CA946524A - Electrically alterable floating gate device and method for altering same - Google Patents

Electrically alterable floating gate device and method for altering same

Info

Publication number
CA946524A
CA946524A CA132,413A CA132413A CA946524A CA 946524 A CA946524 A CA 946524A CA 132413 A CA132413 A CA 132413A CA 946524 A CA946524 A CA 946524A
Authority
CA
Canada
Prior art keywords
floating gate
gate device
electrically alterable
altering
same
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA132,413A
Other versions
CA132413S (en
Inventor
Frohman-Bentchkowsky
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Intel Corp
Original Assignee
Intel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Intel Corp filed Critical Intel Corp
Application granted granted Critical
Publication of CA946524A publication Critical patent/CA946524A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/788Field effect transistors with field effect produced by an insulated gate with floating gate
    • H01L29/7881Programmable transistors with only two possible levels of programmation
    • H01L29/7884Programmable transistors with only two possible levels of programmation charging by hot carrier injection
    • H01L29/7886Hot carrier produced by avalanche breakdown of a PN junction, e.g. FAMOS
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0408Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
    • G11C16/0416Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing a single floating gate transistor and no select transistor, e.g. UV EPROM

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Non-Volatile Memory (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Semiconductor Memories (AREA)
CA132,413A 1971-01-15 1972-01-14 Electrically alterable floating gate device and method for altering same Expired CA946524A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10664371A 1971-01-15 1971-01-15

Publications (1)

Publication Number Publication Date
CA946524A true CA946524A (en) 1974-04-30

Family

ID=22312502

Family Applications (1)

Application Number Title Priority Date Filing Date
CA132,413A Expired CA946524A (en) 1971-01-15 1972-01-14 Electrically alterable floating gate device and method for altering same

Country Status (8)

Country Link
JP (1) JPS5146382B1 (en)
BE (1) BE777996A (en)
CA (1) CA946524A (en)
DE (1) DE2201028C3 (en)
FR (1) FR2121824B1 (en)
GB (1) GB1383981A (en)
IT (1) IT962050B (en)
NL (1) NL7200562A (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3797000A (en) * 1972-12-29 1974-03-12 Ibm Non-volatile semiconductor storage device utilizing avalanche injection and extraction of stored information
US3836992A (en) * 1973-03-16 1974-09-17 Ibm Electrically erasable floating gate fet memory cell
JPS5613029B2 (en) * 1973-09-21 1981-03-25
DE2638730C2 (en) * 1974-09-20 1982-10-28 Siemens AG, 1000 Berlin und 8000 München N-channel memory FET, method of discharging the memory gate of the n-channel memory FET and using the n-channel memory FET
DE2505816C3 (en) * 1974-09-20 1982-04-22 Siemens AG, 1000 Berlin und 8000 München Method for operating an n-channel memory FET, n-channel memory FET for carrying out the method and applying the method to the n-channel memory FETs of a memory matrix
DE2525062C2 (en) 1975-06-05 1983-02-17 Siemens AG, 1000 Berlin und 8000 München N-channel memory FET array
DE2643987C2 (en) * 1974-09-20 1984-03-29 Siemens AG, 1000 Berlin und 8000 München n-channel memory FET
DE2513207C2 (en) * 1974-09-20 1982-07-01 Siemens AG, 1000 Berlin und 8000 München n-channel memory FET
DE2812049C2 (en) * 1974-09-20 1982-05-27 Siemens AG, 1000 Berlin und 8000 München n-channel memory FET
DE2445079C3 (en) * 1974-09-20 1981-06-04 Siemens AG, 1000 Berlin und 8000 München Storage field effect transistor
DE2560220C2 (en) * 1975-03-25 1982-11-25 Siemens AG, 1000 Berlin und 8000 München n-channel memory FET
JPS5554415A (en) * 1978-10-16 1980-04-21 Nippon Gakki Seizo Kk Method and device for space set averaging for reverberation waveform
DE2845328C2 (en) * 1978-10-18 1986-04-30 Deutsche Itt Industries Gmbh, 7800 Freiburg Memory transistor
JPS6162824A (en) * 1985-06-22 1986-03-31 Nippon Gakki Seizo Kk Method and apparatus for compressive intake of reverberation data
AU6918300A (en) * 1999-09-24 2001-04-30 Intel Corporation A nonvolatile memory device with a high work function floating-gate and method of fabrication
US6518618B1 (en) 1999-12-03 2003-02-11 Intel Corporation Integrated memory cell and method of fabrication

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3500142A (en) * 1967-06-05 1970-03-10 Bell Telephone Labor Inc Field effect semiconductor apparatus with memory involving entrapment of charge carriers
CA813537A (en) * 1967-10-17 1969-05-20 Joseph H. Scott, Jr. Semiconductor memory device

Also Published As

Publication number Publication date
JPS5146382B1 (en) 1976-12-08
BE777996A (en) 1972-05-02
FR2121824A1 (en) 1972-08-25
DE2201028B2 (en) 1979-01-18
NL7200562A (en) 1972-07-18
GB1383981A (en) 1974-02-12
IT962050B (en) 1973-12-20
DE2201028C3 (en) 1981-07-09
FR2121824B1 (en) 1977-04-01
DE2201028A1 (en) 1972-08-31

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