CN100413112C - 投影曝光设备中的成像装置 - Google Patents

投影曝光设备中的成像装置 Download PDF

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Publication number
CN100413112C
CN100413112C CNB028282299A CN02828229A CN100413112C CN 100413112 C CN100413112 C CN 100413112C CN B028282299 A CNB028282299 A CN B028282299A CN 02828229 A CN02828229 A CN 02828229A CN 100413112 C CN100413112 C CN 100413112C
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CN
China
Prior art keywords
optical element
axis
imaging device
linear actuator
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CNB028282299A
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English (en)
Chinese (zh)
Other versions
CN1620731A (zh
Inventor
W·哈梅尔
J·菲舍尔
K·-E·奥贝勒
E·默茨
R·罗尔
K·里夫
S·舍恩加特
M·诺伊迈尔
B·特罗斯巴赫
T·拉赛尔
U·韦伯
M·米尔贝耶
H·霍尔德雷尔
A·科尔
J·韦伯
J·利佩尔特
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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Publication date
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Publication of CN1620731A publication Critical patent/CN1620731A/zh
Application granted granted Critical
Publication of CN100413112C publication Critical patent/CN100413112C/zh
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lens Barrels (AREA)
CNB028282299A 2001-12-19 2002-12-17 投影曝光设备中的成像装置 Expired - Lifetime CN100413112C (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE10162289 2001-12-19
DE10162289.9 2001-12-19
DE10225266A DE10225266A1 (de) 2001-12-19 2002-06-07 Abbildungseinrichtung in einer Projektionsbelichtungsanlage
DE10225266.1 2002-06-07

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN200810125368.5A Division CN101308333B (zh) 2001-12-19 2002-12-17 一种用于微刻的投影曝光设备的成像装置的光学元件的操纵装置

Publications (2)

Publication Number Publication Date
CN1620731A CN1620731A (zh) 2005-05-25
CN100413112C true CN100413112C (zh) 2008-08-20

Family

ID=7709733

Family Applications (2)

Application Number Title Priority Date Filing Date
CNB028282299A Expired - Lifetime CN100413112C (zh) 2001-12-19 2002-12-17 投影曝光设备中的成像装置
CN200810125368.5A Expired - Lifetime CN101308333B (zh) 2001-12-19 2002-12-17 一种用于微刻的投影曝光设备的成像装置的光学元件的操纵装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN200810125368.5A Expired - Lifetime CN101308333B (zh) 2001-12-19 2002-12-17 一种用于微刻的投影曝光设备的成像装置的光学元件的操纵装置

Country Status (8)

Country Link
US (5) US7304717B2 (ja)
EP (1) EP1456891B1 (ja)
JP (1) JP2005513767A (ja)
KR (1) KR100895833B1 (ja)
CN (2) CN100413112C (ja)
AU (1) AU2002363876A1 (ja)
DE (1) DE10225266A1 (ja)
WO (1) WO2003052511A2 (ja)

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US7486382B2 (en) 2001-12-19 2009-02-03 Carl Zeiss Smt Ag Imaging device in a projection exposure machine
DE10225266A1 (de) 2001-12-19 2003-07-03 Zeiss Carl Smt Ag Abbildungseinrichtung in einer Projektionsbelichtungsanlage
WO2005006416A1 (ja) 2003-07-09 2005-01-20 Nikon Corporation 結合装置、露光装置、及びデバイス製造方法
US6977461B2 (en) * 2003-12-15 2005-12-20 Asml Netherlands B.V. System and method for moving an object employing piezo actuators
US7738193B2 (en) 2004-06-29 2010-06-15 Carl Zeiss Smt Ag Positioning unit and alignment device for an optical element
JP4980922B2 (ja) * 2004-11-18 2012-07-18 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置及びマイクロリソグラフィ投影露光装置の像面湾曲を修正するための方法
KR101332497B1 (ko) * 2005-01-26 2013-11-26 칼 짜이스 에스엠테 게엠베하 광학 조립체를 포함하는 마이크로-리소그래피의 투사 노광기
WO2006133800A1 (en) 2005-06-14 2006-12-21 Carl Zeiss Smt Ag Lithography projection objective, and a method for correcting image defects of the same
US20070013889A1 (en) * 2005-07-12 2007-01-18 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufactured thereby having an increase in depth of focus
JP5069232B2 (ja) * 2005-07-25 2012-11-07 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の投影対物レンズ
DE102006039821A1 (de) * 2006-08-25 2008-03-13 Carl Zeiss Smt Ag Optisches System, insbesondere ein Projektionsobjektiv oder ein Beleuchtungssystem
EP1921480A1 (de) * 2006-11-07 2008-05-14 Carl Zeiss SMT AG Optische Vorrichtung mit kinematischen Komponenten zur Manipulation beziehungsweise Positionsbestimmung
DE102008034285A1 (de) * 2008-07-22 2010-02-04 Carl Zeiss Smt Ag Aktuator zur hochpräzisen Positionierung bzw. Manipulation von Komponenten und Projektionsbelichtungsanlage für die Mikrolithographie
DE102008047562B4 (de) 2008-09-16 2012-11-08 Carl Zeiss Smt Gmbh Vorrichtung zur Dämpfung von Schwingungen in Projektionsbelichtungsanlagen für die Halbleiterlithographie
DE102009009221A1 (de) 2009-02-17 2010-08-26 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Halbleiterlithographie mit einem Aktuatorsystem
DE102010013298B4 (de) * 2010-03-29 2012-10-04 Carl Zeiss Smt Gmbh Positionierverfahren für eine optische Anordnung einer Projektionsbelichtungsanlage
US8711186B2 (en) * 2011-05-02 2014-04-29 Microvision, Inc. Scanning projection apparatus with tangential compensation
WO2012163643A1 (de) 2011-05-30 2012-12-06 Carl Zeiss Smt Gmbh Bewegung eines optischen elements in einer mikrolithografischen projektionsbelichtungsanlage
JP5864762B2 (ja) 2011-10-07 2016-02-17 カール・ツァイス・エスエムティー・ゲーエムベーハー リソグラフィシステムの光学素子の動きの制御方法
FI20116111L (fi) * 2011-11-10 2013-05-11 Sensapex Oy Mikromanipulaattorijärjestely
DE102013201082A1 (de) 2013-01-24 2014-03-13 Carl Zeiss Smt Gmbh Anordnung zur Aktuierung eines Elementes in einer mikrolithographischen Projektionsbelichtungsanlage
DE102013201604B4 (de) * 2013-01-31 2014-10-23 Picofine GmbH Kippvorrichtung und Verfahren zum Kippen
WO2014140143A2 (en) 2013-03-15 2014-09-18 Carl Zeiss Smt Gmbh Piezo drive unit
DE102015209078A1 (de) 2015-05-18 2016-11-24 Carl Zeiss Smt Gmbh Sensoranordnung und verfahren zur ermittlung einer jeweiligen position einer anzahl von spiegeln einer lithographieanlage
DE102015209077A1 (de) 2015-05-18 2016-11-24 Carl Zeiss Smt Gmbh Sensoranordnung und verfahren zur ermittlung einer jeweiligen position einer anzahl von spiegeln einer lithographieanlage
DE102015209259A1 (de) 2015-05-20 2016-11-24 Carl Zeiss Smt Gmbh Positonssensorvorrichtung und verfahren zum ermitteln einer position zumindest eines spiegels einer lithographieanlage
WO2017207016A1 (en) * 2016-05-30 2017-12-07 Carl Zeiss Smt Gmbh Optical imaging arrangement with a piezoelectric device
US10816026B2 (en) * 2017-08-09 2020-10-27 Raytheon Company Separable physical coupler using piezoelectric forces for decoupling
CN213457488U (zh) * 2020-06-30 2021-06-15 诚瑞光学(常州)股份有限公司 镜头模组及电子设备
DE102022116699A1 (de) * 2022-07-05 2024-01-11 Carl Zeiss Smt Gmbh Optisches Element und Projektionsbelichtungsanlage für die Halbleiterlithographie
DE102023200329B3 (de) 2023-01-17 2024-05-02 Carl Zeiss Smt Gmbh Optische Baugruppe, Verfahren zur Montage der optischen Baugruppe und Projektionsbelichtungsanlage
DE102023205553A1 (de) 2023-06-14 2024-05-29 Carl Zeiss Smt Gmbh Justageeinheit, Justageeinrichtung und Lithographiesystem
DE102023205570A1 (de) 2023-06-14 2024-06-27 Carl Zeiss Smt Gmbh Optisches system und projektionsbelichtungsanlage

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JP2000173467A (ja) * 1998-12-10 2000-06-23 Toshiba Corp カラー陰極線管の蛍光面形成用露光装置
JP2000216078A (ja) * 1999-01-22 2000-08-04 Nikon Corp 露光方法
US20020117953A1 (en) * 2001-02-27 2002-08-29 Huei-Pei Kuo Electron source having planar emission region and focusing structure

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JPH11274031A (ja) * 1998-03-20 1999-10-08 Canon Inc 露光装置およびデバイス製造方法ならびに位置決め装置
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DE10225266A1 (de) * 2001-12-19 2003-07-03 Zeiss Carl Smt Ag Abbildungseinrichtung in einer Projektionsbelichtungsanlage
US7486382B2 (en) * 2001-12-19 2009-02-03 Carl Zeiss Smt Ag Imaging device in a projection exposure machine
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Publication number Priority date Publication date Assignee Title
JP2000173467A (ja) * 1998-12-10 2000-06-23 Toshiba Corp カラー陰極線管の蛍光面形成用露光装置
JP2000216078A (ja) * 1999-01-22 2000-08-04 Nikon Corp 露光方法
US20020117953A1 (en) * 2001-02-27 2002-08-29 Huei-Pei Kuo Electron source having planar emission region and focusing structure

Also Published As

Publication number Publication date
CN1620731A (zh) 2005-05-25
AU2002363876A8 (en) 2003-06-30
AU2002363876A1 (en) 2003-06-30
WO2003052511A2 (de) 2003-06-26
WO2003052511A3 (de) 2004-02-05
KR20040065287A (ko) 2004-07-21
DE10225266A1 (de) 2003-07-03
CN101308333A (zh) 2008-11-19
CN101308333B (zh) 2013-08-07
KR100895833B1 (ko) 2009-05-06
US8514371B2 (en) 2013-08-20
US7961294B2 (en) 2011-06-14
US20110199597A1 (en) 2011-08-18
US7710542B2 (en) 2010-05-04
US20080174757A1 (en) 2008-07-24
US7304717B2 (en) 2007-12-04
EP1456891A2 (de) 2004-09-15
US20090040487A1 (en) 2009-02-12
JP2005513767A (ja) 2005-05-12
EP1456891B1 (de) 2012-05-30
US20090141258A1 (en) 2009-06-04
US20040263812A1 (en) 2004-12-30

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Address after: Germany Cohen

Patentee after: CARL ZEISS SMT GmbH

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Patentee before: Carl Zeiss SMT AG

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Granted publication date: 20080820

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