CA2640511C - Thermally stable multilayer mirror for the euv spectral range - Google Patents

Thermally stable multilayer mirror for the euv spectral range Download PDF

Info

Publication number
CA2640511C
CA2640511C CA2640511A CA2640511A CA2640511C CA 2640511 C CA2640511 C CA 2640511C CA 2640511 A CA2640511 A CA 2640511A CA 2640511 A CA2640511 A CA 2640511A CA 2640511 C CA2640511 C CA 2640511C
Authority
CA
Canada
Prior art keywords
multilayer mirror
layer
layers
multilayer
mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CA2640511A
Other languages
English (en)
French (fr)
Other versions
CA2640511A1 (en
Inventor
Torsten Feigl
Nicolas Benoit
Sergiy Yulin
Nobert Kaiser
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Original Assignee
Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV filed Critical Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Publication of CA2640511A1 publication Critical patent/CA2640511A1/en
Application granted granted Critical
Publication of CA2640511C publication Critical patent/CA2640511C/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/04—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings formed by bundles of fibres
    • G02B6/06—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings formed by bundles of fibres the relative position of the fibres being the same at both ends, e.g. for transporting images
    • G02B6/08—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings formed by bundles of fibres the relative position of the fibres being the same at both ends, e.g. for transporting images with fibre bundle in form of plate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CA2640511A 2006-02-10 2007-01-24 Thermally stable multilayer mirror for the euv spectral range Expired - Fee Related CA2640511C (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102006006283.3A DE102006006283B4 (de) 2006-02-10 2006-02-10 Thermisch stabiler Multilayer-Spiegel für den EUV-Spektralbereich
DE102006006283.3 2006-02-10
PCT/DE2007/000126 WO2007090364A2 (de) 2006-02-10 2007-01-24 Thermisch stabiler multilayer-spiegel für den euv-spektralbereich

Publications (2)

Publication Number Publication Date
CA2640511A1 CA2640511A1 (en) 2007-08-16
CA2640511C true CA2640511C (en) 2014-09-23

Family

ID=37998459

Family Applications (1)

Application Number Title Priority Date Filing Date
CA2640511A Expired - Fee Related CA2640511C (en) 2006-02-10 2007-01-24 Thermally stable multilayer mirror for the euv spectral range

Country Status (7)

Country Link
US (1) US7986455B2 (enExample)
EP (1) EP1982219A2 (enExample)
JP (1) JP5054707B2 (enExample)
KR (1) KR101350325B1 (enExample)
CA (1) CA2640511C (enExample)
DE (1) DE102006006283B4 (enExample)
WO (1) WO2007090364A2 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008002403A1 (de) 2008-06-12 2009-12-17 Carl Zeiss Smt Ag Verfahren zum Herstellen einer Mehrlagen-Beschichtung, optisches Element und optische Anordnung
DE102008040265A1 (de) * 2008-07-09 2010-01-14 Carl Zeiss Smt Ag Reflektives optisches Element und Verfahren zu seiner Herstellung
DE102009017096A1 (de) * 2009-04-15 2010-10-21 Carl Zeiss Smt Ag Spiegel für den EUV-Wellenlängenbereich, Projektionsobjektiv für die Mikrolithographie mit einem solchen Spiegel und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv
JP2011222958A (ja) * 2010-03-25 2011-11-04 Komatsu Ltd ミラーおよび極端紫外光生成装置
WO2012171674A1 (en) 2011-06-15 2012-12-20 Asml Netherlands B.V. Multilayer mirror, method of producing a multilayer mirror and lithographic apparatus
DE102013207751A1 (de) 2013-04-29 2014-10-30 Carl Zeiss Smt Gmbh Optisches Element mit einer Mehrlagen-Beschichtung und optische Anordnung damit
DE102013107192A1 (de) 2013-07-08 2015-01-08 Carl Zeiss Laser Optics Gmbh Reflektives optisches Element für streifenden Einfall im EUV-Wellenlängenbereich
FR3059434B1 (fr) * 2016-11-29 2019-05-17 Centre National De La Recherche Scientifique - Cnrs Composant de selection spectrale pour radiations xuv
US12339477B2 (en) 2020-05-26 2025-06-24 Lawrence Livermore National Security, Llc Amorphous or nanocrystalline molybdenum nitride and silicon nitride multilayers

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5190807A (en) * 1990-10-18 1993-03-02 Diamonex, Incorporated Abrasion wear resistant polymeric substrate product
US5480706A (en) * 1991-09-05 1996-01-02 Alliedsignal Inc. Fire resistant ballistic resistant composite armor
JP3357876B2 (ja) * 1996-04-30 2002-12-16 株式会社デンソー Ｘ線反射装置
JPH09326347A (ja) * 1996-06-05 1997-12-16 Hitachi Ltd 微細パターン転写方法およびその装置
US5911858A (en) * 1997-02-18 1999-06-15 Sandia Corporation Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors
JPH1138192A (ja) * 1997-07-17 1999-02-12 Nikon Corp 多層膜反射鏡
US6073559A (en) * 1998-09-11 2000-06-13 Presstek, Inc. Lithographic imaging with constructions having inorganic oleophilic layers
US6385290B1 (en) * 1998-09-14 2002-05-07 Nikon Corporation X-ray apparatus
US6670040B1 (en) * 1999-07-14 2003-12-30 Tokai University Educational System Carbon fiber-reinforced carbon composite body and method of manufacturing the same
DE10011547C2 (de) * 2000-02-28 2003-06-12 Fraunhofer Ges Forschung Thermisch stabiles Schichtsystem zur Reflexion von Strahlung im extremen ultravioletten Spektralbereich (EUV)
DE10011548C2 (de) * 2000-02-28 2003-06-18 Fraunhofer Ges Forschung Verfahren zur Herstellung eines thermisch stabilen Schichtsystems zur Reflexion von Strahlung im extremen ultravioletten Spektralbereich (EUV)
US6664554B2 (en) * 2001-01-03 2003-12-16 Euv Llc Self-cleaning optic for extreme ultraviolet lithography
US6396900B1 (en) * 2001-05-01 2002-05-28 The Regents Of The University Of California Multilayer films with sharp, stable interfaces for use in EUV and soft X-ray application
US7843632B2 (en) * 2006-08-16 2010-11-30 Cymer, Inc. EUV optics
DE10150874A1 (de) * 2001-10-04 2003-04-30 Zeiss Carl Optisches Element und Verfahren zu dessen Herstellung sowie ein Lithographiegerät und ein Verfahren zur Herstellung eines Halbleiterbauelements
JP3864106B2 (ja) * 2002-03-27 2006-12-27 ジーイー・メディカル・システムズ・グローバル・テクノロジー・カンパニー・エルエルシー 透過ｘ線データ獲得装置およびｘ線断層像撮影装置
EP1348984A1 (en) 2002-03-27 2003-10-01 Carl Zeiss Semiconductor Manufacturing Technologies Ag Optical broad band element and process for its production
US7560581B2 (en) * 2002-07-12 2009-07-14 President And Fellows Of Harvard College Vapor deposition of tungsten nitride
FR2853418B1 (fr) 2003-04-01 2005-08-19 Commissariat Energie Atomique Dispositif optique a stabilite mecanique renforcee fonctionnant dans l'extreme ultraviolet et masque de lithographie comportant un tel dispositif
US8945310B2 (en) * 2003-05-22 2015-02-03 Koninklijke Philips Electronics N.V. Method and device for cleaning at least one optical component
US7193228B2 (en) * 2004-03-10 2007-03-20 Cymer, Inc. EUV light source optical elements
JP2005300249A (ja) * 2004-04-08 2005-10-27 Nikon Corp 多層膜反射鏡、多層膜反射鏡の製造方法、及びｅｕｖ露光装置
JP2006173446A (ja) * 2004-12-17 2006-06-29 Nikon Corp 極端紫外線用の光学素子及びこれを用いた投影露光装置
DE102004062289B4 (de) * 2004-12-23 2007-07-19 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Thermisch stabiler Multilayer-Spiegel für den EUV-Spektralbereich

Also Published As

Publication number Publication date
DE102006006283A1 (de) 2007-08-23
DE102006006283B4 (de) 2015-05-21
CA2640511A1 (en) 2007-08-16
JP5054707B2 (ja) 2012-10-24
US7986455B2 (en) 2011-07-26
EP1982219A2 (de) 2008-10-22
JP2009526387A (ja) 2009-07-16
US20090009858A1 (en) 2009-01-08
KR20080096660A (ko) 2008-10-31
WO2007090364A3 (de) 2007-09-20
WO2007090364A2 (de) 2007-08-16
KR101350325B1 (ko) 2014-01-10

Similar Documents

Publication Publication Date Title
CA2640511C (en) Thermally stable multilayer mirror for the euv spectral range
JP4904287B2 (ja) Ｅｕｖスペクトル範囲のための熱安定性多層ミラー
US11520087B2 (en) Reflective optical element
US9910193B2 (en) Reflective optical element and EUV lithography appliance
JP5716038B2 (ja) Ｅｕｖリソグラフィ用反射光学素子
TWI427334B (zh) Ｅｕｖ蝕刻裝置反射光學元件
US20130335816A1 (en) Method for producing a reflective optical component for an euv projection exposure apparatus and component of this type
US10061204B2 (en) Mirror, in particular for a microlithographic projection exposure apparatus
KR20120018085A (ko) Ｕｖ 또는 ｅｕｖ 리소그래피용 광학 소자
JP2006173446A (ja) 極端紫外線用の光学素子及びこれを用いた投影露光装置
EP2300876A1 (en) Method for producing a multilayer coating, optical element and optical arrangement
TWI835896B (zh) 具有後側塗層的極紫外線掩模
TWI804135B (zh) 極紫外光表膜
JP2007198782A (ja) 多層膜反射鏡及び露光装置
JP4852852B2 (ja) 加熱ユニット
JP2006171577A (ja) 光学素子及びこれを用いた投影露光装置
JP2005302860A (ja) 極短紫外線光学系用光学素子及び極短紫外線露光装置
JP4343895B2 (ja) 軟ｘ線用多層膜ミラー
JP2006170911A (ja) 光学素子及びこれを用いた投影露光装置
JP2024530977A (ja) 多層極端紫外線反射材料
JP2002277589A (ja) Ｍｏ／Ｓｉ多層膜及びその耐熱性を向上させる方法
CN120283199A (zh) 表膜隔膜和制造方法
JP2006135203A (ja) 輻射温調部材および露光装置
JP2545905C (enExample)

Legal Events

Date Code Title Description
EEER Examination request
MKLA Lapsed

Effective date: 20170124