CN100591588C - 在受控空气中传输衬底的设备 - Google Patents

在受控空气中传输衬底的设备 Download PDF

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Publication number
CN100591588C
CN100591588C CN200510066155A CN200510066155A CN100591588C CN 100591588 C CN100591588 C CN 100591588C CN 200510066155 A CN200510066155 A CN 200510066155A CN 200510066155 A CN200510066155 A CN 200510066155A CN 100591588 C CN100591588 C CN 100591588C
Authority
CN
China
Prior art keywords
microenvironment
chamber
confined chamber
equipment according
micropump
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN200510066155A
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English (en)
Chinese (zh)
Other versions
CN1689929A (zh
Inventor
罗兰·贝尔纳
神原久德
让·吕克·里瓦尔
卡特林·勒盖
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alcatel CIT SA
Alcatel Lucent NV
Original Assignee
Alcatel NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alcatel NV filed Critical Alcatel NV
Publication of CN1689929A publication Critical patent/CN1689929A/zh
Application granted granted Critical
Publication of CN100591588C publication Critical patent/CN100591588C/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67353—Closed carriers specially adapted for a single substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67389—Closed carriers characterised by atmosphere control
    • H01L21/67393—Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/14—Wafer cassette transporting

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Physical Vapour Deposition (AREA)
CN200510066155A 2004-04-21 2005-04-21 在受控空气中传输衬底的设备 Expired - Fee Related CN100591588C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0450751 2004-04-21
FR0450751A FR2869452B1 (fr) 2004-04-21 2004-04-21 Dispositif pour le transport de substrats sous atmosphere controlee

Publications (2)

Publication Number Publication Date
CN1689929A CN1689929A (zh) 2005-11-02
CN100591588C true CN100591588C (zh) 2010-02-24

Family

ID=34942117

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200510066155A Expired - Fee Related CN100591588C (zh) 2004-04-21 2005-04-21 在受控空气中传输衬底的设备

Country Status (7)

Country Link
US (1) US7694700B2 (fr)
EP (1) EP1589565B1 (fr)
JP (1) JP4712425B2 (fr)
CN (1) CN100591588C (fr)
AT (1) ATE350763T1 (fr)
DE (1) DE602005000396T2 (fr)
FR (1) FR2869452B1 (fr)

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* Cited by examiner, † Cited by third party
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WO2007107983A2 (fr) * 2006-03-17 2007-09-27 Shlomo Shmuelov Système de stockage et de purge pour tranches semi-conductrices
US8297319B2 (en) * 2006-09-14 2012-10-30 Brooks Automation, Inc. Carrier gas system and coupling substrate carrier to a loadport
TWI387040B (zh) * 2006-12-19 2013-02-21 Applied Materials Inc 感測承載件中基板之設備
JP2008258477A (ja) * 2007-04-06 2008-10-23 Canon Inc 処理装置及び雰囲気置換方法
US9105673B2 (en) 2007-05-09 2015-08-11 Brooks Automation, Inc. Side opening unified pod
JP5521307B2 (ja) * 2008-10-24 2014-06-11 東京エレクトロン株式会社 パーティクル捕集装置及びパーティクル捕集方法
FR2963327B1 (fr) * 2010-07-27 2012-08-24 Air Liquide Dispositif de stockage d'articles sous atmosphere controlee
US9926626B2 (en) * 2012-07-09 2018-03-27 Bengbu Design & Research Institute For Glass Industry System and method for processing substrates
JP6257616B2 (ja) * 2012-07-09 2018-01-10 サン−ゴバン グラス フランスＳａｉｎｔ−Ｇｏｂａｉｎ Ｇｌａｓｓ Ｆｒａｎｃｅ コーティングされた基板を処理するための、プロセスボックス、装置及び方法
CN104919580B (zh) 2012-07-09 2017-09-29 法国圣戈班玻璃厂 用于对物体进行热处理的装置和方法
CN107505702B (zh) * 2017-09-06 2020-01-03 四川梓冠光电科技有限公司 一种微机电型可调光衰减器
US11794314B2 (en) 2021-08-30 2023-10-24 Kla Corporation Quick swap chuck with vacuum holding interchangeable top plate

Family Cites Families (30)

* Cited by examiner, † Cited by third party
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JPH0710323B2 (ja) * 1987-05-12 1995-02-08 日本真空技術株式会社 真空排気系用微粒子トラツプ
JPH0377313A (ja) * 1989-08-19 1991-04-02 Mitsubishi Electric Corp 化学気相成長装置
US5137063A (en) * 1990-02-05 1992-08-11 Texas Instruments Incorporated Vented vacuum semiconductor wafer cassette
US5217053A (en) * 1990-02-05 1993-06-08 Texas Instruments Incorporated Vented vacuum semiconductor wafer cassette
JPH03270049A (ja) * 1990-03-19 1991-12-02 Fujitsu Ltd 基板収納容器
US5255783A (en) * 1991-12-20 1993-10-26 Fluoroware, Inc. Evacuated wafer container
FR2697000B1 (fr) * 1992-10-16 1994-11-25 Commissariat Energie Atomique Boîte plate de confinement d'un objet plat sous atmosphère spéciale.
US5346518A (en) * 1993-03-23 1994-09-13 International Business Machines Corporation Vapor drain system
US5575394A (en) * 1994-07-15 1996-11-19 Fluoroware, Inc. Wafer shipper and package
JPH0927542A (ja) * 1995-07-13 1997-01-28 Hitachi Ltd 搬送容器
CA2218185C (fr) * 1995-10-13 2005-12-27 Empak, Inc. Pene mecanique actionne par le vide
FR2741328B1 (fr) * 1995-11-20 1997-12-19 Commissariat Energie Atomique Boite de stockage d'un objet destine a etre protege d'une contamination physico-chimique
US6026963A (en) * 1996-02-23 2000-02-22 Memc Electronic Materials, Inc. Moisture barrier bag having window
JP3783973B2 (ja) * 1996-03-22 2006-06-07 独立行政法人 日本原子力研究開発機構 減圧容器内におけるダスト回収方法
US5879458A (en) * 1996-09-13 1999-03-09 Semifab Incorporated Molecular contamination control system
JP3324731B2 (ja) * 1997-03-24 2002-09-17 株式会社ハイモールド 記憶ディスク収納ケース
JPH1165094A (ja) * 1997-08-22 1999-03-05 Nikon Corp 収納ケース、露光装置及びデバイス製造装置
JPH11168135A (ja) * 1997-12-03 1999-06-22 Toshiba Corp 基板保管装置および基板保管方法
US6153044A (en) * 1998-04-30 2000-11-28 Euv Llc Protection of lithographic components from particle contamination
US6168364B1 (en) * 1999-04-19 2001-01-02 Tdk Corporation Vacuum clean box, clean transfer method and apparatus therefor
JP3769417B2 (ja) * 1999-06-30 2006-04-26 株式会社東芝 基板収納容器
FR2802335B1 (fr) * 1999-12-09 2002-04-05 Cit Alcatel Systeme et procede de controle de minienvironnement
US6135168A (en) * 1999-12-22 2000-10-24 Industrial Technology Research Institute Standard mechanical interface wafer pod gas filling system
JP3939101B2 (ja) * 2000-12-04 2007-07-04 株式会社荏原製作所 基板搬送方法および基板搬送容器
US6792982B2 (en) * 2001-01-24 2004-09-21 Spectrx, Inc. Vacuum device for substance extraction
US6906783B2 (en) * 2002-02-22 2005-06-14 Asml Holding N.V. System for using a two part cover for protecting a reticle
TW587197B (en) * 2002-03-15 2004-05-11 Nikon Corp Mask safekeeping apparatus, exposure apparatus and manufacturing method of device
JP2004039986A (ja) * 2002-07-05 2004-02-05 Tokyo Seimitsu Co Ltd 露光マスク収容器、露光マスク入出力機構及び収容器内気圧調整装置
US6955197B2 (en) * 2002-08-31 2005-10-18 Applied Materials, Inc. Substrate carrier having door latching and substrate clamping mechanisms
US7159719B2 (en) * 2003-07-31 2007-01-09 Intel Corporation Thermophoretic protection of reticles

Also Published As

Publication number Publication date
US7694700B2 (en) 2010-04-13
FR2869452A1 (fr) 2005-10-28
CN1689929A (zh) 2005-11-02
EP1589565A1 (fr) 2005-10-26
JP2005311361A (ja) 2005-11-04
DE602005000396D1 (de) 2007-02-15
EP1589565B1 (fr) 2007-01-03
ATE350763T1 (de) 2007-01-15
DE602005000396T2 (de) 2007-11-29
FR2869452B1 (fr) 2006-09-08
US20050238476A1 (en) 2005-10-27
JP4712425B2 (ja) 2011-06-29

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C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20100224

Termination date: 20130421