DE102006006283B4 - Thermisch stabiler Multilayer-Spiegel für den EUV-Spektralbereich - Google Patents

Thermisch stabiler Multilayer-Spiegel für den EUV-Spektralbereich Download PDF

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Publication number
DE102006006283B4
DE102006006283B4 DE102006006283.3A DE102006006283A DE102006006283B4 DE 102006006283 B4 DE102006006283 B4 DE 102006006283B4 DE 102006006283 A DE102006006283 A DE 102006006283A DE 102006006283 B4 DE102006006283 B4 DE 102006006283B4
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DE
Germany
Prior art keywords
multilayer mirror
layer
layers
mirror according
multilayer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE102006006283.3A
Other languages
German (de)
English (en)
Other versions
DE102006006283A1 (de
Inventor
Dr. Feigl Torsten
Dr. Yulin Sergiy
Nicolas Benoit
Dr. Kaiser Norbert
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Original Assignee
Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to DE102006006283.3A priority Critical patent/DE102006006283B4/de
Application filed by Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV filed Critical Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Priority to CA2640511A priority patent/CA2640511C/en
Priority to EP07711155A priority patent/EP1982219A2/de
Priority to KR1020087019398A priority patent/KR101350325B1/ko
Priority to PCT/DE2007/000126 priority patent/WO2007090364A2/de
Priority to JP2008553606A priority patent/JP5054707B2/ja
Publication of DE102006006283A1 publication Critical patent/DE102006006283A1/de
Priority to US12/188,603 priority patent/US7986455B2/en
Application granted granted Critical
Publication of DE102006006283B4 publication Critical patent/DE102006006283B4/de
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/04—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings formed by bundles of fibres
    • G02B6/06—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings formed by bundles of fibres the relative position of the fibres being the same at both ends, e.g. for transporting images
    • G02B6/08—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings formed by bundles of fibres the relative position of the fibres being the same at both ends, e.g. for transporting images with fibre bundle in form of plate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE102006006283.3A 2006-02-10 2006-02-10 Thermisch stabiler Multilayer-Spiegel für den EUV-Spektralbereich Expired - Fee Related DE102006006283B4 (de)

Priority Applications (7)

Application Number Priority Date Filing Date Title
DE102006006283.3A DE102006006283B4 (de) 2006-02-10 2006-02-10 Thermisch stabiler Multilayer-Spiegel für den EUV-Spektralbereich
EP07711155A EP1982219A2 (de) 2006-02-10 2007-01-24 Thermisch stabiler multilayer-spiegel für den euv-spektralbereich
KR1020087019398A KR101350325B1 (ko) 2006-02-10 2007-01-24 Ｅｕｖ-스펙트럼 영역을 위한 열에 안정적인 다층 미러
PCT/DE2007/000126 WO2007090364A2 (de) 2006-02-10 2007-01-24 Thermisch stabiler multilayer-spiegel für den euv-spektralbereich
CA2640511A CA2640511C (en) 2006-02-10 2007-01-24 Thermally stable multilayer mirror for the euv spectral range
JP2008553606A JP5054707B2 (ja) 2006-02-10 2007-01-24 極紫外線スペクトル領域（ｅｕｖ）用の熱安定多層ミラー及び当該多層ミラーの使用
US12/188,603 US7986455B2 (en) 2006-02-10 2008-08-08 Thermally stable multilayer mirror for the EUV spectral range

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102006006283.3A DE102006006283B4 (de) 2006-02-10 2006-02-10 Thermisch stabiler Multilayer-Spiegel für den EUV-Spektralbereich

Publications (2)

Publication Number Publication Date
DE102006006283A1 DE102006006283A1 (de) 2007-08-23
DE102006006283B4 true DE102006006283B4 (de) 2015-05-21

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Family Applications (1)

Application Number Title Priority Date Filing Date
DE102006006283.3A Expired - Fee Related DE102006006283B4 (de) 2006-02-10 2006-02-10 Thermisch stabiler Multilayer-Spiegel für den EUV-Spektralbereich

Country Status (7)

Country Link
US (1) US7986455B2 (enExample)
EP (1) EP1982219A2 (enExample)
JP (1) JP5054707B2 (enExample)
KR (1) KR101350325B1 (enExample)
CA (1) CA2640511C (enExample)
DE (1) DE102006006283B4 (enExample)
WO (1) WO2007090364A2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9703209B2 (en) 2013-07-08 2017-07-11 Carl Zeiss Smt Gmbh Reflective optical element for grazing incidence in the EUV wavelength range

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008002403A1 (de) 2008-06-12 2009-12-17 Carl Zeiss Smt Ag Verfahren zum Herstellen einer Mehrlagen-Beschichtung, optisches Element und optische Anordnung
DE102008040265A1 (de) 2008-07-09 2010-01-14 Carl Zeiss Smt Ag Reflektives optisches Element und Verfahren zu seiner Herstellung
DE102009017096A1 (de) * 2009-04-15 2010-10-21 Carl Zeiss Smt Ag Spiegel für den EUV-Wellenlängenbereich, Projektionsobjektiv für die Mikrolithographie mit einem solchen Spiegel und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv
JP2011222958A (ja) * 2010-03-25 2011-11-04 Komatsu Ltd ミラーおよび極端紫外光生成装置
WO2012171674A1 (en) * 2011-06-15 2012-12-20 Asml Netherlands B.V. Multilayer mirror, method of producing a multilayer mirror and lithographic apparatus
DE102013207751A1 (de) 2013-04-29 2014-10-30 Carl Zeiss Smt Gmbh Optisches Element mit einer Mehrlagen-Beschichtung und optische Anordnung damit
FR3059434B1 (fr) * 2016-11-29 2019-05-17 Centre National De La Recherche Scientifique - Cnrs Composant de selection spectrale pour radiations xuv
US12339477B2 (en) 2020-05-26 2025-06-24 Lawrence Livermore National Security, Llc Amorphous or nanocrystalline molybdenum nitride and silicon nitride multilayers

Citations (7)

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US5190807A (en) * 1990-10-18 1993-03-02 Diamonex, Incorporated Abrasion wear resistant polymeric substrate product
US6385290B1 (en) * 1998-09-14 2002-05-07 Nikon Corporation X-ray apparatus
WO2004007796A1 (en) * 2002-07-12 2004-01-22 President And Fellows Of Harvard College Vapor deposition of tungsten nitride
EP1464993A1 (fr) * 2003-04-01 2004-10-06 Commissariat A L'energie Atomique Dispositif optique à stabilité mécanique renforcée fonctionnant dans l'extrême ultraviolet et masque de lithographie comportant un tel dispositif
WO2004104707A2 (de) * 2003-05-22 2004-12-02 Philips Intellectual Property & Standards Gmbh Verfahren und vorrichtung zum reinigen mindestens einer optischen komponente
US20050199830A1 (en) * 2004-03-10 2005-09-15 Bowering Norbert R. EUV light source optical elements
DE102004062289A1 (de) * 2004-12-23 2006-07-06 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Thermisch stabiler Multilayer-Spiegel für den EUV-Spektralbereich

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US5480706A (en) * 1991-09-05 1996-01-02 Alliedsignal Inc. Fire resistant ballistic resistant composite armor
JP3357876B2 (ja) * 1996-04-30 2002-12-16 株式会社デンソー Ｘ線反射装置
JPH09326347A (ja) * 1996-06-05 1997-12-16 Hitachi Ltd 微細パターン転写方法およびその装置
US5911858A (en) * 1997-02-18 1999-06-15 Sandia Corporation Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors
JPH1138192A (ja) * 1997-07-17 1999-02-12 Nikon Corp 多層膜反射鏡
US6073559A (en) * 1998-09-11 2000-06-13 Presstek, Inc. Lithographic imaging with constructions having inorganic oleophilic layers
US6670040B1 (en) * 1999-07-14 2003-12-30 Tokai University Educational System Carbon fiber-reinforced carbon composite body and method of manufacturing the same
DE10011548C2 (de) * 2000-02-28 2003-06-18 Fraunhofer Ges Forschung Verfahren zur Herstellung eines thermisch stabilen Schichtsystems zur Reflexion von Strahlung im extremen ultravioletten Spektralbereich (EUV)
DE10011547C2 (de) * 2000-02-28 2003-06-12 Fraunhofer Ges Forschung Thermisch stabiles Schichtsystem zur Reflexion von Strahlung im extremen ultravioletten Spektralbereich (EUV)
US6664554B2 (en) * 2001-01-03 2003-12-16 Euv Llc Self-cleaning optic for extreme ultraviolet lithography
US6396900B1 (en) * 2001-05-01 2002-05-28 The Regents Of The University Of California Multilayer films with sharp, stable interfaces for use in EUV and soft X-ray application
US7843632B2 (en) * 2006-08-16 2010-11-30 Cymer, Inc. EUV optics
DE10150874A1 (de) * 2001-10-04 2003-04-30 Zeiss Carl Optisches Element und Verfahren zu dessen Herstellung sowie ein Lithographiegerät und ein Verfahren zur Herstellung eines Halbleiterbauelements
EP1348984A1 (en) 2002-03-27 2003-10-01 Carl Zeiss Semiconductor Manufacturing Technologies Ag Optical broad band element and process for its production
JP3864106B2 (ja) * 2002-03-27 2006-12-27 ジーイー・メディカル・システムズ・グローバル・テクノロジー・カンパニー・エルエルシー 透過ｘ線データ獲得装置およびｘ線断層像撮影装置
JP2005300249A (ja) * 2004-04-08 2005-10-27 Nikon Corp 多層膜反射鏡、多層膜反射鏡の製造方法、及びｅｕｖ露光装置
JP2006173446A (ja) * 2004-12-17 2006-06-29 Nikon Corp 極端紫外線用の光学素子及びこれを用いた投影露光装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5190807A (en) * 1990-10-18 1993-03-02 Diamonex, Incorporated Abrasion wear resistant polymeric substrate product
US6385290B1 (en) * 1998-09-14 2002-05-07 Nikon Corporation X-ray apparatus
WO2004007796A1 (en) * 2002-07-12 2004-01-22 President And Fellows Of Harvard College Vapor deposition of tungsten nitride
EP1464993A1 (fr) * 2003-04-01 2004-10-06 Commissariat A L'energie Atomique Dispositif optique à stabilité mécanique renforcée fonctionnant dans l'extrême ultraviolet et masque de lithographie comportant un tel dispositif
WO2004104707A2 (de) * 2003-05-22 2004-12-02 Philips Intellectual Property & Standards Gmbh Verfahren und vorrichtung zum reinigen mindestens einer optischen komponente
US20050199830A1 (en) * 2004-03-10 2005-09-15 Bowering Norbert R. EUV light source optical elements
DE102004062289A1 (de) * 2004-12-23 2006-07-06 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Thermisch stabiler Multilayer-Spiegel für den EUV-Spektralbereich

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9703209B2 (en) 2013-07-08 2017-07-11 Carl Zeiss Smt Gmbh Reflective optical element for grazing incidence in the EUV wavelength range

Also Published As

Publication number Publication date
US7986455B2 (en) 2011-07-26
JP5054707B2 (ja) 2012-10-24
DE102006006283A1 (de) 2007-08-23
CA2640511A1 (en) 2007-08-16
WO2007090364A2 (de) 2007-08-16
US20090009858A1 (en) 2009-01-08
CA2640511C (en) 2014-09-23
EP1982219A2 (de) 2008-10-22
WO2007090364A3 (de) 2007-09-20
KR20080096660A (ko) 2008-10-31
JP2009526387A (ja) 2009-07-16
KR101350325B1 (ko) 2014-01-10

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