CN100344631C - 具有二环骨架的化合物及其用途 - Google Patents

具有二环骨架的化合物及其用途 Download PDF

Info

Publication number
CN100344631C
CN100344631C CNB031192351A CN03119235A CN100344631C CN 100344631 C CN100344631 C CN 100344631C CN B031192351 A CNB031192351 A CN B031192351A CN 03119235 A CN03119235 A CN 03119235A CN 100344631 C CN100344631 C CN 100344631C
Authority
CN
China
Prior art keywords
compound
ink
record
group
solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB031192351A
Other languages
English (en)
Chinese (zh)
Other versions
CN1443765A (zh
Inventor
石川贵之
榊原悌互
三浦大祐
宇野英满
小野升
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN1443765A publication Critical patent/CN1443765A/zh
Application granted granted Critical
Publication of CN100344631C publication Critical patent/CN100344631C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/22—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains four or more hetero rings
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B47/00—Porphines; Azaporphines
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B47/00—Porphines; Azaporphines
    • C09B47/04—Phthalocyanines abbreviation: Pc
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/30—Inkjet printing inks
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/30—Inkjet printing inks
    • C09D11/32—Inkjet printing inks characterised by colouring agents
    • C09D11/328—Inkjet printing inks characterised by colouring agents characterised by dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/30—Inkjet printing inks
    • C09D11/38—Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/54—Inks based on two liquids, one liquid being the ink, the other liquid being a reaction solution, a fixer or a treatment solution for the ink
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/15—Deposition of organic active material using liquid deposition, e.g. spin coating characterised by the solvent used
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/30—Coordination compounds
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/30—Coordination compounds
    • H10K85/311—Phthalocyanine

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
  • Ink Jet (AREA)
CNB031192351A 2002-03-08 2003-03-06 具有二环骨架的化合物及其用途 Expired - Fee Related CN100344631C (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP063700/2002 2002-03-08
JP2002063700 2002-03-08
JP2003047459A JP4502357B2 (ja) 2002-03-08 2003-02-25 新規化合物とその合成方法、インク、インクカートリッジ、記録ユニット、インクジェット記録装置及び記録方法
JP047459/2003 2003-02-25

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CNB2005101166556A Division CN100543180C (zh) 2002-03-08 2003-03-06 有机半导体膜的图案形成方法

Publications (2)

Publication Number Publication Date
CN1443765A CN1443765A (zh) 2003-09-24
CN100344631C true CN100344631C (zh) 2007-10-24

Family

ID=27759750

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB031192351A Expired - Fee Related CN100344631C (zh) 2002-03-08 2003-03-06 具有二环骨架的化合物及其用途

Country Status (6)

Country Link
US (5) US7090719B2 (enExample)
EP (2) EP1688417B1 (enExample)
JP (1) JP4502357B2 (enExample)
CN (1) CN100344631C (enExample)
AT (1) ATE404565T1 (enExample)
DE (1) DE60322762D1 (enExample)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4502357B2 (ja) * 2002-03-08 2010-07-14 キヤノン株式会社 新規化合物とその合成方法、インク、インクカートリッジ、記録ユニット、インクジェット記録装置及び記録方法
JP2004006750A (ja) * 2002-03-27 2004-01-08 Mitsubishi Chemicals Corp 有機半導体材料及び有機電子デバイス
US7193237B2 (en) 2002-03-27 2007-03-20 Mitsubishi Chemical Corporation Organic semiconductor material and organic electronic device
JP2008270843A (ja) * 2002-03-27 2008-11-06 Mitsubishi Chemicals Corp 有機半導体材料及び有機電子デバイス
US20040141036A1 (en) * 2002-11-07 2004-07-22 Canon Kabushiki Kaisha Process and apparatus for weatherability test of image
JP2005330414A (ja) * 2004-05-21 2005-12-02 Fuji Photo Film Co Ltd 膜形成用塗布液、その塗布液を用いて得られる絶縁膜、及びそれを有する電子デバイス
CN101014671A (zh) * 2004-09-08 2007-08-08 佳能株式会社 颜料、颜料的制备方法、颜料分散体、颜料分散体的制备方法、记录用油墨、记录方法以及记录图像
EP1792950A1 (en) * 2004-09-08 2007-06-06 Canon Kabushiki Kaisha Intermediate chemical substance in pigment crystal production stage, process for producing pigment crystal from the same, and crystalline pigment
JP5031369B2 (ja) * 2004-09-08 2012-09-19 キヤノン株式会社 被覆微粒子、分散微粒子、被覆微粒子の製造方法、インク、記録方法及び記録画像
US7988276B2 (en) * 2004-11-19 2011-08-02 Canon Kabushiki Kaisha Ink jet printing method and ink jet printing apparatus
US7654662B2 (en) * 2004-11-19 2010-02-02 Canon Kabushiki Kaisha Ink jet printing method and ink jet printing apparatus
WO2006069282A2 (en) * 2004-12-22 2006-06-29 California Institute Of Technology Degradable p0lymers and methods of preparation thereof
WO2006129823A1 (ja) * 2005-05-31 2006-12-07 Canon Kabushiki Kaisha 画像退色防止剤、画像形成要素、被記録媒体、画像形成方法、及び画像
JP5044226B2 (ja) * 2006-01-27 2012-10-10 国立大学法人愛媛大学 ビシクロポルフィリン化合物、ビシクロピロール化合物、化合物の製造方法、有機半導体及びその製造方法
US8138075B1 (en) 2006-02-06 2012-03-20 Eberlein Dietmar C Systems and methods for the manufacture of flat panel devices
JP2008018711A (ja) * 2006-06-14 2008-01-31 Canon Inc インクジェット記録装置、データ生成装置および記録物
US7927416B2 (en) 2006-10-31 2011-04-19 Sensient Colors Inc. Modified pigments and methods for making and using the same
WO2009026552A2 (en) 2007-08-23 2009-02-26 Sensient Colors Inc. Self-dispersed pigments and methods for making and using the same
JP2009105336A (ja) * 2007-10-25 2009-05-14 Mitsubishi Chemicals Corp 膜の製造方法、有機電子素子の製造方法及びナフタロシアニン膜
CN102105507B (zh) * 2008-08-07 2014-09-03 三菱化学株式会社 聚合物、发光层材料、有机电致发光元件材料、有机电致发光元件用组合物、利用它们的有机电致发光元件、太阳能电池元件、有机el显示装置和有机el照明
JP5490386B2 (ja) * 2008-08-12 2014-05-14 三菱化学株式会社 フタロシアニン前駆体及びその製造方法、フタロシアニンの製造方法、並びにフタロシアニン膜の製造方法
KR101697567B1 (ko) * 2008-12-25 2017-01-18 니폰 가야꾸 가부시끼가이샤 포르피라진 색소, 이를 함유하는 잉크 조성물 및 착색체
US9221986B2 (en) 2009-04-07 2015-12-29 Sensient Colors Llc Self-dispersing particles and methods for making and using the same
JP2011074161A (ja) * 2009-09-29 2011-04-14 Mitsubishi Chemicals Corp ジアザポルフィリン化合物又はその塩、半導体材料、膜、電子デバイス、電界効果トランジスタ、及び光電変換素子
EP2495229B1 (en) * 2009-10-30 2016-06-01 Mitsubishi Chemical Corporation Low-molecular compound, polymer, material for electronic devices, composition for electronic devices, organic electroluminescent element, organic solar cell element, display and lighting equipment
TWI813576B (zh) * 2017-07-03 2023-09-01 德商麥克專利有限公司 具有低含量苯酚類雜質的調配物

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000008103A1 (en) * 1998-08-08 2000-02-17 Avecia Limited Phthalocyanine compounds used in inks for ink-jet printing
WO2000064901A1 (en) * 1999-04-27 2000-11-02 Nippon Kayaku Kabushiki Kaisha Phthalocyanine compounds, water-base ink compositions and colored products

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05171085A (ja) * 1991-12-20 1993-07-09 Seiko Epson Corp インク及びインクジェットプリンタ
JPH1031275A (ja) 1996-05-17 1998-02-03 Fuji Xerox Co Ltd 刺激応答性粒子、それを含有する刺激応答性インク及びそれを用いた画像形成方法並びに画像形成装置
US6248458B1 (en) * 1997-11-17 2001-06-19 Lg Electronics Inc. Organic electroluminescent device with improved long-term stability
JPH11349877A (ja) 1998-04-23 1999-12-21 Tektronix Inc 相変化インク・キャリア組成物
JP2001011076A (ja) * 1999-04-27 2001-01-16 Nippon Kayaku Co Ltd フタロシアニン化合物、水性インク組成物及び着色体
US6403397B1 (en) * 2000-06-28 2002-06-11 Agere Systems Guardian Corp. Process for fabricating organic semiconductor device involving selective patterning
US6835534B2 (en) * 2000-10-27 2004-12-28 The Penn State Research Foundation Chemical functionalization nanolithography
EP1416069B1 (en) 2001-08-09 2010-10-27 Asahi Kasei Kabushiki Kaisha Organic semiconductor film and method for manufacture thereof
US6963080B2 (en) * 2001-11-26 2005-11-08 International Business Machines Corporation Thin film transistors using solution processed pentacene precursor as organic semiconductor
JP4502357B2 (ja) * 2002-03-08 2010-07-14 キヤノン株式会社 新規化合物とその合成方法、インク、インクカートリッジ、記録ユニット、インクジェット記録装置及び記録方法
US7193237B2 (en) 2002-03-27 2007-03-20 Mitsubishi Chemical Corporation Organic semiconductor material and organic electronic device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000008103A1 (en) * 1998-08-08 2000-02-17 Avecia Limited Phthalocyanine compounds used in inks for ink-jet printing
WO2000064901A1 (en) * 1999-04-27 2000-11-02 Nippon Kayaku Kabushiki Kaisha Phthalocyanine compounds, water-base ink compositions and colored products

Also Published As

Publication number Publication date
DE60322762D1 (de) 2008-09-25
EP1688417A2 (en) 2006-08-09
EP1688417A3 (en) 2008-05-21
US7211120B2 (en) 2007-05-01
EP1688417B1 (en) 2012-12-26
US7090719B2 (en) 2006-08-15
US20080032442A1 (en) 2008-02-07
US7315043B2 (en) 2008-01-01
JP4502357B2 (ja) 2010-07-14
ATE404565T1 (de) 2008-08-15
EP1342722A1 (en) 2003-09-10
US7615630B2 (en) 2009-11-10
US20060269876A1 (en) 2006-11-30
CN1443765A (zh) 2003-09-24
US20030187250A1 (en) 2003-10-02
EP1342722B1 (en) 2008-08-13
US20060075584A1 (en) 2006-04-13
US20060191440A1 (en) 2006-08-31
JP2003327588A (ja) 2003-11-19

Similar Documents

Publication Publication Date Title
CN100344631C (zh) 具有二环骨架的化合物及其用途
CN100348671C (zh) 染料混合物和含有这种染料混合物的油墨
CN1095861C (zh) 蒽并吡啶酮化合物、水基油墨组合物和着色制品
CN1525975A (zh) 叔烷基苯氧基取代的多环化合物
JP2003213167A (ja) 水溶性フタロシアニン化合物を含むインク、インクジェット用インク、インクジェット記録方法、及び着色画像材料のオゾンガス褪色改良方法
JP4745226B2 (ja) フロピロールの製造法
JP4021669B2 (ja) インク組成物、及びインクジェット記録方法
JP2004075986A (ja) フタロシアニン化合物、これを含むインク、インクジェット記録方法、および画像形成方法
JP2004002670A (ja) 染料混合物、及びそれを含有するインク
CN1906255A (zh) 黑色油墨组合物和喷墨记录方法
CN1194053C (zh) 黑色水性油墨组合物、使用其的喷墨记录方法及记录物
JP2003012952A (ja) フタロシアニン色素の製造方法、フタロシアニン色素、着色組成物、インク、インクジェット記録用インク、インクジェット記録用インクセット、インクジェット記録方法、容器
CN1175054C (zh) 偶氮酞菁染料和颜料前体和其用途
CN1821442A (zh) 有机半导体膜的图案形成方法
CN102686593B (zh) 铜酞菁苄砜基化合物及其衍生物
JP2016047892A (ja) アゾ化合物
JP6332722B1 (ja) ベンズイミダゾロンジオキサジン化合物
JP4702949B2 (ja) パターン形成方法
JP2003321630A (ja) インク組成物
JP2004331734A (ja) 置換フタロシアニン化合物とその製造方法及び置換フタロシアニン化合物を含むインクジェット記録用インク
KR20230129770A (ko) 프탈로시아닌계 안료에서 금속을 제거하는 방법
TW201229037A (en) Dipyrromethene metal complex compound and coloring composition, ink sheet, toner, ink and filter including the compound
JP2013129806A (ja) 着色組成物及びインクジェット用インク
JPWO2013168806A1 (ja) インクジェット捺染用インクセット及びそれを用いた繊維の捺染方法
JP2010196062A (ja) フタロシアニン化合物、インク、インクジェット記録方法、および画像形成方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20071024

Termination date: 20170306