KR20040065287A - 투영 노광 장치의 결상 장치 - Google Patents
투영 노광 장치의 결상 장치 Download PDFInfo
- Publication number
- KR20040065287A KR20040065287A KR10-2004-7009439A KR20047009439A KR20040065287A KR 20040065287 A KR20040065287 A KR 20040065287A KR 20047009439 A KR20047009439 A KR 20047009439A KR 20040065287 A KR20040065287 A KR 20040065287A
- Authority
- KR
- South Korea
- Prior art keywords
- optical element
- axis
- optical
- imaging device
- manipulator
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
- G03F7/706—Aberration measurement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lens Barrels (AREA)
Abstract
Description
Claims (8)
- 적어도 하나의 광학소자, 및 선형 드라이브를 구비하며 상기 광학소자의 위치를 조작하는 적어도 하나의 조작기를 포함하는 마이크로 리소그래피용 투영 노광 장치의 결상 장치에 있어서,상기 선형 드라이브(11)는 이동축(17) 방향으로 서로에 대해 상대적으로 이동이 가능한 구동 서브영역(14)과 비구동 서브영역(15)을 구비하며, 상기 서브영역들(14,15)은 상기 이동축(17)에 적어도 대략 수직한 활동 방향을 갖는 기능소자들(18)을 통해 그리고 상기 이동축(17)에 적어도 대략 평행한 활동 방향을 갖는 기능소자들(19)을 통해 적어도 일시적으로 상호연결되는 것을 특징으로 하는 결상 장치.
- 제 1 항에 있어서,상기 기능소자들(18,19)은 압전소자들로서 설계되는 것을 특징으로 하는 결상 장치.
- 제 1 항 또는 제 2 항에 있어서,상기 두 개의 서브영역들(14,15)은 안내수단(바(bar)(20))을 통해 상호 연결되는 것을 특징으로 하는 결상 장치.
- 제 1 항, 제 2 항 또는 제 3 항에 있어서,상기 광학소자(10)의 조작은, 결상 장치(7)에 영구적으로 연결된 고정부(13)에 상기 선형 드라이브들(11) 중 적어도 하나를 통해 연결된 이동부(12)에 상기 광학소자(10)가 영구적으로 연결되어 있다는 사실에 의해 수행되는 것을 특징으로 하는 결상 장치.
- 제 1 항 내지 제 4 항 중 어느 한 항에 있어서,상기 조작기(9)는 상기 광학소자(10)의 광축(21)에 적어도 대략 평행한 이동축(17)을 갖는 세 개의 선형 드라이브들(11)을 구비하며, 상기 광학소자(10)의 위치는 적어도 세 개의 센서(24)에 의해 검출되고, 상기 광축(21) 방향으로의 순수한 이동으로서 조작을 제어하는 것이 가능한 것을 특징으로 하는 결상 장치.
- 제 1 항 내지 제 5 항 중 어느 한 항에 있어서,상기 조작기(9)는 상기 광학소자(10)의 광축(21)에 적어도 대략 평행한 이동축(17)을 갖는 세 개의 선형 드라이브들(11)을 구비하며, 상기 광학소자(10)의 위치는 적어도 세 개의 센서(24)에 의해 검출되고, 기울임(tilting) 이동으로서 조작을 제어하는 것이 가능한 것을 특징으로 하는 결상 장치.
- 제 1 항 내지 제 4 항 중 어느 한 항에 있어서,상기 광학소자(10)의 조작(9)은 상기 광학소자(10)의 광축(21)에 수직한 평면 내에 놓여 있는 이동축(17)을 가지는 적어도 두 개의 선형 드라이브들(11)에 의해 수행되며, 상기 광학소자(10)의 조작은 상기 광축(21)에 수직한 평면과 동일한 평면 또는 그 평면에 평행한 평면 내에서 수행되는 것을 특징으로 하는 결상 장치.
- 제 1 항 내지 제 4 항 중 어느 한 항에 있어서,상기 광학소자(10)는, 상기 광학소자(10)가 탑재된 한 점 또는 축(베어링 점(33 또는 35))을 중심으로 적어도 하나의 선형 드라이브(11)를 통해 회전할 수 있는 것을 특징으로 하는 결상 장치.
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10162289 | 2001-12-19 | ||
DE10162289.9 | 2001-12-19 | ||
DE10225266A DE10225266A1 (de) | 2001-12-19 | 2002-06-07 | Abbildungseinrichtung in einer Projektionsbelichtungsanlage |
DE10225266.1 | 2002-06-07 | ||
PCT/EP2002/014380 WO2003052511A2 (de) | 2001-12-19 | 2002-12-17 | Abbildungseinrichtung in einer projektionsbelichtungsanlage |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20040065287A true KR20040065287A (ko) | 2004-07-21 |
KR100895833B1 KR100895833B1 (ko) | 2009-05-06 |
Family
ID=7709733
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020047009439A KR100895833B1 (ko) | 2001-12-19 | 2002-12-17 | 투영 노광 장치의 결상 장치 |
Country Status (8)
Country | Link |
---|---|
US (5) | US7304717B2 (ko) |
EP (1) | EP1456891B1 (ko) |
JP (1) | JP2005513767A (ko) |
KR (1) | KR100895833B1 (ko) |
CN (2) | CN100413112C (ko) |
AU (1) | AU2002363876A1 (ko) |
DE (1) | DE10225266A1 (ko) |
WO (1) | WO2003052511A2 (ko) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7486382B2 (en) | 2001-12-19 | 2009-02-03 | Carl Zeiss Smt Ag | Imaging device in a projection exposure machine |
DE10225266A1 (de) | 2001-12-19 | 2003-07-03 | Zeiss Carl Smt Ag | Abbildungseinrichtung in einer Projektionsbelichtungsanlage |
JP4844123B2 (ja) | 2003-07-09 | 2011-12-28 | 株式会社ニコン | 露光装置、及びデバイス製造方法 |
US6977461B2 (en) * | 2003-12-15 | 2005-12-20 | Asml Netherlands B.V. | System and method for moving an object employing piezo actuators |
US7738193B2 (en) | 2004-06-29 | 2010-06-15 | Carl Zeiss Smt Ag | Positioning unit and alignment device for an optical element |
WO2006053751A2 (de) * | 2004-11-18 | 2006-05-26 | Carl Zeiss Smt Ag | Projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage |
JP5022914B2 (ja) * | 2005-01-26 | 2012-09-12 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 光学アセンブリ |
WO2006133800A1 (en) | 2005-06-14 | 2006-12-21 | Carl Zeiss Smt Ag | Lithography projection objective, and a method for correcting image defects of the same |
US20070013889A1 (en) * | 2005-07-12 | 2007-01-18 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and device manufactured thereby having an increase in depth of focus |
JP5069232B2 (ja) * | 2005-07-25 | 2012-11-07 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ投影露光装置の投影対物レンズ |
DE102006039821A1 (de) | 2006-08-25 | 2008-03-13 | Carl Zeiss Smt Ag | Optisches System, insbesondere ein Projektionsobjektiv oder ein Beleuchtungssystem |
EP1921480A1 (de) * | 2006-11-07 | 2008-05-14 | Carl Zeiss SMT AG | Optische Vorrichtung mit kinematischen Komponenten zur Manipulation beziehungsweise Positionsbestimmung |
DE102008034285A1 (de) * | 2008-07-22 | 2010-02-04 | Carl Zeiss Smt Ag | Aktuator zur hochpräzisen Positionierung bzw. Manipulation von Komponenten und Projektionsbelichtungsanlage für die Mikrolithographie |
DE102008047562B4 (de) | 2008-09-16 | 2012-11-08 | Carl Zeiss Smt Gmbh | Vorrichtung zur Dämpfung von Schwingungen in Projektionsbelichtungsanlagen für die Halbleiterlithographie |
DE102009009221A1 (de) | 2009-02-17 | 2010-08-26 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage für die Halbleiterlithographie mit einem Aktuatorsystem |
DE102010013298B4 (de) * | 2010-03-29 | 2012-10-04 | Carl Zeiss Smt Gmbh | Positionierverfahren für eine optische Anordnung einer Projektionsbelichtungsanlage |
US8711186B2 (en) * | 2011-05-02 | 2014-04-29 | Microvision, Inc. | Scanning projection apparatus with tangential compensation |
JP6186352B2 (ja) * | 2011-05-30 | 2017-08-23 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ用の投影露光装置の光学素子を動かす方法 |
KR101660140B1 (ko) | 2011-10-07 | 2016-09-26 | 칼 짜이스 에스엠테 게엠베하 | 리소그래피 시스템에서 광학적 요소의 이동을 제어하기 위한 방법 |
FI20116111L (fi) * | 2011-11-10 | 2013-05-11 | Sensapex Oy | Mikromanipulaattorijärjestely |
DE102013201082A1 (de) | 2013-01-24 | 2014-03-13 | Carl Zeiss Smt Gmbh | Anordnung zur Aktuierung eines Elementes in einer mikrolithographischen Projektionsbelichtungsanlage |
DE102013201604B4 (de) * | 2013-01-31 | 2014-10-23 | Picofine GmbH | Kippvorrichtung und Verfahren zum Kippen |
WO2014140143A2 (en) | 2013-03-15 | 2014-09-18 | Carl Zeiss Smt Gmbh | Piezo drive unit |
DE102015209078A1 (de) | 2015-05-18 | 2016-11-24 | Carl Zeiss Smt Gmbh | Sensoranordnung und verfahren zur ermittlung einer jeweiligen position einer anzahl von spiegeln einer lithographieanlage |
DE102015209077A1 (de) | 2015-05-18 | 2016-11-24 | Carl Zeiss Smt Gmbh | Sensoranordnung und verfahren zur ermittlung einer jeweiligen position einer anzahl von spiegeln einer lithographieanlage |
DE102015209259A1 (de) | 2015-05-20 | 2016-11-24 | Carl Zeiss Smt Gmbh | Positonssensorvorrichtung und verfahren zum ermitteln einer position zumindest eines spiegels einer lithographieanlage |
WO2017207016A1 (en) * | 2016-05-30 | 2017-12-07 | Carl Zeiss Smt Gmbh | Optical imaging arrangement with a piezoelectric device |
US10816026B2 (en) * | 2017-08-09 | 2020-10-27 | Raytheon Company | Separable physical coupler using piezoelectric forces for decoupling |
CN213457488U (zh) * | 2020-06-30 | 2021-06-15 | 诚瑞光学(常州)股份有限公司 | 镜头模组及电子设备 |
DE102022116699A1 (de) * | 2022-07-05 | 2024-01-11 | Carl Zeiss Smt Gmbh | Optisches Element und Projektionsbelichtungsanlage für die Halbleiterlithographie |
DE102023200329B3 (de) | 2023-01-17 | 2024-05-02 | Carl Zeiss Smt Gmbh | Optische Baugruppe, Verfahren zur Montage der optischen Baugruppe und Projektionsbelichtungsanlage |
DE102023205553A1 (de) | 2023-06-14 | 2024-05-29 | Carl Zeiss Smt Gmbh | Justageeinheit, Justageeinrichtung und Lithographiesystem |
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US4928030A (en) * | 1988-09-30 | 1990-05-22 | Rockwell International Corporation | Piezoelectric actuator |
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DE19715226A1 (de) * | 1997-04-11 | 1998-10-15 | Univ Schiller Jena | Verfahren und Vorrichtung zur hochgenauen Mikropositionierung |
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JP2000173467A (ja) * | 1998-12-10 | 2000-06-23 | Toshiba Corp | カラー陰極線管の蛍光面形成用露光装置 |
JP2000216078A (ja) * | 1999-01-22 | 2000-08-04 | Nikon Corp | 露光方法 |
DE19910295C2 (de) | 1999-03-09 | 2002-06-20 | Storz Karl Gmbh & Co Kg | Medizinisches oder technisches endoskopisches Instrument |
DE19910947A1 (de) | 1999-03-12 | 2000-09-14 | Zeiss Carl Fa | Vorrichtung zum Verschieben eines optischen Elementes entlang der optischen Achse |
JP4945845B2 (ja) * | 2000-03-31 | 2012-06-06 | 株式会社ニコン | 光学素子保持装置、鏡筒及び露光装置並びにマイクロデバイスの製造方法。 |
US20040042094A1 (en) | 2000-12-28 | 2004-03-04 | Tomoyuki Matsuyama | Projection optical system and production method therefor, exposure system and production method therefor, and production method for microdevice |
US6815875B2 (en) * | 2001-02-27 | 2004-11-09 | Hewlett-Packard Development Company, L.P. | Electron source having planar emission region and focusing structure |
US7035056B2 (en) * | 2001-11-07 | 2006-04-25 | Asml Netherlands B.V. | Piezoelectric actuator and a lithographic apparatus and a device manufacturing method |
DE10225266A1 (de) | 2001-12-19 | 2003-07-03 | Zeiss Carl Smt Ag | Abbildungseinrichtung in einer Projektionsbelichtungsanlage |
US7486382B2 (en) * | 2001-12-19 | 2009-02-03 | Carl Zeiss Smt Ag | Imaging device in a projection exposure machine |
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-
2002
- 2002-06-07 DE DE10225266A patent/DE10225266A1/de not_active Withdrawn
- 2002-12-17 AU AU2002363876A patent/AU2002363876A1/en not_active Abandoned
- 2002-12-17 WO PCT/EP2002/014380 patent/WO2003052511A2/de active Application Filing
- 2002-12-17 CN CNB028282299A patent/CN100413112C/zh not_active Expired - Lifetime
- 2002-12-17 CN CN200810125368.5A patent/CN101308333B/zh not_active Expired - Lifetime
- 2002-12-17 KR KR1020047009439A patent/KR100895833B1/ko active IP Right Grant
- 2002-12-17 US US10/250,495 patent/US7304717B2/en not_active Expired - Fee Related
- 2002-12-17 EP EP02798340A patent/EP1456891B1/de not_active Expired - Lifetime
- 2002-12-17 JP JP2003553336A patent/JP2005513767A/ja active Pending
-
2007
- 2007-11-07 US US11/936,768 patent/US7710542B2/en not_active Expired - Fee Related
-
2008
- 2008-10-08 US US12/247,597 patent/US7961294B2/en not_active Expired - Lifetime
-
2009
- 2009-01-30 US US12/363,065 patent/US20090141258A1/en not_active Abandoned
-
2011
- 2011-04-28 US US13/096,112 patent/US8514371B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CN101308333A (zh) | 2008-11-19 |
US20090141258A1 (en) | 2009-06-04 |
US20040263812A1 (en) | 2004-12-30 |
WO2003052511A3 (de) | 2004-02-05 |
US7961294B2 (en) | 2011-06-14 |
AU2002363876A1 (en) | 2003-06-30 |
US8514371B2 (en) | 2013-08-20 |
US7710542B2 (en) | 2010-05-04 |
US20080174757A1 (en) | 2008-07-24 |
US20090040487A1 (en) | 2009-02-12 |
CN101308333B (zh) | 2013-08-07 |
CN100413112C (zh) | 2008-08-20 |
US7304717B2 (en) | 2007-12-04 |
EP1456891A2 (de) | 2004-09-15 |
JP2005513767A (ja) | 2005-05-12 |
WO2003052511A2 (de) | 2003-06-26 |
EP1456891B1 (de) | 2012-05-30 |
AU2002363876A8 (en) | 2003-06-30 |
US20110199597A1 (en) | 2011-08-18 |
CN1620731A (zh) | 2005-05-25 |
KR100895833B1 (ko) | 2009-05-06 |
DE10225266A1 (de) | 2003-07-03 |
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