KR101350325B1 - Ｅｕｖ-스펙트럼 영역을 위한 열에 안정적인 다층 미러 - Google Patents

Ｅｕｖ-스펙트럼 영역을 위한 열에 안정적인 다층 미러 Download PDF

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KR101350325B1
KR101350325B1 KR1020087019398A KR20087019398A KR101350325B1 KR 101350325 B1 KR101350325 B1 KR 101350325B1 KR 1020087019398 A KR1020087019398 A KR 1020087019398A KR 20087019398 A KR20087019398 A KR 20087019398A KR 101350325 B1 KR101350325 B1 KR 101350325B1
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South Korea
Prior art keywords
mirror
multilayer
layer
euv
layers
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English (en)
Korean (ko)
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KR20080096660A (ko
Inventor
토르스텐 파이클
니콜라스 베르노이트
제르기 율린
노베르트 카이저
Original Assignee
프라운호퍼-게젤샤프트 츄어 푀르더룽 데어 안게반텐 포르슝에.파우.
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/04—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings formed by bundles of fibres
    • G02B6/06—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings formed by bundles of fibres the relative position of the fibres being the same at both ends, e.g. for transporting images
    • G02B6/08—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings formed by bundles of fibres the relative position of the fibres being the same at both ends, e.g. for transporting images with fibre bundle in form of plate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020087019398A 2006-02-10 2007-01-24 Ｅｕｖ-스펙트럼 영역을 위한 열에 안정적인 다층 미러 Expired - Fee Related KR101350325B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102006006283.3A DE102006006283B4 (de) 2006-02-10 2006-02-10 Thermisch stabiler Multilayer-Spiegel für den EUV-Spektralbereich
DE102006006283.3 2006-02-10
PCT/DE2007/000126 WO2007090364A2 (de) 2006-02-10 2007-01-24 Thermisch stabiler multilayer-spiegel für den euv-spektralbereich

Publications (2)

Publication Number Publication Date
KR20080096660A KR20080096660A (ko) 2008-10-31
KR101350325B1 true KR101350325B1 (ko) 2014-01-10

Family

ID=37998459

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020087019398A Expired - Fee Related KR101350325B1 (ko) 2006-02-10 2007-01-24 Ｅｕｖ-스펙트럼 영역을 위한 열에 안정적인 다층 미러

Country Status (7)

Country Link
US (1) US7986455B2 (enExample)
EP (1) EP1982219A2 (enExample)
JP (1) JP5054707B2 (enExample)
KR (1) KR101350325B1 (enExample)
CA (1) CA2640511C (enExample)
DE (1) DE102006006283B4 (enExample)
WO (1) WO2007090364A2 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008002403A1 (de) 2008-06-12 2009-12-17 Carl Zeiss Smt Ag Verfahren zum Herstellen einer Mehrlagen-Beschichtung, optisches Element und optische Anordnung
DE102008040265A1 (de) * 2008-07-09 2010-01-14 Carl Zeiss Smt Ag Reflektives optisches Element und Verfahren zu seiner Herstellung
DE102009017096A1 (de) * 2009-04-15 2010-10-21 Carl Zeiss Smt Ag Spiegel für den EUV-Wellenlängenbereich, Projektionsobjektiv für die Mikrolithographie mit einem solchen Spiegel und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv
JP2011222958A (ja) * 2010-03-25 2011-11-04 Komatsu Ltd ミラーおよび極端紫外光生成装置
US9448492B2 (en) 2011-06-15 2016-09-20 Asml Netherlands B.V. Multilayer mirror, method of producing a multilayer mirror and lithographic apparatus
DE102013207751A1 (de) 2013-04-29 2014-10-30 Carl Zeiss Smt Gmbh Optisches Element mit einer Mehrlagen-Beschichtung und optische Anordnung damit
DE102013107192A1 (de) * 2013-07-08 2015-01-08 Carl Zeiss Laser Optics Gmbh Reflektives optisches Element für streifenden Einfall im EUV-Wellenlängenbereich
FR3059434B1 (fr) * 2016-11-29 2019-05-17 Centre National De La Recherche Scientifique - Cnrs Composant de selection spectrale pour radiations xuv
US12339477B2 (en) * 2020-05-26 2025-06-24 Lawrence Livermore National Security, Llc Amorphous or nanocrystalline molybdenum nitride and silicon nitride multilayers

Citations (4)

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JPH1138192A (ja) * 1997-07-17 1999-02-12 Nikon Corp 多層膜反射鏡
KR20030072588A (ko) * 2001-01-03 2003-09-15 이유브이 리미티드 라이어빌러티 코포레이션 극 자외 사진 식각용 자가 세정 광학계
JP2005300249A (ja) * 2004-04-08 2005-10-27 Nikon Corp 多層膜反射鏡、多層膜反射鏡の製造方法、及びｅｕｖ露光装置
KR20060006841A (ko) * 2003-05-22 2006-01-19 코닌클리즈케 필립스 일렉트로닉스 엔.브이. 하나 이상의 광학 컴포넌트를 클리닝하기 위한 방법 및장치

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US5190807A (en) * 1990-10-18 1993-03-02 Diamonex, Incorporated Abrasion wear resistant polymeric substrate product
US5480706A (en) * 1991-09-05 1996-01-02 Alliedsignal Inc. Fire resistant ballistic resistant composite armor
JP3357876B2 (ja) * 1996-04-30 2002-12-16 株式会社デンソー Ｘ線反射装置
JPH09326347A (ja) * 1996-06-05 1997-12-16 Hitachi Ltd 微細パターン転写方法およびその装置
US5911858A (en) * 1997-02-18 1999-06-15 Sandia Corporation Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors
US6073559A (en) * 1998-09-11 2000-06-13 Presstek, Inc. Lithographic imaging with constructions having inorganic oleophilic layers
US6385290B1 (en) * 1998-09-14 2002-05-07 Nikon Corporation X-ray apparatus
US6670040B1 (en) * 1999-07-14 2003-12-30 Tokai University Educational System Carbon fiber-reinforced carbon composite body and method of manufacturing the same
DE10011548C2 (de) * 2000-02-28 2003-06-18 Fraunhofer Ges Forschung Verfahren zur Herstellung eines thermisch stabilen Schichtsystems zur Reflexion von Strahlung im extremen ultravioletten Spektralbereich (EUV)
DE10011547C2 (de) * 2000-02-28 2003-06-12 Fraunhofer Ges Forschung Thermisch stabiles Schichtsystem zur Reflexion von Strahlung im extremen ultravioletten Spektralbereich (EUV)
US6396900B1 (en) * 2001-05-01 2002-05-28 The Regents Of The University Of California Multilayer films with sharp, stable interfaces for use in EUV and soft X-ray application
US7843632B2 (en) * 2006-08-16 2010-11-30 Cymer, Inc. EUV optics
DE10150874A1 (de) * 2001-10-04 2003-04-30 Zeiss Carl Optisches Element und Verfahren zu dessen Herstellung sowie ein Lithographiegerät und ein Verfahren zur Herstellung eines Halbleiterbauelements
JP3864106B2 (ja) * 2002-03-27 2006-12-27 ジーイー・メディカル・システムズ・グローバル・テクノロジー・カンパニー・エルエルシー 透過ｘ線データ獲得装置およびｘ線断層像撮影装置
EP1348984A1 (en) 2002-03-27 2003-10-01 Carl Zeiss Semiconductor Manufacturing Technologies Ag Optical broad band element and process for its production
EP1543177A1 (en) * 2002-07-12 2005-06-22 President And Fellows Of Harvard College Vapor deposition of tungsten nitride
FR2853418B1 (fr) * 2003-04-01 2005-08-19 Commissariat Energie Atomique Dispositif optique a stabilite mecanique renforcee fonctionnant dans l'extreme ultraviolet et masque de lithographie comportant un tel dispositif
US7193228B2 (en) * 2004-03-10 2007-03-20 Cymer, Inc. EUV light source optical elements
JP2006173446A (ja) * 2004-12-17 2006-06-29 Nikon Corp 極端紫外線用の光学素子及びこれを用いた投影露光装置
DE102004062289B4 (de) * 2004-12-23 2007-07-19 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Thermisch stabiler Multilayer-Spiegel für den EUV-Spektralbereich

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1138192A (ja) * 1997-07-17 1999-02-12 Nikon Corp 多層膜反射鏡
KR20030072588A (ko) * 2001-01-03 2003-09-15 이유브이 리미티드 라이어빌러티 코포레이션 극 자외 사진 식각용 자가 세정 광학계
KR20060006841A (ko) * 2003-05-22 2006-01-19 코닌클리즈케 필립스 일렉트로닉스 엔.브이. 하나 이상의 광학 컴포넌트를 클리닝하기 위한 방법 및장치
JP2005300249A (ja) * 2004-04-08 2005-10-27 Nikon Corp 多層膜反射鏡、多層膜反射鏡の製造方法、及びｅｕｖ露光装置

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Publication number Publication date
JP2009526387A (ja) 2009-07-16
KR20080096660A (ko) 2008-10-31
WO2007090364A2 (de) 2007-08-16
WO2007090364A3 (de) 2007-09-20
DE102006006283B4 (de) 2015-05-21
US7986455B2 (en) 2011-07-26
CA2640511A1 (en) 2007-08-16
DE102006006283A1 (de) 2007-08-23
US20090009858A1 (en) 2009-01-08
JP5054707B2 (ja) 2012-10-24
CA2640511C (en) 2014-09-23
EP1982219A2 (de) 2008-10-22

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