US3440151A - Electrodeposition of copper-tin alloys - Google Patents

Electrodeposition of copper-tin alloys Download PDF

Info

Publication number
US3440151A
US3440151A US460852A US3440151DA US3440151A US 3440151 A US3440151 A US 3440151A US 460852 A US460852 A US 460852A US 3440151D A US3440151D A US 3440151DA US 3440151 A US3440151 A US 3440151A
Authority
US
United States
Prior art keywords
bath
copper
tin
alkali
cyanide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US460852A
Inventor
Robert Duva
Bernard Katz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OMI International Corp
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Application granted granted Critical
Publication of US3440151A publication Critical patent/US3440151A/en
Assigned to OXY METAL INDUSTRIES CORPORATION reassignment OXY METAL INDUSTRIES CORPORATION CHANGE OF NAME (SEE DOCUMENT FOR DETAILS). 4-09-74 Assignors: OXY METAL FINISHING CORPORATION
Assigned to HOOKER CHEMICALS & PLASTICS CORP. reassignment HOOKER CHEMICALS & PLASTICS CORP. MERGER (SEE DOCUMENT FOR DETAILS). Assignors: OXY METAL INDUSTRIES CORPORATION
Assigned to OCCIDENTAL CHEMICAL CORPORATION reassignment OCCIDENTAL CHEMICAL CORPORATION CHANGE OF NAME (SEE DOCUMENT FOR DETAILS). EFFECTIVE MARCH 30, 1982. Assignors: HOOKER CHEMICAS & PLASTICS CORP.
Assigned to OMI INTERNATIONAL CORPORATION reassignment OMI INTERNATIONAL CORPORATION ASSIGNMENT OF ASSIGNORS INTEREST. Assignors: OCCIDENTAL CHEMICAL CORPORATION
Assigned to MANUFACTURERS HANOVER TRUST COMPANY, A CORP OF reassignment MANUFACTURERS HANOVER TRUST COMPANY, A CORP OF SECURITY INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: INTERNATIONAL CORPORATION, A CORP OF DE
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/58Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of copper

Definitions

  • This invention relates to an improved process .of electroplating copper-tin alloys, i.e. bronzes and to electrolytic compositions for plating such alloys.
  • aqueous electrolytic bath composition containing tin and copper in which the tendency for tin to sludge out is nullified.
  • This invention is based on the discovery that the tendency of tin to sludge out of a copper-tin bath can be prevented by incorporating considerable quantities of the salts of acetic acid substituted aliphatic amines, such as the salts of ethylenediaminetetracetic acid (EDTA) and diethylenetriaminepentaacetate, into the plating bath.
  • EDTA ethylenediaminetetracetic acid
  • the addition of small quantities of EDTA and similar compounds in acid-tin baths has been described to function as a brightener, and such addition has also been disclosed for extending the bright range of brass solutions but the discovery of the effectiveness of relatively large quantities of this material as a sludge inhibitor was totally unexpected.
  • aqueous electrolytic bath composition for plating bright bronze in which the tendency for tin to sludgeout is nullified.
  • This the bath of the invention comprises the following ingredients:
  • Copper cyanide (g./l.) Alkali Stannate (g./l.) Alkali cyanide (g./l.) Alkali hydroxide (g./l.) Agali aminoaeetates (g p
  • the copper cyanide is at least partially present in said bath as the double cyanide of copper and alkali and the copper may be added in the form of said double cyanide.
  • Potassium and sodium are the usual alkalis re ferred in the table but ammonium and lithium compounds can also be employed.
  • alkali amino acetates will be understood to include the ammonium compounds, and to include such amines carrying acetate groups having a pK value between about 12 and 22.
  • the acid amino acetates (instead of salts) can be added and the tin can be added as the stannic oxide provided the additional alkali hydroxide necessary to form the corresponding salts is taken into account to provide the required pH.
  • the deposits obtained from this bath are smooth, but not fully bright.
  • the bath is operated above room temperature (approx. 110-160 F.) preferably at a current density of 1 to 10 amp/dm.
  • the pH is higher than 12.5 as stated above.
  • Example 1 A bath is made of the following components:
  • Example 2 The process was conducted as in Example 1 except that 0.1 g./l. of lead as lead acetate was added to the bath. The panels obtained were fully bright. The bath has the same stability as that of Example 1.
  • Copper cyanide -70 Alkali metal stannate -90 Alkali cyanide -1 60-120 Alkali hydroxide (to pH l2.5) 10-80 Alkali metal alkylene aminoacetates selected from the group consisting of alkali metal alkylene diamino tetra acetate and alkali metal alkylene triamino penta acetate 25-200 3.
  • An aqueous electrolytic bath for co-electrodepositing copper and tin containing the following ingredients:
  • Alkali metal alkylene aminoacetates selected from the group consisting of alkali metal alkylene diamino tetra acetate and alkali metal alkylene triamino penta acetate 725-200 5.
  • An aqueous electrolytic bath according to claim 4 containing in addition a lead compound in the amount of about 0.05 to 0.75 g./l. calculated as lead.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Description

United States Patent Ofice 3,440,151 Patented Apr. 22, 1969 ABSTRACT OF THE DISCLOSURE In the plating of copper-tin alloys from alkaline baths containing free cyanide, the tendency of tin to sludge out is suppressed by the addition of alkali aminoacetate chelating agents, such as EDTA, in amounts of over 25 g./l., i.e., in excess of the amounts added to function as a brightener.
This invention relates to an improved process .of electroplating copper-tin alloys, i.e. bronzes and to electrolytic compositions for plating such alloys.
One of the problems in prior art plating of coppertin alloys and, indeed, of tin plating itself has been the tendency of the tin to sludge out, making it difficult in the case of the alloy bath to maintain the proper CuzSn ratio even though anodes of the alloy were soluble in the bath.
Among the objects of this invention is to provide an aqueous electrolytic bath composition containing tin and copper in which the tendency for tin to sludge out is nullified.
This invention is based on the discovery that the tendency of tin to sludge out of a copper-tin bath can be prevented by incorporating considerable quantities of the salts of acetic acid substituted aliphatic amines, such as the salts of ethylenediaminetetracetic acid (EDTA) and diethylenetriaminepentaacetate, into the plating bath. The addition of small quantities of EDTA and similar compounds in acid-tin baths has been described to function as a brightener, and such addition has also been disclosed for extending the bright range of brass solutions but the discovery of the effectiveness of relatively large quantities of this material as a sludge inhibitor was totally unexpected. We have consistently found that the addition of a large amount of such a chelating or complexing agent does in fact provide a plating bath much more stable than the same formulation, absent the EDTA or similar salt.
Among other objects of the invention is to provide an aqueous electrolytic bath composition for plating bright bronze in which the tendency for tin to sludgeout is nullified.
Aside from the requirement that relatively large quantities of the EDTA type of complexing agents be added to the bath, the range of other components is not extremely critical. The relative proportions of tin and cop per in the bath of course will be governed by the proportion of such metals desired in the plating layer. Alkali is present in suificient amount to provide a pH of at least 12.5. A certain amount of free potassium cyanide is desirable in the bath.
Various other ingredients such as brighteners, etc., can be added to the bath without undesirability affecting its operation. Soluble lead salts are particularly effective as brighteners.
This the bath of the invention comprises the following ingredients:
Copper cyanide (g./l.) Alkali Stannate (g./l.) Alkali cyanide (g./l.) Alkali hydroxide (g./l.) Agali aminoaeetates (g p The foregoing composition will be understood not to be limiting as to the way in which the various ingredients are added. The copper cyanide is at least partially present in said bath as the double cyanide of copper and alkali and the copper may be added in the form of said double cyanide. Potassium and sodium are the usual alkalis re ferred in the table but ammonium and lithium compounds can also be employed. The term alkali amino acetates will be understood to include the ammonium compounds, and to include such amines carrying acetate groups having a pK value between about 12 and 22. The acid amino acetates (instead of salts) can be added and the tin can be added as the stannic oxide provided the additional alkali hydroxide necessary to form the corresponding salts is taken into account to provide the required pH.
The deposits obtained from this bath are smooth, but not fully bright. The addition of brighteners described as eifective in bronze solutions, particularly about 0.05- 0.07 g./l. of lead, as a salt soluble in the bath, makes it possible to obtain fully bright and highly levelled deposits from this bath.
The bath is operated above room temperature (approx. 110-160 F.) preferably at a current density of 1 to 10 amp/dm. The pH is higher than 12.5 as stated above.
Bronze anodes will dissolve but can lead to sludge formation so We generally prefer to operate with insoluble anodes, stainless steel is satisfactory, and to feed the metals into the bath in the form of compounds as the alloy is plated out.
Example 1 A bath is made of the following components:
Copper cyanide g./l Potassium stannate, K SnO g./l
KCN g./l s5 KOH g./l 4s Na EDTA g./l pH 13.5
With brass or steel panels as the cathode, at a current density of 4 amp/dm. and at a temperature of 140 F., smooth deposits are obtained. The deposit is approximately 80% Cu. This bath was stable for 120 days, showing no sludge formation and at the end of this time, plated panels equivalent to those obtained from the freshly made bath were obtained.
Example 2 The process was conducted as in Example 1 except that 0.1 g./l. of lead as lead acetate was added to the bath. The panels obtained were fully bright. The bath has the same stability as that of Example 1.
The features and principles underlying the invention described above in connection with specific exemplifications will suggest to those skilled in the art many other modifications thereof. It is accordingly desired that the appended claims shall not be limited to any specific feature or details thereof.
We claim:
1. The process for co-electrodepositing copper and tin which comprises electrolyzing an aqueous solution containing the following ingredients:
G./l. Copper cyanide 40 Potassium stannate 50 KON 85 KOH 45 Na EDTA 100 2. The process of co-electrodepositing copper and tin which comprises electrolyzing an aqueous solution containing the following ingredients:
Copper cyanide -70 Alkali metal stannate -90 Alkali cyanide -1 60-120 Alkali hydroxide (to pH=l2.5) 10-80 Alkali metal alkylene aminoacetates selected from the group consisting of alkali metal alkylene diamino tetra acetate and alkali metal alkylene triamino penta acetate 25-200 3. A process as claimed in claim 2, comprising in ad- 4 dition 0.05 to 0.75 g./1. of lead, added as a soluble lead salt.
4. An aqueous electrolytic bath for co-electrodepositing copper and tin containing the following ingredients:
G./l. Copper cyanide 10-70 Alkali metal stannate 15-90 Alkali cyanide -120 Alkali hydroxide (to pH=l2.5).
Alkali metal alkylene aminoacetates selected from the group consisting of alkali metal alkylene diamino tetra acetate and alkali metal alkylene triamino penta acetate 725-200 5. An aqueous electrolytic bath as claimed in claim 4 wherein the alkali of said alkali metal stannate, alkali cyanide and alkali hydroxide is potassium.
6. An aqueous electrolytic bath according to claim 4 containing in addition a lead compound in the amount of about 0.05 to 0.75 g./l. calculated as lead.
7. An aqueous electrolytic bath as claimed in claim 4 wherein the alkali aminoacetate is alkali metal alkylene EDTA.
References Cited UNITED STATES PATENTS JOHN H. MACK, Primary Examiner.
G. L. KAPLAN, Assistant Examiner.
US. Cl. X.R. 20454, 123.
US460852A 1965-06-02 1965-06-02 Electrodeposition of copper-tin alloys Expired - Lifetime US3440151A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US46085265A 1965-06-02 1965-06-02

Publications (1)

Publication Number Publication Date
US3440151A true US3440151A (en) 1969-04-22

Family

ID=23830322

Family Applications (1)

Application Number Title Priority Date Filing Date
US460852A Expired - Lifetime US3440151A (en) 1965-06-02 1965-06-02 Electrodeposition of copper-tin alloys

Country Status (1)

Country Link
US (1) US3440151A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3769181A (en) * 1971-07-21 1973-10-30 Richardson Chemical Co Method of simultaneously electroplating and machining a metal surface
FR2244832A1 (en) * 1973-09-25 1975-04-18 Richardson Chemical Co Electroplating and machining process - using tool as anode
US4223826A (en) * 1979-01-29 1980-09-23 Usui Kokusai Sangyo Kabushiki Kaisha Method of brazing stainless steels
DE3346721A1 (en) * 1983-12-23 1985-06-27 Fa. Karl-Wilh. Hen, 5820 Gevelsberg Alkaline bath for depositing a high-lustre electroplated coating on a substrate
US4565608A (en) * 1983-11-02 1986-01-21 Degussa Aktiengesellschaft Alkaline cyanide bath for electrolytic deposition of copper-tin-alloy coatings
FR2688234A1 (en) * 1992-03-03 1993-09-10 Sarrel Process for protecting a silver or silver-coated article
WO1997021852A1 (en) * 1995-12-09 1997-06-19 Metallveredlung Gmbh & Co. Kg Method of forming an alloy layer
US20100323115A1 (en) * 2005-12-05 2010-12-23 Rohm And Haas Electronic Materials Llc Metallization of dielectrics
CN108138346A (en) * 2015-09-30 2018-06-08 科文特亚股份公司 The purposes of the electrochemical deposition method of electroplating bath, the alloy for electrochemical deposition Cu-Sn-Zn-Pd alloys, the base material comprising the alloy and base material

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2436316A (en) * 1946-04-25 1948-02-17 Westinghouse Electric Corp Bright alloy plating
US2658032A (en) * 1949-06-11 1953-11-03 City Auto Stamping Co Electrodeposition of bright copper-tin alloy
US2854388A (en) * 1955-03-14 1958-09-30 City Auto Stamping Co Electrodeposition of copper-tin alloys
US2886500A (en) * 1956-11-01 1959-05-12 Battelle Development Corp Electroplating of copper alloys
US2989448A (en) * 1959-04-08 1961-06-20 Daniel R France Brass, copper-tin, and copper plating bath brightener
CA655356A (en) * 1963-01-08 Flack Arnold Electrodeposition of metals having two valences and alloys thereof
US3108006A (en) * 1959-07-13 1963-10-22 M & T Chemicals Inc Plating on aluminum
US3120550A (en) * 1960-05-27 1964-02-04 Dow Chemical Co Organo-tin and lead chelates
US3152155A (en) * 1960-01-04 1964-10-06 Dow Chemical Co Insoluble chelates of divalent tin, germanium, and lead

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA655356A (en) * 1963-01-08 Flack Arnold Electrodeposition of metals having two valences and alloys thereof
US2436316A (en) * 1946-04-25 1948-02-17 Westinghouse Electric Corp Bright alloy plating
US2658032A (en) * 1949-06-11 1953-11-03 City Auto Stamping Co Electrodeposition of bright copper-tin alloy
US2854388A (en) * 1955-03-14 1958-09-30 City Auto Stamping Co Electrodeposition of copper-tin alloys
US2886500A (en) * 1956-11-01 1959-05-12 Battelle Development Corp Electroplating of copper alloys
US2989448A (en) * 1959-04-08 1961-06-20 Daniel R France Brass, copper-tin, and copper plating bath brightener
US3108006A (en) * 1959-07-13 1963-10-22 M & T Chemicals Inc Plating on aluminum
US3152155A (en) * 1960-01-04 1964-10-06 Dow Chemical Co Insoluble chelates of divalent tin, germanium, and lead
US3120550A (en) * 1960-05-27 1964-02-04 Dow Chemical Co Organo-tin and lead chelates

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3769181A (en) * 1971-07-21 1973-10-30 Richardson Chemical Co Method of simultaneously electroplating and machining a metal surface
FR2244832A1 (en) * 1973-09-25 1975-04-18 Richardson Chemical Co Electroplating and machining process - using tool as anode
US4223826A (en) * 1979-01-29 1980-09-23 Usui Kokusai Sangyo Kabushiki Kaisha Method of brazing stainless steels
US4565608A (en) * 1983-11-02 1986-01-21 Degussa Aktiengesellschaft Alkaline cyanide bath for electrolytic deposition of copper-tin-alloy coatings
US4605474A (en) * 1983-11-02 1986-08-12 Gerd Hoffacker Alkaline cyanide bath for electrolytic deposition of copper-tin-alloy coatings
DE3346721A1 (en) * 1983-12-23 1985-06-27 Fa. Karl-Wilh. Hen, 5820 Gevelsberg Alkaline bath for depositing a high-lustre electroplated coating on a substrate
FR2688234A1 (en) * 1992-03-03 1993-09-10 Sarrel Process for protecting a silver or silver-coated article
WO1997021852A1 (en) * 1995-12-09 1997-06-19 Metallveredlung Gmbh & Co. Kg Method of forming an alloy layer
US20100323115A1 (en) * 2005-12-05 2010-12-23 Rohm And Haas Electronic Materials Llc Metallization of dielectrics
CN108138346A (en) * 2015-09-30 2018-06-08 科文特亚股份公司 The purposes of the electrochemical deposition method of electroplating bath, the alloy for electrochemical deposition Cu-Sn-Zn-Pd alloys, the base material comprising the alloy and base material
EP3150744B1 (en) 2015-09-30 2020-02-12 COVENTYA S.p.A. Electroplating bath for electrochemical deposition of a cu-sn-zn-pd alloy layer, method for electrochemical deposition of said alloy layer, substrate comprising said alloy layer and uses of the coated substrate
CN108138346B (en) * 2015-09-30 2021-03-05 科文特亚股份公司 Electroplating bath for the electrochemical deposition of a Cu-Sn-Zn-Pd alloy, method for the electrochemical deposition of said alloy, substrate comprising said alloy and use of the substrate

Similar Documents

Publication Publication Date Title
US3905878A (en) Electrolyte for and method of bright electroplating of tin-lead alloy
US3785939A (en) Tin/lead plating bath and method
EP1874982B1 (en) Method for electrodeposition of bronzes
US4331518A (en) Bismuth composition, method of electroplating a tin-bismuth alloy and electroplating bath therefor
JP3481020B2 (en) Sn-Bi alloy plating bath
US3475292A (en) Gold plating bath and process
US4098656A (en) Bright palladium electroplating baths
JP3274232B2 (en) Tin-bismuth alloy plating bath and plating method using the same
EP0611840A1 (en) Cyanide-free plating solutions for monovalent metals
US4118289A (en) Tin/lead plating bath and method
US20060137991A1 (en) Method for bronze galvanic coating
US20040149587A1 (en) Electroplating solution containing organic acid complexing agent
US4013523A (en) Tin-gold electroplating bath and process
US3440151A (en) Electrodeposition of copper-tin alloys
KR910004972B1 (en) Manufacturing method of tin-cobalt, tin-nickel, tin-lead binary alloy electroplating bath and electroplating bath manufactured by this method
US3764489A (en) Electrodeposition of gold alloys
US3637474A (en) Electrodeposition of palladium
US4069113A (en) Electroplating gold alloys and electrolytes therefor
US2750333A (en) Electrodeposition of antimony and antimony alloys
US4265715A (en) Silver electrodeposition process
US3770596A (en) Gold plating bath for barrel plating operations
GB2046794A (en) Silver and gold/silver alloy plating bath and method
KR100368127B1 (en) Sn-Bi ALLOY PLATING BATH AND METHOD OF PLATING USING THE SAME
US4048023A (en) Electrodeposition of gold-palladium alloys
US2862861A (en) Copper cyanide plating process and solution therefor

Legal Events

Date Code Title Description
AS Assignment

Owner name: OXY METAL INDUSTRIES CORPORATION

Free format text: CHANGE OF NAME;ASSIGNOR:OXY METAL FINISHING CORPORATION;REEL/FRAME:003967/0084

Effective date: 19741220

AS Assignment

Owner name: HOOKER CHEMICALS & PLASTICS CORP.

Free format text: MERGER;ASSIGNOR:OXY METAL INDUSTRIES CORPORATION;REEL/FRAME:004075/0885

Effective date: 19801222

AS Assignment

Owner name: OCCIDENTAL CHEMICAL CORPORATION

Free format text: CHANGE OF NAME;ASSIGNOR:HOOKER CHEMICAS & PLASTICS CORP.;REEL/FRAME:004126/0054

Effective date: 19820330

AS Assignment

Owner name: OMI INTERNATIONAL CORPORATION, 21441 HOOVER ROAD,

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNOR:OCCIDENTAL CHEMICAL CORPORATION;REEL/FRAME:004190/0827

Effective date: 19830915

AS Assignment

Owner name: MANUFACTURERS HANOVER TRUST COMPANY, A CORP OF NY

Free format text: SECURITY INTEREST;ASSIGNOR:INTERNATIONAL CORPORATION, A CORP OF DE;REEL/FRAME:004201/0733

Effective date: 19830930