CN100334710C - 导体图形的制造方法 - Google Patents
导体图形的制造方法 Download PDFInfo
- Publication number
- CN100334710C CN100334710C CNB2005100519669A CN200510051966A CN100334710C CN 100334710 C CN100334710 C CN 100334710C CN B2005100519669 A CNB2005100519669 A CN B2005100519669A CN 200510051966 A CN200510051966 A CN 200510051966A CN 100334710 C CN100334710 C CN 100334710C
- Authority
- CN
- China
- Prior art keywords
- conductor
- resist layer
- resist
- nesa coating
- photomask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000004020 conductor Substances 0.000 title claims abstract description 97
- 238000000034 method Methods 0.000 title claims abstract description 40
- 239000000758 substrate Substances 0.000 claims abstract description 41
- 238000007747 plating Methods 0.000 claims abstract description 18
- 239000011248 coating agent Substances 0.000 claims description 46
- 238000000576 coating method Methods 0.000 claims description 46
- 238000004519 manufacturing process Methods 0.000 claims description 32
- 230000015572 biosynthetic process Effects 0.000 claims description 10
- 229910052804 chromium Inorganic materials 0.000 claims description 8
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- 238000002360 preparation method Methods 0.000 claims description 4
- 239000000463 material Substances 0.000 abstract description 4
- 230000001678 irradiating effect Effects 0.000 abstract description 2
- 238000000151 deposition Methods 0.000 abstract 1
- 239000011651 chromium Substances 0.000 description 7
- 238000003475 lamination Methods 0.000 description 7
- 238000001039 wet etching Methods 0.000 description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000012780 transparent material Substances 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04M—TELEPHONIC COMMUNICATION
- H04M1/00—Substation equipment, e.g. for use by subscribers
- H04M1/26—Devices for calling a subscriber
- H04M1/27—Devices whereby a plurality of signals may be stored simultaneously
- H04M1/274—Devices whereby a plurality of signals may be stored simultaneously with provision for storing more than one subscriber number at a time, e.g. using toothed disc
- H04M1/2745—Devices whereby a plurality of signals may be stored simultaneously with provision for storing more than one subscriber number at a time, e.g. using toothed disc using static electronic memories, e.g. chips
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F21/00—Security arrangements for protecting computers, components thereof, programs or data against unauthorised activity
- G06F21/30—Authentication, i.e. establishing the identity or authorisation of security principals
- G06F21/31—User authentication
- G06F21/32—User authentication using biometric data, e.g. fingerprints, iris scans or voiceprints
-
- G—PHYSICS
- G10—MUSICAL INSTRUMENTS; ACOUSTICS
- G10L—SPEECH ANALYSIS TECHNIQUES OR SPEECH SYNTHESIS; SPEECH RECOGNITION; SPEECH OR VOICE PROCESSING TECHNIQUES; SPEECH OR AUDIO CODING OR DECODING
- G10L15/00—Speech recognition
- G10L15/02—Feature extraction for speech recognition; Selection of recognition unit
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04M—TELEPHONIC COMMUNICATION
- H04M3/00—Automatic or semi-automatic exchanges
- H04M3/42—Systems providing special services or facilities to subscribers
- H04M3/487—Arrangements for providing information services, e.g. recorded voice services or time announcements
- H04M3/493—Interactive information services, e.g. directory enquiries ; Arrangements therefor, e.g. interactive voice response [IVR] systems or voice portals
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04M—TELEPHONIC COMMUNICATION
- H04M2215/00—Metering arrangements; Time controlling arrangements; Time indicating arrangements
- H04M2215/62—Called party billing, e.g. reverse billing, freephone, collect call, 0800 or 0900
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Signal Processing (AREA)
- Theoretical Computer Science (AREA)
- Computer Security & Cryptography (AREA)
- Acoustics & Sound (AREA)
- Human Computer Interaction (AREA)
- Audiology, Speech & Language Pathology (AREA)
- Health & Medical Sciences (AREA)
- Multimedia (AREA)
- Computational Linguistics (AREA)
- Computer Hardware Design (AREA)
- Software Systems (AREA)
- General Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004046179A JP2005236188A (ja) | 2004-02-23 | 2004-02-23 | 導体パターンの製造方法 |
JP046179/2004 | 2004-02-23 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1661793A CN1661793A (zh) | 2005-08-31 |
CN100334710C true CN100334710C (zh) | 2007-08-29 |
Family
ID=35010980
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2005100519669A Expired - Fee Related CN100334710C (zh) | 2004-02-23 | 2005-02-23 | 导体图形的制造方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2005236188A (ko) |
KR (1) | KR100602912B1 (ko) |
CN (1) | CN100334710C (ko) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100773588B1 (ko) * | 2006-06-29 | 2007-11-05 | 한국과학기술원 | 폴리머 패턴 형성방법 및 이를 이용한 금속 박막 패턴,금속 패턴, 마이크로셔터, 마이크로렌즈 어레이 스탬퍼,플라스틱 몰드의 형성방법 |
JP4861893B2 (ja) * | 2006-07-28 | 2012-01-25 | 東京エレクトロン株式会社 | 基板の処理方法、プログラム、コンピュータ記憶媒体及び基板の処理システム |
JP6021399B2 (ja) * | 2012-04-13 | 2016-11-09 | ラピスセミコンダクタ株式会社 | 半導体装置の製造方法 |
JP5941737B2 (ja) * | 2012-04-13 | 2016-06-29 | ラピスセミコンダクタ株式会社 | 半導体装置の製造方法 |
US9293402B2 (en) | 2012-04-13 | 2016-03-22 | Lapis Semiconductor Co., Ltd. | Device with pillar-shaped components |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1130291A (zh) * | 1994-10-04 | 1996-09-04 | 松下电器产业株式会社 | 转印导体的制造方法和层迭用生片的制造方法 |
JP2002062638A (ja) * | 2000-08-21 | 2002-02-28 | Semiconductor Leading Edge Technologies Inc | マスクブランクス、フォトマスク、パターン形成方法および半導体装置の製造方法 |
JP2003287872A (ja) * | 2003-05-09 | 2003-10-10 | Toppan Printing Co Ltd | パターン転写方法 |
-
2004
- 2004-02-23 JP JP2004046179A patent/JP2005236188A/ja active Pending
-
2005
- 2005-02-22 KR KR1020050014383A patent/KR100602912B1/ko not_active IP Right Cessation
- 2005-02-23 CN CNB2005100519669A patent/CN100334710C/zh not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1130291A (zh) * | 1994-10-04 | 1996-09-04 | 松下电器产业株式会社 | 转印导体的制造方法和层迭用生片的制造方法 |
JP2002062638A (ja) * | 2000-08-21 | 2002-02-28 | Semiconductor Leading Edge Technologies Inc | マスクブランクス、フォトマスク、パターン形成方法および半導体装置の製造方法 |
JP2003287872A (ja) * | 2003-05-09 | 2003-10-10 | Toppan Printing Co Ltd | パターン転写方法 |
Non-Patent Citations (1)
Title |
---|
Fabrication of fine metal microstructures packaged in thebonded glass substrates Kawamura A,Ike S,Shoji S,Conference on Design,Characterization,and Packaging for MEMS and Microelectronics 1999 * |
Also Published As
Publication number | Publication date |
---|---|
KR20060045328A (ko) | 2006-05-17 |
CN1661793A (zh) | 2005-08-31 |
KR100602912B1 (ko) | 2006-07-19 |
JP2005236188A (ja) | 2005-09-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20070829 Termination date: 20100223 |