CA2980201C - Methods, systems and devices relating to distortion correction in imaging devices - Google Patents

Methods, systems and devices relating to distortion correction in imaging devices Download PDF

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Publication number
CA2980201C
CA2980201C CA2980201A CA2980201A CA2980201C CA 2980201 C CA2980201 C CA 2980201C CA 2980201 A CA2980201 A CA 2980201A CA 2980201 A CA2980201 A CA 2980201A CA 2980201 C CA2980201 C CA 2980201C
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substrate
location
intended
image
corrected
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English (en)
French (fr)
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CA2980201A1 (en
Inventor
Christopher Pawlowicz
Alexander Sorkin
Vladimir Martincevic
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TechInsights Inc
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TechInsights Inc
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/70—Determining position or orientation of objects or cameras
    • G06T7/73—Determining position or orientation of objects or cameras using feature-based methods
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/222—Image processing arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/60—Noise processing, e.g. detecting, correcting, reducing or removing noise
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/40—Imaging
    • G01N2223/418—Imaging electron microscope
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/10—Image acquisition modality
    • G06T2207/10056—Microscopic image
    • G06T2207/10061—Microscopic image from scanning electron microscope
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/20—Special algorithmic details
    • G06T2207/20068—Projection on vertical or horizontal image axis
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30141—Printed circuit board [PCB]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/22—Treatment of data
    • H01J2237/226—Image reconstruction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H01J2237/2817—Pattern inspection

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Physics & Mathematics (AREA)
  • Immunology (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Pathology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Theoretical Computer Science (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Image Processing (AREA)
CA2980201A 2015-03-23 2016-03-22 Methods, systems and devices relating to distortion correction in imaging devices Active CA2980201C (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201562137078P 2015-03-23 2015-03-23
US62/137,078 2015-03-23
PCT/CA2016/050328 WO2016149817A1 (en) 2015-03-23 2016-03-22 Methods, systems and devices relating to distortion correction in imaging devices

Publications (2)

Publication Number Publication Date
CA2980201A1 CA2980201A1 (en) 2016-09-29
CA2980201C true CA2980201C (en) 2023-06-27

Family

ID=56976889

Family Applications (1)

Application Number Title Priority Date Filing Date
CA2980201A Active CA2980201C (en) 2015-03-23 2016-03-22 Methods, systems and devices relating to distortion correction in imaging devices

Country Status (6)

Country Link
US (1) US10469777B2 (enExample)
EP (2) EP4009042A1 (enExample)
JP (1) JP7294806B2 (enExample)
CN (1) CN107533017B (enExample)
CA (1) CA2980201C (enExample)
WO (1) WO2016149817A1 (enExample)

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GB201715902D0 (en) * 2017-09-29 2017-11-15 Oxford Instr Plc Improved system for electron diffraction analysis
EP3709894B1 (en) * 2017-11-15 2026-02-25 BFLY Operations, Inc. Ultrasound apparatuses and methods for fabricating ultrasound devices
JP6934811B2 (ja) * 2017-11-16 2021-09-15 株式会社ミツトヨ 三次元測定装置
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US10410372B1 (en) * 2018-06-14 2019-09-10 The University Of North Carolina At Chapel Hill Methods, systems, and computer-readable media for utilizing radial distortion to estimate a pose configuration
DE102018124401A1 (de) * 2018-10-02 2020-04-02 Carl Zeiss Smt Gmbh Verfahren zum Aufnehmen eines Bildes mit einem Teilchenmikroskop
FR3087928B1 (fr) 2018-10-29 2020-11-06 Texplained Procede de traitement d'une pluralite d'images elementaires acquises sur un circuit integre
US10834306B2 (en) * 2019-01-15 2020-11-10 International Business Machines Corporation Method for a remote control of a radiation detection apparatus
US11728126B2 (en) * 2021-06-24 2023-08-15 Applied Materials Israel Ltd. 3D metrology from 3D datacube created from stack of registered images obtained during delayering of the sample
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CN116416160B (zh) * 2023-04-12 2026-04-10 东方晶源微电子科技(上海)有限公司 图像矫正方法及装置
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Also Published As

Publication number Publication date
CA2980201A1 (en) 2016-09-29
CN107533017A (zh) 2018-01-02
JP7294806B2 (ja) 2023-06-20
CN107533017B (zh) 2021-01-08
WO2016149817A1 (en) 2016-09-29
US10469777B2 (en) 2019-11-05
EP4009042A1 (en) 2022-06-08
EP3274698A1 (en) 2018-01-31
EP3274698A4 (en) 2018-12-26
JP2018517146A (ja) 2018-06-28
US20180054575A1 (en) 2018-02-22

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