | SH3775M | 5 | 0.005 |
比较例1 | 28% | 50% | 40 | 5 | 35 | 20 | F-470 | 1 | 0.1 |
比较例3 | 28% | 50% | 40 | 20 | 20 | 20 | SH3771M | 13 | 0.005 |
比较例2 | 28% | 50% | 40 | 0 | 40 | 20 | SH3775M | 5 | 0.005 |
比较例4 | 28% | 50% | 40 | 5 | 50 | 5 | SH3775M | 5 | 0.005 |
比较例5 | 28% | 50% | 40 | 5 | 20 | 35 | SH3775M | 5 | 0.005 |
比较例6 | 28% | 50% | 30 | 30 | 30 | 10 | SH3775M | 5 | 0.005 |
比较例7 | 28% | 50% | 30 | 5 | 55 | 10 | SH3775M | 5 | 0.005 |
比较例8 | 28% | 50% | 55 | 5 | 20 | 20 | SH3775M | 5 | 0.005 |
评估项目 | |||||
平坦性 | 吐出部干燥防止 | 基板干燥性 | 固体成分溶解性 | 保存稳定性 | |
实施例1 | ○ | ○ | ○ | ○ | ○ |
实施例2 | ○ | ○ | ○ | ○ | ○ |
实施例3 | ○ | ○ | ○ | ○ | ○ |
实施例4 | ○ | ○ | ○ | ○ | ○ |
实施例5 | ○ | ○ | ○ | ○ | ○ |
实施例6 | ○ | ○ | ○ | ○ | ○ |
实施例7 | ○ | ○ | ○ | ○ | ○ |
实施例8 | ○ | ○ | ○ | ○ | ○ |
实施例9 | ○ | ○ | ○ | ○ | ○ |
实施例10 | ○ | ○ | ○ | ○ | ○ |
实施例11 | ○ | ○ | ○ | ○ | ○ |
实施例12 | ○ | ○ | ○ | ○ | ○ |
实施例13 | ○ | ○ | ○ | ○ | ○ |
实施例14 | ○ | ○ | ○ | ○ | ○ |
实施例15 | ○ | ○ | ○ | ○ | ○ |
比较例1 | × | ○ | ○ | ○ | ○ |
比较例3 | × | ○ | ○ | ○ | ○ |
比较例2 | ○ | ○ | ○ | ○ | × |
比较例4 | ○ | ○ | ○ | × | ○ |
比较例5 | ○ | ○ | ○ | ○ | × |
比较例6 | ○ | ○ | × | ○ | ○ |
比较例7 | × | ○ | × | ○ | ○ |
比较例8 | × | ○ | × | ○ | ○ |
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