CH618990A5 - - Google Patents

Download PDF

Info

Publication number
CH618990A5
CH618990A5 CH429977A CH429977A CH618990A5 CH 618990 A5 CH618990 A5 CH 618990A5 CH 429977 A CH429977 A CH 429977A CH 429977 A CH429977 A CH 429977A CH 618990 A5 CH618990 A5 CH 618990A5
Authority
CH
Switzerland
Prior art keywords
dye
group
composition
amino
weight
Prior art date
Application number
CH429977A
Other languages
English (en)
French (fr)
Inventor
Toshio Yamazaki
Harriet J Cook
Melvin A Lipson
Original Assignee
Dynachem Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dynachem Corp filed Critical Dynachem Corp
Publication of CH618990A5 publication Critical patent/CH618990A5/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/907—Synthetic resins or natural rubbers -- part of the class 520 series involving precursor of an ultraviolet absorber, e.g. monobenzoate
CH429977A 1976-04-26 1977-04-05 CH618990A5 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/680,304 US4065315A (en) 1976-04-26 1976-04-26 Phototropic dye system and photosensitive compositions containing the same

Publications (1)

Publication Number Publication Date
CH618990A5 true CH618990A5 (de) 1980-08-29

Family

ID=24730555

Family Applications (1)

Application Number Title Priority Date Filing Date
CH429977A CH618990A5 (de) 1976-04-26 1977-04-05

Country Status (16)

Country Link
US (1) US4065315A (de)
JP (1) JPS6012623B2 (de)
AU (1) AU508227B2 (de)
BE (1) BE853935A (de)
BR (1) BR7702613A (de)
CA (1) CA1103083A (de)
CH (1) CH618990A5 (de)
DD (1) DD130810A5 (de)
DE (1) DE2718200C2 (de)
FR (1) FR2349856A1 (de)
GB (1) GB1555215A (de)
IL (1) IL51638A (de)
IT (1) IT1073231B (de)
MX (1) MX144887A (de)
NL (1) NL174766C (de)
SE (1) SE435105B (de)

Families Citing this family (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4552830A (en) * 1978-05-09 1985-11-12 Dynachem Corporation Carbonylic halides as activators for phototropic compositions
US4343885A (en) * 1978-05-09 1982-08-10 Dynachem Corporation Phototropic photosensitive compositions containing fluoran colorformer
CA1164710A (en) * 1978-05-09 1984-04-03 Edward J. Reardon, Jr. Phototropic photosensitive compositions containing fluoran colorformer
CA1153610A (en) * 1978-05-09 1983-09-13 Edward J. Reardon, Jr. Carbonylic halides as activators for phototropic compositions
DE2850585A1 (de) * 1978-11-22 1980-06-04 Hoechst Ag Photopolymerisierbares gemisch
DE2953553T1 (de) * 1979-02-26 1982-03-25 Xidex Corp Contrast colorant for photopolymerizable compositions
DE3114931A1 (de) * 1981-04-13 1982-10-28 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes photopolymerisierbares kopiermaterial
US4394439A (en) * 1981-05-28 1983-07-19 Robillard Jean J Non-silver X-ray recording process
JPS5888741A (ja) * 1981-11-20 1983-05-26 Hitachi Chem Co Ltd 感光性樹脂組成物及び感光性樹脂組成物積層体
JPS5964835A (ja) * 1982-10-05 1984-04-12 Mitsui Toatsu Chem Inc フオトレジスト組成物
JPS5978339A (ja) * 1982-10-28 1984-05-07 Fuji Photo Film Co Ltd 光重合性組成物
JPS5983152A (ja) * 1982-11-04 1984-05-14 Mitsui Toatsu Chem Inc フオトレジスト組成物
JPS5991438A (ja) * 1982-11-17 1984-05-26 Fuji Photo Film Co Ltd 感光感熱記録材料
JPS6024544A (ja) * 1983-07-21 1985-02-07 Mitsui Toatsu Chem Inc 回路基板材料
JPS6063532A (ja) * 1983-08-16 1985-04-11 Fuji Photo Film Co Ltd 光重合性組成物
US4634657A (en) * 1984-08-23 1987-01-06 E. I. Du Pont De Nemours And Company Photoimaging compositions containing substituted 1,2-dibromoethanes
JPS6261045A (ja) * 1985-09-11 1987-03-17 Fuji Photo Film Co Ltd 光重合性組成物
US4710445A (en) * 1986-04-22 1987-12-01 Minnesota Mining And Manufacturing Company Resist imageable photopolymerizable compositions
DE3613632A1 (de) * 1986-04-23 1987-10-29 Hoechst Ag Photopolymerisierbares gemisch und dieses enthaltendes photopolymerisierbares aufzeichnungsmaterial
DE3717036A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien
DE3717034A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien, sowie neue chinazolon-4-verbindungen
DE3717037A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien
DE3717038A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien
DE3735088A1 (de) * 1987-10-16 1989-04-27 Hoechst Ag Photopolymerisierbares gemisch
JP2768481B2 (ja) * 1988-01-29 1998-06-25 オリエンタル写真工業株式会社 感光体、感光材料および画像形成方法
US5698373A (en) * 1988-09-22 1997-12-16 Toray Industries, Incorporated Photosensitive relief printing plate and photosensitive intaglio printing plate
DE68921275T2 (de) * 1988-09-22 1995-06-22 Toray Industries Lichtempfindliche Buch- und Tiefdruckform.
DE4129284A1 (de) * 1991-09-03 1993-03-04 Agfa Gevaert Ag Bilderzeugungselement mit einem fotopolymerisierbaren monomer
PL366326A1 (en) * 1998-09-28 2005-01-24 Kimberly-Clark Worldwide, Inc. Novel photoinitiators and applications therefor
EP1209528B1 (de) * 2000-11-28 2015-07-22 Eternal Technology Corporation Photoresistzusammensetzung
JP4617580B2 (ja) * 2001-02-09 2011-01-26 日立化成工業株式会社 感光性樹脂組成物及びそれを用いた感光性エレメント
DE10259374A1 (de) * 2002-12-18 2004-07-08 Atto-Tec Gmbh Carboxamid-substituierte Farbstoffe für analytische Anwendungen
US7144676B2 (en) 2004-02-06 2006-12-05 Rohm And Haas Electronic Materials Llc Imaging compositions and methods
US20050175941A1 (en) 2004-02-06 2005-08-11 Rohm And Hass Electronic Materials, L.L.C. Imaging composition and method
US7270932B2 (en) * 2004-02-06 2007-09-18 Rohm And Haas Electronic Materials Llc Imaging composition and method
KR101125678B1 (ko) 2004-02-06 2012-03-28 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨. 개선된 이미지화 조성물 및 방법
US7977026B2 (en) 2004-02-06 2011-07-12 Rohm And Haas Electronic Materials Llc Imaging methods
JPWO2007034610A1 (ja) * 2005-09-21 2009-03-19 日立化成工業株式会社 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法、プリント配線板の製造方法、及び、プラズマディスプレイの隔壁形成方法
KR101298884B1 (ko) * 2008-02-27 2013-08-21 미쓰비시 가가꾸 가부시키가이샤 컬러 필터용 착색 수지 조성물, 컬러 필터, 유기 ｅｌ 디스플레이 및 액정 표시 장치
CN102307878B (zh) 2008-12-10 2014-10-15 维斯塔实验室有限公司 3，6-二取代的呫吨鎓盐
US8163155B2 (en) * 2008-12-29 2012-04-24 Basf Coatings Gmbh Sulfo or sulfamyl group-containing cathodic electrocoat resin
CN102799070B (zh) * 2012-08-27 2014-03-05 珠海市能动科技光学产业有限公司 双层涂布的负性光致抗蚀干膜
CN115185160B (zh) * 2022-09-09 2023-06-27 之江实验室 基于纤维素衍生物的激光直写光刻胶组合物及图案化方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH378283A (de) * 1959-10-15 1964-07-31 Agfa Ag Verfahren zur Herstellung von farbigen photographischen Bildern auf Textilmaterial
US3102029A (en) * 1961-06-16 1963-08-27 Horizons Inc Print-out process with aryl amine and polyphenylmethane carbinols
DE1214084B (de) * 1963-09-28 1966-04-07 Kalle Ag Aufzeichnungsmaterial zur Herstellung von Bildern oder Flachdruckformen
US3370026A (en) * 1964-09-24 1968-02-20 American Cyanamid Co Method of producing photochromic castings
US3342603A (en) * 1964-09-28 1967-09-19 Horizons Inc Non-silver photosensitive printout compositions
US3443945A (en) * 1965-10-22 1969-05-13 Horizons Research Inc Photosensitive color-forming composition
DE1286898B (de) * 1965-11-10 1969-01-09 Kalle Ag Lichtempfindliche Schicht
US3712817A (en) * 1971-03-01 1973-01-23 Horizons Inc Dry working photosensitive compositions comprising organic halogen compounds,ethylene compounds and carbinol compounds
US3769023A (en) * 1971-05-07 1973-10-30 Horizons Inc Light sensitive reproduction and electron beam sensitive material
US3899338A (en) * 1972-02-09 1975-08-12 Horizons Inc Photosensitive material suitable for use as a photoresist
US3926643A (en) * 1974-05-16 1975-12-16 Du Pont Photopolymerizable compositions comprising initiator combinations comprising thioxanthenones

Also Published As

Publication number Publication date
IL51638A0 (en) 1977-05-31
BR7702613A (pt) 1978-04-04
JPS6012623B2 (ja) 1985-04-02
GB1555215A (en) 1979-11-07
IL51638A (en) 1980-06-30
AU2317077A (en) 1978-09-14
NL174766C (nl) 1984-08-01
AU508227B2 (en) 1980-03-13
US4065315A (en) 1977-12-27
NL7704529A (nl) 1977-10-28
DD130810A5 (de) 1978-05-03
IT1073231B (it) 1985-04-13
MX144887A (es) 1981-12-01
BE853935A (fr) 1977-08-16
CA1103083A (en) 1981-06-16
JPS52130701A (en) 1977-11-02
NL174766B (nl) 1984-03-01
DE2718200A1 (de) 1977-10-27
FR2349856B1 (de) 1981-11-20
FR2349856A1 (fr) 1977-11-25
DE2718200C2 (de) 1982-12-30
SE435105B (sv) 1984-09-03
SE7704646L (sv) 1977-11-30

Similar Documents

Publication Publication Date Title
CH618990A5 (de)
US4268667A (en) Derivatives of aryl ketones based on 9,10-dihydro-9,10-ethanoanthracene and p-dialkyl-aminoaryl aldehydes as visible sensitizers for photopolymerizable compositions
FR2477295A1 (fr) Composition resineuse photosensible d'urethane
JPS5928203B2 (ja) 光重合性組成物
FR2501388A1 (fr) Composition de resine photosensible et element photosensible utilisant ladite resine
JPS5928323B2 (ja) 光重合性組成物
JPS62173455A (ja) マイクロゲルを含有する感光性組成物
DE2602409A1 (de) Photopolymerisierbare masse und deren verwendung
DE2558528A1 (de) Aufzeichnungsmaterial
US4245031A (en) Photopolymerizable compositions based on salt-forming polymers and polyhydroxy polyethers
US4297435A (en) Contrast colorant for photopolymerizable compositions
JPH01161001A (ja) 光重合可能な混合物
JPS58144824A (ja) フォトレジスト製品
CH618991A5 (de)
FR2604534A1 (fr) Produit lamifie photodurcissable, procede pour sa preparation et circuit imprime l'utilisant
US4291115A (en) Elements and method which use photopolymerizable compositions based on salt-forming polymers and polyhydroxy polyethers
GB1576217A (en) Light-sensitive compositions
CA1288629C (en) Photopolymerizable composition and photopolymerizable recording materialcontaining said composition
US4886735A (en) Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon
US5041357A (en) Radiation-polymerizable mixture and recording material containing it
DD159226A5 (de) Fotoresistelement
US4891301A (en) Photopolymerizable recording materials, photoresist layers and lithographic printing plates based theron, and novel 4-quinazolone compounds
JPS61156116A (ja) 感光記録素子
DE2628562B2 (de) Photopolymerisierbare Massen und ihre Verwendung
GB1576218A (en) Light-sensitive compositions

Legal Events

Date Code Title Description
PL Patent ceased