CA946524A - Electrically alterable floating gate device and method for altering same - Google Patents

Electrically alterable floating gate device and method for altering same

Info

Publication number
CA946524A
CA946524A CA132,413A CA132413A CA946524A CA 946524 A CA946524 A CA 946524A CA 132413 A CA132413 A CA 132413A CA 946524 A CA946524 A CA 946524A
Authority
CA
Canada
Prior art keywords
floating gate
gate device
electrically alterable
altering
same
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA132,413A
Other languages
English (en)
Other versions
CA132413S (en
Inventor
Frohman-Bentchkowsky
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Intel Corp
Original Assignee
Intel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Intel Corp filed Critical Intel Corp
Application granted granted Critical
Publication of CA946524A publication Critical patent/CA946524A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/788Field effect transistors with field effect produced by an insulated gate with floating gate
    • H01L29/7881Programmable transistors with only two possible levels of programmation
    • H01L29/7884Programmable transistors with only two possible levels of programmation charging by hot carrier injection
    • H01L29/7886Hot carrier produced by avalanche breakdown of a PN junction, e.g. FAMOS
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0408Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
    • G11C16/0416Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing a single floating gate transistor and no select transistor, e.g. UV EPROM

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Non-Volatile Memory (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Semiconductor Memories (AREA)
CA132,413A 1971-01-15 1972-01-14 Electrically alterable floating gate device and method for altering same Expired CA946524A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10664371A 1971-01-15 1971-01-15

Publications (1)

Publication Number Publication Date
CA946524A true CA946524A (en) 1974-04-30

Family

ID=22312502

Family Applications (1)

Application Number Title Priority Date Filing Date
CA132,413A Expired CA946524A (en) 1971-01-15 1972-01-14 Electrically alterable floating gate device and method for altering same

Country Status (8)

Country Link
JP (1) JPS5146382B1 (fr)
BE (1) BE777996A (fr)
CA (1) CA946524A (fr)
DE (1) DE2201028C3 (fr)
FR (1) FR2121824B1 (fr)
GB (1) GB1383981A (fr)
IT (1) IT962050B (fr)
NL (1) NL7200562A (fr)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3797000A (en) * 1972-12-29 1974-03-12 Ibm Non-volatile semiconductor storage device utilizing avalanche injection and extraction of stored information
US3836992A (en) * 1973-03-16 1974-09-17 Ibm Electrically erasable floating gate fet memory cell
JPS5613029B2 (fr) * 1973-09-21 1981-03-25
DE2812049C2 (de) * 1974-09-20 1982-05-27 Siemens AG, 1000 Berlin und 8000 München n-Kanal-Speicher-FET
DE2638730C2 (de) * 1974-09-20 1982-10-28 Siemens AG, 1000 Berlin und 8000 München n-Kanal-Speicher-FET, Verfahren zum Entladen des Speichergate des n-Kanal-Speicher-FET und Verwendung des n-Kanal-Speicher-FET
DE2643987C2 (de) * 1974-09-20 1984-03-29 Siemens AG, 1000 Berlin und 8000 München n-Kanal-Speicher-FET
DE2445079C3 (de) * 1974-09-20 1981-06-04 Siemens AG, 1000 Berlin und 8000 München Speicher-Feldeffekttransistor
DE2525062C2 (de) 1975-06-05 1983-02-17 Siemens AG, 1000 Berlin und 8000 München Matrixanordnung aus n-Kanal-Speicher-FET
DE2505816C3 (de) * 1974-09-20 1982-04-22 Siemens AG, 1000 Berlin und 8000 München Verfahren zum Betrieb eines n-Kanal-Speicher-FET, n-Kanal-Speicher-FET zur Ausübung des Verfahrens und Anwendung des Verfahrens auf die n-Kanal-Speicher-FETs einer Speichermatrix
DE2513207C2 (de) * 1974-09-20 1982-07-01 Siemens AG, 1000 Berlin und 8000 München n-Kanal-Speicher-FET
DE2560220C2 (de) * 1975-03-25 1982-11-25 Siemens AG, 1000 Berlin und 8000 München n-Kanal-Speicher-FET
JPS5554415A (en) * 1978-10-16 1980-04-21 Nippon Gakki Seizo Kk Method and device for space set averaging for reverberation waveform
DE2845328C2 (de) * 1978-10-18 1986-04-30 Deutsche Itt Industries Gmbh, 7800 Freiburg Speichertransistor
JPS6162824A (ja) * 1985-06-22 1986-03-31 Nippon Gakki Seizo Kk 残響デ−タ圧縮取込方法およびその装置
WO2001024268A1 (fr) * 1999-09-24 2001-04-05 Intel Corporation Dispositif a memoire remanente avec grille flottante hautement fonctionnelle et son procede de fabrication
US6518618B1 (en) 1999-12-03 2003-02-11 Intel Corporation Integrated memory cell and method of fabrication

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3500142A (en) * 1967-06-05 1970-03-10 Bell Telephone Labor Inc Field effect semiconductor apparatus with memory involving entrapment of charge carriers
CA813537A (en) * 1967-10-17 1969-05-20 Joseph H. Scott, Jr. Semiconductor memory device

Also Published As

Publication number Publication date
FR2121824A1 (fr) 1972-08-25
DE2201028A1 (de) 1972-08-31
DE2201028C3 (de) 1981-07-09
IT962050B (it) 1973-12-20
GB1383981A (en) 1974-02-12
NL7200562A (fr) 1972-07-18
JPS5146382B1 (fr) 1976-12-08
FR2121824B1 (fr) 1977-04-01
BE777996A (fr) 1972-05-02
DE2201028B2 (de) 1979-01-18

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