CN101043791A - 用于高温条件的绝缘结构及其制造方法 - Google Patents
用于高温条件的绝缘结构及其制造方法 Download PDFInfo
- Publication number
- CN101043791A CN101043791A CNA2007100872062A CN200710087206A CN101043791A CN 101043791 A CN101043791 A CN 101043791A CN A2007100872062 A CNA2007100872062 A CN A2007100872062A CN 200710087206 A CN200710087206 A CN 200710087206A CN 101043791 A CN101043791 A CN 101043791A
- Authority
- CN
- China
- Prior art keywords
- oxide layer
- substrate
- metal oxide
- pattern
- insulation system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000009413 insulation Methods 0.000 title claims abstract description 41
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 8
- 239000000758 substrate Substances 0.000 claims abstract description 55
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 33
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 33
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 9
- 230000003647 oxidation Effects 0.000 claims description 18
- 238000007254 oxidation reaction Methods 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 16
- 229910052751 metal Inorganic materials 0.000 claims description 13
- 239000002184 metal Substances 0.000 claims description 13
- 230000008018 melting Effects 0.000 claims description 11
- 238000002844 melting Methods 0.000 claims description 11
- 238000001465 metallisation Methods 0.000 claims description 8
- 238000005530 etching Methods 0.000 claims description 4
- 238000002360 preparation method Methods 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 2
- 230000008021 deposition Effects 0.000 claims description 2
- 230000008020 evaporation Effects 0.000 claims description 2
- 238000001704 evaporation Methods 0.000 claims description 2
- 238000002048 anodisation reaction Methods 0.000 abstract 1
- 230000004888 barrier function Effects 0.000 description 13
- 229910000679 solder Inorganic materials 0.000 description 8
- 230000014509 gene expression Effects 0.000 description 6
- 229920000647 polyepoxide Polymers 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 239000003822 epoxy resin Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000004806 packaging method and process Methods 0.000 description 4
- 239000004020 conductor Substances 0.000 description 3
- 238000005538 encapsulation Methods 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000009940 knitting Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000036647 reaction Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/483—Containers
- H01L33/486—Containers adapted for surface mounting
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/05—Insulated conductive substrates, e.g. insulated metal substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/62—Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/58—Optical field-shaping elements
- H01L33/60—Reflective elements
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/03—Metal processing
- H05K2203/0315—Oxidising metal
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0502—Patterning and lithography
- H05K2203/0542—Continuous temporary metal layer over metal pattern
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Led Device Packages (AREA)
- Insulated Metal Substrates For Printed Circuits (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
Description
Claims (11)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060025454 | 2006-03-20 | ||
KR1020060025454A KR100764386B1 (ko) | 2006-03-20 | 2006-03-20 | 고온공정에 적합한 절연구조체 및 그 제조방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101043791A true CN101043791A (zh) | 2007-09-26 |
CN100562212C CN100562212C (zh) | 2009-11-18 |
Family
ID=38516871
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2007100872062A Active CN100562212C (zh) | 2006-03-20 | 2007-03-19 | 用于高温条件的绝缘结构及其制造方法 |
Country Status (5)
Country | Link |
---|---|
US (3) | US7998879B2 (zh) |
JP (1) | JP4959387B2 (zh) |
KR (1) | KR100764386B1 (zh) |
CN (1) | CN100562212C (zh) |
TW (1) | TWI341018B (zh) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100917028B1 (ko) * | 2007-12-26 | 2009-09-10 | 삼성전기주식회사 | 아노다이징을 이용한 금속 기판 및 이의 제조방법 |
KR101124102B1 (ko) * | 2009-08-24 | 2012-03-21 | 삼성전기주식회사 | 발광 소자 패키지용 기판 및 이를 포함하는 발광 소자 패키지 |
KR101237668B1 (ko) | 2011-08-10 | 2013-02-26 | 삼성전기주식회사 | 반도체 패키지 기판 |
CN109960438B (zh) * | 2019-03-19 | 2021-04-23 | 京东方科技集团股份有限公司 | 基板及其制作方法、触控显示装置 |
US11608162B2 (en) * | 2020-06-10 | 2023-03-21 | Goodrich Corporation | Aircraft wheel torque bar spacer |
Family Cites Families (38)
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US5414543A (en) * | 1992-08-24 | 1995-05-09 | Samsung Electronics Co., Ltd. | Method for manufacturing a multiple level liquid crystal display using alternating metal and metal oxide layers |
JPH06120368A (ja) * | 1992-10-08 | 1994-04-28 | Shinko Electric Ind Co Ltd | 半導体パッケージ及びこれを用いた半導体装置 |
JP3036324B2 (ja) * | 1993-10-14 | 2000-04-24 | 松下電器産業株式会社 | 電子部品とその製造方法 |
JPH07193344A (ja) * | 1993-12-27 | 1995-07-28 | Casio Comput Co Ltd | 配線基板 |
JPH07193345A (ja) * | 1993-12-27 | 1995-07-28 | Casio Comput Co Ltd | 配線基板 |
KR100453015B1 (ko) | 1994-07-04 | 2005-09-02 | 세이코 엡슨 가부시키가이샤 | 표면처리방법및그장치,기판의표면처리방법및기판의제조방법 |
DE69737086T2 (de) | 1996-08-27 | 2007-05-16 | Seiko Epson Corp. | Trennverfahren, verfahren zur übertragung eines dünnfilmbauelements, und unter verwendung des übertragungsverfahrens hergestelltes flüssigkristall-anzeigebauelement |
USRE38466E1 (en) | 1996-11-12 | 2004-03-16 | Seiko Epson Corporation | Manufacturing method of active matrix substrate, active matrix substrate and liquid crystal display device |
US7208725B2 (en) | 1998-11-25 | 2007-04-24 | Rohm And Haas Electronic Materials Llc | Optoelectronic component with encapsulant |
FR2810845B1 (fr) | 2000-06-23 | 2002-08-23 | Alstom | Module de puissance a composants electroniques de puissance et procede de fabrication d'un tel module |
JP3906654B2 (ja) | 2000-07-18 | 2007-04-18 | ソニー株式会社 | 半導体発光素子及び半導体発光装置 |
JP2002174822A (ja) | 2000-12-06 | 2002-06-21 | Sharp Corp | アクティブマトリクス基板の製造方法 |
JP3919594B2 (ja) | 2001-05-10 | 2007-05-30 | キヤノン株式会社 | 光電融合基板および電子機器 |
US6818465B2 (en) | 2001-08-22 | 2004-11-16 | Sony Corporation | Nitride semiconductor element and production method for nitride semiconductor element |
JP2003218034A (ja) | 2002-01-17 | 2003-07-31 | Sony Corp | 選択成長方法、半導体発光素子及びその製造方法 |
JP3815335B2 (ja) | 2002-01-18 | 2006-08-30 | ソニー株式会社 | 半導体発光素子及びその製造方法 |
KR20030083452A (ko) * | 2002-04-23 | 2003-10-30 | 서울반도체 주식회사 | 고휘도 발광 다이오드 및 그 제조 방법 |
KR100499129B1 (ko) | 2002-09-02 | 2005-07-04 | 삼성전기주식회사 | 발광 다이오드 및 그 제조방법 |
US7002182B2 (en) | 2002-09-06 | 2006-02-21 | Sony Corporation | Semiconductor light emitting device integral type semiconductor light emitting unit image display unit and illuminating unit |
JP4134770B2 (ja) * | 2003-03-17 | 2008-08-20 | カシオ計算機株式会社 | 半導体装置およびその製造方法 |
KR100714639B1 (ko) | 2003-10-21 | 2007-05-07 | 삼성전기주식회사 | 발광 소자 |
JP4556422B2 (ja) | 2003-12-02 | 2010-10-06 | パナソニック株式会社 | 電子部品およびその製造方法 |
KR100506740B1 (ko) | 2003-12-23 | 2005-08-08 | 삼성전기주식회사 | 질화물 반도체 발광소자 및 그 제조방법 |
KR100601506B1 (ko) | 2004-08-24 | 2006-07-19 | 삼성전기주식회사 | 양극 산화에 의한 미세 회로패턴이 형성된 패키지 기판의제조 방법 |
KR100664985B1 (ko) | 2004-10-26 | 2007-01-09 | 삼성전기주식회사 | 질화물계 반도체 소자 |
KR100665222B1 (ko) | 2005-07-26 | 2007-01-09 | 삼성전기주식회사 | 확산재료를 이용한 엘이디 패키지 및 그 제조 방법 |
KR100661614B1 (ko) | 2005-10-07 | 2006-12-26 | 삼성전기주식회사 | 질화물계 반도체 발광소자 및 그 제조방법 |
KR100723247B1 (ko) | 2006-01-10 | 2007-05-29 | 삼성전기주식회사 | 칩코팅형 led 패키지 및 그 제조방법 |
KR100735325B1 (ko) | 2006-04-17 | 2007-07-04 | 삼성전기주식회사 | 발광다이오드 패키지 및 그 제조방법 |
KR100930171B1 (ko) | 2006-12-05 | 2009-12-07 | 삼성전기주식회사 | 백색 발광장치 및 이를 이용한 백색 광원 모듈 |
KR100855065B1 (ko) | 2007-04-24 | 2008-08-29 | 삼성전기주식회사 | 발광 다이오드 패키지 |
KR100982980B1 (ko) | 2007-05-15 | 2010-09-17 | 삼성엘이디 주식회사 | 면 광원 장치 및 이를 구비하는 lcd 백라이트 유닛 |
KR101164026B1 (ko) | 2007-07-12 | 2012-07-18 | 삼성전자주식회사 | 질화물계 반도체 발광소자 및 그 제조방법 |
KR100891761B1 (ko) | 2007-10-19 | 2009-04-07 | 삼성전기주식회사 | 반도체 발광소자, 그의 제조방법 및 이를 이용한 반도체발광소자 패키지 |
KR101332794B1 (ko) | 2008-08-05 | 2013-11-25 | 삼성전자주식회사 | 발광 장치, 이를 포함하는 발광 시스템, 상기 발광 장치 및발광 시스템의 제조 방법 |
KR20100030470A (ko) | 2008-09-10 | 2010-03-18 | 삼성전자주식회사 | 다양한 색 온도의 백색광을 제공할 수 있는 발광 장치 및 발광 시스템 |
KR101530876B1 (ko) | 2008-09-16 | 2015-06-23 | 삼성전자 주식회사 | 발광량이 증가된 발광 소자, 이를 포함하는 발광 장치, 상기 발광 소자 및 발광 장치의 제조 방법 |
US8008683B2 (en) | 2008-10-22 | 2011-08-30 | Samsung Led Co., Ltd. | Semiconductor light emitting device |
-
2006
- 2006-03-20 KR KR1020060025454A patent/KR100764386B1/ko active IP Right Grant
-
2007
- 2007-03-09 TW TW096108134A patent/TWI341018B/zh active
- 2007-03-19 JP JP2007069924A patent/JP4959387B2/ja active Active
- 2007-03-19 CN CNB2007100872062A patent/CN100562212C/zh active Active
- 2007-03-19 US US11/723,236 patent/US7998879B2/en active Active
-
2011
- 2011-07-06 US US13/177,276 patent/US20110260198A1/en not_active Abandoned
-
2014
- 2014-11-26 US US14/555,186 patent/US9231167B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US7998879B2 (en) | 2011-08-16 |
TW200742016A (en) | 2007-11-01 |
KR100764386B1 (ko) | 2007-10-08 |
JP2007258714A (ja) | 2007-10-04 |
TWI341018B (en) | 2011-04-21 |
US20070215894A1 (en) | 2007-09-20 |
US20110260198A1 (en) | 2011-10-27 |
US20150084089A1 (en) | 2015-03-26 |
JP4959387B2 (ja) | 2012-06-20 |
KR20070095145A (ko) | 2007-09-28 |
US9231167B2 (en) | 2016-01-05 |
CN100562212C (zh) | 2009-11-18 |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: JIANGSU ZHONGKE GLOBALTEK OPTOELECTRONICS TECHNOLO Free format text: FORMER OWNER: JIANGSU GLOBALTEK OPTOELECTRONICS TECHNOLOGY CO., LTD. Effective date: 20101029 |
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Free format text: CORRECT: ADDRESS; FROM: 226007 YUTAI INDUSTRY PARK, NO.299, XINGYUAN ROAD, ECONOMIC DEVELOPMENT ZONE, TONGZHOU, NANTONG CITY, JIANGSU PROVINCE TO: 226300 NO.299, XINGYUAN ROAD, ECONOMIC DEVELOPMENT ZONE, TONGZHOU DISTRICT, NANTONG CITY, JIANGSU PROVINCE |
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TR01 | Transfer of patent right |
Effective date of registration: 20101109 Address after: Gyeonggi Do, South Korea Co-patentee after: Samsung LED Co., Ltd. Patentee after: Samsung Electro-Mechanics Co., Ltd. Address before: Gyeonggi Do, South Korea Patentee before: Samsung Electro-Mechanics Co., Ltd. |
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ASS | Succession or assignment of patent right |
Owner name: SAMSUNG ELECTRONICS CO., LTD. Free format text: FORMER OWNER: SAMSUNG LED CO., LTD. Effective date: 20130105 |
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C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20130105 Address after: Gyeonggi Do, South Korea Patentee after: Samsung Electro-Mechanics Co., Ltd. Patentee after: Samsung Electronics Co., Ltd. Address before: Gyeonggi Do, South Korea Patentee before: Samsung Electro-Mechanics Co., Ltd. Patentee before: Samsung LED Co., Ltd. |
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ASS | Succession or assignment of patent right |
Owner name: SAMSUNG ELECTRONICS CO., LTD. Free format text: FORMER OWNER: SAMSUNG ELECTRO-MECHANICS CO., LTD. Effective date: 20140218 Free format text: FORMER OWNER: SAMSUNG ELECTRONICS CO., LTD. Effective date: 20140218 |
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Effective date of registration: 20140218 Address after: Gyeonggi Do, South Korea Patentee after: Samsung Electronics Co., Ltd. Address before: Gyeonggi Do, South Korea Patentee before: Samsung Electro-Mechanics Co., Ltd. Patentee before: Samsung Electronics Co., Ltd. |