CN100482850C - 直列式有机电致发光制造装置 - Google Patents
直列式有机电致发光制造装置 Download PDFInfo
- Publication number
- CN100482850C CN100482850C CNB2005100547673A CN200510054767A CN100482850C CN 100482850 C CN100482850 C CN 100482850C CN B2005100547673 A CNB2005100547673 A CN B2005100547673A CN 200510054767 A CN200510054767 A CN 200510054767A CN 100482850 C CN100482850 C CN 100482850C
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12044—OLED
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004098403A JP2005285576A (ja) | 2004-03-30 | 2004-03-30 | インライン式有機エレクトロルミネセンス製造装置 |
JP2004098403 | 2004-03-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1676659A CN1676659A (zh) | 2005-10-05 |
CN100482850C true CN100482850C (zh) | 2009-04-29 |
Family
ID=35049405
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2005100547673A Active CN100482850C (zh) | 2004-03-30 | 2005-03-11 | 直列式有机电致发光制造装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2005285576A (de) |
KR (1) | KR100692170B1 (de) |
CN (1) | CN100482850C (de) |
TW (1) | TW200539740A (de) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007149482A (ja) * | 2005-11-28 | 2007-06-14 | Konica Minolta Holdings Inc | 有機el素子の製造方法 |
KR101200593B1 (ko) * | 2006-02-17 | 2012-11-12 | 황창훈 | 유기소자 양산용 증착용 기판 이송용 롤러장치 |
JP2007328999A (ja) * | 2006-06-07 | 2007-12-20 | Tokyo Electron Ltd | 発光素子の製造装置および発光素子の製造方法 |
JP5051870B2 (ja) * | 2006-06-14 | 2012-10-17 | 東京エレクトロン株式会社 | 発光素子の製造装置および発光素子の製造方法 |
JP5051869B2 (ja) * | 2006-06-14 | 2012-10-17 | 東京エレクトロン株式会社 | 発光素子および発光素子の製造方法 |
JP5280667B2 (ja) * | 2007-11-08 | 2013-09-04 | 株式会社ジャパンディスプレイ | 有機el表示装置の製造方法及び蒸着マスクのクリーニング方法 |
JP5185678B2 (ja) * | 2008-03-31 | 2013-04-17 | 芝浦メカトロニクス株式会社 | スパッタリング装置及び方法 |
CN102598863B (zh) * | 2009-11-19 | 2015-07-29 | 株式会社尼康 | 引导部件、基板、基板筒、基板处理装置、引导部件连接方法、显示元件的制造方法及显示元件的制造装置 |
JP2011127190A (ja) * | 2009-12-18 | 2011-06-30 | Showa Denko Kk | インライン式成膜装置、磁気記録媒体の製造方法、及びゲートバルブ |
TWI398533B (zh) * | 2009-12-29 | 2013-06-11 | Au Optronics Corp | 蔭罩及其製作方法 |
JP5602483B2 (ja) * | 2010-04-23 | 2014-10-08 | パナソニック株式会社 | 発光モジュール及びそのモジュールを用いた照明器具 |
KR20140110971A (ko) * | 2011-12-23 | 2014-09-17 | 솔렉셀, 인크. | 반도체 금속화와 상호접속부를 위한 고 생산성 스프레이 처리 |
JP2013159841A (ja) * | 2012-02-08 | 2013-08-19 | Tokyo Electron Ltd | 成膜装置 |
JP6196078B2 (ja) * | 2012-10-18 | 2017-09-13 | 株式会社アルバック | 成膜装置 |
KR101341850B1 (ko) * | 2012-10-24 | 2013-12-16 | 주식회사 선익시스템 | 유기 증착 마스크의 플라즈마 건식세정을 위한 시스템 |
JP5968770B2 (ja) * | 2012-11-30 | 2016-08-10 | 長州産業株式会社 | 真空成膜装置 |
JP6814998B1 (ja) * | 2019-12-25 | 2021-01-20 | 株式会社プラズマイオンアシスト | プラズマ処理装置 |
KR20210083082A (ko) * | 2019-12-26 | 2021-07-06 | 캐논 톡키 가부시키가이샤 | 성막 시스템 및 성막 방법 |
WO2022137022A1 (ja) * | 2020-12-25 | 2022-06-30 | 株式会社半導体エネルギー研究所 | 表示装置の製造装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06173002A (ja) * | 1992-02-26 | 1994-06-21 | Nkk Corp | イオンプレ−ティング装置 |
JP2001007507A (ja) * | 1999-06-25 | 2001-01-12 | Fujitsu Ltd | リフロー装置 |
JP3683788B2 (ja) * | 1999-08-11 | 2005-08-17 | 東京エレクトロン株式会社 | 加熱処理装置の冷却方法及び加熱処理装置 |
JP4343480B2 (ja) * | 2001-02-08 | 2009-10-14 | 株式会社半導体エネルギー研究所 | 成膜装置及び発光装置の作製方法 |
JP4704605B2 (ja) * | 2001-05-23 | 2011-06-15 | 淳二 城戸 | 連続蒸着装置、蒸着装置及び蒸着方法 |
JP2003171763A (ja) * | 2001-12-07 | 2003-06-20 | Sony Corp | インライン式真空成膜装置およびその冷却制御方法 |
JP2003309167A (ja) * | 2002-04-16 | 2003-10-31 | Canon Inc | 基板保持装置 |
US20030221620A1 (en) * | 2002-06-03 | 2003-12-04 | Semiconductor Energy Laboratory Co., Ltd. | Vapor deposition device |
JP2005281784A (ja) * | 2004-03-30 | 2005-10-13 | Mitsubishi-Hitachi Metals Machinery Inc | 基板の冷却構造 |
-
2004
- 2004-03-30 JP JP2004098403A patent/JP2005285576A/ja active Pending
-
2005
- 2005-03-02 TW TW094106283A patent/TW200539740A/zh unknown
- 2005-03-11 CN CNB2005100547673A patent/CN100482850C/zh active Active
- 2005-03-11 KR KR1020050020364A patent/KR100692170B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
CN1676659A (zh) | 2005-10-05 |
TW200539740A (en) | 2005-12-01 |
KR100692170B1 (ko) | 2007-03-12 |
TWI311895B (de) | 2009-07-01 |
JP2005285576A (ja) | 2005-10-13 |
KR20060043861A (ko) | 2006-05-15 |
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Legal Events
Date | Code | Title | Description |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: MITSUBISHI HEAVY INDUSTRY CORP. Free format text: FORMER OWNER: MITSUBISHI HITACHI STEEL MACHINERY CO LTD Effective date: 20090717 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20090717 Address after: Tokyo, Japan Patentee after: Mit-subishi Heavy Industries Ltd. Address before: Tokyo, Japan Co-patentee before: Mit-subishi Heavy Industries Ltd. Patentee before: MITSUBISHI Hitachi Iron Machinery Co., Ltd. |