US3149057A - Acid gold plating - Google Patents
Acid gold plating Download PDFInfo
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- US3149057A US3149057A US808913A US80891359A US3149057A US 3149057 A US3149057 A US 3149057A US 808913 A US808913 A US 808913A US 80891359 A US80891359 A US 80891359A US 3149057 A US3149057 A US 3149057A
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- gold
- solution
- acid
- cobalt
- chelate
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 title claims description 64
- 229910052737 gold Inorganic materials 0.000 title claims description 64
- 239000010931 gold Substances 0.000 title claims description 64
- 238000007747 plating Methods 0.000 title claims description 24
- 239000002253 acid Substances 0.000 title description 16
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 21
- 239000013522 chelant Substances 0.000 claims description 18
- 229910017052 cobalt Inorganic materials 0.000 claims description 17
- 239000010941 cobalt Substances 0.000 claims description 17
- MPMSMUBQXQALQI-UHFFFAOYSA-N cobalt phthalocyanine Chemical compound [Co+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 MPMSMUBQXQALQI-UHFFFAOYSA-N 0.000 claims description 12
- -1 ETHYLENEDIAMINE ACETIC ACID COMPOUND Chemical class 0.000 claims description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- IZLAVFWQHMDDGK-UHFFFAOYSA-N gold(1+);cyanide Chemical compound [Au+].N#[C-] IZLAVFWQHMDDGK-UHFFFAOYSA-N 0.000 claims description 4
- 239000000243 solution Substances 0.000 description 38
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 21
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 18
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 12
- 229960003975 potassium Drugs 0.000 description 12
- 229910052700 potassium Inorganic materials 0.000 description 12
- 239000011591 potassium Substances 0.000 description 12
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 11
- 229960001484 edetic acid Drugs 0.000 description 10
- 239000000203 mixture Substances 0.000 description 10
- 238000000151 deposition Methods 0.000 description 9
- 230000008021 deposition Effects 0.000 description 9
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 8
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 8
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 8
- 229910001020 Au alloy Inorganic materials 0.000 description 7
- 239000003353 gold alloy Substances 0.000 description 7
- LELOWRISYMNNSU-UHFFFAOYSA-N hydrogen cyanide Chemical compound N#C LELOWRISYMNNSU-UHFFFAOYSA-N 0.000 description 6
- 229910052783 alkali metal Inorganic materials 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- OBITVHZFHDIQGH-UHFFFAOYSA-N [Au].[K]C#N Chemical compound [Au].[K]C#N OBITVHZFHDIQGH-UHFFFAOYSA-N 0.000 description 4
- 150000001340 alkali metals Chemical class 0.000 description 4
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 4
- 238000004070 electrodeposition Methods 0.000 description 4
- 238000009713 electroplating Methods 0.000 description 4
- 150000007524 organic acids Chemical class 0.000 description 4
- SCVFZCLFOSHCOH-UHFFFAOYSA-M potassium acetate Chemical compound [K+].CC([O-])=O SCVFZCLFOSHCOH-UHFFFAOYSA-M 0.000 description 4
- LWIHDJKSTIGBAC-UHFFFAOYSA-K potassium phosphate Substances [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 229960000583 acetic acid Drugs 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- SZXAQBAUDGBVLT-UHFFFAOYSA-H antimony(3+);2,3-dihydroxybutanedioate Chemical compound [Sb+3].[Sb+3].[O-]C(=O)C(O)C(O)C([O-])=O.[O-]C(=O)C(O)C(O)C([O-])=O.[O-]C(=O)C(O)C(O)C([O-])=O SZXAQBAUDGBVLT-UHFFFAOYSA-H 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 239000000872 buffer Substances 0.000 description 3
- 239000002738 chelating agent Substances 0.000 description 3
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 description 3
- 229940093915 gynecological organic acid Drugs 0.000 description 3
- 229910052738 indium Inorganic materials 0.000 description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000002609 medium Substances 0.000 description 3
- 235000005985 organic acids Nutrition 0.000 description 3
- 239000001508 potassium citrate Substances 0.000 description 3
- 229960002635 potassium citrate Drugs 0.000 description 3
- QEEAPRPFLLJWCF-UHFFFAOYSA-K potassium citrate (anhydrous) Chemical compound [K+].[K+].[K+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O QEEAPRPFLLJWCF-UHFFFAOYSA-K 0.000 description 3
- 235000011082 potassium citrates Nutrition 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- URDCARMUOSMFFI-UHFFFAOYSA-N 2-[2-[bis(carboxymethyl)amino]ethyl-(2-hydroxyethyl)amino]acetic acid Chemical compound OCCN(CC(O)=O)CCN(CC(O)=O)CC(O)=O URDCARMUOSMFFI-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 238000013019 agitation Methods 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 238000005275 alloying Methods 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- IFQUWYZCAGRUJN-UHFFFAOYSA-N ethylenediaminediacetic acid Chemical compound OC(=O)CNCCNCC(O)=O IFQUWYZCAGRUJN-UHFFFAOYSA-N 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 230000009931 harmful effect Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910000402 monopotassium phosphate Inorganic materials 0.000 description 2
- 235000019796 monopotassium phosphate Nutrition 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 235000011056 potassium acetate Nutrition 0.000 description 2
- GNSKLFRGEWLPPA-UHFFFAOYSA-M potassium dihydrogen phosphate Chemical compound [K+].OP(O)([O-])=O GNSKLFRGEWLPPA-UHFFFAOYSA-M 0.000 description 2
- XTFKWYDMKGAZKK-UHFFFAOYSA-N potassium;gold(1+);dicyanide Chemical compound [K+].[Au+].N#[C-].N#[C-] XTFKWYDMKGAZKK-UHFFFAOYSA-N 0.000 description 2
- BDDLHHRCDSJVKV-UHFFFAOYSA-N 7028-40-2 Chemical compound CC(O)=O.CC(O)=O.CC(O)=O.CC(O)=O BDDLHHRCDSJVKV-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 1
- 239000004135 Bone phosphate Substances 0.000 description 1
- BGYTUJHSBASBCG-UHFFFAOYSA-N C(C)(=O)O.C(C)(=O)O.C(C)(=O)O.C(C)(=O)O.C(CN)N.[Cd] Chemical compound C(C)(=O)O.C(C)(=O)O.C(C)(=O)O.C(C)(=O)O.C(CN)N.[Cd] BGYTUJHSBASBCG-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 241000220010 Rhode Species 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 125000000218 acetic acid group Chemical group C(C)(=O)* 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 1
- 150000008041 alkali metal carbonates Chemical class 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 229910000318 alkali metal phosphate Inorganic materials 0.000 description 1
- LHIJANUOQQMGNT-UHFFFAOYSA-N aminoethylethanolamine Chemical compound NCCNCCO LHIJANUOQQMGNT-UHFFFAOYSA-N 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 239000011260 aqueous acid Substances 0.000 description 1
- 239000012736 aqueous medium Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- 150000001868 cobalt Chemical class 0.000 description 1
- 150000004700 cobalt complex Chemical class 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 239000002659 electrodeposit Substances 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 229940071106 ethylenediaminetetraacetate Drugs 0.000 description 1
- OUDSFQBUEBFSPS-UHFFFAOYSA-N ethylenediaminetriacetic acid Chemical class OC(=O)CNCCN(CC(O)=O)CC(O)=O OUDSFQBUEBFSPS-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000012362 glacial acetic acid Substances 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- NKCCODPFBDGPRJ-UHFFFAOYSA-N nitridocarbon(1+) Chemical compound N#[C+] NKCCODPFBDGPRJ-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229910000160 potassium phosphate Inorganic materials 0.000 description 1
- 235000011009 potassium phosphates Nutrition 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/48—Electroplating: Baths therefor from solutions of gold
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/62—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of gold
Definitions
- the present invention relates to the electrolytic deposition of gold on surfaces and more particularly to the electrodeposition of gold and gold alloys from solutions of the same onto objects to develop a gold or gold alloy appearance.
- Gold baths of this conventional type containing free alkali cyanide are never allowed to operate on the acid side, because of the formation and elimination from the bath of the extremely toxic hydrogen cyanide gas.
- An additional chemical reason for maintaining alkaline baths resides in the fact that where an alkali metal aurocyanide solution is contacted with a strong mineral acid, one cyanide radical is displaced from the aurocyanide complex anion and there separates from the solution insoluble aurous cyanide.
- Such 24 karat baths must be operated hot and are usually limited to rather low current densities. It is also diflicult to obtain bright deposits in heavy thicknesses, i.e. greater than .000050". It, therefore, has been common practice in the prior art to add to such a bath certain soluble metal salts which are co-deposited with the gold in order to impart certain qualities to the plate such as color, hardness, wear resistance, etc.
- cobalt (II) chelate of ethylenediamine tetra-acetic acid, or other chelating agent giving with cobalt (II) a chelate having a stability constant of the same order of magnitude, to an alkali metal aurocyanide at a relatively low pH will produce a bright, smooth electrodeposit of gold which is better than 99.8% pure.
- the amount of cobalt chelate employed in the solution of gold to effect this result may vary from 1 gram per liter up to 50 grams per liter.
- Gold alloy plates may also be obtained from this bath by incorporating into the bath certain metal salts, complexes, or chelates, because such other metals plate out with the gold.
- certain metal salts, complexes, or chelates may be men tioned antimony tartrate, nickel or cadmium ethylenediamine tetra-acetic acid.
- Similar compounds of indium, zinc, copper, iron may be used to obtain alloy plates.
- a primary object of the present invention to provide an aqueous acid solution from which gold may be electrodeposited in which the harmful consequences of the formation of free hydrogen cyanide are eliminated.
- the present invention accordingly, comprises a bath from which gold may be electrolytically deposited, the bath essentially consisting of an aqueous solution of an alkali metal aurocyanide, with or without additional a1 loying salts, the cobalt chelate of ethylenediarnine tetraacetic acid, or a cobalt che-late of a chelating agent having a stability constant of about the same order of magnitude, and at least one buffer material to maintain the pH between 3.0 and 4.5 during the deposition of the gold from the solution.
- the maintenance of the pH value between 3.0 and 4.5 is most easily accomplished by incorporating into the bath salts of moderately strong organic acids whose acid dissociation constants are of such a nature that they serve as buffers in restricting the pH of the solution to limits as defined during the electro-deposition of the gold or its alloy.
- moderately strong organic acids whose acid dissociation constants are of such a nature that they serve as buffers in restricting the pH of the solution to limits as defined during the electro-deposition of the gold or its alloy.
- these substances may be listed, as representative, certain organic acids which have at least one ionization constant of such a value as to create a buffer region in the specified pH range, when properly neutralized with the appropriate amount of base.
- the acids most useful are the soluble aliphatic acids containing 2 to 8 C atoms, and also may carry hydroxyl groups in functional relationship to the carboxylic groups.
- Typical useful acids are citric, citraconic, itaconic, lactic, gluconic, glutaric and glycollic.
- the electrolytic deposition can be carried out using insoluble anodes such as platinum, gold, stainless steel or carbon, and replenishment of the gold and its alloying components can be accomplished during plating to maintain these materials at their original concentrations as the bath is used.
- the ratio of anode surface area to cathode surface area should be most preferably not less than 1:1.
- the temperature of the bath should be held within the limits of 55 to F. during the electrodeposition. It has been found that mechanical agitation of the bath, such as with a stirrer, serves to facilitate clean, smooth deposition, and at the same time permits the use of higher current densities without smutting the plated surface.
- the electrical tension between the anodes and the wares is held between 2 and 4 volts.
- Example I Into an amount of water suificient to form 1 liter of solution is dissolved:
- ethylenediamine The pH is then adjusted with either phosphoric acid or potassium hydroxide to a value near 4.0, but no lower than 3.0 nor higher than 4.5.
- Example i V Into an amount of water suflicient to form 1 liter of solution is dissolved:
- the preferre gold plating formula of this invention includes a very substantial molar excess of the organic acid over the amount of gold present. Generally it may be said that at least two moles of the acid or mixture of acids being used per mole of gold is a preferred range. Within said range the gold is held in complex form, hydrogen cyanide is not released, optimum pH in the range of 3-5 is achieved and gold plate of mirror-bright finish is consistently produced.
- Typical ethylenediaminetriacetic acid compounds which are useful chelating agents for holding the cobalt in the form of a complex of the requisite of stability to accomplish the results of the invention are ethylenediaminetetraacetic acid, hydroxyethyl ethylenediaminetriacetic acid, hydroxypropyl ethylenediaminetriacetic acid, ethylenediaminediacetic acid and the like. It seems that the essential element of structure in the compound is a spaced acetic acid moiety which will form a cobalt com plex of the desired level of stability.
- a bright gold plating bath consisting essentially of a Water solution of gold cyanide
- the improvement which comprises incorporating and maintaining in said solution a cobaltous chelate of an ethylenediamine acetic acid compound, the cobaltous chelate having a stability such that it is not electrodeposited with the gold under plating conditions, the solution being buffered at a pH level in the range from about 3 to about 5, the chelate being such that cobalt is not deposited under plating conditions.
- a composition suitable for formulation of acid gold plating solutions comprising a mixture of potassium gold cyanide and potassium cobaltous ethylenediamine tetraacetate, the ratio of the two being about 1-50 parts of the gold by weight to as much as 25 parts of cobalt by weight.
- An aqueous gold plating solution in accordance with claim 2 consisting essentially of:
- An aqueous gold plating solution in accordance with claim 2 consisting essentially of:
- An aqueous gold plating solution in accordance with claim 2 consisting essentially of:
- indium as the indium chelate of ethylenediaminetetraacetic acid, and sufiicient citric acid and potassium hydroxide to maintain the pH in the range from 3 to 4.5.
- An aqueous gold plating solution in accordance with claim 2 consisting essentially of:
- An aqueous gold plating solution in accordance with claim 2 consisting essentially of:
- cobalt as potassium cobaltous chelate of ethylenediaminetetraacetic acid, and sufficient monopotassium phosphate, citric acid and potassium hydroxide to maintain the pH of said solution at a level in the rangefrom 3 to 4.
- the improvement comprising forming a water solution of gold cyanide and maintaining in said solution a minor amount of cobalt of valence II as a chelate of an ethylenediamine acetic acid compound, said solution containing buifering ingredients suitable to maintain the pH of the solution in the range from about 3 to about 5, so that at current densities up to 100 amperes per square foot'a bright gold plate is achieved at temperatures up to 100 F. without deposition of cobalt.
- the improvement comprising formulating said gold as the auro (I) cyanide in an aqueous medium wherein the pH of said medium is maintained in the range from about 3 to about 5, in the presence of organic acids selected from the group consisting of acetic, citric, citratonic, itaconic, glutaric, lactic succinic and gluconic acidsand mixtures thereof, and also in the presence of a cobaltous chelate of a compound selected from the group consisting of ethylenediaminetetraacetic acid, hydroxyethyl ethylenediamine triacetic' acid, hydroxypropylethylenediaminetriacetic acid, and ethylenediaminediacetic'acid.
- the improvement which comprises maintaining the gold in solution as the auro (I) cyanide at a pH in the range from about 3 to about 5 in the presence of an alloying metal for simultaneous electrodepo'sition with gold, the improvement comprising acetic acid, hydroxyethyl ethylenediamine triacetic acid,
- acobaltous chelate selected from the group consisting of ethylenediaminetetrahydroxypropylethylenediaminetriacetic acid, and ethylenediaminediacetic acid.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Description
United States Patent Office 3,149,557 Patented Sept. 15, 1964 3,149,057 ACID GOLD PLATING Edward A. Parker, Cranston, and James A. Powers, East Providence, R1,, assignors to Technic, inn, Providence, R.I., a corporation of Rhode island No Drawing. Filed Apr. 27, 1959, Ser. No. 808,913 11 Claims. (Cl. 204-46) The present invention relates to the electrolytic deposition of gold on surfaces and more particularly to the electrodeposition of gold and gold alloys from solutions of the same onto objects to develop a gold or gold alloy appearance.
It has been customary for many years in the electroplating of gold and gold alloys to use a bath containing an alkali metal 'aurocyanide, with or without other soluble metal salts. In addition to the above compounds, certain other additives have been used to increase the conductivity of the bath; to increase throwing power; to maintain color; or to provide a buffered pH region in which the bath was to operate. A few examples of these additives are free alkali metal cyanide, alkali metal hydroxide, alkali metal carbonate or bicarbonate, and, almost always, a di-basic, or tri-basic alkali metal phosphate. In all instances, however, the pH of the aurocyan-ide bath in plating operations is never reduced below pH=6, and is most usually maintained in the pH range of 8 to 12.
Gold baths of this conventional type containing free alkali cyanide are never allowed to operate on the acid side, because of the formation and elimination from the bath of the extremely toxic hydrogen cyanide gas. An additional chemical reason for maintaining alkaline baths resides in the fact that where an alkali metal aurocyanide solution is contacted with a strong mineral acid, one cyanide radical is displaced from the aurocyanide complex anion and there separates from the solution insoluble aurous cyanide.
Such 24 karat baths must be operated hot and are usually limited to rather low current densities. It is also diflicult to obtain bright deposits in heavy thicknesses, i.e. greater than .000050". It, therefore, has been common practice in the prior art to add to such a bath certain soluble metal salts which are co-deposited with the gold in order to impart certain qualities to the plate such as color, hardness, wear resistance, etc.
We have found that the addition of the cobalt (II) chelate of ethylenediamine tetra-acetic acid, or other chelating agent giving with cobalt (II) a chelate having a stability constant of the same order of magnitude, to an alkali metal aurocyanide at a relatively low pH will produce a bright, smooth electrodeposit of gold which is better than 99.8% pure. The amount of cobalt chelate employed in the solution of gold to effect this result may vary from 1 gram per liter up to 50 grams per liter.
However, we prefer to operate in the region of 20-30 grams per liter. Heavy deposits may also be obtained which are brilliant in character. By the addition of this compound the speed of deposition for bright plating is immensely increased so that current densities of 60 amperes per square foot are possible. It has also been found that such 24 karat plates are of smaller grain size, increased hardness, less porous, and have better wear resistance than similar plates obtained from a conventional 24 karat bath.
It appears that the effect of having present in the solution a cobalt salt holding the cobalt (II) in such stable form that it does not plate out is that the cobalt inhibits the growth of coarse crystallites of gold in the plated surface. It thereby permits the development of bright plate, pure, at low voltage, high current density over a wide range to assist in obtaining full coverage overall parts of the area.
Gold alloy plates may also be obtained from this bath by incorporating into the bath certain metal salts, complexes, or chelates, because such other metals plate out with the gold. Among such compounds may be men tioned antimony tartrate, nickel or cadmium ethylenediamine tetra-acetic acid. Similar compounds of indium, zinc, copper, iron may be used to obtain alloy plates.
It is, therefore, a primary object of the present invention to provide an aqueous acid solution from which gold may be electrodeposited in which the harmful consequences of the formation of free hydrogen cyanide are eliminated.
It is another object of this invention to provide a bath for the deposition of substantially 24 karat gold electroplate which is characterized by higher hardness, greater wear resistance, and increased speed of plating than that obtained in a conventional 24 karat bath.
It is another object of the present invention to provide a solution from which gold and gold alloys may be electrodeposited in a clean, smooth fashion to give a gold or gold alloy plate which is of high reflectivity and will provide the mirror image of an object placed before it.
It is a further object of the present invention to provide a solution from which gold and gold alloys may be electrodeposited in which the harmful effects of alkali and alkali producing materials are avoided.
The present invention, accordingly, comprises a bath from which gold may be electrolytically deposited, the bath essentially consisting of an aqueous solution of an alkali metal aurocyanide, with or without additional a1 loying salts, the cobalt chelate of ethylenediarnine tetraacetic acid, or a cobalt che-late of a chelating agent having a stability constant of about the same order of magnitude, and at least one buffer material to maintain the pH between 3.0 and 4.5 during the deposition of the gold from the solution.
The maintenance of the pH value between 3.0 and 4.5 is most easily accomplished by incorporating into the bath salts of moderately strong organic acids whose acid dissociation constants are of such a nature that they serve as buffers in restricting the pH of the solution to limits as defined during the electro-deposition of the gold or its alloy. Among these substances may be listed, as representative, certain organic acids which have at least one ionization constant of such a value as to create a buffer region in the specified pH range, when properly neutralized with the appropriate amount of base.
In general, the acids most useful are the soluble aliphatic acids containing 2 to 8 C atoms, and also may carry hydroxyl groups in functional relationship to the carboxylic groups. Typical useful acids are citric, citraconic, itaconic, lactic, gluconic, glutaric and glycollic.
This list, while not all inclusive of the substances which may be used, is indicative of the general types of compounds which have been found to be useful. It is also possible to use mixtures of the compounds, provided the pH of the final gold bath lies in the range of 3.0 to 4.5.
The electrolytic deposition can be carried out using insoluble anodes such as platinum, gold, stainless steel or carbon, and replenishment of the gold and its alloying components can be accomplished during plating to maintain these materials at their original concentrations as the bath is used. The ratio of anode surface area to cathode surface area should be most preferably not less than 1:1. The temperature of the bath should be held within the limits of 55 to F. during the electrodeposition. It has been found that mechanical agitation of the bath, such as with a stirrer, serves to facilitate clean, smooth deposition, and at the same time permits the use of higher current densities without smutting the plated surface. The electrical tension between the anodes and the wares is held between 2 and 4 volts.
The following examples illustrate typical composition for use in plating operations in accordance with this invention:
Example I Into an amount of water suificient to form 1 liter of solution is dissolved:
12 grams of pure gold in the form of potassium gold (I) cyanide t 105 grams of citric acid 56 grams of potassium hydroxide 12.6 milliliters con. phosphoric acid 1 gram Co as cobalt dipotassium of ethylenediamine tetra-acetic acid This solution may be utilized for the electrodeposition of gold in the usual manner with a current density of 5 amperes per square foot (a.s.f.).
Example [1 Into an amount of water sufiicient to form 1 liter of solution is dissolved:
12 grams of pure gold in the form of potassium gold (I) cyanide 125 grams of primary potassium citrate 0.2 gram of antimony as antimony tartrate 3.0 grams Co as dipotassium cobalt ethylenediamine tetra-acetate Example 111 Into an amount of water suilicient to form 1 liter of solution is dissolved:
ethylenediamine The pH is then adjusted with either phosphoric acid or potassium hydroxide to a value near 4.0, but no lower than 3.0 nor higher than 4.5.
Example i V Into an amount of water suflicient to form 1 liter of solution is dissolved:
6 grams of pure gold in the form of potassium gold (I) cyanide 28 grams of glacial acetic acid 40 grams of potassium acetate 1 gram of cobalt as potassium cobalt ethylene diamine tetra-acetic acid ExampIe V Into an amount of water sufficient to form 1 liter of solution is dissolved:
8 grams of pure gold in the form of potassium gold (I) cyanide 50 grams of monopotassium phosphate 50 grams of citric acid 21 grams of potassium hydroxide 3 grams of cobalt as dipotassium cobalt ethylene diamine tetra-acetic acid In each case the pH should be finally adjusted with phosphoric acid or potassium hydroxide to a value of 4.0 but no lower than 3.0 or greater than 4.2.
Copper panels plated at 10 amperes per square foot at 75 F. with vigorous agitation for 20 minutes gave smooth brilliant gold plates with the appearance of 24K .asgosr gold. Plate thickness was 0.0002 inch indicating a current elliciency of 40 percent.
Barrel plating of small items is readily consummated in the type of solution illustrated in Examples I-V with a still further improvement in appearance and uniformity even at current densities as low as 1-5 amperes per square foot. The formulation given in Example V will give excellent results. The gold content may be reduced to onehalf this value to reduce losses in dragout.
It will be evident from the specific examples given that the preferre gold plating formula of this invention includes a very substantial molar excess of the organic acid over the amount of gold present. Generally it may be said that at least two moles of the acid or mixture of acids being used per mole of gold is a preferred range. Within said range the gold is held in complex form, hydrogen cyanide is not released, optimum pH in the range of 3-5 is achieved and gold plate of mirror-bright finish is consistently produced.
Typical ethylenediaminetriacetic acid compounds which are useful chelating agents for holding the cobalt in the form of a complex of the requisite of stability to accomplish the results of the invention are ethylenediaminetetraacetic acid, hydroxyethyl ethylenediaminetriacetic acid, hydroxypropyl ethylenediaminetriacetic acid, ethylenediaminediacetic acid and the like. It seems that the essential element of structure in the compound is a spaced acetic acid moiety which will form a cobalt com plex of the desired level of stability.
Though the invention has been described in terms of only a few specific examples, variance thereof may be practiced Without departing from its spirit or scope.
What is claimed is: Y
1. In a bright gold plating bath consisting essentially of a Water solution of gold cyanide, the improvement which comprises incorporating and maintaining in said solution a cobaltous chelate of an ethylenediamine acetic acid compound, the cobaltous chelate having a stability such that it is not electrodeposited with the gold under plating conditions, the solution being buffered at a pH level in the range from about 3 to about 5, the chelate being such that cobalt is not deposited under plating conditions.
2. An electroplating composition suitable for the deposition of gold from an acid medium consisting essentially of 1-50 parts of gold by weight as potassium gold cyanide, and up to 25 parts of cobalt by weight as potassium cobaltous chelate of ethylencdiaminetetraacetic acid, the Weight ratio of gold to cobalt being at least about 2:1, in a buffering medium including a potassium phosphate, citric acid and potassium citrate, the said composition when dissolved in water forming a solution at plating concentration of 5-25 grams of gold per liter of solution for the deposition of gold having a pH in the range from about 3 to about 5, said cobalt chelate being such that cobalt is not plated from the solution under plating conditions.
3. A composition suitable for formulation of acid gold plating solutions comprising a mixture of potassium gold cyanide and potassium cobaltous ethylenediamine tetraacetate, the ratio of the two being about 1-50 parts of the gold by weight to as much as 25 parts of cobalt by weight. 4. An aqueous gold plating solution in accordance with claim 2 consisting essentially of:
12 parts by weight of pure gold as potassium auro (I) cyanide, 1 part by weight of cobalt as potassium cobaltous chelate of ethylenediamine-tetraacetic acid, and suflicient phosphoric acid, citric acid and potassium hydroxide to maintain the pH of said solution at a level in the range from 3 to 5.
5. An aqueous gold plating solution in accordance with claim 2 consisting essentially of:
12 parts by Weight of pure gold as potassium auro (I) cyanide,
3 parts by weight of cobalt as potassium cobaltous chelate of ethylenediaminetetraacetic acid, 125 parts by weight of potassium citrate,
.2 part by weight of antimony as antimony tartrate.
6. An aqueous gold plating solution in accordance with claim 2 consisting essentially of:
12 parts by weight of pure gold as potassium auro (I) cyanide,
1 part by weight of cobalt as potassium cobaltous chelate of ethylenediaminetetraacetic acid,
2 parts by weight of indium as the indium chelate of ethylenediaminetetraacetic acid, and sufiicient citric acid and potassium hydroxide to maintain the pH in the range from 3 to 4.5.
7. An aqueous gold plating solution in accordance with claim 2 consisting essentially of:
6 parts by weight of pure gold as the potassium auro (I) cyanide, 1 part by weight of cobalt as the potassium cobaltous chelate of ethylenediaminetetraacetic acid, and sufiicient acetic acid and potassium acetate tomaintain the pH of said solution at a level in the rangefrorn 3 to 5.
8. An aqueous gold plating solution in acordance with claim 2 consisting essentially of:
8 parts by weight of pure gold in the form of potassium auro (I) cyanide,
3 parts by weight of cobalt as potassium cobaltous chelate of ethylenediaminetetraacetic acid, and sufficient monopotassium phosphate, citric acid and potassium hydroxide to maintain the pH of said solution at a level in the rangefrom 3 to 4.
9. In the method of electroplating gold from aqueous solutions, the improvement comprising forming a water solution of gold cyanide and maintaining in said solution a minor amount of cobalt of valence II as a chelate of an ethylenediamine acetic acid compound, said solution containing buifering ingredients suitable to maintain the pH of the solution in the range from about 3 to about 5, so that at current densities up to 100 amperes per square foot'a bright gold plate is achieved at temperatures up to 100 F. without deposition of cobalt.
10. In the process of plating gold to obtain bright gold deposits on objects in accordance with claim 9, the improvement comprising formulating said gold as the auro (I) cyanide in an aqueous medium wherein the pH of said medium is maintained in the range from about 3 to about 5, in the presence of organic acids selected from the group consisting of acetic, citric, citratonic, itaconic, glutaric, lactic succinic and gluconic acidsand mixtures thereof, and also in the presence of a cobaltous chelate of a compound selected from the group consisting of ethylenediaminetetraacetic acid, hydroxyethyl ethylenediamine triacetic' acid, hydroxypropylethylenediaminetriacetic acid, and ethylenediaminediacetic'acid.
11. In'the electroplating of gold from aqueous solution in accordance with claim 9, the improvement which comprises maintaining the gold in solution as the auro (I) cyanide at a pH in the range from about 3 to about 5 in the presence of an alloying metal for simultaneous electrodepo'sition with gold, the improvement comprising acetic acid, hydroxyethyl ethylenediamine triacetic acid,
maintaining in the said solution acobaltous chelate selected from the group consisting of ethylenediaminetetrahydroxypropylethylenediaminetriacetic acid, and ethylenediaminediacetic acid.
References Cited in the file of this patent UNITED STATES PATENTS Ostrow et al. Jan. 3, 1961
Claims (1)
1. IN A BIRGHT GOLD PLATING BATH CONSISTING ESSENTIALLY OF A WATER SOLUTION OF GOLD CYANIDE, THE IMPROVEMENT WHICH COMPISES INCORPORATING AND MAINTAINING IN SAID SOLUTION A COBALTOUS CHELATE OF AN ETHYLENEDIAMINE ACETIC ACID COMPOUND, THE COBALTOUS CHELATE HAVING A STABILITY SUCH THAT IT IS NOT ELECTRODEPOSITED WITH THE GOLD UNDER PLATING CONDITIONS, THE SOLUTION BEING BUFFERED AT A PH LEVEL IN THE RANGE FROM ABOUT 3 TO ABOUT 5, THE CHELATE BEING SUCH THAT COBALT IS NOT DEPOSITED UNDER PLATING CONDITIONS.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US808913A US3149057A (en) | 1959-04-27 | 1959-04-27 | Acid gold plating |
| GB37258/59A GB880656A (en) | 1959-04-27 | 1959-11-03 | Acid gold plating |
| DET17650A DE1213697B (en) | 1959-04-27 | 1959-12-23 | Acid cyanide bath, mixture for the production of the bath and process for the galvanic deposition of shiny gold or gold alloy coatings |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US808913A US3149057A (en) | 1959-04-27 | 1959-04-27 | Acid gold plating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3149057A true US3149057A (en) | 1964-09-15 |
Family
ID=25200098
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US808913A Expired - Lifetime US3149057A (en) | 1959-04-27 | 1959-04-27 | Acid gold plating |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US3149057A (en) |
| DE (1) | DE1213697B (en) |
| GB (1) | GB880656A (en) |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3303112A (en) * | 1963-10-28 | 1967-02-07 | American Chem & Refining Co | Acidic gold cyanide electroplating bath and process |
| US3423295A (en) * | 1966-02-23 | 1969-01-21 | Engelhard Ind Inc | Gold plating |
| US3460953A (en) * | 1966-05-27 | 1969-08-12 | Pennsalt Chemicals Corp | Process for depositing brasslike coatings and composition therefor |
| US3475292A (en) * | 1966-02-10 | 1969-10-28 | Technic | Gold plating bath and process |
| US3902977A (en) * | 1973-12-13 | 1975-09-02 | Engelhard Min & Chem | Gold plating solutions and method |
| US4076598A (en) * | 1976-11-17 | 1978-02-28 | Amp Incorporated | Method, electrolyte and additive for electroplating a cobalt brightened gold alloy |
| DE2831756A1 (en) * | 1977-07-20 | 1979-02-01 | Technic | COBALT AND NICKEL ORGANOPHOSPHONATES AS GLOSS FORMS FOR ELECTROPLATING |
| DE3244092A1 (en) * | 1981-12-14 | 1983-06-23 | American Chemical & Refining Co., Inc., 06720 Waterbury, Conn. | AQUEOUS BATH FOR GALVANIC DEPOSITION OF GOLD AND METHOD FOR GALVANIC DEPOSIT OF HARD GOLD USING ITS USE |
| US4670107A (en) * | 1986-03-05 | 1987-06-02 | Vanguard Research Associates, Inc. | Electrolyte solution and process for high speed gold plating |
| US4744871A (en) * | 1986-09-25 | 1988-05-17 | Vanguard Research Associates, Inc. | Electrolyte solution and process for gold electroplating |
| WO1988009401A1 (en) * | 1987-05-29 | 1988-12-01 | Vanguard Research Associates, Inc. | Electrolyte solution and process for gold electroplating |
| US5575900A (en) * | 1995-07-03 | 1996-11-19 | Antelman Technologies Ltd. | Gold plating solutions |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3562120A (en) * | 1966-09-07 | 1971-02-09 | Sel Rex Corp | Plating of smooth,semibright gold deposits |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2724687A (en) * | 1952-05-08 | 1955-11-22 | Spreter Victor | Baths for the deposit of gold alloys by electroplating |
| US2905601A (en) * | 1957-08-13 | 1959-09-22 | Sel Rex Corp | Electroplating bright gold |
| US2967135A (en) * | 1960-06-08 | 1961-01-03 | Barnet D Ostrow | Electroplating baths for hard bright gold deposits |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE731102C (en) * | 1941-12-13 | 1943-02-03 | Dr Herbert Brintzinger | Process for the production of metallic coatings |
| NL219700A (en) * | 1956-09-08 |
-
1959
- 1959-04-27 US US808913A patent/US3149057A/en not_active Expired - Lifetime
- 1959-11-03 GB GB37258/59A patent/GB880656A/en not_active Expired
- 1959-12-23 DE DET17650A patent/DE1213697B/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2724687A (en) * | 1952-05-08 | 1955-11-22 | Spreter Victor | Baths for the deposit of gold alloys by electroplating |
| US2905601A (en) * | 1957-08-13 | 1959-09-22 | Sel Rex Corp | Electroplating bright gold |
| US2967135A (en) * | 1960-06-08 | 1961-01-03 | Barnet D Ostrow | Electroplating baths for hard bright gold deposits |
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3303112A (en) * | 1963-10-28 | 1967-02-07 | American Chem & Refining Co | Acidic gold cyanide electroplating bath and process |
| US3475292A (en) * | 1966-02-10 | 1969-10-28 | Technic | Gold plating bath and process |
| US3423295A (en) * | 1966-02-23 | 1969-01-21 | Engelhard Ind Inc | Gold plating |
| US3460953A (en) * | 1966-05-27 | 1969-08-12 | Pennsalt Chemicals Corp | Process for depositing brasslike coatings and composition therefor |
| US3902977A (en) * | 1973-12-13 | 1975-09-02 | Engelhard Min & Chem | Gold plating solutions and method |
| US4076598A (en) * | 1976-11-17 | 1978-02-28 | Amp Incorporated | Method, electrolyte and additive for electroplating a cobalt brightened gold alloy |
| DE2831756A1 (en) * | 1977-07-20 | 1979-02-01 | Technic | COBALT AND NICKEL ORGANOPHOSPHONATES AS GLOSS FORMS FOR ELECTROPLATING |
| US4186064A (en) * | 1977-07-20 | 1980-01-29 | Technic, Inc. | Method and electrolyte for electrodeposition of bright gold and gold alloys |
| DE3244092A1 (en) * | 1981-12-14 | 1983-06-23 | American Chemical & Refining Co., Inc., 06720 Waterbury, Conn. | AQUEOUS BATH FOR GALVANIC DEPOSITION OF GOLD AND METHOD FOR GALVANIC DEPOSIT OF HARD GOLD USING ITS USE |
| US4396471A (en) * | 1981-12-14 | 1983-08-02 | American Chemical & Refining Company, Inc. | Gold plating bath and method using maleic anhydride polymer chelate |
| US4670107A (en) * | 1986-03-05 | 1987-06-02 | Vanguard Research Associates, Inc. | Electrolyte solution and process for high speed gold plating |
| US4744871A (en) * | 1986-09-25 | 1988-05-17 | Vanguard Research Associates, Inc. | Electrolyte solution and process for gold electroplating |
| WO1988009401A1 (en) * | 1987-05-29 | 1988-12-01 | Vanguard Research Associates, Inc. | Electrolyte solution and process for gold electroplating |
| WO1988009834A1 (en) * | 1987-06-01 | 1988-12-15 | Vanguard Research Associates, Inc. | Electrolyte solution and process for gold electroplating |
| US5575900A (en) * | 1995-07-03 | 1996-11-19 | Antelman Technologies Ltd. | Gold plating solutions |
Also Published As
| Publication number | Publication date |
|---|---|
| DE1213697B (en) | 1966-03-31 |
| GB880656A (en) | 1961-10-25 |
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