CH652150A5 - Gold-plattierungsbad und -verfahren unter verwendung eines polymerchelates. - Google Patents
Gold-plattierungsbad und -verfahren unter verwendung eines polymerchelates. Download PDFInfo
- Publication number
- CH652150A5 CH652150A5 CH7273/82A CH727382A CH652150A5 CH 652150 A5 CH652150 A5 CH 652150A5 CH 7273/82 A CH7273/82 A CH 7273/82A CH 727382 A CH727382 A CH 727382A CH 652150 A5 CH652150 A5 CH 652150A5
- Authority
- CH
- Switzerland
- Prior art keywords
- bath
- gold
- cobalt
- metal
- nickel
- Prior art date
Links
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 title claims description 42
- 229910052737 gold Inorganic materials 0.000 title claims description 42
- 239000010931 gold Substances 0.000 title claims description 42
- 238000007747 plating Methods 0.000 title claims description 38
- 238000000034 method Methods 0.000 title claims description 25
- 239000013522 chelant Substances 0.000 title claims description 22
- 229920000642 polymer Polymers 0.000 title description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 48
- 229910052751 metal Inorganic materials 0.000 claims description 45
- 239000002184 metal Substances 0.000 claims description 45
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 34
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 30
- 229910017052 cobalt Inorganic materials 0.000 claims description 25
- 239000010941 cobalt Substances 0.000 claims description 25
- 229910052759 nickel Inorganic materials 0.000 claims description 24
- 229920001577 copolymer Polymers 0.000 claims description 17
- 239000002244 precipitate Substances 0.000 claims description 17
- -1 alkali metal gold cyanide Chemical class 0.000 claims description 14
- 239000000203 mixture Substances 0.000 claims description 14
- 238000001556 precipitation Methods 0.000 claims description 14
- 238000009713 electroplating Methods 0.000 claims description 13
- 229910052783 alkali metal Inorganic materials 0.000 claims description 12
- 239000003792 electrolyte Substances 0.000 claims description 10
- 229910052738 indium Inorganic materials 0.000 claims description 10
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 10
- 239000002253 acid Substances 0.000 claims description 7
- 150000003839 salts Chemical class 0.000 claims description 7
- 150000002739 metals Chemical class 0.000 claims description 6
- 150000007524 organic acids Chemical class 0.000 claims description 6
- 238000002360 preparation method Methods 0.000 claims description 6
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- 230000000694 effects Effects 0.000 claims description 4
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 claims description 4
- 239000004848 polyfunctional curative Substances 0.000 claims description 4
- 229910002651 NO3 Inorganic materials 0.000 claims description 3
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims description 3
- 229910019142 PO4 Inorganic materials 0.000 claims description 3
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 229910021645 metal ion Inorganic materials 0.000 claims description 3
- 150000007522 mineralic acids Chemical class 0.000 claims description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 3
- 239000010452 phosphate Substances 0.000 claims description 3
- QAOWNCQODCNURD-UHFFFAOYSA-L sulfate group Chemical group S(=O)(=O)([O-])[O-] QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims description 3
- 150000008044 alkali metal hydroxides Chemical class 0.000 claims description 2
- 230000000536 complexating effect Effects 0.000 claims description 2
- 239000000356 contaminant Substances 0.000 claims description 2
- 238000011109 contamination Methods 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 2
- 150000002894 organic compounds Chemical class 0.000 claims description 2
- 239000003795 chemical substances by application Substances 0.000 claims 3
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 claims 2
- 238000007792 addition Methods 0.000 claims 2
- DBVJJBKOTRCVKF-UHFFFAOYSA-N Etidronic acid Chemical compound OP(=O)(O)C(O)(C)P(O)(O)=O DBVJJBKOTRCVKF-UHFFFAOYSA-N 0.000 claims 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical class OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 claims 1
- 150000007513 acids Chemical class 0.000 claims 1
- HAMNKKUPIHEESI-UHFFFAOYSA-N aminoguanidine Chemical compound NNC(N)=N HAMNKKUPIHEESI-UHFFFAOYSA-N 0.000 claims 1
- 239000010953 base metal Substances 0.000 claims 1
- 239000006172 buffering agent Substances 0.000 claims 1
- 230000003139 buffering effect Effects 0.000 claims 1
- 239000002738 chelating agent Substances 0.000 claims 1
- 238000004070 electrodeposition Methods 0.000 claims 1
- 230000009931 harmful effect Effects 0.000 claims 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical class [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 claims 1
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 claims 1
- 229920000768 polyamine Polymers 0.000 claims 1
- 150000003112 potassium compounds Chemical class 0.000 claims 1
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 21
- 239000000243 solution Substances 0.000 description 18
- UPBDXRPQPOWRKR-UHFFFAOYSA-N furan-2,5-dione;methoxyethene Chemical compound COC=C.O=C1OC(=O)C=C1 UPBDXRPQPOWRKR-UHFFFAOYSA-N 0.000 description 11
- 239000011347 resin Substances 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 239000001508 potassium citrate Substances 0.000 description 7
- 229960002635 potassium citrate Drugs 0.000 description 7
- QEEAPRPFLLJWCF-UHFFFAOYSA-K potassium citrate (anhydrous) Chemical compound [K+].[K+].[K+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O QEEAPRPFLLJWCF-UHFFFAOYSA-K 0.000 description 7
- 235000011082 potassium citrates Nutrition 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- XTFKWYDMKGAZKK-UHFFFAOYSA-N potassium;gold(1+);dicyanide Chemical compound [K+].[Au+].N#[C-].N#[C-] XTFKWYDMKGAZKK-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 239000008367 deionised water Substances 0.000 description 5
- 229910021641 deionized water Inorganic materials 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 229910001369 Brass Inorganic materials 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 239000010951 brass Substances 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- NNFCIKHAZHQZJG-UHFFFAOYSA-N potassium cyanide Chemical compound [K+].N#[C-] NNFCIKHAZHQZJG-UHFFFAOYSA-N 0.000 description 4
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 3
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 229910052715 tantalum Inorganic materials 0.000 description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 3
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- 229910021446 cobalt carbonate Inorganic materials 0.000 description 2
- ZOTKGJBKKKVBJZ-UHFFFAOYSA-L cobalt(2+);carbonate Chemical compound [Co+2].[O-]C([O-])=O ZOTKGJBKKKVBJZ-UHFFFAOYSA-L 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- LELOWRISYMNNSU-UHFFFAOYSA-N hydrogen cyanide Chemical compound N#C LELOWRISYMNNSU-UHFFFAOYSA-N 0.000 description 2
- 239000011630 iodine Substances 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229960003975 potassium Drugs 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 235000010333 potassium nitrate Nutrition 0.000 description 2
- 239000004323 potassium nitrate Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000002000 Electrolyte additive Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000005323 carbonate salts Chemical class 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 150000001869 cobalt compounds Chemical class 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000012777 electrically insulating material Substances 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 230000002070 germicidal effect Effects 0.000 description 1
- IZLAVFWQHMDDGK-UHFFFAOYSA-N gold(1+);cyanide Chemical compound [Au+].N#[C-] IZLAVFWQHMDDGK-UHFFFAOYSA-N 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 229910000337 indium(III) sulfate Inorganic materials 0.000 description 1
- XGCKLPDYTQRDTR-UHFFFAOYSA-H indium(iii) sulfate Chemical compound [In+3].[In+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O XGCKLPDYTQRDTR-UHFFFAOYSA-H 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 235000015250 liver sausages Nutrition 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 229910000402 monopotassium phosphate Inorganic materials 0.000 description 1
- 235000019796 monopotassium phosphate Nutrition 0.000 description 1
- PJNZPQUBCPKICU-UHFFFAOYSA-N phosphoric acid;potassium Chemical compound [K].OP(O)(O)=O PJNZPQUBCPKICU-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000867 polyelectrolyte Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 230000029219 regulation of pH Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 229920006163 vinyl copolymer Polymers 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/48—Electroplating: Baths therefor from solutions of gold
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/62—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of gold
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/330,706 US4396471A (en) | 1981-12-14 | 1981-12-14 | Gold plating bath and method using maleic anhydride polymer chelate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH652150A5 true CH652150A5 (de) | 1985-10-31 |
Family
ID=23290963
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH7273/82A CH652150A5 (de) | 1981-12-14 | 1982-12-14 | Gold-plattierungsbad und -verfahren unter verwendung eines polymerchelates. |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US4396471A (en, 2012) |
| JP (1) | JPS58110687A (en, 2012) |
| CA (1) | CA1211410A (en, 2012) |
| CH (1) | CH652150A5 (en, 2012) |
| DE (1) | DE3244092A1 (en, 2012) |
| FR (1) | FR2519031B1 (en, 2012) |
| GB (1) | GB2112397B (en, 2012) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| HU191879B (en) * | 1983-09-09 | 1987-04-28 | Videoton Elekt Vallalat | Processor fot the galvanic speretaion of hard gold plating for electronic purposes |
| US4670107A (en) * | 1986-03-05 | 1987-06-02 | Vanguard Research Associates, Inc. | Electrolyte solution and process for high speed gold plating |
| US4758630A (en) * | 1986-10-27 | 1988-07-19 | Richardson-Vicks Inc. | Denture stabilizing zinc and strontium salts of ave/ma copolymer |
| US4857159A (en) * | 1987-03-25 | 1989-08-15 | The Standard Oil Company | Electrodeposition recovery method for metals in polymer chelates |
| JP2779207B2 (ja) * | 1989-06-06 | 1998-07-23 | 富士通株式会社 | 半導体装置の製造方法 |
| DE10340197B3 (de) * | 2003-08-27 | 2004-09-23 | Siemens Ag | Verfahren zum elektrochemischen Abscheiden von Metallen aus einem Elektrolyt |
| JP4945193B2 (ja) * | 2006-08-21 | 2012-06-06 | ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． | 硬質金合金めっき液 |
| EP2123799B1 (en) * | 2008-04-22 | 2015-04-22 | Rohm and Haas Electronic Materials LLC | Method of replenishing indium ions in indium electroplating compositions |
| DE102013109400A1 (de) * | 2013-08-29 | 2015-03-05 | Harting Kgaa | Kontaktelement mit Goldbeschichtung |
| JP2017186627A (ja) * | 2016-04-07 | 2017-10-12 | 小島化学薬品株式会社 | 硬質金めっき溶液 |
| US20240271306A1 (en) | 2021-09-16 | 2024-08-15 | P & S, Galvasols | High-speed pure gold electroforming/electroplating bath |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USRE23514E (en) * | 1930-06-26 | 1952-06-24 | Artificial resins and process of | |
| DE801312C (de) * | 1949-05-05 | 1950-11-23 | Pforzheimer Elektrizitäts - Gesellschaft m. b. H., Pforzheim | Verfahren zur elektrolvtischen Abscheidung von Gold und Goldlegierungen |
| US2752281A (en) * | 1953-06-01 | 1956-06-26 | Rohm & Haas | Iodine dissolved in aqueous solutions of maleic anhydride-vinyl ether copolymers |
| US3087853A (en) * | 1956-07-02 | 1963-04-30 | Gen Aniline & Film Corp | Water soluble compositions consisting essentially of iodine and a water soluble oxygen containing polymer |
| BE570261A (en, 2012) * | 1957-08-13 | |||
| US3149057A (en) * | 1959-04-27 | 1964-09-15 | Technic | Acid gold plating |
| US3149058A (en) * | 1959-12-31 | 1964-09-15 | Technic | Bright gold plating process |
| GB1052380A (en, 2012) * | 1964-09-08 | |||
| FR1478334A (fr) * | 1965-05-06 | 1967-04-28 | Inst Francais Du Petrole | Catalyseur à base de métaux bivalents, sa préparation et ses applications, en particulier pour la polymérisation d'éthers cycliques |
| US3407126A (en) * | 1965-12-23 | 1968-10-22 | Ibm | Electrodeposition of magnetic thin films |
| US3424597A (en) * | 1966-04-08 | 1969-01-28 | Shipley Co | Electroless nickel plating |
| US3672969A (en) * | 1970-10-26 | 1972-06-27 | Lea Ronal Inc | Electrodeposition of gold and gold alloys |
| US3856638A (en) * | 1971-08-20 | 1974-12-24 | Auric Corp | Bright gold electroplating bath and method of electroplating bright gold |
| US3716463A (en) * | 1971-08-30 | 1973-02-13 | Auric Corp | Bright gold alloy electroplating bath and process |
| BE791401A (fr) * | 1971-11-15 | 1973-05-14 | Monsanto Co | Compositions et procedes electrochimiques |
| US3787463A (en) * | 1972-02-24 | 1974-01-22 | Oxy Metal Finishing Corp | Amine gold complex useful for the electrodeposition of gold and its alloys |
| US3770596A (en) * | 1972-07-21 | 1973-11-06 | Auric Corp | Gold plating bath for barrel plating operations |
| CH555894A (fr) * | 1972-08-10 | 1974-11-15 | Oxy Metal Industries Corp | Utilisation de derives organophosphores dans les bains sulfitiques pour l'electrodeposition de l'or et des alliages d'or. |
| US3864222A (en) * | 1973-03-26 | 1975-02-04 | Technic | Baths for Electrodeposition of Gold and Gold Alloys and Method Therefore |
| US3902977A (en) * | 1973-12-13 | 1975-09-02 | Engelhard Min & Chem | Gold plating solutions and method |
| US4076598A (en) * | 1976-11-17 | 1978-02-28 | Amp Incorporated | Method, electrolyte and additive for electroplating a cobalt brightened gold alloy |
| US4186064A (en) * | 1977-07-20 | 1980-01-29 | Technic, Inc. | Method and electrolyte for electrodeposition of bright gold and gold alloys |
| US4197172A (en) * | 1979-04-05 | 1980-04-08 | American Chemical & Refining Company Incorporated | Gold plating composition and method |
| US4253920A (en) * | 1980-03-20 | 1981-03-03 | American Chemical & Refining Company, Incorporated | Composition and method for gold plating |
-
1981
- 1981-12-14 US US06/330,706 patent/US4396471A/en not_active Expired - Fee Related
-
1982
- 1982-11-29 DE DE19823244092 patent/DE3244092A1/de active Granted
- 1982-11-30 CA CA000416692A patent/CA1211410A/en not_active Expired
- 1982-12-13 JP JP57218241A patent/JPS58110687A/ja active Granted
- 1982-12-14 CH CH7273/82A patent/CH652150A5/de not_active IP Right Cessation
- 1982-12-14 GB GB08235542A patent/GB2112397B/en not_active Expired
- 1982-12-14 FR FR8220954A patent/FR2519031B1/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| FR2519031B1 (fr) | 1986-05-23 |
| JPS58110687A (ja) | 1983-07-01 |
| FR2519031A1 (fr) | 1983-07-01 |
| US4396471A (en) | 1983-08-02 |
| JPS614919B2 (en, 2012) | 1986-02-14 |
| DE3244092C2 (en, 2012) | 1989-03-02 |
| GB2112397A (en) | 1983-07-20 |
| DE3244092A1 (de) | 1983-06-23 |
| GB2112397B (en) | 1985-09-18 |
| CA1211410A (en) | 1986-09-16 |
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