CN100528561C - 可成像元件、形成图像的方法以及制备的图像 - Google Patents

可成像元件、形成图像的方法以及制备的图像 Download PDF

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Publication number
CN100528561C
CN100528561C CN200580036939.2A CN200580036939A CN100528561C CN 100528561 C CN100528561 C CN 100528561C CN 200580036939 A CN200580036939 A CN 200580036939A CN 100528561 C CN100528561 C CN 100528561C
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CN
China
Prior art keywords
top layer
mixture
group
monomer
copolymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN200580036939.2A
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English (en)
Chinese (zh)
Other versions
CN101048281A (zh
Inventor
A·P·基特森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
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Eastman Kodak Co
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Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of CN101048281A publication Critical patent/CN101048281A/zh
Application granted granted Critical
Publication of CN100528561C publication Critical patent/CN100528561C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/36—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties
    • B41M5/368—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties involving the creation of a soluble/insoluble or hydrophilic/hydrophobic permeability pattern; Peel development
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/14—Multiple imaging layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M2205/00—Printing methods or features related to printing methods; Location or type of the layers
    • B41M2205/38—Intermediate layers; Layers between substrate and imaging layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/11—Vinyl alcohol polymer or derivative
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/165—Thermal imaging composition

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
CN200580036939.2A 2004-10-26 2005-10-19 可成像元件、形成图像的方法以及制备的图像 Expired - Fee Related CN100528561C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/973,799 2004-10-26
US10/973,799 US6969570B1 (en) 2004-10-26 2004-10-26 Solvent resistant imageable element

Publications (2)

Publication Number Publication Date
CN101048281A CN101048281A (zh) 2007-10-03
CN100528561C true CN100528561C (zh) 2009-08-19

Family

ID=35405112

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200580036939.2A Expired - Fee Related CN100528561C (zh) 2004-10-26 2005-10-19 可成像元件、形成图像的方法以及制备的图像

Country Status (5)

Country Link
US (1) US6969570B1 (enExample)
EP (1) EP1805014A1 (enExample)
JP (1) JP4634462B2 (enExample)
CN (1) CN100528561C (enExample)
WO (1) WO2006047150A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070065737A1 (en) * 2004-12-06 2007-03-22 Eastman Kodak Company Multilayer imageable elements having good solvent resistance
US7163770B1 (en) 2006-01-23 2007-01-16 Eastman Kodak Company Multilayer imageable element containing sulfonamido resin
CN101547791A (zh) * 2006-11-28 2009-09-30 伊斯曼柯达公司 具有优良耐溶剂性的多层可成像元件
JP5319097B2 (ja) * 2007-10-16 2013-10-16 イーストマン コダック カンパニー ポジ型平版印刷版原版及びその製版方法
JP2014137426A (ja) * 2013-01-15 2014-07-28 Sumitomo Bakelite Co Ltd 感光性組成物
JP6027912B2 (ja) * 2013-02-22 2016-11-16 東京応化工業株式会社 相分離構造を含む構造体の製造方法、及びパターン形成方法、並びにトップコート材料
JP6065749B2 (ja) * 2013-05-29 2017-01-25 住友ベークライト株式会社 感光性樹脂組成物および電子装置
JP6065750B2 (ja) * 2013-05-29 2017-01-25 住友ベークライト株式会社 感光性樹脂組成物および電子装置
JP7206616B2 (ja) * 2017-04-28 2023-01-18 住友ベークライト株式会社 ポリマー

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6316565B1 (en) * 1996-12-31 2001-11-13 Hyundai Electronics Industries Co., Ltd. Amide- or imide-introduced copolymer, preparation thereof and a photoresist comprising the same
EP1195646A1 (en) * 2000-10-03 2002-04-10 Fuji Photo Film Co., Ltd. Photosensitive lithographic printing plate precursor
EP1208995A2 (en) * 2000-11-24 2002-05-29 Ricoh Company, Ltd. Light-permeable thermosensitive recording material
JP2003177518A (ja) * 2001-12-10 2003-06-27 Toyo Ink Mfg Co Ltd 化学増幅型ポジ型レジスト組成物、及びそれを用いたパターン形成方法
EP1268660B1 (en) * 1999-12-22 2004-07-28 Kodak Polychrome Graphics Company Ltd. Lithographic printing plate having high chemical resistance

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JP2638887B2 (ja) * 1988-02-26 1997-08-06 東ソー株式会社 感光性組成物
US6103445A (en) 1997-03-07 2000-08-15 Board Of Regents, The University Of Texas System Photoresist compositions comprising norbornene derivative polymers with acid labile groups
US6090532A (en) 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
JP3779444B2 (ja) 1997-07-28 2006-05-31 富士写真フイルム株式会社 赤外線レーザ用ポジ型感光性組成物
EP1003645B1 (en) 1997-08-14 2003-09-24 Kodak Polychrome Graphics Company Ltd. Method of making electronic parts
GB9722861D0 (en) 1997-10-29 1997-12-24 Horsell Graphic Ind Ltd Improvements in relation to the manufacture of lithographic printing forms
KR100520148B1 (ko) 1997-12-31 2006-05-12 주식회사 하이닉스반도체 신규한바이시클로알켄유도체와이를이용한포토레지스트중합체및이중합체를함유한포토레지스트조성물
GB9811813D0 (en) 1998-06-03 1998-07-29 Horsell Graphic Ind Ltd Polymeric compounds
US6352812B1 (en) 1998-06-23 2002-03-05 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
US6358669B1 (en) 1998-06-23 2002-03-19 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
US6352811B1 (en) 1998-06-23 2002-03-05 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
KR100557609B1 (ko) 1999-02-22 2006-03-10 주식회사 하이닉스반도체 신규의 포토레지스트 가교제 및 이를 이용한 포토레지스트 조성물
JP2000330265A (ja) 1999-05-24 2000-11-30 Fuji Photo Film Co Ltd 画像形成材料
KR100301063B1 (ko) * 1999-07-29 2001-09-22 윤종용 감광성 중합체 및 이들을 포함하는 화학 증폭형 포토레지스트 조성물
DE19936331B4 (de) 1999-08-02 2006-12-07 Kodak Polychrome Graphics Gmbh Copolymer zur Erhöhung der Chemikalien- und Entwicklerresistenz von positiv arbeitenden Druckplatten
US6528228B2 (en) 1999-12-22 2003-03-04 Kodak Polychrome Graphics, Llc Chemical resistant underlayer for positive-working printing plates
US6406828B1 (en) 2000-02-24 2002-06-18 Shipley Company, L.L.C. Polymer and photoresist compositions
US6777157B1 (en) 2000-02-26 2004-08-17 Shipley Company, L.L.C. Copolymers and photoresist compositions comprising same
JP2003021902A (ja) * 2001-07-09 2003-01-24 Fuji Photo Film Co Ltd 平版印刷版用原版
US6723490B2 (en) * 2001-11-15 2004-04-20 Kodak Polychrome Graphics Llc Minimization of ablation in thermally imageable elements
JP4173686B2 (ja) * 2002-05-13 2008-10-29 富士フイルム株式会社 画像記録材料
US6858359B2 (en) 2002-10-04 2005-02-22 Kodak Polychrome Graphics, Llp Thermally sensitive, multilayer imageable element
EP1433594B1 (en) 2002-12-27 2008-04-09 FUJIFILM Corporation Heat-sensitive lithographic printing plate precursor
JP2004287194A (ja) * 2003-03-24 2004-10-14 Fuji Photo Film Co Ltd 感熱性平版印刷版

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6316565B1 (en) * 1996-12-31 2001-11-13 Hyundai Electronics Industries Co., Ltd. Amide- or imide-introduced copolymer, preparation thereof and a photoresist comprising the same
EP1268660B1 (en) * 1999-12-22 2004-07-28 Kodak Polychrome Graphics Company Ltd. Lithographic printing plate having high chemical resistance
EP1195646A1 (en) * 2000-10-03 2002-04-10 Fuji Photo Film Co., Ltd. Photosensitive lithographic printing plate precursor
EP1208995A2 (en) * 2000-11-24 2002-05-29 Ricoh Company, Ltd. Light-permeable thermosensitive recording material
JP2003177518A (ja) * 2001-12-10 2003-06-27 Toyo Ink Mfg Co Ltd 化学増幅型ポジ型レジスト組成物、及びそれを用いたパターン形成方法

Also Published As

Publication number Publication date
WO2006047150A1 (en) 2006-05-04
CN101048281A (zh) 2007-10-03
JP4634462B2 (ja) 2011-02-16
EP1805014A1 (en) 2007-07-11
US6969570B1 (en) 2005-11-29
JP2008518276A (ja) 2008-05-29

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Granted publication date: 20090819

Termination date: 20131019