CA2597866A1 - Photolithographic patterning of polymeric materials - Google Patents
Photolithographic patterning of polymeric materials Download PDFInfo
- Publication number
- CA2597866A1 CA2597866A1 CA 2597866 CA2597866A CA2597866A1 CA 2597866 A1 CA2597866 A1 CA 2597866A1 CA 2597866 CA2597866 CA 2597866 CA 2597866 A CA2597866 A CA 2597866A CA 2597866 A1 CA2597866 A1 CA 2597866A1
- Authority
- CA
- Canada
- Prior art keywords
- radiation
- plastic substrate
- curable polymer
- polymer
- photo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000000059 patterning Methods 0.000 title claims abstract description 29
- 239000000463 material Substances 0.000 title description 35
- 229920000642 polymer Polymers 0.000 claims abstract description 145
- 239000000758 substrate Substances 0.000 claims abstract description 144
- 238000000034 method Methods 0.000 claims abstract description 98
- 229920003023 plastic Polymers 0.000 claims abstract description 95
- 239000004033 plastic Substances 0.000 claims abstract description 95
- 230000003287 optical effect Effects 0.000 claims abstract description 81
- 230000005855 radiation Effects 0.000 claims abstract description 72
- 230000004888 barrier function Effects 0.000 claims abstract description 33
- 239000000654 additive Substances 0.000 claims abstract description 26
- 230000000996 additive effect Effects 0.000 claims abstract description 23
- 238000004519 manufacturing process Methods 0.000 claims abstract description 18
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 24
- 229920000139 polyethylene terephthalate Polymers 0.000 claims description 24
- 238000005253 cladding Methods 0.000 claims description 21
- 229920000515 polycarbonate Polymers 0.000 claims description 21
- 239000003999 initiator Substances 0.000 claims description 20
- 239000004417 polycarbonate Substances 0.000 claims description 19
- 238000000151 deposition Methods 0.000 claims description 18
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 14
- 239000002904 solvent Substances 0.000 claims description 13
- -1 polyethylene terephthalate Polymers 0.000 claims description 12
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 10
- 239000006096 absorbing agent Substances 0.000 claims description 9
- 125000000524 functional group Chemical group 0.000 claims description 9
- 239000012949 free radical photoinitiator Substances 0.000 claims description 8
- 239000000178 monomer Substances 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 6
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical group C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 claims description 5
- 239000004411 aluminium Substances 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- 230000008021 deposition Effects 0.000 claims description 5
- 125000003700 epoxy group Chemical group 0.000 claims description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 3
- 229920002554 vinyl polymer Polymers 0.000 claims description 3
- 238000001125 extrusion Methods 0.000 claims description 2
- 239000000203 mixture Substances 0.000 abstract description 20
- 238000000016 photochemical curing Methods 0.000 abstract 2
- 239000010410 layer Substances 0.000 description 44
- 150000003254 radicals Chemical class 0.000 description 18
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 15
- 238000000576 coating method Methods 0.000 description 15
- 229910052760 oxygen Inorganic materials 0.000 description 15
- 239000001301 oxygen Substances 0.000 description 15
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 14
- 239000010703 silicon Substances 0.000 description 14
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- 238000000206 photolithography Methods 0.000 description 7
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- 239000004642 Polyimide Substances 0.000 description 3
- 239000012952 cationic photoinitiator Substances 0.000 description 3
- 230000001066 destructive effect Effects 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
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- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 2
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 2
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 2
- RIWRBSMFKVOJMN-UHFFFAOYSA-N 2-methyl-1-phenylpropan-2-ol Chemical compound CC(C)(O)CC1=CC=CC=C1 RIWRBSMFKVOJMN-UHFFFAOYSA-N 0.000 description 2
- 229940123457 Free radical scavenger Drugs 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 239000004425 Makrolon Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000003491 array Methods 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 125000002091 cationic group Chemical group 0.000 description 2
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- 238000001465 metallisation Methods 0.000 description 2
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- 239000002516 radical scavenger Substances 0.000 description 2
- 125000003011 styrenyl group Chemical group [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
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- GJKGAPPUXSSCFI-UHFFFAOYSA-N 2-Hydroxy-4'-(2-hydroxyethoxy)-2-methylpropiophenone Chemical compound CC(C)(O)C(=O)C1=CC=C(OCCO)C=C1 GJKGAPPUXSSCFI-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- LRRQSCPPOIUNGX-UHFFFAOYSA-N 2-hydroxy-1,2-bis(4-methoxyphenyl)ethanone Chemical compound C1=CC(OC)=CC=C1C(O)C(=O)C1=CC=C(OC)C=C1 LRRQSCPPOIUNGX-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- MYISVPVWAQRUTL-UHFFFAOYSA-N 2-methylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3SC2=C1 MYISVPVWAQRUTL-UHFFFAOYSA-N 0.000 description 1
- KTALPKYXQZGAEG-UHFFFAOYSA-N 2-propan-2-ylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC=C3SC2=C1 KTALPKYXQZGAEG-UHFFFAOYSA-N 0.000 description 1
- VZEZONWRBFJJMZ-UHFFFAOYSA-N 3-allyl-2-[2-(diethylamino)ethoxy]benzaldehyde Chemical compound CCN(CC)CCOC1=C(CC=C)C=CC=C1C=O VZEZONWRBFJJMZ-UHFFFAOYSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 1
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 1
- 239000005041 Mylar™ Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- BEUGBYXJXMVRFO-UHFFFAOYSA-N [4-(dimethylamino)phenyl]-phenylmethanone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=CC=C1 BEUGBYXJXMVRFO-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
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- 229960002130 benzoin Drugs 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
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- 230000000779 depleting effect Effects 0.000 description 1
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- 238000004049 embossing Methods 0.000 description 1
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- 238000005530 etching Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- 230000007760 free radical scavenging Effects 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
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- 230000007246 mechanism Effects 0.000 description 1
- 238000001393 microlithography Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
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- 238000007254 oxidation reaction Methods 0.000 description 1
- 150000002926 oxygen Chemical class 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
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- 229920001296 polysiloxane Polymers 0.000 description 1
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- 239000003381 stabilizer Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
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- B32B15/00—Layered products comprising a layer of metal
- B32B15/20—Layered products comprising a layer of metal comprising aluminium or copper
-
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- B32B27/00—Layered products comprising a layer of synthetic resin
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- B32B27/36—Layered products comprising a layer of synthetic resin comprising polyesters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/1221—Basic optical elements, e.g. light-guiding paths made from organic materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B32B2250/00—Layers arrangement
- B32B2250/02—2 layers
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- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2255/00—Coating on the layer surface
- B32B2255/10—Coating on the layer surface on synthetic resin layer or on natural or synthetic rubber layer
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- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/41—Opaque
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/42—Polarizing, birefringent, filtering
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- B32B2307/00—Properties of the layers or laminate
- B32B2307/70—Other properties
- B32B2307/71—Resistive to light or to UV
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- B32B2457/00—Electrical equipment
- B32B2457/20—Displays, e.g. liquid crystal displays, plasma displays
- B32B2457/208—Touch screens
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
- Y10T428/24612—Composite web or sheet
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31507—Of polycarbonate
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Optics & Photonics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Optical Integrated Circuits (AREA)
- Laminated Bodies (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Materials For Photolithography (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US65334605P | 2005-02-15 | 2005-02-15 | |
| US60/653,346 | 2005-02-15 | ||
| PCT/AU2006/000201 WO2006086841A1 (en) | 2005-02-15 | 2006-02-15 | Photolithographic patterning of polymeric materials |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2597866A1 true CA2597866A1 (en) | 2006-08-24 |
Family
ID=36916114
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA 2597866 Abandoned CA2597866A1 (en) | 2005-02-15 | 2006-02-15 | Photolithographic patterning of polymeric materials |
Country Status (11)
| Country | Link |
|---|---|
| US (3) | US7923071B2 (enExample) |
| EP (1) | EP1851591A4 (enExample) |
| JP (2) | JP2008530317A (enExample) |
| KR (1) | KR20070103069A (enExample) |
| CN (1) | CN101142532A (enExample) |
| AU (1) | AU2006214795A1 (enExample) |
| BR (1) | BRPI0607463A2 (enExample) |
| CA (1) | CA2597866A1 (enExample) |
| RU (1) | RU2007134366A (enExample) |
| TW (1) | TW200702904A (enExample) |
| WO (1) | WO2006086841A1 (enExample) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7811640B2 (en) * | 2006-05-02 | 2010-10-12 | Rpo Pty Limited | Methods for fabricating polymer optical waveguides on large area panels |
| US20080106527A1 (en) * | 2006-11-06 | 2008-05-08 | Rpo Pty Limited | Waveguide Configurations for Minimising Substrate Area |
| EP2019336A1 (en) * | 2007-06-11 | 2009-01-28 | Stichting Dutch Polymer Institute | Process for preparing a polymeric relief structure |
| EP2183408A2 (en) | 2007-08-07 | 2010-05-12 | President And Fellows Of Harvard College | Metal oxide coating on surfaces |
| US8562770B2 (en) | 2008-05-21 | 2013-10-22 | Manufacturing Resources International, Inc. | Frame seal methods for LCD |
| US8268604B2 (en) * | 2007-12-20 | 2012-09-18 | Abbott Point Of Care Inc. | Compositions for forming immobilized biological layers for sensing |
| US8241697B2 (en) * | 2007-12-20 | 2012-08-14 | Abbott Point Of Care Inc. | Formation of immobilized biological layers for sensing |
| CN102047206B (zh) | 2008-01-11 | 2015-04-15 | 昂纳光波触摸有限公司 | 触敏装置 |
| JP2011515236A (ja) * | 2008-03-28 | 2011-05-19 | プレジデント アンド フェローズ オブ ハーバード カレッジ | 制御された濡れ特性を有するマイクロ流体チャネルを含む表面 |
| GB2459505A (en) * | 2008-04-25 | 2009-10-28 | Dublin Inst Of Technology | Optical component fabrication by depositing a polymerisation activator pattern |
| JP2009276724A (ja) * | 2008-05-19 | 2009-11-26 | Nitto Denko Corp | 光導波路装置の製造方法 |
| US9573346B2 (en) | 2008-05-21 | 2017-02-21 | Manufacturing Resources International, Inc. | Photoinitiated optical adhesive and method for using same |
| JP2010066667A (ja) * | 2008-09-12 | 2010-03-25 | Nitto Denko Corp | 光導波路装置の製造方法 |
| JP5106332B2 (ja) * | 2008-09-18 | 2012-12-26 | 日東電工株式会社 | 光導波路装置の製造方法およびそれによって得られた光導波路装置 |
| MX2012005664A (es) * | 2009-12-02 | 2012-06-19 | Basf Se | Procedimiento para el combate de microorganismos fitopatogenos con sales de cobre particuladas de superficie modificada. |
| US9465296B2 (en) | 2010-01-12 | 2016-10-11 | Rolith, Inc. | Nanopatterning method and apparatus |
| KR102396005B1 (ko) * | 2013-10-21 | 2022-05-10 | 닛산 가가쿠 가부시키가이샤 | 광도파로의 제조방법 |
| US11407901B2 (en) * | 2018-06-13 | 2022-08-09 | The Boeing Company | System and method for protecting a surface from UV radiation |
| WO2022174006A1 (en) | 2021-02-12 | 2022-08-18 | Manufacturing Resourcesinternational, Inc | Display assembly using structural adhesive |
| US12350730B1 (en) | 2023-12-27 | 2025-07-08 | Manufacturing Resources International, Inc. | Bending mandril comprising ultra high molecular weight material, related bending machines, systems, and methods |
Family Cites Families (63)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3689264A (en) * | 1970-03-19 | 1972-09-05 | Bell Telephone Labor Inc | Method for increasing index of refraction in transparent bodies and its application to light guides and the like |
| US3809732A (en) * | 1972-12-18 | 1974-05-07 | Bell Telephone Labor Inc | Photo-locking technique for producing integrated optical circuits |
| GB1464718A (en) * | 1973-05-10 | 1977-02-16 | Grace W R & Co | Laminates containing layers of aluminium and hydrolysed olefin-vinyl ester copolymer |
| US4126466A (en) * | 1974-07-22 | 1978-11-21 | E. I. Du Pont De Nemours And Company | Composite, mask-forming, photohardenable elements |
| US3993485A (en) * | 1975-05-27 | 1976-11-23 | Bell Telephone Laboratories, Incorporated | Photopolymerization process and related devices |
| US4126468A (en) * | 1975-06-28 | 1978-11-21 | Vickers Limited | Radiation sensitive compositions of quaternary ammonium salt and carboxylic acid sensitizer |
| US4609252A (en) * | 1979-04-02 | 1986-09-02 | Hughes Aircraft Company | Organic optical waveguide device and method of making |
| JPS61231541A (ja) * | 1985-04-06 | 1986-10-15 | Nippon Seihaku Kk | 感光性平版印刷版材 |
| US4645731A (en) * | 1985-12-27 | 1987-02-24 | E. I. Du Pont De Nemours And Company | Distortion resistant polyester support for use as a phototool |
| GB8610227D0 (en) * | 1986-04-25 | 1986-05-29 | Plessey Co Plc | Organic optical waveguides |
| US5292620A (en) * | 1988-01-15 | 1994-03-08 | E. I. Du Pont De Nemours And Company | Optical waveguide devices, elements for making the devices and methods of making the devices and elements |
| DE3814298A1 (de) * | 1988-04-28 | 1989-11-09 | Hoechst Ag | Lichtwellenleiter |
| JPH01282543A (ja) * | 1988-05-09 | 1989-11-14 | Fuji Photo Film Co Ltd | 画像形成材料 |
| DE69019889T2 (de) * | 1989-08-08 | 1995-11-16 | Ici Plc | Optische Komponente. |
| FR2656156A1 (fr) * | 1989-12-16 | 1991-06-21 | Sgs Thomson Microelectronics | Circuit integre entierement protege des rayons ultra-violets. |
| US5054872A (en) * | 1990-03-16 | 1991-10-08 | Ibm Corporation | Polymeric optical waveguides and methods of forming the same |
| EP0504824B1 (en) * | 1991-03-20 | 1998-01-14 | E.I. Du Pont De Nemours And Company | Photosensitive printing element |
| TW262537B (enExample) * | 1993-07-01 | 1995-11-11 | Allied Signal Inc | |
| CH688165A5 (de) * | 1993-07-26 | 1997-05-30 | Balzers Hochvakuum | Verfahren zur Herstellung eines optischen Wellenleiters und darnach hergestellter optischer Wellenleiter |
| JPH0792337A (ja) * | 1993-09-27 | 1995-04-07 | Hitachi Cable Ltd | ポリマコア光導波路およびその製造方法 |
| GB9320326D0 (en) * | 1993-10-01 | 1993-11-17 | Ici Plc | Organic optical components and preparation thereof |
| US5462700A (en) * | 1993-11-08 | 1995-10-31 | Alliedsignal Inc. | Process for making an array of tapered photopolymerized waveguides |
| GB2290745A (en) * | 1994-07-01 | 1996-01-10 | Ciba Geigy Ag | Coextruded stabilised laminated thermolastics |
| US6162579A (en) * | 1996-04-19 | 2000-12-19 | Corning Incorporated | Nitrone compounds as photopolymer polymerization inhibitors and contrast enhancing additives |
| US5789015A (en) * | 1996-06-26 | 1998-08-04 | Innotech, Inc. | Impregnation of plastic substrates with photochromic additives |
| SE508067C2 (sv) * | 1996-10-18 | 1998-08-24 | Ericsson Telefon Ab L M | Optisk ledare tillverkad av ett polymert material innefattande glycidylakrylat och pentafluorstyren |
| DE69710098T2 (de) * | 1996-12-31 | 2002-08-29 | Honeywell, Inc. | Flexible optische verbindungseinheit |
| US5914709A (en) * | 1997-03-14 | 1999-06-22 | Poa Sana, Llc | User input device for a computer system |
| US6335149B1 (en) * | 1997-04-08 | 2002-01-01 | Corning Incorporated | High performance acrylate materials for optical interconnects |
| US6054253A (en) * | 1997-10-10 | 2000-04-25 | Mcgill University-The Royal Institute For The Advancement Of Learning | Solvent-assisted lithographic process using photosensitive sol-gel derived glass for depositing ridge waveguides on silicon |
| US6133472A (en) * | 1998-01-20 | 2000-10-17 | Alliedsignal Inc. | Fluorinated oxyvinyl compounds and methods of preparing and using same |
| US6537723B1 (en) * | 1998-10-05 | 2003-03-25 | Nippon Telegraph And Telephone Corporation | Photosensitive composition for manufacturing optical waveguide, production method thereof and polymer optical waveguide pattern formation method using the same |
| JP4304549B2 (ja) * | 1999-01-18 | 2009-07-29 | 東洋紡績株式会社 | 感光性樹脂積層体 |
| US6500887B1 (en) * | 1999-04-12 | 2002-12-31 | Asahi Denka Kogyo K.K. | Polymeric material composition |
| US6306563B1 (en) * | 1999-06-21 | 2001-10-23 | Corning Inc. | Optical devices made from radiation curable fluorinated compositions |
| US6413699B1 (en) * | 1999-10-11 | 2002-07-02 | Macdermid Graphic Arts, Inc. | UV-absorbing support layers and flexographic printing elements comprising same |
| WO2001037049A1 (en) * | 1999-11-12 | 2001-05-25 | Nippon Sheet Glass Co., Ltd. | Photosensitive composition, and optical waveguide element and process for producing the same |
| JP2003515782A (ja) * | 1999-12-02 | 2003-05-07 | ジェムファイア コーポレイション | 光デバイスの光画定 |
| JP2001175185A (ja) * | 1999-12-14 | 2001-06-29 | Bridgestone Corp | 電磁波シールド性光透過窓材及び表示装置 |
| US6181842B1 (en) * | 2000-01-10 | 2001-01-30 | Poa Sana, Inc. | Position digitizer waveguide array with integrated collimating optics |
| JP2001296438A (ja) * | 2000-04-12 | 2001-10-26 | Hitachi Cable Ltd | フォトブリーチング導波路 |
| JP2001166166A (ja) * | 2000-11-06 | 2001-06-22 | Nippon Telegr & Teleph Corp <Ntt> | 高分子光導波路フィルム |
| US20020142234A1 (en) * | 2001-03-29 | 2002-10-03 | Hansel Gregory A. | Photomask |
| US6731857B2 (en) * | 2001-03-29 | 2004-05-04 | Shipley Company, L.L.C. | Photodefinable composition, method of manufacturing an optical waveguide with the photodefinable composition, and optical waveguide formed therefrom |
| WO2002088221A1 (en) * | 2001-04-27 | 2002-11-07 | The University Of Sydney | Materials for optical applications |
| US6542684B2 (en) * | 2001-05-01 | 2003-04-01 | Corning Incorporated | Optimized multi-layer optical waveguiding system |
| US6599957B2 (en) * | 2001-05-07 | 2003-07-29 | Corning Incorporated | Photosensitive material suitable for making waveguides and method of making waveguides utilizing this photosensitive optical material |
| TW557368B (en) * | 2001-06-29 | 2003-10-11 | Jsr Corp | Anti-reflection film laminated body and method of manufacturing the laminated body |
| DE10153760A1 (de) * | 2001-10-31 | 2003-05-22 | Fraunhofer Ges Forschung | Verfahren zur Herstellung einer UV-absorbierenden transparenten Abriebschutzschicht |
| JP3846284B2 (ja) * | 2001-11-26 | 2006-11-15 | 株式会社トッパンNecサーキットソリューションズ | 光導波路の製造方法 |
| JP3838964B2 (ja) * | 2002-03-13 | 2006-10-25 | 株式会社リコー | 機能性素子基板の製造装置 |
| US6965006B2 (en) * | 2002-04-10 | 2005-11-15 | Rpo Pty Ltd. | Metal alkoxide polymers |
| US6727337B2 (en) * | 2002-05-16 | 2004-04-27 | The Australian National University | Low loss optical material |
| WO2003098280A2 (en) * | 2002-05-17 | 2003-11-27 | Nanoventions, Inc. | Planar optical waveguide |
| US6781761B2 (en) * | 2002-08-29 | 2004-08-24 | Mark A. Raymond | Lenticular lens system and method for use in producing images with clear-walled containers |
| US6832036B2 (en) * | 2002-10-11 | 2004-12-14 | Polyset Company, Inc. | Siloxane optical waveguides |
| US6818721B2 (en) * | 2002-12-02 | 2004-11-16 | Rpo Pty Ltd. | Process for producing polysiloxanes and use of the same |
| JP4193544B2 (ja) * | 2003-03-27 | 2008-12-10 | セイコーエプソン株式会社 | 光学式タッチパネル及び電子機器 |
| US7786983B2 (en) * | 2003-04-08 | 2010-08-31 | Poa Sana Liquidating Trust | Apparatus and method for a data input device using a light lamina screen |
| US7058272B2 (en) * | 2003-12-29 | 2006-06-06 | Eastman Kodak Company | Wave-guided optical indicator |
| JP2005225996A (ja) * | 2004-02-13 | 2005-08-25 | Fuji Photo Film Co Ltd | 樹脂組成物およびそれを用いた光学部品、プラスチックレンズ、プラスチックフィルム基板 |
| JP4067504B2 (ja) * | 2004-03-17 | 2008-03-26 | 三洋電機株式会社 | 光導波路及びその製造方法 |
| WO2006034980A1 (en) * | 2004-09-30 | 2006-04-06 | Ciba Specialty Chemicals Holding Inc. | Method for replenishing or introducing light stabilizers |
-
2006
- 2006-02-15 KR KR1020077021047A patent/KR20070103069A/ko not_active Ceased
- 2006-02-15 TW TW095105121A patent/TW200702904A/zh unknown
- 2006-02-15 CN CNA2006800049365A patent/CN101142532A/zh active Pending
- 2006-02-15 AU AU2006214795A patent/AU2006214795A1/en not_active Abandoned
- 2006-02-15 RU RU2007134366/04A patent/RU2007134366A/ru not_active Application Discontinuation
- 2006-02-15 WO PCT/AU2006/000201 patent/WO2006086841A1/en not_active Ceased
- 2006-02-15 EP EP06704878A patent/EP1851591A4/en not_active Withdrawn
- 2006-02-15 BR BRPI0607463-4A patent/BRPI0607463A2/pt not_active Application Discontinuation
- 2006-02-15 US US11/355,668 patent/US7923071B2/en not_active Expired - Fee Related
- 2006-02-15 CA CA 2597866 patent/CA2597866A1/en not_active Abandoned
- 2006-02-15 JP JP2007555423A patent/JP2008530317A/ja active Pending
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2010
- 2010-12-21 US US12/974,858 patent/US20110151197A1/en not_active Abandoned
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2011
- 2011-12-09 US US13/315,538 patent/US9176384B2/en not_active Expired - Fee Related
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2012
- 2012-12-06 JP JP2012267005A patent/JP2013080242A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| TW200702904A (en) | 2007-01-16 |
| WO2006086841A8 (en) | 2008-02-28 |
| AU2006214795A1 (en) | 2006-08-24 |
| US20110151197A1 (en) | 2011-06-23 |
| US20070190331A1 (en) | 2007-08-16 |
| CN101142532A (zh) | 2008-03-12 |
| JP2008530317A (ja) | 2008-08-07 |
| JP2013080242A (ja) | 2013-05-02 |
| BRPI0607463A2 (pt) | 2009-09-08 |
| EP1851591A1 (en) | 2007-11-07 |
| EP1851591A4 (en) | 2010-09-01 |
| US9176384B2 (en) | 2015-11-03 |
| US20120219771A1 (en) | 2012-08-30 |
| RU2007134366A (ru) | 2009-03-27 |
| KR20070103069A (ko) | 2007-10-22 |
| US7923071B2 (en) | 2011-04-12 |
| WO2006086841A1 (en) | 2006-08-24 |
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